Memristive Tunneling Devices: From Device Principles to Neuromorphic Applications

Size: px
Start display at page:

Download "Memristive Tunneling Devices: From Device Principles to Neuromorphic Applications"

Transcription

1 Memristive Tunneling Devices: From Device Principles to Neuromorphic Applications Martin Ziegler, A. Petraru, R. Soni, and H. Kohlstedt AG Nanoelektronik Technische Fakultät Christian-Albrechts-Universität zu Kiel FOR Jülich,

2 2 Neuromorphic Systems non-biogical systems functioning similarly to brains Carver Mead, 1986 Learning: Capability to process new information: Creation of knowledge Memory: Capability to capture knowledge

3 Neuromorphic Systems CNS program at the California Institute of Technology, 1986 Analog VLSI and Neural Systems, Carver Mead, Addison-Wesley 1989, p. 44 Exploring the relationship between structure of neuronal networks and their computations, whether natural or synthetic 3 Richard Feynman Neuroinformatics John Hopfield Carver Mead VLSI Technology Integrated Circuits

4 Richard Feynman s last bord 4 Richard Feynman (* 11. Mai 1918 in Queens, New York; 15. February 1988 in Los Angeles)

5 5 Computer vs. Brain = Computing Gap Computer: Arithmetic operation Brain: Pattern Recognition (Associative Memory)

6 6 Computer vs. Brain = Computing Gap Try to close the gap Computer: Arithmetic operation Brain: Pattern Recognition (Associative Memory)

7 7 Computer vs. Brain Energy Efficiency 216kW 25W IBM Watson IBM J. RES. & DEV. VOL

8 Building neuromorphic circuits 8 non-volatile device neuromorphic systems biological model neural network

9 Current Transport through Energy Barriers Formation of Barriers Electron Tunneling Thermonic Emission Theory

10 Formation of Energie Barriers 10 *taken from C. J. Chen, Introduction to Scanning Tunneling Microscopy, Oxford University Press, 1993

11 Formation of Energie Barriers 11 *taken from C. J. Chen, Introduction to Scanning Tunneling Microscopy, Oxford University Press, 1993

12 Formation of Energie Barriers 12 E F qφ m φ m : Work function: is the minimum energy to remove an electron Metal Vacuum

13 Formation of Energie Barriers 13 E F qφ m φ m : Work function: is the minimum energy to remove an electron Metal Vacuum qχ φ m = χ + φ n E C E F qφ n χ : electron affinity: minimum energy to remove an electron from the bottom of the conductance band E V Semiconductor Vacuum φ n = E C - E F

14 Formation of Energie Barriers 14 Tunnel barrier qφ m-1 E F-1 δ qv qφ m-2 E F-2 Metal 1 Metal 2 Insulator

15 Formation of Energie Barriers 15 Tunnel barrier qφ m-1 E F-1 δ qv qφ m-2 E F-2 Metal 1 Metal 2 Insulator qχ Schottky barrier qφ m qφ B E C E F Metal δ E V

16 Elastic Electron Tunneling 16 qφ 0 qφ(x) E ψ 1 ψ 2 δ Region 1 Region 2 x 1 x 2 Energy conservation: elastic Transmission probability:

17 Elastic Electron Tunneling 17 qφ 0 qφ(x) E ψ 1 ψ 2 δ Region 1 Region 2 x 1 x 2 Energy conservation: elastic Transmission probability: planar wave: ψ =ψ 0 exp(±ikx) with and WKB approximation (using classical momentum)

18 Elastic Electron Tunneling 18 qφ 0 qφ(x) E ψ 1 ψ 2 δ Region 1 Region 2 x 1 x 2 Energy conservation: elastic Transmission probability: planar wave: ψ =ψ 0 exp(±ikx) with and WKB approximation (using classical momentum)

19 Elastic Electron Tunneling 19 Tunneling current: occupied states N1 unoccupied states N2 E δ Region 1 Region 2 f1, f2: Fermi-Dirac distribution

20 Elastic Electron Tunneling 20 Fowler- Nordheim tunneling current: electron tunneling at higher voltages Region 1 Region 2 applied electrical field tunneling area

21 Thermionic Emission Theory 21 current conduction mechanism in metal-semiconductor contacts. E C qφ B Major assumptions: (1) the barrier height qφ B is assumed to be much larger than kt (2) drift diffusion effects within the barrier layer are neglected (3) the energy barrier is not affect by the image force. E F Semiconductor Metal

22 Thermionic Emission Theory 22 current conduction mechanism in metal-semiconductor contacts. number of electrons above Φ B qφ B effective density of states in conductance band E C E F Semiconductor Metal

23 Thermionic Emission Theory 23 current conduction mechanism in metal-semiconductor contacts. random motion of carriers within a Maxwellian distribution number of electrons above Φ B effective thermal velocity

24 Thermionic Emission Theory 24 current conduction mechanism in metal-semiconductor contacts. number of electrons above Φ B effective thermal velocity A*- Richardson constant

25 Thermionic Emission Theory 25 current conduction mechanism in metal-semiconductor contacts. number of electrons above Φ B effective thermal velocity +

26 Memristive Tunneling Devices How to change the transmission probability? MemFlash Cell Ionic Tunnel Junction Ferroelectric Tunneling Junctions

27 Change of Transmission Probability 27

28 Floating Gate Transistor as Memristive Device? 28 H. C. Card and W.R. Moore, Electronic Letters 25, 805 (1989). C. Diorio, P. Hasler, B.A. Mimich, and C. A. Mead, IEEE Trans. on Elec. Dev. 43, 1972 (1996). Control Gate Floating Gate Tunnel Window Source Drain Bulk Memristive operation mode of a single EEPROM cell? Reduction to a two-terminal device: simultaneous read/write I = M(x,V) V dx/dt = f(x,v)

29 MemFlash - Cell Ziegler et al., Appl Phys. Lett. 101, (2012) 29 Control Gate Floating Gate Tunnel Window Source Drain ±V D Bulk x = Q FG I D = M(Q FG,V D ) V D 1. = I FG (Q FG,V D ) dq FG /dt = I FG (Q FG,V D )

30 Capacitive Device Model Ziegler et al., Appl Phys. Lett. 101, (2012) 30 CG C C C S FG C OX C D S B D

31 Capacitive Device Model Ziegler et al., Appl Phys. Lett. 101, (2012) 31 CG C C C S FG C OX C D S V C = V S = 0 B D k B 0

32 Capacitive Device Model Ziegler et al., Appl Phys. Lett. 101, (2012) 32 CG C C C S FG C OX I FN C D S B D

33 Capacitive Device Model C. Riggert, M. Ziegler et al., Semicond. Sci. Technol. 29, (2014). 33 CG C C C S FG C OX I FN I PF I INJ C D S B D Fowler-Nordheim Pool-Frenkel Hot electrons

34 Capacitive Device Model C. Riggert, M. Ziegler et al., Semicond. Sci. Technol. 29, (2014). 34

35 Capacitive Device Model C. Riggert, M. Ziegler et al., Semicond. Sci. Technol. 29, (2014). 35 MOSFET

36 Scaling Perspective C. Riggert, M. Ziegler et al., Semicond. Sci. Technol. 29, (2014). 36 Tunneling oxide scaling

37 Scaling Perspective C. Riggert, M. Ziegler et al., Semicond. Sci. Technol. 29, (2014). 37 Tunneling oxide scaling

38 Scaling Perspective C. Riggert, M. Ziegler et al., Semicond. Sci. Technol. 29, (2014). 38 Retention times

39 C-MemFlash N-MemFlash 39 Ziegler et al., IEEE EDL 37, 186 (2016) P-MemFlash

40 C-MemFlash 1. increased number of end- resistant states 40 Ziegler et al., IEEE EDL 37, 186 (2016) 2. realizing a rich variety of memory and logic functionalities

41 Change of Transmission Probability 41 Metal Metal

42 Interface-based Memristive Devices 42 Memristive layer Tunnel barrier D. S. Jeong, H. Kohlstedt, Solid-State Electronics 63 (2011) Baik et al., Appl. Phys. Lett. 97, (2010) Modulation of the tunnel barrier by the reactive Ti layer

43 Interface-based Memristive Devices 43 Sawa, Mat. Today 11, 28 (2008) Modulation of oxygen vacancies at Metal-Semiconductor interfaces Mikheev et al., Nat Commun. 5: 3990 (2014).

