Control of ion and electron distribution functions by the Electrical Asymmetry Effect. U. Czarnetzki
|
|
- Rosa Perkins
- 5 years ago
- Views:
Transcription
1 Control of ion and electron distribution functions by the Electrical Asymmetry Effect U. Czarnetzki 64t h GEC, Salt Lake City, November 2011 Institute for Plasma and Atomic Physics 1
2 Ion energy: Ion flux: Process Requirements - deposition or etching/sputtering - quality and selectivity - process speed, substrate heating Ideal concept: Independent control of ion energy and flux. This can be achieved by the Electrical Asymmetry Effect. 2
3 Voltage Balance Model of CCP Discharges RF C RF sheath p bulk sheath g φ = φ + φ + φ + φ C sp sg b Balance of all voltages. One-dimensional model (plane-parallel, cylinder, sphere). Unequal electrode areas included in non-planar geometries. All voltages φ are expressed as functions of q(t), the positive space charge in the sheath at the powered electrode. 3
4 φ RF + η = q Simplified System 1 ε The total positive space charge q t in both sheaths is approximately constant. Sheaths are well characterized by a quadratic 2 charge-voltage relation: φ = The bulk voltage is negligible in most cases. The time varying part of the capacitor voltage is also negligible. A single parameter characterizes the symmetry of the system by the ratio of areas and mean sheath ion densities: ε = ε qt = sp q A 2 p A g n n + sp sg ε q ( 1 ε )( φ ( ϕ) + η) t RF + ε ( qt q) q( ϕ) 4
5 Self-bias and total charge Assuming for flux balance approximately a full collapse of the sheaths at times of the applied voltage extremes determines the total charge q t and the self-bias η : q t = φm φm 1+ ε and φm 1 + ε φ η = 1+ ε 1 2 m2 η ε η = 1 + ε ε In a single-frequency discharge the self-bias is: determined by the area ratio A p / A g. vanishes in a geometrically symmetric discharge (ε = 1). Heil B G, Czarnetzki U, Brinkmann R P and Mussenbrock T, 2008 J. Phys. D: Appl. Phys
6 The Electrical Asymmetry Effect (EAE) Unequal voltage extremes lead to a self-bias for any value of the symmetry parameter ε. This can be realized by a two successive harmonics: ( ϕ, θ ) = ( cos( ϕ + θ ) + cos( 2ϕ )) φ ~ ~ φm 1( θ ) + φm2( θ ) 0 η 0 / 2 The phase θ is the control parameter! Η Ε Θ 1.5 6
7 Bias Variation by the Phase high potential at ground, low potential at the electrode low potential at ground, high potential at the electrode The bias varies almost linearly with the phase. The bias can be varied over a large range. The role of the two electrodes can interchanged. Z. Donkó, J. Schulze, B.G. Heil and U. Czarnetzki, Journal of Physics D: Applied Physics 42, (2009) 7
8 PIC-MC: Ion Energy Distribution (Argon, 2.7 Pa, d = 6.7 cm, φ 0 = 315 V ) powered electrode grounded electrode Ion energy distribution can be well controlled by the phase. The role of the two electrodes can be reversed. Donkò Z, Schulze J, Heil B G, Czarnetzki U 2009 J. Phys. D: Appl. Phys
9 Experimental Ion Energy Distributions E [ev] 4 Pa θ [Degree] Ion flux [a.u.] 10 Pa E [ev] θ [Degree] Ion flux [a.u.] The experiment very well confirms theory and simulation. Schulze J, Schüngel E, Czarnetzki U 2009 J. Phys. D: Appl. Phys
10 Mean Sheath Potentials The massive ions react only on the mean sheath potential. Therefore, the mean sheath potential controls the ion energy. φ sp = q η φ sg = φ sp + η η φ sp + φ sg const. The mean sheath potentials are approximately linear functions of the self bias. The sum of the absolute values is approximately constant. Ion energies can be varied complimentary at the electrodes. E. Schüngel, J. Schulze, Z. Donkó, and U. Czarnetzki Physics of Plasmas 18, (2011) 10
