Progress in LPP EUV Source Development by Japan MEXT Project
|
|
- Georgina Bell
- 6 years ago
- Views:
Transcription
1 Progress in LPP EUV Source Development by Japan MEXT Project Y. Izawa, N. Miyanaga, H. Nishimura, S. Fujioka, T. Aota, K. Nagai, T. Norimatsu,K. Nishihara, M. Murakami, Y. -G. Kang, M. Nakatsuka, H. Fujita, K. Tsubakimoto, H. Yoshida, K. Mima ( ILE, Osaka University) S. Uchida, Y. Shimada, M. Yamaura, K. Hashimoto, A. Sunahara, H. Furukawa (Institute for Laser Technology) F. Koike (Kitazato University) H. Tanuma (Tokyo Metropolitan University) T. Kawamura (Tokyo Institute of Technology) K. Fujima (Yamanashi University) R. More, T. Kato (National Institute of Fusion Science) A. Sasaki (Advanced Photon Research Center, JAERI) T. Kagawa (Nara Womens College) T. Nishikawa (Okayama University) 4thEUVL Symposium November 7-9, 2005 San Diego, USA
2 Basic research on EUV plasma is important. MEXT project ( ) Collaboration Objectives 1) Understanding physics of EUV source plasma and providing guidelines for practical EUV source design High power and high efficiency EUV data base (experiments and simulations) Optimization of EUV plasma (laser and target) Clean, debris free source (H. Nishimura et al.) Data base on ion and neutral atom emission Suppression of high energy ions 2) Development of new targets (K. Nagai et al.) low density, mass-limited, high feed rate METI project ( ) 3) Development of laser technology 5 kw/5 khz DPSSL compact, high efficiency, good beam quality, long life Objectives: EUVL system R&D MEXT: Ministry of Education, Culture, Science and Technology METI; Ministry of Economy, Trade and Industry 2
3 Guideline for optimization of EUV source Design windows EUV power : 300W at - 30kHz Large size plasma: 400 ~ 700 mm Low laser intensity: 11 ~ 12 W/cm 2 Low electron density: 19 ~ 21 cm -3 Electron temperature: 20 ~ 40 ev 4 2 Low density foam target may be a powerful candidate. gas jet target discharge plasma foam target Opacity for EUV emission will be important. Selection of laser wavelength and pulse width. 1 solid target plasma scale length (mm) mm t = L 20 optically too thin optimum density-depth product mm0.53 mm0.25 mm 20ns ns 5ns optically too thick 5 2ns 1ns etendue limit 1mm 2 sr (W=p) ion number density (cm -3 ) 3
4 Research flow to high power and efficient EUV source Atomic data By CXS Xe 11+ Xe + Transmission T e ~ 30 ev Sn Benchmark Atomic model Radiation hydro code Benchmark EUV experiment Laser: I, t, l Target: Z, r, Intensity Intensity 4d-4f Simulation 4d-5p Xe + Xe 9+ 1x 11 W/cm 2 1x 12 W/cm 2 Experiment 0.9x 11 W/cm 2 0.9x 12 W/cm 2 Xe 9+ By HULLAC Code wavelength (nm) wavelength (nm) Conversion efficiency (%) T e ~ 0 ev Wavelength (nm) Experiment Simulation Laser intensity (W/cm 2 ) Electron temperature(ev) Conversion efficiency Ion density (/cm 3 ) Design of high power and clean EUV source 4
5 Radiation hydrodynamic simulation reproduces well the measured spectra. Radiation spectra drastically changes with laser intensity. Target: Sn, laser wavelength: 64 nm Sn 8.8x [W/cm 2 ] Exp x 11 [W/cm 2 ] Sim. Intensity (a.u.) 3.0x 11 [W/cm 2 ] 9.0x 11 [W/cm 2 ] x 11 [W/cm 2 ] x 12 [W/cm 2 ] Wavelength (nm) Wavelength (nm) 5
6 Mapping of conversion efficiency by power balance model electron temperature [ev] Sn: short pulse laser (< 5 ns) Xe, Li: long pulse laser (> 5 ns) 80 Sn 2ns ion density [cm -3 ] For Sn, high conversion is obtained for a wide range of n i and T e Te [ev] Li 30ns Xe 15ns ion density [cm -3 ] ion density [cm -3 ] 6
7 EUV plasma diagnostics ion (Thomson parabola) neutral particle (LIF) x l x t 7
8 Experimental results were compared with simulation µm (2w) probe 0.27-µm (4w) probe Distance from target surface (µm) Time (ns) 150 µm 12.2 ns Laser pulse ( ns) Spatially integrated temporal profile 220 µm Ion number density (cm-3 Electron temperature (ev) Degree of ionization Time integrated spatial profile Experimental condition Laser wavelength: 1.064mm I = 1 11 W/cm 2 Target: Sn stripe 1x 11 W/cm 2 Position (µm) 8
9 EUV spectral shape depends on laser wavelength and pulse width. Short wavelength Long pulse Increase in ion density Increase in scale length Increase in opacity, and spectral dip at 13.5 nm Nomalized intensity (arb. units) Intensity normalized at 13.5 nm Sn 1.06mm Wavelength (nm) EUV spectrum (3 ns) EUV spectrum ( ns) 5 x W/cm relative intensity (a.u.) Sn 1.06mm 0.53mm 0.27mm 5 x W/cm wavelength (nm) 9
10 EUV spectral shape depends on initial mass-density. Opacity can be controlled by target initial mass-density. SnO 2 foam target Intensity normaized by laser intensity Laser wavelength: 1.06 µm (5.2±0.7)x W/cm 2 Improved spectral purity 2.9x W/cm 2 Intensity normaized by laser intensity Laser wavelength: 0.53 µm (4.2±0.2)x W/cm 2 Improved efficiency Wavelength (nm) Wavelength (nm)
11 Conversion efficiency is improved by controlling target mass-density and laser pulse width. Nd:YAG [64 nm, 2-3 ns/ns] Nd:YAG [64 nm, ns] 2.5 Conversion efficiency (%) ~ 3 ns 1.2 ns ns 8 ~ ns Simulation Laser intensity (W/cm 2 ) CE (%/2 sr/2%bw) Laser intensity (x W/cm 2 ) 11
12 Summary Guideline to achieve high conversion from laser to EUV radiation has been established by the experiments and simulation. For Sn plasma, opacity effect is important, and short pulse laser and low density target will be effective for high efficiency. High conversion efficiency was achieved. Sn: 3 % (spherical plasma), SnO 2 foam: 2.5 %, Xe (solid): 1.1 %, Li: > 1% 5kHz/5kW laser has been developed, and will be used for high power EUV experiment in this year. 12
Plasma EUV source has been studied to achieve 180W of power at λ=13.5nm, which is required for the next generation microlithography
Acknowledgement K. Nishihara, H. Nishimura, S. Fujioka Institute for Laser Engineering, Osaka University A. Sunahara, H. Furukawa Institute for Laser Technology T. Nishikawa, Okayama University F. Koike,
More informationLaser-produced extreme ultraviolet (EUV) light source plasma for the next generation lithography application
Laser-produced extreme ultraviolet (EUV) light source plasma for the next generation lithography application EUV light source plasma Tin icrodroplet Main pulse (CO2 laser pulse) Pre-pulse (Nd:YAG laser
More informationSpectral control of emissions from Sn-doped targets for EUV lithography
University of California, San Diego UCSD-CER-05-05 Spectral control of emissions from Sn-doped targets for EUV lithography S. S. Harilal, B. O Shay, M. S. Tillack and Y. Tao August 2005 Center for Energy
More informationRadiative Hydrodynamic Simulation of Laser-produced Tin Plasma for Extreme Ultraviolet Lithography
P10 Radiative Hydrodynamic Simulation of Laser-produced Tin Plasma for Extreme Ultraviolet Lithography A. Sunahara 1 K. Nishihara 2 A. Sasaki 3 1 Institute for Laser Technology (ILT) 2 Institute of Laser
More informationVisualization of Xe and Sn Atoms Generated from Laser-Produced Plasma for EUV Light Source
3rd International EUVL Symposium NOVEMBER 1-4, 2004 Miyazaki, Japan Visualization of Xe and Sn Atoms Generated from Laser-Produced Plasma for EUV Light Source H. Tanaka, A. Matsumoto, K. Akinaga, A. Takahashi
More informationEfficient EUV source by use of a micro-target containing tin nanoparticles
2008 International Workshop on EUV Lithography Efficient EUV source by use of a micro-target containing tin nanoparticles Takeshi Higashiguchi higashi@cc.utsunomiya-u.ac.jp Utsunomiya University, Japan
More informationOpacity effect on extreme ultraviolet radiation from laser-produced tin plasmas
Physics Physics fields Okayama University Year 2005 Opacity effect on extreme ultraviolet radiation from laser-produced tin plasmas Shinsuke Fujioka, Osaka University Hiroaki Nishimura, Osaka University
More informationMeasurement of CO 2 laser absorption by thin plasma as a 13.5 nm EUV light source!
Measurement of CO 2 laser absorption by thin plasma as a 13.5 nm EUV light source! H. Nishimura 1, H. Matsukuma 1, K. Yoshida 1, T. Hosoda 1, A. Yogo 1,! N. Tanaka 1, S. Fujioka 1, K. Nishihara 1,! A.
More informationEXTREME ULTRAVIOLET (EUV) lithography (EUVL)
714 IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 38, NO. 4, APRIL 2010 Interaction of a CO 2 Laser Pulse With Tin-Based Plasma for an Extreme Ultraviolet Lithography Source Yezheng Tao, Mark S. Tillack, Sam
More informationRare-earth plasma extreme ultraviolet sources at nm for next generation semiconductor lithography
Rare-earth plasma extreme ultraviolet sources at 6.5-6.7 nm for next generation semiconductor lithography Takeshi Higashiguchi 1 Takamitsu Otsuka 1, Deirdre Kilbane 3, John White 3, Noboru Yugami 1,2,
More informationModeling of radiative properties of Sn plasmas for EUV source
Modeling of radiative properties of Sn plasmas for EUV source Akira Sasaki Quantum Beam Science Directorate, Japan Atomic Energy Agency 8-1 Umemidai, Kizugawa-shi, Kyoto 619-0215, Japan Atsushi Sunahara,
More informationA laser-produced plasma extreme ultraviolet (EUV) source by use of liquid microjet target
A laser-produced plasma extreme ultraviolet (EUV) source by use of liquid microjet target Takeshi Higashiguchi E-mail: higashi@opt.miyazaki-u.ac.jp Keita Kawasaki, Naoto Dojyo, Masaya Hamada, Wataru Sasaki,
More informationInstitute for Laser Technology
Shinsuke Fujioka, Teruyuki Ugomori, Kensuke Yoshida, Chaogang Li, Atsushi Sunahara A, Katsunobu Nishihara, Nozomi Tanaka, Hiroaki Nishimura Institute of Laser Engineering, Osaka University A Institute
More informationFundamental investigation on CO 2 laser-produced Sn plasma for an EUVL source
Fundamental investigation on CO 2 laser-produced Sn plasma for an EUVL source Yezheng Tao*, Mark Tillack, Kevin Sequoia, Russel Burdt, Sam Yuspeh, and Farrokh Najmabadi University of California, San Diego
More informationInves&ga&on of atomic processes in laser produced plasmas for the short wavelength light sources
Inves&ga&on of atomic processes in laser produced plasmas for the short wavelength light sources Akira Sasaki Quantum Beam Science Directorate Japan Atomic Energy Agency Introduc&on EUV source at λ=6.5nm
More informationEUV lithography and Source Technology
EUV lithography and Source Technology History and Present Akira Endo Hilase Project 22. September 2017 EXTATIC, Prague Optical wavelength and EUV (Extreme Ultraviolet) VIS 13.5nm 92eV Characteristics of
More informationAblation Dynamics of Tin Micro-Droplet Target for LPP-based EUV light Source
1 Ablation Dynamics of Tin Micro-Droplet Target for LPP-based EUV light Source D. Nakamura, T. Akiyama, K. Tamaru, A. Takahashi* and T. Okada Graduate School of Information Science and Electrical Engineering,
More informationPlasma Source Modelling for Future Lithography at 6.7 nm and Other Applications
Plasma Source Modelling for Future Lithography at 6.7 nm and Other Applications Gerry O Sullivan, Deirdre Kilbane, Li Bowen and Padraig Dunne, School of Physics, University College Dublin, Belfield, Dublin
More informationDevelopment of Polarization Interferometer Based on Fourier Transform Spectroscopy for Thomson Scattering Diagnostics
16th International Toki Conference Advanced Imaging and Plasma Diagnostics Ceratopia Toki, Gifu, JAPAN December 5-8, 2006 Development of Polarization Interferometer Based on Fourier Transform Spectroscopy
More informationEUV Source Developments on Laser-Produced Plasmas using Lithium New Scheme Target
San Diego, 25.11.7-9 EUV Source Developments on Laser-Produced Plasmas using thium New Scheme Target Shuji MIYAMOTO, Sho AMANO, Takahiro INOUE Petru-Edward NICA, Atsushi SHIMOURA Kakyo KAKU, and Takayasu
More informationLaser Production of Extreme Ultraviolet Light Source for the Next Generation Lithography Application )
Laser Production of Extreme Ultraviolet Light Source for the Next Generation Lithography Application ) Shinsuke FUJIOKA, Hiroaki NISHIMURA, Katsunobu NISHIHARA, Noriaki MIYANAGA, Yasukazu IZAWA, Kunioki
More informationLaser heating of noble gas droplet sprays: EUV source efficiency considerations
Laser heating of noble gas droplet sprays: EUV source efficiency considerations S.J. McNaught, J. Fan, E. Parra and H.M. Milchberg Institute for Physical Science and Technology University of Maryland College
More informationAnalysis, simulation, and experimental studies of YAG and CO 2 laserproduced plasma for EUV lithography sources
Analysis, simulation, and experimental studies of YAG and CO 2 laserproduced plasma for EUV lithography sources A. Hassanein, V. Sizyuk, S.S. Harilal, and T. Sizyuk School of Nuclear Engineering and Center