44 Interface-based Memristive Devices 44 Interface trap states Metal Mobile Ions Memristive Layer E C E C Metal E C Memristive Layer E C Simmons & Verderber (1967) contribution from memristive layer Voltage-time dilemma: Schroeder et al., J. Appl. Phys. 107: (2010). long set pulses at low voltages low retention

45 Interface-based Memristive Devices 45 Aims: homogeneous interfacial effect (high resistance, contineus switching) no contribution from memristive layer retention in the order of days weeks

46 A Double Barrier Memristive Device 46 Hansen, Ziegler et al., Sci. Rep. 5: (2015) Tunnel barrier Limit resistive switching to interface effects by using thin insulating layers Schottky barrier Φ HRS TB LRS Φ S TB S Change of electron tunneling due to the modulation of Schottky barrier

47 A Double Barrier Memristive Device 47 Hansen, Ziegler et al., Sci. Rep. 5: (2015) Au 2.5 nm Nb x O y Solid state electrolyte 1.3 nm Al 2 O 3 Al Tunnel barrier

48 A Double Barrier Memristive Device 48 Hansen, Ziegler et al., Sci. Rep. 5: (2015) Au Nb x O y Al 2 O 3 Al

49 A Double Barrier Memristive Device 49 Hansen, Ziegler et al., Sci. Rep. 5: (2015) 10 8 Homogeneity on wafer level 4 '' 1 mm Resistance map

50 A Double Barrier Memristive Device 50 Hansen, Ziegler et al., Sci. Rep. 5: (2015) Interface effect 10 8 Homogeneity on wafer level 4 '' 1 mm Resistance map

51 A Double Barrier Memristive Device Interface Contribution Tunnel barrier Nb Nb x O y Al 2 O 3 Al Au 51 Hansen, Ziegler et al., Sci. Rep. 5: (2015) Schottky barrier Nb x O y Nb Schottky barrier + Tunnel barrier Au Nb x O y Al 2 O 3 Al

52 A Double Barrier Memristive Device Retention Retention for single barrier device characteristic for traps Significantly longer retention for double barrier devices 52 Hansen, Ziegler et al., Sci. Rep. 5: (2015)

53 A Double Barrier Memristive Device Retention Retention for single barrier device characteristic for traps Significantly longer retention for double barrier devices 53 Hansen, Ziegler et al., Sci. Rep. 5: (2015) Two mechanisms involved (short- and long-term)

54 A Double Barrier Memristive Device 54 Hansen, Ziegler et al., Sci. Rep. 5: (2015) During set process, mobile oxygen ions increase interface potential V I and decrease effective barrier width d eff

55 A Double Barrier Memristive Device 55 Hansen, Ziegler et al., Sci. Rep. 5: (2015) During set process, mobile oxygen ions increase interface potential V I and decrease effective barrier width d eff

56 A Double Barrier Memristive Device 56 Hansen, Ziegler et al., Sci. Rep. 5: (2015) Tunnel distance Simulation Experiment variable constant

57 Change of Transmission Probability 57 Metal Metal

58 Dielectric Barrier Ferroelectric Tunnel Junction Kohlstedt, Pertsev, Waser, Ferroelectric Thin Films X, Vol. 688 (Material Research Society) 2002, p Magnet Magnet Density of states effects 2p e A I( V ) = T ( E) n ( E -ev ) n ( E )[ f ( E ev ) - f ( E) ]de h - Cooperative phenomenon located in the barrier! Metal Metal Ferroelectric Barrier

59 Ferroelectric Tunnel Junction 59 Ferroelectric Materials

60 Ferroelectric Tunnel Junction Ferroelectric Materials Esaki et al., IBM Tech. Discl. Bull (1971) Kohlstedt, Pertsev, Waser, Ferroelectric Thin Films X, Vol. 688 (Material Research Society) 2002, p thickness < 3 nm

61 Ferroelectric Tunnel Junction 61 Garcia et. al., Nature (2009) PFM + C-AFM P E P P E P Correlation between tunneling resistance and ferroelectric switching

62 Ferroelectric Tunnel Junction 62 A ferroelectric memristor Chanthbouala et al., Nature Materials 11, (2012)

63 3 mechanisms affecting the tunneling resistance H. Kohlstedt et al., Phys. Rev. B 72, (2005). 63

64 Ferroelectric Tunnel Junctions on Silicon 64 Guo et al., Scientific Reports 5:12576 (2015)

65 Application in Neuromorphic Systems cellular mechanisms Associative learning Pattern recognition

66 Basic Building Block: The Neuron Spikes the information units Stimulus 66 Pulse duration 3.5 ms (in electronics: 60 ns) Signal speed-along the axon 100 m/s (in electroncis 2.4 x 10 8 m/s) Memristive device as chemical synapse Sung Hyun Jo et al., Nano Lett. 10, (2010)

67 Hebbian Plasticity 67 neurons that fire together wire together local synaptic Plasticity D.O. Hebb (1949) ν i ν j ν i associative cooperative local cellular mechanism ν j competition global multidimensional network level

68 Hebbian Plasticity 68 neurons that fire together wire together dω(t)/dt = F(ω, ν i, ν j ) local ν = f(u) synaptic Plasticity D.O. Hebb (1949) cooperative ν i F(ν i,ν j )= β ν i ν j ν j ν i associative β = β(ω,<ν j >) local cellular mechanism ν j competition global multidimensional network level

69 Associative Learning: Pavlov s Dog 69 Classical conditioning I. Pavlov (1903)

70 Associative Learning: Pavlov s Dog 70 Principles of associative learning can be understood on cellular level S Sensory neuron unconditional stimulus (UCS) S Sensory neuron conditional stimulus (CS) + I M Strengthen interneuron Motor neuron E. R. Kandel 1971

71 Associative Learning: Pavlov s Dog 71 Principles of associative learning can be understood on cellular level i j S Sensory neuron unconditional stimulus (UCS) S Sensory neuron conditional stimulus (CS) + I M Strengthen interneuron Motor neuron E. R. Kandel 1971 dω(t)/dt = β ν bell ν food

72 Associative Learning: Pavlov s Dog 72 Principles of associative learning can be understood on cellular level ω bell E. R. Kandel 1971 ν food ʃω > ϴ ω food Heterosynaptic plasticity dω bell (t)/dt = β ν bell ν food

73 Associative Learning: Pavlov s Dog 73 Ziegler et al., Adv. Func. Mat. 22, 2744 (2012) An Electronic Version of Pavlov s Dog V bell V food LRS -> HRS SET dr M /dt = β f[t, (V bell + V food )]

74 Pavlov s Dog Ziegler et al., Adv. Func. Mat. 22, 2744 (2012) circuit with thresholds V bell < V cth & V food > V cth V bell + V food > V p mth (before) & V bell > V cth (after) 74

75 Pavlov s Dog Ziegler et al., Adv. Func. Mat. 22, 2744 (2012) How to scale it to a network level? 75? How realistic is a heterosynaptic rule?! different time-scales for (Pavlov s) behavioral experiments and synaptic plasticity processes: Pavlov: up to 4 seconds At neurons: ms

