Low Temperature Plasma Physics

Transcription

1 Rainer Hippler, Sigismund Pfau, Martin Schmidt, Karl H. Schoenbach (Eds.) Low Temperature Plasma Physics Fundamental Aspects and Applications WILEY-VCH Berlin Weinheim New York Chichester Brisbane Singapore Toronto

2 Contents 1 Characteristics of low-temperature plasmas under non-thermal conditions a short summary (Alfred Rutscher) Introduction Definition Types of plasmas Starting point for modeling the plasma state Single-particle trajectories Kinetic and statistical theory Hydrodynamic approximation The role of charge carriers Facts and formulas Electron energy distribution functions (EEDF) Kinetic temperature of electrons Coefficients for particle and energy transport Generalized Вoltzmann equilibrium Ambipolar diffusion Condition of quasi-neutrality Debye screening length Degree of ionization Electrical conductivity Plasma frequency 27 2 Electron kinetics in weakly ionized plasmas (Rolf Winkler) Introduction The active role of electrons in the plasma Action of electric fields and collision processes Kinetic treatment of the electrons Velocity distribution and macroscopic properties Kinetic equation of the electrons Treatment of the kinetic equation Macroscopic properties of the electrons Kinetics in time-and space-independent plasmas Basic equations and consistent macroscopic balances Illustration of distribution functions and macroscopic quantities... 39

3 Contents 2.4 Electron kinetics in time-dependent plasmas Basic equations for the distribution components Balance equations and dissipation frequencies Temporal relaxation of the electrons Electron kinetics in space-dependent plasmas Basic equations and consistent balances Spatial relaxation of the electrons Concluding remarks 52 References 53 Elementary collision processes in plasmas {Kurt H. Becker) Introduction Summary of electron impact-induced collision processes with atoms Electron impact-induced collision processes with molecules Concluding remarks 74 References 74 Fundamental processes in plasma-surface interactions {Rainer Hippler) Introduction Theoretical considerations Binary collision model Molecular dynamics model Scattering potentials Scattering of ions at surfaces Implantation of ions Backscattering of ions Physical sputtering Projectile energy dependence Energy distribution of sputtered particles Sputtering of clusters Potential sputtering employing highly-charged ions Electron emission Emission of electrons by electron impact Emission of electrons by ion impact Emission of electrons by cluster impact Chemical effects Chemical sputtering and plasma etching 106 References 109 Modeling of plasma-wall interaction {Holger Kersten) Introduction Characterization of the elementary mechanisms in low-temperature plasma processing Adsorption, desorption, diffusion Reflection, activation, mixing 117

4 5.2.3 Physical sputtering and implantation Chemical reactions at the surface Modeling of etching and deposition processes Particle balance Temperature dependence of the processes Energy balance of the substrate during low-temperature plasma processing 125 References Langmuir probe diagnostics of low-temperature plasmas (Sigismund Pfau and Milan Tichy) Introduction Probe shapes and probe characteristics The working regimes of the Langmuir probe Advantages and disadvantages of probe diagnostics The Langmuir single probe method Theoretical foundations of the Langmuir probe method Probe characteristics - example of the spherical probe General theories of the current to a Langmuir probe Starting system of equations The cold ion model by Allen, Boyd and Reynolds (Ti/T e = 0) The Druyvesteyn method for estimation of the electron energy distribution function (EEDF) Probe diagnostics of anisotropic plasmas Probe diagnostics under non-collision-free conditions Langmuir probe in a magnetized plasma Space and time resolved Langmuir probe method Space resolved Langmuir probe measurements Time resolved Langmuir probe measurements Probe diagnostic of chemically active plasmas Double probe technique 163 References Diagnostics of non-equilibrium molecular plasmas using emission and absorption spectroscopy (J. Röpcke, P.B. Davies, M. Käning and В.Р. Lavrov) Introduction Instrumental techniques Emission spectrometry General considerations Actinometry Absorption spectroscopy Background theory Infrared absorption spectroscopy Results and applications: physical properties of plasmas Temperatures and distribution functions 183 9

5 10 Contents Degree of dissociation Electric field, electron temperature, density and distribution function Time-resolved spectroscopy Conclusions 192 References Mass spectrometric diagnostics {Martin Schmidt, Rüdiger Foest and Ralf Basner) Introduction Instrumentation Ion source Mass analyzer Ion energy analyzer Ion detector Coupling of the mass spectrometer with the plasma system Mechanical coupling Electrical coupling Neutral gas mass spectrometry Ion mass spectrometry Mass spectrometry for the determination of elementary data for plasma physics Conclusions 223 References Ellipsometric analysis of plasma-treated surfaces (Wolfgang Fukarek) Introduction Comparison with other techniques Experimental technique Instrumentation Data analysis Examples In situ single wavelength ellipsometry examples In situ spectroscopic ellipsometry examples Ex situ spectroscopic ellipsometry examples Limitations and remaining issues 249 References Characterization of thin solid films (Harm Wulff and Hartmut Steffen) Introduction X-ray methods for thin film analysis Grazing incidence x-ray diffractometry (GIXD) Grazing incidence x-ray reflectometry (GIXR) X-ray photoelectron spectroscopy (XPS) Examples Phase analysis of plasma-deposited TiN x films Characterization of defect structures by x-ray investigations 261

