ECEN 3320 Semiconductor Devices Final exam - Sunday December 17, 2000
|
|
- Ruby Moody
- 3 years ago
- Views:
Transcription
1 Your Name: ECEN 3320 Semiconductor Devices Final exam - Sunday December 17, Review questions a) Illustrate the generation of a photocurrent in a p-n diode by drawing an energy band diagram. Indicate the photo-generated carriers and their direction of motion. (5 points) b) How does recombination in the base-emitter depletion region affect the emitter, base and collector current? (5 points)
2 c) Draw an MOS flatband diagram. Indicate the work function of the metal and the semiconductor as well as the flatband voltage. Draw it approximately to scale using Φ M = 4.1 V, χ = 4.05 V, E g = 1.12 ev (silicon) and N a = cm -3. (5 points) d) Name the three bias regimes of an MOS capacitor and explain what happens in the semiconductor in each of these bias modes. (5 points)
3 e) Why is the high frequency capacitance constant in inversion? (5 points) f) Which device has most positive threshold voltage a depletion mode p-type MOSFET or an enhancement mode p-type MOSFET? Explain. (5 points)
4 2. An aluminum-silicon Schottky diode has a breakdown voltage of 5 V. The silicon is p-type with a doping N a = cm -3. Calculate the breakdown field and the depletion layer width. (Φ M = 4.0 V) (15 points)
5 3. Consider a silicon bipolar transistor with N E = cm -3, N B = cm -3 and N C = cm -3 The quasi-neutral width in the emitter and base are w E = 1 µm and w B = 0.2 µm. a) Calculate the majority as well as the excess minority carrier charge per unit area in the base region. (V BE = 0.65 V, V BC = 0 V) b) Find the minority carrier lifetime in the base for which the transistor has a current gain of 100. Use µ n = 1000 cm 2 /V-s and µ p = 300 cm 2 /V-s. (25 points)
6 4. The gate length of a silicon nmosfet is reduced from 0.18 µm to 0.13 µm. At the same time the doping density of the substrate is increased from 8 x cm -3 to 1.2 x cm -3 and the gate oxide thickness is reduced from 6 to 4 nm. By what amount must the charge density (per unit area) at the interface be changed to reduce the threshold voltage from 0.15 V to 0.1 V? Indicate whether the charge density must be increased or decreased. The gate material is heavily doped n-type poly-silicon with a work function of 4 V. (30 points)
7 Extra credit problem: Find the threshold voltage of the 0.13 µm device (Problem 4) if the bulk-to-source voltage equals 4 V. (5 points)
8 Appendix 2: Physical constants Avogadro's number Bohr radius Boltzmann's constant Electronic charge Free electron rest mass Permeability of free space Permittivity of free space Planck's constant Reduced Planck's constant Proton rest mass Rydberg constant Speed of light in vacuum Thermal voltage (at T = 300 K) N A a 0 k q m x atoms per mole picometer Angstrom 1.38 x Joule/Kelvin 8.62 x 10-5 electron Volt/Kelvin x Coulomb 9.11 x kilogram 5.69 x ev s 2 cm -2 µ 0 4π x 10-7 Henry/meter ε 0 h h M R c V t x Farad/meter x Farad/centimeter x Joule second x electron Volt second x Joule second 1.67 x Kilogram x Joule electron Volt x 10 8 meter/second x centimeter/second millivolt
9 Appendix 3: Material Parameters Name Symbol Germanium Silicon Gallium Arsenide Bandgap energy at 300 K E g (ev) Breakdown Field E br (V/cm) x 10 5 * 4 x 10 5 Effective density of states in the conduction band at 300 K Effective density of states in the valence band at 300 K N c (cm -3 ) 1.02 x x x N v (cm -3 ) 5.65 x x x Intrinsic concentration at 300 K n i (cm -3 ) 2.8 x x x 10 6 Effective mass for density of states calculations Electrons m e * / m Holes m h * / m Electron affinity χ (V) Mobility at 300 K (undoped) Electrons µ n (cm 2 /V-s) Holes µ p (cm 2 /V-s) Relative dielectric constant ε s / ε Thermal conductivity at 300 K χ (W/cmK) Refractive index at nm wavelength n * See also section 4.5.1: Breakdown field in silicon at 300 K - i i i µ µ µ = µ max min min + α N 1+ ( ) N r Arsenic Phosphorous Boron µ min (cm 2 /V-s) µ max (cm 2 /V-s) N r (cm -3 ) 9.68 x x x α
Appendix 1: List of symbols
Appendix 1: List of symbols Symbol Description MKS Units a Acceleration m/s 2 a 0 Bohr radius m A Area m 2 A* Richardson constant m/s A C Collector area m 2 A E Emitter area m 2 b Bimolecular recombination
Final Examination EE 130 December 16, 1997 Time allotted: 180 minutes
Final Examination EE 130 December 16, 1997 Time allotted: 180 minutes Problem 1: Semiconductor Fundamentals [30 points] A uniformly doped silicon sample of length 100µm and cross-sectional area 100µm 2
1 Name: Student number: DEPARTMENT OF PHYSICS AND PHYSICAL OCEANOGRAPHY MEMORIAL UNIVERSITY OF NEWFOUNDLAND. Fall :00-11:00
1 Name: DEPARTMENT OF PHYSICS AND PHYSICAL OCEANOGRAPHY MEMORIAL UNIVERSITY OF NEWFOUNDLAND Final Exam Physics 3000 December 11, 2012 Fall 2012 9:00-11:00 INSTRUCTIONS: 1. Answer all seven (7) questions.
