High Sensitivity Mass and Energy Analysers for Monitoring, Control and Characterisation of Ions, Neutrals and Radicals in Plasma

Transcription

1 EQP Series High Sensitivity Mass and Energy Analysers for Monitoring, Control and Characterisation of Ions, eutrals and Radicals in Plasma

2 The Hiden EQP Series Mass and Energy Analysers for Plasma Diagnostics and Characterisation Plasma Sampling Interface XXPlasma is sampled via a laser drilled orifice available from 3 3 µm. XXThe orifice is specifically designed for plasma sampling, using prethinned material for the laser drilled component. XXThe ion extraction optics are software controlled and optimised for minimum plasma perturbation. XXThe optics are fully tuneable for optimum detection of ve and ve ions as well as electrons and radicals. EQP PLASMA SAMPLIG ITERFACE Integral Ionisation Source XXThe integral ioniser is fully software controllable offering precise control of electron energy ( ev) and thermionic emission (. µa). XXTwo oxide coated iridium filaments, with a radially symmetrical cage offering Electron Impact, Appearance Potential and Soft Ionisation modes for powerful characterisation of the neutral and radical species from the plasma. XXA key feature of the EQP ionisation source is the confinement of the electrons in the source cage, allowing precise control for appearance potential measurements for the analysis of radical species and energetic neutrals. XXOptionally, electron attachment ionisation allows for the analysis of electronegative species from the plasma. This feature provides valuable information of radical species from electronegative plasmas. EQP IOISATIO SOURCE Internal Ioniser Energy Analyser XXThe EQP analyser offers constant transmission at all energies with minimum perturbation of the ion flight path. XXThe 4 electrostatic parallel plate energy analyser is used to provide minimum perturbation of the ion flight path within the analyser for optimum energy resolution. XXConstant transmission for ion energy distribution functions throughout the ion energy range / ev, / ev. XXSoftware controlled Energy scan increments are from. ev, with a <. ev FWHM energy resolution. XXThe EQP system can be floated to kev with an external power supply and isolation components. EQP 4 EERGY SECTOR AALYSER Sem C/S Ion Energy ev Example data showing typical energy spectrum

3 .6e8.4e8.e8 e8 8e7 6e7 4e Ion counting detector e FWHM.4ev EQP ABUDACE SESITIVITY Typical and H resolved spectrum energy ev Triple filter quadrupole analyser EQP EERGY RESOLUTIO Ion flight tube to provide plasma sampling insertion from 4 mm up to 7 mm PPB C at ~PPB EQP SESITIVITY ppb detection of C ions from CF 4 plasma 4 Sector field energy analyser Detector Turbo molecular pump port XXA digital ion counting detector is included as standard with 7decade continuous dynamic range. Counting is via a 3bit counter for c/s resolution. XXA Faraday Cup option extends the range up to x c/s for high density plasma applications. XXThe EQP MASsoft software provides data acquisition as raw counts, counts per second or integrated counts. Averaging or accumulating counts over repeated and energy scans significantly increases the signal to noise ratio in the analysis of minor components. XXA TTL output of raw counts is available via an external connector on the EQP electronics system. XXSignal gating with ns time resolution for energy & distributions. XXOptional integrated MultiChannel Scalar (MCS) device offers ns time resolution for transient event analysis such as HiPIMS, plasma ignition/modulation/extinction experiments and ion flight time measurements. Mass Analyser EQP6 3F MASS AALYSER XXA Hiden high performance triple filter spectrometer is included with the EQP system. XXMass range options of,,, 3,,, and amu are offered. XX6, 9 and mm quadrupole diameters are offered for a specialist plasma sampling applications. XXThe triple filter system has a main filter featuring RF and DC filtering, coupled with RF only pre and post filters. This technology minimises the effects from fringe fields at the primary filter entrance and exit, enhancing resolution and transmission. Triple filter technology allows high species such as clusters and metallic compounds used in plasma deposition to be analysed. XXAbundance sensitivity is to. ppm and detection of plasma species to ppb. XXThe filter rods are precision machined from molybdenum with radially supported precision ceramics.

