MIDISPPI. «MicroDispositif de test en Silicium nanoporeux pour le Packaging Intelligent» ANR Project N. Pous, F. Mailly, P. Nouet, L.
|
|
- Blake Briggs
- 6 years ago
- Views:
Transcription
1 Projet DEMAR LIRMM MIDISPPI «MicroDispositif de test en Silicium nanoporeux pour le Packaging Intelligent» ANR Project 006 N. Pous, F. Mailly, P. Nouet, L. Latorre MEMS Reliability Workshop - Toulouse, may 9-30, 008
2 LIRMM The MIDISPPI Project ANR MIDISPPI Project 006 IEF IMS LIRMM - NXP Academic Partners: IEF (Orsay) IMS (Bordeaux) LIRMM (Montpellier) Industrial Partners: NXP Design and realization of a smart packaging : Integrating microsensors in the cap for the monitoring of the package internal environment. Various test devices will be integrated: Temperature, Pressure and Humidity sensor. The ultimate goal is to obtain a «zero-defect» final test method. Calibration & compensation functions
3 Context: The PiCS substrate LIRMM ANR MIDISPPI Project 006 IEF IMS LIRMM - NXP 3 RF passive component Sensor conditionning IC Silicon cap IC 1 RF substrate MEMS (main function) Temperature sensor Pressure sensor (Pirani)
4 Context: The PiCS substrate LIRMM ANR MIDISPPI Project 006 IEF IMS LIRMM - NXP 4 PiCS 5-50nm of SiN x /SiO One polysilicon layer interconnect levels (Al) oxides (SiO ) layers +1 passivation (SiN x ) layer MEMS compatibility TMAH /FSBM : fabrication of suspended structures PolySi : Thermal and mechanical sensitivity Al ox opennings SiN x ox 1 polysi SiN x /SiO
5 LIRMM MEMS on PiCS ANR MIDISPPI Project 006 IEF IMS LIRMM - NXP 5 Magnetometers Accelerometers Microphones
6 Temperature sensor LIRMM ANR MIDISPPI Project 006 IEF IMS LIRMM - NXP 6 0,00144 Use of PiCS polysilicon (resistors) Measure of thermal coefficient between 0 and 90 C (LIRMM) Good linearity (r > 0.999) 0.13%/ C < CTR <0.14 %/ C CTR (/ C) 0,0014 0, , , , ,0013 puce 1 puce 0, R 0 C (Ω) Confirmed by IMS measurements between -50 et 10 C
7 Pirani Gauge Working Principles LIRMM ANR MIDISPPI Project 006 IEF IMS LIRMM - NXP 7 Use of a suspended resistor as a heater (FSBM) Thermal equilibrium: Heat conduction into materials to the substrate Radiation losses (usually negligible) Heat conduction or natural convection into surrounding gas (related to the pressure) Gas thermal conductivity: log(λ gaz ) Negligible for p<<p tr Constant (λ 0 ) for p>>p tr λ gaz ( p) λ = 0 p p + p tr log(λ 0 ) log(p) techniques for pressure measurement Temperature measurement at constant power Power measurement at constant temperature log(p tr )
8 Transition pressure LIRMM ANR MIDISPPI Project 006 IEF IMS LIRMM - NXP 8 Related to molecule free minimal path (l) : l = kt pπa pour N, πa =0,43nm 0 C p tr as a function of molecules speed and air gap: p tr wtb = λ0 ( w + z) dv T b R. Puers et al, Sens. Actuators A (00), p tr as a function of air gap and l p tr = v Cv RT lp d d + l( α E 1) M. Kimura et al, Microelectronics Journal 38 (007),
9 Thermal Equilibrium LIRMM ANR MIDISPPI Project 006 IEF IMS LIRMM - NXP 9 G tot = G solid + G rad + G gas p p + p tr log(g tot ) Under vaccum (p<<p tr ) G solid + G rad At p>>p tr G tot puis G gas log(g gas ) log(g solide +G rad ) log(p tr ) log(p)
10 Prototyping LIRMM ANR MIDISPPI Project 006 IEF IMS LIRMM - NXP 10 Prototype features R 0 C = 390Ω, CTR=0,138%/ C Length =100μm, width d polysi =5μm Cross-section area : s tot ~ 104μm Beam exchange surface : S tot ~ 78500μm S SiNx # 10μm 1.5 μm 0.5 μm 0.3 μm 0.8 μm S ox #.4μm S ox1 # 0.9μm d polysi μm μm μm Temperature regulation (T c =316 C) R T c R T ) = R (1 + CTR. T ) = 560Ω ( 0 C C