6 Calculation of depth profiles in plasma-deposited Ti/TiSi films Structural studies of thin ITO films Investigation of plasma-deposited ITO films In situ studies of diffusion and crystal growth in plasma-deposited thin ITO films Conclusions 280 References Plasma sources (Martin Schmidt and Hans Conrads) Introduction Properties of non-thermal plasmas Plasma generation by electric fields Direct current (dc) discharges Pulsed direct current (dc) discharges Radiofrequency (rf) discharges Microwave discharges Plasma generation by beams Conclusions 300 References Reactive non-thermal plasmas chemical quasi-equilibria, similarity principles and macroscopic kinetics (Hans-Erich Wagner) Introduction Chemical quasi-equilibria The concept Chemical quasi-equilibria and the kinetic background Experimental verification Plasma chemical similarity Similarity principles in the chemistry of non-thermal plasmas Application to the flow reactor Comparison with experimental results The method of generalized macroscopic kinetics History and concept The particle balance equations Demonstration examples Macroscopic modeling of experimental results Summary 328 References High-pressure plasmas: dielectric-barrier and corona discharges - properties and technical applications (Ulrich Kogelschatz and Jürgen Salge) Introduction Dielectric-barrier discharges Filamentary discharges Homogeneous discharges 339

7 12 Contents Applications Corona discharges Direct current (de) discharges Pulsed corona discharges Applications 351 References Transient plasma-assisted diesel exhaust remediation (M. Gundersen, V. Puchkarev, A. Kharlov, G. Roth, J. Yampolsky and D. Erwin) Introduction Experiment Diesel exhaust treatment Laser-induced fluorescence (LIF) of NO/NCv Experimental results Pulsed power and plasma formation Time-and space-resolved NO/NOa; depletion Plasma chemistry Plasma-assisted catalyst Summary 365 References Plasma display panel (J.K.LeeandJ.P.Verboncoeur) Introduction and overview History and background Alternating current plasma display panel (AC-PDP) The plasma discharge driven by a high voltage One-dimensional AC-PDP model Two-dimensional AC-PDP models Driving voltage for the AC-PDP Research status and remaining issues Other PDP types Conclusions 383 References Low-pressure discharge light sources (G.G. Lister) Introduction The physics of low-pressure discharge lamps Collisional processes Radiation transport Ambipolar diffusion Electron energy balance in the positive column Electroded fluorescent lamps Electrodeless fluorescent lamps Benefits of electrodeless discharges for lighting Electromagnetic interference and safety 394

8 The physics of electrodeless fluorescent lamps Inductive fluorescent discharge lamps Capacitively coupled fluorescent lamps Surface wave fluorescent discharge lamps Low-pressure sodium lamps Rare gas discharges for lighting Conclusions 403 References High-pressure plasma light sources (Klaus Günther) Introduction and basic equations Application demands Photometric properties Operation requirements Costs and environmental aspects High intensity discharge (HID) lamps and their operational principle The plasma of HID lamps High-pressure mercury (HPM) lamps Metal halide (MH) lamps High-pressure sodium (HPS) lamps Technical applications New developments Lamp operation Starting of HID lamps Conventional operation Electronic operation Conclusions 429 References Plasma etching in microelectronics (Harald Richter and Andre Wolff) Characterization of plasma etching Etching techniques Physical etching Chemical etching Chemical-physical etching Equipment-related topics Etch chemistries Dry etching in advanced technologies (selected examples) Silicon dry etching Oxide etch processes Metal etch Process control Plasma process-induced damage Contamination effects Charging damage 448

9 14 Contents 18.8 Future outlook 450 References Low-temperature plasmas for polymer surface modification (Jürgen Meichsner) Introduction Low-temperature plasma and plasma-polymer interaction Characterisation of low-pressure electric gas discharges Plasma species and expected effects in polymer surface treatment Methods for characterisation of plasma treated polymers Polymer samples and thin film preparation Plasma modification of polyethylene and polystyrene Plasma modification of wool and cellulose fabrics Summary 470 References Plasma-enhanced deposition of superhard thin films (Achim Lunk) Characterization of superhard materials Plasma-enhanced deposition of diamond and diamond-like carbon Deposition of diamond Plasma-enhanced deposition of diamond-like carbon Plasma-enhanced deposition of cubic boron nitride films Physical vapor deposition Plasma-enhanced chemical vapor deposition 495 References Markets for plasma technology (Hans Conrads) Introduction Existing markets Impacts to push the spread of plasma based products and processes Newmarkets Features to enlarge the potential of new markets 512 References 513 Index 515