Study of Electronegativity in Inductively Coupled Radio-Frequency Plasma with Langmuir Probe
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1 Study of Electronegativity in Inductively Coupled Radio-Frequency Plasma with Langmuir Probe International Training Program Queen s University Belfast Dept. Energy Sciences Tokyo Institute of Technology Hotta Lab D1 Bin Huang ( 黄斌 )
2 Director: Prof. Bill Graham About Queen s Main building of Queen s Cooperator: Mr. Mujahid
3 Introduction to ICP Inductively Coupled Plasma (ICP) Type: planar/cylindrical Principle: time-varying current through coil time-varying magnetic field induces azimuthal electric currents break down forming plasma
4 Semiconductor manufacture Ashing: Oxygen ICP application Oxygen +polymers /organics CO 2 +H 2 O photo resist is applied to the wafer photo mask hardens/illuminates resist Deposition/etching Cleaning wafer
5 Oxygen ICP characteristics Two operation regimes: E-mode: low power, low density, capacitive discharge. H-mode: high power, high density, inductively discharge. E-H transition: Negative ions: O -,O 2-, O 3-,etc change of electron density, EEDF, coil current, light emission, etc.
6 Photo-detachment measuring system GEC reference cell Nd:Yag laser 532nm Upper electrode Langmuir Probe Lower electrode RF:13.56 MHz Schematic of photo-detachment measurement system Electrode diameter: mm Electrode gap: 40.5 mm
7 Photo-detachment diagnostics Diagnostics principle: A - +hν=a+e electron affinities: O - :1.46 ev; O 2- :0.44 ev Nd:YAG laser(532 nm): hν=2.33 ev Photo-detachment electron current Suffice to photo-detach both species Advantages: Less perturbing Better time resolution Capacity of measuring ion temperature
8 Photodetachemnt fraction Photodetachment fraction Vs laser energy Experimental: Negative ion density: 2.0 I e : probe current n e : background density ΔI e : instantaneous current Theoretical: Photo-detachment fraction: W 100mtorr 20mtorr 50W theory E:incident laser power S:beam cross-sectional area σ pd : photo-detachment cross section of negative ion Deviate from theory: thermionic electron emission laser ablation of the probe surface Energy (mj) Photo-detachment fraction against energy measured with probe 1.25 cm from lower electrode with laser diameter of 5 mm.
9 A. U. Electronegativity electronegavity A.U. Electronegativity Vs probe bias Capacitive mode: Electronegativity V Inductive mode: Electronegativity V Electronegativity Negative ion current Electron current 400W 100mtorr Electronegativity Negative ion current Electron Current Probe bias (V) Probe bias voltage Bias Voltage (V) Probe bias voltage Electronegativity (blue), Negative ion current (black) and electron current (red) against probe bias voltage in capacitive mode. Electronegativity (black), Negative ion current (red) and electron current (green) against probe bias voltage in inductive mode.
10 Electronegativity Vs laser diameterr mtorr 50W Amplitude (mv) 0-2 2mm 3mm 4mm 5mm ~6mm AU electronegavity Time ( s) Diameter (mm) Electronegaticity 5 mm 5 6
11 Electronegativity Electronegativity Electronegativity against pressure 2cm from the ground Capacitive mode 50W 100W 150W cm from the ground 50W 100W 150W Pressure (mtorr) Peak electronegativity when RF power fixed: Pressure (mtorr) O - is produced by dissociative attachment of O 2 and destroyed by ion-ion recombination at low pressures. At higher pressures it is lost due to detachment. Electronegativity decreased when RF power increase: Electron density increases while negativity ion density is almost constant
12 Electronegativity Electronegativity against pressure Compared with simulation 50W 100W 150W Pressure (mtorr) From Corrmac. Corr Ph.Dthesis
13 Conclusion & future work < Conclusion: > Laser energy, laser diameter and probe bias voltage were calibrated and suitable parameters were selected for photo-detachment measurement. Electrongativity were measured at different positions in capacitive mode. The relationship between electronegaticity and pressure & RF power is consistent with simulation. < Future work: > Measuring electronegativity against pressure in inductively mode
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16 Electronegativity Electronegativity against pressure Inductive mode 1.25 cm from lower electrode W 300W The relationship is not clear and should do again Pressure (mtorr)
17 Electronegativity nd measurment 300W 1st measurment 300W Pressure (mtorr)
18 Electronegativity Electronegativity against pressure Compared with simulation W 100W 150W Pressure (mtorr) Global model From Corrmac. Corr thesis
19 Self introduction Name: Bin Huang ( 黄斌 ) Hometown : Suzhou, China ( 蘇州, 中国 ) Research in Tokyo Tech: Xe gas jet type Z-pinch EUV source Research in Queen s: Oxygen radio-frequency ICP
20 Oxygen Inductively Coupled Plasma Negative ions: O -,O 2-, O 3-,etc < Application: > surface modification fabrication of chips thin film deposition Two operation regimes: E-mode: O2- is less than 10% capacitive discharge. low power, low density, H-mode: high power, high density, inductively discharge. E-H transition: change of electron density, EEDF, coil current, light emission, etc.
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