More informationDevelopment of Radiation Hydrodynamic code STAR for EUV plasmas. Atsushi Sunahara. Institute for Laser Technology
Development of Radiation Hydrodynamic code STAR for EUV plasmas Atsushi Sunahara suna@ile.osaka-u.ac.jp Institute for Laser Technology 2013 International Workshop on EUV and Soft x-ray Sources University
More informationImportant processes in modeling and optimization of EUV lithography sources
Important processes in modeling and optimization of UV lithography sources T. Sizyuk and A. Hassanein Center for Materials under xtreme nvironment, School of Nuclear ngineering Purdue University, West
More informationModelling of high intensity EUV light sources based on laser- & discharge- produced plasmas
Modelling of high intensity EUV light sources based on laser- & discharge- produced plasmas Sergey V. Zakharov +, Peter Choi, Vasily S. Zakharov NANO UV sas EPPRA sas + also with RRC Kurchatov Institute,
More informationComparison of EUV spectral and ion emission features from laserproduced
Comparison of EUV spectral and ion emission features from laserproduced and plasmas R. W. Coons, D. Campos, M. Crank, S. S. Harilal, and A. Hassanein School of Nuclear Engineering, and Center for Materials
More informationPeculiarities of Modeling LPP Source at 6.X nm
V.Novikov, V.Ivanov, K.Koshelev, V.Krivtsun, A.Grushin, R.Kildiyarova, A.Solomyannaya Peculiarities of Modeling LPP Source at 6.X nm Outline Theoretical base Optimal plasma parameters Band position Scaling
More informationEvaluation at the intermediate focus for EUV Light Source
Evaluation at the intermediate focus for EUV Light Source Takashi Suganuma, Georg Soumagne, Masato Moriya, Tamotsu Abe, Akira Sumitani, Akira Endo Extreme Ultraviolet Lithography System Development Association
More informationEmission characteristics of debris from CO 2 and Nd:YAG laser-produced tin plasmas for extreme ultraviolet lithography light source
Appl. Phys. B 92, 73 77 (2008) DOI: 10.1007/s00340-008-3068-5 Applied Physics B Lasers and Optics a. takahashi 1, d. nakamura 2 k. tamaru 2 t. akiyama 2 t. okada 2 Emission characteristics of debris from
More informationOptimization of EUV Lithography Plasma Radiation Source Characteristics Using HELIOS-CR
Optimization of EUV Lithography Plasma Radiation Source Characteristics Using HELIOS-CR J. J. MacFarlane, P. Wang, I. E. Golovkin, P. R. Woodruff Prism Computational Sciences, Inc. Madison, WI (USA) http://www.prism-cs.com
More informationPadraig Dunne, UCD School of Physics Dublin, Ireland.
Padraig Dunne, UCD School of Physics Dublin, Ireland. Contents Zurich Prague Dublin Padova Carl Zeiss Aachen ASML IMEC EPPRA Xtreme ISAN ISAN Progress in on line MLM carbon cleaning Progress in radiative
More informationConsequences of high-frequency operation on EUV source efficiency
Consequences of high-frequency operation on EUV source efficiency Tatyana Sizyuk Center for Materials under Extreme Environment (CMUXE), School of Nuclear Engineering Purdue University, West Lafayette,
More informationHigh Brightness Electrodeless Z-Pinch TM EUV Source for Mask Inspection Tools
High Brightness Electrodeless Z-Pinch TM EUV Source for Mask Inspection Tools Stephen F. Horne, Matthew M. Besen, Matthew J. Partlow, Donald K. Smith, Paul A. Blackborow, Deborah S. Gustafson Agenda Background
More informationOptimization of laser-produced plasma light sources for EUV lithography
page 1 of 17 Optimization of laser-produced plasma light sources for EUV lithography M. S. Tillack and Y. Tao 1 University of California, San Diego Center for Energy Research 1 Currently at Cymer Inc.
More informationFast Ignition Experimental and Theoretical Researches toward Fast Ignition Realization Experiment (FIREX)
1 Fast Ignition Experimental and Theoretical Researches toward Fast Ignition Realization Experiment (FIREX) K. Mima 1), H. Azechi 1), H. Fujita 1), Y. Izawa 1), T. Jitsuno 1), T. Johzaki 1), Y. Kitagawa
More informationA Straight Forward Path (Roadmap) to EUV High Brightness LPP Source
Introduction and Outline A Straight Forward Path (Roadmap) to EUV High Brightness LPP Source Rainer Lebert, AIXUV Target Features of High Brightness EUV Source LPP Concept to reach Specification Target
More informationPulsed-power based bright EUV light source for metrology
Pulsed-power based bright EUV light source for metrology Sergey V. Zakharov NaextStream sas, Buc, France sergey.zakharov@naextstream.com + also with NRC Kurchatov Institute, Moscow, Russia 1 Sources for
