Nikon Synthetic Silica Glass Si02

Transcription

1 Nikon Synthetic Silica GlassSi02 Glass Business Unit

2 Nikon NIFS Series Synthetic Silica Glass NIFS Series ADVANTAGES Nikon s synthetic silica glass (SiO2) NIFS series is built around over 90 years experience in the field of optics. By combining our critical process controls and leading metrology capabilities, we offer materials which meet and exceed our customers standard requirements. With our proprietary synthesis and annealing processes, we can optimize our glass to meet our customers application requirements for homogeneity, birefringence and OH content. The NIFS series is the ideal choice for OEM, R&D and special project requirements for Semiconductor lithography, High - power Nd:YAG, Astronomy, Medical and FPD applications. Optical grades Grade Internal transmittance [%] Sample thickness10 mm Laser durability Birefringence Striae Recommended wavelength NIFS-U NIFS-S NIFS-I 99.9at 193 nm 99.9at 193 nm 99.9at 248 nm 99.9at 365 nm A B 110 nm/cm on request 3D Free 3D Free 1D Free 3D Free 1D Free 3D Free 1D Free excimer laser193 nm excimer laser193 nm excimer laser248 nm UV region, Visible region Values stated above are valid for material with a diameter of mm and a thickness of mm. Material outside this range will be regarded as custom. Laser durability is classified into three groups, A, B and, with represents the highest grade of material available. Material available in Striae 3D Free (all directions) or in the required working direction (1D free). NIFS Available range of homogeneity at 633 nm ppm NIFS-U NIFS-S < 0.5 < 1 < 1.5 < 2 < 3 < 4 < 5 < 10 < 40 Not specified NIFS Transmittance range F nm 193 nm 248 nm i-line 365 nm g-line 436 nm NIFS-U NIFS-S 1 Glass Business Unit

3 Transmittance data VUV-VIS-IR region Internal transmittance% , -U, -S Thickness:10 mm nm Internal transmittance% Guarantee area of NIFS-U NIFS-S Thickness:10 mm nm 2

4 Nikon NIFS Series Synthetic Silica Glass Properties of Refractive Indices (Nikon Synthetic Silica Glass) Optical Properties [nm] He t s A' r ' He-Ne D d e F F' g h i Measured at Temperature 22.5 Humidity 50 % Atmospheric pressure 1013 hpa Impurities Refractive Index n d (He, nm) n e (Hg, nm) n F - n n F' - n ' d e Sellmeier Dispersion Equation onstants B1 B2 B3 B Stress oefficient * 35 nm/cm MPa Mechanical Properties Density 2.2 g/cm 3 Knoop Hardness 100g load Abrasion ** kg/mm 2 50 Young's Modulus 73GPa OH < 100 ppm Li Thermal Properties Na K Mg a Linear Thermal Expansion oefficient Thermal onductivity Mean Heat apacity * /K 1.3 W/mK 730 J/kgK Al Ti * Excerpts from literature ** Measuring method JOGIS 10 r Fe u Each property is shown as a typical value. 3 Glass Business Unit

5 Properties of Refractive Indices (Nikon Synthetic Silica Glass) Optical Properties [nm] Refractive Index n d (He, nm) n e (Hg, nm) He n F - n t n F' - n ' s d 67.8 A' e 67.7 r dn/dt (K -1 ) ' nm He-Ne Thermal oefficient n/t * nm D nm d nm e nm F Stress oefficient * 35 nm/cm MPa F' g Mechanical Properties h i Measured at Temperature 22.5 Humidity 50 % Atmospheric pressure 1013 hpa Density Knoop Hardness (100 g load) Abrasion ** Young's Modulus Shear Modulus Poisson's Ratio Bending Strength 2.2 g/cm kg/mm GPa 31 GPa MPa Impurities Thermal Properties OH Li Na K Mg a Al Ti < 1200 ppm Softening Point * Annealing Point * Strain Point * Linear Thermal Expansion oefficient Thermal onductivity Mean Heat apacity * log=7.6 log=13.0 log= /K 1.4 W/mK 770 J/kgK 960 J/kgK 1050 J/kgK r Fe u Dielectric onstant r (0-1x10 6 Hz) * tan * 1 MHz x 10-4 Electrical Resistivity * 1.0 x m * Excerpts from literature ** Measuring method JOGIS 10 Each property is shown as a typical value. 4

6 Nikon NIFS Series Synthetic Silica Glass Properties of NIFS-U Refractive Indices (Nikon Synthetic Silica Glass) Optical Properties [nm] Refractive Index n d (He, nm) n e (Hg, nm) He n F - n t n F' - n ' s d 67.8 A' e 67.7 r dn/dt (K -1 ) ' He-Ne Thermal oefficient n/t * nm nm D nm d nm e nm F Stress oefficient * 35 nm/cm MPa F' g Mechanical Properties h i Measured at Temperature 22.5 Humidity 50 % Atmospheric pressure 1013 hpa Density Knoop Hardness (100 g load) Abrasion ** Young's Modulus Shear Modulus Poisson's Ratio Bending Strength 2.2 g/cm kg/mm GPa 31 GPa MPa Impurities Thermal Properties OH Li Na K Mg a Al Ti < 1200 ppm Softening Point * Annealing Point * Strain Point * Linear Thermal Expansion oefficient Thermal onductivity Mean Heat apacity * log=7.6 log=13.0 log= /K 1.4 W/mK 770 J/kgK 960 J/kgK 1050 J/kgK r Fe u Dielectric onstant r (0-1x10 6 Hz) * tan * 1 MHz x 10-4 Electrical Resistivity * 1.0 x m * Excerpts from literature ** Measuring method JOGIS 10 Each property is shown as a typical value. 5 Glass Business Unit

7 Properties of NIFS-S Refractive Indices (Nikon Synthetic Silica Glass) Optical Properties [nm] Refractive Index n d (He, nm) n e (Hg, nm) He n F - n t n F' - n ' s d 67.8 A' e 67.7 r dn/dt (K -1 ) ' nm He-Ne Thermal oefficient n/t * nm D nm d nm e nm F Stress oefficient * 35 nm/cm MPa F' g Mechanical Properties h i Measured at Temperature 22.5 Humidity 50 % Atmospheric pressure 1013 hpa Density Knoop Hardness (100 g load) Abrasion ** Young's Modulus Shear Modulus Poisson's Ratio Bending Strength 2.2 g/cm kg/mm GPa 31 GPa MPa Impurities Thermal Properties OH Li Na K Mg a Al Ti < 1200 ppm Softening Point * Annealing Point * Strain Point * Linear Thermal Expansion oefficient Thermal onductivity Mean Heat apacity * log=7.6 log=13.0 log= /K 1.4 W/mK 770 J/kgK 960 J/kgK 1050 J/kgK r Fe u Dielectric onstant r (0-1x10 6 Hz) * tan * 1 MHz x 10-4 Electrical Resistivity * 1.0 x m * Excerpts from literature ** Measuring method JOGIS 10 Each property is shown as a typical value. 6

8 Glass Business Unit Sagamihara Plant 10-1, Asamizodai 1-chome, Minami-ku, Sagamihara, Kanagawa Tel: