EUV-collector mirrors for high-power LPP sources

Transcription

1 EUV-collector mirrors for high-power LPP sources EUV Source Workshop Torsten Feigl, Sergiy Yulin, Nicolas Benoit, Norbert Kaiser Fraunhofer IOF Jena Norbert Böwering, Oleh Khodykin, David Brandt Cymer, Inc. Vancouver, May 25, 2006

2 Content Motivation / Introduction High-temperature multilayer development Technical setup: Collector mirror coating EUV reflectivity measurements Summary

3 Content Motivation / Introduction High-temperature multilayer development Technical setup: Collector mirror coating EUV reflectivity measurements Summary

4 Collector lifetime challenges EUV-collector mirrors for high-power LPP sources EUV induced carbon growth and oxidation Sputtering of multilayers Thermal stability of multilayer Source material buildup on collector Source material diffusion into multilayer Deposition of source material contaminations Deposition of material sputtered from source hardware

5 Cymer s HVM EUV source concept EUV-collector mirrors for high-power LPP sources

6 Cymer s HVM EUV source concept EUV-collector mirrors for high-power LPP sources Collector mounting and heating First 320 mm collector in optical test setup

7 Content Motivation / Introduction High-temperature multilayer development Technical setup: Collector mirror coating EUV reflectivity measurements Summary

8 Mo/Si multilayers R = 68.8 % λ = 13.5 nm FWHM = 0.50 nm N = 60 R 20 % λ = nm FWHM = 2.33 nm N = 60 reflectivity periodic design broadband design narrowband design R = 14.6 % λ = 13.5 nm FWHM = nm N = 40 Measurements: PTB Berlin, BESSY II wavelength, nm

9 Interface - engineered multilayers EUV-collector mirrors for high-power LPP sources Ideal Real Interface Engineering A B A B A A A+B B A+B A A+B B A+B A B A B A C

10 Enhancement of reflectivity and stability in Mo/Si with C barriers R = 69.6 % λ = nm Mo C Si

11 High-temperature Mo/X/Si/X multilayer mirrors for λ = 13.5 nm T = 500 C [Si/X 2 /Mo/X 2 ] 60 +Si θ = 1.5 As-deposited τ = 1h τ = 10h τ = 100h Reflectivity, % C 100 h Wavelength, nm

12 High-temperature Mo/X/Si/X multilayer mirrors for λ = 13.5 nm 500 C 100 hours AFM of Mo/X/Si/X, as-deposited, rms-roughness: σ = 0.12 nm AFM of Mo/X/Si/X after 500 C / 100 h, rms-roughness: σ = 0.14 nm

13 Content Motivation / Introduction High-temperature multilayer development Technical setup: Collector mirror coating EUV reflectivity measurements Summary

14 NESSY New EUV Sputtering System EUV-collector mirrors for high-power LPP sources Design and realization of an EUV sputtering system Conception: magnetron sputtering (sputter down) of rotating, fast spinning substrates deposition of graded multilayers on curved substrates

15 NESSY New EUV Sputtering System EUV-collector mirrors for high-power LPP sources

16 NESSY specifications EUV-collector mirrors for high-power LPP sources Substrate size Substrate size limit Substrate stations Sputter sources Thickness homogeneity Base pressure Working pressure up to Ø 450 mm (load locked) Ø650 mm 2 stations for Ø 450 mm or 3 stations for Ø 300 mm 4 magnetrons, 600 mm x 125 mm +/- 0.1 % on 150 mm, +/- 0.2 % on 300 mm < 8*10-9 mbar < 7*10-4 mbar

17 Content Motivation / Introduction High-temperature multilayer development Technical setup: Collector mirror coating EUV reflectivity measurements Summary

18 Lateral multilayer gradient EUV-collector mirrors for high-power LPP sources 1,06 1,05 Multilayer gradient, ideal and experimental data. error bar: Δd/d = 0.74 % corresponding to (13.5 ± 0.1) nm Normalized multilayer period 1,04 1,03 1,02 1,01 1,00 0,99 0,98 ideal experiment Distance from substrate center, mm

19 Reflectance of high-temperature collector 50% 45% 40% Maximum reflectance of hightemperature collector mirror. Measurements: PTB Berlin maximum reflectance 35% 30% 25% 20% 15% 10% 5% 0% R max, 0 R max, 90 R max, 180 R max, 270 clear apert ure collector mirror radius, mm

20 Reflectance of high-temperature collector 45% 40% r = 40mm r = 50mm 35% r = 60mm 30% r = 70mm r = 80mm Measurement of reflectance along a line within clear reflectance 25% 20% 15% 10% r = 90mm r = 100mm r = 110mm r = 120mm r = 130mm aperture of collector mirror. 5% Measurements: PTB Berlin 0% wavelength, nm

21 Reflectance of high-temperature collector Reflectance curve of Si test sample Reflectance curve of SiC collector

22 Content Motivation / Introduction High-temperature multilayer development Technical setup: Collector mirror coating EUV reflectivity measurements Summary

23 Optical properties of high-temperature collector Peak reflectance of collector mirror: R max = 41 %, Peak reflectance of silicon test sample: R max = 54 %, Center wavelength of collector mirror: λ = (13.5 ± 0.1) nm, FWHM > 0.45 nm.

24 Optical properties of high-temperature collector Proof of high-temperature collector mirror concept, First high-temperature multilayer coating of LPP source collector mirror realized, Mirror diameter: 320 mm - largest multilayer collector mirror coated to date, Thermal stability of high-temperature Mo/X/Si/X multilayer up to 600 C, First EUV light collected at Cymer s test stand.

25 Optical properties of high-temperature collector IOF project team Wieland Stöckl, Michael Scheler, Marcel Flemming, Hein Uhlig, Tino Benkenstein, Ronald Schmidt EUV measurements Frank Scholze, Christian Laubis, Christian Buchholz, Heike Wagner, Sven Plöger (PTB Berlin) TEM measurements Ute Kaiser (University Ulm)

26 Thank you for your EUV-collector attention! mirrors for high-power LPP sources