11 PIC Simulation of the Mean Sheath Potentials 0.8 I<φ s >I powered sum ground Argon p = 100 Pa φ 0 = 100 V d = 1 cm η Linear variation of the mean sheath potential. Sum is approximately constant. Good agreement with the model. This explains the linear variation of the mean ion energy. E. Schüngel, J. Schulze, Z. Donkó, and U. Czarnetzki Physics of Plasmas 18, (2011) 11
12 Mean Ion Energies PIC (100 Pa) Experiment Pa, 2.5 cm 10 Pa, 2.5 cm 20 Pa, 1 cm <ε i > [ev] θ [Degree] Linear variation of the mean ion energy by the phase angle. Good agreement with the mean sheath potential. J. Schulze, E. Schüngel and U Czarnetzki Journal of Physics D: Applied Physics 42, (2009) 12
13 Mean Ion and Total Power P i i Γ n φ sp P i P ( ) φ + φ e + = sp φ P sg e P P e e sg Γ const. + P i i P e Abs o rbed power density [ kw m -3 ] Electrons Ions Total Θ [Degrees] The mean sheath voltages vary linearly with the bias. The power dissipated by the ions is proportional to the power dissipated by the electrons. Then the same applies also to the total power. E. Schüngel, J. Schulze, Z. Donkó, and U. Czarnetzki Physics of Plasmas 18, (2011) 13
14 Electron velocity distribution functions Ionization rate: V 0 = 200 V, f = MHz, Theta = 0 deg, L = 2.5 cm, p = 3 Pa (argon), T = 400 K The powered electrode is at x=0, time covers one period of the MHz cycle. The grey lines indicate equipotential contours (spacing = 20 V). The applied voltage waveform leads apparently to complicate sheath dynamics and electron distribution functions. Z. Donkó, Plasma Sources Sci. Technol. 20, (2011) 14
15 Simulated and measured Excitaiton As expected, the complex time-space structure of the sheath voltage waveforms leads to similar complexity in excitation. Positions and strengths of the various maxima are varying with the phase, i.e. with the form of the waveform. J. Schulze, E. Schüngel, Z. Donko, and U Czarnetzki Plasma Sources Sci. Technol. 19, (2010) 15
16 Non-local contribution to the distribution function The distribution function in the bulk has a local, basically constant part and a non-local part caused by ballistic electrons from the sheath. The relative contribution is scaled by the ratio of the sheath to the bulk density α z. The part originating from the sheath is expanded in the time varying drift velocity u z. J. Schulze, E. Schüngel, Z. Donko, and U Czarnetzki Plasma Sources Sci. Technol. 19, (2010) 16
17 Excitation Rates The excitation rate E in the bulk can be split into a constant and a time varying part. Of particular interest is the ration between peak values at both sheaths. A similar argument could be made for ionization, although more difficult to measure. The velocity u can be related to the derivative of q and so to the derivative of the applied voltage φ. J. Schulze, E. Schüngel, Z. Donko, and U Czarnetzki Plasma Sources Sci. Technol. 19, (2010) 17
18 Ratio of the absolute maxima at both sheaths Experiment, simulation, and model agree very well. Excitation is clearly related to the beam electrons from the sheaths. The excitation can be well described by the calculated q(t). J. Schulze, E. Schüngel, Z. Donko, and U Czarnetzki Plasma Sources Sci. Technol. 19, (2010) 18
19 Phase dependence of the absolute maximum Again, very good agreement is found, supporting the rather simple model description, i.e. the physical picture related to the model. J. Schulze, E. Schüngel, Z. Donko, and U Czarnetzki Plasma Sources Sci. Technol. 19, (2010) 19
20 Power Dissipated by the Electrons a) Experiment (I 2 ) b) PIC simulation c) 2 Analytical Model I q& Identical results throughout! Variations by θ cancel out almost entirely in the integral over ϕ. 2 E. Schüngel, J. Schulze, Z. Donkó, and U. Czarnetzki Physics of Plasmas 18, (2011) 20
21 Mean Electron Power Not more than 10 % variation of the mean power! E. Schüngel, J. Schulze, Z. Donkó, and U. Czarnetzki Physics of Plasmas 18, (2011) 21
