First Russian Standards in Nanotechnology

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1 ISSN , Bulletin of the Russian Academy of Sciences: Physics, 2009, Vol. 73, No. 4, pp Allerton Press, Inc., Original Russian Text V.P. Gavrilenko, E.N. Lesnovsky, Yu.A. Novikov, A.V. Rakov, P.A. Todua, M.N. Filippov, 2009, published in Izvestiya Rossiiskoi Akademii Nauk. Seriya Fizicheskaya, 2009, Vol. 73, No. 4, pp First Russian Standards in Nanotechnology V. P. Gavrilenko a, E. N. Lesnovsky a, Yu. A. Novikov b, A. V. Rakov b, P. A. Todua a, and M. N. Filippov c a Center for Surface and Vacuum Research, Moscow, Russia b Prokhorov General Physics Institute, Russian Academy of Sciences, Moscow, Russia c Kurnakov Institute of General and Inorganic Chemistry, Russian Academy of Sciences, Moscow, Russia nya@kapella.gpi.ru Abstract The problem of ensuring uniformity of measurements in nanotechnology is discussed. A functional block diagram is developed for length unit size transfer from the primary length standard (meter) to the nanometric range. The first six Russian national standards are presented, which ensure this transfer using scanning electron and atomic force microscopes. DOI: /S INTRODUCTION Modern economics is developed due to scientific and technological progress. In the 20th century, the state of economics of highly developed countries was determined to a large extent by high technologies in aviation, astronautics, nuclear power engineering, electronics, and (at the end of the century) in microelectronics and informatics. The beginning of the 21st century is characterized by the formation of a new direction in science and technology nanotechnology [1]. Nanotechnology is very rapidly developing in scientific, technical, and applied aspects, including solution of many economical and social problems, throughout the world. Therefore, there is a need for systematic approach both to organization of research implementation of its results in different fields of economical life. 1. NANOTECHNOLOGY Nanotechnology implies the following: (i) knowledge and control of processes occurring generally on the nanometer scale but not excluding a scale less than 100 nm in one or more dimensions when a size effect (phenomenon) leads to new possible applications; (ii) use of the properties of objects and materials on the nanometer scale, which differ from both the properties of free atoms or molecules and from the bulk properties of the material formed by these atoms or molecules, to improve the materials, devices, and systems realizing these new properties. A specific feature of nanotechnology is its interdisciplinary character, due to which the same phenomenon caused by a scale effect can be used in different fields of the economical life of society, such as information and telecommunication technologies, medicine, pharmacology, production of new materials and materials science, agriculture, diagnostics of diseases in early stages, ecology, and many others. The interdisciplinary character of nanotechnology; different terminology; and different research, technological, and measurement approaches and methods, used in different fields by different research centers and laboratories, led to some disconnection, impeding successful exchange with technical information. 2. NANOMETROLOGY METROLOGY ON THE NANOSCALE The development of science and technology goes hand in hand with the development of the system, methods, and tools of measurements. Currently, the entire human activity can be covered by a unified scale of sizes (Fig. 1). This scale is headed by the primary standard of the length unit meter. Different fields of economical human activity occupy different ranges on this scale. Transition to nanotechnology put a number of new specific problems before science and technology; Transport Meter primary length unit standard Ranges of sizes used in different fields of economics Building Machine building m 10 3 Microelectronics Nanotechnology kilometers meters millimeters micrometers nanometers 10 6 Nanometrology Fig. 1. Scale of linear sizes in economical human activity. 433

