NRAM: High Performance, Highly Reliable Emerging Memory

Size: px
Start display at page:

Download "NRAM: High Performance, Highly Reliable Emerging Memory"

Transcription

1 NRAM: High Performance, Highly Reliable Emerging Memory Sheyang Ning,2, Tomoko Ogura Iwasaki, Darlene Viviani 2, Henry Huang 2, Monte Manning 2, Thomas Rueckes 2, Ken Takeuchi Chuo University 2 Nantero Inc. Santa Clara, CA

2 Outline l Introduction of NRAM l Single NRAM cell and cell array measurement setup l NRAM characteristics l DC-IV curve l Set and reset program characteristics l Large on/off ratio l High temperature program l High endurance l Conclusion Santa Clara, CA 2

3 Introduction of NRAM Performance DRAM NRAM Nano-RAM, Carbon nanotube based resistive memory NAND flash Santa Clara, CA 3

4 Compare with Conventional Memories = good Performance Scalability Endurance Non-volatile = bad DRAM NAND flash NRAM 20 ns pulse [] Single cell 5 nm [2] Single cell 0 2 [3] 000 years@ 85ºC [2] []. S. Ning et al., IEEE Symp. on VLSI Technology, Jun. 204, pp [2]. Nantero Presentation for ITRS ERD/ERM, International Technology Roadmap for Santa Clara, CA Semiconductors (ITRS), 203. [3]. S. Ning et al., IEEE Trans. on Electron Devices (TED), vol. 62, no. 9, pp , Sept

5 Compare with Emerging Memories Material Resistive switching on read ReRAM [] PRAM [2] NRAM [3] Al x O y Ge 2 Sb 2 Te 5 Filament size Phase change Carbon nanotube (CNT) Tunneling current between CNTs Endurance Current High High Low []. S. Ning et al., Solid-State Electronics, vol. 03, pp , Jan., 205. [2]. H. Y. Cheng et al., IEEE Int. Electron Devices Meeting, 203, pp [3]. S. Ning et al., Symp. on VLSI Tech., 204, pp [4]. S. Ning et al., Ext. Abstr. Solid State Devices and Materials (SSDM), Oct. 205, pp Santa Clara, CA 5

6 Physical Mechanism R cell 800 kω Small distance R cell GΩ Large distance []. S. Ning et al., in VLSI Symp. Tech. Dig., Jun. 204, pp Santa Clara, CA [2]. Nantero presentation, Int. Tech. Roadmap for Semiconductors (ITRS),

7 Physical Mechanism Set: attraction force Reset: repulsive force Electrical induction + Heat caused phonon vibration []. S. Ning et al., IEEE Trans. on Electron Devices (TED), vol. 62, no. 9, pp , Sept Santa Clara, CA 7

8 Outline l Introduction of NRAM l Single NRAM cell and cell array measurement setup l NRAM characteristics l DC-IV curve l Set and reset program characteristics l Large on/off ratio l High temperature program l High endurance l Conclusion Santa Clara, CA 8

9 Single NRAM Cell and Cell Array Test 40 nm NRAM single cell 6 nm, 4 Mbits NRAM cell array V d NRAM cell WL BL 0 SL 0 BL N SL N V g NRAM cell BL SL Oscilloscope NRAM testchip Set voltage Reset voltage +V Set 0 V 0 V +V Reset []. S. Ning et al., IEEE Trans. on Electron Devices (TED), vol. 62, no. 9, pp , Sept Santa Clara, CA [2]. G. Rosendale et al., Proceedings of the European Solid-State Circuits Research Conference (ESSCIRC), Sept. 200, pp

10 Outline l Introduction of NRAM l Single NRAM cell and cell array measurement setup l NRAM characteristics l DC-IV curve l Set and reset program characteristics l Large on/off ratio l High temperature program l High endurance l Conclusion Santa Clara, CA 0

11 I d (µa) DC-IV Curve Single cell bi-polar program Set Reset Butterfly curve V d (V) V d (V) []. S. Ning et al., IEEE Symp. on VLSI Technology, Jun. 204, pp Santa Clara, CA I d (µa) Current vibration due to long term voltage stress on CNTs Same cell, reset curve Trigger voltage

12 Low Program Current Single cell DC I compliance = 5 µa, 30 µa, and 00 µa Current (A) µa 30 µa 5 µa Set Voltage Reset Single cell AC I peak < 20 µa Reset Current (µa) Time (ns) 0.72pJ Time (ns) []. S. Ning et al., IEEE Trans. on Electron Devices (TED), vol. 62, no. 9, pp , Sept Santa Clara, CA [2]. S. Ning et al., IEEE Symp. on VLSI Technology, Jun. 204, pp Set Current (µa) pJ Voltage (V) Voltage (V)

13 Reset Characteristic l Cell array measurement, Reset is driven by both voltage and current BL = 0 V SL=V program WL= V gate Reset BER (a.u.) WL=0.4 a.u., SL from 0 to a.u Santa Clara, CA []. S. Ning et al., Ext. Abstr. Solid State Devices and Materials (SSDM), Oct. 205, pp

14 Program voltages (a.u.) Program voltages (a.u.) Set and Reset Voltages l Use incremental pulse programing on single cell Reset voltage Set voltage (absolute value) Write cycles Write cycles Cumulative program success l Three randomly chosen NRAM cells 00% 80% 60% 40% 20% 0% Reset []. S. Ning et al., IEEE Trans. on Electron Devices (TED), vol. 62, no. 9, pp , Sept Santa Clara, CA 4 cell cell 2 cell 3 Reset voltage (V) Cumulative program success 00% 80% 60% 40% 20% 0% Set cell cell 2 cell 3 Set voltage (V)

15 l Single cell measurement Large On/Off Ratio > 00 times on/off ratio Possible for multi-level cell (MLC) Resistance (Ω) Read at V Resistance Ω 0 5 Ω Read cycles []. S. Ning et al., IEEE Symp. on VLSI Technology, Jun. 204, pp Santa Clara, CA 5