11 Conditionning Circuit LIRMM ANR MIDISPPI Project 006 IEF IMS LIRMM - NXP 11 R 1 =560Ω Two stable states : All potentials are zero (impossible due to noises and offsets) I 1 large enough to heat the Pirani resistor, giving R Pirani # R 1 and T Pirani # T c et V + # V - AD60 (G=1000) I V S1 V S R 1 R 1 I I 1 R 1 R Pirani
12 Experimental results LIRMM ANR MIDISPPI Project 006 IEF IMS LIRMM - NXP 1 V S (V) sauts de la jauge de référence 0,01 0, p (mbar) T T V V + S1 Pirani Pirani V = G( V + V R1 R = CTR R S V = 316 C ε ( R R ) 1 4R 1 ) V ( VS GV. Pirani S ).4R. CTR. R 0 C 1. 0 C S 0 C V V S S =,5V = 7,14V ε = 5,3 C ε = 4,6 C G G solide tot + G T rad Pirani T Pirani PJ 0 C PJ 0 C,9.10 = 91.3,8.10 = 90,5 3 = 7,85.10 = 9, W / K W / K G air 6, W / K h air 876W. m K 1
13 Modeling (Matlab/Simulink) LIRMM ANR MIDISPPI Project 006 IEF IMS LIRMM - NXP 13 noise + offset V+ V Hz +10V V S1-10V I = I 0 e V S1 V kt S 1 + V = R 1 I V = R PiraniI 1 V+ 3 5 V S1 + - V S V- AD 60 G tot = G solide R th + G rad 1 = G tot + G gaz p p + p tr R Pirani ( + ( T + ΔT )) = R0 C 1 α 0 R Pirani diode 6 I 1 Pirani 4 p 1a R th 1b ΔT 1c R Pirani p I 1 I I 1 ΔT = P J Rth Rth = RPirani I1 1+ jωτ 1+ jωτ rq : τ = 1 bar I I 1 = I 3R 1 R + R1 + R = I 3R + R 1 1 R Pirani Pirani Pirani V S = R1 I
14 Simulation vs Measurements LIRMM ANR MIDISPPI Project 006 IEF IMS LIRMM - NXP V S (V) ,01 0, p (mbar) p tr = 1 mbar
15 LIRMM Porous Silicon Humidity Sensor ANR MIDISPPI Project 006 IEF IMS LIRMM - NXP 15
16 LIRMM Porous Silicon Humidity Sensor ANR MIDISPPI Project 006 IEF IMS LIRMM - NXP 16
17 Conclusion & Further work LIRMM ANR MIDISPPI Project 006 IEF IMS LIRMM - NXP 17 Approach strengths Environment parameters monitoring Fail information or feedback to conditioning circuit Use of PICS substrate (low-cost integration) Sensors level Thermal conductivity of air and materials needs to be studied Modeling (porous silicon absorption, heat transfer ) Optimization & characterization Support from FEM System level Integration issues (packaging) Design & Integration of conditioning circuits
convective A.A. Rekik
An Electrical Test Method for MEMS Convective Accelerometers: Development and Evaluation A.A. ekik 1,2, F. Azaïs 1, N. Dumas 1, F. Mailly 1, P. Nouet 1 1 LIMM - CNS/Univ. Montpellier 2-161 rue Ada, 34392
More informationProposal of A New Structure Thermal Vacuum Sensor with Diode-Thermistors Combined with a Micro-Air-Bridge Heater
Proposal of A New Structure Thermal Vacuum Sensor with Diode-Thermistors Combined with a Micro-Air-Bridge Heater M. Kimura, F. Sakurai, H. Ohta, T. Terada To cite this version: M. Kimura, F. Sakurai, H.
More informationThermal Sensors and Actuators
Thermal Sensors and Actuators Part I Fundamentals of heat transfer Heat transfer occurs where there is a temperature gradient until an equilibrium is reached. Four major mechanism Thermal conduction Natural
More informationMEMS Pirani type vacuum sensor with extended sensitivity range
MEMS Pirani type vacuum sensor with extended sensitivity range F. Völklein**, C. Dütsch*, M.Grau**, J. Schieferdecker*, M. Simon*, K. Storck* * Heimann Sensor GmbH, Grenzstraße 22, D-01109 Dresden; **
More informationLast Name _Di Tredici_ Given Name _Venere_ ID Number
Last Name _Di Tredici_ Given Name _Venere_ ID Number 0180713 Question n. 1 Discuss noise in MEMS accelerometers, indicating the different physical sources and which design parameters you can act on (with
More informationObjective: Competitive Low-Cost Thin-Film Varactor Technology. Integrated Monolithic Capacitors using Sputtered/MOCVD material on low-cost substrates
Overview of Program Objective: Competitive Low-Cost Thin-Film Varactor Technology coplanar waveguide (CPW) capacitor ground signal ground Si substrate etched troughs Focus of Our Program! Reproducibility!