Semiconductor Physics fall 2012 problems
Semiconductor Physics fall 2012 problems 1. An n-type sample of silicon has a uniform density N D = 10 16 atoms cm -3 of arsenic, and a p-type silicon sample has N A = 10 15 atoms cm -3 of boron. For each
UNIVERSITY OF CALIFORNIA College of Engineering Department of Electrical Engineering and Computer Sciences. EECS 130 Professor Ali Javey Fall 2006
UNIVERSITY OF CALIFORNIA College of Engineering Department of Electrical Engineering and Computer Sciences EECS 130 Professor Ali Javey Fall 2006 Midterm I Name: Closed book. One sheet of notes is allowed.
UNIVERSITY OF CALIFORNIA College of Engineering Department of Electrical Engineering and Computer Sciences. EECS 130 Professor Ali Javey Fall 2006
UNIVERSITY OF CALIFORNIA College of Engineering Department of Electrical Engineering and Computer Sciences EECS 130 Professor Ali Javey Fall 2006 Midterm 2 Name: SID: Closed book. Two sheets of notes are
Semiconductor Physics Problems 2015
Semiconductor Physics Problems 2015 Page and figure numbers refer to Semiconductor Devices Physics and Technology, 3rd edition, by SM Sze and M-K Lee 1. The purest semiconductor crystals it is possible
Quiz #1 Practice Problem Set
Name: Student Number: ELEC 3908 Physical Electronics Quiz #1 Practice Problem Set? Minutes January 22, 2016 - No aids except a non-programmable calculator - All questions must be answered - All questions
MOS CAPACITOR AND MOSFET
EE336 Semiconductor Devices 1 MOS CAPACITOR AND MOSFET Dr. Mohammed M. Farag Ideal MOS Capacitor Semiconductor Devices Physics and Technology Chapter 5 EE336 Semiconductor Devices 2 MOS Capacitor Structure
Electrical Characteristics of MOS Devices
Electrical Characteristics of MOS Devices The MOS Capacitor Voltage components Accumulation, Depletion, Inversion Modes Effect of channel bias and substrate bias Effect of gate oide charges Threshold-voltage
Electronic Devices & Circuits
Electronic Devices & Circuits For Electronics & Communication Engineering By www.thegateacademy.com Syllabus Syllabus for Electronic Devices Energy Bands in Intrinsic and Extrinsic Silicon, Carrier Transport,
an introduction to Semiconductor Devices
an introduction to Semiconductor Devices Donald A. Neamen Chapter 6 Fundamentals of the Metal-Oxide-Semiconductor Field-Effect Transistor Introduction: Chapter 6 1. MOSFET Structure 2. MOS Capacitor -
p = {470.5 [1+(N i 2.23E17) ]}+44.9, in cm 2 /V-sec. 14. For electrons in silicon doped primarily with phosphorous, assume
Final - EE 5340/001 (print last name) (print first name) SOLUTION Wednesday, December 15, 2010, 11:00 AM, 108 Nedderman Hall 2 hr 30 min allowed (last four digits of your student #) (e-mail if new) Instructions:
Fundamentals of the Metal Oxide Semiconductor Field-Effect Transistor
Triode Working FET Fundamentals of the Metal Oxide Semiconductor Field-Effect Transistor The characteristics of energy bands as a function of applied voltage. Surface inversion. The expression for the
6.012 Electronic Devices and Circuits
Page 1 of 12 YOUR NAME Department of Electrical Engineering and Computer Science Massachusetts Institute of Technology 6.012 Electronic Devices and Circuits FINAL EXAMINATION Open book. Notes: 1. Unless
