UV Source Series. UVS 10/35 gas discharge, UVS 300 duoplasmatron. Key Features

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1 UV Source Series UVS 10/35 gas discharge, UVS 300 duoplasmatron and UVLS microwave source for UPS and arpes Key Features Ultimate intensity and stability UV sources Ease of operation Variable excitation lines Focussing capillary (optional) Polarizer (optional) TMM 304 UV monochromator (optional)

2 Innovation in surface Spectroscopy and microscopy systems SPECS leads the way in developing cutting-edge components and systems for groundbreaking new surface analysis tools. SPECS Surface Nano Analysis GmbH Packaging of a SPECS component after final testing SPECS Surface Nano Analysis GmbH headquarters is situated in the center of Germany s capital Berlin with subsidiaries in Switzerland, USA and China. SPECS has attracted a talented team of scientists and engineers who have dedicated their knowledge and experience to the development, design, and production of instruments for surface science, materials research, and nanotechnology for almost 30 years. SPECS engineer during system assembly In order to continuously improve performance and to make available latest developments, we are in contact with numerous scientists, users and customers from all over the world. Reliable quality control (ISO 9001 certified) and excellent fast service, both remote and onsite, ensures maximum uptime and long-term operation and reliability of SPECS instruments over many years. UV Source Series

3 UV Source Series Ultimate Performance and Reliability Ultraviolet and angle resolved photoelectron spectroscopy (UPS and ARPES) Ultraviolet and Angle Resolved Photoelectron Spectroscopy (UPS, ARPES) Photoelectron spectroscopy (PES) is one of the most powerful and most frequently used spectroscopic techniques in solid state physics, physical chemistry and materials science. Using the photoelectric effect, PES provides a material sensitive and non-destructive probe for modern scientists to examine the chemical composition (XPS or ESCA) and the electronic structure (UPS and ARPES) of matter. By illuminating a sample with light of a certain photon energy (hν), electrons are released from a solid, using the photon energy to overcome their binding energy (E b ) and work function (Φ). The remaining energy provided by the photons is transferred into the kinetic energy (E kin ) of the photoelectrons. Such a transition can only occur from occupied electronic states of an energy E i into unoccupied states of energy E f, when the energy is conserved. On the other hand, also the wave vector (or momentum) k (k x, k y, k z ) has to be conserved. The surface breaks the geometry, not affecting the energy conservations rule, but affecting the momentum conservation such, that the parallel wave component k ӀӀ is conserved after crossing the surface, but the component along the surface normal (k ) is not conserved. Finally the electrons can be analyzed in an electron analyzer with respect to their E kin (or recalculated to E b ) and to Θ (or recalculated to the parallel wave vector component (k ӀӀ ). On this basis, a 2D distribution of the electrons (number of electrons for given E b and k ӀӀ is measured, directly reflecting the electronic (or band) structure of the material. Such experiments in laboratory environments require intense, small spot UV light sources of high stability for optimum performance. The intensity of the light source is the key point for fast and efficient measurements, while small spot sizes ensure measurements with highest angle (or momentum) resolution. SPECS offers a series of UV sources fitted to various demands, starting from flexible and robust UV sources for economic application to highly sophisticated UV sources for different gases and photon energies with monochromators for highest performance and energy resolution. Angle resolved photoelectron spectroscopy

4 UVS 10/35 UV Discharge Lamp For ultraviolet photoelectron spectroscopy on solids (UPS), the high performance ultraviolet source UVS 10/35 is ideally suited. The design of the discharge chamber results in high intensity and it also facilitates easy ignition and extremely stable operation of the discharge. The UVS 10/35 can be mounted on any DN 35 CF flange on an analysis chamber as flange-to-sample distances are not critical. Efficient differential pumping ensures a long operating life. The He I / He II ratio can be controlled by adjusting the pressure of the gas in the discharge chamber. Power Supply The PS-UVS20-A supplies all voltages and currents needed for the SPECS UVS 10/35 source operation. It consists of a switch mode power unit, an ignition unit and a fan control unit. The power supply operates in constant voltage or constant current mode. Before ignition the power supply operates in voltage mode. The source is ignited by simply pressing a push button on the front panel. The power supply also ensures fail safe operation of the UV- source. An interlock circuit turns off the high voltage applied to the source to prevent UV-source damage. UVS20-A power supply Typically the source is operated using He gas in He I and He II mode. Other gases (Ne, Ar, Kr, Xe) can also be used for operation. UVS 10/35 UV light source Polarizer An optional polarizer is available, as well as a gas inlet and a differential pumping system. For measurements with linearly polarized VUV light Triple mirror construction Polarization degree > 90% in-situ rotatable linear polarization / switchable to nonpolarized light UV Source Series

