Advanced Plasma Technology

Transcription

1 Advanced Plasma Technology Edited by Riccardo d'agostino, Pietro Favia, Yoshinobu Kawai, Hideo Ikegami, Noriyoshi Sato, and Farzaneh Arefi-Khonsari WILEY- VCH WILEY-VCH Verlag GmbH & Co. KGaA

2 Contents Preface XV List of Contributors XVII 1 Basic Approaches to Plasma Production and Control 1 N. Sato 1.1 Plasma Production Under Low Gas Pressure (<0.1 torr) Under Medium Gas Pressure ( torr) Under High (Atmospheric) Gas Pressure (>10 torr) Energy Control Electron-Temperature Control Ion-Energy Control Dust Collection and Removal 11 References 15 2 Plasma Sources and Reactor Configurations 17 P. Colpo, T Meziani, and F. Rossi 2.1 Introduction Characteristics of ICP Principle Transformer Model Technological Aspects Matching Capacitive Coupling Standing Wave Effects Sources and Reactor Configuration Substrate Shape Flat Substrates Complex Three-Dimensional Shapes Large Area Treatment Conclusions 31 References 32 Advanced Plasma Technology. Edited by Riccardo d'agostino, Pietro Favia, Yoshinobu Kawai, Hideo Ikegami, Noriyoshi Sato, and Farzaneh Arefi-Khonsari Copyright 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim ISBN:

3 VII Contents 3 Advanced Simulations for Industrial Plasma Applications 35 Sj. Kim, F. Iza, N. Babaeva, S.H. Lee, HJ. Lee, and J.K. Lee 3.1 Introduction PIC Simulations Capacitively Coupled 0 2/Ar Plasmas Gas Composition Pressure Effect in Ar/0 2 Plasmas Three-Dimensional (3D) Charge-up Simulation Description of 3D Charge-up Simulations Effects of Secondary Electron Emission Negative Ion Extraction Fluid Simulations Capacitively Coupled Discharges Large Area Plasma Source Summary 51 References 52 4 Modeling and Diagnostics of He Discharges for Treatment of Polymers 55 E. Amanatides and D. Mataras 4.1 Introduction Experimental Model Description Results and Discussion Electrical Properties Gas-Phase Chemistry Plasma Surface Interactions Conclusions 72 References 73 5 Three-Dimensional Modeling of Thermal Plasmas (RF and Transferred Arc) for the Design of Sources and Industrial Processes 75 V. Colombo, E. Ghedini, A. Mentrelli, and T Trornbetti 5.1 Introduction Inductively Coupled Plasma Torches Modeling Approach Modeling Assumptions Governing Equations of the Continuum Phase Governing Equations of the Discrete Phase Computational Domain and Boundary Conditions Selected Simulation Results High-Definition Numerical Simulation of Industrial ICPTs 82

4 Contents IVII Numerical Simulation of the Trajectories and Thermal Histories of Powders Injected in Industrial ICPTs DC Transferred Arc Plasma Torches Modeling Approach Modeling Assumptions Governing Equations Computational Domain and Boundary Conditions Selected Simulation Results Magnetically Deflected Transferred Arc The Twin Torch The Cutting Torch 94 References 95 6 Radiofrequency Plasma Sources for Semiconductor Processing 99 F. F. Chen 6.1 Introduction Capacitively Coupled Plasmas Dual-Frequency CCPs Inductively Coupled Plasmas General Description Anomalous Ski/1 Depth Magnetized ICPs Helicon Wave Sources General Description Unusual Features Extended Helicon Sources 114 References Advanced Plasma Diagnostics for Thin-Film Deposition 117 R. Engeln, M.C.M. van de Sanden, W.M.M. Kessels, M. Creatore, and D.C. Schram 7.1 Introduction Diagnostics Available to the (Plasma) Physicist Optical Diagnostics Thomson Rayleigh and Raman Scattering Laser-Induced Fluorescence Absorption Techniques Surface Diagnostics Applications Thomson Rayleigh Scattering and Raman Scattering Laser-Induced Fluorescence Absorption Spectroscopy Surface Diagnostics 133 References 134