16 High Temperature Program l Single cell measurement, stable program voltage at different temperatures Reset failure rate (a.u., log scale) Reset Reset voltage (a. u.) Set voltage (a.u.) Santa Clara, CA []. S. Ning et al., IEEE Trans. on Electron Devices (TED), vol. 62, no. 9, pp , Sept Set failure rate (a.u., log scale) Set

17 Resistance (Ω) High Endurance Single cell Cell array Reset BER 0 7 HRS.25MΩ 4 Set BER LRS 200kΩ Write cycles Program BER (a.u.) Write cycles []. S. Ning et al., IEEE Trans. on Electron Devices (TED), vol. 62, no. 9, pp , Sept Santa Clara, CA [2]. S. Ning et al., Ext. Abstr. Solid State Devices and Materials (SSDM), Oct. 205, pp

18 High Endurance l Cell array does not wear-out after 0 8 write cycles Set BER (a.u.) Set BER after 0 3 write cycles Set BER after 0 8 write cycles Set voltage Verify-set pulses Set BL voltage (a.u.) Reset BER after 0 3 write cycles Reset BER after 0 8 write cycles Reset voltage Verify-reset pulses []. S. Ning et al., Japanese Journal of Applied Physics (JJAP), vol. 55, no. 4S, 206. Santa Clara, CA [2]. S. Ning et al., Ext. Abstr. Solid State Devices and Materials (SSDM), Oct. 205, pp Reset BER (a.u.) Reset SL voltage (a.u.)

19 Outline l Introduction of NRAM l Single NRAM cell and cell array measurement setup l NRAM characteristics l DC-IV curve l Set and reset program characteristics l Large on/off ratio l High temperature program l High endurance l Conclusion Santa Clara, CA 9

20 Conclusion l NRAM is an emerging nonvolatile memory cell which has performance between DRAM and NAND flash. l Compared with other emerging nonvolatile memories, NRAM has competitive characteristics, including, lower program current, large on/off ratio, large endurance, high temperature stability and long retention time. Santa Clara, CA 20

Mechanism of Switching and Related Challenges in Transition Metal Oxide Based RRAM Devices

Mechanism of Switching and Related Challenges in Transition Metal Oxide Based RRAM Devices Mechanism of Switching and Related Challenges in Transition Metal Oxide Based RRAM Devices Rashmi Jha and Branden Long Dept. of Electrical Engineering and Computer Science University of Toledo Toledo,

More information

MTJ-Based Nonvolatile Logic-in-Memory Architecture and Its Application

MTJ-Based Nonvolatile Logic-in-Memory Architecture and Its Application 2011 11th Non-Volatile Memory Technology Symposium @ Shanghai, China, Nov. 9, 20112 MTJ-Based Nonvolatile Logic-in-Memory Architecture and Its Application Takahiro Hanyu 1,3, S. Matsunaga 1, D. Suzuki

More information

Influence of electrode materials on CeO x based resistive switching

Influence of electrode materials on CeO x based resistive switching Influence of electrode materials on CeO x based resistive switching S. Kano a, C. Dou a, M. Hadi a, K. Kakushima b, P. Ahmet a, A. Nishiyama b, N. Sugii b, K. Tsutsui b, Y. Kataoka b, K. Natori a, E. Miranda

More information

Size-dependent Metal-insulator Transition Random Materials Crystalline & Amorphous Purely Electronic Switching

Size-dependent Metal-insulator Transition Random Materials Crystalline & Amorphous Purely Electronic Switching Nanometallic RRAM I-Wei Chen Department of Materials Science and Engineering University of Pennsylvania Philadelphia, PA 19104 Nature Nano, 6, 237 (2011) Adv Mater,, 23, 3847 (2011) Adv Func Mater,, 22,

More information

Electrical and Reliability Characteristics of RRAM for Cross-point Memory Applications. Hyunsang Hwang

Electrical and Reliability Characteristics of RRAM for Cross-point Memory Applications. Hyunsang Hwang Electrical and Reliability Characteristics of RRAM for Cross-point Memory Applications Hyunsang Hwang Dept. of Materials Science and Engineering Gwangju Institute of Science and Technology (GIST), KOREA

More information

Page 1. A portion of this study was supported by NEDO.

Page 1. A portion of this study was supported by NEDO. MRAM : Materials and Devices Current-induced Domain Wall Motion High-speed MRAM N. Ishiwata NEC Corporation Page 1 A portion of this study was supported by NEDO. Outline Introduction Positioning and direction

More information

N ano scale l S il ii lco i n B ased N o nvo lat l i atl ie l M em ory r Chungwoo Kim, Ph.D.

N ano scale l S il ii lco i n B ased N o nvo lat l i atl ie l M em ory r Chungwoo Kim, Ph.D. cw_kim@samsung.com Acknowledgements Collaboration Funding Outline Introduction Current research status Nano fabrication Process Nanoscale patterning SiN thin film Si Nanoparticle Nano devices Nanoscale

More information

A Perpendicular Spin Torque Switching based MRAM for the 28 nm Technology Node

A Perpendicular Spin Torque Switching based MRAM for the 28 nm Technology Node A Perpendicular Spin Torque Switching based MRAM for the 28 nm Technology Node U.K. Klostermann 1, M. Angerbauer 1, U. Grüning 1, F. Kreupl 1, M. Rührig 2, F. Dahmani 3, M. Kund 1, G. Müller 1 1 Qimonda

More information

Non Volatile Memories Compact Models for Variability Evaluation

Non Volatile Memories Compact Models for Variability Evaluation Non Volatile Memories Compact Models for Variability Evaluation Andrea Marmiroli MOS-AK/GSA Workshop April 2010 Sapienza Università di Roma Outline Reasons to address variability aspects Physics based

More information

HN58C256 Series word 8-bit Electrically Erasable and Programmable CMOS ROM

HN58C256 Series word 8-bit Electrically Erasable and Programmable CMOS ROM 32768-word 8-bit Electrically Erasable and Programmable CMOS ROM ADE-203-092G (Z) Rev. 7.0 Nov. 29, 1994 Description The Hitachi HN58C256 is a electrically erasable and programmable ROM organized as 32768-word

More information

3/10/2013. Lecture #1. How small is Nano? (A movie) What is Nanotechnology? What is Nanoelectronics? What are Emerging Devices?

