Session # Name Company Title O/P

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1 Session # Name Company Title / Keynote S1 Igor Fomenkov ASML Keynote S2 Hakaru Mizoguchi Gigaphoton Keynote S3 Gerry 'Sullivan UCD EUVL Extension Blue X S11 Vivek Bakshi EUV Litho EUVL Extension Blue X S12 Henryk Fiedorowicz Military University of Technology EUVL Extension Blue X S13 Klaus Bergmann Fraunhofer EUVL Extension Blue X S14 Serguei Kalmykov Ioffe Institute EUVL Extension Blue X S15 Craig Siders LLNL EUVL Extension Blue X S16 aul Sheridan Sirius XT EUV source for Lithography: readiness for HVM and outlook for increase in power and availability. High ower L EUV Source with Long Collector Mirror Lifetime for Semiconductor High Volume Manufacturing Laser roduced lasma Light Sources for Short Wavelength Applications Blue X Case for EUVL Extension via Wavelength Reduction Recent advances in development and application of compact laser plasma soft X ray sources based on a gas puff target Wavelength and brilliance scaling potential of discharge based XUV sources Xe Laser lasma EUV Source from 13.5 nm to 11 nm: Researches to ptimize the Xe L 11 nm Source New Architectures for W Scale High eak ower Lasers Scalable to Near MW Average owers and Their Application to EUV Generation A Water Window source for Soft X Ray Microscopy and other Applications EUVL Extension Blue X S17 Hans Hertz KTH Liquid jet laser plasma sources for sub 5 nm emission EUVL Extension Blue X S18 Torsten Feigl ptixfab Multilayer optics for 1 nm to 13.5 nm: Can we reduce the lithography wavelength further? age 1

2 Session # Name Company Title / EUVL Extension Blue X S19 Ronald Meisels Leoben Depth modified Bragg mirrors for sub 10 nm wavelengths FEL S21 Hiroshi Kawata KEK Upgrade plan of cerl for the C as a first stage of the development on EUV FEL high power light source FEL S22 Nishikino Masaharu QST Surface Ablation by Soft X ray Laser ulse for EUV nanoscale fabrication FEL S23 Jom Luiten Eindhoven Technology Laser cooled electron source Lasers S31 eter Kraus ARCNL HHG Status, challenges and ARCNL program review Lasers S32 Stephane Sebban ENSTA aristech rogress on laser driven soft x ray lasers at LA Lasers S33 Tomas Mocek HiLASE Technologies and applications of high average power lasers at HiLASE Lasers S34 Akira Endo HiLASE Quantum Technology and kw, ps thin disc lasers Lasers S35 Thomas Metzger Trumpf Ultrafast Thin Disk Amplifiers Lasers S36 Johannes Kaschke Trumpf Lasers S37 Johannes Weitenberg Fraunhofer Beam Quality of ulsed High ower C 2 Lasers for EUV Lithography High Harmonic Generation for EUV Frequency Comb Spectroscopy of He + age 2

3 Session # Name Company Title / Lasers S38 Jiri Mužík HiLASE Lasers S39 Siva Sankar Nagisetty HiLASE Lasers S40 aweł Sikociński HiLASE Lasers S70 Yuya Koshiba Waseda University L S41 scar Versolato ARCNL 0.5 kw picosecond thin disk laser system for pre pulsing in high power EUV sources High energy burst mode thin disk multipass amplifier for laser Compton X ray source Development of a high energy, cryogenically cooled Yb:YAG laser system Adopting Crab Crossing to Laser Compton Scattering X ray Nd:YAG laser driven Sn plasma: an ARCNL research update L S42 Ronnie Hoekstra ARCNL Tin ion interactions. L S43 Ruben Schupp ARCNL Influence of opacity in Nd:YAG laser produced tin plasmas L S44 adraig Dunne UCD TBA L S45 avel Krainov ISAN EUV induced plasma of hydrogen with nitrogen admixture L S45 Dmitrii Astakhov RnD ISAN L S46 Bogdan Lakatosh Moscow Institute of hysics and Technology Computer modeling of contamination and cleaning of EUV source optics Validation of radiation hydrodynamic model against experiment with C 2 laser produced tin plasma age 3

4 Session # Name Company Title / Metrology S65 Matthias Müller Metrology S61 Slava Medvedev Metrology S62 Daniel Wilson Laser Laboratorium Göttingen e.v. 1 RnD ISAN/EUV Labs Forschungszentrum Jülich GmbH Soft x ray spectroscopy and microscopy using a table top laser induced plasma source Free standing carbon nanotube membranes for applications in extreme ultraviolet and soft X ray optics Design and evaluation of a focusing EUV monochromator for laboratory based photoemission electron microscopy beyond He II Metrology S63 Muharrem Bayraktar Twente Monitoring EUV and DUV spectral emission ratios of a high power EUVL source Metrology S64 Martin Duda HiLASE Metrology Sources S51 Jaroslav Nejdl ELI A single shot NEXAFS spectroscopy using laser plasma double stream gas puff target SXR source EUV/X ray sources driven by new generation of lasers for user applications at ELI Beamlines Metrology Sources S52 Steve Horne Energetiq Mixed gas fueling experiments on the Energetiq EQ 10 Metrology Sources S53 Reza Abhari ETHZ TBA Metrology Sources S54 Michael Krivokoritov Euv Labs/RnD ISAN High brightness light source based on a new concept of L for actinic EUV microscopy and metrology applications Metrology Sources S55 Ladislav ina Rigaku Metrology Sources S56 Yusuke Teramoto Ushio Electron impact type laboratory EUV source for metrology and imaging Characterization and performance improvement of laserassisted and laser driven EUV sources for metrology applications age 4

5 Session # Name Company Title / Metrology Sources S57 Kosuke Saito Energetiq Metrology Sources S58 Jochen Vieker Fraunhofer Xenon plus additives in the Energetiq EQ 10: Initial Results The extendibility of the maintenance interval of a discharge based EUV source Metrology Sources S59 Florian Melsheimer RWTH Aachen University Advances in laser heated discharge plasma sources Metrology Sources S60 Chiara Liberatore HiLASE EUV LASMA SURCE AT HILASE age 5