4 Hiden EQP Plasma diagnostics Systems The Hiden EQP System is an advanced plasma diagnostic tool with combined high transmission ion energy analyser and quadrupole spectrometer, acquiring both spectra at specified ion energies and ion energy distributions of selected plasma ions. The advanced EQP ioniser provides for neutral and radical detection, the electron attachment ionisation feature further enhancing the detection capability for radicals in electronegative plasma chemistries. XXHigh Sensitivity Sub PPM detection of plasma ions, neutrals and radicals. XXIon Energy Analysis Ion Energy distributions of plasma ions are acquired in seconds, ev and ev energy range versions are available. XXHiPIMS, Afterglow, Pulsed and Laser Ablation A standard TTL signal gating input is included for time resolved studies. The programmable signal gating option provides for automatic data acquisition for defined time slices through the plasma pulse. Gating resolution is nanoseconds. XXOptional innovative MultiChannel Scalar (MCS) device integrated into controller firmware and MASsoft software. XX6bin multichannel scalar resolution offering ns time resolution with data intuitive to obtain and can be manipulated in external programmes such as Excel an Origin. XXPositive and egative Ion Measurement Preset software modes enable automatic switching between positive ion, negative ion and neutral analysis modes. XXeutral and Radical Detection The EQP integral electron impact ioniser provides for analysis of neutral and radical species. XXElectron Attachment Ionisation This technique of soft ionisation offered as an option for the analysis of electronegative species in plasma, further enhances the analysis of neutrals and radicals. XXAppearance Potential Spectra The EQP ioniser features precision control of all ion source parameters, including the facility to accurately scan electron energy for appearance potential spectra of selected species. The appearance potential spectra provide direct information to confirm the fragmentation and excitation state of plasma neutral species. EQP OPERATIG MODES IO EERGY DISTRIBUTIOS of selected ve and ve ions MASS SPECTRA at selected ion energies for ve ions, ve ions and neutrals. lpm CO, Plasma Reactor: Torr Appearance Potential: W plasma 7 metastable O excited state a Δg 6 4 no plasma 3 ground state O X 3 Σ g electronenergy: V APPEARACE POTETIAL SPECTRA for identification of radical species from parent stable molecules. ELECTRO ATTACHMET IOISATIO scans to identify radical species produced in the plasma from electronegative gases.

5 Example EQP Data Ion Energy Distributions in dual frequency RF Plasmas Ion energy distributions (IEDs) for both positive and negative ions have been measured, using a /energy spectrometer system, for two plasma reactors which can be operated using a combination of two RF power sources. One reactor uses capacitivelycoupled inputs and the other includes an inductivelycoupled input. Typical data for.6, 3.6 and 7. MHz inputs are presented for a range of phase relationships. The IEDs clearly show significant differences between the data for different species of ions. The differences result, in part, from the ionmolecule collisions occurring particularly in the plasma/surface sheath regions. IEDs for argon plasma at mtorr with 3.6 and 7. MHz for phase differences to 8. IEDs for O ions from a nitrous oxide plasma at selected phase differences. IEDs for ions in nitrogen plasma at mtorr for mixed.6 and 3.6 MHz signals for selected phase differences ev ion energies. mtorr khz plasma. XXParallelplate gon plasma driven by a khz AC supply. XXMCS device used to collect resolved ion energy distributions for plasma at ns intervals. XXData shows ignition and decay of features in the ion energy spectra that are not possible to obtain with time averaged data. ev Time Resolved Ion Energy Distributions in RF Plasma