3/10/2013. Lecture #1. How small is Nano? (A movie) What is Nanotechnology? What is Nanoelectronics? What are Emerging Devices? EECS 498/598: Nanocircuits and Nanoarchitectures Lecture 1: Introduction to Nanotelectronic Devices (Sept. 5) Lectures 2: ITRS Nanoelectronics Road Map (Sept 7) Lecture 3: Nanodevices; Guest Lecture by

More information

Noise and Interference Characterization for MLC Flash Memories

Noise and Interference Characterization for MLC Flash Memories International Conference on Computing, Networking and Communications Invited Position Paper Track Noise and Interference Characterization for MLC Flash Memories Jaekyun Moon, Jaehyeong No Department of

More information

Multiple Gate CMOS and Beyond

Multiple Gate CMOS and Beyond Multiple CMOS and Beyond Dept. of EECS, KAIST Yang-Kyu Choi Outline 1. Ultimate Scaling of MOSFETs - 3nm Nanowire FET - 8nm Non-Volatile Memory Device 2. Multiple Functions of MOSFETs 3. Summary 2 CMOS

More information

HN58C66 Series word 8-bit CMOS Electrically Erasable and Programmable CMOS ROM. ADE F (Z) Rev. 6.0 Apr. 12, Description.

HN58C66 Series word 8-bit CMOS Electrically Erasable and Programmable CMOS ROM. ADE F (Z) Rev. 6.0 Apr. 12, Description. 8192-word 8-bit CMOS Electrically Erasable and Programmable CMOS ROM ADE-203-375F (Z) Rev. 6.0 Apr. 12, 1995 Description The Hitachi HN58C66 is a electrically erasable and programmable ROM organized as

More information

SPICE Modeling of STT-RAM for Resilient Design. Zihan Xu, Ketul Sutaria, Chengen Yang, Chaitali Chakrabarti, Yu (Kevin) Cao School of ECEE, ASU

SPICE Modeling of STT-RAM for Resilient Design. Zihan Xu, Ketul Sutaria, Chengen Yang, Chaitali Chakrabarti, Yu (Kevin) Cao School of ECEE, ASU SPICE odeling of STT-RA for Resilient Design Zihan Xu, Ketul Sutaria, Chengen Yang, Chaitali Chakrabarti, Yu (Kevin) Cao School of ECEE, ASU OUTLINE - 2 - Heterogeneous emory Design A Promising Candidate:

More information

An Autonomous Nonvolatile Memory Latch

An Autonomous Nonvolatile Memory Latch Radiant Technologies, Inc. 2835D Pan American Freeway NE Albuquerque, NM 87107 Tel: 505-842-8007 Fax: 505-842-0366 e-mail: radiant@ferrodevices.com www.ferrodevices.com An Autonomous Nonvolatile Memory

More information

A Technology-Agnostic MTJ SPICE Model with User-Defined Dimensions for STT-MRAM Scalability Studies

A Technology-Agnostic MTJ SPICE Model with User-Defined Dimensions for STT-MRAM Scalability Studies A Technology-Agnostic MTJ SPICE Model with User-Defined Dimensions for STT-MRAM Scalability Studies Model download website: mtj.umn.edu Jongyeon Kim 1, An Chen 2, Behtash Behin-Aein 2, Saurabh Kumar 1,

More information

HN58C65 Series word 8-bit Electrically Erasable and Programmable CMOS ROM

HN58C65 Series word 8-bit Electrically Erasable and Programmable CMOS ROM 8192-word 8-bit Electrically Erasable and Programmable CMOS ROM ADE-203-374A (Z) Rev. 1.0 Apr. 12, 1995 Description The Hitachi HN58C65 is a electrically erasable and programmable ROM organized as 8192-word

More information

Advanced Topics In Solid State Devices EE290B. Will a New Milli-Volt Switch Replace the Transistor for Digital Applications?

Advanced Topics In Solid State Devices EE290B. Will a New Milli-Volt Switch Replace the Transistor for Digital Applications? Advanced Topics In Solid State Devices EE290B Will a New Milli-Volt Switch Replace the Transistor for Digital Applications? August 28, 2007 Prof. Eli Yablonovitch Electrical Engineering & Computer Sciences

More information

UNISONIC TECHNOLOGIES CO., LTD L16B45 Preliminary CMOS IC

UNISONIC TECHNOLOGIES CO., LTD L16B45 Preliminary CMOS IC UNISONIC TECHNOLOGIES CO., LTD L16B45 Preliminary CMOS IC 16-BIT CONSTANT CURRENT LED SINK DRIVER DESCRIPTION The UTC L16B45 is designed for LED displays. UTC L16B45 contains a serial buffer and data latches

More information

Device and Circuit Interaction Analysis of Stochastic Behaviors in Cross-Point RRAM Arrays

Device and Circuit Interaction Analysis of Stochastic Behaviors in Cross-Point RRAM Arrays Device and Circuit Interaction Analysis of Stochastic Behaviors in Cross-Point RRAM Arrays Haitong Li, Student Member, IEEE, Peng Huang, Bin Gao, Member, IEEE, Xiaoyan Liu, Member, IEEE, Jinfeng Kang,

More information

Single Event Effects: SRAM

Single Event Effects: SRAM Scuola Nazionale di Legnaro 29/3/2007 Single Event Effects: SRAM Alessandro Paccagnella Dipartimento di Ingegneria dell Informazione Università di Padova alessandro.paccagnella@unipd.it OUTLINE Introduction

More information

1 Ionic Memory Technology

1 Ionic Memory Technology j1 1 Ionic Memory Technology An Chen Ionic memory devices based on ion migration and electrochemical reactions have shown promising characteristics for next-generation memory technology. Both cations (e.g.,

More information

Advanced Flash and Nano-Floating Gate Memories

Advanced Flash and Nano-Floating Gate Memories Advanced Flash and Nano-Floating Gate Memories Mater. Res. Soc. Symp. Proc. Vol. 1337 2011 Materials Research Society DOI: 10.1557/opl.2011.1028 Scaling Challenges for NAND and Replacement Memory Technology