More informationFeedback. Joel Voldman* Massachusetts Institute of Technology *(with thanks to SDS)
Feedback Joel Voldman* Massachusetts Institute of Technology *(with thanks to SDS) Cite as: Joel Voldman, course materials for 6.777J / 2.372J Design and Fabrication of Microelectromechanical Devices,
More informationBiosensors and Instrumentation: Tutorial 2
Biosensors and Instrumentation: Tutorial 2. One of the most straightforward methods of monitoring temperature is to use the thermal variation of a resistor... Suggest a possible problem with the use of
More informationEffect of the Detector Width and Gas Pressure on the Frequency Response of a Micromachined Thermal Accelerometer
Micromachines 2011, 2, 167-178; doi:10.3390/mi2020167 OPEN ACCESS micromachines ISSN 2072-666X www.mdpi.com/journal/micromachines Article Effect of the Detector Width and Gas Pressure on the Frequency
More informationDESIGN AND FABRICATION OF THE MICRO- ACCELEROMETER USING PIEZOELECTRIC THIN FILMS
DESIGN AND FABRICATION OF THE MICRO- ACCELEROMETER USING PIEZOELECTRIC THIN FILMS JYH-CHENG YU and FU-HSIN LAI Department of Mechanical Engineering National Taiwan University of Science and Technology
More informationPerformance, Packaging, Price: Challenges for Sensor Research I. Eisele Fraunhofer EMFT
Performance, Packaging, Price: Challenges for Sensor Research I. Eisele Fraunhofer EMFT Introduction There are many sensor effects... but only a a very few sensors! Outline CMOS Encapsulated CMOS/MEMS
More informationELEN0037 Microelectronic IC Design. Prof. Dr. Michael Kraft
ELEN0037 Microelectronic IC Design Prof. Dr. Michael Kraft Lecture 2: Technological Aspects Technology Passive components Active components CMOS Process Basic Layout Scaling CMOS Technology Integrated
More informationAnalytical Optimization of High Performance and High Quality Factor MEMS Spiral Inductor
Progress In Electromagnetics Research M, Vol. 34, 171 179, 2014 Analytical Optimization of High Performance and High Quality Factor MEMS Spiral Inductor Parsa Pirouznia * and Bahram Azizollah Ganji Abstract
More informationhal , version 1-20 Feb 2008
Author manuscript, published in "DTIP 27, Stresa, lago Maggiore : Italy (27)" Stresa, Italy, 2527 April 27 NOISE AND THERMAL STAILITY OF IRATING MIROGYROMETERS PREAMPLIFIERS R. Levy 1, A.Dupret 1, H. Mathias
More informationCarbonized Electrospun Nanofiber Sheets for Thermophones
Supporting Information Carbonized Electrospun Nanofiber Sheets for Thermophones Ali E. Aliev 1 *, Sahila Perananthan 2, John P. Ferraris 1,2 1 A. G. MacDiarmid NanoTech Institute, University of Texas at
More informationIntegrated Circuits & Systems
Federal University of Santa Catarina Center for Technology Computer Science & Electronics Engineering Integrated Circuits & Systems INE 5442 Lecture 7 Interconnections 1: wire resistance, capacitance,
More informationDESIGN AND OPTIMIZATION OF BULK MICROMACHINED ACCELEROMETER FOR SPACE APPLICATIONS
INTERNATIONAL JOURNAL ON SMART SENSING AND INTELLIGENT SYSTEMS, VOL. 1, NO. 4, DECEMBER 008 DESIGN AND OPTIMIZATION OF BULK MICROMACHINED ACCELEROMETER FOR SPACE APPLICATIONS Thampi Paul 1, Jaspreet Singh,
More informationLecture 12: MOS Capacitors, transistors. Context
Lecture 12: MOS Capacitors, transistors Context In the last lecture, we discussed PN diodes, and the depletion layer into semiconductor surfaces. Small signal models In this lecture, we will apply those
More information(Refer Slide Time: 02:27)
MEMS & Microsystems Prof. Santiram Kal Department of Electronics and Electrical Communication Engineering Indian Institute of Technology, Kharagpur Lecture No. # 02 Introduction to Microsensors So, in
More informationRobotics Errors and compensation
Robotics Errors and compensation Tullio Facchinetti Friday 17 th January, 2014 13:17 http://robot.unipv.it/toolleeo Problems in sensors measurement the most prominent problems
More informationTime-of-Flight Flow Microsensor using Free-Standing Microfilaments
07-Rodrigues-V4 N2-AF 19.08.09 19:41 Page 84 Time-of-Flight Flow Microsensor using Free-Standing Microfilaments Roberto Jacobe Rodrigues 1,2, and Rogério Furlan 3 1 Center of Engineering and Social Sciences,
More informationMicro-sensors based on thermal transduction for steady and unsteady flow measurements
Micro-sensors based on thermal transduction for steady and unsteady flow measurements Abdelkrim Talbi 7/11/2013 Institute of Electronic Microelectronic and Nanotechnologies (IEMN) A.Talbi, J-C. Gerbedoen,
More informationSwitched-Capacitor Circuits David Johns and Ken Martin University of Toronto
Switched-Capacitor Circuits David Johns and Ken Martin University of Toronto (johns@eecg.toronto.edu) (martin@eecg.toronto.edu) University of Toronto 1 of 60 Basic Building Blocks Opamps Ideal opamps usually
More informationInstitute for Electron Microscopy and Nanoanalysis Graz Centre for Electron Microscopy
Institute for Electron Microscopy and Nanoanalysis Graz Centre for Electron Microscopy Micromechanics Ass.Prof. Priv.-Doz. DI Dr. Harald Plank a,b a Institute of Electron Microscopy and Nanoanalysis, Graz
More informationMara Bruzzi INFN and University of Florence, Italy and SCIPP, UC Santa Cruz, USA
SCIPP 06/16 September 2006 Capacitance-Voltage analysis at different temperatures in heavily irradiated silicon detectors Mara Bruzzi INFN and University of Florence, Italy and SCIPP, UC Santa Cruz, USA
More informationEE C245 / ME C218 INTRODUCTION TO MEMS DESIGN FALL 2009 PROBLEM SET #7. Due (at 7 p.m.): Thursday, Dec. 10, 2009, in the EE C245 HW box in 240 Cory.
