Ultrafast Nano Imprint Lithography

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1 Ultrafast Nano Imprint Lithography

2 Imprint in less than 1 sec Logos Anti-counterfeiting nanostructures Miniaturized QRs Customized designs 2

3 Pulsed-NIL technology enables printing times in less than 100 microseconds (*) Based on the patented process of ultra-fast Nanoimprint lithography 3

4 Imprint on Nylon 4

5 Imprint on Acetate 5

6 Details at optical microscope 6

7 Details at SEM 1 µm The smallest details in these pictures are on the order of 100 nm. The pulsed-nil technique enables features on the order of 10 nm. 7

8 Examples of customized imprint 8

9 Process Imprinting time: 100 microsec Handling: dependent on the level of automation (~1 sec) Handling time + imprint time ~1-2 sec 9

10 Main results It is possible to transfer a pattern on polymeric substrates in 100 microsecs It s possible to pattern at the same time: Millimetric structures Micrometric structures Nanometric structures Areas from few mm2 up to tens of cm2 are patternable with a single imprint step. Chromatic variations dependent on the observation angle can be obtained. Image changes dependent on the observation angle can be obtained. Different materials are patternable. There is no intrinsic limitation for materials with dielectric properties. For conductive materials, tests are on-going. 10

11 The pulsed-nil technology 11

12 Standard Nano Imprinting Lithography Advantages Extreme resolution (5 nm) Large area parallel processing (up to 12 ) Flexibility (various applications, materials etc.) Limited costs Problem Not ideal yet because of speed Far from the industrial target of > 1000 substrates/h for mass production market 12

13 ThunderNIL s concept - Eliminate the bottleneck limiting the throughput in already existing NIL equipment - ThunderNIL has demonstrated that the throughput could be increased to > 4000 substrates/hour - Sell customized solutions for specific industries or applications 13

14 ThunderNIL working principle Substrate and/or polymer to be patterned Stamp with integrated heater Intense and short (100 μsec) current pulse flowing as a uniform sheet under the patterned surface of the stamp 14

15 High uniformity of the ThunderNIL processes 15

16 16

17 Nanopatterning the surface of microstructures Nanopatterning the top of pre-patterned polymer microstructures (e.g. by photolithography) without melting down the latter. 17

18 Competitive technological advantages Thermal cycle much faster Heat is provided by the stamp, not by hot plates High potential throughput ( >1000 substrates/hour) Energy saving ( J/cm 2 <10 J/cm 2 ) Reduced effects of thermal expansion No distortion of macroscopic scale objects, patterned at the surface Possibility for seamless stitching 18

19 Equipment ThunderNIL 4 - ULISS 19

20 Equipment ThunderNIL 4 - ULISS 20

21 The COMPANY 21

22 ThunderNIL Key elements ThunderNIL provides solutions for macro-, micro- and nano- patterning in less than 1 second 2009: ThunderNIL is founded by Massimo and Maurizio Tormen 2009: a Seed Investor joins the company 2012: a Private Investor joins the company 2014: 13 people (8 employees, 5 external partners) - ThunderNIL's technology is patented. - The pulsed-nil technology is widely proven. 22

23 ThunderNIL markets ThunderNIL looks at markets with big production volumes. Particular attention is devoted to luxury goods. Medicine pills Plastic packages (e.g. for food) Luxury goods Disposables used for medical analysis Credit card, Bancomat, plastic cards for different applications External case of portable PC, smartphones or electronic gadgets in general 23

24 Main ThunderNIL s activities Production of standardized equipment for micro- and nano- structuring of substrates. Development and production of customized equipment for micro- and nano- structuring of substrates under industrial mandate. In this case the client has exclusivity rights for the field of application (e.g. watch industry) Services for micro- and nano- structuring of substrates up to pieces. Applied research related to micro- and nano- structuring of substrates. 24

25 Examples of equipment developed by ThunderNIL st generation ThunderNIL equipment 2 nd generation ThunderNIL equipment 25

26 Examples of equipment developed by ThunderNIL - 2 Stamp soldering station UV-NIL press 26

27 Examples of equipment developed by ThunderNIL 3 Evaporator for organic molecules and metals 27

28 Examples of patterning services

29 Examples of patterning services

30 What ThunderNIL can offer 30

31 Different options Production of standardized equipment for micro- and nano- structuring of substrates. Development and production of customized equipment for micro- and nano- structuring of substrates under industrial mandate. In this case the client has exclusivity rights for the field of application (e.g. watch industry) Services for micro- and nano- structuring of substrates up to pieces. Applied research related to micro- and nano- structuring of substrates. 31

32 Example - Ultrafast imprinting to integrate in a production chain Delta Robot ThunderNIL stamp 32

33 Example of possible specs for a customized equipment Materials Printing area Surface morphology acetate, cellulose propionate, Nylon. Paint on metal up to 4 wafers curvature (R>3 cm) Handling Automatized Imprint time 100 µs Throughput 700:1000 pieces / hour Resolution (Minimum feature size) <50 nm Averaged consumption power for imprinting 50 W Stamp price and stamping cycles per stamp 6000 / 20'000 cycles 33

34 Nanostructures in Microseconds

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