EUVL Optics lifetime and contamination. European Update

Transcription

1 EUVL Optics life and contamination European Update EUVL Symposium 27 TWG Optics Contamination and Life Sapporo Bas Wolschrijn, TNO 1/12

2 % productivity EUV intensity [au] % productivity Pulse intensity CxHy typical vacuum system improved vacuum system EUVL vacuum system Cleaned mirrors EUVL vacuum system synchrotron AD tool pulsed Re flectivity FC115 B1 SI Reflectivity FC115 B1 SI Status EUVL symposium 2 Progress in the optics usage programme for ASML EUV Lithographic Tools Bas Wolschrijn 1 *, Rik Jansen 1, Arnold Storm 1, Bas Mertens 1, Dirk Ehm, Thomas Stein, Roel Moors 2, Vadim Banine 2, Hans Meiling 2 1) TNO Science and Industry, P.O Box AD Delft, The Netherlands 2) ASML,, De Run 111, Veldhoven, The Netherlands * corresponding author: bas.wolschrijn@tno.nl ) Carl Zeiss SMT-AG, Abt. HL-VT, D-744 Oberkochen, Germany Introduction In order to make EUV economically viable, optics usage should be in the range of 7-1 years (tens of thousands of illumination hours). The ASML strategy to reach the specification for optics usage includes: good vacuum reduced C-growth improved oxidation resistance of mirrors fast carbon ing, without mirror degradation productivity Optics reflectivity is not influenced by H 2 Influence of H 2 O pressure 1.E-8 1.E-7 1.E- 1.E-5 1.E-4 1.E H2O partial pressure [mbar] Amount of C-growth on mirror depends on EUV intensity and hydrocarbon (CxHy) partial pressure Illumination profile non-able effect non-ed ed R= will check with Roel for latest data -2.. Initial effect reflectivity map initial Prod. loss -2% Mild carbon growth Influence of non-ed ed Exposure H2O] H Optics reflectivity is influenced by C-growth Given experimental data, we expect mild carbon growth for lithotool vacuum environment R (%) Cleaning result R/R = -.15 ±.%! Exposure [Mpulse] R/R = -%! Intentionally Cleaning heavily carbonised mirrors up fully to initial reflectance has been experimentally ed proven!!! Summary - Carbon growth expected in lithotool - No oxidation expected - Optics degardation intensity dependent -Cleaning proven and implemented Progress in Optics Usage On the left: poster contribution EUVL symposium 2, Barcelona See also EU update Optics Life and contamination TWG meeting Barcelona 2 Reflectivity loss % Reflectivity loss R vs EUV power, using model CxHy at 1-5 mbar The first mirrors in the illuminator see the highest EUV intensity and thus the highest carbon growth rate Intensity at the POB mirrors is substantially lower Optics life [exp.hrs] ] production AD-tool Acknowledgements: FOM Rijnhuizen, Philips Eindhoven, PTB Berlin, ALS Berkeley 2/12

3 % productivity EUV intensity [au] % productivity Pulse intensity CxHy typical vacuum system improved vacuum system EUVL vacuum system Cleaned mirrors EUVL vacuum system synchrotron AD tool pulsed Re flectivity FC115 B1 SI Reflectivity FC115 B1 SI Status EUVL symposium 2 Progress in the optics usage programme for ASML EUV Lithographic Tools Bas Wolschrijn 1 *, Rik Jansen 1, Arnold Storm 1, Bas Mertens 1, Dirk Ehm, Thomas Stein, Roel Moors 2, Vadim Banine 2, Hans Meiling 2 1) TNO Science and Industry, P.O Box AD Delft, The Netherlands 2) ASML,, De Run 111, Veldhoven, The Netherlands * corresponding author: bas.wolschrijn@tno.nl ) Carl Zeiss SMT-AG, Abt. HL-VT, D-744 Oberkochen, Germany Introduction In order to make EUV economically viable, optics usage should be in the range of 7-1 years (tens of thousands of illumination hours). The ASML strategy to reach the specification for optics usage includes: good vacuum reduced C-growth improved oxidation resistance of mirrors fast carbon ing, without mirror degradation productivity non-able effect initial Prod. loss -2% Optics reflectivity is influenced by C-growth Exposure [Mpulse] Given experimental data, we expect mild carbon growth for lithotool vacuum environment Strategy productivity non-able effect initial Prod. loss -2% Optics reflectivity is not influenced by H Influence of H 2 O pressure non-ed ed R= 1.E-8 1.E-7 1.E- 1.E-5 1.E-4 1.E H2O partial pressure [mbar] will check with Roel for latest data Amount of C-growth on mirror depends on EUV intensity and hydrocarbon (CxHy) partial pressure Initial effect Mild carbon growth Influence of non-ed ed Exposure H2O] H R (%) Cleaning result R/R = -.15 ±.%! R/R = -%! Intentionally Cleaning heavily carbonised mirrors up fully to initial reflectance has been experimentally ed proven!!! Summary - Carbon growth expected in lithotool - No oxidation expected - Optics degardation intensity dependent -Cleaning proven and implemented Given experimental data, we expect mild carbon growth for lithotool vacuum environment Illumination profile reflectivity map Progress in Optics Usage Reflectivity loss % Reflectivity loss R vs EUV power, using model CxHy at 1-5 mbar The first mirrors in the illuminator see the highest EUV intensity and thus the highest carbon growth rate Intensity at the POB mirrors is substantially lower Optics life [exp.hrs] ] production AD-tool Acknowledgements: FOM Rijnhuizen, Philips Eindhoven, PTB Berlin, ALS Berkeley /12