More information

Supplementary Materials for

Supplementary Materials for Supplementary Materials for Extremely Low Operating Current Resistive Memory Based on Exfoliated 2D Perovskite Single Crystals for Neuromorphic Computing He Tian,, Lianfeng Zhao,, Xuefeng Wang, Yao-Wen

More information

Cation-based resistive memory

Cation-based resistive memory Cation-based resistive memory Emerging Non-Volatile Memory Technologies Symposium San Francisco Bay Area Nanotechnology Council April 6, 2012 Michael N. Kozicki Professor of Electrical Engineering School

More information

NV Electronically Programmable Capacitor

NV Electronically Programmable Capacitor Small Packages MSOP Flipchip NV Electronically Programmable Capacitor FEATURES Non-volatile EEPROM storage of programmed trim codes Power On Recall of capacitance setting High-Performance Electronically

More information

Emerging Memory Technologies

Emerging Memory Technologies Emerging Memory Technologies Minal Dubewar 1, Nibha Desai 2, Subha Subramaniam 3 1 Shah and Anchor kutchhi college of engineering, 2 Shah and Anchor kutchhi college of engineering, 3 Shah and Anchor kutchhi

More information

Demonstration of Logic Operations in High-Performance RRAM Crossbar Array Fabricated by Atomic Layer Deposition Technique

Demonstration of Logic Operations in High-Performance RRAM Crossbar Array Fabricated by Atomic Layer Deposition Technique Han et al. Nanoscale Research Letters (2017) 12:37 DOI 10.1186/s11671-016-1807-9 NANO EXPRESS Demonstration of Logic Operations in High-Performance RRAM Crossbar Array Fabricated by Atomic Layer Deposition

More information

Lecture 6 NEW TYPES OF MEMORY

Lecture 6 NEW TYPES OF MEMORY Lecture 6 NEW TYPES OF MEMORY Memory Logic needs memory to function (efficiently) Current memories Volatile memory SRAM DRAM Non-volatile memory (Flash) Emerging memories Phase-change memory STT-MRAM (Ferroelectric

More information

ESE 570: Digital Integrated Circuits and VLSI Fundamentals

ESE 570: Digital Integrated Circuits and VLSI Fundamentals ESE 570: Digital Integrated Circuits and VLSI Fundamentals Lec 19: March 29, 2018 Memory Overview, Memory Core Cells Today! Charge Leakage/Charge Sharing " Domino Logic Design Considerations! Logic Comparisons!

More information

Developing IoT-Based Factory Automation Using F-RAM

Developing IoT-Based Factory Automation Using F-RAM Developing IoT-Based Factory Automation Using F-RAM Douglas Mitchell Flash Memory Summit 2018 Santa Clara, CA 1 INDUSTRIAL SYSTEMS TODAY Industry 4.0 The smart factory, Cyber-physical systems monitor factory

More information

Emerging Memories: Are They

Emerging Memories: Are They Emerging Memories: Are They Stanford University Energy Efficient Enough? H. -S. Philip Wong Stanford University 2007.11.08 Center for Integrated Systems Memory Key Enabler for New Applications 256GB 8GB

More information

MRAM: Device Basics and Emerging Technologies

MRAM: Device Basics and Emerging Technologies MRAM: Device Basics and Emerging Technologies Matthew R. Pufall National Institute of Standards and Technology 325 Broadway, Boulder CO 80305-3337 Phone: +1-303-497-5206 FAX: +1-303-497-7364 E-mail: pufall@boulder.nist.gov

More information

Preliminary Datasheet

Preliminary Datasheet Macroblock Preliminary Datasheet Features 3 output channels for RGB D lamps Output current invariant to load voltage change Programmable output current for each channel Built-in brightness control Constant

More information

Memory and computing beyond CMOS

Memory and computing beyond CMOS Memory and computing beyond CMOS Dipartimento di Elettronica, Informazione e Bioingegneria Politecnico di Milano daniele.ielmini@polimi.it Outline 2 Introduction What is CMOS? What comes after CMOS? Example:

More information

Floating Gate Devices: Operation and Compact Modeling

Floating Gate Devices: Operation and Compact Modeling Floating Gate Devices: Operation and Compact Modeling Paolo Pavan (1), Luca Larcher (1) and Andrea MarmirolI (2) (1) Università di Modena e Reggio Emilia, Via Fogliani, 1 42100 Reggio Emilia (Italy) -

More information

A 68 Parallel Row Access Neuromorphic Core with 22K Multi-Level Synapses Based on Logic- Compatible Embedded Flash Memory Technology

A 68 Parallel Row Access Neuromorphic Core with 22K Multi-Level Synapses Based on Logic- Compatible Embedded Flash Memory Technology A 68 Parallel Row Access Neuromorphic Core with 22K Multi-Level Synapses Based on Logic- Compatible Embedded Flash Memory Technology M. Kim 1, J. Kim 1, G. Park 1, L. Everson 1, H. Kim 1, S. Song 1,2,

More information

GB2X100MPS V SiC MPS Diode

GB2X100MPS V SiC MPS Diode Silicon Carbide Schottky Diode V RRM = 1200 V I F (Tc = 100 C) = 246 A* Q C = 796 nc* Features High Avalanche (UIS) Capability Enhanced Surge Current Capability Superior Figure of Merit Q C /I F Low Thermal

More information

Ω μ. PKG CODE M AX 5128E LA+ -40 C to +85 C 8 μdfn AAF L822-1 TEMP RANGE PIN - PA C K A G E TOP MARK PART. Maxim Integrated Products 1

Ω μ. PKG CODE M AX 5128E LA+ -40 C to +85 C 8 μdfn AAF L822-1 TEMP RANGE PIN - PA C K A G E TOP MARK PART. Maxim Integrated Products 1 19-3929; Rev 2; 6/7 μ Ω μ μ μ Ω μ PART TEMP RANGE PIN - PA C K A G E TOP MARK PKG M AX 5128E A+ -4 C to +85 C 8 μdfn AAF 822-1 H V CC GND POR 7 7-BIT NV MEMORY 128-POSITION DER 128 TAPS W UP DN SERIA INTERFACE

More information

W hen the number of stored electrons reaches statistical limits, continued scaling is more and more