Section 12: Intro to Devices
Section 12: Intro to Devices Extensive reading materials on reserve, including Robert F. Pierret, Semiconductor Device Fundamentals Bond Model of Electrons and Holes Si Si Si Si Si Si Si Si Si Silicon
UNIVERSITY OF CALIFORNIA, BERKELEY College of Engineering Department of Electrical Engineering and Computer Sciences
UNIVERSITY OF CALIFORNIA, BERKELEY College of Engineering Department of Electrical Engineering and Computer Sciences EE 105: Microelectronic Devices and Circuits Spring 2008 MIDTERM EXAMINATION #1 Time
Solution 11:00 AM, Wednesday February 10, 2010, 108 Nedderman Hall 80 minutes allowed (last four digits of your student #) ( if new)
MidTerm - EE 5342 (print last name) (print first name) Solution 11:00 AM, Wednesday February 10, 2010, 108 Nedderman Hall 80 minutes allowed (last four digits of your student #) (e-mail if new) Instructions:
ECE 340 Lecture 39 : MOS Capacitor II
ECE 340 Lecture 39 : MOS Capacitor II Class Outline: Effects of Real Surfaces Threshold Voltage MOS Capacitance-Voltage Analysis Things you should know when you leave Key Questions What are the effects
Lecture 12: MOS Capacitors, transistors. Context
Lecture 12: MOS Capacitors, transistors Context In the last lecture, we discussed PN diodes, and the depletion layer into semiconductor surfaces. Small signal models In this lecture, we will apply those
6.012 Electronic Devices and Circuits Spring 2005
6.012 Electronic Devices and Circuits Spring 2005 May 16, 2005 Final Exam (200 points) -OPEN BOOK- Problem NAME RECITATION TIME 1 2 3 4 5 Total General guidelines (please read carefully before starting):
Schottky Rectifiers Zheng Yang (ERF 3017,
ECE442 Power Semiconductor Devices and Integrated Circuits Schottky Rectifiers Zheng Yang (ERF 3017, email: yangzhen@uic.edu) Power Schottky Rectifier Structure 2 Metal-Semiconductor Contact The work function
Student Number: CARLETON UNIVERSITY SELECTED FINAL EXAMINATION QUESTIONS
Name: CARLETON UNIVERSITY SELECTE FINAL EXAMINATION QUESTIONS URATION: 6 HOURS epartment Name & Course Number: ELEC 3908 Course Instructors: S. P. McGarry Authorized Memoranda: Non-programmable calculators
ESE 570: Digital Integrated Circuits and VLSI Fundamentals
ESE 570: Digital Integrated Circuits and VLSI Fundamentals Lec 4: January 23, 2018 MOS Transistor Theory, MOS Model Penn ESE 570 Spring 2018 Khanna Lecture Outline! CMOS Process Enhancements! Semiconductor
UNIVERSITY OF CALIFORNIA, BERKELEY College of Engineering Department of Electrical Engineering and Computer Sciences
UNIVERSITY OF CALIFORNIA, BERKELEY College of Engineering Department of Electrical Engineering and Computer Sciences EECS 40 Spring 2000 Introduction to Microelectronic Devices Prof. King MIDTERM EXAMINATION
MSE 310/ECE 340: Electrical Properties of Materials Fall 2014 Department of Materials Science and Engineering Boise State University
MSE 310/ECE 340: Electrical Properties of Materials Fall 2014 Department of Materials Science and Engineering Boise State University Practice Final Exam 1 Read the questions carefully Label all figures
Semiconductor Physics fall 2012 problems