5 VIII I Contents 8 Plasma Processing of Polymers by a Low-Frequency Discharge with Asymmetrical Configuration of Electrodes 137 F. Arefi-Khonsari and M. Tatoulian 8.1 Introduction Plasma Treatment of Polymers Surface Activation Functionalization (Grafting) Reactions Crosslinldng Reactions Surface Etching (Ablation) Reactions Decarboxylation I3-Scission Plasma Cleaning/Etching Effect Surface Treatment of Polymers in a Low-Frequency, Low-Pressure Reactor With Asymmetrical Configuration of Electrodes (ACE) Surface Functionalization Ablation Effect of an Ammonia Plasma During Grafting of Nitrogen Groups Acid Base Properties Introduction Contact Angle Titration Method Aging of Plasma-Treated Surfaces Aging of Ammonia Plasma-Treated PP Stability of PP Treated in Plasmas of Mixtures of He + NH 3 for Improved Adhesion to Aluminum Plasma Polymerization Influence of the Chemical Composition of the Substrate on the Plasma Polymerization of a Mixture of CF 4 + H Plasma Polymerization of Acrylic Acid Conclusions 169 References Fundamentals on Plasma Deposition of Fluorocarbon Films 175 A. Milella, F. Palumbo, and R. d'agostino 9.1 Deposition of Fluorocarbon Films by Continuous Discharges Active Species in Fluorocarbon Plasmas Effect of Ion Bombardment The Activated Growth Model Afterglow Deposition of Fluorocarbon Films Deposition of Fluorocarbon Films by Modulated Glow Discharges Deposition of Nanostructured Thin Films from Tetrafluoroethylene Glow Discharges 185 References 193

6 10 Plasma CVD Processes for Thin Film Silicon Solar Cells 197 A. Matsuda 10.1 Introduction Dissociation Reaction Processes in SiH 4 and SiH4/H2 Plasmas Film-Growth Processes on the Surface Growth of a-si:h Growth of Nudeus Formation Process Epitaxial-Like Crystal Growth Defect Density Determination Process in a-si:h and Growth of a-si:h and with SiH 3 (H) Radicals Contribution of Short-Lifetime Species Solar Cell Applications Recent Progress in Material Issues for Thin-Film Silicon Solar Cells Control of Photoinduced Degradation in a-si:h High-Rate Growth of Device-Grade Kc-Si:H Summary 210 References VHF Plasma Production for Solar Cells 211 Y. Kawai, Y. Takeuchi, H. Mashima, Y. Yamauchi, and H. Takatsuka 11.1 Introduction Characteristics of VHF H2 Plasma Characteristics of VHF SiH 4 Plasma Characteristics of Large-Area VHF H2 Plasma Short-Gap VHF Discharge H2 Plasma 222 References Growth Control of Clusters in Reactive Plasmas and Application to High-Stability a-si:h Film Deposition 227 Y. Watanabe, M. Shiratani, and K. Koga 12.1 Introduction Review of Cluster Growth Observation in SiH 4 HFCCP Precursor for Cluster Growth Initiation Cluster Nudeation Phase Effects of Gas Flow on Cluster Growth Effects of Gas Temperature Gradient on Cluster Growth Effects of H2 Dilution on Cluster Growth Effects of Discharge Modulation on Cluster Growth Cluster Growth Kinetics in SiH 4 HFCCP Growth Control of Clusters Control of Production Rate of Precursor Radicals Control of Growth Reactions and Transport Loss of Clusters 238 Contents I IX

7 X Contents 12.5 Application of Cluster Growth Control to High-Stability a-si:h Film Deposition Conclusions 241 References Micro- and Nanostructuring in Plasma Processes for Biomaterials: Micro- and Nano-features as Powerful Tools to Address Selective Biological Responses 243 E. Sardella, R. Gristina, R. d'agostino, and P. Favia 13.1 Introduction: Micro and Nano, a Good Point of View in Biomedicine Micro- and Nanofeatures Modulate Biointeractions In Vivo and In Vitro Micro- and Nano-fabrication Technologies Photolithography: The Role of Photolithographic Masks Role of Plasma Processes in Photolithography Limits of Photolithography Soft Lithography Description of the Technique Role of Plasma Processes in Soft Lithography Limits of Soft Lithography Plasma-Assisted Micropatterning: The Role of Physical Masks Micropatterning Nanopatterning Novel Approaches in Plasma-Patterning Procedures Plasma Polymerization and Patterning of "Smart" Materials Deposition of Micro- and Nanostructured Coatings Conclusions 264 References Chemical Immobilization of Biomolecules an Plasma-Modified Substrates for Biomedical Applications 269 L.C. Lopez, R. Gristina, R. d'agostino, and P. Favia 14.1 Introduction Immobilization of Biomolecules Immobilization of PEO Chains (Unfouling Surfaces) Immobilization of Polysaccharides Immobilization of Proteins and Peptides Immobilization of Collagen Immobilization of Peptides Immobilization of Enzymes Immobilization of Carbohydrates Condusions 282

8 Contents IXI 14.4 List of Abbreviations 283 References In Vitro Methods to Assess the Biocompatibility of Plasma-Modified Surfaces 287 M. Nardulli, R. Gristina, R. d'agostino, and P. Favia 15.1 Introduction Surface Modification Methods: Plasma Processes and Biomolecule Immobilization In Vitro Cell Culture Tests of Artificial Surfaces Cytotoxicity Analysis Viability Assays Metabolic Assays Irritancy Assays Analysis of Cell Adhesion Analysis of Cell Functions Conclusions 299 References Cold Gas Plasma in Biology and Medicine 301 E. Stoffels, I.E. Kieft, R.E,J. Sladek, M.A.Mj. Van Zandvoort, and D.W. Slaaf 16.1 Introduction Experiments Plasma Characteristics Bacterial Inactivation Cell and Tissue Treatment Conduding Remarks and Perspectives 317 References Mechanisms of Sterilization and Decontamination of Surfaces by Low-Pressure Plasma 319 F. Rossi, 0. Kyliän, and M. Hasiwa 17.1 Introduction Overview of Sterilization and Decontamination Methods Current Cleaning and Sterilization Processes Low-Pressure Plasma-Based Method Bacterial Spore Sterilization Depyrogenation Protein Removal Experimental Experimental Setup Biological Tests Pyrogen Samples Detection Protein Removal Tests 327