More informationDevelopment and Optimization of EUV Emission from Laser Produced Plasmas
Development and Optimization of EUV Emission from Laser Produced Plasmas Gerry O Sullivan School of Physics, University College Dublin, Belfield, Dublin 4, Ireland. 2011 International Workshop on EUV Lithography,
More informationCHARACTERISTICS OF ION EMISSION FROM CO 2 /Nd:YAG LPP WITH TIN TARGET
CHARACTERISTICS OF ION EMISSION FROM CO 2 /Nd:YAG LPP WITH TIN TARGET Akihiko Takahashi 1, Hiroki Tanaka 2, Atsushi Matsumoto 2, Yuuki Hashimoto 2, Kiichiro Uchino 3, Tatsuo Okada 2 1 Department of Health
More informationSpectroscopic Studies of Soft X-Ray Emission from Gadolinium Plasmas
I. Kambali, G. Atom O Sullivan Indonesia / Atom Vol. Indonesia 4 No. 2 (24) Vol. 47 No. - 2 (24) 7 - Spectroscopic Studies of Soft X-Ray Emission from Gadolinium Plasmas I. Kambali * and G. O Sullivan
More informationVolume Production of D - Negative Ions in Low-Pressure D 2 Plasmas - Negative Ion Densities versus Plasma Parameters -
Volume Production of D - Negative Ions in Low-Pressure D 2 Plasmas - Negative Ion Densities versus Plasma Parameters - Osamu Fukumasa and Shigefumi Mori Department of Electrical and Electronic Engineering,
More informationUC San Diego EUV Lithography Group Progress Report
University of California, San Diego UCSD-CER-10-02 UC San Diego EUV Lithography Group Progress Report M. S. Tillack, Y. Tao, F. Najmabadi, L. Carlson, S. Yuspeh, R. Burdt, A. Farkas, N. Shaikh, N. Amin,
More informationLaser Fusion Research with GEKKO XII and PW Laser System at Osaka
1 Laser Fusion Research with GEKKO XII and PW Laser System at Osaka Y. Izawa 1), K. Mima1), H. Azechi1), S. Fujioka 1), H. Fujita 1), Y. Fujimoto 1), T. Jitsuno 1), Y. Johzaki 1),Y. Kitagawa 1), R. Kodama
More informationCritical Path to Impact Fast Ignition Suppression of the Rayleigh-Taylor Instability
Critical Path to Impact Fast Ignition Suppression of the Rayleigh-Taylor Instability H. Azechi Vice Director Institute of Laser Engineering, Osaka University Jpn-US WS on HIF and HEDP September 28, 2005
More informationHigh intensity EUV and soft X-ray X plasma sources modelling
High intensity EUV and soft X-ray X plasma sources modelling Sergey V. Zakharov +, Vasily S. Zakharov +,Peter Choi, Alex Yu. Krukovskiy, Vladimir G. Novikov, Anna D. Solomyannaya NANO UV sas EPPRA sas
More informationResearch Article Development of Laser-Produced Tin Plasma-Based EUV Light Source Technology for HVM EUV Lithography
Physics Research International Volume, Article ID 49495, pages doi:.55//49495 Research Article Development of Laser-Produced Tin Plasma-Based EUV Light Source Technology for HVM EUV Lithography Junichi
More informationLaser Ablation Studies at UCSD and Plans for Time and Space Resolved Ejecta Measurements
Laser Ablation Studies at UCSD and Plans for Time and Space Resolved Ejecta Measurements M. S. Tillack, Y. Tao, Y. Ueno*, R. Burdt, S. Yuspeh, A. Farkas, 2 nd TITAN workshop on MFE/IFE common research
More informationEXTREME ULTRAVIOLET AND SOFT X-RAY LASERS
Chapter 7 EXTREME ULTRAVIOLET AND SOFT X-RAY LASERS Hot dense plasma lasing medium d θ λ λ Visible laser pump Ch07_00VG.ai The Processes of Absorption, Spontaneous Emission, and Stimulated Emission Absorption
More informationUtsunomiya University Experiments, September - November 2011
Colm O Gorman 1, Thomas Cummins 1, Takamitsu Otsuka 2, Noboru Yugami 2,4,Weihua Jiang 5, Akira Endo 6, Bowen Li 1, Padraig Dunne 1,Emma Sokell 1, Gerry O Sullivan 1 and Takeshi Higashiguchi 2,4 Utsunomiya
More informationattosecond laser pulse
Kenichi Ishikawa ( ) http://ishiken.free.fr/english/lecture.html ishiken@atto.t.u-tokyo.ac.jp Advanced Plasma and Laser Science E attosecond laser pulse 1 attosecond pulse train (APT) isolated attosecond
More informationFUJIOKA Shinsuke Institute of Laser Engineering, Osaka University IAEA-FEC2016, 20 th October 2016
B-generation coil Cone Dense plasma core FUJIOKA Shinsuke Institute of Laser Engineering, Osaka University IAEA-FEC2016, 20 th October 2016 1 Summary Fast ignition with external B-field A critical problem
More informationNumerical Study of Advanced Target Design for FIREX-I
1 IF/P7-18 Numerical Study of Advanced Target Design for FIREX-I H. Nagatomo 1), T. Johzaki 1), H. Sakagami 2) Y. Sentoku 3), A. Sunahara 4), T. Taguchi 5), Y. Nakao 6), H. Shiraga 1), H. Azechi 1), K.