5 5 Results Graphene adsorbed on Ir(111) shows an interesting electronic structure. Due to a mismatch between the graphene layer and the substrates unit cell dimension, a super-lattice is formed. This super-lattice induces the formation of backfolded replica bands. When these replica bands cross the original graphene band, mini gaps are formed (see black arrows). Technical Data Specification Value Photon Flux 8x10 15 photons/s*sr Photon Current na Beam Divergence < ±1 Spot Size/Working Distance 120 mm Mounting Flange DN35CF Binding Energy OeVD E F Graphene/IrO111D K-Point He II Emission UVS 10/35 PHOIBOS 150 2D-CCD Detector Insertion Depth Bakeable Dimensions mm up to 250 C 10 Emission Angle O D E F Polar Angle O D Binding Energy OeVD Band map of graphene/ir(111) K point, acquired with He II excitation. Features Cold discharge High photon flux / discharge current ratio Excellent and adjustable He I / He II ratio Differential pumping Easy operation / ignition Stable output Constant voltage / current mode High thermal and electrical stability 3 ½ digital panel, two display modes (V or ma) leds for Voltage / Current / Fan Fail and HV Fail 19 (W) x 132 mm (H), 12 kg 100/115/200/230 V, 200VA, Hz UVS 10/35

6 UVS 300 UVS 300 power supply Duoplasmatron UV Source The UVS 300 generates a high density plasma by guiding the electrons extracted from a hot cathode filament along the lines of a strongly inhomogeneous magnetic field towards a small discharge region (duo-plasmatron principle). The strong vacuum ultraviolet radiation is extracted from the cathode side by the combination of a metal and quartz capillary. Easy use is assured by one stage differential pumping and an integrated microvalve for a filament exchange without affecting the vacuum. Power Supply The UVS 300-A is a power supply designed for the UVS 300. It features a high thermal an electrical stability, interlock sensors for water flow and temperature and constant voltage and current mode. Indicators on the power supply assist chosing optimal operation conditions for different modes. UVS 300 UV source with quartz capillary The UVS 300 allows for optimal He I and He II operation (atomic and ionic emission lines), with best performance and highest available output on He II operation. The UV source is compatible with the SPECS TMM 304 monochromator. SPECS offers two capillaries: a standard quartz capillary and an ETC focusing capillary (ellipsoidal transfer capillary) for small spot UPS with high photon currents. Polarizer An optional polarizer is available, as well as a gas inlet and a differential pumping system. The polarizer is not compatible with the ETC. For measurements with linearly polarized VUV light Triple mirror construction Polarization degree > 90% In-situ rotatable linear polarization / switchable to nonpolarized light UV Source Series

7 7 Results Graphene is a two dimensional lattice of carbon atoms. Adsorbed on SiC, the K point is slightly shifted to higher binding energy. A band gap due to symmetry breaking is clearly visible. One side of the trifold structure is open, as along the Brillouin zone boundary, the two branches of the graphene π-band are interfering and the intensity of the photoemission signal is zero in this direction. Technical Data Specification Value Gases H, Hel/II Photon Flux > 2x10 16 photons/s*sr Photon Current > 500 na with ETC Spot Size > 500 µm (with ETC) Mounting Flange DN35CF Operating Pressure in AC <5x10-8 mbar possible Bakeable up to 100 C (internal bakeout) Binding Energy (ev) E F K M K' Γ Monochromator Version Dimensions Yes 10 5 Polar Angle ( ) 0-5 ` E F Deflector Angle ( ) Binding Energy (ev) Scan Direction Graphene/SiC: K point measured with PHOIBOS 150 SAL and UVS 300 attached to a TMM 304 (He I) n n Features Duoplasmatron discharge Adjustable He I/He Il ratio Excellent absolute He II intensity Single stage differential pumping Optional ETC for small spot size and high photon densities High thermal and electrical stability Constant voltage / current mode Interlocks: flow sensor, cathode temperature UVS 300