W hen the number of stored electrons reaches statistical limits, continued scaling is more and more OPEN SUBJECT AREAS: ELECTRICAL AND ELECTRONIC ENGINEERING ELECTRONIC DEVICES Received 10 April 2014 Accepted 3 July 2014 Published 22 July 2014 Study of Multi-level Characteristics for 3D Vertical Resistive

More information

PALCE22V10 and PALCE22V10Z Families

PALCE22V10 and PALCE22V10Z Families PALCE22V10 PALCE22V10Z COM'L: H-5/7/10/15/25,Q-10/15/25 IND: H-10/15/20/25 COM'L: -25 IND: -15/25 PALCE22V10 and PALCE22V10Z Families 24-Pin EE CMOS (Zero Power) Versatile PAL Device DISTINCTIVE CHARACTERISTICS

More information

GB01SLT V SiC MPS Diode

GB01SLT V SiC MPS Diode Silicon Carbide Schottky Diode V RRM = 1200 V I F (Tc = 160 C) = 1 A Q C = 4 nc Features High Avalanche (UIS) Capability Enhanced Surge Current Capability Superior Figure of Merit Q C /I F Low Thermal

More information

Name: Answers. Mean: 83, Standard Deviation: 12 Q1 Q2 Q3 Q4 Q5 Q6 Total. ESE370 Fall 2015

Name: Answers. Mean: 83, Standard Deviation: 12 Q1 Q2 Q3 Q4 Q5 Q6 Total. ESE370 Fall 2015 University of Pennsylvania Department of Electrical and System Engineering Circuit-Level Modeling, Design, and Optimization for Digital Systems ESE370, Fall 2015 Final Tuesday, December 15 Problem weightings

More information

GMU, ECE 680 Physical VLSI Design 1

GMU, ECE 680 Physical VLSI Design 1 ECE680: Physical VLSI Design Chapter VIII Semiconductor Memory (chapter 12 in textbook) 1 Chapter Overview Memory Classification Memory Architectures The Memory Core Periphery Reliability Case Studies

More information

Magnetic tunnel junction beyond memory from logic to neuromorphic computing WANJUN PARK DEPT. OF ELECTRONIC ENGINEERING, HANYANG UNIVERSITY

Magnetic tunnel junction beyond memory from logic to neuromorphic computing WANJUN PARK DEPT. OF ELECTRONIC ENGINEERING, HANYANG UNIVERSITY Magnetic tunnel junction beyond memory from logic to neuromorphic computing WANJUN PARK DEPT. OF ELECTRONIC ENGINEERING, HANYANG UNIVERSITY Magnetic Tunnel Junctions (MTJs) Structure High density memory

More information

Gate Carrier Injection and NC-Non- Volatile Memories

Gate Carrier Injection and NC-Non- Volatile Memories Gate Carrier Injection and NC-Non- Volatile Memories Jean-Pierre Leburton Department of Electrical and Computer Engineering and Beckman Institute University of Illinois at Urbana-Champaign Urbana, IL 61801,

More information

Sensitive SCRs. ( Amps) Features. Electrically Isolated Packages. Glass Passivation

Sensitive SCRs. ( Amps) Features. Electrically Isolated Packages. Glass Passivation Selected Packages* U.L. RECOGNIZED File #E71639 TO - 92 THERMOTAB TO-2AB TO-2AB A K G Sensitive SCRs (.8 1 ) 5 General Description The Teccor Electronics, Inc. line of sensitive SCR semiconductors are

More information

GA08JT Normally OFF Silicon Carbide Super Junction Transistor. V DS = 1700 V I D = 8 A R DS(ON) = 250 mω

GA08JT Normally OFF Silicon Carbide Super Junction Transistor. V DS = 1700 V I D = 8 A R DS(ON) = 250 mω Normally OFF Silicon Carbide Super Junction Transistor Features 175 C maximum operating temperature Temperature independent switching performance Gate oxide free SiC switch Suitable for connecting an anti-parallel

More information

Perpendicular MTJ stack development for STT MRAM on Endura PVD platform

Perpendicular MTJ stack development for STT MRAM on Endura PVD platform Perpendicular MTJ stack development for STT MRAM on Endura PVD platform Mahendra Pakala, Silicon Systems Group, AMAT Dec 16 th, 2014 AVS 2014 *All data in presentation is internal Applied generated data

More information

All-Carbon Spin Logic Sensor for RRAM Arrays

All-Carbon Spin Logic Sensor for RRAM Arrays All-Carbon Spin Logic Sensor for RRAM Arrays Stephen K. Heinrich-Barna Connected Microcontrollers Texas Instruments, Inc Dallas, TX USA s-barna@ti.com Jean-Pierre Leburton Electrical and Computer Engineering

More information

Ultralow-Power Reconfigurable Computing with Complementary Nano-Electromechanical Carbon Nanotube Switches

Ultralow-Power Reconfigurable Computing with Complementary Nano-Electromechanical Carbon Nanotube Switches Ultralow-Power Reconfigurable Computing with Complementary Nano-Electromechanical Carbon Nanotube Switches Presenter: Tulika Mitra Swarup Bhunia, Massood Tabib-Azar, and Daniel Saab Electrical Eng. And

More information

! Charge Leakage/Charge Sharing. " Domino Logic Design Considerations. ! Logic Comparisons. ! Memory. " Classification. " ROM Memories.