2 434 GAVRILENKO et al. Basis Short measures transfer standards Basic length unit standard in the range 1 nm 100 µm on the basis of scanning electron and probe microscopy and laser interferometry Objects of measurements Samples with standard composition, structure, and properties Calibration Measurement tools Measurements Fig. 2. Block diagram of physical unit transfer to the nanoscale range. these problems are related to the small sizes of elements and structures with which nanotechnology deals. In nanotechnology, the thesis what you cannot measure cannot be managed is urgent as nowhere else. All countries involved in the nanotechnological breakthrough clearly realize the necessity of advanced development of metrology in this intensively evolving field of knowledge, because specifically the level of accuracy and reliability of measurements can either stimulate development of the corresponding fields of the economical life of society or be a limiting factor. Metrology is on the one hand a science about measurements, methods, and tools for achieving their global uniformity and required measurement accuracy. At the same time, it is an institute aimed at ensuring the uniformity of measurements within a country, including standardization of physical units, their reproduction with the highest (in this country) accuracy using the state standards and hierarchical transfer of physical unit sizes from top to bottom to all measurement tools (instruments) applicable on the territory of this country. The main problem of metrology is to ensure uniformity of measurements, i.e., to reach the state in which measurement results are expressed in terms of legitimate units and the measurement errors are known with a specified probability. Using a conventional school ruler, we do not bear in mind that its scale is hierarchically related to the state standard of meter. In view of this, different users of different rulers, measuring the length of the same object, obtain the same result (naturally, with a certain error). This is the essence of ensuring uniformity of measurements. The specificity of nanotechnology led to the development of new direction in metrology nanometrology, which interrelates all theoretical and practical aspects of metrological ensurance of uniformity of measurements in nanotechnology. First, these are standards of the physical quantities and standard systems, as well as samples with standard composition, structure, and properties, aimed at transferring the physical unit sizes to nanoscale (Fig. 2). Second, these are certified or standardized methods for measuring physicochemical parameters and properties of nanotechnological objects, as well as methods for calibrating (verification) of the measurement tools used in nanotechnology. Third, this is the metrological environment of the processes of fabrication of materials, structures, objects, and other nanotechnology products. The definition of nanotechnology, which operates with nanoscale objects, naturally suggests the top priority task of measuring the geometric parameters of an object (Fig. 2), which, in turn, calls for ensurance of uniformity of linear nanomeasurements. However, the role of nanometrology of linear measurements is not restricted to this problem. Metrology of linear measurements is implicitly presented in the overwhelming majority of methods and tools aimed at providing uniform measurements of physicochemical parameters and properties (mechanical, optical, electric, magnetic, acoustic, etc.) of nanotechnological objects. In many cases, it is necessary to perform precise spatial positioning of a measuring probe in the region of interest, while the range of linear scanning over each coordinate can be from several nanometers to several hundred micrometers or more, covering more than six orders of magnitude of a measured value (Fig. 1), and the required error in positioning can be as small as several tenths of a nanometer. 3. STANDARDIZATION IN NANOTECHNOLOGY Standardization is closely interrelated with metrology. One of the top priority tasks in this field is the standardization of the measured parameters and properties of materials, objects, elements, and structures of nanotechnology. With allowance for the interdisciplinary character of nanotechnology and the difference in the terminology and research and measurement procedures and methods, this is a difficult, successively solved problem, which has a positive unifying potential. This problem is closely related to the necessity of standardizing terms and definitions in nanotechnology, which is aimed at providing successful communication and mutual understanding between different research teams not only in a separately taken country but also in interdisciplinary exchange by information between different countries. A regular consequence is the need for certified and standardized measurement methods, techniques for calibrating and verifying measurement tools used in nanotechnology, and many other aspects, which were noted in enumeration of nanometrology problems. A peculiar aspect of standardization is the ensurance of health and safety of process operators, as well as the persons dealing with nanoproducts in all stages of the their production, tests, study, and applications, as well as the environmental safety.

