Nano-Lithography. Edited by Stefan Landis

Transcription

1 Nano-Lithography Edited by Stefan Landis IST^ m WILEY

2 Table of Contents Foreword Jörge DE SOUSA NORONHA Introduction Michel BRILLOUET xi xvii Chapter 1. X-ray Lithography: Fundamentals and Applications 1 Massimo TORMEN, Gianluca GRENCI, Benedetta MARMIROLI and Filippo ROMANATO 1.1. Introduction The principle of X-ray lithography The irradiation system for XRL Properties of synchrotron radiation High Resolution and Deep XRL Examples of X-ray lithography beamlines Scanner/stepper The mask The physics of X-ray lithography How phase and intensity of X-rays are altered by interaction with matter X-ray lithography as a shadow printing technique X-ray absorption in a resist and physical mechanisms involved in its exposure Physical model of electron energy loss in resists Diffraction effects in X-ray lithography Coherence of synchrotron radiation from bending magnet devices 41

3 vi Nano-Lithography Basic formulation of diffraction theory for a scalar field Rayleigh-Sommerfeld formulation of diffraction by a planar screen An example of diffraction effects: Poisson's spot in X-ray lithography Applications Optimal photon energy range for high resolution and deep X-ray lithography Diffraction effects on proximity lithography High resolution 3D nano structuring D polymer structures by combination of Nanolmprint (NIL) and X-ray lithography (XRL) Micromachining and the LIGA process Micro-optical element for distance measurement Appendix Bibliography 79 Chapter 2. Nanolmprint Lithography 87 Stefan LANDIS 2.1. From printing to Nanolmprint A few words about Nanolmprint The fabrication of the mold Separating the mold and the resist after imprint: de-embossing The problem Adhesion Adhesion and physico-chemical surface properties Surface treatment of the mold Treatment of the resist Characterization of the demolding process The residual layer problem in Nanolmprint The residual layer: a Nanolmprint specific issue Is the thickness of the residual layer predictable? How can the process impact the thickness of the residual layer? Residual layer thickness measurement Macro-scale approach: coherence between film color and thickness Microscopic approach 136

4 Table of Contents vii 2.7. A few remarks on the mechanical behavior of molds and flow properties of the nanoimprint process Conclusion Bibliography 157 Chapter 3. Lithography Techniques Using Scanning Probe Microscopy 169 Vincent BOUCHIAT 3.1. Introduction Presentation of local-probe microscopes General principles of local-probe lithography techniques Classification of surface structuring techniques using local-probe microscopes Classification according to the physical nature of the interaction Comparison with competing advanced lithography techniques Industrial development perspectives Lithographic techniques with polymer resist mask Electron beam exposure of resists by scanning probe microscopes Development of a resist dedicated to AFM nano-lithography Lithography using mechanical indentation Lithography techniques using oxidation-reduction interactions Direct fabrication by matter deposition induced by STM microscopy Local anodization under the AFM tip "Passive" lithography techniques Dip-pen lithography Alignment technique by means of a mechanical masking (stencil mask) Conclusions and perspectives Bibliography 201 Chapter 4. Lithography and Manipulation Based on the Optical Properties of Metal Nanostructures 207 Renaud BACHELOT and Marianne CONSONNi 4.1. Introduction Surface plasmons Definition of a volume plasmon 208

5 viii Nano-Lithography Delocalized surface plasmons Localized surface plasmons Application to lithography Localized plasmon optical lithography Near-field optical lithography by optical edge effect Use of nanoparticle resonances Delocalized surface plasmon optical lithography Coupling between nanostructures and delocalized surface plasmons Surface plasmon launch and interferences Conclusions, discussions and perspectives Bibliography 226 Chapter 5. Patterning with Self-Assembling Block Copolymers 231 Karim Aissou, Martin KOGELSCHATZ, Claire AGRAFFEIL, Alina PASCALE and Thierry BARON 5.1. Block copolymers: a nano-lithography technique for tomorrow? Controlling self-assembled block copolymer films Technological applications of block copolymer films Bibliography 244 Chapter 6. Metrology for Lithography 249 Johann FOUCHER and Jerome HAZART 6.1. Introduction The concept of CD in metrology CD measurement after a lithography stage: definitions What are the metrological needs during a lithography step? Scanning electron microscopy (SEM) SEM principle Matter-electron interaction From signal to quantified measurement Provisional conclusion on scanning electron microscopy D atomic force microscopy (AFM3D) AFM principle Three-dimensionnal AFM (AFM3D) special features Provisional conclusion on AFM 3D Grating optical diffractometry (or scatterometry) Principle 287

6 Table of Contents ix Example: ellipsometry characterization of post development lithography Pros and cons Optical measurements analysis Specificities of scatterometry for CD metrology Scatterometry implementation: R&D versus production New fields for scatterometry What is the most suitable technique for lithography? Technique correlation Technique calibration Process development Evaluation of morphological damage generated by the primary electron beam from CD-SEM Bibliography 316 List of Authors 321 Index 323