Semiconductor Physics fall 2012 problems 1. An n-type sample of silicon has a uniform density N D = 10 16 atoms cm -3 of arsenic, and a p-type silicon sample has N A = 10 15 atoms cm -3 of boron. For each
6.012 Electronic Devices and Circuits
Page 1 of 10 YOUR NAME Department of Electrical Engineering and Computer Science Massachusetts Institute of Technology 6.012 Electronic Devices and Circuits Exam No. 2 Thursday, November 5, 2009 7:30 to
SECTION: Circle one: Alam Lundstrom. ECE 305 Exam 5 SOLUTIONS: Spring 2016 April 18, 2016 M. A. Alam and M.S. Lundstrom Purdue University
NAME: PUID: SECTION: Circle one: Alam Lundstrom ECE 305 Exam 5 SOLUTIONS: April 18, 2016 M A Alam and MS Lundstrom Purdue University This is a closed book exam You may use a calculator and the formula
ECE 442. Spring, Lecture -2
ECE 442 Power Semiconductor Devices and Integrated circuits Spring, 2006 University of Illinois at Chicago Lecture -2 Semiconductor physics band structures and charge carriers 1. What are the types of
Current mechanisms Exam January 27, 2012
Current mechanisms Exam January 27, 2012 There are four mechanisms that typically cause currents to flow: thermionic emission, diffusion, drift, and tunneling. Explain briefly which kind of current mechanisms
CHAPTER 4: P-N P N JUNCTION Part 2. M.N.A. Halif & S.N. Sabki
CHAPTER 4: P-N P N JUNCTION Part 2 Part 2 Charge Storage & Transient Behavior Junction Breakdown Heterojunction CHARGE STORAGE & TRANSIENT BEHAVIOR Once injected across the junction, the minority carriers
ELECTRONIC DEVICES AND CIRCUITS SUMMARY
ELECTRONIC DEVICES AND CIRCUITS SUMMARY Classification of Materials: Insulator: An insulator is a material that offers a very low level (or negligible) of conductivity when voltage is applied. Eg: Paper,
6.012 Electronic Devices and Circuits
Page 1 of 1 YOUR NAME Department of Electrical Engineering and Computer Science Massachusetts Institute of Technology 6.12 Electronic Devices and Circuits Exam No. 1 Wednesday, October 7, 29 7:3 to 9:3
R. Ludwig and G. Bogdanov RF Circuit Design: Theory and Applications 2 nd edition. Figures for Chapter 6
R. Ludwig and G. Bogdanov RF Circuit Design: Theory and Applications 2 nd edition Figures for Chapter 6 Free electron Conduction band Hole W g W C Forbidden Band or Bandgap W V Electron energy Hole Valence
ESE 570: Digital Integrated Circuits and VLSI Fundamentals
ESE 570: Digital Integrated Circuits and VLSI Fundamentals Lec 4: January 29, 2019 MOS Transistor Theory, MOS Model Penn ESE 570 Spring 2019 Khanna Lecture Outline! CMOS Process Enhancements! Semiconductor
Section 12: Intro to Devices
Section 12: Intro to Devices Extensive reading materials on reserve, including Robert F. Pierret, Semiconductor Device Fundamentals EE143 Ali Javey Bond Model of Electrons and Holes Si Si Si Si Si Si Si
ECE 250 Electronic Devices 1. Electronic Device Modeling
ECE 250 Electronic Devices 1 ECE 250 Electronic Device Modeling ECE 250 Electronic Devices 2 Introduction to Semiconductor Physics You should really take a semiconductor device physics course. We can only
UNIVERSITY OF CALIFORNIA College of Engineering Department of Electrical Engineering and Computer Sciences. Professor Chenming Hu.