22 PIC (2.7 Pa) Ion Flux Experiment (4 Pa) Grounded electrode Ion flux [a.u.] θ [Degree] The ion flux is nearly independent of the phase angle. Ion energy and flux can be controlled separately. Z. Donkó, J. Schulze, B.G. Heil and U. Czarnetzki, Journal of Physics D: Applied Physics 42, (2009) 22
23 Summary The electrical asymmetry effect allows a convenient control of ion energy distribution functions. Increasing the ion energy at one electrode reduces correspondingly the ion energy at the counter electrode, allowing even for a full reversal. The control parameter is the phase between the two RF frequencies. Electron energy distribution functions and correspondingly excitation and ionization show a complicate spatial-temporal behavior. The temporal and spatial average is, however, approximately constant leading to a constant density and ion flow. Support by the DFG in the frame of SFB 591, GK 1051, the RUB Research School, the Federal Ministry for Environment and the Hungarian Fund for Scientific Research is gratefully acknowledged. Commercialization and licensing is via RUBITEC. 23
24 More about the EAE on this meeting Shinya Iwashita, Tuesday ET4 4 Edmund Schüngel, Thursday QRP1 45 Julian Schulze, Thursday QRP1 46 Sebastian Mohr, Thursday QRP1 47 Julian Schulze, Friday SF1 2 24
Report on Visit to Ruhr University Bochum by International Training Program From October 1st to November 29th 2010
Report on Visit to Ruhr University Bochum by International Training Program From October 1st to November 29th 2010 Graduate school of Engineering, Hori-Sekine Lab. Doctor course student Yusuke Abe Ruhr
More informationarxiv: v1 [physics.plasm-ph] 10 Nov 2014
arxiv:1411.2464v1 [physics.plasm-ph] 10 Nov 2014 Effects of fast atoms and energy-dependent secondary electron emission yields in PIC/MCC simulations of capacitively coupled plasmas A. Derzsi 1, I. Korolov
More informationControl of Ion Energy Distributions on Plasma Electrodes
Control of Ion Energy Distributions on Plasma Electrodes P. Diomede, D. J. Economou and V. M. Donnelly Plasma Processing Laboratory, University of Houston DOE Plasma Science Center Teleseminar, February
More informationPlasma ionization through wave-particle interaction in a capacitively coupled radiofrequency
Plasma ionization through wave-particle interaction in a capacitively coupled radiofrequency discharge D. O Connell, T. Gans, D. Vender, U. Czarnetzki, and R. Boswell Citation: Physics of Plasmas (1994-present)
More informationKinetic interpretation of resonance phenomena in low pressure capacitively coupled radio frequency plasmas
PHYSICS OF PLASMAS 23, 063514 (2016) Kinetic interpretation of resonance phenomena in low pressure capacitively coupled radio frequency plasmas Sebastian Wilczek, 1 Jan Trieschmann, 1 Denis Eremin, 1 Ralf
More informationStriations in electronegative capacitively coupled radio-frequency plasmas: effects of the pressure, voltage, and electrode gap
Striations in electronegative capacitively coupled radio-frequency plasmas: effects of the pressure, voltage, and electrode gap Yong-Xin Liu 1, Ihor Korolov 2, Edmund Schüngel 3, You-Nian Wang 1, Zoltán
More informationEffects of fast atoms and energy-dependent secondary electron emission yields in PIC/ MCC simulations of capacitively coupled plasmas
(14pp) Plasma Sources Science and Technology doi:10.1088/0963-0252/24/3/034002 Effects of fast atoms and energy-dependent secondary electron emission yields in PIC/ MCC simulations of capacitively coupled
More informationarxiv: v1 [physics.plasm-ph] 18 Sep 2018
arxiv:189.6779v1 [physics.plasm-ph] 18 Sep 218 Ion energy and angular distributions in low-pressure capacitive oxygen RF discharges driven by tailored voltage waveforms Zoltán Donkó 1,2, Aranka Derzsi
More informationarxiv: v2 [physics.plasm-ph] 31 May 2013