Issued: Thursday, Nov. 24, 2009 PROBLEM SET #7 Due (at 7 p.m.): Thursday, Dec. 10, 2009, in the EE C245 HW box in 240 Cory. 1. Gyroscopes are inertial sensors that measure rotation rate, which is an extremely
More informationan introduction to Semiconductor Devices
an introduction to Semiconductor Devices Donald A. Neamen Chapter 6 Fundamentals of the Metal-Oxide-Semiconductor Field-Effect Transistor Introduction: Chapter 6 1. MOSFET Structure 2. MOS Capacitor -
More informationChapter 8. Model of the Accelerometer. 8.1 The static model 8.2 The dynamic model 8.3 Sensor System simulation
Chapter 8. Model of the Accelerometer 8.1 The static model 8.2 The dynamic model 8.3 Sensor System simulation 8.2.1 Basic equations 8.2.2 Resonant frequency 8.2.3 Squeeze-film damping 8.2 The dynamic model
More informationESE 570: Digital Integrated Circuits and VLSI Fundamentals
ESE 570: Digital Integrated Circuits and VLSI Fundamentals Lec 4: January 23, 2018 MOS Transistor Theory, MOS Model Penn ESE 570 Spring 2018 Khanna Lecture Outline! CMOS Process Enhancements! Semiconductor
More informationMicromechanical Instruments for Ferromagnetic Measurements
Micromechanical Instruments for Ferromagnetic Measurements John Moreland NIST 325 Broadway, Boulder, CO, 80305 Phone:+1-303-497-3641 FAX: +1-303-497-3725 E-mail: moreland@boulder.nist.gov Presented at
More informationSimulation and Optimization of an In-plane Thermal Conductivity Measurement Structure for Silicon Nanostructures
32nd International Thermal Conductivity Conference 20th International Thermal Expansion Symposium April 27 May 1, 2014 Purdue University, West Lafayette, Indiana, USA Simulation and Optimization of an
More informationResistance Thermometry based Picowatt-Resolution Heat-Flow Calorimeter
Resistance Thermometry based Picowatt-Resolution Heat-Flow Calorimeter S. Sadat 1, E. Meyhofer 1 and P. Reddy 1, 1 Department of Mechanical Engineering, University of Michigan, Ann Arbor, 48109 Department
More informationTHERMAL MICROSENSOR FOR APPLICATION IN RADIOMETER
XVIII IMEKO WORLD CONGRESS Metrology for a Sustainable Development September, 17 22, 2006, Rio de Janeiro, Brazil THERMAL MICROSENSOR FOR APPLICATION IN RADIOMETER Francisco Santos 1, Rafael Cantalice,
More informationSensors and Actuators Sensors Physics
Sensors and Actuators Sensors Physics Sander Stuijk (s.stuijk@tue.nl) Department of Electrical Engineering Electronic Systems HEMOESISIVE SENSOS (Chapter 16.3) 3 emperature sensors placement excitation
More information1711. Analysis on vibrations and infrared absorption of uncooled microbolometer
1711. Analysis on vibrations and infrared absorption of uncooled microbolometer Chao Chen 1, Long Zhang 2, Yun Zhou 3, Xing Zheng 4, Jianghui Dong 5 1, 2, 3, 4 School of Optoelectronic Information, University
More information20 MHz Free-Free Beam Microelectromechanical Filter with High Quality Factor
20 MHz Free-Free Beam Microelectromechanical Filter with High Quality Factor Group 4 Yang Lu 1, Tianfeng Lu 1, Han Wang 2, Zichen Tang 2 1 Department of Material Science and Engineering 2 Department of
More informationSilicon Capacitive Accelerometers. Ulf Meriheinä M.Sc. (Eng.) Business Development Manager VTI TECHNOLOGIES
Silicon Capacitive Accelerometers Ulf Meriheinä M.Sc. (Eng.) Business Development Manager VTI TECHNOLOGIES 1 Measuring Acceleration The acceleration measurement is based on Newton s 2nd law: Let the acceleration
More informationSelf-study problems and questions Processing and Device Technology, FFF110/FYSD13
Self-study problems and questions Processing and Device Technology, FFF110/FYSD13 Version 2016_01 In addition to the problems discussed at the seminars and at the lectures, you can use this set of problems
More informationHeterogeneous 3D integration considered by the perspective of reliability studied in the European projects e-brains and ESiP
Workshop Heterogeneous 3D integration considered by the perspective of reliability studied in the European projects and ESiP Best-Reliable Ambient Intelligent Nanosensor Systems by Heterogeneous Integration
More informationMODELING, DESIGN AND EXPERIMENTAL CARACHTERIZATION OF MICRO-ELECTRO ELECTRO-MECHANICAL- SYSTEMS FOR GAS- CHROMATOGRAPHIC APPLICATIONS