UNIVERSITY OF CALIFORNIA College of Engineering Department of Electrical Engineering and Computer Sciences EECS 130 Spring 2009 Professor Chenming Hu Midterm I Name: Closed book. One sheet of notes is
ESE 372 / Spring 2013 / Lecture 5 Metal Oxide Semiconductor Field Effect Transistor
Metal Oxide Semiconductor Field Effect Transistor V G V G 1 Metal Oxide Semiconductor Field Effect Transistor We will need to understand how this current flows through Si What is electric current? 2 Back
Lecture 15 OUTLINE. MOSFET structure & operation (qualitative) Review of electrostatics The (N)MOS capacitor
Lecture 15 OUTLINE MOSFET structure & operation (qualitative) Review of electrostatics The (N)MOS capacitor Electrostatics Charge vs. voltage characteristic Reading: Chapter 6.1 6.2.1 EE15 Spring 28 Lecture
Long Channel MOS Transistors
Long Channel MOS Transistors The theory developed for MOS capacitor (HO #2) can be directly extended to Metal-Oxide-Semiconductor Field-Effect transistors (MOSFET) by considering the following structure:
GATE SOLVED PAPER - EC
03 ONE MARK Q. In a forward biased pn junction diode, the sequence of events that best describes the mechanism of current flow is (A) injection, and subsequent diffusion and recombination of minority carriers
The Intrinsic Silicon
The Intrinsic ilicon Thermally generated electrons and holes Carrier concentration p i =n i ni=1.45x10 10 cm-3 @ room temp Generally: n i = 3.1X10 16 T 3/2 e -1.21/2KT cm -3 T= temperature in K o (egrees
Lecture 04 Review of MOSFET
ECE 541/ME 541 Microelectronic Fabrication Techniques Lecture 04 Review of MOSFET Zheng Yang (ERF 3017, email: yangzhen@uic.edu) What is a Transistor? A Switch! An MOS Transistor V GS V T V GS S Ron D
Lecture 15 OUTLINE. MOSFET structure & operation (qualitative) Review of electrostatics The (N)MOS capacitor
Lecture 15 OUTLINE MOSFET structure & operation (qualitative) Review of electrostatics The (N)MOS capacitor Electrostatics t ti Charge vs. voltage characteristic Reading: Chapter 6.1 6.2.1 EE105 Fall 2007
! CMOS Process Enhancements. ! Semiconductor Physics. " Band gaps. " Field Effects. ! MOS Physics. " Cut-off. " Depletion.
ESE 570: Digital Integrated Circuits and VLSI Fundamentals Lec 4: January 3, 018 MOS Transistor Theory, MOS Model Lecture Outline! CMOS Process Enhancements! Semiconductor Physics " Band gaps " Field Effects!
Spring Semester 2012 Final Exam
Spring Semester 2012 Final Exam Note: Show your work, underline results, and always show units. Official exam time: 2.0 hours; an extension of at least 1.0 hour will be granted to anyone. Materials parameters
ESE 570: Digital Integrated Circuits and VLSI Fundamentals
ESE 570: Digital Integrated Circuits and VLSI Fundamentals Lec 4: January 24, 2017 MOS Transistor Theory, MOS Model Penn ESE 570 Spring 2017 Khanna Lecture Outline! Semiconductor Physics " Band gaps "
Lecture (02) Introduction to Electronics II, PN Junction and Diodes I
Lecture (02) Introduction to Electronics II, PN Junction and Diodes I By: Dr. Ahmed ElShafee ١ Agenda Current in semiconductors/conductors N type, P type semiconductors N Type Semiconductor P Type Semiconductor
Lecture (02) PN Junctions and Diodes
Lecture (02) PN Junctions and Diodes By: Dr. Ahmed ElShafee ١ I Agenda N type, P type semiconductors N Type Semiconductor P Type Semiconductor PN junction Energy Diagrams of the PN Junction and Depletion
ECE 305 Exam 5 SOLUTIONS: Spring 2015 April 17, 2015 Mark Lundstrom Purdue University
NAME: PUID: : ECE 305 Exam 5 SOLUTIONS: April 17, 2015 Mark Lundstrom Purdue University This is a closed book exam. You may use a calculator and the formula sheet at the end of this exam. Following the
ECE-342 Test 2 Solutions, Nov 4, :00-8:00pm, Closed Book (one page of notes allowed)
ECE-342 Test 2 Solutions, Nov 4, 2008 6:00-8:00pm, Closed Book (one page of notes allowed) Please use the following physical constants in your calculations: Boltzmann s Constant: Electron Charge: Free
Introduction to Power Semiconductor Devices
ECE442 Power Semiconductor Devices and Integrated Circuits Introduction to Power Semiconductor Devices Zheng Yang (ERF 3017, email: yangzhen@uic.edu) Power Semiconductor Devices Applications System Ratings
Designing Information Devices and Systems II A. Sahai, J. Roychowdhury, K. Pister Discussion 1A
EECS 16B Spring 2019 Designing Information Devices and Systems II A. Sahai, J. Roychowdhury, K. Pister Discussion 1A 1 Semiconductor Physics Generally, semiconductors are crystalline solids bonded into
1st Year-Computer Communication Engineering-RUC. 4- P-N Junction
4- P-N Junction We begin our study of semiconductor devices with the junction for three reasons. (1) The device finds application in many electronic systems, e.g., in adapters that charge the batteries
Lecture 2. Introduction to semiconductors Structures and characteristics in semiconductors. Fabrication of semiconductor sensor
Lecture 2 Introduction to semiconductors Structures and characteristics in semiconductors Semiconductor p-n junction Metal Oxide Silicon structure Semiconductor contact Fabrication of semiconductor sensor
Lecture 7 PN Junction and MOS Electrostatics(IV) Metal Oxide Semiconductor Structure (contd.)