! Charge Leakage/Charge Sharing.  Domino Logic Design Considerations. ! Logic Comparisons. ! Memory.  Classification.  ROM Memories. ESE 57: Digital Integrated Circuits and VLSI Fundamentals Lec 9: March 9, 8 Memory Overview, Memory Core Cells Today! Charge Leakage/ " Domino Logic Design Considerations! Logic Comparisons! Memory " Classification

More information

Resistive Memories Based on Amorphous Films

Resistive Memories Based on Amorphous Films Resistive Memories Based on Amorphous Films Wei Lu University of Michigan Electrical Engineering and Computer Science Crossbar Inc 1 Introduction Hysteretic resistive switches and crossbar structures Simple

More information

GC15MPS V SiC MPS Diode

GC15MPS V SiC MPS Diode Silicon Carbide Schottky Diode V RRM = 1200 V I F (Tc = 135 C) = 40 A Q C = 66 nc Features High Avalanche (UIS) Capability Enhanced Surge Current Capability Superior Figure of Merit Q C /I F Low Thermal

More information

TECHNOLOGY ROADMAP EMERGING RESEARCH DEVICES 2013 EDITION FOR

TECHNOLOGY ROADMAP EMERGING RESEARCH DEVICES 2013 EDITION FOR INTERNATIONAL TECHNOLOGY ROADMAP FOR SEMICONDUCTORS 01 EDITION EMERGING RESEARCH DEVICES THE ITRS IS DEVISED AND INTENDED FOR TECHNOLOGY ASSESSMENT ONLY AND IS WITHOUT REGARD TO ANY COMMERCIAL CONSIDERATIONS

More information

NTE74HC109 Integrated Circuit TTL High Speed CMOS, Dual J K Positive Edge Triggered Flip Flop w/set & Reset

NTE74HC109 Integrated Circuit TTL High Speed CMOS, Dual J K Positive Edge Triggered Flip Flop w/set & Reset NTE74HC109 Integrated Circuit TTL High Speed CMOS, Dual J K Positive Edge Triggered Flip Flop w/set & Reset Description: The NTE74HC109 is a dual J K flip flip with set and reset in a 16 Lead plastic DIP

More information

Access from the University of Nottingham repository:

Access from the University of Nottingham repository: ElHassan, Nemat Hassan Ahmed (2017) Development of phase change memory cell electrical circuit model for non-volatile multistate memory device. PhD thesis, University of Nottingham. Access from the University

More information

TOSHIBA Field Effect Transistor Silicon N Channel MOS Type SSM3K02F

TOSHIBA Field Effect Transistor Silicon N Channel MOS Type SSM3K02F TOSHIBA Field Effect Transistor Silicon N Channel MOS Type SSM3K02F High Speed Switching Applications Unit: mm Small package Low on resistance : R on = 200 mω (max) (V GS = 4 V) : R on = 250 mω (max) (V

More information

Magnetic core memory (1951) cm 2 ( bit)

Magnetic core memory (1951) cm 2 ( bit) Magnetic core memory (1951) 16 16 cm 2 (128 128 bit) Semiconductor Memory Classification Read-Write Memory Non-Volatile Read-Write Memory Read-Only Memory Random Access Non-Random Access EPROM E 2 PROM

More information

Topics. Dynamic CMOS Sequential Design Memory and Control. John A. Chandy Dept. of Electrical and Computer Engineering University of Connecticut

Topics. Dynamic CMOS Sequential Design Memory and Control. John A. Chandy Dept. of Electrical and Computer Engineering University of Connecticut Topics Dynamic CMOS Sequential Design Memory and Control Dynamic CMOS In static circuits at every point in time (except when switching) the output is connected to either GND or V DD via a low resistance

More information

GAP3SLT33-220FP 3300 V SiC MPS Diode

GAP3SLT33-220FP 3300 V SiC MPS Diode Silicon Carbide Schottky Diode V RRM = 3300 V I F (Tc 125 C) = 0.3 A Q C = 3 nc Features High Avalanche (UIS) Capability Enhanced Surge Current Capability Superior Figure of Merit Q C /I F Low Thermal

More information

Slow Write Driver Faults in 65nm SRAM Technology: Analysis and March Test Solution

Slow Write Driver Faults in 65nm SRAM Technology: Analysis and March Test Solution Slow Write Driver Faults in 65nm SRAM Technology: Analysis and March Test Solution Alexandre Ney, Patrick Girard, Christian Landrault, Serge Pravossoudovitch, Arnaud Virazel, Magali Bastian To cite this

More information

74HC123; 74HCT123. Dual retriggerable monostable multivibrator with reset

74HC123; 74HCT123. Dual retriggerable monostable multivibrator with reset Product data sheet 1. General description 2. Features The are high-speed Si-gate CMOS devices and are pin compatible with Low-power Schottky TTL (LSTTL). They are specified in compliance with JEDEC standard

More information

Resistive Random Access Memories (RRAMs)

Resistive Random Access Memories (RRAMs) Resistive Random Access Memories (RRAMs) J. Joshua Yang HP Labs, Palo Alto, CA, USA (currently) ECE Dept., Umass Amherst (Jan/2015 - ) 1 Copyright 2010 Hewlett-Packard Development Company, L.P. Resistive

More information

Semiconductor Memories

Semiconductor Memories Semiconductor References: Adapted from: Digital Integrated Circuits: A Design Perspective, J. Rabaey UCB Principles of CMOS VLSI Design: A Systems Perspective, 2nd Ed., N. H. E. Weste and K. Eshraghian

More information

Distributed by: www.jameco.com 1-800-831-4242 The content and copyrights of the attached material are the property of its owner. DS0026 Dual High-Speed MOS Driver General Description DS0026 is a low cost

More information

Nonvolatile CMOS Circuits Using Magnetic Tunnel Junction

Nonvolatile CMOS Circuits Using Magnetic Tunnel Junction November 3-4, 2011 Berkeley, CA, USA Nonvolatile CMOS Circuits Using Magnetic Tunnel Junction Hideo Ohno 1,2 1 Center for Spintronics Integrated Systems, Tohoku University, Japan 2 Laboratory for Nanoelectronics

More information

Metallic: 2n 1. +n 2. =3q Armchair structure always metallic = 2

Metallic: 2n 1. +n 2. =3q Armchair structure always metallic = 2 Properties of CNT d = 2.46 n 2 2 1 + n1n2 + n2 2π Metallic: 2n 1 +n 2 =3q Armchair structure always metallic a) Graphite Valence(π) and Conduction(π*) states touch at six points(fermi points) Carbon Nanotube:

More information

Chapter 1. Introduction

Chapter 1. Introduction Chapter 1. Introduction In this chapter, ferroelectric materials are briefly introduced with emphasis on their nonvolatile memory properties and their potential impact on the current state of digital memories.