More informationEUV spectroscopy of mass-limited Sn-doped laser microplasmas
EUV spectroscopy of mass-limited Sn-doped laser microplasmas Simi George, Chiew-Seng Koay, Kazutoshi Takenoshita, Robert Bernath, Moza Al-Rabban a, Christian Keyser b, Vivek Bakshi c, Howard Scott d, &
More informationUTA versus line emission for EUVL: Studies on xenon emission at the NIST EBIT
UTA versus line emission for EUVL: Studies on xenon emission at the NIST EBIT K. Fahy, P. Dunne, L. Mckinney, G. O Sullivan, E. Sokell, J. White, A. Aguilar, J. M. Pomeroy, J. N. Tan, B. Blagojevic, et
More informationWuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan , China
Research of the EUV radiation and CO 2 Laser produced tin plasma Wang Xinbing 1 *, Zuo DouLuo 1, Lu Peixiang 2, Wu Tao 3 1 Wuhan National Laboratory for Optoelectronics, Huazhong University of Science
More informationCharacterization of the Tin-doped droplet laser plasma EUVL sources for HVM
Characterization of the Tin-doped droplet laser plasma EUVL sources for HVM Kazutoshi Takenoshita a, Simi A. George a, Tobias Schmid a, Chiew-Seng Koay a*, Jose Cunado a, Robert Bernath a, Christopher
More informationPIs: Louis DiMauro & Pierre Agostini
Interaction of Clusters with Intense, Long Wavelength Fields PIs: Louis DiMauro & Pierre Agostini project objective: explore intense laser-cluster interactions in the strong-field limit project approach:
More informationStatus of EUV Sources for Mask Metrology
Status of EUV Sources for Mask Metrology Vivek Bakshi, Ph.D. EUV Litho Inc. 10202 Womack Road, Austin, TX 78748 USA www.euvlitho.com vivek.bakshi@euvlitho.com Outline Background Current Technology Status
More informationULTRA-INTENSE LASER PLASMA INTERACTIONS RELATED TO FAST IGNITOR IN INERTIAL CONFINEMENT FUSION
ULTRA-INTENSE LASER PLASMA INTERACTIONS RELATED TO FAST IGNITOR IN INERTIAL CONFINEMENT FUSION R. KODAMA, H. FUJITA, N. IZUMI, T. KANABE, Y. KATO*, Y. KITAGAWA, Y. SENTOKU, S. NAKAI, M. NAKATSUKA, T. NORIMATSU,
More informationInfluence of an intensive UV preionization on evolution and EUV-emission of the laser plasma with Xe gas target (S12)
Influence of an intensive UV preionization on evolution and EUV-emission of the laser plasma with Xe gas target (S12) 2013 Int. Workshop on EUV and Soft X-ray Sources UCD, Dublin, November 4-7, 2013 A.Garbaruk
More informationHigh-density implosion via suppression of Rayleigh Taylor instability
Journal of Physics: Conference Series PAPER OPEN ACCESS High-density implosion via suppression of Rayleigh Taylor instability Recent citations - Experimental study of shock-accelerated inclined heavy gas
More informationDebris characterization and mitigation from microscopic laser-plasma tin-doped droplet EUV sources
Debris characterization and mitigation from microscopic laser-plasma tin-doped droplet EUV sources Kazutoshi Takenoshita, Chiew-Seng Koay, Somsak Teerawattansook, & Martin Richardson Laser Plasma Laboratory,
More informationThis work was performed under the auspices of the U.S. Department of Energy by Lawrence Livermore National Laboratory under contract
This work was performed under the auspices of the U.S. Department of Energy by under contract DE-AC52-7NA27344. Lawrence Livermore National Security, LLC The ITER tokamak Tungsten (W) is attractive as
More informationJoint ICTP-IAEA Workshop on Fusion Plasma Modelling using Atomic and Molecular Data January 2012
2327-4 Joint ICTP- Workshop on Fusion Plasma Modelling using Atomic and Molecular Data 23-27 January 2012 Atomic Processes Modeling in Plasmas Modeling Spectroscopic Observables from Plasmas Hyun-Kyung
More informationEUV Lithography and EUVL sources: from the beginning to NXE and beyond. V. Banine
EUV Lithography and EUVL sources: from the beginning to NXE and beyond. V. Banine Content EUV lithography: History and status EUV sources- historical perspective: Age of choice Age of Xe Age of Sn Age
More informationIntegrated simulations of fast ignition of inertial fusion targets
Integrated simulations of fast ignition of inertial fusion targets Javier Honrubia School of Aerospace Engineering Technical University of Madrid, Spain 11 th RES Users Meeting, Santiago de Compostela,
More informationPolymath Research Inc.
