NARROW GAP ELECTRONEGATIVE CAPACITIVE DISCHARGES AND STOCHASTIC HEATING

Size: px
Start display at page:

Download "NARROW GAP ELECTRONEGATIVE CAPACITIVE DISCHARGES AND STOCHASTIC HEATING"

Transcription

1 NARRW GAP ELECTRNEGATIVE CAPACITIVE DISCHARGES AND STCHASTIC HEATING M.A. Lieberman, E. Kawamura, and A.J. Lichtenberg Department of Electrical Engineering and Computer Sciences University of California Berkeley, CA 9472 Motivation: widely used for thin film etch and deposition Download this talk: lieber LiebermanPSC13 1

2 UTLINE Narrow gap oxygen discharges PIC simulations Equilibrium discharge model Stochastic (collisionless) heating Narrow gap oxygen Two-step density model with argon hmic heating issues Single-step with finite slope LiebermanPSC13 2

3 DISCHARGE CNFIGURATIN xygen at 1 1 mtorr, V rf = 5 2 V 1D plane-parallel geometry ( 1 1 cm gap length L) Usual model is stratified discharge with electronegative (EN) core and electropositive (EP) edge As L is decreased, the EP edge can disappear and new interesting phenomena are found LiebermanPSC13 3

4 PIC SIMULATINS AND EQUILIBRIUM MDELING (Vary gap length L at p=5 mtorr, V rf = 5 V) LiebermanPSC13 4

5 L=4.5 cm (EP EDGE EXISTS) 2e e+16 1e+16 5e+15 (a) Particle Density (m-3) e (c) Temperature (V) Low Te e EN core EP edge Sheath e + 2 (b) Current Density (A/m 2) Large pos (d) Electron Heating (W/m 3) p e Core flux p ohm p stoc Small neg LiebermanPSC13 5

6 L=2.5 cm (N EP EDGE) (a) Particle Density (m-3) (b) Current Density (A/m 2) 2e e EN core No EP edge.4.2 e Core flux 1e+16 5e e e (c) Temperature (V) High Te e Sheath (d) Electron Heating (W/m 3) Negative (A SURPRISE!) p e p ohm p Large pos stoc LiebermanPSC13 6

7 EEDF S AND DENSITY DETAILS (a) EEDF (a.u.) for L = 4.5 cm (b) EEDF (a.u.) for L = 2.5 cm EP edge: bi-maxwellian 1 No EP edge: Maxwellian Energy (ev) Energy (ev) 2e+15 (a) Densities (m-3) for L= 4.5 cm 1e+15 (b) Densities (m-3) for L= 2.5 cm 1.5e+15 1e+15 5e+14 n + - n - n e sheath edge n e+14 6e+14 Sheath begins at end of EP edge 4e+14 2e+14 n + - n - n e n ~ sheath edge Sheath begins inside EN core LiebermanPSC13 7

8 TIME-VARYING DENSITY (L=2.5 cm, N EP EDGE) 1e+15 Electron density (m-3) at T/8 intervals + 2 5e+14 scillating electron cloud uncovers core Core LiebermanPSC13 8

9 MDELING CNSIDERATINS EP edge exists (larger gap lengths L) Bi-Maxwellian EEDF About half the ion flux generated in sheath/ep edge Usual Child law rf sheath Usual positive collisionless heating in sheath No EP edge (smaller gap lengths L) Maxwellian EEDF ver half the ion flux generated in sheath Attachment in sheath is important Unusual rf sheath containing negative ions Negative collisionless heating in sheath, positive in core Models developed: model with some inputs from PIC results self-consistent model LiebermanPSC13 9

10 MDEL WITH SME INPUTS FRM PIC Rate coefficients and collisional energy losses using PIC EEDF Power deposition in core from PIC results Solid lines (2-region model with EP edge); Dashed lines (1-region model without EP edge); circles (PIC results) (a) n e (m 3 ) at 1 mtorr, 5 V L (m) (c) n e (m 3 ) at 5 mtorr, 5 V (b) n e (m 3 ) at 25 mtorr, 5 V L (m) (d) n e (m 3 ) at 1 mtorr, 5 V L (m) (e) n e (m 3 ) at 5 mtorr, 1 V L (m) (f) n e (m 3 ) at 5 mtorr, 2 V Reasonable agreement between model and PIC results (submitted to Physics of Plasmas, 213) L (m) L (m) LiebermanPSC

11 STCHASTIC (CLLISINLESS) HEATING (WRK IN PRGRESS) LiebermanPSC13 11

12 PIC RESULTS FR VARIUS GAPS L (5 mt, 5 V) Stochastic heating small at transition where EP edge disappears EP edge exists positive heating in sheath, negative in core No EP edge negative heating in sheath, positive in 1 core L (m) Large pos (d) Electron Heating (W/m 3) p e L=4.5 cm pohm 1 p ohm p pstoc stoc Small neg LiebermanPSC13 12 S (W/m 2 ) S ohm S stoc A SURPRISE! (d) Electron Heating (W/m 3) L=2.5 cm Negative (A SURPRISE!) p e Large pos

13 S stoc (x) FR VARIUS GAPS L Integrate p stoc (x) from electrode (x = ) toward discharge midplane S stoc (x) Large L n e (core) > n e (sheath) positive heating in sheath, negative heating in core Small L n e (sheath) > n e (core) negative heating in sheath, positive heating in core LiebermanPSC13 13

14 TW-STEP DENSITY MDEL 1. I.D. Kaganovich, Phys. Rev. Lett. 89, 2656 (22). 2. E. Kawamura, M.A. Lieberman and A.J. Lichtenberg, Phys. Plasmas 13, 5356 (26). Use to investigate stochastic heating LiebermanPSC13 14

15 FIXED INS, PIC ELECTRNS (3 mt Ar, MHz) (Models EN plasma with EP edge) (Models EN plasma with no EP edge) n i n i n e n e Sheath oscillation Sheath oscillation Positive Fermi kick? Positive low density kick? Negative high density kick? Negative high density kick? Positive low density kick? Negative Fermi kick? LiebermanPSC13 15

16 ELECTRN HEATING GAS PRESSURE EFFECTS Large device 2:1 step at 6 cm At 2 mt 66% of heating is ohmic; at 3 mt 96% is ohmic error in finding stochastic heating 2 mtorr 3 mtorr LiebermanPSC13 16

17 PIC SIMULATIN HMIC HEATING ISSUES (see Lister, Li and Godyak, 1996) hmic power density p ohm = 1 2 J rf 2 Re[1/(σ p + jωǫ )], where σ p = 4π 3 e 2 m v 3 dv df e jω + ν m (v) dv The usual simple expression (see Margenau, 1946) e 2 n e σ p = m(jω + ν m ) is not correct unless ν m = const Argon is a Ramsauer gas with ν m a function of v The momentum transfer frequency ν m must be distinguished from the total collision frequency ν coll Large errors in calculating stochastic heating for ohmic heating stochastic heating Can use pseudo-argon in PIC simulation ν m = ν coll = const LiebermanPSC13 17