6 EXAMPLE EQP DATA EXAMPLE EQP DATA Plasma etching of Hfbased k thin films Plasma etchinghigh of Hfbased high k thin films 3 mtorr, Watt mtorr, 3Watt 3 mtorr, Watt mtorr, 3Watt QMSmeasured plasma ionic species are shown in QMSmeasured plasma ionic species are shown in (a) and (b). Higher(a) species measured by andionic (b). Higher ionic species measured by QMS are shown inqms (c) and The in data the(d). leftthe data in the left are(d). shown (c) in and column are taken at 3 mtorr W column areand taken at 3(high mtorrdensity and W (high density plasma condition) plasma while those in the right condition) whilecolumn those in the right column are taken at mtorr 3W density plasma areand taken at (low mtorr and 3W (low density plasma condition). condition). Example EQP Data Data ref: Data ref: Ryan M. Martin, Jane P. Chang Ryan M. Martin, Jane P. Chang University of California, Los Angeles, USA.Los Angeles, USA. University of California, J.Vac. Sci. Technol.J.Vac. A 7() Sci. Technol. A 7() EXAMPLE EQP DATA EXAMPLE EQP DATA MAGETRO SPUTTERIG POSITIVE AD EGATIVE IO MASS SPECTRA etching of Hfbased high k thin films Plasma etching of Hfbased high Plasma k thin films 3 mtorr, Watt 3 mtorr, Watt mtorr, 3Watt mtorr, 3Watt QMSmeasured plasma ionic species are shown in QMSmeasured plasma ionic species are shown in (a) and ionic species measured by (a)positive and (b). Higher ionic species measured by(b). Higher Magnetron sputtering Positive and negative ion spectra Magnetron sputtering and negative ion spectra QMS QMS are shown in (c) and (d). The data in the left are shown in (c) and (d). The data in the left column are taken at 3 mtorr and W (highcolumn densityare taken at 3 mtorr and W (high density Positive Ions. Molybdenum Sulphur Hexafluoride Gas.Sulphur Hexafluoride egative Sulphur Hexafluoride Gas.Sulphur Hexafluoride Gas. Positive Ions. Molybdenum Gas.Ions. Molybdenum egative Ions. Molybdenum plasma condition) while those in the right column plasma condition) while those in the right column Data ref: 7 7Data ref: Ryan M. Martin, Jane P. Chang Ryan M. Martin, Jane P. Chang 6 6 University of California, Los Angeles, USA. University of California, Los Angeles, USA. J.Vac. Sci. Technol. A 7() J.Vac. Sci. Technol. A 7() condition). 6 4 condition). 6 Mass spectrum 9 to Mass amu, showing Fluoride Ions. Mass 4 to amu,plasma showing SF MoF and3w MoF Ions. spectrummolybdenum 9 to amu, showing Molybdenum Ions.3W Mass spectrum 4 and amu, showing SF 6 (low 6, MoFplasma and MoF6 Ions. are taken at 6,to mtorr density are taken at Fluoride mtorrspectrum and (low density Magnetron Positive and negative ion spectra Magnetron sputtering Positive and negativesputtering ion spectra MolybdenumIons. Sulphur Hexafluoride Gas. Hexafluoride egative Ions. Molybdenum Positive Ions. Molybdenum Sulphur HexafluoridePositive Gas.Ions. Molybdenum Sulphur Gas.: amu : Sulphur amu Hexafluoride Gas. : amuegative to spectrum amu, showing Fluoride spectrum 4 to amu, showing SF6, MoF and MoF6 Ions. Mass spectrum 9 to amu, showing Molybdenum FluorideMass Ions. spectrum 9 Mass 4 tomolybdenum amu, showing SFIons. 6, MoF and MoFMass 6 Ions. HIPIMS and conventional sputtering compared and energy spectra HIPIMS and conventional sputtering compared and energy spectra (a) 8 8 E =. ev (b) 4 E =. ev (a) (b) () 3 () 4 E =. ev E =. ev 3 HIPIMS AD COVETIOAL SPUTTERIG COMPARED MASS AD EERGY SPECTRA () () k k k () 3 4 k k Flux, (x 6 counts ) k () () k (b) E =. ev () k k () k 3 4 () 4 3 () () (b) E =. ev () k 3 () k k k E =. ev () () k k k () () k Countrate, cs () (a) () Flux, (x 6 counts ) 3 Flux, (x 6 counts ) k E =. ev Flux, (x 6 counts ) Countrate, cs () k Flux, (x 6 counts ) Countrate, cs Flux, (x 6 counts ) k (a) Flux, (x 6 counts ) HIPIMS and conventional compared and energy spectra HIPIMS and conventional sputtering compared and sputtering energy spectra () () Countrate, cs Flux, (x 6 counts ) k () k 3 Countrate, cs Countrate, cs k 4 Countrate, cs Countrate, cs Mass and energy spectra of (a) HIPIMS of ofand conventional of dc in sputtering and of in and Mass and energy spectra (a) (b) HIPIMS of anddc(b)sputtering conventional It is Hiden Analytical s policy to continual atmosphere as used to depositas theused /b nanolayer coating.nanolayer coating. atmosphere to deposit the /b energy spectra of (a) HIPIMS of in and Mass and energy spectra of (a) HIPIMS of Mass and and (b) conventional dc sputtering of and(b)conventional dc sputtering of in and Data ref: Purandare, Ehiasarian andpurandare, Hovsepian.Ehiasarian J.Vac. Sciand Technol. A 6().J.Vac. Data ref: Hovsepian. Sci Technol. A 6(). as used to deposit the /b nanolayer coating. atmosphere as used to deposit the /batmosphere nanolayer coating. Data ef: Purandare, Ehiasarian and Hovsepian. J.Vac. Sci Technol. A 6(). Data ref: Purandare, Ehiasarian and Hovsepian. J.Vac. Sci Technol. 6(). Mass and energy spectra of (a) HIPIMS of and (b) conventional dc sputtering of in and atmosphere as used to deposit the /b nanolayer coating. Data ref: Purandare, Ehiasarian and Hovsepian. J.Vac. Sci Technol. A 6(). 6