Can We Really Control Stimulated Raman and Brillouin Backscattering by Surposing Large Amplitude Waves onto the Plasma an Making it an Inhospitable Environment for Their Growth? Bedros Afeyan & M.Mardirian
More informationPlasma Chemistry Study in an Inductively Coupled Dielectric Etcher
Plasma Chemistry Study in an Inductively Coupled Dielectric Etcher Chunshi Cui, John Trow, Ken Collins, Betty Tang, Luke Zhang, Steve Shannon, and Yan Ye Applied Materials, Inc. October 26, 2000 10/28/2008
More informationLaser and pinching discharge plasmas spectral characteristics in water window region
Laser and pinching discharge plasmas spectral characteristics in water window region P Kolar 1, M Vrbova 1, M Nevrkla 2, P Vrba 2, 3 and A Jancarek 2 1 Czech Technical University in Prague, Faculty of
More informationDesign study of the divertor Thomson scattering system for JT-60SA
J. Plasma Fusion Res. SERIES, Vol. 9 (0) Design study of the divertor Thomson scattering system for JT-0SA Shin Kajita ), Takaki Hatae ), Kiyoshi Itami ), Noriyasu Ohno ), Tomohide Nakano ) ) EcoTopia
More informationRadiation-Hydrodynamics, Spectral, and Atomic Physics Modeling of Laser-Produced Plasma EUV Lithography Light Sources
Radiation-Hydrodynamics, Spectral, and Atomic Physics Modeling of aser-produced Plasma EUV ithography ight Sources J. J. MacFarlane, C.. Rettig, P. Wang, I. E. Golovkin, and P. R. Woodruff Prism Computational
More informationApplication of atomic data to quantitative analysis of tungsten spectra on EAST tokamak
Technical Meeting on Uncertainty Assessment and Benchmark Experiments for Atomic and Molecular Data for Fusion Applications, 19-21 December 2016, Vienna, Austria Application of atomic data to quantitative
More informationThe Future of EUV sources: a FIRE perspective
The Future of EUV sources: a FIRE perspective C Fanara EPPRA sas 2010 International Workshop on Extreme Ultraviolet Sources University College Dublin Dublin, Ireland - November 13-15 2010 OUTLOOK 1. EPPRA:
More informationEffects of excitation laser wavelength on Ly-a and He-a line emission from nitrogen plasmas
PHYSICS OF PLASMAS 20, 013105 (2013) Effects of excitation laser wavelength on Ly-a and He-a line emission from nitrogen plasmas S. S. Harilal, G. V. Miloshevsky, T. Sizyuk, and A. Hassanein Center for
More informationPIC simulations of laser interactions with solid targets
PIC simulations of laser interactions with solid targets J. Limpouch, O. Klimo Czech Technical University in Prague, Faculty of Nuclear Sciences and Physical Engineering, Břehová 7, Praha 1, Czech Republic
More informationAnswers to questions on exam in laser-based combustion diagnostics on March 10, 2006
Answers to questions on exam in laser-based combustion diagnostics on March 10, 2006 1. Examples of advantages and disadvantages with laser-based combustion diagnostic techniques: + Nonintrusive + High
More informationMulti-Scale Simulations for Fast Ignition. H. Nagatomo, T. Johzaki, A. Sunahara, and K. Mima Institute of Laser Engineering g Osaka University
Multi-Scale Simulations for Fast Ignition and Related Laser Plasma Physics H. Nagatomo, T. Johzaki, A. Sunahara, and K. Mima Institute of Laser Engineering g Osaka University Y. Sentoku University of Nevada
More informationLaser plasma EUVL sources progress and challenges
Laser plasma EUVL sources progress and challenges M. Richardson, C-S. Koay, K. Takenoshita, C. Keyser *, S. George, S. Teerawattansook Laser Plasma Laboratory, School of Optics: CREOL & FPCE University
More informationStudies of high-repetition-rate laser plasma EUV sources from droplet targets e. turcu 2
Appl. Phys. A 77, 217 221 (2003) DOI: 10.1007/s00339-003-2142-4 Applied Physics A Materials Science & Processing c. keyser 1, g. schriever 1, m. richardson 1, Studies of high-repetition-rate laser plasma
More informationMechanisms of Visible Photoluminescence from Size-Controlled Silicon Nanoparticles
Mat. Res. Soc. Symp. Proc. Vol. 737 23 Materials Research Society F1.5.1 Mechanisms of Visible Photoluminescence from Size-Controlled Silicon Nanoparticles Toshiharu Makino *, Nobuyasu Suzuki, Yuka Yamada,
More informationA mass-limited Sn target irradiated by dual laser pulses for an EUVL source
A mass-limited Sn target irradiated by dual laser pulses for an EUVL source Y.Tao *1, 2, M.S.Tillack 1, 2, K.L.Sequoia 1, 2, and F.Najmabadi 2, 3 1 Department of Mechanical and Aerospace Engineering, 2
More informationProperties of High Intensity EUV Micro-Plasma Pulsed Discharge EUV source
Properties of High Intensity EUV Micro-Plasma Pulsed Discharge EUV source P. Choi, S.V. Zakharov, R. Aliaga Rossel, O. Benali, O. Sarroukh, V.S. Zakharov EPPRA NanoUV Abstract EPPRA has developed a unique
More informationLaser-driven proton acceleration from cryogenic hydrogen jets
Laser-driven proton acceleration from cryogenic hydrogen jets new prospects in tumor therapy and laboratory astroparticle physics C. Roedel SLAC National Accelerator Laboratory & Friedrich-Schiller-University
More informationUpdate on MJ Laser Target Physics
Update on MJ Laser Target Physics P.A.Holstein, J.Giorla, M.Casanova, F.Chaland, C.Cherfils, E. Dattolo, D.Galmiche, S.Laffite, E.Lefebvre, P.Loiseau, M.C. Monteil, F.Poggi, G.Riazuelo, Y.Saillard CEA
More informationThe PETAL+ project X-ray and particle diagnostics for plasma experiments at LMJ - PETAL
PETAL+ plasma diagnostics The PETAL+ project X-ray and particle diagnostics for plasma experiments at LMJ - PETAL Jean-Éric Ducret CEA-Saclay/IRFU/Service d Astrophysique & CELIA UMR5107, U. Bordeaux CEA
More informationRadiation hydrodynamics of tin targets for laser-plasma EUV sources
Radiation hydrodynamics of tin targets for laser-plasma EUV sources M. M. Basko, V. G. Novikov, A. S. Grushin Keldysh Institute of Applied Mathematics, Moscow, Russia RnD-ISAN, Troitsk, Moscow, Russia
More informationTowards 100 MeV proton generation using ultrathin targets irradiated with petawatt laser pulses
IZEST_Tokyo 2013.11.18 Towards 100 MeV proton generation using ultrathin targets irradiated with petawatt laser pulses Chang Hee Nam 1,2, I J. Kim 1,3, H. T. Kim 1,3, I. W. Choi 1,3, K. H. Pae 1,3, C.