18 VARIUS CLLISIN MDELS (UNIFRM ) Fixed Ion Uniform 5 mtorr Argon with n b = 4.8e15 m 3 V rf =1 V, f=13.56 MHz, L=.5 m, Area=.1 m 2 pstoc (Margenau) pstoc (Margenau) pstoc (Margenau) pstoc(crrect!) Margenau LiebermanPSC13 18

19 STCHASTIC HEATING (5 CM UNIFRM ) (Ramsauer elastic cross section, non-isotropic scattering) Sstoc(x) (W/m 2) for Uniform Profiles -3 mtorr Ar, L= 5 cm, Area =.1 m 2, 1V@13.56MHz 2 3 mtorr 1 mtorr 5 mtorr 2 mtorr 1mTorr.5 mtorr LiebermanPSC13 19

20 STCHASTIC HEATING (2:1 STEP, d edge = 6 CM) (Ramsauer elastic cross section, non-isotropic scattering) 12 3 mtorr 1 2mTorr 1 mtorr 8 5 mtorr 2 mtorr 6 1 mtorr.5 mtorr Sstoc(x) (W/m 2) for d edge = 6 cm, ν (x) coll 2-3 mtorr Ar, L= 3 cm, Area =.1 m 2,.41A@13.56MHz LiebermanPSC13 2

21 STCHASTIC HEATING (2:1 STEP, d edge = 6 CM) (Constant collision frequency, isotropic scattering) Sstoc(x) (W/m 2) for d 12 3 mtorr 1 mtorr 1 5 mtorr 2 mtorr 8 1 mtorr.5 mtorr edge = 6 cm, Iso., const K.5-3 mtorr Ar, L= 3 cm, Area =.1 m 2,.41A@13.56MHz LiebermanPSC13 21 el

22 STCHASTIC HEATING (2:1 STEP, d edge = 1 CM) (Constant collision frequency, isotropic scattering) Sstoc(x) (W/m 2) for d 12 3 mtorr 1 mtorr 1 5 mtorr 2 mtorr 8 1 mtorr.5 mtorr edge = 1 cm, Iso., const K.5-3 mtorr Ar, L= 3 cm, Area =.1 m 2,.41A@13.56MHz el LiebermanPSC13 22

23 ENERGY KICK FR TW-STEP DENSITY + V s E rf (bulk) E rf (sheath) Reflected 5 Transmitted There is a potential drop V s = T e ln(n b /n s ) across the step There are rf fields E rf (bulk) and E rf (sheath) Calculate the phase-averaged energy kick E for transmitted and reflected particles There is no contribution to the kick at the oscillating plasma-sheath edge (2 3) LiebermanPSC13 23

24 SINGLE STEP WITH VARIABLE SLPE (PIC) 3 mtorr Argon fixed Ion Tanh profile with a 1 =1 to 4, a 2 =3, n l /n r =.5, I rf =.3 A, f=27.12 MHz, L=.1 m, Area=.1 m 2, n l =2e15 m 3 (a) a 1 = 1 (b) a 1 = 2 n(x) = n 2 [ ( a1 a 2 + tanh L ( L) )] x 2 Vary slope using a 1 in tanh function and find stochastic heating LiebermanPSC13 24

25 STCHASTIC HEATING WITH VARIABLE SLPE 6 3 Stochastic Heating in Center Region (W/m ) 3 mt Ar, Irf=.3A@27.12MHz, L=.1 m, Area =.1 m^ n =2e15 m, n =4e15 m l -3-3 r (d/l)(a1/a2) d = v e /ω.4 cm = mixing length (1 radian phase change) (v e = electron thermal velocity) La 2 /a 1 = scale length of step (.25 3 cm) Saturation for small scale length; adiabatic for large scale length Electron oscillation amplitude (.4 cm) may be significant LiebermanPSC13 25

26 SUMMARY A transition from a narrow gap EN discharge with an EP edge, to a narrower gap discharge with no EP edge, was investigated with PIC simulations and modeling The effects of a bi-maxwellian EEDF, with an EP edge, and sheath attachment and core uncovering, with no EP edge, need to be taken into account in modeling A transition from sheath to internal stochastic heating after the EP edge disappears is observed, and is being studied with fixed ion, two-step and single-step density, PIC simulations At the higher pressures, the ohmic heating has to be carefully calculated in order to determine the true stochastic heating in the PIC simulations LiebermanPSC13 26

NARROW GAP ELECTRONEGATIVE CAPACITIVE DISCHARGES AND STOCHASTIC HEATING

NARROW GAP ELECTRONEGATIVE CAPACITIVE DISCHARGES AND STOCHASTIC HEATING NARRW GAP ELECTRNEGATIVE CAPACITIVE DISCHARGES AND STCHASTIC HEATING M.A. Lieberman Deartment of Electrical Engineering and Comuter Sciences University of California Berkeley, CA 9472 Collaborators: E.

More information

ADVENTURES IN TWO-DIMENSIONAL PARTICLE-IN-CELL SIMULATIONS OF ELECTRONEGATIVE DISCHARGES

ADVENTURES IN TWO-DIMENSIONAL PARTICLE-IN-CELL SIMULATIONS OF ELECTRONEGATIVE DISCHARGES ADVENTURES IN TWO-DIMENSIONAL PARTICLE-IN-CELL SIMULATIONS OF ELECTRONEGATIVE DISCHARGES PART 1: DOUBLE LAYERS IN A TWO REGION DISCHARGE E. Kawamura, A.J. Lichtenberg, M.A. Lieberman and J.P. Verboncoeur

More information

DOE WEB SEMINAR,

DOE WEB SEMINAR, DOE WEB SEMINAR, 2013.03.29 Electron energy distribution function of the plasma in the presence of both capacitive field and inductive field : from electron heating to plasma processing control 1 mm PR

More information

PIC-MCC/Fluid Hybrid Model for Low Pressure Capacitively Coupled O 2 Plasma

PIC-MCC/Fluid Hybrid Model for Low Pressure Capacitively Coupled O 2 Plasma PIC-MCC/Fluid Hybrid Model for Low Pressure Capacitively Coupled O 2 Plasma Kallol Bera a, Shahid Rauf a and Ken Collins a a Applied Materials, Inc. 974 E. Arques Ave., M/S 81517, Sunnyvale, CA 9485, USA

