A final review session will be offered on Thursday, May 10 from 10AM to 12noon in 521 Cory (the Hogan Room).

Transcription

1 A final review session will be offered on Thursday, May 10 from 10AM to 12noon in 521 Cory (the Hogan Room). The Final Exam will take place from 12:30PM to 3:30PM on Saturday May 12 in 60 Evans.» All of the material of the course will be covered (including HW#14)» Closed book, no calculators; 7 pages of notes allowed. SCORE EE130 QUIZ RESULTS (UG scores only) Q1 Q2 Q3 Q4 Q5 Q6 Quiz 6 results: Mean = Median = 22 Std. Dev. = High = 24 Low =

2 Prof. Tsu-Jae King Liu Department of Electrical Engineering and Computer Sciences University of California, Berkeley, CA May 7, 2007

3 ( More of Moore )

4 The traditional approach to transistor scaling is reaching fundamental limits» oxide scaling» Shallow junctions Source L g Drain» Channel engineering halo doping Issues for scaling L g to below 20 nm:» Leakage SiO 2» Incommensurate gains in I Dsat» V T variation Source Drain A. Brown et al., IEEE Trans. Nanotechnology, p. 195,

5 Leakage must be suppressed to scale down L g Leakage occurs in region far from channel surface Let s get rid of it! L g Thin-Body MOSFET Source Drain Buried Oxide Substrate Silicon- on- I nsulator ( SOI ) W afer 5

6 Leakage is suppressed by using a thin body (T Si < L g )» Channel doping is not needed higher carrier mobility» Aggressive gate-oxide scaling is not needed Double-gate structure is most scalable (to L g <10nm) Ultra-Thin Body (UTB) Double- (DG) L g Source Drain Buried Oxide T Si Source Drain T Si Substrate 6

7 UTB suppresses leakage Thick S/D => low R series Source SOI SiO 2 Silicon Substrate Drain M. Takamiya et al., Proc ISDRS, p. 215 B. Yu et al. (UC Berkeley), Proc ISDRS, p E-02 1.E-04 1.E-06 1.E-08 1.E-10 1.E-12 L g = 12 nm T ox = 2 nm Simulated I d -V g V ds =1V Subthreshold swing S (units: mv/dec) T si =8nm T si =6nm T si =4nm Voltage [V] 7

8 Issues for bulk-si MOSFET scaling obviated» Body does not need to be heavily doped» T ox does not need to be scaled as aggressively» Ultra-shallow S/D junction formation is not an issue Body thickness must be less than ~1/3 x L g» Formation of uniformly thin body is primary challenge» For T Si < 4 nm, quantum confinement & interface roughness V T variation and degraded g m K. Uchida et al., IEDM Technical Digest, pp ,

9 Planar DG-FET FinFET L g L g Drain T Si Source Drain Fin Height H FIN = W/2 Source D. Hisamoto et al. (UC Berkeley), IEDM Technical Digest, pp , 1998 N. Lindert et al. (UC Berkeley), IEEE Electron Device Letters, pp , 2001 Fin Width = T Si 15nm L g FinFET: GATE 20 nm SOURCE DRAIN 10 nm Y.-K. Choi et al. (UC Berkeley), IEDM Technical Digest, pp ,

10 g Y.-K. Choi et al. (UC Berkeley), IEDM Technical Digest, pp , 2001 T Si = 10 nm; T ox = 2.1 nm d Transfer Characteristics V d =-1.0 V V d =-0.05 V N-body= 2x10 18 cm -3 PMOS P+Si 0.4 Ge 0.6 V d =1.0 V V d =0.05 V NMOS Voltage, V g [V] d Output Characteristics PMOS V g -V t =1.2V NMOS Voltage step : 0.2V Drain Voltage, V d [V]

11 Hole Mobility (100) (110) D D (110) S PMOS (100) S NMOS D Electron Mobility (110) S D S (100) (110) (110) L. Chang et al., IEEE Trans. Electron Devices, Vol. 51, p. 1621,

12 g B. Yu et al. (AMD & UC Berkeley), IEDM Technical Digest, pp , 2002 Drain Source Poly-Si NiSi 220Å SiO2 cap Si Fin BOX Lg=10nm 12