More information

ESE 570: Digital Integrated Circuits and VLSI Fundamentals

ESE 570: Digital Integrated Circuits and VLSI Fundamentals ESE 570: Digital Integrated Circuits and VLSI Fundamentals Lec 21: April 4, 2017 Memory Overview, Memory Core Cells Penn ESE 570 Spring 2017 Khanna Today! Memory " Classification " ROM Memories " RAM Memory

More information

P4C164 ULTRA HIGH SPEED 8K X 8 STATIC CMOS RAMS FEATURES DESCRIPTION. Full CMOS, 6T Cell. Common Data I/O

P4C164 ULTRA HIGH SPEED 8K X 8 STATIC CMOS RAMS FEATURES DESCRIPTION. Full CMOS, 6T Cell. Common Data I/O FEATURES Full CMOS, 6T Cell High Speed (Equal Access and Cycle Times) 8/10/12/15/20/25/35/70/100 ns (Commercial) 10/12/15/20/25/35/70/100 ns(industrial) 12/15/20/25/35/45/70/100 ns (Military) Low Power

More information

Solid-State Electronics

Solid-State Electronics Solid-State Electronics 84 (2013) 147 154 Contents lists available at SciVerse ScienceDirect Solid-State Electronics journal homepage: www.elsevier.com/locate/sse Progress in Z 2 -FET 1T-DRAM: Retention

More information

Supplementary Information for. Non-volatile memory based on ferroelectric photovoltaic effect

Supplementary Information for. Non-volatile memory based on ferroelectric photovoltaic effect Supplementary Information for Non-volatile memory based on ferroelectric photovoltaic effect Rui Guo 1, Lu You 1, Yang Zhou 1, Zhi Shiuh Lim 1, Xi Zou 1, Lang Chen 1, R. Ramesh 2, Junling Wang 1* 1 School

More information

Analysis of charge-transport properties in GST materials for next generation phase-change memory devices. Fabio Giovanardi Tutor: Prof.

Analysis of charge-transport properties in GST materials for next generation phase-change memory devices. Fabio Giovanardi Tutor: Prof. Analysis of charge-transport properties in GST materials for next generation phase-change memory devices Fabio Giovanardi Tutor: Prof. Massimo Rudan The use of phase-change chalcogenide alloy films to

More information

DECODER I/O DATA CIRCUIT CONTROL CIRCUIT

DECODER I/O DATA CIRCUIT CONTROL CIRCUIT 32K x 8 HIGH-SPEED CMOS STATIC RAM MAY 1999 FEATURES High-speed access time: 10, 12, 15, 20, 25 ns Low active power: 400 mw (typical) Low standby power 250 µw (typical) CMOS standby 55 mw (typical) TTL

More information

CMOS Digital Integrated Circuits Lec 13 Semiconductor Memories

CMOS Digital Integrated Circuits Lec 13 Semiconductor Memories Lec 13 Semiconductor Memories 1 Semiconductor Memory Types Semiconductor Memories Read/Write (R/W) Memory or Random Access Memory (RAM) Read-Only Memory (ROM) Dynamic RAM (DRAM) Static RAM (SRAM) 1. Mask

More information

Digital Integrated Circuits A Design Perspective

Digital Integrated Circuits A Design Perspective Semiconductor Memories Adapted from Chapter 12 of Digital Integrated Circuits A Design Perspective Jan M. Rabaey et al. Copyright 2003 Prentice Hall/Pearson Outline Memory Classification Memory Architectures

More information

CHAPTER I. Introduction. 1.1 State of the art for non-volatile memory

CHAPTER I. Introduction. 1.1 State of the art for non-volatile memory CHAPTER I Introduction 1.1 State of the art for non-volatile memory 1.1.1 Basics of non-volatile memory devices In the last twenty years, microelectronics has been strongly developed, concerning higher

More information

Introduction to Computer Engineering. CS/ECE 252, Fall 2012 Prof. Guri Sohi Computer Sciences Department University of Wisconsin Madison

Introduction to Computer Engineering. CS/ECE 252, Fall 2012 Prof. Guri Sohi Computer Sciences Department University of Wisconsin Madison Introduction to Computer Engineering CS/ECE 252, Fall 2012 Prof. Guri Sohi Computer Sciences Department University of Wisconsin Madison Chapter 3 Digital Logic Structures Slides based on set prepared by

More information

Features. Description. Table 1. Device summary. Order code Marking Packages Packing. STGD19N40LZ GD19N40LZ DPAK Tape and reel

Features. Description. Table 1. Device summary. Order code Marking Packages Packing. STGD19N40LZ GD19N40LZ DPAK Tape and reel Automotive-grade 390 V internally clamped IGBT E SCIS 180 mj Features Datasheet - production data TAB DPAK 1 3 AEC-Q101 qualified 180 mj of avalanche energy @ T C = 150 C, L = 3 mh ESD gate-emitter protection

More information

A final review session will be offered on Thursday, May 10 from 10AM to 12noon in 521 Cory (the Hogan Room).

A final review session will be offered on Thursday, May 10 from 10AM to 12noon in 521 Cory (the Hogan Room). A final review session will be offered on Thursday, May 10 from 10AM to 12noon in 521 Cory (the Hogan Room). The Final Exam will take place from 12:30PM to 3:30PM on Saturday May 12 in 60 Evans.» All of

More information

Static Behavior of Chalcogenide Based Programmable Metallization Cells. Saba Rajabi

Static Behavior of Chalcogenide Based Programmable Metallization Cells. Saba Rajabi Static Behavior of Chalcogenide Based Programmable Metallization Cells by Saba Rajabi A Thesis Presented in Partial Fulfillment of the Requirements for the Degree Master of Science Approved July 2014 by

More information

RRAM technology: From material physics to devices. Fabien ALIBART IEMN-CNRS, Lille

RRAM technology: From material physics to devices. Fabien ALIBART IEMN-CNRS, Lille RRAM technology: From material physics to devices Fabien ALIBART IEMN-CNRS, Lille Outline Introduction: RRAM technology and applications Few examples: Ferroelectric tunnel junction memory Mott Insulator

More information

DATA SHEET. PH2369 NPN switching transistor DISCRETE SEMICONDUCTORS. Product specification Supersedes data of 1999 Apr Oct 11.