4 % productivity EUV intensity [au] % productivity Pulse intensity CxHy typical vacuum system improved vacuum system EUVL vacuum system Cleaned mirrors EUVL vacuum system synchrotron AD tool pulsed Re flectivity FC115 B1 SI Reflectivity FC115 B1 SI Status EUVL symposium 2 Progress in the optics usage programme for ASML EUV Lithographic Tools Bas Wolschrijn 1 *, Rik Jansen 1, Arnold Storm 1, Bas Mertens 1, Dirk Ehm, Thomas Stein, Roel Moors 2, Vadim Banine 2, Hans Meiling 2 1) TNO Science and Industry, P.O Box AD Delft, The Netherlands 2) ASML,, De Run 111, Veldhoven, The Netherlands * corresponding author: bas.wolschrijn@tno.nl ) Carl Zeiss SMT-AG, Abt. HL-VT, D-744 Oberkochen, Germany Illumination profile reflectivity map Introduction In order to make EUV economically viable, optics usage should be in the range of 7-1 years (tens of thousands of illumination hours). The ASML strategy to reach the specification for optics usage includes: good vacuum reduced C-growth improved oxidation resistance of mirrors fast carbon ing, without mirror degradation productivity non-able effect initial Optics reflectivity is influenced by C-growth Exposure [Mpulse] Prod. loss -2% Given experimental data, we expect mild carbon growth for lithotool vacuum environment Optics reflectivity is not influenced by H Influence of H 2 O pressure non-ed ed R= 1.E-8 1.E-7 1.E- 1.E-5 1.E-4 1.E H2O partial pressure [mbar] will check with Roel for latest data -2.. Initial effect Mild carbon growth Influence of non-ed ed Exposure H2O] H R (%) Cleaning result R/R = -.15 ±.%! R/R = -%! Intentionally Cleaning heavily carbonised mirrors up fully to initial reflectance has been experimentally ed proven!!! Residual carbon growth is expected to be intensity dependent Amount of C-growth on mirror depends on EUV intensity and hydrocarbon (CxHy) partial pressure Summary - Carbon growth expected in lithotool - No oxidation expected - Optics degardation intensity dependent -Cleaning proven and implemented Illumination profile reflectivity map Progress in Optics Usage Reflectivity loss % Reflectivity loss R vs EUV power, using model CxHy at 1-5 mbar The first mirrors in the illuminator see the highest EUV intensity and thus the highest carbon growth rate Intensity at the POB mirrors is substantially lower Optics life [exp.hrs] ] production AD-tool Acknowledgements: FOM Rijnhuizen, Philips Eindhoven, PTB Berlin, ALS Berkeley 4/12