MODELING, DESIGN AND EXPERIMENTAL CARACHTERIZATION OF MICRO-ELECTRO ELECTRO-MECHANICAL- SYSTEMS FOR GAS- CHROMATOGRAPHIC APPLICATIONS ENRICO COZZANI DEIS DOCTORATE CYCLE XXIII 18/01/2011 Enrico Cozzani
More informationStatic temperature analysis and compensation of MEMS gyroscopes
Int. J. Metrol. Qual. Eng. 4, 209 214 (2013) c EDP Sciences 2014 DOI: 10.1051/ijmqe/2013059 Static temperature analysis and compensation of MEMS gyroscopes Q.J. Tang 1,2,X.J.Wang 1,Q.P.Yang 2,andC.Z.Liu
More informationLecture 040 Integrated Circuit Technology - II (5/11/03) Page ECE Frequency Synthesizers P.E. Allen
Lecture 040 Integrated Circuit Technology - II (5/11/03) Page 040-1 LECTURE 040 INTEGRATED CIRCUIT TECHNOLOGY - II (Reference [7,8]) Objective The objective of this presentation is: 1.) Illustrate and
More informationMICROMECHANICAL TEMPERATURE SENSOR
MICROMECHANICAL TEMPERATURE SENSOR Ralitza Simeonova Gjosheva 2, Krassimir Hristov Denishev 1 1 Department of Microelectronics, Technical University - Sofia, 8 Kliment Ohridski Blvd., bl. 1, 1797-Sofia,
More informationEECS240 Spring Today s Lecture. Lecture 2: CMOS Technology and Passive Devices. Lingkai Kong EECS. EE240 CMOS Technology
EECS240 Spring 2013 Lecture 2: CMOS Technology and Passive Devices Lingkai Kong EECS Today s Lecture EE240 CMOS Technology Passive devices Motivation Resistors Capacitors (Inductors) Next time: MOS transistor
More informationEE C247B / ME C218 INTRODUCTION TO MEMS DESIGN SPRING 2014 PROBLEM SET #1
Issued: Thursday, Jan. 30, 2014 PROBLEM SET #1 Due (at 9 a.m.): Wednesday Feb. 12, 2014, in the EE C247B HW box near 125 Cory. This homework assignment is intended to give you some early practice playing
More informationPiezoresistive Sensors
Piezoresistive Sensors Outline Piezoresistivity of metal and semiconductor Gauge factor Piezoresistors Metal, silicon and polysilicon Close view of the piezoresistivity of single crystal silicon Considerations
More informationProceedings MEMS Inertial Switch for Military Applications
Proceedings MEMS Inertial Switch for Military Applications Hyo-Nam Lee 1, Seung-Gyo Jang 1, *, Sungryeol Lee 2, Jeong-Sun Lee 2 and Young-Suk Hwang 2 1 Agency for Defence Development, Daejeon, Korea; lhn4577@add.re.kr
More informationMOSFET: Introduction
E&CE 437 Integrated VLSI Systems MOS Transistor 1 of 30 MOSFET: Introduction Metal oxide semiconductor field effect transistor (MOSFET) or MOS is widely used for implementing digital designs Its major
More informationSimple piezoresistive accelerometer
Simple piezoresistive pressure sensor Simple piezoresistive accelerometer Simple capacitive accelerometer Cap wafer C(x)=C(x(a)) Cap wafer may be micromachined silicon, pyrex, Serves as over-range protection,
More informationQuiz #1 Practice Problem Set
Name: Student Number: ELEC 3908 Physical Electronics Quiz #1 Practice Problem Set? Minutes January 22, 2016 - No aids except a non-programmable calculator - All questions must be answered - All questions
More informationContactless Excitation of MEMS Resonant Sensors by Electromagnetic Driving
Excerpt from the Proceedings of the COMSOL Conference 2009 Milan Contactless Excitation of MEMS Resonant Sensors by Electromagnetic Driving M. Baù *, V. Ferrari, D. Marioli Department of Electronics for
More informationSensing, Computing, Actuating
Sensing, Computing, Actuating Sander Stuijk (s.stuijk@tue.nl) Department of Electrical Engineering Electronic Systems HEMOESISIVE SENSOS AND LINEAIZAION (Chapter.9, 5.11) 3 Applications discharge air temperature
More informationESE 570: Digital Integrated Circuits and VLSI Fundamentals
ESE 570: Digital Integrated Circuits and VLSI Fundamentals Lec 4: January 29, 2019 MOS Transistor Theory, MOS Model Penn ESE 570 Spring 2019 Khanna Lecture Outline! CMOS Process Enhancements! Semiconductor
More informationRelative-Air Humidity Sensing Element Based on Heat Transfer of a Single Micromachined Floating Polysilicon Resistor
Relative-Air Humidity Sensing Element Based on Heat Transfer of a Single Micromachined Floating Polysilicon Resistor P. Zambrozi Jr. and F. Fruett School of Electrical and Computer Engineering FEEC, University
More informationCMOS Cross Section. EECS240 Spring Today s Lecture. Dimensions. CMOS Process. Devices. Lecture 2: CMOS Technology and Passive Devices