More information

MWP MODELING AND SIMULATION OF ELECTROMAGNETIC EFFECTS IN CAPACITIVE DISCHARGES

MWP MODELING AND SIMULATION OF ELECTROMAGNETIC EFFECTS IN CAPACITIVE DISCHARGES MWP 1.9 MODELING AND SIMULATION OF ELECTROMAGNETIC EFFECTS IN CAPACITIVE DISCHARGES Insook Lee, D.B. Graves, and M.A. Lieberman University of California Berkeley, CA 9472 LiebermanGEC7 1 STANDING WAVES

More information

The Role of Secondary Electrons in Low Pressure RF Glow Discharge

The Role of Secondary Electrons in Low Pressure RF Glow Discharge WDS'05 Proceedings of Contributed Papers, Part II, 306 312, 2005. ISBN 80-86732-59-2 MATFYZPRESS The Role of Secondary Electrons in Low Pressure RF Glow Discharge O. Brzobohatý and D. Trunec Department

More information

PIC-MCC/Fluid Hybrid Model for Low Pressure Capacitively Coupled O 2 Plasma

PIC-MCC/Fluid Hybrid Model for Low Pressure Capacitively Coupled O 2 Plasma PIC-MCC/Fluid Hybrid Model for Low Pressure Capacitively Coupled O 2 Plasma Kallol Bera a, Shahid Rauf a and Ken Collins a a Applied Materials, Inc. 974 E. Arques Ave., M/S 81517, Sunnyvale, CA 9485, USA

More information

Hong Young Chang Department of Physics, Korea Advanced Institute of Science and Technology (KAIST), Republic of Korea

Hong Young Chang Department of Physics, Korea Advanced Institute of Science and Technology (KAIST), Republic of Korea Hong Young Chang Department of Physics, Korea Advanced Institute of Science and Technology (KAIST), Republic of Korea Index 1. Introduction 2. Some plasma sources 3. Related issues 4. Summary -2 Why is

More information

4 Modeling of a capacitive RF discharge

4 Modeling of a capacitive RF discharge 4 Modeling of a capacitive discharge 4.1 PIC MCC model for capacitive discharge Capacitive radio frequency () discharges are very popular, both in laboratory research for the production of low-temperature

More information

MODELING PLASMA PROCESSING DISCHARGES

MODELING PLASMA PROCESSING DISCHARGES MODELING PROCESSING DISCHARGES M.A. Lieberman Department of Electrical Engineering and Computer Sciences University of California Berkeley, CA 94720 Collaborators: E. Kawamura, D.B. Graves, and A.J. Lichtenberg,

More information

NONLINEAR ELECTROMAGNETICS MODEL OF AN ASYMMETRICALLY DRIVEN CAPACITIVE DISCHARGE

NONLINEAR ELECTROMAGNETICS MODEL OF AN ASYMMETRICALLY DRIVEN CAPACITIVE DISCHARGE NONLINEAR ELECTROMAGNETICS MODEL OF AN ASYMMETRICALLY DRIVEN CAPACITIVE DISCHARGE M.A. Lieberman Department of Electrical Engineering and Computer Sciences University of California Berkeley, CA 94720 Collaborators:

More information

65 th GEC, October 22-26, 2012

65 th GEC, October 22-26, 2012 65 th GEC, October 22-26, 2012 2D Fluid/Analytical Simulation of Multi-Frequency Capacitively-Coupled Plasma Reactors (CCPs) E. Kawamura, M.A. Lieberman, D.B. Graves and A.J. Lichtenberg A fast 2D hybrid

More information

MODELING AND SIMULATION OF LOW TEMPERATURE PLASMA DISCHARGES

MODELING AND SIMULATION OF LOW TEMPERATURE PLASMA DISCHARGES MODELING AND SIMULATION OF LOW TEMPERATURE PLASMA DISCHARGES Michael A. Lieberman University of California, Berkeley lieber@eecs.berkeley.edu DOE Center on Annual Meeting May 2015 Download this talk: http://www.eecs.berkeley.edu/~lieber

More information

Dual-RadioFrequency Capacitively-Coupled Plasma Reactors. Tomás Oliveira Fartaria nº58595

Dual-RadioFrequency Capacitively-Coupled Plasma Reactors. Tomás Oliveira Fartaria nº58595 Dual-RadioFrequency Capacitively-Coupled Plasma Reactors Tomás Oliveira Fartaria nº58595 Index Capacitive Reactors Dual Frequency Capacitively-Coupled reactors o Apparatus for improved etching uniformity

More information

FINAL REPORT. DOE Grant DE-FG03-87ER13727

FINAL REPORT. DOE Grant DE-FG03-87ER13727 FINAL REPORT DOE Grant DE-FG03-87ER13727 Dynamics of Electronegative Plasmas for Materials Processing Allan J. Lichtenberg and Michael A. Lieberman Department of Electrical Engineering and Computer Sciences

More information

Monte Carlo Collisions in Particle in Cell simulations

Monte Carlo Collisions in Particle in Cell simulations Monte Carlo Collisions in Particle in Cell simulations Konstantin Matyash, Ralf Schneider HGF-Junior research group COMAS : Study of effects on materials in contact with plasma, either with fusion or low-temperature

More information

Copyright 1996, by the author(s). All rights reserved.

Copyright 1996, by the author(s). All rights reserved. Copyright 1996, by the author(s). All rights reserved. Permission to make digital or hard copies of all or part of this work for personal or classroom use is granted without fee provided that copies are

More information

2D Hybrid Fluid-Analytical Model of Inductive/Capacitive Plasma Discharges

2D Hybrid Fluid-Analytical Model of Inductive/Capacitive Plasma Discharges 63 rd GEC & 7 th ICRP, 2010 2D Hybrid Fluid-Analytical Model of Inductive/Capacitive Plasma Discharges E. Kawamura, M.A. Lieberman, and D.B. Graves University of California, Berkeley, CA 94720 This work

More information

RECENT PROGRESS ON THE PHYSICS

RECENT PROGRESS ON THE PHYSICS RECENT PROGRESS ON THE PHYSICS OF CAPACITIVE DISCHARGES M.A. Lieberman Department of Electrical Engineering and Computer Sciences University of California Berkeley, CA 94720 Download this talk: http://www.eecs.berkeley.edu/

More information

Lee Chen, Merritt Funk, and Radha Sundararajan Tokyo Electron America, Austin, Texas 78741

Lee Chen, Merritt Funk, and Radha Sundararajan Tokyo Electron America, Austin, Texas 78741 Measurement of electron temperatures and electron energy distribution functions in dual frequency capacitively coupled CF 4 /O 2 plasmas using trace rare gases optical emission spectroscopy Zhiying Chen,