76 Spike Pairing: Asymmetric Hebbian rule Bi &Poo J. Neurosci (1998) 76 Spike-Time- Dependent-Plasticity (STDP) pre +ΔT time pre -ΔT time post t time post t time Potentiation dω(t)/dt = +β ν pre (t-δt) ν post (t) Depression dω(t)/dt = -β ν pre (t)ν post (t+δt)

77 Spike Pairing: Asymmetric Hebbian rule Bi &Poo J. Neurosci (1998) Spike-Time- Dependent-Plasticity (STDP) dω(t)/dt = +β f[v pre (t-δt) - V post (t)] dω(t)/dt = -β f[v pre (t) - V post (t-δt) ] 77 pre V pre post t pre V post post t Δ V Δt t Jo et al., Nano Lett. 10, (2010). LTD C. Zamarreño-Ramos et al., Front. Neurosci. 5, 26 (2011)

78 Realization of artificial synapses You have the choice a few Examples D.S. Jeong, I. Kim, M. Ziegler, H. Kohlstedt, RSC ADVANCES, 3, 3169 (2013) 78 Ferroelectric Tunnel Junctions Andrè Chanthbouala, et al. Nature Nanotechnology 2012 Nanoionics R. Waser et al. Adv. Mater Ionics and Interface Barriers D. S. Jeong et al. Solid-State Electronics 63, 1 (2011) Baik et al., Appl. Phys. Lett. 97, (2010) D. B. Strukov et al. Nature 2008, 453, 80 Spin Transfer Torque Devices P. Krzysteczko et al. Adv. Mater Floating-Gate Transistors: MemFlash Ziegler et al. Appl. Phys. Lett. 2012

79 Plasticity model Ziegler, Bartsch et al., IEEE TBioCAS 79 o local + cooperative o voltage dependence: dω/dt= α(δv) o pulse width dependence: dω/dt= λ(δt) o weight saturation: ω min < ω(t) < ω max

80 Plasticity model Ziegler, Bartsch et al., IEEE TBioCAS o local + cooperative o voltage dependence: dω/dt= α(δv) o pulse width dependence: dω/dt= λ(δt) o weight saturation: ω min < ω(t) < ω max weight dependent learning rate: β(ω,t) dω(t)/dt = β ω(t) ( 1 - ω(t)/ω max ) Logistic function ω p,d (t) = ω p,d (t 0 )+ ω max [ 1+ exp{-β(t-t 0 )} ] -1 β(ω,t) = K p,d ω(δv,t) ω(δv,t) = G(ΔV,n,Δt) 80 V pre pre pre V pre V post post post V post

81 Plasticity model Ziegler, Bartsch et al., IEEE TBioCAS 81 dω(t)/dt = β ω(t) ( 1 - ω(t)/ω max ) ω (t) = α(δv) λ(δt) G(t-1)

82 Plasticity model Ziegler, Bartsch et al., IEEE TBioCAS Potentiation (Set) 82 +ΔV Depression (Reset) -ΔV Pulse time Δt

83 Pattern recognition 83 LeCun et al., Proceedings of the IEEE, 86 (1998) (website: MNIST: hand writen digits of 250 hand writer

84 Unsupervised learning network Zahari, Ziegler et al., AIMS 2, 203 (2015). 84 Querlioz et al., IEEE Transactions on Nanotechnology 12, 288 (2013). Memristive device digits Receptive field

85 Unsupervised learning network Zahari, Ziegler et al., AIMS 2, 203 (2015). 85 Stochastic Input white t U t black Condition for positive pulse random number ε (0,1) Querlioz et al., IEEE Transactions on Nanotechnology 12, 288 (2013).

86 Unsupervised learning network Zahari, Ziegler et al., AIMS 2, 203 (2015). 86 Leaky-Integrate-and Fire Neurons i(t)~ ω ij (t) N i V t v Mem > V th homeostasis Winner-take-it-all (WTA) N 1 N 2 N 3

87 Unsupervised learning network Zahari, Ziegler et al., AIMS 2, 203 (2015). 87 STDP-based learning locality through proper thresholds positive pre-pulse U t Above threshold U th post-pulse t

88 Unsupervised learning network Zahari, Ziegler et al., AIMS 2, 203 (2015). 88 STDP-based learning locality through proper thresholds negative pre-pulse U t Below threshold post-pulse t U th

89 Unsupervised learning network Zahari, Ziegler et al., AIMS 2, 203 (2015). 89

90 Unsupervised learning network 90 Zahari, Ziegler et al., AIMS 2, 203 (2015). 93.3% Double barrier memristive devices Querlioz et al., IEEE Transactions on Nanotechnology 12, 288 (2013). TiOx-based devices

91 Unsupervised learning network 75% 91 Zahari, Ziegler et al., AIMS 2, 203 (2015). Au Nb x O y Al 2 O 3 Al Nb 60% Al TiOx Al Nb Al 2 O 3

92 Unsupervised learning network Zahari, Ziegler et al., AIMS 2, 203 (2015). 92 Device Performance Requirements: device variability (reliability, retention, fatigue, ) I-V nonlinearity defined threshold voltages device model - statistics of device parameters compatibility with Si-fabrication technology

93 Thanks to 93 Hermann Kohlstedt Rohit Soni Adrian Petraru Members AG Nanoelectronic Members FOR2093 Financial support by the DFG through FOR2093 is gratefully acknowledged.

94 94 FOR

Niobium oxide and Vanadium oxide as unconventional Materials for Applications in neuromorphic Devices and Circuits

Niobium oxide and Vanadium oxide as unconventional Materials for Applications in neuromorphic Devices and Circuits Niobium oxide and Vanadium oxide as unconventional Materials for Applications in neuromorphic Devices and Circuits Martin Ziegler, Mirko Hansen, Marina Ignatov, Adrian Petraru, and Hermann Kohlstedt Nanoelektronik,

More information

Memory and computing beyond CMOS

Memory and computing beyond CMOS Memory and computing beyond CMOS Dipartimento di Elettronica, Informazione e Bioingegneria Politecnico di Milano daniele.ielmini@polimi.it Outline 2 Introduction What is CMOS? What comes after CMOS? Example:

More information

Magnetic tunnel junction beyond memory from logic to neuromorphic computing WANJUN PARK DEPT. OF ELECTRONIC ENGINEERING, HANYANG UNIVERSITY

Magnetic tunnel junction beyond memory from logic to neuromorphic computing WANJUN PARK DEPT. OF ELECTRONIC ENGINEERING, HANYANG UNIVERSITY Magnetic tunnel junction beyond memory from logic to neuromorphic computing WANJUN PARK DEPT. OF ELECTRONIC ENGINEERING, HANYANG UNIVERSITY Magnetic Tunnel Junctions (MTJs) Structure High density memory

More information

Neuromorphic computing with Memristive devices. NCM group

Neuromorphic computing with Memristive devices. NCM group Neuromorphic computing with Memristive devices NCM group Why neuromorphic? New needs for computing Recognition, Mining, Synthesis (Intel) Increase of Fault (nanoscale engineering) SEMICONDUCTOR TECHNOLOGY

More information

Addressing Challenges in Neuromorphic Computing with Memristive Synapses

Addressing Challenges in Neuromorphic Computing with Memristive Synapses Addressing Challenges in Neuromorphic Computing with Memristive Synapses Vishal Saxena 1, Xinyu Wu 1 and Maria Mitkova 2 1 Analog Mixed-Signal and Photonic IC (AMPIC) Lab 2 Nanoionic Materials and Devices

More information

ESE 570: Digital Integrated Circuits and VLSI Fundamentals

ESE 570: Digital Integrated Circuits and VLSI Fundamentals ESE 570: Digital Integrated Circuits and VLSI Fundamentals Lec 4: January 24, 2017 MOS Transistor Theory, MOS Model Penn ESE 570 Spring 2017 Khanna Lecture Outline! Semiconductor Physics " Band gaps "