3 FIRST RUSSIAN STANDARDS IN NANOTECHNOLOGY 435 All the aforesaid logically suggests that metrology has the highest statistical weight, because specifically metrology is the quantitative basis of standardization. 4. CONTRIBUTION OF THE RUSSIAN FEDERATION TO THE METROLOGY AND STANDARDIZATION FOR NANOTECHNOLOGY The State Metrological Service in the Russian Federatin is the Federal Agency on Technical Regulating and Metrology Rostechregulirovaniye and subsidiary organizations. Their duties include ensurance of measurement uniformity, including state tests aimed at certifying newly produced or imported measurement tools, surveying the state and application of exploited measurement tools, providing tracking of transfer of physical unit sizes to nanoscale for all used measurement instruments, metrological examination of standards and other normative documents, service of standard reference data, participation in international metrological organizations, etc. To solve nanotechnological problems, the Technical Committee on Standardization TC 441 Nanotechnologies and Nanomaterials of the Federal Agency on Technical Regulating and Metrology has been organized in the Russian Federation. The TC 441 activity covers the following fields: (i) terminology and definitions; (ii) measurements, including methods and tools; (iii) methods for testing nanotechnological objects; (iv) health, safety, and environment. The long-term investigations in the Russian Federation made it possible to solve the problem of developing metrological bases for length measurements in the range nm with the world priority. The results obtained made it possible to develop (i) methodology of ensuring measurement uniformity in the length range from 1 nm to 1 µm, based on the principles of probe microscopy and laser interferometry phasometry; (ii) a standard three-dimensional system for measuring nanodisplacements, providing reproduction and transfer of unit of length size in the range from 1 nm to 1 µm to real length measures with an error of 0.5 nm; (iii) new generation of short-length measures aimed at calibrating measurement tools in the range from 1 nm to 1 µm, including surface nanorelief measures; (iv) methods and algorithms for measuring the profile parameters for elements of micro- and nanostructures and a software package for automating such measurements. PS First-order standards Second-order standards Third-order standards Working measurement tools (a) 4.1. Ensurance of Uniformity of Nanoscale Measurements At the end of the 20th century, measurement of lengths smaller than 1 m was metrologically ensured only in the range 1 µm 1 m, which corresponded to the multistep block diagram of unit of length size transfer from the primary meter standard to the object measured. This scheme can be figuratively represented as a pyramid, whose base is the entire set of measurement tools and the vertex corresponds to the primary unit of length standard (Fig. 3a). The intermediate levels (different cross sections, parallel to the base) are occupied by the standards of the first, second, third (and sometimes fourth) orders. Each of them has some properties inherent in the standards of both the upper and lower levels, which makes it possible to transfer unit of length sizes between levels. Such a large number of levels increases the measurement error from 0.02 nm for the primary standard to 100 nm on a measured object, which excludes possibility of measuring linear sizes less than 1 µm. The rapid development of nanotechnology, which deals with objects having atomic-scale sizes, requires to ensure uniformity of linear nanoscale ( nm) measurements. Linear measurements in this length range are performed using new (developed in the second half of the 20th century) devices high-resolution probe (optical near-field, scanning electron, scanning tunnel, and atomic-force) microscopes. To transform the devices of a customer from observation to measurement tools, it is necessary to calibrate them with absolute reference to the primary unit of length standard meter. The old scheme of such referencing (Fig. 3a) is not appropriate to this end because of very large precision loss at intermediate levels. It is necessary to apply a new scheme with some intermediate levels eliminated. The best way is to leave only one level (Fig. 3b) a short-length measure with properties linking it with the primary standard and working measurement tools. The transition to the length measurements in the range nm required radically new solutions with drastic revision of the conventional approaches. To pass to length measurements in the noted range, we per- PS First-order standards Working measurement tools (b) Fig. 3. (a) Old and (b) new schemes of size transfer from the primary standard (PS) to the unit of lengths of working measurement tools.