More information

PRINCIPLES OF PLASMA DISCHARGES AND MATERIALS PROCESSING

PRINCIPLES OF PLASMA DISCHARGES AND MATERIALS PROCESSING PRINCIPLES OF PLASMA DISCHARGES AND MATERIALS PROCESSING Second Edition MICHAEL A. LIEBERMAN ALLAN J, LICHTENBERG WILEY- INTERSCIENCE A JOHN WILEY & SONS, INC PUBLICATION CONTENTS PREFACE xrrii PREFACE

More information

Plasmas rf haute densité Pascal Chabert LPTP, Ecole Polytechnique

Plasmas rf haute densité Pascal Chabert LPTP, Ecole Polytechnique Plasmas rf haute densité Pascal Chabert LPTP, Ecole Polytechnique chabert@lptp.polytechnique.fr Pascal Chabert, 2006, All rights reserved Programme Introduction Généralité sur les plasmas Plasmas Capacitifs

More information

PIC-MCC simulations for complex plasmas

PIC-MCC simulations for complex plasmas GRADUATE SUMMER INSTITUTE "Complex Plasmas August 4, 008 PIC-MCC simulations for complex plasmas Irina Schweigert Institute of Theoretical and Applied Mechanics, SB RAS, Novosibirsk Outline GRADUATE SUMMER

More information

Feature-level Compensation & Control

Feature-level Compensation & Control Feature-level Compensation & Control 2 Plasma Eray Aydil, UCSB, Mike Lieberman, UCB and David Graves UCB Workshop November 19, 2003 Berkeley, CA 3 Feature Profile Evolution Simulation Eray S. Aydil University

More information

Comparison of a hybrid model to a global model of atmospheric pressure radio-frequency

Comparison of a hybrid model to a global model of atmospheric pressure radio-frequency Home Search Collections Journals About Contact us My IOPscience Comparison of a hybrid model to a global model of atmospheric pressure radio-frequency capacitive discharges This article has been downloaded

More information

P. Diomede, D. J. Economou and V. M. Donnelly Plasma Processing Laboratory, University of Houston

P. Diomede, D. J. Economou and V. M. Donnelly Plasma Processing Laboratory, University of Houston P. Diomede, D. J. Economou and V. M. Donnelly Plasma Processing Laboratory, University of Houston 1 Outline Introduction PIC-MCC simulation of tailored bias on boundary electrode Semi-analytic model Comparison

More information

arxiv: v1 [physics.plasm-ph] 10 Nov 2014

arxiv: v1 [physics.plasm-ph] 10 Nov 2014 arxiv:1411.2464v1 [physics.plasm-ph] 10 Nov 2014 Effects of fast atoms and energy-dependent secondary electron emission yields in PIC/MCC simulations of capacitively coupled plasmas A. Derzsi 1, I. Korolov

More information

Equilibrium model for two low-pressure electronegative plasmas connected by a double layer

Equilibrium model for two low-pressure electronegative plasmas connected by a double layer PHYSICS OF PLASMAS 13, 093504 2006 Equilibrium model for two low-pressure electronegative plasmas connected by a double layer P. Chabert, a N. Plihon, C. S. Corr, and J.-L. Raimbault Laboratoire de Physique

More information

arxiv: v1 [physics.plasm-ph] 16 Apr 2018

arxiv: v1 [physics.plasm-ph] 16 Apr 2018 Consistent simulation of capacitive radio-frequency discharges and external matching networks Frederik Schmidt Institute of Theoretical Electrical Engineering, arxiv:1804.05638v1 [physics.plasm-ph] 16

More information

Collisionless electron heating by capacitive radio-frequency plasma sheaths 2 and Lieberman[2, 3, 4], where the electrons moving towards the sheath ar

Collisionless electron heating by capacitive radio-frequency plasma sheaths 2 and Lieberman[2, 3, 4], where the electrons moving towards the sheath ar Collisionless electron heating by capacitive radio-frequency plasma sheaths G. Gozadinosyx, D. Vendery, M.M. Turnery and M.A. Liebermanz yplasma Research Laboratory, School of Physical Sciences Dublin

More information

A SHORT COURSE ON THE PRINCIPLES OF PLASMA DISCHARGES AND MATERIALS PROCESSING

A SHORT COURSE ON THE PRINCIPLES OF PLASMA DISCHARGES AND MATERIALS PROCESSING A SHORT COURSE ON THE PRINCIPLES OF DISCHARGES AND MATERIALS PROCESSING Michael A. Lieberman Department of Electrical Engineering and Computer Sciences, CA 94720 LiebermanShortCourse15 TABLE OF CONTENTS

More information

Plasma parameter evolution in a periodically pulsed ICP

Plasma parameter evolution in a periodically pulsed ICP Plasma parameter evolution in a periodically pulsed ICP V. Godyak and B. Alexandrovich OSRAM SYLVANIA, 71 Cherry Hill Drive, Beverly, MA 01915, USA The electron energy probability function (EEPF) has been

More information

Plasma Chemistry and Kinetics in Low Pressure Discharges

Plasma Chemistry and Kinetics in Low Pressure Discharges Plasma Chemistry and Kinetics in Low Pressure Discharges Jón Tómas Guðmundsson Science Institute, University of Iceland, Iceland tumi@hi.is 12o. Encontro Brasileiro de Física de Plasmas Brasilia, Brazil

More information

Lecture 6 Plasmas. Chapters 10 &16 Wolf and Tauber. ECE611 / CHE611 Electronic Materials Processing Fall John Labram 1/68

Lecture 6 Plasmas. Chapters 10 &16 Wolf and Tauber. ECE611 / CHE611 Electronic Materials Processing Fall John Labram 1/68 Lecture 6 Plasmas Chapters 10 &16 Wolf and Tauber 1/68 Announcements Homework: Homework will be returned to you on Thursday (12 th October). Solutions will be also posted online on Thursday (12 th October)

More information

Electron Temperature Modification in Gas Discharge Plasma

Electron Temperature Modification in Gas Discharge Plasma Electron Temperature Modification in Gas Discharge Plasma Valery Godyak University of Michigan and RF Plasma Consulting egodyak@comcast.net Workshop: Control of Distribution Functions in Low Temperature

More information

P. Diomede, D. J. Economou and V. M. Donnelly Plasma Processing Laboratory, University of Houston

P. Diomede, D. J. Economou and V. M. Donnelly Plasma Processing Laboratory, University of Houston P. Diomede, D. J. Economou and V. M. Donnelly Plasma Processing Laboratory, University of Houston Acknowledgements: DoE Plasma Science Center, NSF Presented at the 57 th AVS Conference, Albuquerque, NM

More information

Plasma Technology September 15, 2005 A UC Discovery Project

Plasma Technology September 15, 2005 A UC Discovery Project 1 Feature-level Compensation & Control Plasma Technology September 15, 2005 A UC Discovery Project 9/15/05 - Plasma Technology 2 Plasma Technology Professors Jane P. Chang (UCLA), Michael A. Lieberman,