Lecture 7 PN Junction and MOS Electrostatics(IV) Metal Oxide Semiconductor Structure (contd.) Outline 1. Overview of MOS electrostatics under bias 2. Depletion regime 3. Flatband 4. Accumulation regime
ELECTRONIC I Lecture 1 Introduction to semiconductor. By Asst. Prof Dr. Jassim K. Hmood
ELECTRONIC I Lecture 1 Introduction to semiconductor By Asst. Prof Dr. Jassim K. Hmood SOLID-STATE ELECTRONIC MATERIALS Electronic materials generally can be divided into three categories: insulators,
Extensive reading materials on reserve, including
Section 12: Intro to Devices Extensive reading materials on reserve, including Robert F. Pierret, Semiconductor Device Fundamentals EE143 Ali Javey Bond Model of Electrons and Holes Si Si Si Si Si Si Si
ECE-305: Fall 2017 Metal Oxide Semiconductor Devices
C-305: Fall 2017 Metal Oxide Semiconductor Devices Pierret, Semiconductor Device Fundamentals (SDF) Chapters 15+16 (pp. 525-530, 563-599) Professor Peter Bermel lectrical and Computer ngineering Purdue
EECS130 Integrated Circuit Devices
EECS130 Integrated Circuit Devices Professor Ali Javey 10/02/2007 MS Junctions, Lecture 2 MOS Cap, Lecture 1 Reading: finish chapter14, start chapter16 Announcements Professor Javey will hold his OH at
Sheng S. Li. Semiconductor Physical Electronics. Second Edition. With 230 Figures. 4) Springer
Sheng S. Li Semiconductor Physical Electronics Second Edition With 230 Figures 4) Springer Contents Preface 1. Classification of Solids and Crystal Structure 1 1.1 Introduction 1 1.2 The Bravais Lattice
Conductivity and Semi-Conductors
Conductivity and Semi-Conductors J = current density = I/A E = Electric field intensity = V/l where l is the distance between two points Metals: Semiconductors: Many Polymers and Glasses 1 Electrical Conduction
! CMOS Process Enhancements. ! Semiconductor Physics. " Band gaps. " Field Effects. ! MOS Physics. " Cut-off. " Depletion.
ESE 570: Digital Integrated Circuits and VLSI Fundamentals Lec 4: January 9, 019 MOS Transistor Theory, MOS Model Lecture Outline CMOS Process Enhancements Semiconductor Physics Band gaps Field Effects
Semiconductor Physical Electronics
Semiconductor Physical Electronics Sheng S. Li Department of Electrical Engineering University of Florida Gainesville, Florida Plenum Press New York and London Contents CHAPTER 1. Classification of Solids
EE 560 MOS TRANSISTOR THEORY
1 EE 560 MOS TRANSISTOR THEORY PART 1 TWO TERMINAL MOS STRUCTURE V G (GATE VOLTAGE) 2 GATE OXIDE SiO 2 SUBSTRATE p-type doped Si (N A = 10 15 to 10 16 cm -3 ) t ox V B (SUBSTRATE VOLTAGE) EQUILIBRIUM:
Solid State Electronics. Final Examination
The University of Toledo EECS:4400/5400/7400 Solid State Electronic Section elssf08fs.fm - 1 Solid State Electronics Final Examination Problems Points 1. 1. 14 3. 14 Total 40 Was the exam fair? yes no
Diodes. anode. cathode. cut-off. Can be approximated by a piecewise-linear-like characteristic. Lecture 9-1
Diodes mplest nonlinear circuit element Basic operation sets the foundation for Bipolar Junction Transistors (BJTs) Also present in Field Effect Transistors (FETs) Ideal diode characteristic anode cathode
Department of Electrical and Computer Engineering, Cornell University. ECE 3150: Microelectronics. Spring Exam 1 ` March 22, 2018
Department of Electrical and Computer Engineering, Cornell University ECE 3150: Microelectronics Spring 2018 Exam 1 ` March 22, 2018 INSTRUCTIONS: Every problem must be done in the separate booklet Only
B. Both A and R are correct but R is not correct explanation of A. C. A is true, R is false. D. A is false, R is true
1. Assertion (A): A demultiplexer can be used as a decode r. Reason (R): A demultiplexer can be built by using AND gates only. A. Both A and R are correct and R is correct explanation of A B. Both A and
MOS Capacitors ECE 2204
MOS apacitors EE 2204 Some lasses of Field Effect Transistors Metal-Oxide-Semiconductor Field Effect Transistor MOSFET, which will be the type that we will study in this course. Metal-Semiconductor Field
Devices. chapter Introduction. 1.2 Silicon Conductivity
chapter 1 Devices 1.1 Introduction The properties and performance of analog bicmos integrated circuits are dependent on the devices used to construct them. This chapter is a review of the operation of
Atoms? All matters on earth made of atoms (made up of elements or combination of elements).