arxiv:128.6519v2 [physics.plasm-ph] 31 May 213 Ionization by bulk heating of electrons in capacitive radio frequency atmospheric pressure microplasmas T Hemke 1, D Eremin 1, T Mussenbrock 1, A Derzsi 2,
More informationExperimental Observation and Computational Analysis of Striations in Electronegative Capacitively Coupled Radio-Frequency Plasmas
Experimental Observation and Computational Analysis of Striations in Electronegative Capacitively Coupled Radio-Frequency Plasmas Yong-Xin Liu, 1 Edmund Schüngel, 2,* Ihor Korolov, 3 Zoltán Donkó, 3 You-Nian
More informationTwo-dimensional Fluid Simulation of an RF Capacitively Coupled Ar/H 2 Discharge
Two-dimensional Fluid Simulation of an RF Capacitively Coupled Ar/H 2 Discharge Lizhu Tong Keisoku Engineering System Co., Ltd., Japan September 18, 2014 Keisoku Engineering System Co., Ltd., 1-9-5 Uchikanda,
More informationElectron heating in capacitively coupled radio frequency discharges
Electron heating in capacitively coupled radio frequency discharges Dissertation zur Erlangung des Grades eines Doktors der Naturwissenschaften in der Fakultät für Physik und Astronomie der Ruhr-Universität
More informationPIC-MCC/Fluid Hybrid Model for Low Pressure Capacitively Coupled O 2 Plasma
PIC-MCC/Fluid Hybrid Model for Low Pressure Capacitively Coupled O 2 Plasma Kallol Bera a, Shahid Rauf a and Ken Collins a a Applied Materials, Inc. 974 E. Arques Ave., M/S 81517, Sunnyvale, CA 9485, USA
More informationPIC-MCC/Fluid Hybrid Model for Low Pressure Capacitively Coupled O 2 Plasma
PIC-MCC/Fluid Hybrid Model for Low Pressure Capacitively Coupled O 2 Plasma Kallol Bera a, Shahid Rauf a and Ken Collins a a Applied Materials, Inc. 974 E. Arques Ave., M/S 81517, Sunnyvale, CA 9485, USA
More informationDOE WEB SEMINAR,
DOE WEB SEMINAR, 2013.03.29 Electron energy distribution function of the plasma in the presence of both capacitive field and inductive field : from electron heating to plasma processing control 1 mm PR
More informationarxiv: v1 [physics.plasm-ph] 20 Sep 2011
Contrib. Plasma Phys. 0, No. 0, 1 15 (0) Modeling and simulation of ion energy distribution functions in technological plasmas Thomas Mussenbrock Institute of Theoretical Electrical Engineering, Ruhr University
More informationP. Diomede, D. J. Economou and V. M. Donnelly Plasma Processing Laboratory, University of Houston
P. Diomede, D. J. Economou and V. M. Donnelly Plasma Processing Laboratory, University of Houston 1 Outline Introduction PIC-MCC simulation of tailored bias on boundary electrode Semi-analytic model Comparison
More informationPIC/MCC Simulation of Radio Frequency Hollow Cathode Discharge in Nitrogen
PIC/MCC Simulation of Radio Frequency Hollow Cathode Discharge in Nitrogen HAN Qing ( ), WANG Jing ( ), ZHANG Lianzhu ( ) College of Physics Science and Information Engineering, Hebei Normal University,
More informationModélisation de sources plasma froid magnétisé
Modélisation de sources plasma froid magnétisé Gerjan Hagelaar Groupe de Recherche Energétique, Plasma & Hors Equilibre (GREPHE) Laboratoire Plasma et Conversion d Énergie (LAPLACE) Université Paul Sabatier,
More informationP. Diomede, D. J. Economou and V. M. Donnelly Plasma Processing Laboratory, University of Houston
P. Diomede, D. J. Economou and V. M. Donnelly Plasma Processing Laboratory, University of Houston Acknowledgements: DoE Plasma Science Center, NSF Presented at the 57 th AVS Conference, Albuquerque, NM
More informationExperimental and simulation study of a capacitively coupled oxygen discharge driven by tailored voltage waveforms
Plasma Sources Sci. Technol. 25 (206) 05004 (4pp) Plasma Sources Science and Technology Experimental and simulation study of a capacitively coupled oxygen discharge driven by tailored voltage waveforms