More information

A Kinetic Theory of Planar Plasma Sheaths Surrounding Electron Emitting Surfaces

A Kinetic Theory of Planar Plasma Sheaths Surrounding Electron Emitting Surfaces A Kinetic Theory of Planar Plasma Sheaths Surrounding Electron Emitting Surfaces J. P. Sheehan1, I. Kaganovich2, E. Barnat3, B. Weatherford3, H. Wang2, 4 1 2 D. Sydorenko, N. Hershkowitz, and Y. Raitses

More information

Low Temperature Plasma Technology Laboratory

Low Temperature Plasma Technology Laboratory Low Temperature Plasma Technology Laboratory Equilibrium theory for plasma discharges of finite length Francis F. Chen and Davide Curreli LTP-6 June, Electrical Engineering Department Los Angeles, California

More information

Electron Series Resonant Discharges: Part II: Simulations of Initiation

Electron Series Resonant Discharges: Part II: Simulations of Initiation Electron Series Resonant Discharges: Part II: Simulations of Initiation K. J. Bowers 1 W. D. Qiu 2 C. K. Birdsall 3 Plasma Theory and Simulation Group Electrical Engineering and Computer Science Department

More information

NANOELECTRONICS AND PLASMA PROCESSING THE NEXT 15 YEARS AND BEYOND

NANOELECTRONICS AND PLASMA PROCESSING THE NEXT 15 YEARS AND BEYOND NANOELECTRONICS AND PROCESSING THE NEXT 15 YEARS AND BEYOND M.A. Lieberman Department of Electrical Engineering and Computer Sciences University of California Berkeley, CA 94720 Download this talk: http://www.eecs.berkeley.edu/

More information

Floating probe for electron temperature and ion density measurement applicable to processing plasmas

Floating probe for electron temperature and ion density measurement applicable to processing plasmas JOURNAL OF APPLIED PHYSICS 101, 033305 2007 Floating probe for electron temperature and ion density measurement applicable to processing plasmas Min-Hyong Lee, Sung-Ho Jang, and Chin-Wook Chung a Department

More information

One dimensional hybrid Maxwell-Boltzmann model of shearth evolution

One dimensional hybrid Maxwell-Boltzmann model of shearth evolution Technical collection One dimensional hybrid Maxwell-Boltzmann model of shearth evolution 27 - Conferences publications P. Sarrailh L. Garrigues G. J. M. Hagelaar J. P. Boeuf G. Sandolache S. Rowe B. Jusselin

More information

Frequency variation under constant power conditions in hydrogen radio frequency discharges

Frequency variation under constant power conditions in hydrogen radio frequency discharges JOURNAL OF APPLIED PHYSICS VOLUME 89, NUMBER 3 1 FEBRUARY 2001 Frequency variation under constant power conditions in hydrogen radio frequency discharges E. Amanatides and D. Mataras a) Plasma Technology

More information

A MINI-COURSE ON THE PRINCIPLES OF LOW-PRESSURE DISCHARGES AND MATERIALS PROCESSING

A MINI-COURSE ON THE PRINCIPLES OF LOW-PRESSURE DISCHARGES AND MATERIALS PROCESSING A MINI-COURSE ON THE PRINCIPLES OF LOW-PRESSURE DISCHARGES AND MATERIALS PROCESSING Michael A. Lieberman Department of Electrical Engineering and Computer Science, CA 94720 LiebermanMinicourse07 1 OUTLINE

More information

Reactor-Scale Models for Rf Diode Sputtering of Metal Thin-Films. S. Desa, S. Ghosal, R.L. Kosut, J.L. Ebert, T.E. Abrahamson, A.

Reactor-Scale Models for Rf Diode Sputtering of Metal Thin-Films. S. Desa, S. Ghosal, R.L. Kosut, J.L. Ebert, T.E. Abrahamson, A. AVS 45 th International Symposium Paper Abstract Number: 946 Program Number TF-WeA4 Reactor-Scale Models for Rf Diode Sputtering of Metal Thin-Films S. Desa, S. Ghosal, R.L. Kosut, J.L. Ebert, T.E. Abrahamson,

More information

EFFECT OF PRESSURE AND ELECTRODE SEPARATION ON PLASMA UNIFORMITY IN DUAL FREQUENCY CAPACITIVELY COUPLED PLASMA TOOLS *

EFFECT OF PRESSURE AND ELECTRODE SEPARATION ON PLASMA UNIFORMITY IN DUAL FREQUENCY CAPACITIVELY COUPLED PLASMA TOOLS * EFFECT OF PRESSURE AND ELECTRODE SEPARATION ON PLASMA UNIFORMITY IN DUAL FREQUENCY CAPACITIVELY COUPLED PLASMA TOOLS * Yang Yang a) and Mark J. Kushner b) a) Department of Electrical and Computer Engineering

More information

Plasma Technology. FLCC Workshop & Review September 13, 2006 FLCC

Plasma Technology. FLCC Workshop & Review September 13, 2006 FLCC 1 Plasma Technology Professors Jane P. Chang (UCLA), Michael A. Lieberman, David B. Graves (UCB) and Allan J. Lichtenberg, John P. Verboncoeur, Alan Wu, Emi Kawamura, Chengche Hsu, Joe Vegh, Insook Lee

More information

Electron Density and Ion Flux in Diffusion Chamber of Low Pressure RF Helicon Reactor

Electron Density and Ion Flux in Diffusion Chamber of Low Pressure RF Helicon Reactor WDS'06 Proceedings of Contributed Papers, Part II, 150 155, 2006. ISBN 80-86732-85-1 MATFYZPRESS Electron Density and Ion Flux in Diffusion Chamber of Low Pressure RF Helicon Reactor R. Šmíd Masaryk University,

More information

1358 IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 27, NO. 5, OCTOBER 1999

1358 IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 27, NO. 5, OCTOBER 1999 1358 IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 27, NO. 5, OCTOBER 1999 Sheath Thickness Evaluation for Collisionless or Weakly Collisional Bounded Plasmas Shiang-Bau Wang and Amy E. Wendt Abstract The

More information

Modelling of low-temperature plasmas: kinetic and transport mechanisms. L.L. Alves

Modelling of low-temperature plasmas: kinetic and transport mechanisms. L.L. Alves Modelling of low-temperature plasmas: kinetic and transport mechanisms L.L. Alves llalves@tecnico.ulisboa.pt Instituto de Plasmas e Fusão Nuclear Instituto Superior Técnico, Universidade de Lisboa Lisboa,

More information

Physique des plasmas radiofréquence Pascal Chabert

Physique des plasmas radiofréquence Pascal Chabert Physique des plasmas radiofréquence Pascal Chabert LPP, Ecole Polytechnique pascal.chabert@lpp.polytechnique.fr Planning trois cours : Lundi 30 Janvier: Rappels de physique des plasmas froids Lundi 6 Février:

More information

Effect of Gas Flow Rate and Gas Composition in Ar/CH 4 Inductively Coupled Plasmas

Effect of Gas Flow Rate and Gas Composition in Ar/CH 4 Inductively Coupled Plasmas COMSOL CONFERENCE BOSTON 2011 Effect of Gas Flow Rate and Gas Composition in Ar/CH 4 Inductively Coupled Plasmas Keisoku Engineering System Co., Ltd., JAPAN Dr. Lizhu Tong October 14, 2011 1 Contents 1.