4 436 GAVRILENKO et al. State primary length unit standard Collation using transfer standards Highest accuracy system for tools for measuring the linear sizes of surface nanorelief of solid-state structures Direct-measurement method Linear measure transfer standard SEM direct measurements SEMs L = 10 nm 100 µm L = nm SPM direct measurements SPMs L = 10 nm 100 µm L = nm Fig. 4. Block diagram of unit of length size transfer to the nanoscale range. formed basic research for the mechanisms of object image formation on an working measurement tool; maximally reduced the number of stages in the block diagram of unit of length size transfer from the primary standard to the working measurement tools; developed new measurement algorithms and the corresponding software, which made it possible to take into account the effect of interaction of the probe of a working measurement tool with a measured object; and designed a new short-length measure in the form of a relief pitch structure with a specified profile of its elements, having properties similar to those of the secondary length standard and the measured object. Specifically such three-dimensional short-length measures material size carriers are necessary not only to calibrate the above-mentioned probe microscopes but also to confirm the reliability of the results of measuring linear sizes of elements of real objects, which are observed in microscopes. Fulfilment of all these procedures allowed us to develop a block diagram of unit of length size transfer to the nanoscale range (Fig. 4). This diagram is based on the state primary standard of unit of length Primary Unit of Length Standard Meter The achievements of fundamental and applied physics in the 20th century made it possible to develop a new primary unit of length standard [2] on the basis of the three great discoveries made in this century. Discovery and rapid development of optical quantum generators monochromatic radiation sources with a high degree of spatial and temporal coherence, provided the metrology of linear measurements with a possibility of passing from the krypton-86 emission line to the radiation of an optical quantum generator having a higher stability and Q factor. Direct measurements of the light frequency of a highly stabilized He Ne laser made it possible to determine the speed of light c from the relation c = λν, where the frequency ν and wavelength λ are found from the frequency standard and meter standard definition, respectively. The third, final finding that formed the basis of the new primary length standard was the constancy of speed of light in any inertial coordinate system. It has been decided to use the speed of light and frequency as new main standards instead of length and time. On the basis of this decision, the 17th General Conference on Measures and Weights (1983) accepted the speed of light in vacuum as an invariable fundamental constant: c = m s 1. At the same conference, a meter was determined as the length of path passed by light in vacuum for 1/c s. At the 9th Session of the Consultation Committee on Length in September 1997, the recommended values of the frequency and wavelength of radiation of a He Ne/I 2 laser, stabilized with respect to the saturated absorption line of molecular iodine, were as follows: ν = khz, λ = nm. The primary meter standard, implementing this physical principle, ensures reproduction of the length unit (meter) with a relative standard deviation (uncertainty) of Thus, for a time interval somewhat longer than 100 yr (active life of three generations), the accuracy of meter standard increased by more than four orders of magnitude ( times). The new primary standard of unit of length is closely related to two physical effects, which are responsible for size transfer from the primary standard to working measurement tools: diffraction and interference. However, only interference makes it possible to realize this function in all length ranges used by humans. Length (linear) measurements can be separated into two ranges: measurements of large lengths (much larger than the radiation wavelength) and short lengths (of the same order of magnitude as the radiation wavelength or less). The measurement range of large lengths

5 FIRST RUSSIAN STANDARDS IN NANOTECHNOLOGY 437 is from few micrometers or tens of micrometers and larger (Fig. 1); it includes meters, kilometers, and larger lengths, such as the astronomical unit of length (the distance from the Earth to the Sun, equal to m), light year (the distance passed by light for 365 Earth s days, equal to m), and a parsec ( m). The measurement range of short lengths is from several micrometers to zero, which; however, is as unattainable as absolute zero temperature. Here, the characteristic sizes are micrometer (10 6 m), nanometer (10 9 m), and angstrom (10 10 m). The diameter of the first unexcited electron orbit in a hydrogen atom is approximately one angstrom. The use of interferometry in unit of length size transfer to large lengths does not meet fundamental difficulties and is limited only by the spatial and temporal coherence of the reference radiation source, while linear measurements of objects with sizes smaller (or much smaller) than the radiation wavelength require radically different approaches System of Highest Accuracy Z LINM Y LINM In accordance with the concept of ensurance of measurement uniformity, transfer of the unit of length size from the primary unit of length standard to the nanoscale range is performed by the system of highest accuracy for tools for measuring linear sizes of a nanorelief on solid structure surfaces (Fig. 4). This is a standard three-dimensional laser interferometric system for measuring nanodisplacements [3]. The standard system, formed on the basis of an atomic force microscope of original design and laser interferometric nanodisplacement meters (see schematic in Fig. 5) is aimed at measuring linear displacements along three coordinates and certifying measures and standard samples used to calibrate the measurement systems of customers. The displacement ranges are nm along the X and Y axes and nm along the Z axis. The displacement measurement uncertainties are 0.5 nm (along X and Y) and nm (along Z). The displacement range is mm. The nanodisplacements in the standard system are directly measured by a laser interferometric nanodisplacement meter (LINM) [4]. Its design is based on a combination of interferometry and phasometry methods. Three such meters, built-in into a standard threedimensional laser interferometric system for measuring nanodisplacements, measure displacements along three coordinates. However, the laser interferometric nanodisplacement meter is of independent importance. Its purpose is to measure linear displacements on the real-time scale, including calibration of scanning systems and positioning in micro- and nanotechnology, exact machine building, micromechanics, robotics, and scanning electron and scanning probe microscopy. The displacement measurement range is from 1 nm to 10 mm, with a reference discreteness of 0.1 nm. The absolute measurement error is in the range nm at a maximum measured velocity of 3 mm s Linear Measure As a Transfer Standard y z In the world practice, linear measurements in the nanoscale range are performed using scanning electron and atomic force microscopes (SEMs and AFMs, respectively). These microscopes are calibrated using test objects short-length measures. These are periodic, pitch, and single relief structures on the solid surface. The parameters of some of them are listed in Table 1. Table 2 contains the SEM and AFM parameters deterx X LINM Fig. 5. Schematic of the standard three-dimensional laser interferometric system for measuring nanodisplacements. Table 1. Test objects for SEMs and AFMs Test object Certification method Certified parameter Nominal size, nm HJ-1000 Diffraction Period 240 SRM-2090 Interference Pitch 200 BCR-97A/G-7 " " 400 MShPS-2.0K " " 2000 Line width * Relief height * * The nominal values of the linewidth and relief height are specified by a customer in preparation of a specific test object sample.