DATA SHEET. PH2369 NPN switching transistor DISCRETE SEMICONDUCTORS. Product specification Supersedes data of 1999 Apr Oct 11. DISCRETE SEMICONDUCTORS DATA SHEET book, halfpage M3D186 Supersedes data of 1999 Apr 27 2004 Oct 11 FEATURES Low current (max. 200 ma) Low voltage (max. 15 V). APPLICATIONS High-speed switching. PINNING

More information

INTEGRATED CIRCUITS. For a complete data sheet, please also download:

INTEGRATED CIRCUITS. For a complete data sheet, please also download: INTEGRATED CIRCUITS DATA SHEET For a complete data sheet, please also download: The IC06 74HC/HCT/HCU/HCMOS Logic Family Specificatio The IC06 74HC/HCT/HCU/HCMOS Logic Package Information The IC06 74HC/HCT/HCU/HCMOS

More information

DRAMATIC advances in technology scaling have given us

DRAMATIC advances in technology scaling have given us IEEE JOURNAL OF SOLID-STATE CIRCUITS, VOL. 39, NO. 6, JUNE 2004 919 Complementary Ferroelectric-Capacitor Logic for Low-Power Logic-in-Memory VLSI Hiromitsu Kimura, Member, IEEE, Takahiro Hanyu, Member,

More information

An Overview of Spin-based Integrated Circuits

An Overview of Spin-based Integrated Circuits ASP-DAC 2014 An Overview of Spin-based Integrated Circuits Wang Kang, Weisheng Zhao, Zhaohao Wang, Jacques-Olivier Klein, Yue Zhang, Djaafar Chabi, Youguang Zhang, Dafiné Ravelosona, and Claude Chappert

More information

DM7490A Decade and Binary Counter

DM7490A Decade and Binary Counter Decade and Binary Counter General Description The DM7490A monolithic counter contains four masterslave flip-flops and additional gating to provide a divide-bytwo counter and a three-stage binary counter

More information

DATA SHEET. BYV2100 Fast soft-recovery controlled avalanche rectifier DISCRETE SEMICONDUCTORS. Product specification 1996 Oct 07. handbook, 2 columns

DATA SHEET. BYV2100 Fast soft-recovery controlled avalanche rectifier DISCRETE SEMICONDUCTORS. Product specification 1996 Oct 07. handbook, 2 columns DISCRETE SEMICONDUCTORS DATA SHEET handbook, columns M3D6 BYV 996 Oct 7 BYV FEATURES Glass passivated High maximum operating temperature Low leakage current Excellent stability Guaranteed avalanche energy

More information

DATA SHEET. TDA3601Q TDA3601AQ Multiple output voltage regulators INTEGRATED CIRCUITS Dec 13

DATA SHEET. TDA3601Q TDA3601AQ Multiple output voltage regulators INTEGRATED CIRCUITS Dec 13 INTEGRATED CIRCUITS DATA SHEET Supersedes data of September 1994 File under Integrated Circuits, IC01 1995 Dec 13 FEATURES Six fixed voltage regulators Three microprocessor-controlled regulators Two V

More information

Digital Integrated Circuits A Design Perspective. Semiconductor. Memories. Memories

Digital Integrated Circuits A Design Perspective. Semiconductor. Memories. Memories Digital Integrated Circuits A Design Perspective Semiconductor Chapter Overview Memory Classification Memory Architectures The Memory Core Periphery Reliability Case Studies Semiconductor Memory Classification

More information

DATA SHEET. BYD63 Ripple blocking diode DISCRETE SEMICONDUCTORS Jun 10

DATA SHEET. BYD63 Ripple blocking diode DISCRETE SEMICONDUCTORS Jun 10 DISCRETE SEMICONDUCTORS DATA SHEET book, halfpage M3D9 Supersedes data of November 995 File under Discrete Semiconductors, SC 996 Jun FEATURES Glass passivated High maximum operating temperature Low leakage

More information

Wouldn t it be great if

Wouldn t it be great if IDEMA DISKCON Asia-Pacific 2009 Spin Torque MRAM with Perpendicular Magnetisation: A Scalable Path for Ultra-high Density Non-volatile Memory Dr. Randall Law Data Storage Institute Agency for Science Technology

More information

Experimental and Theoretical Study of Electrode Effects in HfO2 based RRAM

Experimental and Theoretical Study of Electrode Effects in HfO2 based RRAM Experimental and Theoretical Study of Electrode Effects in HfO2 based RRAM C. Cagli 1, J. Buckley 1, V. Jousseaume 1, T. Cabout 1, A. Salaun 1, H. Grampeix 1, J. F. Nodin 1,H. Feldis 1, A. Persico 1, J.

More information

SEU RADIATION EFFECTS ON GAA-CNTFET BASED DIGITAL LOGIC CIRCUIT

SEU RADIATION EFFECTS ON GAA-CNTFET BASED DIGITAL LOGIC CIRCUIT International Journal of Mechanical Engineering and Technology (IJMET) Volume 9, Issue 7, July 2018, pp. 345 353, Article ID: IJMET_09_07_039 Available online at http://www.iaeme.com/ijmet/issues.asp?jtype=ijmet&vtype=9&itype=7

More information

Semiconductor Memory Classification

Semiconductor Memory Classification Semiconductor Memory Classification Read-Write Memory Non-Volatile Read-Write Memory Read-Only Memory Random Access Non-Random Access EPROM E 2 PROM Mask-Programmed Programmable (PROM) SRAM FIFO FLASH

More information

Error Control Codes for Memories

Error Control Codes for Memories The 2 th Korea Test Conference Error Control Codes for Memories June 22, 2 Jun Jin Kong, Ph.D. (jjkong@samsung.com) Samsung Electronics Co., Ltd. (Memory) Biography of Jun Jin Kong Brief History Present:

More information

Reliability issues of current and emerging NVMs

Reliability issues of current and emerging NVMs Reliability issues of current and emerging NVMs A. S. Spinelli, C. Monzio Compagnoni and D. Ielmini Dip. di Elettronica e Informazione Politecnico di Milano, Milano, Italy and IU.NET alessandro.spinelli@polimi.it

More information