9 XII I Contents Results 327 Sterilization 327 Depyrogenation 329 Protein Removal 331 Discussion 332 Plasma Sterilization 332 Depyrogenation 338 Protein Removal 338 Conclusions 338 References Application of Atmospheric Pressure Glow Plasma: Powder Coating in Atmospheric Pressure Glow Plasma 341 M. Kogoma and K. Tanaka 18.1 Introduction Development of Silica Coating Methods for Powdered Organic and Inorganic Pigments with Atmospheric Pressure Glow Plasma Experimental Results and Discussion Condusion Application to TiO 2 Fine Powder Coating with Thin Film of Si02 to Quench the Photosensitive Ability of the Powder Experimental Results and Discussion XPS Analysis TEM Analysis of Powder GC/MS Spectrum of the Vapor from UV-Irradiated Squalene Oil That Mixed With the Powders Condusion 352 References Hydrocarbon and Fluorocarbon Thin Film Deposition in Atmospheric Pressure Glow Dielectric Barrier Discharges 353 F. Fanelli, R. d'agostino, and F. Fracassi 19.1 Introduction DBDs for Thin Film Deposition: State of the Art Filamentary and Glow Dielectric Barrier Discharges Electrode Configurations and Gas Injection Systems Hydrocarbon Thin Film Deposition Fluorocarbon Thin Film Deposition Experimental Results Apparatus and Diagnostics Deposition of Hydrocarbon Films by Means of He C2H4GDBDs 361

10 Contents 'XIII Deposition of Fluorocarbon Films by Means of He C3F6 and He C3 F8 H2 GDBDs Condusion 366 References Remark an Production of Atmospheric Pressure Non-thermal Plasmas for Modern Applications 371 R. Itatani 20.1 Introduction Why Atmospheric Pressure Non-thermal Plasmas Are Attractive Origin of Activities of Plasmas Limits of Similarity Law of Gas Discharge Reduction of Gas Temperature Examples of Realization of the Above Discussion Large-Area Plasma Production Summery of Evidence To Date to Obtain Uniform DBDs Consideration to Realize Uniform Plasmas of Large Area Factors to be Considered to Realize Uniformity of DBD Plasma Remote Plasmas Condusion 379 References Present Status and Future of Color Plasma Displays 381 T Shinoda 21.1 Introduction Development of Color PDP Technologies Panel Structure Driving Technologies Latest Research and Development Analysis of Discharge in PDPs High Luminance and High Luminous Efficiency ALIS Structure Condusion 391 References Characteristics of PDP Plasmas 393 H. Ikegami 22.1 Introduction PDP Operation PDP Plasma Structure Plasma Density and Electron Temperature Remarks 399 References 399

11 XIV IContents 23 Recent Progress in Plasma Spray Processing 401 M. Kambara, H. Huang, and T Yoshida 23.1 Introduction Key Elements in Thermal Plasma Spray Technology Thermal Plasma Spraying for Coating Technologies Plasma Powder Spraying Plasma Spray CVD Plasma Spray PVD Thermal Barrier Coatings Thermal Plasma Spraying for Powder Metallurgical Engineering Thermal Plasma Spheroidization Plasma Spray CVD Plasma Spray PVD Thermal Plasma Spraying for Waste Treatments Conduding Remarks and Prospects 417 References Electrohydraulic Discharge Direct Plasma Water Treatment Processes 421 J.-S. Chang, S. Dickson, Y. Guo, K. Urashima, and M.B. Emelko 24.1 Introduction Characteristics of Electrohydraulic Discharge Systems Treatment Mechanisms Generated by Electrohydraulic Discharge Treatment of Chemical Contaminants by Electrohydraulic Discharge Disinfection of Pathogenic Contaminants by PAED Municipal Sludge Treatment Conduding Remarks 432 References Development and Physics Issues of an Advanced Space Propulsion 435 M. Inutake, A. Ando, H. Tobari, and K. Hattori 25.1 Introduction Performance of Rocket Propulsion Systems Experimental Researches for an Advanced Space Thruster Experimental Apparatus and Diagnostics Improvement of an MPDA Plasma Using a Magnetic Laval Nozzle RF Heating of a High Mach Number Plasma Flow Summary 447 References 448 Index 449