6 438 GAVRILENKO et al. Table 2. SEM and AFM parameters determined with test objects Test object SEM calibration AFM calibration HJ-1000 Magnification Scale division values for X and Y SRM-2090 " " BCR-97A/G-7 " " MShPS-2.0K " Scale division values for X, Y, and Z Scale linearity Scale linearity Probe diameter Scale orthogonality Cantilever tip radius mined using these test objects. The test object referred to as MShPS-2.0K (special measure of width and period, nominal pitch 2.0 µm, silicon) has the best properties [5]. Application of the MShPS-2.0K test object as a transfer standard (linear measure) in the block diagram of unit of length size transfer to the nanoscale range (Fig. 4) makes it possible to significantly reduce the number of stages in this diagram Direct Measurement Methods A relationship between the highest accuracy system, transfer standard, and measurement tools based on the use of SEMs and scanning probe microscopes (SPMs) is established using direct measurement methods (Fig. 4). Such methods have been developed for both SEMs [5, 6] and SPMs [5, 7]. They make it possible to calibrated microscopes for measuring the linear sizes of relief structures in the range from 10 nm to 100 µm with an uncertainty of nm. 5. FIRST RUSSIAN STANDARDS IN NANOTECHNOLOGY To ensure operation of the block diagram of unit of length size transfer to the nanoscale range (Fig. 4), six Russian state standards have been developed, which (a) (c) (b) (d) Fig. 6. Typical elements of a relief measure: (a) pitch, (b) single protrusion, (c) trapezoidal protrusion, and (d) pitch structure (fragment). regulate fabrication and application of test objects for SEM and AFM calibration: (i) GOST R Nanometer Range Relief Measures. Requirements for Geometrical Shapes, Linear Sizes, and Manufacturing Material Selection [8]. (ii) GOST R Nanometer Range Relief Measures with Trapezoidal Profile of Elements. Methods for Verification [9]. (iii) GOST R Atomic-Force Scanning Probe Measuring Microscopes. Methods for Verification [10]. (iv) GOST R Scanning Electron Measuring Microscopes. Methods for Verification [11]. (v) GOST R Atomic-Force Scanning Probe Measuring Microscopes. Methods for Calibration [12]. (vi) GOST R Scanning Electron Measuring Microscopes. Methods for Calibration [13]. Standard [8] specifies general requirements to the characteristics of a relief structure, which can be used in measurements of sizes in the range from 1 nm to 1 µm. According to this standard, the surface relief of a linear measure is a set of single elements: pitches, protrusions, and one or several pitch structures (Fig. 6). A relief structure is prepared from single-crystal silicon by anisotropic etching. The schematic of relief measure preparation is shown in Fig. 7. Figure 8 shows schematically the position of silicon crystallographic planes in the structure obtained by anisotropic etching of a Si(100) wafer through windows in a mask. The specific geometric form of relief elements in such a structure is chosen according to the techniques for verifying and calibrating SEMs [11, 13] and AFMs [10, 12]. The linear sizes of the relief structure elements are as follows: the linewidth (width of the upper protrusion base) is from 30 nm to 500 nm, the relief element height is from 100 to 800 nm, and the pitch size in periodic structures is from 1 to 3 µm. Standard [9] specifies the technique for verifying relief structures with trapezoidal elements nanoscale relief measures. The sizes of elements and material for their preparation correspond to the requirements of the standard [8].