More information

MOSFET: Introduction

MOSFET: Introduction E&CE 437 Integrated VLSI Systems MOS Transistor 1 of 30 MOSFET: Introduction Metal oxide semiconductor field effect transistor (MOSFET) or MOS is widely used for implementing digital designs Its major

More information

8. Schottky contacts / JFETs

8. Schottky contacts / JFETs Technische Universität Graz Institute of Solid State Physics 8. Schottky contacts / JFETs Nov. 21, 2018 Technische Universität Graz Institute of Solid State Physics metal - semiconductor contacts Photoelectric

More information

Supplementary Figures

Supplementary Figures Supplementary Figures Supplementary Figure 1 Thickness calibration of PVDF layers using atomic force microscopy. (a-d) Tapping AFM images of 1 L, 2 Ls, 4 Ls and 20 Ls PVDF films, respectively on Au-coated

More information

Schottky diodes. JFETs - MESFETs - MODFETs

Schottky diodes. JFETs - MESFETs - MODFETs Technische Universität Graz Institute of Solid State Physics Schottky diodes JFETs - MESFETs - MODFETs Quasi Fermi level When the charge carriers are not in equilibrium the Fermi energy can be different

More information

Appendix 1: List of symbols

Appendix 1: List of symbols Appendix 1: List of symbols Symbol Description MKS Units a Acceleration m/s 2 a 0 Bohr radius m A Area m 2 A* Richardson constant m/s A C Collector area m 2 A E Emitter area m 2 b Bimolecular recombination

More information

Size-dependent Metal-insulator Transition Random Materials Crystalline & Amorphous Purely Electronic Switching

Size-dependent Metal-insulator Transition Random Materials Crystalline & Amorphous Purely Electronic Switching Nanometallic RRAM I-Wei Chen Department of Materials Science and Engineering University of Pennsylvania Philadelphia, PA 19104 Nature Nano, 6, 237 (2011) Adv Mater,, 23, 3847 (2011) Adv Func Mater,, 22,

More information

Carbon Nanotube Synaptic Transistor Network for. Pattern Recognition. Supporting Information for

Carbon Nanotube Synaptic Transistor Network for. Pattern Recognition. Supporting Information for Supporting Information for Carbon Nanotube Synaptic Transistor Network for Pattern Recognition Sungho Kim 1, Jinsu Yoon 2, Hee-Dong Kim 1 & Sung-Jin Choi 2,* 1 Department of Electrical Engineering, Sejong

More information

ESE 570: Digital Integrated Circuits and VLSI Fundamentals

ESE 570: Digital Integrated Circuits and VLSI Fundamentals ESE 570: Digital Integrated Circuits and VLSI Fundamentals Lec 4: January 23, 2018 MOS Transistor Theory, MOS Model Penn ESE 570 Spring 2018 Khanna Lecture Outline! CMOS Process Enhancements! Semiconductor

More information

Lecture Outline. ESE 570: Digital Integrated Circuits and VLSI Fundamentals. Review: MOSFET N-Type, P-Type. Semiconductor Physics.

Lecture Outline. ESE 570: Digital Integrated Circuits and VLSI Fundamentals. Review: MOSFET N-Type, P-Type. Semiconductor Physics. ESE 57: Digital Integrated Circuits and VLSI Fundamentals Lec 4: January 24, 217 MOS Transistor Theory, MOS Model Lecture Outline! Semiconductor Physics " Band gaps " Field Effects! MOS Physics " Cutoff

More information

Avalanche breakdown. Impact ionization causes an avalanche of current. Occurs at low doping

Avalanche breakdown. Impact ionization causes an avalanche of current. Occurs at low doping Avalanche breakdown Impact ionization causes an avalanche of current Occurs at low doping Zener tunneling Electrons tunnel from valence band to conduction band Occurs at high doping Tunneling wave decays

More information

Bipolar resistive switching in amorphous titanium oxide thin films

Bipolar resistive switching in amorphous titanium oxide thin films Bipolar resistive switching in amorphous titanium oxide thin films Hu Young Jeong and Jeong Yong Lee Department of Materials Science and Engineering, KAIST, Daejeon 305-701, Korea Min-Ki Ryu and Sung-Yool

More information

Leakage Mechanisms. Thin films, fully depleted. Thicker films of interest for higher voltage applications. NC State

Leakage Mechanisms. Thin films, fully depleted. Thicker films of interest for higher voltage applications. NC State Leakage Mechanisms Thin films, fully depleted Leakage controlled by combined thermionic / field emission across the Schottky barrier at the film-electrode interfaces. Film quality effects barrier height,

More information

Synaptic Devices and Neuron Circuits for Neuron-Inspired NanoElectronics

Synaptic Devices and Neuron Circuits for Neuron-Inspired NanoElectronics Synaptic Devices and Neuron Circuits for Neuron-Inspired NanoElectronics Byung-Gook Park Inter-university Semiconductor Research Center & Department of Electrical and Computer Engineering Seoul National

More information

A Bottom-gate Depletion-mode Nanowire Field Effect Transistor (NWFET) Model Including a Schottky Diode Model

A Bottom-gate Depletion-mode Nanowire Field Effect Transistor (NWFET) Model Including a Schottky Diode Model Journal of the Korean Physical Society, Vol. 55, No. 3, September 2009, pp. 1162 1166 A Bottom-gate Depletion-mode Nanowire Field Effect Transistor (NWFET) Model Including a Schottky Diode Model Y. S.

More information

Electrical and Reliability Characteristics of RRAM for Cross-point Memory Applications. Hyunsang Hwang

Electrical and Reliability Characteristics of RRAM for Cross-point Memory Applications. Hyunsang Hwang Electrical and Reliability Characteristics of RRAM for Cross-point Memory Applications Hyunsang Hwang Dept. of Materials Science and Engineering Gwangju Institute of Science and Technology (GIST), KOREA

More information

Review Energy Bands Carrier Density & Mobility Carrier Transport Generation and Recombination

Review Energy Bands Carrier Density & Mobility Carrier Transport Generation and Recombination Review Energy Bands Carrier Density & Mobility Carrier Transport Generation and Recombination The Metal-Semiconductor Junction: Review Energy band diagram of the metal and the semiconductor before (a)

More information

ESE 570: Digital Integrated Circuits and VLSI Fundamentals

ESE 570: Digital Integrated Circuits and VLSI Fundamentals ESE 570: Digital Integrated Circuits and VLSI Fundamentals Lec 4: January 29, 2019 MOS Transistor Theory, MOS Model Penn ESE 570 Spring 2019 Khanna Lecture Outline! CMOS Process Enhancements! Semiconductor

More information

Advanced Flash and Nano-Floating Gate Memories

Advanced Flash and Nano-Floating Gate Memories Advanced Flash and Nano-Floating Gate Memories Mater. Res. Soc. Symp. Proc. Vol. 1337 2011 Materials Research Society DOI: 10.1557/opl.2011.1028 Scaling Challenges for NAND and Replacement Memory Technology

More information

! CMOS Process Enhancements. ! Semiconductor Physics. " Band gaps. " Field Effects. ! MOS Physics. " Cut-off. " Depletion.

! CMOS Process Enhancements. ! Semiconductor Physics.  Band gaps.  Field Effects. ! MOS Physics.  Cut-off.  Depletion. ESE 570: Digital Integrated Circuits and VLSI Fundamentals Lec 4: January 3, 018 MOS Transistor Theory, MOS Model Lecture Outline! CMOS Process Enhancements! Semiconductor Physics " Band gaps " Field Effects!

