Microsystems technology. for molecular bioengineering. Hans-Georg Braun Max Bergmann Center of Biomaterials

Transcription

1 Microsystems technology for molecular bioengineering Hans-Georg Braun Max Bergmann Center of Biomaterials

2 CV Diploma in Chemistry University of Freiburg PhD at the Institute of Macromolecular Chemistry in Macromolecular Science Biophysics Crystallography Electron microscopy / GPC / X-ray diffraction

3 CV PostDoc Work at the Institute of Chemical Engineering University Kyoto X-Ray diffraction Polymer Physics Dept. Polymer Research BASF Electron Microscopy (TEM / SEM ) Polymer Morphology

4 CV Group leader at the Institute of Polymer Research Dresden Max Bergmann Center of Biomaterials Scientific interests Structure formation at surfaces & in confined geometries (Self-assembly / Softlithography / Lithography ) Micro- / Nanofluidics Surface Chemistry

5 Schedule WS 2010/2011 Topic A: Methods and materials for 3d-microstructure preparation Topic B: Preparation and behavior of micropatterned surfaces Topic C: Microsystems in bioanalytics, cell biology and tissue engineering Topic D: Biomimetics - Principles and examples

6 Lecture Topic A

7 Molecular Bio-Engineering & Micro- and Nanotechnology Molecular Separation Cell- / Microsystems Bioanalytics Molecular Recognition Diagnostics Bionanotechnology Biomimetic Chemistry

8 Polymers in micro- and nanotechnology What are micro- and nanotechnology about? Majour goals Representative examples form microtechnology Representative examples from nanotechnology What are the materials used in micro- and nanotechnology? Silicon, metals, semiconductors and inorganics Polymers, organic materials

9 Example: Cell free gene expression on a chip Buxboim and Bar-Ziv Small 3 (2007)

10 Micro- and nanostructures through self-assembly Hui Zhang and Mary J. Wirth* Anal. Chem.2005, 77,

11 Micro- and nanostructures through lithographic approaches L. Jay Guo,*, Xing Cheng, and Chia-Fu Chou*, NANO LETTERS 2004 Vol. 4, No

12 Example: Microfluidic devices for protein crystallization Li and Ismagilov Annual Review on Biophysics 39 (2010)

13 Example: Microfluidic devices for protein crystallization Li and Ismagilov Annual Review on Biophysics 39 (2010)

14 Example: Open microfluid systems Franke and Wixforth ChemPhysChem 9 (2008)

15 Example: In-situ encapsulation of cells in micrenvironement Kaehr and Shear Lab on a chip 9 (2009)

16 Lecture Topic A

17 2d structures Lateral structures 3d structures D D D D: lateral resolution D: lateral resolution H: height Aspect ratio α α = H/D

18 Top down technologies for micro-/nanostructure preparation 100 µm 10 µm 1 µm 100 nm 10 nm Sub-micrometer Optical Lithography Softlithography Ebeam Lithography AFM based Lithography 1 nm

19 Top down technologies for micro-/nanostructure preparation 2d,3d Electronbeam & Optical, X-ray Lithography, 2d,3d Soft-Lithography 2d AFM based Lithography (dip pen, SNOM,..)

20 Ebeam and optical lithography Substrate Resist layer Irradiation Resist layer Positive resist (becomes soluble upon irradiation) Negative resist (becomes insoluble upon irradiation) Pattern transfer

21 Film formation by spin coating Substrate Resist layer Inhomogeneous thickness of resist layer and time evolution of layer thickness

22 Film formation by spin coating Process and materials parameter influencing film thickness Solution viscosity Solid content Angular speed Spin Time

23 Wetting of (polymer) solutions on solid substrates ω ~ 0 deg. Spreading 0 < ω < 90 deg. Wetting ω > 90 deg. Non-wetting

24 Wetting and dewetting of thin polymer (liquid films) on solid substrates

25 Optical lithography Thick layer resist technology : High aspect ratios

26 Optical lithography Thick layer resist technology : Thick layer resist systems (SU-8)

27 Optical lithography Thick layer resist technology : High aspect ratios I(d) H I(d) = I * exp- ε * d Inhomogeneous irradiation of polymer due to strong optical absorption (H > 100 µm)

28 Optical lithography Chemically amplified negative resist T-BOC cleavage Acid catalyst negative resist Alkaline development