More information

Influence of driving frequency on the metastable atoms and electron energy distribution function in a capacitively coupled argon discharge

Influence of driving frequency on the metastable atoms and electron energy distribution function in a capacitively coupled argon discharge Influence of driving frequency on the metastable atoms and electron energy distribution function in a capacitively coupled argon discharge S. Sharma Institute for Plasma Research, Gandhinagar -382428,

More information

Solution of time-dependent Boltzmann equation for electrons in non-thermal plasma

Solution of time-dependent Boltzmann equation for electrons in non-thermal plasma Solution of time-dependent Boltzmann equation for electrons in non-thermal plasma Z. Bonaventura, D. Trunec Department of Physical Electronics Faculty of Science Masaryk University Kotlářská 2, Brno, CZ-61137,

More information

Collisional sheath dynamics in the intermediate rf frequency regime

Collisional sheath dynamics in the intermediate rf frequency regime Collisional sheath dynamics in the intermediate rf frequency regime N.Xiang, F.L.Waelbroeck Institute for Fusion Studies, University of Texas Austin,Texas 7871 email: nongx@mail.utexas.edu April 16, 4

More information

Control of Ion Energy Distributions on Plasma Electrodes

Control of Ion Energy Distributions on Plasma Electrodes Control of Ion Energy Distributions on Plasma Electrodes P. Diomede, D. J. Economou and V. M. Donnelly Plasma Processing Laboratory, University of Houston DOE Plasma Science Center Teleseminar, February

More information

A MINI-COURSE ON THE PRINCIPLES OF LOW-PRESSURE DISCHARGES AND MATERIALS PROCESSING

A MINI-COURSE ON THE PRINCIPLES OF LOW-PRESSURE DISCHARGES AND MATERIALS PROCESSING A MINI-COURSE ON THE PRINCIPLES OF LOW-PRESSURE DISCHARGES AND MATERIALS PROCESSING Michael A. Lieberman Department of Electrical Engineering and Computer Science, CA 94720 LiebermanMinicourse10 1 OUTLINE

More information

Effect of electron energy distribution function on power deposition and plasma density in an inductively coupled discharge at very low pressures

Effect of electron energy distribution function on power deposition and plasma density in an inductively coupled discharge at very low pressures INSTITUTE OF PHYSICS PUBLISHING Plasma Sources Sci. Technol. 12 (23) 32 312 PLASMA SOURCES SCIENCE AND TECHNOLOGY PII: S963-252(3)6287-6 Effect of electron energy distribution function on power deposition

More information

Effect of a dielectric layer on plasma uniformity in high frequency electronegative capacitive discharges

Effect of a dielectric layer on plasma uniformity in high frequency electronegative capacitive discharges Effect of a dielectric layer on plasma uniformity in high frequency electronegative capacitive discharges Emi KawamuraDe-Qi WenMichael A. Lieberman and Allan J. Lichtenberg Citation: Journal of Vacuum

More information

Effects of fast atoms and energy-dependent secondary electron emission yields in PIC/ MCC simulations of capacitively coupled plasmas

Effects of fast atoms and energy-dependent secondary electron emission yields in PIC/ MCC simulations of capacitively coupled plasmas (14pp) Plasma Sources Science and Technology doi:10.1088/0963-0252/24/3/034002 Effects of fast atoms and energy-dependent secondary electron emission yields in PIC/ MCC simulations of capacitively coupled

More information

The distorting effect of the ion current on electron temperature measured by an electric probe

The distorting effect of the ion current on electron temperature measured by an electric probe The distorting effect of the ion current on electron temperature measured by an electric probe A. Kudryavtsev 1, S.A. Gutsev 1, V.I. Demidov 2,1 1 St.Petersburg State University, St. Petersburg, Russia

More information

Particle-In-Cell Simulations of a Current-Free Double Layer

Particle-In-Cell Simulations of a Current-Free Double Layer Particle-In-Cell Simulations of a Current-Free Double Layer S. D. Baalrud 1, T. Lafleur, C. Charles and R. W. Boswell American Physical Society Division of Plasma Physics Meeting November 10, 2010 1Present

More information

Electron heating in capacitively coupled radio frequency discharges

Electron heating in capacitively coupled radio frequency discharges Electron heating in capacitively coupled radio frequency discharges Dissertation zur Erlangung des Grades eines Doktors der Naturwissenschaften in der Fakultät für Physik und Astronomie der Ruhr-Universität

More information

Structure of Velocity Distribution of Sheath-Accelerated Secondary Electrons in Asymmetric RF-DC Discharge

Structure of Velocity Distribution of Sheath-Accelerated Secondary Electrons in Asymmetric RF-DC Discharge Structure of Velocity Distribution of Sheath-Accelerated Secondary Electrons in Asymmetric RF-DC Discharge Alexander V. Khrabrov 1, Igor D. Kaganovich 1, Peter L. G. Ventzek 2, Alok Ranjan 3, and Lee Chen

More information

Modeling and Simulation of Plasma Based Applications in the Microwave and RF Frequency Range

Modeling and Simulation of Plasma Based Applications in the Microwave and RF Frequency Range Modeling and Simulation of Plasma Based Applications in the Microwave and RF Frequency Range Dr.-Ing. Frank H. Scharf CST of America What is a plasma? What is a plasma? Often referred to as The fourth

More information

Simulation of the Interaction Between Two Counterflowing Rarefied Jets

Simulation of the Interaction Between Two Counterflowing Rarefied Jets Simulation of the Interaction Between Two Counterflowing Rarefied Jets Cyril Galitzine and Iain D. Boyd Department of Aerospace Engineering, University of Michigan, Ann Arbor, MI 48109 Abstract. A preliminary

More information

Scaling laws verification for capacitive rf-discharge Ar plasma using particle-in-cell simulations

Scaling laws verification for capacitive rf-discharge Ar plasma using particle-in-cell simulations Scaling laws verification for capacitive rf-discharge Ar plasma using particle-in-cell simulations T H. Chunga) and H. S. Yoon Department of Physics, Dong-A University, Pusan 64-714, Korea J. K. Lee Department

More information

In situ electrical characterization of dielectric thin films directly exposed to plasma vacuum-ultraviolet radiation

In situ electrical characterization of dielectric thin films directly exposed to plasma vacuum-ultraviolet radiation JOURNAL OF APPLIED PHYSICS VOLUME 88, NUMBER 4 15 AUGUST 2000 In situ electrical characterization of dielectric thin films directly exposed to plasma vacuum-ultraviolet radiation C. Cismaru a) and J. L.