More informationExtreme-ultraviolet radiation transport in small scale length laser-produced tin plasmas
University of California, San Diego UCSD-CER-09-01 Extreme-ultraviolet radiation transport in small scale length laser-produced tin plasmas Kevin L. Sequoia 5 February 2009 Center for Energy Research University
More informationProgress of Confinement Physics Study in Compact Helical System
1st IAEA Fusion Energy Conference Chengdu, China, 16-1 October, 6 IAEA-CN-149/ EX/5-5Rb Progress of Confinement Physics Study in Compact Helical System S. Okamura et al. NIFS-839 Oct. 6 1 EX/5-5Rb Progress
More informationStudy of matter in extreme conditions using 4th generation FEL light sources
Study of matter in extreme conditions using 4th generation FEL light sources Sam Vinko Department of Physics Clarendon Laboratory University of Oxford Workshop on Science with Free Electron Lasers Shanghai,
More informationQ. Shen 1,2) and T. Toyoda 1,2)
Photosensitization of nanostructured TiO 2 electrodes with CdSe quntum dots: effects of microstructure in substrates Q. Shen 1,2) and T. Toyoda 1,2) Department of Applied Physics and Chemistry 1), and
More informationStimulated Raman Scattering in Direct-Drive Inertial Confinement Fusion
Stimulated Raman Scattering in Direct-Drive Inertial Confinement Fusion View ports 5 FABS Experiments carried out at the National Ignition Facility FABS power (arbitrary units) Plasma-producing beams (
More informationESTIMATION OF ELECTRON TEMPERATURE IN ATMOSPHERIC PRESSURE DIELECTRIC BARRIER DISCHARGE USING LINE INTENSITY RATIO METHOD
KATHMANDU UNIVERSITY JOURNAL OF SCIENCE, ENGINEERING AND TECHNOLOGY ESTIMATION OF ELECTRON TEMPERATURE IN ATMOSPHERIC PRESSURE DIELECTRIC BARRIER DISCHARGE USING LINE INTENSITY RATIO METHOD 1, 2 R. Shrestha,
More informationExperimental and numerical investigations on the density profile of CO 2 laser-produced Sn plasma for an EUVL source
Experimental and numerical investigations on the density profile of CO 2 laser-produced Sn plasma for an EUVL source Y. Tao* a, Y.Ueno a,b, S.Yuspeh a,c, R.A.Burdt a,c, N. Amin a,d, N. M. Shaikh a,e, M.S.Tillack
More informationDevelopment of a dispersion interferometer for magnetic confinement plasma and its application to atmospheric pressure plasmas
Development of a dispersion interferometer for magnetic confinement plasma and its application to atmospheric pressure plasmas T. Akiyama 1, a, R. Yasuhara a, K. Kawahata a, K. Nakayama b, S. Okajima b,
More informationMeasurement of EUV scattering from Mo/Si multilayer mirrors
Measurement of EUV scattering from Mo/Si multilayer mirrors N. Kandaka, T. Kobayashi, T. Komiya, M. Shiraishi, T. Oshino and K. Murakami Nikon Corp. 3 rd EUVL Symposium Nov. 2-4 2004 (Miyazaki, JAPAN)
More informationGA A25842 STUDY OF NON-LTE SPECTRA DEPENDENCE ON TARGET MASS IN SHORT PULSE LASER EXPERIMENTS
GA A25842 STUDY OF NON-LTE SPECTRA DEPENDENCE ON TARGET MASS IN SHORT PULSE LASER EXPERIMENTS by C.A. BACK, P. AUDBERT, S.D. BATON, S.BASTIANI-CECCOTTI, P. GUILLOU, L. LECHERBOURG, B. BARBREL, E. GAUCI,
More informationOptimizing a Magnetic Field Strength of a Magnetic Thrust Chamber
Optimizing a Magnetic Field Strength of a Magnetic Thrust Chamber IEPC-2015-91258 /ISTS-2015-b-91258 Presented at Joint Conference of 30th International Symposium on Space Technology and Science 34th International
More informationDynamics of carbon and tungsten colliding plumes
Dynamics of carbon and tungsten colliding plumes H. Sato 2,Y. Hirooka 1, K. A. Tanaka 2 and the Reactor Eng. Group 2 1) National Institute for Fusion Science 2) Osaka University 2009,Oct 8 th -9 th TITAN
More information