7 EQP System Configurations EQP Mass Spectrometer Range EQP6 6 mm quadrupole rod diameter Mass range options 3 and amu EQP9 9 mm quadrupole rod diameter Mass range options, 3,,, and amu EQP mm quadrupole rod diameter Zone H Mass range amu Zone Mass range amu Plasma Pressure Options XXUp to. mbar Differential pumping with a 6 l/s turbomolecular pump XXUp to mbar Differential pumping with a 4 l/s turbomolecular pump X X> mbar EQP system is upgradeable to the multi stage HPR6 molecular beam sampling system System Options The EQP system can be configured with a wide range of customised options to suit many plasma conditions. These include: Option Part o. ev energy range 6 Dual Faraday/ Electron Multiplier Detector 443 Extended Flight Tube 3 or 4 mm 6 Extended Flight Tube to 7 mm 64 Magnetic Shielding to 8 Gauss 6 Magnetic Shielding to Gauss 6 Electron Attachment Ionisation 63 DC Driven Electrode 44 mm diameter 68 RF/DC Driven Electrode mm diameter 68 Water Cooled RF/DC Electrode 84 mm diameter UHV Gate Valve 3 Zdrive 4 Stroke Manual Zdrive Stroke Motorised 9 Front End Shutter 644 RIV6 ReEntrant Isolation Valve 64 PC Computer with MASsoft v Software PreInstalled 864 Windows IST MS Database 8 volt 8 Channel Analogue Output Card 3498 Penning Gauge and Controller incl. Vacuum Interlock for System Protection 338 Programmable Signal Gating with Foreground and Background Delay Timers 6 MultiChannel Scalar (MCS) Mode for ns Time Resolution 844 HPR6 Molecular Beam Sampling Option for Atmospheric Plasma Sampling 336 Plasma Applications EQP systems are offered with a range of standard plasma sampling options to provide noninvasive sampling of a broad range of plasma applications including: XXHiPIMS XXECR Electron Cyclotron Discharge XXPulsed Plasma & Laser Ablation XXParallel Plate RF Plasma XXMagnetron Discharge XXHelicon Source XXDC Glow Discharge Plasma XXICP Inductively Coupled Plasma EQP SYSTEM in plasma PLASMA EEDLE atmospheric plasma analysis with EQP/HPR6 molecular beam sampling system.

8 Hiden s quadrupole spectrometer systems address a broad application range in: GAS AALYSIS dynamic measurement of reaction gas streams catalysis and thermal analysis molecular beam studies dissolved species probes fermentation, environmental and ecological studies SURFACE AALYSIS ALYSIS UHV TPD SIMS end point detection in ion beam etch elemental imaging 3D mapping PLASMA DIAGOSTICS plasma source characterisation etch and deposition process reaction kinetic studies analysis of neutral and radical species Hiden Analytical Ltd. 4 Europa Boulevard Warrington WA 7U England T 44 [] 9 44 F 44 [] E info@hiden.co.uk W VACUUM AALYSIS partial pressure measurement and control of process gases reactive sputter process control vacuum diagnostics vacuum coating process monitoring Sales Offices: We have sales offices situated around the globe. Visit our website for further information. TDS 7/