More information

Charge Extraction. Lecture 9 10/06/2011 MIT Fundamentals of Photovoltaics 2.626/2.627 Fall 2011 Prof. Tonio Buonassisi

Charge Extraction. Lecture 9 10/06/2011 MIT Fundamentals of Photovoltaics 2.626/2.627 Fall 2011 Prof. Tonio Buonassisi Charge Extraction Lecture 9 10/06/2011 MIT Fundamentals of Photovoltaics 2.626/2.627 Fall 2011 Prof. Tonio Buonassisi 2.626/2.627 Roadmap You Are Here 2.626/2.627: Fundamentals Every photovoltaic device

More information

A Hybrid CMOS/Memristive Nanoelectronic Circuit for Programming Synaptic Weights

A Hybrid CMOS/Memristive Nanoelectronic Circuit for Programming Synaptic Weights A Hybrid CMOS/Memristive Nanoelectronic Circuit for Programming Synaptic Weights Arne Heittmann and Tobias G. Noll Chair of Electrical Engineering and Computer Systems RWTH Aachen University -52062 Aachen,

More information

PHYSICAL ELECTRONICS(ECE3540) CHAPTER 9 METAL SEMICONDUCTOR AND SEMICONDUCTOR HETERO-JUNCTIONS

PHYSICAL ELECTRONICS(ECE3540) CHAPTER 9 METAL SEMICONDUCTOR AND SEMICONDUCTOR HETERO-JUNCTIONS PHYSICAL ELECTRONICS(ECE3540) CHAPTER 9 METAL SEMICONDUCTOR AND SEMICONDUCTOR HETERO-JUNCTIONS Tennessee Technological University Wednesday, October 30, 013 1 Introduction Chapter 4: we considered the

More information

A nanoparticle-organic memory field-effect transistor behaving as a programmable spiking synapse

A nanoparticle-organic memory field-effect transistor behaving as a programmable spiking synapse A nanoparticle-organic memory field-effect transistor behaving as a programmable spiking synapse F. Alibart,. Pleutin, D. Guerin, K. Lmimouni, D. Vuillaume Molecular Nanostructures & Devices group, Institute

More information

an introduction to Semiconductor Devices

an introduction to Semiconductor Devices an introduction to Semiconductor Devices Donald A. Neamen Chapter 6 Fundamentals of the Metal-Oxide-Semiconductor Field-Effect Transistor Introduction: Chapter 6 1. MOSFET Structure 2. MOS Capacitor -

More information

Applications of Memristors in ANNs

Applications of Memristors in ANNs Applications of Memristors in ANNs Outline Brief intro to ANNs Firing rate networks Single layer perceptron experiment Other (simulation) examples Spiking networks and STDP ANNs ANN is bio inpsired inpsired

More information

Characteristics and parameter extraction for NiGe/n-type Ge Schottky diode with variable annealing temperatures

Characteristics and parameter extraction for NiGe/n-type Ge Schottky diode with variable annealing temperatures 034 Chin. Phys. B Vol. 19, No. 5 2010) 057303 Characteristics and parameter extraction for NiGe/n-type Ge Schottky diode with variable annealing temperatures Liu Hong-Xia ), Wu Xiao-Feng ), Hu Shi-Gang

More information

Figure 3.1 (p. 141) Figure 3.2 (p. 142)

Figure 3.1 (p. 141) Figure 3.2 (p. 142) Figure 3.1 (p. 141) Allowed electronic-energy-state systems for two isolated materials. States marked with an X are filled; those unmarked are empty. System 1 is a qualitative representation of a metal;

More information

Lecture 6: 2D FET Electrostatics

Lecture 6: 2D FET Electrostatics Lecture 6: 2D FET Electrostatics 2016-02-01 Lecture 6, High Speed Devices 2014 1 Lecture 6: III-V FET DC I - MESFETs Reading Guide: Liu: 323-337 (he mainly focuses on the single heterostructure FET) Jena:

More information

PHYSICAL ELECTRONICS(ECE3540) CHAPTER 9 METAL SEMICONDUCTOR AND SEMICONDUCTOR HETERO-JUNCTIONS

PHYSICAL ELECTRONICS(ECE3540) CHAPTER 9 METAL SEMICONDUCTOR AND SEMICONDUCTOR HETERO-JUNCTIONS PHYSICAL ELECTRONICS(ECE3540) CHAPTER 9 METAL SEMICONDUCTOR AND SEMICONDUCTOR HETERO-JUNCTIONS Tennessee Technological University Monday, November 11, 013 1 Introduction Chapter 4: we considered the semiconductor

More information

MENA9510 characterization course: Capacitance-voltage (CV) measurements

MENA9510 characterization course: Capacitance-voltage (CV) measurements MENA9510 characterization course: Capacitance-voltage (CV) measurements 30.10.2017 Halvard Haug Outline Overview of interesting sample structures Ohmic and schottky contacts Why C-V for solar cells? The

More information

Schottky Rectifiers Zheng Yang (ERF 3017,

Schottky Rectifiers Zheng Yang (ERF 3017, ECE442 Power Semiconductor Devices and Integrated Circuits Schottky Rectifiers Zheng Yang (ERF 3017, email: yangzhen@uic.edu) Power Schottky Rectifier Structure 2 Metal-Semiconductor Contact The work function

More information

Neuromorphic Network Based on Carbon Nanotube/Polymer Composites

Neuromorphic Network Based on Carbon Nanotube/Polymer Composites Neuromorphic Network Based on Carbon Nanotube/Polymer Composites Andrew Tudor, Kyunghyun Kim, Alex Ming Shen, Chris Shaffer, Dongwon Lee, Cameron D. Danesh, and Yong Chen Department of Mechanical & Aerospace

More information

Colossal electroresistance in metal/ferroelectric/semiconductor. tunnel diodes for resistive switching memories

Colossal electroresistance in metal/ferroelectric/semiconductor. tunnel diodes for resistive switching memories Colossal electroresistance in metal/ferroelectric/semiconductor tunnel diodes for resistive switching memories Zheng Wen, Chen Li, Di Wu*, Aidong Li and Naiben Ming National Laboratory of Solid State Microstructures

More information

NEUROMORPHIC COMPUTING WITH MAGNETO-METALLIC NEURONS & SYNAPSES: PROSPECTS AND PERSPECTIVES

NEUROMORPHIC COMPUTING WITH MAGNETO-METALLIC NEURONS & SYNAPSES: PROSPECTS AND PERSPECTIVES NEUROMORPHIC COMPUTING WITH MAGNETO-METALLIC NEURONS & SYNAPSES: PROSPECTS AND PERSPECTIVES KAUSHIK ROY ABHRONIL SENGUPTA, KARTHIK YOGENDRA, DELIANG FAN, SYED SARWAR, PRIYA PANDA, GOPAL SRINIVASAN, JASON

More information

Scaling Issues in Planar FET: Dual Gate FET and FinFETs

Scaling Issues in Planar FET: Dual Gate FET and FinFETs Scaling Issues in Planar FET: Dual Gate FET and FinFETs Lecture 12 Dr. Amr Bayoumi Fall 2014 Advanced Devices (EC760) Arab Academy for Science and Technology - Cairo 1 Outline Scaling Issues for Planar

More information

Center for Spintronic Materials, Interfaces, and Novel Architectures. Spintronics Enabled Efficient Neuromorphic Computing: Prospects and Perspectives

Center for Spintronic Materials, Interfaces, and Novel Architectures. Spintronics Enabled Efficient Neuromorphic Computing: Prospects and Perspectives Center for Spintronic Materials, Interfaces, and Novel Architectures Spintronics Enabled Efficient Neuromorphic Computing: Prospects and Perspectives KAUSHIK ROY ABHRONIL SENGUPTA, KARTHIK YOGENDRA, DELIANG

More information

Novel Devices and Circuits for Computing

Novel Devices and Circuits for Computing Novel Devices and Circuits for Computing UCSB 594BB Winter 213 Lectures 5 and 6: VCM cell Class Outline VCM = Valence Change Memory General features Forming SET and RESET Heating Switching models Scaling

More information

(a) (b) Supplementary Figure 1. (a) (b) (a) Supplementary Figure 2. (a) (b) (c) (d) (e)

(a) (b) Supplementary Figure 1. (a) (b) (a) Supplementary Figure 2. (a) (b) (c) (d) (e) (a) (b) Supplementary Figure 1. (a) An AFM image of the device after the formation of the contact electrodes and the top gate dielectric Al 2 O 3. (b) A line scan performed along the white dashed line

More information

12. Memories / Bipolar transistors

12. Memories / Bipolar transistors Technische Universität Graz Institute of Solid State Physics 12. Memories / Bipolar transistors Jan. 9, 2019 Technische Universität Graz Institute of Solid State Physics Exams January 31 March 8 May 17

More information

Advanced Topics In Solid State Devices EE290B. Will a New Milli-Volt Switch Replace the Transistor for Digital Applications?