8 UVLS Microwave Source The UVLS UV source uses microwaves to generate UV light in a small cavity, establishing a stable and high intensity light output without any filament. The UVLS is hence a stable and maintenance free light source for UPS and ARPES operation. Power Supply The UVS 600 Power Supply is design for high stability and ease of operation. It allows for easy ignition and stable operation over long time. UVS 600 power supply The design of the UVLS is optimized on the usage of various gases, including He, Ne Ar, Kr. Heavier gases are usable. Hence it provides best results combined with a TMM 304 monochromator with different gratings. The source is differentially pumped by an optional available package and can be equipped with quartz and the focusing Ellipsoidal Transfer Capillary (ETC). Polarizer An optional polarizer is available, as well as a gas inlet and a differential pumping system. The polarizer is not compatible with the ETC. UVLS UV source with ETC capillary UV Source Series

9 9 Results Clean surfaces of many materials exhibit a special electronic state when sharply terminated, e.g. to UHV. The so called surface state originates from electrons on the surface of solids, which are located in a potential different from the bulk electronic structure. Especially for 3d transition metals, e.g. on Au(111), such electronic states exhibit a splitting in momentum originating from spin orbit interaction, the so called Rashba effect. As an example, for Au(111), the surface state has been measured using a PHOIBOS 150 and a monochromated UVLS in He I mode, a common test of the performance of ARPES systems. Technical Data Specification Value Gases He, Ne, Ar, Xe Photon Flux > 1.3x10 16 photons/s*sr Spot Size > 500 µm (with ETC) Mounting Flange DN35CF Operating Pressure in AC <5x10-8 mbar possible Bakeable up to 120 C Monochromator Version Yes Dimensions E F Binding Energy (ev) k Au(111) surface state measured with a UVLS and TMM 304 at T=23 K Features Microwave induced plasma discharge High photon flux > photons/sr s Various gases for operation Single stage differential pumping optional ETC for small spot size and high photon densities High stability Easy operation and ignition Interlock connection UVLS

10 TMM 304 Monochromator TMM 304 monochromator with ETC capillary The TMM304 is toroidal mirror monochromator for laboratory UV sources, compatible with the SPECS UVS 300 and UVLS sources. It is equipped with two grating (choose from He I, He II, Xe and polarizier). The grating can be switched without breaking the vacuum. The light is guided to the sample by a focusing ETC capillary with small spot size and high photon densities. The frame is optionally available with a rotary stage to change the polarization in-situ, without breaking the vacuum. An advanced differential pumping system allows for full UHV compatibility during operation. Cassettes Gratings are available for HeI and HeII, as well as for Xe (with 1200 and 2400 lines/mm). The degree of polarization is >80 %. An optional polarizing cassette is available. TMM 304 cassette Frame The frame of the TMM 304 can be built rotatable, to switch between s and p linear polarized light, without breaking the vacuum. TMM 304 monochromator UV Source Series

11 11 Results Topological insulators are insulating materials with surface states crossing the gap between the (bulk) valence and conduction band. On the example of Bi 2 Te 3, these electronic states have different spin states, avoiding the opening of a band gap at the touching point of these two bands. The result is a dirac cone like structure. Technical Data Specification Value Photon Flux > 1x10 16 photons/s*sr Spot Size > 500 µm (with ETC) Mounting Flange DN35CF Operating Pressure in AC <1x10-10 mbar possible Bakeable up to 120 C Rotatable Frame Available Yes E F Dimensions Binding Energy (ev) Γ point of Bi 2 Te 3, Atopological insulator. Raw data from PHOIBOS 225 2D-CCD with UVLS and TMM 304 at T=70K. Features Two gratings installed High photon flux Gratings for HeI, HeII, Xe and polarizer Advanced differential pumping ETC for small spot size and high photon densities TMM 304 Monochromator

12 SPECS Surface Nano Analysis GmbH Voltastrasse Berlin / Germany T F E info@specs.com Version 01.03