More information

Chapter VI: Cold plasma generation

Chapter VI: Cold plasma generation Introduction This photo shows the electrical discharge inside a highpressure mercury vapor lamp (Philips HO 50) just after ignition (Hg + Ar) Chapter VI: Cold plasma generation Anode Positive column Cathode

More information

Study of Electronegativity in Inductively Coupled Radio-Frequency Plasma with Langmuir Probe

Study of Electronegativity in Inductively Coupled Radio-Frequency Plasma with Langmuir Probe Study of Electronegativity in Inductively Coupled Radio-Frequency Plasma with Langmuir Probe International Training Program Queen s University Belfast Dept. Energy Sciences Tokyo Institute of Technology

More information

Collisions and transport phenomena

Collisions and transport phenomena Collisions and transport phenomena Collisions in partly and fully ionized plasmas Typical collision parameters Conductivity and transport coefficients Conductivity tensor Formation of the ionosphere and

More information

Two-Dimensional Particle-in-Cell Simulation of a Micro RF Ion Thruster

Two-Dimensional Particle-in-Cell Simulation of a Micro RF Ion Thruster Two-Dimensional Particle-in-Cell Simulation of a Micro RF Ion Thruster IEPC--7 Presented at the nd International Electric Propulsion Conference, Wiesbaden Germany September 5, Yoshinori Takao, Koji Eriguchi,

More information

Department of Aerospace Engineering and Engineering Mechanics, The University of Texas at Austin, Austin, Texas 78712, USA

Department of Aerospace Engineering and Engineering Mechanics, The University of Texas at Austin, Austin, Texas 78712, USA 1 MAGNETIZED DIRECT CURRENT MICRODISCHARGE, I: EFFECT OF THE GAS PRESSURE Dmitry Levko and Laxminarayan L. Raja Department of Aerospace Engineering and Engineering Mechanics, The University of Texas at

More information

A floating potential method for measuring ion density

A floating potential method for measuring ion density A floating potential method for measuring ion density Francis F. Chen, John D. Evans, and Donald Arnush Electrical Engineering Department, University of California Los Angeles Los Angeles, California 995-1594

More information

arxiv: v1 [physics.plasm-ph] 18 Sep 2018

arxiv: v1 [physics.plasm-ph] 18 Sep 2018 arxiv:189.6779v1 [physics.plasm-ph] 18 Sep 218 Ion energy and angular distributions in low-pressure capacitive oxygen RF discharges driven by tailored voltage waveforms Zoltán Donkó 1,2, Aranka Derzsi

More information

Driving frequency effects on the mode transition in capacitively coupled argon discharges

Driving frequency effects on the mode transition in capacitively coupled argon discharges Driving frequency effects on the mode transition in capacitively coupled argon discharges Liu Xiang-Mei( ), Song Yuan-Hong( ), and Wang You-Nian( ) School of Physics and Optoelectronic Technology, Dalian

More information

Two-dimensional Fluid Simulation of an RF Capacitively Coupled Ar/H 2 Discharge

Two-dimensional Fluid Simulation of an RF Capacitively Coupled Ar/H 2 Discharge Two-dimensional Fluid Simulation of an RF Capacitively Coupled Ar/H 2 Discharge Lizhu Tong Keisoku Engineering System Co., Ltd., Japan September 18, 2014 Keisoku Engineering System Co., Ltd., 1-9-5 Uchikanda,

More information

Effect of Electron Energy Distribution Function on Power Deposition and Plasma Density in an Inductively Coupled Discharge at Very Low Pressures

Effect of Electron Energy Distribution Function on Power Deposition and Plasma Density in an Inductively Coupled Discharge at Very Low Pressures Effect of Electron Energy Distribution Function on Power Deposition and Plasma Density in an Inductively Coupled Discharge at Very Low Pressures Badri Ramamurthi and Demetre J. Economou 1 Plasma Processing

More information

Measurement of EEDF and Distribution of Primary Electron in a Bucket Ion Source

Measurement of EEDF and Distribution of Primary Electron in a Bucket Ion Source Fourth IAEA Technical Meeting on "Negative Ion Based NBIs" May 9-11 2005, Padova - Italy Measurement of EEDF and Distribution of Primary Electron in a Bucket Ion Source S. Miyamoto, F. Kanayama, T. Minami,

More information

LOW-PRESSURE radio-frequency (RF) inductive-coupled

LOW-PRESSURE radio-frequency (RF) inductive-coupled IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 34, NO. 3, JUNE 2006 767 Self-Consistent Modeling of Nonlocal Inductively Coupled Plasmas Oleg V. Polomarov, Constantine E. Theodosiou, Igor D. Kaganovich, Demetre

More information

Low-field helicon discharges

Low-field helicon discharges Plasma Phys. Control. Fusion 39 (1997) A411 A420. Printed in the UK PII: S0741-3335(97)80958-X Low-field helicon discharges F F Chen, X Jiang, J D Evans, G Tynan and D Arnush University of California,

More information

An Improved Global Model for Electronegative Discharge and Ignition Conditions for Peripheral Plasma Connected to a Capacitive Discharge

An Improved Global Model for Electronegative Discharge and Ignition Conditions for Peripheral Plasma Connected to a Capacitive Discharge An Improved Global Model for Electronegative Discharge and Ignition Conditions for Peripheral Plasma Connected to a Capacitive Discharge Sungjin Kim Electrical Engineering and Computer Sciences University

More information

Hybrid global model of water cluster ions in atmospheric pressure Ar/ H 2

Hybrid global model of water cluster ions in atmospheric pressure Ar/ H 2 Journal of Physics D: Applied Physics PAPER Hybrid global model of water cluster ions in atmospheric pressure Ar/ H O RF capacitive discharges To cite this article: A Tavant and M A Lieberman 0 J. Phys.