More informationHong Young Chang Department of Physics, Korea Advanced Institute of Science and Technology (KAIST), Republic of Korea
Hong Young Chang Department of Physics, Korea Advanced Institute of Science and Technology (KAIST), Republic of Korea Index 1. Introduction 2. Some plasma sources 3. Related issues 4. Summary -2 Why is
More informationLee Chen, Merritt Funk, and Radha Sundararajan Tokyo Electron America, Austin, Texas 78741
Measurement of electron temperatures and electron energy distribution functions in dual frequency capacitively coupled CF 4 /O 2 plasmas using trace rare gases optical emission spectroscopy Zhiying Chen,
More informationarxiv: v1 [physics.plasm-ph] 16 Apr 2018
Consistent simulation of capacitive radio-frequency discharges and external matching networks Frederik Schmidt Institute of Theoretical Electrical Engineering, arxiv:1804.05638v1 [physics.plasm-ph] 16
More informationEFFECT OF PRESSURE AND ELECTRODE SEPARATION ON PLASMA UNIFORMITY IN DUAL FREQUENCY CAPACITIVELY COUPLED PLASMA TOOLS *
EFFECT OF PRESSURE AND ELECTRODE SEPARATION ON PLASMA UNIFORMITY IN DUAL FREQUENCY CAPACITIVELY COUPLED PLASMA TOOLS * Yang Yang a) and Mark J. Kushner b) a) Department of Electrical and Computer Engineering
More informationMonte Carlo Collisions in Particle in Cell simulations
Monte Carlo Collisions in Particle in Cell simulations Konstantin Matyash, Ralf Schneider HGF-Junior research group COMAS : Study of effects on materials in contact with plasma, either with fusion or low-temperature
More information65 th GEC, October 22-26, 2012
65 th GEC, October 22-26, 2012 2D Fluid/Analytical Simulation of Multi-Frequency Capacitively-Coupled Plasma Reactors (CCPs) E. Kawamura, M.A. Lieberman, D.B. Graves and A.J. Lichtenberg A fast 2D hybrid
More informationGlobal modeling of HiPIMS systems: transition from homogeneous to self organized discharges
RUHR-UNIVERSITÄT BOCHUM Global modeling of HiPIMS systems: transition from homogeneous to self organized discharges S. Gallian 1, J. Trieschmann 1, T. Mussenbrock 1, W. N. G. Hitchon 2 and R. P. Brinkmann
More informationInfluence of driving frequency on the metastable atoms and electron energy distribution function in a capacitively coupled argon discharge
Influence of driving frequency on the metastable atoms and electron energy distribution function in a capacitively coupled argon discharge S. Sharma Institute for Plasma Research, Gandhinagar -382428,
More informationThe Role of Secondary Electrons in Low Pressure RF Glow Discharge
WDS'05 Proceedings of Contributed Papers, Part II, 306 312, 2005. ISBN 80-86732-59-2 MATFYZPRESS The Role of Secondary Electrons in Low Pressure RF Glow Discharge O. Brzobohatý and D. Trunec Department
More informationLecture 6 Plasmas. Chapters 10 &16 Wolf and Tauber. ECE611 / CHE611 Electronic Materials Processing Fall John Labram 1/68
Lecture 6 Plasmas Chapters 10 &16 Wolf and Tauber 1/68 Announcements Homework: Homework will be returned to you on Thursday (12 th October). Solutions will be also posted online on Thursday (12 th October)
More information4 Modeling of a capacitive RF discharge
4 Modeling of a capacitive discharge 4.1 PIC MCC model for capacitive discharge Capacitive radio frequency () discharges are very popular, both in laboratory research for the production of low-temperature
More informationCZ České Budějovice, Czech Republic b Technical University of Liberec, Department of Materials Science, Hálkova 6, D Dresden, Germany
INVESTIGATION OF ELECTRIC CONDITIONS IN THE VICINITY OF CARBON NANOTUBES GROWN IN A DC PLASMA SHEATH J. Blažek a, P. Špatenka b, Ch. Taeschner c, A. Leonhardt c a University of South Bohemia, Department
More informationSome more equations describing reactive magnetron sputtering.