EECS240 Spring 2008 CMOS Cross Section Metal p - substrate p + diffusion Lecture 2: CMOS echnology and Passive Devices Poly n - well n + diffusion Elad Alon Dept. of EECS EECS240 Lecture 2 4 oday s Lecture
More informationThermal System Closed-Loop Temperature Control
Thermal System Closed-Loop Temperature Control aluminum plate thin-film resistive heater ceramic insulation conduction and convection heat transfer AD590 temperature sensor microcontroller on-off closed-loop
More informationPractice 3: Semiconductors
Practice 3: Semiconductors Digital Electronic Circuits Semester A 2012 VLSI Fabrication Process VLSI Very Large Scale Integration The ability to fabricate many devices on a single substrate within a given
More informationE05 Resonator Design
POLITECNICO DI MILANO MSC COURSE - MEMS AND MICROSENSORS - 2018/2019 E05 Resonator Design Giorgio Mussi 16/10/2018 In this class we will learn how an in-plane MEMS resonator handles process variabilities,
More informationDesign And Analysis of Microcantilevers With Various Shapes Using COMSOL Multiphysics Software
Design And Analysis of Microcantilevers With Various Shapes Using COMSOL Multiphysics Software V. Mounika Reddy 1, G.V.Sunil Kumar 2 1,2 Department of Electronics and Instrumentation Engineering, Sree
More informationEE C245 / ME C218 INTRODUCTION TO MEMS DESIGN FALL 2011 C. Nguyen PROBLEM SET #7. Table 1: Gyroscope Modeling Parameters
Issued: Wednesday, Nov. 23, 2011. PROBLEM SET #7 Due (at 7 p.m.): Thursday, Dec. 8, 2011, in the EE C245 HW box in 240 Cory. 1. Gyroscopes are inertial sensors that measure rotation rate, which is an extremely
More informationAn Electronic Thermal Transducer
An Electronic Thermal Transducer PRJ NO: 16 By Okore Daniel F17/969/ Supervisor : Dr. Mwema Examiner: Dr. Abungu INTRODUCTION The aim of this project was to design and implement a temperature sensor in
More informationTemperature stabilization of CMOS capacitive accelerometers
INSTITUTE OFPHYSICS PUBLISHING JOURNAL OFMICROMECHANICS ANDMICROENGINEERING J. Micromech. Microeng. 14 (2004) 559 566 PII: S0960-1317(04)71039-6 Temperature stabilization of CMOS capacitive accelerometers
More informationFRAUNHOFER IISB STRUCTURE SIMULATION
FRAUNHOFER IISB STRUCTURE SIMULATION Eberhard Bär eberhard.baer@iisb.fraunhofer.de Page 1 FRAUNHOFER IISB STRUCTURE SIMULATION Overview SiO 2 etching in a C 2 F 6 plasma Ga ion beam sputter etching Ionized
More informationContactless Excitation of MEMS Resonant Sensors by Electromagnetic Driving
Presented at the COMSOL Conference 2009 Milan University of Brescia Department of Electronics for Automation Contactless Excitation of MEMS Resonant Sensors by Electromagnetic Driving Marco Baù, VF V.
More informationDevice 3D. 3D Device Simulator. Nano Scale Devices. Fin FET
Device 3D 3D Device Simulator Device 3D is a physics based 3D device simulator for any device type and includes material properties for the commonly used semiconductor materials in use today. The physical
More informationFabrication Technology, Part I
EEL5225: Principles of MEMS Transducers (Fall 2004) Fabrication Technology, Part I Agenda: Microfabrication Overview Basic semiconductor devices Materials Key processes Oxidation Thin-film Deposition Reading:
More informationThe Pull-In of Symmetrically and Asymmetrically Driven Microstructures and the Use in DC Voltage References
IEEE Instrumentation and Measurement Technology Conference Anchorage, AK, USA, 1-3 May 00 The Pull-In of Symmetrically and Asymmetrically Driven Microstructures and the Use in DC Voltage References L.A.
More informationEE382M-14 CMOS Analog Integrated Circuit Design
EE382M-14 CMOS Analog Integrated Circuit Design Lecture 3, MOS Capacitances, Passive Components, and Layout of Analog Integrated Circuits MOS Capacitances Type of MOS transistor capacitors Depletion capacitance
More informationSENSOR DEVICES MECHANICAL SENSORS
SENSOR DEVICES MECHANICAL SENSORS OUTLINE 4 Mechanical Sensors Introduction General mechanical properties Piezoresistivity Piezoresistive sensors Capacitive sensors Applications INTRODUCTION MECHANICAL
More informationSensors and Transducers. mywbut.com
Sensors and Transducers 1 Objectives At the end of this chapter, the students should be able to: describe the principle of operation of various sensors and transducers; namely.. Resistive Position Transducers.