29 Optical lithography Chemically amplified negative resist T-BOC cleavage Acid catalyst negative resist Alkaline development

30 Optical lithography Light sources and structure resolution Hg KrF 365 nm 248 nm ArF 193 nm F2 157 nm

31 Lecture Topic A

32 Ebeam lithography Penetration depth of electrons with different energies in different materials

33 Ebeam lithography Penetration depth of electrons with different energies

34 Ebeam lithography Resolution down to 8 nm (A. Tilke LMU München) Resist: Calixarene

35 Optical lithography Two-photon lithography for complex 3d structures

36 Optical lithography Two-photon lithography for complex 3d structures

37 Optical lithography Two-photon lithography for complex 3d structures

38 Optical lithography Two-photon lithography for complex 3d structures

39 Optical lithography Quantum dots as 2 photon initiators 2 hν Cd S ( o o o ) o N.C. Strandwitz JACS 2008, 130(26),

40 Optical lithography of complex 3d microstructures Multiphoton fabrication of chemically responsive protein hydrogels for microactuation Bryan Kaehr and Jason B. Shear, PNAS 105 (2008), 8850 ff. Dynamic cell enclosures

41 Optical lithography of complex 3d microstructures Multiphoton fabrication of chemically responsive protein hydrogels Bryan Kaehr et. al., PNAS 101 (2004), ff. Guiding neurons by crosslinked BSA

42 Optical lithography in aqueous solutions Jhaveri, et. al. Chem. Mater. 2009, 21 (10), 2004 ff.

43 Maskless optical lithography - A simple setup 100 µm lines 500 µm pitch Musgraves et. al. Am. J. Phys. 2005, 73 (10), 980 ff.

44 Maskless optical lithography 3d stereolithography Sun et. al. Sensors and Actuators A 121, 2005, 113 ff.

45 Maskless optical lithography 3d stereolithography Choi et. al. J. Mat. Process. Tech. 209, 2009, 5494 ff.

46 Maskless optical lithography 3d stereolithography Kidney scaffold Choi et. al. J. Mat. Process. Tech. 209, 2009, 5494 ff.

47 DMD chip element Monk et. al. Microelectronic Eng., 27, 1995, 489 ff.

48 Lecture Topic A

49 Optical lithography in microfluidic systems Lee et. al. Lab Chip 9, 2009, 1670 ff.

50 Optical lithography in microfluidic systems Chung et. al. Nature Materials 7, 2008, 581 ff.

51 Optical lithography in µ-fluidic systems Particle assembly Chung et. al. Nature Materials 7, 2008, 581 ff.

52 Multi-LED array Grossmann et. al. J. Neural Eng., 11, 2010, ff.

53 Multi-LED array Local stimulation of nerve cells Grossmann et. al. J. Neural Eng., 11, 2010, ff.

54 Synchroton lithography / Synchroton X-rays

55 Synchroton lithography X-rays

56 Synchroton lithography / LIGA X-rays

57 Synchroton lithography / Mask production X-rays

58 Polymer embossing Embossing machine Process steps (Jenoptik) Cycle time ~ 7 minutes Heating of substrate and tools above Tg Application of pressure (~ kn) Cooling of substrate and embossing tool below Tg Removal of tool

59 Polymer embossing Silicon master embossing tool Polymer replica made by embossing

60 Polymer microysystems Lensarrays Beam splitter

61 Microdropdeposition

62

63 Polydimethylsiloxane (PDMS) - The material - Me : - CH3 Pt Curing Linear flexible polymer Crosslinking Flexible crosslinked Rubber

64 Lecture Topic A

65 Polydimethylsiloxane (PDMS) - The material Chemical crosslinking by hydrosilylation Schmid,H. Macromolecules 33, 3042 (2000)

66 Polydimethylsiloxane (PDMS) - The material Chemical modification by hydrosilylation (-O-CH2-CH2)- EO Hydrophilic

67 Polydimethylsiloxane (PDMS) - The material Jessamine Ng Lee, Cheolmin Park, and George M. Whitesides* Anal. Chem.2003, 75,

68 Polydimethylsiloxane (PDMS) - The material T.R.E. Simpsona, Z. Tabatabaianb, C. Jeynesb, B. Parbhooc, and J.L. Keddiea*