5 % productivity EUV intensity [au] % productivity Pulse intensity CxHy typical vacuum system improved vacuum system EUVL vacuum system Cleaned mirrors EUVL vacuum system synchrotron AD tool pulsed Re flectivity FC115 B1 SI Reflectivity FC115 B1 SI Status EUVL symposium 2 Progress in the optics usage programme for ASML EUV Lithographic Tools Bas Wolschrijn 1 *, Rik Jansen 1, Arnold Storm 1, Bas Mertens 1, Dirk Ehm, Thomas Stein, Roel Moors 2, Vadim Banine 2, Hans Meiling 2 1) TNO Science and Industry, P.O Box AD Delft, The Netherlands 2) ASML,, De Run 111, Veldhoven, The Netherlands * corresponding author: bas.wolschrijn@tno.nl ) Carl Zeiss SMT-AG, Abt. HL-VT, D-744 Oberkochen, Germany Introduction In order to make EUV economically viable, optics usage should be in the range of 7-1 years (tens of thousands of illumination hours). The ASML strategy to reach the specification for optics usage includes: good vacuum reduced C-growth improved oxidation resistance of mirrors fast carbon ing, without mirror degradation productivity non-able effect initial Prod. loss -2% Optics reflectivity is influenced by C-growth Exposure [Mpulse] Given experimental data, we expect mild carbon growth for lithotool vacuum environment R (%) Cleaning result R/R = -.15 ±.%! R/R = -%! - - Reflectivity FC115 B1 SI Optics reflectivity is not influenced by H 2 Mild carbon growth Cleaning result Influence of H 2 O pressure non-ed ed R= 1.E-8 1.E-7 1.E- 1.E-5 1.E-4 1.E H2O partial pressure [mbar] will check with Roel for latest data -2.. Initial effect Influence of non-ed ed Exposure H2O] H R (%) R/R = -%! Intentionally Cleaning heavily carbonised mirrors up fully to initial reflectance has been experimentally ed proven!!! R/R = -.15 ±.%! Intentionally carbonised mirror fully Cleaning on heavily carbonised mirrors up to initial reflectance has been experimentally ed proven!!! Reflectivity loss % Amount of C-growth on mirror depends on EUV intensity and hydrocarbon (CxHy) partial pressure Illumination profile Reflectivity loss R vs EUV power, using model CxHy at 1-5 mbar reflectivity map The first mirrors in the illuminator see the highest EUV intensity and thus the highest carbon growth rate Intensity at the POB mirrors is substantially lower Summary - Carbon growth expected in lithotool - No oxidation expected - Optics degardation intensity dependent -Cleaning proven and implemented Progress in Optics Usage Optics life [exp.hrs] ] production AD-tool Losses due to any carbon growth will be ed Acknowledgements: FOM Rijnhuizen, Philips Eindhoven, PTB Berlin, ALS Berkeley 5/12

6 So far for the observation from experimental program What do we observe at when Alpha Demo Tools are operational? /12

7 ADT data During usage of ASML Alpha tools, the mirror contamination behavior has been investigated for several mirrors The observed contamination rate is different for various mirrors contamination rate depends on intensity, similar to the findings in our experimental setups Contamination is proven to be reversible (able) with implemented ing method as expected ADT mirror data Fit Contamination Rate Intensity 7/12

8 ADT data We measured the contamination distribution on one single mirror ( spot resolved ) Intensity dependence also observed within one single mirror ADT mirror data Fit Single mirror: spot resolved Contamination Rate Intensity 8/12

9 ADT data Intensity dependence also observed by in-situ measurement(s) (dedicated experiment) ADT mirror data Fit In-situ reference measurement Single mirror: spot resolved Contamination Rate Intensity /12

10 ADT data: after liness improvements Reason for contamination is known/understood Additional vacuum improvements further enhanced the liness of the Alpha Tools below detectable levels (!) ADT mirror data Fit In-situ reference measurement Single mirror: spot resolved Contamination Rate In-situ reference measurement after improvements Intensity 1/12

11 Towards Production tools Alpha tools learning Production tool program Fundamental research The ASML strategy to reach the specification for optics usage includes: good vacuum reduced C-growth improved oxidation resistance of mirrors fast carbon ing, without mirror degradation 11/12

12 Acknowledgements Carl Zeiss SMT AG, Oberkochen, Germany ASML, Veldhoven, The Netherlands TNO Science and Industry, Delft/Eindhoven, The Netherlands FOM, Nieuwegein, The Netherlands PTB, Berlin, Germany Philips, Eindhoven, The Netherlands ALS, Berkeley, USA 12/12