Chapter 1 Atoms? All matters on earth made of atoms (made up of elements or combination of elements). Atomic Structure Atom is the smallest particle of an element that can exist in a stable or independent
Preview from Notesale.co.uk Page 4 of 35
field 64 If a dielectric is inserted b/w the plates of a charged capacitor, its Remains Becomes infinite capacitance constant decreases increases 65 Selenium is an insulator in the dark but when exposed
Electrons are shared in covalent bonds between atoms of Si. A bound electron has the lowest energy state.
Photovoltaics Basic Steps the generation of light-generated carriers; the collection of the light-generated carriers to generate a current; the generation of a large voltage across the solar cell; and
EE 130 Intro to MS Junctions Week 6 Notes. What is the work function? Energy to excite electron from Fermi level to the vacuum level
EE 13 Intro to S Junctions eek 6 Notes Problem 1 hat is the work function? Energy to ecite electron from Fermi level to the vacuum level Electron affinity of 4.5eV Electron affinity of Ge 4.eV orkfunction
Introduction to Semiconductor Physics. Prof.P. Ravindran, Department of Physics, Central University of Tamil Nadu, India
Introduction to Semiconductor Physics 1 Prof.P. Ravindran, Department of Physics, Central University of Tamil Nadu, India http://folk.uio.no/ravi/cmp2013 Review of Semiconductor Physics Semiconductor fundamentals
Introduction to Transistors. Semiconductors Diodes Transistors
Introduction to Transistors Semiconductors Diodes Transistors 1 Semiconductors Typical semiconductors, like silicon and germanium, have four valence electrons which form atomic bonds with neighboring atoms
Chapter 1 Overview of Semiconductor Materials and Physics
Chapter 1 Overview of Semiconductor Materials and Physics Professor Paul K. Chu Conductivity / Resistivity of Insulators, Semiconductors, and Conductors Semiconductor Elements Period II III IV V VI 2 B
Semiconductor Junctions
8 Semiconductor Junctions Almost all solar cells contain junctions between different materials of different doping. Since these junctions are crucial to the operation of the solar cell, we will discuss
Problem 9.20 Threshold bias for an n-channel MOSFET: In the text we used a criterion that the inversion of the MOSFET channel occurs when V s = ;2 F w
Prof. Jasprit Singh Fall 2001 EECS 320 Homework 11 The nals for this course are set for Friday December 14, 6:30 8:30 pm and Friday Dec. 21, 10:30 am 12:30 pm. Please choose one of these times and inform
Lecture Outline. ESE 570: Digital Integrated Circuits and VLSI Fundamentals. Review: MOSFET N-Type, P-Type. Semiconductor Physics.
ESE 57: Digital Integrated Circuits and VLSI Fundamentals Lec 4: January 24, 217 MOS Transistor Theory, MOS Model Lecture Outline! Semiconductor Physics " Band gaps " Field Effects! MOS Physics " Cutoff
Sample Exam # 2 ECEN 3320 Fall 2013 Semiconductor Devices October 28, 2013 Due November 4, 2013
Sample Exam # 2 ECEN 3320 Fall 203 Semiconductor Devices October 28, 203 Due November 4, 203. Below is the capacitance-voltage curve measured from a Schottky contact made on GaAs at T 300 K. Figure : Capacitance
MOS Capacitor MOSFET Devices. MOSFET s. INEL Solid State Electronics. Manuel Toledo Quiñones. ECE Dept. UPRM.