69 Polydimethylsiloxane (PDMS) - The material Hydrophilization by surface plasma treatment O. Steinbock, Langmuir 19, 8117 (2003)

70 Liquid filling of a capillary by Surface interactions S. Stark,Microelectronic Eng. 67/68, 229 (2003)

71 Liquid filling of a capillary by Surface interactions S. Stark,Microelectronic Eng. 67/68, 229 (2003)

72 Polydimethylsiloxane (PDMS) - The material Hydrophilization by surface plasma treatment O. Steinbock, Langmuir 19, 8117 (2003)

73 Polydimethylsiloxane (PDMS) - The material Hydrophilization by surface plasma treatment Hydrophobic recovery measured by surcface force AFM M. Meincken, T.A. Berhane, P.E. Mallon, Polymer 46 (2005)

74 Polydimethylsiloxane (PDMS) - The material Compression mold 2 N/mm2 Compression mold 9.7 N/mm2 Schmid,H. Macromolecules 33, 3042 (2000)

75 Permeation induced flow in PDMS channels P. Silberzan, Europhys. Letters 68, 412 (2004)

76 Permeation induced flow in PDMS channels P. Silberzan, Europhys. Letters 68, 412 (2004)

77 Permeation induced flow in PDMS channels P. Silberzan, Europhys. Letters 68, 412 (2004)

78 PDMS based complex microfluidic systems Multilayer µ-fluidic systems a) Fluidic transport layer b) Control layer S. Quake,Science 298, 580 (2002)

79 TIRF measurement of particle velocity near surfaces K.Breuer 2003 ASME International Mechanical Engineering Congress & Exposition Washington, D.C., November 16-21, 2003

80 TIRF measurement of particle velocity near surfaces K.Breuer 2003 ASME International Mechanical Engineering Congress & Exposition Washington, D.C., November 16-21, 2003

81 Unconventional lithographic techniques

82 Unconventional lithographic techniques

83 Softlithographic techniques Se-Jin Choi, Pil J. Yoo, Seung J. Baek, Tae W. Kim, and Hong H. Lee*, J. AM. CHEM. SOC. 2004, 126,

84 Softlithographic techniques UV induced radical polymerisation of polyurethaneacrylates Se-Jin Choi, Pil J. Yoo, Seung J. Baek, Tae W. Kim, and Hong H. Lee*, J. AM. CHEM. SOC. 2004, 126,

85 Softlithographic techniques Se-Jin Choi, Pil J. Yoo, Seung J. Baek, Tae W. Kim, and Hong H. Lee*, J. AM. CHEM. SOC. 2004, 126,

86 Softlithographic techniques Se-Jin Choi, Pil J. Yoo, Seung J. Baek, Tae W. Kim, and Hong H. Lee*, J. AM. CHEM. SOC. 2004, 126,

87 Rigiflex lithography Se-Jin Choi, Pil J. Yoo, Seung J. Baek, Tae W. Kim, and Hong H. Lee*, J. AM. CHEM. SOC. 2004, 126,

88 Rigiflex lithography Se-Jin Choi, Pil J. Yoo, Seung J. Baek, Tae W. Kim, and Hong H. Lee*, J. AM. CHEM. SOC. 2004, 126,

89 Complex shaped 3d nanoparticles Larken E. Euliss, Julie A. DuPont, Stephanie Gratton and Joseph DeSimone Chem. Soc. Rev., 2006, 35,

90 Complex shaped 3d nanoparticles Larken E. Euliss, Julie A. DuPont, Stephanie Gratton and Joseph DeSimone Chem. Soc. Rev., 2006, 35, S.E.A. Gratton et al. / Journal of Controlled Release 121 (2007) 10 18

91 Complex shaped 3d nanoparticles Larken E. Euliss, Julie A. DuPont, Stephanie Gratton and Joseph DeSimone Chem. Soc. Rev., 2006, 35, S.E.A. Gratton et al. / Journal of Controlled Release 121 (2007) 10 18

92 Complex shaped 3d nanoparticles

93 Complex shaped 3d nanoparticles Jason P. Rolland, Benjamin W. Maynor, Larken E. Euliss, Ansley E. Exner, Ginger M. Denison, and Joseph M. DeSimone J. AM. CHEM. SOC. 9 VOL. 127, NO. 28,

94

95 Polymers in micro- and nanotechnology 2d structures Lateral structures DNA Chip 3d structures Microfluidic channel