7 FIRST RUSSIAN STANDARDS IN NANOTECHNOLOGY 439 The metrological characteristics of these measures are determined using an AFM and two laser doublebeam interferometers with He Ne lasers as radiation sources. The laser wavelength is stabilized with respect to the saturated-absorption line of molecular iodine. Two laser interferometers, one of which allows measurement of displacements in the horizontal direction and the other provides vertical measurements, are used along with the AFM to determine the main parameters of the trapezoidal elements: protrusion height, widths of the upper and lower protrusion bases, and the inclined wall projection onto the plane of the lower protrusion base. In this case, the width of the upper protrusion base is measured directly using the first derivative of an AFM signal. The standards [10] and [11] specify the techniques for verifying AFMs and SEMs that are used to measure sizes in the range from 1 nm to 1 µm, and the standards [12] and [13] specify the calibration techniques for AFMs and SEMs, respectively. A relief measure prepared according to the standard [8] and verified according to the standard [9] is used as a calibration tool for AFMs and SEMs. To calibrate a microscope (either AFM or SEM), the relief measure element under study is scanned, and a video image is recorded. Using the geometric characteristics of a relief measure element and the geometric characteristics of its video image, one can find the main characteristics of a microscope. To verify and calibrate an SEM, the parameters of relief measure elements are directly measured. The following characteristics are determined for AFMs: the scale coefficient of AFM video image, the effective cantilever tip radius, the vertical scale division value, and the relative deviation of the microscope Z scanner from orthogonality. The following characteristics are determined for SEMs: the scale coefficient of SEM video image and the effective electron beam diameter. The first four standards [8 11] came into force on February 1, 2008, and the two other standards [12, 13] were accepted on August 1, These standards ensure nanomeasurement uniformity with a possibility of tracing up to the primary meter standard (Fig. 4). 6. INTERNATIONAL COOPERATION IN NANOMETROLOGY The Committee TC 441 Nanotechnologies and Nanomaterials solves nanometrological problems on the basis of international cooperation. We should note the Technical Committees of the International Organization for Standardization (ISO) ISO/TC 229 Nanotechnology and the International Electrotechnical Committee IEC/TC 113 Standardization in Nanotechnologies for Electric and Electronic Products and Systems. The first session of ISO/TC 229 was performed on November 9 11, 2005, in London. It was organized by (100) Mask Protrusion Trench the British Standards Institute, which governs the secretariat of this committee. The top priority tasks of ISO/TC 229, stated by the members of the session (countries entering the ISO), which are greatly interested in the development of this field of knowledge, is the nanotechnology standardization in such fields as terms and definitions, metrology and methods of tests and measurements, samples with standard composition and properties, simulation of processes, medicine and safety, and environmental effect. Solution of these top priority problems should give a strong impetus to the development of nanotechnology and its practical applications and implementations in different fields of economics. Within the Technical Committee of the International Organization for Standardization ISO/TC 229 Nanotechnology, whose secretariat is carried out by the British Standards Institute, Japan controls the subcommittee on metrology, measurement methods, and tests; Canada is responsible for terms and definitions; and the United States deal with health, safety, and environmental problems. The Russian Federation is involved in the activity of the Technical Committee ISO/TC 229 Nan- (a) (b) (c) (d) Fig. 7. Schematic of test object preparation: (a) starting single-crystal Si(100) wafer, (b) wafer with a deposited technological layer (mask), (c) wafer after anisotropic etching, and (d) wafer with relief elements after mask removal. {111} {111} {100} Fig. 8. Schematic arrangement of the silicon crystallographic planes in a structure prepared by anisotropic etching of a Si(100) wafer through windows in a mask.