Some more equations describing reactive magnetron sputtering D. Depla, S. Mahieu, W. Leroy, K. Van Aeken, J. Haemers, R. De Gryse www.draft.ugent.be discharge voltage (V) 44 4 36 32 28..5 1. 1.5 S (Pumping
More information1. INTRODUCTION 2. EXPERIMENTAL SET-UP CHARACTERIZATION OF A TUBULAR PLASMA REACTOR WITH EXTERNAL ANNULAR ELECTRODES
Romanian Reports in Physics, Vol. 57, No. 3, P. 390-395, 2005 CHARACTERIZATION OF A TUBULAR PLASMA REACTOR WITH EXTERNAL ANNULAR ELECTRODES C. PETCU, B. MITU, G. DINESCU National Institute for Lasers,
More informationPenning Traps. Contents. Plasma Physics Penning Traps AJW August 16, Introduction. Clasical picture. Radiation Damping.
Penning Traps Contents Introduction Clasical picture Radiation Damping Number density B and E fields used to increase time that an electron remains within a discharge: Penning, 936. Can now trap a particle
More informationMWP MODELING AND SIMULATION OF ELECTROMAGNETIC EFFECTS IN CAPACITIVE DISCHARGES
MWP 1.9 MODELING AND SIMULATION OF ELECTROMAGNETIC EFFECTS IN CAPACITIVE DISCHARGES Insook Lee, D.B. Graves, and M.A. Lieberman University of California Berkeley, CA 9472 LiebermanGEC7 1 STANDING WAVES
More informationPlasma Potential Determination in RF Capacitively Coupled Plasma by Measuring Electrode Voltage. Nagoya university Hironao Shimoeda
Plasma Potential Determination in RF Capacitively Coupled Plasma by Measuring Electrode Voltage. Nagoya university Hironao Shimoeda Introduction The University of Texas at Dallas International Center for
More informationModification of thin films and nanoparticles. Johannes Berndt, GREMI,Orléans
Modification of thin films and nanoparticles Johannes Berndt, GREMI,Orléans Low temperature plasmas not fully ionized Ionization degree 10-6 10-4 far away from thermodynamic equlilibrium T electron >>
More informationPhysics 102 Spring 2006: Final Exam Multiple-Choice Questions
Last Name: First Name: Physics 102 Spring 2006: Final Exam Multiple-Choice Questions For questions 1 and 2, refer to the graph below, depicting the potential on the x-axis as a function of x V x 60 40
More informationCollisional sheath dynamics in the intermediate rf frequency regime
Collisional sheath dynamics in the intermediate rf frequency regime N.Xiang, F.L.Waelbroeck Institute for Fusion Studies, University of Texas Austin,Texas 7871 email: nongx@mail.utexas.edu April 16, 4
More informationStudy of a Micro Hollow Cathode Discharge at medium argon gas pressure
Study of a Micro Hollow Cathode Discharge at medium argon gas pressure Claudia LAZZARONI Antoine ROUSSEAU Pascal CHABERT LPP Ecole Polytechnique, Palaiseau, FRANCE Nader SADEGHI LSP Grenoble, FRANCE I-V
More informationDepartment of Aerospace Engineering and Engineering Mechanics, The University of Texas at Austin, Austin, Texas 78712, USA
1 MAGNETIZED DIRECT CURRENT MICRODISCHARGE, I: EFFECT OF THE GAS PRESSURE Dmitry Levko and Laxminarayan L. Raja Department of Aerospace Engineering and Engineering Mechanics, The University of Texas at