More information

Characteristics and classification of plasmas

Characteristics and classification of plasmas Characteristics and classification of plasmas PlasTEP trainings course and Summer school 2011 Warsaw/Szczecin Indrek Jõgi, University of Tartu Partfinanced by the European Union (European Regional Development

More information

A global (volume averaged) model of a chlorine discharge

A global (volume averaged) model of a chlorine discharge A global (volume averaged) model of a chlorine discharge Eyþór Gísli Þorsteinsson and Jón Tómas Guðmundsson Science Institute, University of Iceland, Iceland Department of Electrical and Computer Engineering,

More information

Sheaths: More complicated than you think a

Sheaths: More complicated than you think a PHYSICS OF PLASMAS 12, 055502 2005 Sheaths: More complicated than you think a Noah Hershkowitz b University of Wisconsin-Madison, Madison, Wisconsin 53706 Received 7 December 2004; accepted 7 February

More information

Striations in electronegative capacitively coupled radio-frequency plasmas: effects of the pressure, voltage, and electrode gap

Striations in electronegative capacitively coupled radio-frequency plasmas: effects of the pressure, voltage, and electrode gap Striations in electronegative capacitively coupled radio-frequency plasmas: effects of the pressure, voltage, and electrode gap Yong-Xin Liu 1, Ihor Korolov 2, Edmund Schüngel 3, You-Nian Wang 1, Zoltán

More information

PHYSICS OF HOT DENSE PLASMAS

PHYSICS OF HOT DENSE PLASMAS Chapter 6 PHYSICS OF HOT DENSE PLASMAS 10 26 10 24 Solar Center Electron density (e/cm 3 ) 10 22 10 20 10 18 10 16 10 14 10 12 High pressure arcs Chromosphere Discharge plasmas Solar interior Nd (nω) laserproduced

More information

PARTICLE MODELLING OF PARALLEL PLATE RADIO FREQUENCY DISCHARGE PLASMAS IN HYDROGEN: INFLUENCE OF PRESSURE

PARTICLE MODELLING OF PARALLEL PLATE RADIO FREQUENCY DISCHARGE PLASMAS IN HYDROGEN: INFLUENCE OF PRESSURE Journal of Optoelectronics and Advanced Materials Vol. 7, No. 5, October 2005, p. 2363-2369 PARTICLE MODELLING OF PARALLEL PLATE RADIO FREQUENCY DISCHARGE PLASMAS IN HYDROGEN: INFLUENCE OF PRESSURE P.

More information

Characterization of an Oxygen Plasma by Using a Langmuir Probe in an Inductively Coupled Plasma

Characterization of an Oxygen Plasma by Using a Langmuir Probe in an Inductively Coupled Plasma Journal of the Korean Physical Society, Vol. 38, No. 3, March 001, pp. 59 63 Characterization of an Oxygen Plasma by Using a Langmuir Probe in an Inductively Coupled Plasma Jong-Sik Kim and Gon-Ho Kim

More information

1. INTRODUCTION 2. EXPERIMENTAL SET-UP CHARACTERIZATION OF A TUBULAR PLASMA REACTOR WITH EXTERNAL ANNULAR ELECTRODES

1. INTRODUCTION 2. EXPERIMENTAL SET-UP CHARACTERIZATION OF A TUBULAR PLASMA REACTOR WITH EXTERNAL ANNULAR ELECTRODES Romanian Reports in Physics, Vol. 57, No. 3, P. 390-395, 2005 CHARACTERIZATION OF A TUBULAR PLASMA REACTOR WITH EXTERNAL ANNULAR ELECTRODES C. PETCU, B. MITU, G. DINESCU National Institute for Lasers,

More information

OPTIMIZATION OF PLASMA UNIFORMITY USING HOLLOW-CATHODE STRUCTURE IN RF DISCHARGES*

OPTIMIZATION OF PLASMA UNIFORMITY USING HOLLOW-CATHODE STRUCTURE IN RF DISCHARGES* 51th Gaseous Electronics Conference & 4th International Conference on Reactive Plasmas Maui, Hawai i 19-23 October 1998 OPTIMIZATION OF PLASMA UNIFORMITY USING HOLLOW-CATHODE STRUCTURE IN RF DISCHARGES*

More information

Particle-in-Cell Simulations of Electron Dynamics in Low Pressure Discharges with Magnetic Fields

Particle-in-Cell Simulations of Electron Dynamics in Low Pressure Discharges with Magnetic Fields Particle-in-Cell Simulations of Electron Dynamics in Low Pressure Discharges with Magnetic Fields A Thesis Submitted to the College of Graduate Studies and Research in Partial Fulfillment of the Requirements

More information

Electron Transport Behavior in a Mirror Magnetic Field and a Non-uniform Electric Field

Electron Transport Behavior in a Mirror Magnetic Field and a Non-uniform Electric Field Commun. Theor. Phys. (Beijing, China) 35 (2001) pp. 207 212 c International Academic Publishers Vol. 35, No. 2, February 15, 2001 Electron Transport Behavior in a Mirror Magnetic Field and a Non-uniform

More information

Breakdown behavior in radio-frequency argon discharges

Breakdown behavior in radio-frequency argon discharges PHYSICS OF PLASMAS VOLUME 10, NUMBER 3 MARCH 2003 H. B. Smith, C. Charles, and R. W. Boswell Plasma Research Laboratory, Research School of Physical Sciences and Engineering, Australian National University,

More information

ANGULAR DEPENDENCE OF ELECTRON VELOCITY DISTRIBUTIONS IN LOW-PRESSURE INDUCTIVELY COUPLED PLASMAS 1

ANGULAR DEPENDENCE OF ELECTRON VELOCITY DISTRIBUTIONS IN LOW-PRESSURE INDUCTIVELY COUPLED PLASMAS 1 ANGULAR DEPENDENCE OF ELECTRON VELOCITY DISTRIBUTIONS IN LOW-PRESSURE INDUCTIVELY COUPLED PLASMAS 1 Alex V. Vasenkov 2, and Mark J. Kushner Department of Electrical and Computer Engineering Urbana, IL

More information

Etching Issues - Anisotropy. Dry Etching. Dry Etching Overview. Etching Issues - Selectivity

Etching Issues - Anisotropy. Dry Etching. Dry Etching Overview. Etching Issues - Selectivity Etching Issues - Anisotropy Dry Etching Dr. Bruce K. Gale Fundamentals of Micromachining BIOEN 6421 EL EN 5221 and 6221 ME EN 5960 and 6960 Isotropic etchants etch at the same rate in every direction mask

More information

Chapter 1. Introduction to Nonlinear Space Plasma Physics

Chapter 1. Introduction to Nonlinear Space Plasma Physics Chapter 1. Introduction to Nonlinear Space Plasma Physics The goal of this course, Nonlinear Space Plasma Physics, is to explore the formation, evolution, propagation, and characteristics of the large

More information

Model for noncollisional heating in inductively coupled plasma processing sources

Model for noncollisional heating in inductively coupled plasma processing sources Model for noncollisional heating in inductively coupled plasma processing sources Shahid Rauf a) and Mark J. Kushner b) Department of Electrical and Computer Engineering, University of Illinois, 1406 West

More information