8 440 GAVRILENKO et al. otechnology via the Russian Technical Committee TC 441 Nanotechnologies and Nanomaterials. Within the International Organization COOMET on European Asian cooperation in metrology, the project Metrological Ensurance of Nanotechnologies has been coordinated. It is devoted to solution of fundamental problems of metrology in nanotechnology. The member countries are the Russian Federation, Belarus, Ukraine, Slovakia, and Germany. The project is coordinated by the Russian Federation. CONCLUSIONS The development of nanotechnology and wide application of its achievements to science, technique, production, and ensurance of production quality are impossible without advanced development of methods and measurement tools. The phrase what you cannot measure cannot be managed characterizes the development of any branch. Advanced development of the metrological ensurance of nanotechnology and primarily ensurance of uniformity of linear measurements in the nanoscale and adjacent ranges is the fundamental base of nanometrology and one of the main factors of successful evolution of nanotechnology main component of the economical development of society as a whole. First pitches have been made in this way: (i) Fundamentals of the infrastructure for standardization in nanotechnologies are formed. The core of this infrastructure is the Technical Committee TC 441, which coordinates its activity with the corresponding Technical Committees of the International Organizations on Standardization: ISO/TC 229 and IEC/TC 113. (ii) The concept of unit of length standard in the nanoscale range as a basis standard for the system ensuring measurement uniformity in nanotechnology is developed. (iii) The methods and tools for transferring the physical unit size to the nanoscale range are elaborated, which make it possible to trace this transfer. (iv) The methods and tools for verifying and calibrating SEMs and AFMs basic tools of linear nanomeasurements are developed and standardized. (v) The first Russian standards in nanotechnology are elaborated. All these achievements form prerequisites and grounds for rapid development of high technologies in Russia and especially the main of them nanotechnology. REFERENCES 1. National Technology Initiative. The Initiative and Its Implementation Plan, Subcommittee on Nanoscience, Engineering and Technology, 2000; 2. Fedorin, V.L., Rossiiskaya metrologicheskaya entsiklopediya (Russian Metrological Encyclopedia), St. Petersburg: Izd-vo Liki Rossii, Kalendin, V.V., Chernyakov, V.N., Todua, P.A., and Zhelkovaev, Zh., Proc. 9th Int. Precision Engineering Seminar, Germany, 1997, p Darznek, S.A., Zhelkobaev, Zh., Kalendin, V.V., and Novikov, Yu.A., Trudy IOFAN, 2006, vol. 62, p Volk, Ch.P., Gornev, E.S., Novikov, Yu.A., et al., Mikroelektronika, 2002, vol. 31, no. 4, p Novikov, Yu.A., Rakov, A.V., and Todua, P.A., Proc. SPIE, 2006, vol. 6260, Novikov, Yu.A., Ozerin, Yu.V., Plotnikov, Yu.I., et al., Trudy IOFAN, 2006, vol. 62, p Mery rel efnye nanometrovogo diapazona. Trebovaniya k geometricheskim formam, lineinym razmeram i vyboru materiala dlya izgotovleniya: GOST R (Nanometer Range Relief Measures. Requirements for Geometrical Shapes, Linear Sizes, and Manufacturing Material Selection: State Standard R ), Moscow: Standartinform, Mery rel efnye nanometrovogo diapazona s trapetseidal nym profilem elementov. Metodika poverki: GOST R (Nanometer Range Relief Measures with Trapezoidal Profile of Elements. Methods for Verification: State Standard R ), Moscow: Standartinform, Mikroskopy skaniruyushchie zondovye atomno-silovye izmeritel nye. Metodika poverki: GOST R (Atomic-Force Scanning Probe Measuring Microscopes. Methods for Verification: State Standard R ), Moscow: Standartinform. 11. Mikroskopy elektronnye rastrovye izmeritel nye. Metodika poverki: GOST R (Scanning Electron Measuring Microscopes. Methods for Verification: State Standard R ), Moscow: Standartinform, Mikroskopy skaniruyushchie zondovye atomno-silovye. Metodika kalibrovki: GOST R (Atomic- Force Scanning Probe Measuring Microscopes. Methods for Calibration: State Standard R ), Moscow: Standartinform, Mikroskopy elektronnye rastrovye. Metodika kalibrovki: GOST R (Scanning Electron Measuring Microscopes. Methods for Calibration: State Standard R ), Moscow: Standartinform, 2008.