Advanced Topics In Solid State Devices EE290B. Will a New Milli-Volt Switch Replace the Transistor for Digital Applications? Advanced Topics In Solid State Devices EE290B Will a New Milli-Volt Switch Replace the Transistor for Digital Applications? August 28, 2007 Prof. Eli Yablonovitch Electrical Engineering & Computer Sciences

More information

Electrical Characteristics of MOS Devices

Electrical Characteristics of MOS Devices Electrical Characteristics of MOS Devices The MOS Capacitor Voltage components Accumulation, Depletion, Inversion Modes Effect of channel bias and substrate bias Effect of gate oide charges Threshold-voltage

More information

An interfacial investigation of high-dielectric constant material hafnium oxide on Si substrate B

An interfacial investigation of high-dielectric constant material hafnium oxide on Si substrate B Thin Solid Films 488 (2005) 167 172 www.elsevier.com/locate/tsf An interfacial investigation of high-dielectric constant material hafnium oxide on Si substrate B S.C. Chen a, T, J.C. Lou a, C.H. Chien

More information

Flash Memory Cell Compact Modeling Using PSP Model

Flash Memory Cell Compact Modeling Using PSP Model Flash Memory Cell Compact Modeling Using PSP Model Anthony Maure IM2NP Institute UMR CNRS 6137 (Marseille-France) STMicroelectronics (Rousset-France) Outline Motivation Background PSP-Based Flash cell

More information

Final Examination EE 130 December 16, 1997 Time allotted: 180 minutes

Final Examination EE 130 December 16, 1997 Time allotted: 180 minutes Final Examination EE 130 December 16, 1997 Time allotted: 180 minutes Problem 1: Semiconductor Fundamentals [30 points] A uniformly doped silicon sample of length 100µm and cross-sectional area 100µm 2

More information

Electrical Characteristics of Multilayer MoS 2 FET s

Electrical Characteristics of Multilayer MoS 2 FET s Electrical Characteristics of Multilayer MoS 2 FET s with MoS 2 /Graphene Hetero-Junction Contacts Joon Young Kwak,* Jeonghyun Hwang, Brian Calderon, Hussain Alsalman, Nini Munoz, Brian Schutter, and Michael

More information

The N3XT Technology for. Brain-Inspired Computing

The N3XT Technology for. Brain-Inspired Computing The N3XT Technology for Brain-Inspired Computing SystemX Alliance 27..8 Department of Electrical Engineering 25.4.5 2 25.4.5 Source: Google 3 25.4.5 Source: vrworld.com 4 25.4.5 Source: BDC Stanford Magazine

More information

! CMOS Process Enhancements. ! Semiconductor Physics. " Band gaps. " Field Effects. ! MOS Physics. " Cut-off. " Depletion.

! CMOS Process Enhancements. ! Semiconductor Physics.  Band gaps.  Field Effects. ! MOS Physics.  Cut-off.  Depletion. ESE 570: Digital Integrated Circuits and VLSI Fundamentals Lec 4: January 9, 019 MOS Transistor Theory, MOS Model Lecture Outline CMOS Process Enhancements Semiconductor Physics Band gaps Field Effects

More information

EECS130 Integrated Circuit Devices

EECS130 Integrated Circuit Devices EECS130 Integrated Circuit Devices Professor Ali Javey 10/02/2007 MS Junctions, Lecture 2 MOS Cap, Lecture 1 Reading: finish chapter14, start chapter16 Announcements Professor Javey will hold his OH at

More information

Part 5: Quantum Effects in MOS Devices

Part 5: Quantum Effects in MOS Devices Quantum Effects Lead to Phenomena such as: Ultra Thin Oxides Observe: High Leakage Currents Through the Oxide - Tunneling Depletion in Poly-Si metal gate capacitance effect Thickness of Inversion Layer

More information

Electrostatics of Nanowire Transistors

Electrostatics of Nanowire Transistors Electrostatics of Nanowire Transistors Jing Guo, Jing Wang, Eric Polizzi, Supriyo Datta and Mark Lundstrom School of Electrical and Computer Engineering Purdue University, West Lafayette, IN, 47907 ABSTRACTS

More information

Gate Carrier Injection and NC-Non- Volatile Memories

Gate Carrier Injection and NC-Non- Volatile Memories Gate Carrier Injection and NC-Non- Volatile Memories Jean-Pierre Leburton Department of Electrical and Computer Engineering and Beckman Institute University of Illinois at Urbana-Champaign Urbana, IL 61801,

More information

Ferroelectric Tunnel Junctions: A Theoretical Approach

Ferroelectric Tunnel Junctions: A Theoretical Approach Forschungszentrum Jülich Ferroelectric Tunnel Junctions: A Theoretical Approach H. Kohlstedt, A. Petraru, R. Waser Forschungszentrum Jülich GmbH, Institut für Festkörperforschung and CNI, the Center of

More information

Directions for simulation of beyond-cmos devices. Dmitri Nikonov, George Bourianoff, Mark Stettler

Directions for simulation of beyond-cmos devices. Dmitri Nikonov, George Bourianoff, Mark Stettler Directions for simulation of beyond-cmos devices Dmitri Nikonov, George Bourianoff, Mark Stettler Outline Challenges and responses in nanoelectronic simulation Limits for electronic devices and motivation

More information

CMPEN 411 VLSI Digital Circuits. Lecture 03: MOS Transistor

CMPEN 411 VLSI Digital Circuits. Lecture 03: MOS Transistor CMPEN 411 VLSI Digital Circuits Lecture 03: MOS Transistor Kyusun Choi [Adapted from Rabaey s Digital Integrated Circuits, Second Edition, 2003 J. Rabaey, A. Chandrakasan, B. Nikolic] CMPEN 411 L03 S.1

More information

Nanoelectronics. Topics

Nanoelectronics. Topics Nanoelectronics Topics Moore s Law Inorganic nanoelectronic devices Resonant tunneling Quantum dots Single electron transistors Motivation for molecular electronics The review article Overview of Nanoelectronic

More information

Supplementary Materials for

Supplementary Materials for Supplementary Materials for Extremely Low Operating Current Resistive Memory Based on Exfoliated 2D Perovskite Single Crystals for Neuromorphic Computing He Tian,, Lianfeng Zhao,, Xuefeng Wang, Yao-Wen

More information

Lecture 9: Metal-semiconductor junctions

Lecture 9: Metal-semiconductor junctions Lecture 9: Metal-semiconductor junctions Contents 1 Introduction 1 2 Metal-metal junction 1 2.1 Thermocouples.......................... 2 3 Schottky junctions 4 3.1 Forward bias............................

More information

Electrical measurements of voltage stressed Al 2 O 3 /GaAs MOSFET

Electrical measurements of voltage stressed Al 2 O 3 /GaAs MOSFET Microelectronics Reliability xxx (2007) xxx xxx www.elsevier.com/locate/microrel Electrical measurements of voltage stressed Al 2 O 3 /GaAs MOSFET Z. Tang a, P.D. Ye b, D. Lee a, C.R. Wie a, * a Department

More information

Integrated Circuits & Systems

Integrated Circuits & Systems Federal University of Santa Catarina Center for Technology Computer Science & Electronics Engineering Integrated Circuits & Systems INE 5442 Lecture 10 MOSFET part 1 guntzel@inf.ufsc.br ual-well Trench-Isolated

More information

Drift-diffusion model for single layer transition metal dichalcogenide field-effect transistors

Drift-diffusion model for single layer transition metal dichalcogenide field-effect transistors Drift-diffusion model for single layer transition metal dichalcogenide field-effect transistors David Jiménez Departament d'enginyeria Electrònica, Escola d'enginyeria, Universitat Autònoma de Barcelona,

More information

Theory of Electrical Characterization of Semiconductors

Theory of Electrical Characterization of Semiconductors Theory of Electrical Characterization of Semiconductors P. Stallinga Universidade do Algarve U.C.E.H. A.D.E.E.C. OptoElectronics SELOA Summer School May 2000, Bologna (It) Overview Devices: bulk Schottky

More information

The Devices: MOS Transistors

The Devices: MOS Transistors The Devices: MOS Transistors References: Semiconductor Device Fundamentals, R. F. Pierret, Addison-Wesley Digital Integrated Circuits: A Design Perspective, J. Rabaey et.al. Prentice Hall NMOS Transistor

More information

Novel VLSI Implementation for Triplet-based Spike-Timing Dependent Plasticity

Novel VLSI Implementation for Triplet-based Spike-Timing Dependent Plasticity Novel LSI Implementation for Triplet-based Spike-Timing Dependent Plasticity Mostafa Rahimi Azghadi, Omid Kavehei, Said Al-Sarawi, Nicolangelo Iannella, and Derek Abbott Centre for Biomedical Engineering,

More information

1 Name: Student number: DEPARTMENT OF PHYSICS AND PHYSICAL OCEANOGRAPHY MEMORIAL UNIVERSITY OF NEWFOUNDLAND. Fall :00-11:00

1 Name: Student number: DEPARTMENT OF PHYSICS AND PHYSICAL OCEANOGRAPHY MEMORIAL UNIVERSITY OF NEWFOUNDLAND. Fall :00-11:00 1 Name: DEPARTMENT OF PHYSICS AND PHYSICAL OCEANOGRAPHY MEMORIAL UNIVERSITY OF NEWFOUNDLAND Final Exam Physics 3000 December 11, 2012 Fall 2012 9:00-11:00 INSTRUCTIONS: 1. Answer all seven (7) questions.

More information

A final review session will be offered on Thursday, May 10 from 10AM to 12noon in 521 Cory (the Hogan Room).

A final review session will be offered on Thursday, May 10 from 10AM to 12noon in 521 Cory (the Hogan Room). A final review session will be offered on Thursday, May 10 from 10AM to 12noon in 521 Cory (the Hogan Room). The Final Exam will take place from 12:30PM to 3:30PM on Saturday May 12 in 60 Evans.» All of

More information

Steep Slope Transistors beyond the Tunnel FET concept. David Esseni, University of Udine

Steep Slope Transistors beyond the Tunnel FET concept. David Esseni, University of Udine Steep Slope Transistors beyond the Tunnel FET concept David Esseni, University of Udine Overcome Boltzmann s Tyranny Sub-threshold swing may be expressed as V g = φ s V S/D G In MOSFETs: - second term

More information

single-electron electron tunneling (SET)

single-electron electron tunneling (SET) single-electron electron tunneling (SET) classical dots (SET islands): level spacing is NOT important; only the charging energy (=classical effect, many electrons on the island) quantum dots: : level spacing

More information

Biological Modeling of Neural Networks:

Biological Modeling of Neural Networks: Week 14 Dynamics and Plasticity 14.1 Reservoir computing - Review:Random Networks - Computing with rich dynamics Biological Modeling of Neural Networks: 14.2 Random Networks - stationary state - chaos

More information

Section 12: Intro to Devices

Section 12: Intro to Devices Section 12: Intro to Devices Extensive reading materials on reserve, including Robert F. Pierret, Semiconductor Device Fundamentals Bond Model of Electrons and Holes Si Si Si Si Si Si Si Si Si Silicon

More information

Metal Semiconductor Contacts

Metal Semiconductor Contacts Metal Semiconductor Contacts The investigation of rectification in metal-semiconductor contacts was first described by Braun [33-35], who discovered in 1874 the asymmetric nature of electrical conduction

More information

MODELLING OF TUNNELLING CURRENTS IN METAL-INSULATOR-METAL JUNCTION

MODELLING OF TUNNELLING CURRENTS IN METAL-INSULATOR-METAL JUNCTION MODELLING OF TUNNELLING CURRENTS IN METAL-INSULATOR-METAL JUNCTION ABSTRACT Ajay Manwani 1, Rajesh Junghare 2 and Abhishek Vaidya 3 Visvesvarya National Institute of Technology, Nagpur, India A numerical

More information

M R S Internet Journal of Nitride Semiconductor Research

M R S Internet Journal of Nitride Semiconductor Research Page 1 of 6 M R S Internet Journal of Nitride Semiconductor Research Volume 9, Article 7 The Ambient Temperature Effect on Current-Voltage Characteristics of Surface-Passivated GaN-Based Field-Effect Transistors

More information

Supporting Information

Supporting Information Supporting Information Monolithically Integrated Flexible Black Phosphorus Complementary Inverter Circuits Yuanda Liu, and Kah-Wee Ang* Department of Electrical and Computer Engineering National University

More information

MOS Transistors. Prof. Krishna Saraswat. Department of Electrical Engineering Stanford University Stanford, CA

MOS Transistors. Prof. Krishna Saraswat. Department of Electrical Engineering Stanford University Stanford, CA MOS Transistors Prof. Krishna Saraswat Department of Electrical Engineering S Stanford, CA 94305 saraswat@stanford.edu 1 1930: Patent on the Field-Effect Transistor! Julius Lilienfeld filed a patent describing

More information

A 68 Parallel Row Access Neuromorphic Core with 22K Multi-Level Synapses Based on Logic- Compatible Embedded Flash Memory Technology

A 68 Parallel Row Access Neuromorphic Core with 22K Multi-Level Synapses Based on Logic- Compatible Embedded Flash Memory Technology A 68 Parallel Row Access Neuromorphic Core with 22K Multi-Level Synapses Based on Logic- Compatible Embedded Flash Memory Technology M. Kim 1, J. Kim 1, G. Park 1, L. Everson 1, H. Kim 1, S. Song 1,2,

More information

Lecture 18 Field-Effect Transistors 3

Lecture 18 Field-Effect Transistors 3 Lecture 18 Field-Effect Transistors 3 Schroder: Chapters, 4, 6 1/38 Announcements Homework 4/6: Is online now. Due Today. I will return it next Wednesday (30 th May). Homework 5/6: It will be online later

More information

MOS Capacitor MOSFET Devices. MOSFET s. INEL Solid State Electronics. Manuel Toledo Quiñones. ECE Dept. UPRM.