More informationCMOS Devices. PN junctions and diodes NMOS and PMOS transistors Resistors Capacitors Inductors Bipolar transistors
CMOS Devices PN junctions and diodes NMOS and PMOS transistors Resistors Capacitors Inductors Bipolar transistors PN Junctions Diffusion causes depletion region D.R. is insulator and establishes barrier
More information! CMOS Process Enhancements. ! Semiconductor Physics. " Band gaps. " Field Effects. ! MOS Physics. " Cut-off. " Depletion.
ESE 570: Digital Integrated Circuits and VLSI Fundamentals Lec 4: January 3, 018 MOS Transistor Theory, MOS Model Lecture Outline! CMOS Process Enhancements! Semiconductor Physics " Band gaps " Field Effects!
More informationMaria-Alexandra PAUN, PhD
On the modelisation of the main characteristics of SOI Hall cells by three-dimensional physical simulations Maria-Alexandra PAUN, PhD Visiting Researcher High Voltage Microelectronics and Sensors (HVMS)
More informationEE105 Fall 2014 Microelectronic Devices and Circuits. NMOS Transistor Capacitances: Saturation Region
EE105 Fall 014 Microelectronic Devices and Circuits Prof. Ming C. Wu wu@eecs.berkeley.edu 511 Sutardja Dai Hall (SDH) 1 NMOS Transistor Capacitances: Saturation Region Drain no longer connected to channel
More informationLateral SiC bipolar junction transistors for high current IC driver applications
KTH ROYAL INSTITUTE OF TECHNOLOGY Lateral SiC bipolar junction transistors for high current IC driver applications Carl-Mikael Zetterling M. Ekström, H. Elahipanah, M. W. Hussain, K. Jacobs, S. Kargarrazi,
More informationCMOS Comparators. Kyungpook National University. Integrated Systems Lab, Kyungpook National University. Comparators
IsLab Analog Integrated ircuit Design OMP-21 MOS omparators כ Kyungpook National University IsLab Analog Integrated ircuit Design OMP-1 omparators A comparator is used to detect whether a signal is greater
More informationSCB10H Series Pressure Elements PRODUCT FAMILY SPEFICIFATION. Doc. No B
PRODUCT FAMILY SPEFICIFATION SCB10H Series Pressure Elements SCB10H Series Pressure Elements Doc. No. 82 1250 00 B Table of Contents 1 General Description... 3 1.1 Introduction... 3 1.2 General Description...
More informationChapter 8. Model of the Accelerometer. 8.1 The static model 8.2 The dynamic model 8.3 Sensor System simulation
Chapter 8. Model of the Accelerometer 8.1 The static model 8.2 The dynamic model 8.3 Sensor System simulation 8.3 Sensor System Simulation In order to predict the behavior of the mechanical sensor in combination
More informationEvaluation of Pressure Sensor Performance Dr. Lynn Fuller Webpage:
ROCHESTER INSTITUTE OF TECHNOLOGY MICROELECTRONIC ENGINEERING Evaluation of Pressure Sensor Performance Webpage: http://people.rit.edu/lffeee 82 Lomb Memorial Drive Rochester, NY 14623-5604 Tel (585) 475-2035
More informationMICROMECHANICAL PIEZORESISTIVE TACTILE SENSOR
MICROMECHANICAL PIEZORESISTIVE TACTILE SENSOR Krassimir Hristov Denishev, Anna Rumyanova Petrova, Department Microelectronics, Technical University - Sofia, Kl. Ohridski Str. No.8, bl., 797-Sofia, Bulgaria,
More informationpickup from external sources unwanted feedback RF interference from system or elsewhere, power supply fluctuations ground currents
Noise What is NOISE? A definition: Any unwanted signal obscuring signal to be observed two main origins EXTRINSIC NOISE examples... pickup from external sources unwanted feedback RF interference from system
More informationEE C247B / ME C218 INTRODUCTION TO MEMS DESIGN SPRING 2016 C. NGUYEN PROBLEM SET #4
Issued: Wednesday, March 4, 2016 PROBLEM SET #4 Due: Monday, March 14, 2016, 8:00 a.m. in the EE C247B homework box near 125 Cory. 1. This problem considers bending of a simple cantilever and several methods
More informationSingle- and dual-axis lateral capacitive accelerometers based on CMOS-MEMS technology
UNIVERSITY OF OSLO Department of informatics Single- and dual-axis lateral capacitive accelerometers based on CMOS-MEMS technology Master thesis Jia Yu Chen April 30, 2010 Abstract In order to have a
More informationImpact-Tek, LLC, Oil Sensors Phase 2, Design Review
ROCHESTER INSTITUTE OF TECHNOLOGY MICROELECTRONIC ENGINEERING Impact-Tek, LLC, Oil Sensors Phase 2, Design Review Dr. Lynn Fuller Ivan Puchades Webpage: http://people.rit.edu/lffeee 82 Lomb Memorial Drive
More informationCircuits. L5: Fabrication and Layout -2 ( ) B. Mazhari Dept. of EE, IIT Kanpur. B. Mazhari, IITK. G-Number