INEL 6055 - Solid State Electronics ECE Dept. UPRM 20th March 2006 Definitions MOS Capacitor Isolated Metal, SiO 2, Si Threshold Voltage qφ m metal d vacuum level SiO qχ 2 E g /2 qφ F E C E i E F E v qφ
Junction Diodes. Tim Sumner, Imperial College, Rm: 1009, x /18/2006
Junction Diodes Most elementary solid state junction electronic devices. They conduct in one direction (almost correct). Useful when one converts from AC to DC (rectifier). But today diodes have a wide
Misan University College of Engineering Electrical Engineering Department. Exam: Final semester Date: 17/6/2017
Misan University College of Engineering Electrical Engineering Department Subject: Electronic I Class: 1 st stage Exam: Final semester Date: 17/6/2017 Examiner: Dr. Baqer. O. TH. Time: 3 hr. Note: Answer
16EC401 BASIC ELECTRONIC DEVICES UNIT I PN JUNCTION DIODE. Energy Band Diagram of Conductor, Insulator and Semiconductor:
16EC401 BASIC ELECTRONIC DEVICES UNIT I PN JUNCTION DIODE Energy bands in Intrinsic and Extrinsic silicon: Energy Band Diagram of Conductor, Insulator and Semiconductor: 1 2 Carrier transport: Any motion
3.15 Electrical, Optical, and Magnetic Materials and Devices Caroline A. Ross Fall Term, 2005
3.15 Electrical, Optical, and Magnetic Materials and Devices Caroline A. Ross Fall Term, 2005 Exam 2 (5 pages) Closed book exam. Formulae and data are on the last 3.5 pages of the exam. This takes 80 min
Lecture 2. Introduction to semiconductors Structures and characteristics in semiconductors
Lecture 2 Introduction to semiconductors Structures and characteristics in semiconductors Semiconductor p-n junction Metal Oxide Silicon structure Semiconductor contact Literature Glen F. Knoll, Radiation
Classification of Solids
Classification of Solids Classification by conductivity, which is related to the band structure: (Filled bands are shown dark; D(E) = Density of states) Class Electron Density Density of States D(E) Examples
Chapter 7. The pn Junction
Chapter 7 The pn Junction Chapter 7 PN Junction PN junction can be fabricated by implanting or diffusing donors into a P-type substrate such that a layer of semiconductor is converted into N type. Converting
Semiconductor Devices. C. Hu: Modern Semiconductor Devices for Integrated Circuits Chapter 5
Semiconductor Devices C. Hu: Modern Semiconductor Devices for Integrated Circuits Chapter 5 Global leader in environmental and industrial measurement Wednesday 3.2. afternoon Tour around facilities & lecture
Electro - Principles I
Electro - Principles I Page 10-1 Atomic Theory It is necessary to know what goes on at the atomic level of a semiconductor so the characteristics of the semiconductor can be understood. In many cases a
Semiconductors CHAPTER 3. Introduction The pn Junction with an Applied Voltage Intrinsic Semiconductors 136
CHAPTER 3 Semiconductors Introduction 135 3.1 Intrinsic Semiconductors 136 3.2 Doped Semiconductors 139 3.3 Current Flow in Semiconductors 142 3.4 The pn Junction 148 3.5 The pn Junction with an Applied
EE 3329 Electronic Devices Syllabus ( Extended Play )
EE 3329 - Electronic Devices Syllabus EE 3329 Electronic Devices Syllabus ( Extended Play ) The University of Texas at El Paso The following concepts can be part of the syllabus for the Electronic Devices
This is the 15th lecture of this course in which we begin a new topic, Excess Carriers. This topic will be covered in two lectures.
Solid State Devices Dr. S. Karmalkar Department of Electronics and Communication Engineering Indian Institute of Technology, Madras Lecture - 15 Excess Carriers This is the 15th lecture of this course
The Devices. Jan M. Rabaey
The Devices Jan M. Rabaey Goal of this chapter Present intuitive understanding of device operation Introduction of basic device equations Introduction of models for manual analysis Introduction of models
Electronics The basics of semiconductor physics
Electronics The basics of semiconductor physics Prof. Márta Rencz, Gergely Nagy BME DED September 16, 2013 The basic properties of semiconductors Semiconductors conductance is between that of conductors
Lecture 12: MOSFET Devices
Lecture 12: MOSFET Devices Gu-Yeon Wei Division of Engineering and Applied Sciences Harvard University guyeon@eecs.harvard.edu Wei 1 Overview Reading S&S: Chapter 5.1~5.4 Supplemental Reading Background