13 P. Xuan et al. (UC Berkeley), IEDM Technical Digest, pp , 2003 The FinFET is attractive for high-density flash memory FinFET SONOS Device Cross-Section 0 SiO 2 Si 3 N 4 SiO 2 30nm Si SiO 2 Poly-Si 40nm charge-storage layer Measured Retention Characteristics Subsequent publications: M. Specht et al. (Infineon Technologies ), IEDM 2004 C. W. Oh et al. (Samsung Electronics), IEDM 2004 E. S. Cho et al. (Samsung Electronics), Symp. VLSI Technology Threshold voltage (V) Measured Endurance Behavior (100) device (110) device k 10k 100k 1M Number of cycles

14 H. Kam and T.-J. King, Proc Silicon Nanoelectronics Workshop, pp L g =18nm, L eff = 20nm, W fin =10nm, T ox =5A Top Contact Wrapped Contact Wrapped Contact, zero contact res End Contact Wrapped Contact Top Contact S O G D UR AT R A C E I E N c=10-8 -cm 2 S O UR C E End Contact G AT D R E A I N S O UR C E G AT E D R A I N 0 Vg=0.6V Vds (V) Parasitic resistance (& capacitance) will limit the performance of nanoscale CMOS Better FET designs are needed! 14

15 metallic gate high- gate dielectric L g (nm): alternative semiconductor? larger E G, lower r S G Si D strained Si classic al forward body biasing G multi-gate S Si D G Advanced structures will enable Si FET scaling to L g <10 nm» Minimization of parasitics will become the primary challenge 15

16 J. Wang et al., IEDM Technical Digest, pp , 2002 Quantum mechanical tunneling sets a fundamental scaling limit for the channel length L, to ~5 nm. If electrons can easily tunnel through the source-to-channel potential barrier, the gate cannot shut off the transistor. NMOSFET Band Diagram (OFF state) Source Drain E C 16 E C

17 ( More than Moore )

18 Alternative approaches to» enhance performance and/or functionality» lower power consumption per function can help to reduce cost per function innovative circuit & system design novel semiconductor devices 3-D & heterogeneous integration e.g. with micro-electro-mechanical devices (MEMS), microfluidics alternative approaches to scaling 18 TIME (yrs)

19 TM Texas Instruments Inc. Mirrors are made using layers of metals (Al alloys) deposited on top of CMOS circuitry SEM image of pixel array Schematic of 2 pixels Each mirror corresponds to a single pixel, programmed by an underlying memory cell to deflect light either into a projection lens or a light absorber. 19

20 Massive Cluster Gigabit Ethernet Clusters Integration trend for mobile phones wireless sensor network Advantages of MEMS RF filters: small size low power low phase noise high Q MEMS - enabled single-chip radio Timing reference can also be implemented on-chip with MEMS courtesy of Robert Aigner (Infineon Technologies) 20

21 An electric field modifies the wetting behavior of a liquid droplet on a surface, by reducing interfacial energy The electric field can be induced by applying a voltage across 2 electrodes sandwiching the droplet If an electric field is applied non-uniformly, then a surface-energy gradient is created, which causes the droplet to move 21

22 R. B. Fair et al., IEDM Technical Digest, pp , 2003 Multiple control electrodes can be used to manipulate droplets across a surface under direct electrical control 22» No pumps, valves, channels needed» Units of fluid can be transported, stored, mixed, reacted, or analyzed using a sequence of electrode voltage combinations. Electrowetting arrays are promising for highly integrated and automated lab-on-a-chip systems!

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24 Bulk-Si MOSFET Source Substrate L eff L g X j (~1970 to present) Drain N sub Opportunities remain for innovations to» reduce power per function (e.g. novel devices)» lower system cost (e.g. integrated system on chip)» increase system functionality T ox CMOS scaling will continue with advances in» transistor design» fabrication techniques» materials scaling to L g < 20 nm (beyond 2010) Investment (e.g. heterogeneous integration of III-V devices, M/NEMS, CNTs, molecular devices, etc.) 24 Multi- MOSFET 1 Source Market Growth Drain 2 Technology, Device & Circuit Innovations, Heterogeneous Integration Lower Power, Lower Cost