EE610: CMOS Analog Circuits L5: Fabrication and Layout -2 (12.8.2013) B. Mazhari Dept. of EE, IIT Kanpur 44 Passive Components: Resistor Besides MOS transistors, sometimes one requires to implement passive
More informationLMM-H04 Mass Air Flow Sensor
Hot Film Anemometer Component Highly reliable and long term stable Uni-directional airflow measurement Fast reaction time Manufactured according ISO TS16949 Can be adapted to various flow channel geometries
More informationCMOS Cross Section. EECS240 Spring Dimensions. Today s Lecture. Why Talk About Passives? EE240 Process
EECS240 Spring 202 CMOS Cross Section Metal p - substrate p + diffusion Lecture 2: CMOS Technology and Passive Devices Poly n - well n + diffusion Elad Alon Dept. of EECS EECS240 Lecture 2 4 Today s Lecture
More informationDr. Maria-Alexandra PAUN
Performance comparison of Hall Effect Sensors obtained by regular bulk or SOI CMOS technology Dr. Maria-Alexandra PAUN Visiting Researcher High Voltage Microelectronics and Sensors (HVMS) Group, Department
More informationTransistor Noise Lecture 14, High Speed Devices
Transistor Noise 016-03-03 Lecture 14, High Speed Devices 016 1 Transistor Noise A very brief introduction 016-03-0 Lecture 13, High Speed Devices 016 Summary hybrid p Noise is a randomly varying voltage/current
More informationSection 12: Intro to Devices
Section 12: Intro to Devices Extensive reading materials on reserve, including Robert F. Pierret, Semiconductor Device Fundamentals Bond Model of Electrons and Holes Si Si Si Si Si Si Si Si Si Silicon
More informationGENERAL CONTACT AND HYSTERESIS ANALYSIS OF MULTI-DIELECTRIC MEMS DEVICES UNDER THERMAL AND ELECTROSTATIC ACTUATION
GENERAL CONTACT AND HYSTERESIS ANALYSIS OF MULTI-DIELECTRIC MEMS DEVICES UNDER THERMAL AND ELECTROSTATIC ACTUATION Yie He, James Marchetti, Carlos Gallegos IntelliSense Corporation 36 Jonspin Road Wilmington,
More informationIntegrated measuring system for MEMS
Integrated measuring system for MEMS Thermal characterization of gas flows under slip-flow regime Alice Vittoriosi May 16, 2011 I NSTITUTE FOR M ICRO P ROCESS E NGINEERING - T HERMAL P ROCESS E NGINEERING
More informationPirani pressure sensor with distributed temperature measurement
Pirani pressure sensor with distributed temperature measurement B.R. de Jong, W.P.Bula, D. Zalewski, J.J. van Baar and R.J. Wiegerink MESA' Research Institute, University of Twente P.O. Box 217, NL-7500
More informationEE650R: Reliability Physics of Nanoelectronic Devices Lecture 18: A Broad Introduction to Dielectric Breakdown Date:
EE650R: Reliability Physics of Nanoelectronic Devices Lecture 18: A Broad Introduction to Dielectric Breakdown Date: Nov 1, 2006 ClassNotes: Jing Li Review: Sayeef Salahuddin 18.1 Review As discussed before,
More informationCIRCUIT ELEMENT: CAPACITOR
CIRCUIT ELEMENT: CAPACITOR PROF. SIRIPONG POTISUK ELEC 308 Types of Circuit Elements Two broad types of circuit elements Ati Active elements -capable of generating electric energy from nonelectric energy
More information! CMOS Process Enhancements. ! Semiconductor Physics. " Band gaps. " Field Effects. ! MOS Physics. " Cut-off. " Depletion.
ESE 570: Digital Integrated Circuits and VLSI Fundamentals Lec 4: January 9, 019 MOS Transistor Theory, MOS Model Lecture Outline CMOS Process Enhancements Semiconductor Physics Band gaps Field Effects
More informationInductance, Inductors, RL Circuits & RC Circuits, LC, and RLC Circuits
Inductance, Inductors, RL Circuits & RC Circuits, LC, and RLC Circuits Self-inductance A time-varying current in a circuit produces an induced emf opposing the emf that initially set up the timevarying
More informationWorkshops on X-band and high gradients: collaboration and resource
Workshops on X-band and high gradients: collaboration and resource 25 October 2012 International workshop on breakdown science and high gradient technology 18-20 April 2012 in KEK 25 October 2012 International
More informationDESIGN AND SIMULATION OF ACCELEROMETER SPRINGS
DESIGN AND SIMULATION OF ACCELEROMETER SPRINGS Marin Hristov Hristov 1, Kiril Toshkov Toshev 1, Krasimir Hristov Denishev 1, Vladimir Emilov Grozdanov 2, Dobromir Georgiev Gaydazhiev 2 1 Department of
More informationLaboratory-on-chip based sensors Part 2: Capacitive measurements
GBM8320 Dispositifs Médicaux Intelligents Laboratory-on-chip based sensors Part 2: Capacitive measurements Mohamad Sawan et al. Laboratoire de neurotechnologies Polystim!!! http://www.cours.polymtl.ca/gbm8320/!
More information