MOS Capacitor MOSFET Devices. MOSFET s. INEL Solid State Electronics. Manuel Toledo Quiñones. ECE Dept. UPRM. INEL 6055 - Solid State Electronics ECE Dept. UPRM 20th March 2006 Definitions MOS Capacitor Isolated Metal, SiO 2, Si Threshold Voltage qφ m metal d vacuum level SiO qχ 2 E g /2 qφ F E C E i E F E v qφ

More information

L ECE 4211 UConn F. Jain Scaling Laws for NanoFETs Chapter 10 Logic Gate Scaling

L ECE 4211 UConn F. Jain Scaling Laws for NanoFETs Chapter 10 Logic Gate Scaling L13 04202017 ECE 4211 UConn F. Jain Scaling Laws for NanoFETs Chapter 10 Logic Gate Scaling Scaling laws: Generalized scaling (GS) p. 610 Design steps p.613 Nanotransistor issues (page 626) Degradation

More information

Semiconductor Devices

Semiconductor Devices Semiconductor Devices - 2014 Lecture Course Part of SS Module PY4P03 Dr. P. Stamenov School of Physics and CRANN, Trinity College, Dublin 2, Ireland Hilary Term, TCD 17 th of Jan 14 Metal-Semiconductor

More information

Electric Field-Dependent Charge-Carrier Velocity in Semiconducting Carbon. Nanotubes. Yung-Fu Chen and M. S. Fuhrer

Electric Field-Dependent Charge-Carrier Velocity in Semiconducting Carbon. Nanotubes. Yung-Fu Chen and M. S. Fuhrer Electric Field-Dependent Charge-Carrier Velocity in Semiconducting Carbon Nanotubes Yung-Fu Chen and M. S. Fuhrer Department of Physics and Center for Superconductivity Research, University of Maryland,

More information

Fermi Level Pinning at Electrical Metal Contacts. of Monolayer Molybdenum Dichalcogenides

Fermi Level Pinning at Electrical Metal Contacts. of Monolayer Molybdenum Dichalcogenides Supporting information Fermi Level Pinning at Electrical Metal Contacts of Monolayer Molybdenum Dichalcogenides Changsik Kim 1,, Inyong Moon 1,, Daeyeong Lee 1, Min Sup Choi 1, Faisal Ahmed 1,2, Seunggeol

More information

High Performance, Low Operating Voltage n-type Organic Field Effect Transistor Based on Inorganic-Organic Bilayer Dielectric System

High Performance, Low Operating Voltage n-type Organic Field Effect Transistor Based on Inorganic-Organic Bilayer Dielectric System Journal of Physics: Conference Series PAPER OPEN ACCESS High Performance, Low Operating Voltage n-type Organic Field Effect Transistor Based on Inorganic-Organic Bilayer Dielectric System To cite this

More information

ESE370: Circuit-Level Modeling, Design, and Optimization for Digital Systems

ESE370: Circuit-Level Modeling, Design, and Optimization for Digital Systems ESE370: Circuit-Level Modeling, Design, and Optimization for Digital Systems Lec 6: September 14, 2015 MOS Model You are Here: Transistor Edition! Previously: simple models (0 and 1 st order) " Comfortable

More information

Resistive Switching Mechanism of Single-Crystalline Oxide Schottky Junctions: Macroscopic and Nanoscopic Characterizations

Resistive Switching Mechanism of Single-Crystalline Oxide Schottky Junctions: Macroscopic and Nanoscopic Characterizations Resistive Switching Mechanism of SingleCrystalline Oxide Schottky Junctions: Macroscopic and Nanoscopic Characterizations Haeri Kim, Eunsongyi Lee, Minji Gwon, Ahrum Sohn, El Mostafa Bourim, and DongWook

More information

Index. buried oxide 35, 44 51, 89, 238 buried channel 56

Index. buried oxide 35, 44 51, 89, 238 buried channel 56 Index A acceptor 275 accumulation layer 35, 45, 57 activation energy 157 Auger electron spectroscopy (AES) 90 anode 44, 46, 55 9, 64, 182 anode current 45, 49, 65, 77, 106, 128 anode voltage 45, 52, 65,

More information

3/10/2013. Lecture #1. How small is Nano? (A movie) What is Nanotechnology? What is Nanoelectronics? What are Emerging Devices?

3/10/2013. Lecture #1. How small is Nano? (A movie) What is Nanotechnology? What is Nanoelectronics? What are Emerging Devices? EECS 498/598: Nanocircuits and Nanoarchitectures Lecture 1: Introduction to Nanotelectronic Devices (Sept. 5) Lectures 2: ITRS Nanoelectronics Road Map (Sept 7) Lecture 3: Nanodevices; Guest Lecture by

More information

Lecture 6 PN Junction and MOS Electrostatics(III) Metal-Oxide-Semiconductor Structure

Lecture 6 PN Junction and MOS Electrostatics(III) Metal-Oxide-Semiconductor Structure Lecture 6 PN Junction and MOS Electrostatics(III) Metal-Oxide-Semiconductor Structure Outline 1. Introduction to MOS structure 2. Electrostatics of MOS in thermal equilibrium 3. Electrostatics of MOS with

More information

Scaling of MOS Circuits. 4. International Technology Roadmap for Semiconductors (ITRS) 6. Scaling factors for device parameters

Scaling of MOS Circuits. 4. International Technology Roadmap for Semiconductors (ITRS) 6. Scaling factors for device parameters 1 Scaling of MOS Circuits CONTENTS 1. What is scaling?. Why scaling? 3. Figure(s) of Merit (FoM) for scaling 4. International Technology Roadmap for Semiconductors (ITRS) 5. Scaling models 6. Scaling factors

More information

This article has been accepted and published on J-STAGE in advance of copyediting. Content is final as presented.

This article has been accepted and published on J-STAGE in advance of copyediting. Content is final as presented. This article has been accepted and published on J-STAGE in advance of copyediting. Content is final as presented. References IEICE Electronics Express, Vol.* No.*,*-* Effects of Gamma-ray radiation on

More information

Decoding. How well can we learn what the stimulus is by looking at the neural responses?

Decoding. How well can we learn what the stimulus is by looking at the neural responses? Decoding How well can we learn what the stimulus is by looking at the neural responses? Two approaches: devise explicit algorithms for extracting a stimulus estimate directly quantify the relationship

More information

Memories Bipolar Transistors

Memories Bipolar Transistors Technische Universität Graz nstitute of Solid State Physics Memories Bipolar Transistors Technische Universität Graz nstitute of Solid State Physics Exams February 5 March 7 April 18 June 27 Exam Four

More information

Neuromorphic Engineering I. To do today. avlsi.ini.uzh.ch/classwiki. Book. A pidgin vocabulary. Neuromorphic Electronics? What is it all about?

Neuromorphic Engineering I. To do today. avlsi.ini.uzh.ch/classwiki. Book. A pidgin vocabulary. Neuromorphic Electronics? What is it all about? Neuromorphic Engineering I Time and day : Lecture Mondays, 13:15-14:45 Lab exercise location: Institut für Neuroinformatik, Universität Irchel, Y55 G87 Credits: 6 ECTS credit points Exam: Oral 20-30 minutes

More information

Moores Law for DRAM. 2x increase in capacity every 18 months 2006: 4GB

Moores Law for DRAM. 2x increase in capacity every 18 months 2006: 4GB MEMORY Moores Law for DRAM 2x increase in capacity every 18 months 2006: 4GB Corollary to Moores Law Cost / chip ~ constant (packaging) Cost / bit = 2X reduction / 18 months Current (2008) ~ 1 micro-cent

More information

Outline. Neural dynamics with log-domain integrator circuits. Where it began Biophysics of membrane channels

Outline. Neural dynamics with log-domain integrator circuits. Where it began Biophysics of membrane channels Outline Neural dynamics with log-domain integrator circuits Giacomo Indiveri Neuromorphic Cognitive Systems group Institute of Neuroinformatics niversity of Zurich and ETH Zurich Dynamics of Multi-function

More information