More informationElectron Temperature Modification in Gas Discharge Plasma
Electron Temperature Modification in Gas Discharge Plasma Valery Godyak University of Michigan and RF Plasma Consulting egodyak@comcast.net Workshop: Control of Distribution Functions in Low Temperature
More informationMulti-fluid Simulation Models for Inductively Coupled Plasma Sources
Multi-fluid Simulation Models for Inductively Coupled Plasma Sources Madhusudhan Kundrapu, Seth A. Veitzer, Peter H. Stoltz, Kristian R.C. Beckwith Tech-X Corporation, Boulder, CO, USA and Jonathan Smith
More information1) Jozef Stefan Institute, Jamova 39, 1000 Ljubljana, Slovenia
SI0100095 Nuclear Energy in Central Europe '98 Terme Catez, September 7 to 10, 1998 PLASMA RESPONSE TO A POSITIVE VOLTAGE STEP APPLIED TO AN ANODE IMMERSED IN A WEAKLY MAGNETIZED DISCHARGE PLASMA COLUMN
More informationThe Computational Simulation of the Positive Ion Propagation to Uneven Substrates
WDS' Proceedings of Contributed Papers, Part II, 5 9,. ISBN 978-8-778-85-9 MATFYZPRESS The Computational Simulation of the Positive Ion Propagation to Uneven Substrates V. Hrubý and R. Hrach Charles University,
More informationMODELING AND SIMULATION OF LOW TEMPERATURE PLASMA DISCHARGES
MODELING AND SIMULATION OF LOW TEMPERATURE PLASMA DISCHARGES Michael A. Lieberman University of California, Berkeley lieber@eecs.berkeley.edu DOE Center on Annual Meeting May 2015 Download this talk: http://www.eecs.berkeley.edu/~lieber
More information2D Hybrid Fluid-Analytical Model of Inductive/Capacitive Plasma Discharges
63 rd GEC & 7 th ICRP, 2010 2D Hybrid Fluid-Analytical Model of Inductive/Capacitive Plasma Discharges E. Kawamura, M.A. Lieberman, and D.B. Graves University of California, Berkeley, CA 94720 This work
More informationPIC-MCC simulations for complex plasmas
GRADUATE SUMMER INSTITUTE "Complex Plasmas August 4, 008 PIC-MCC simulations for complex plasmas Irina Schweigert Institute of Theoretical and Applied Mechanics, SB RAS, Novosibirsk Outline GRADUATE SUMMER
More informationMultidimensional Numerical Simulation of Glow Discharge by Using the N-BEE-Time Splitting Method
Plasma Science and Technology, Vol.14, No.9, Sep. 2012 Multidimensional Numerical Simulation of Glow Discharge by Using the N-BEE-Time Splitting Method Benyssaad KRALOUA, Ali HENNAD Electrical Engineering
More informationSPUTTER-WIND HEATING IN IONIZED METAL PVD+
SPUTTER-WIND HEATING IN IONIZED METAL PVD+ Junqing Lu* and Mark Kushner** *Department of Mechanical and Industrial Engineering **Department of Electrical and Computer Engineering University of Illinois
More informationFINAL REPORT. DOE Grant DE-FG03-87ER13727
FINAL REPORT DOE Grant DE-FG03-87ER13727 Dynamics of Electronegative Plasmas for Materials Processing Allan J. Lichtenberg and Michael A. Lieberman Department of Electrical Engineering and Computer Sciences
More informationarxiv: v1 [physics.plasm-ph] 23 May 2013
The characteristic shape of emission profiles of plasma spokes in HiPIMS: the role of secondary electrons A. Hecimovic 1, S. Gallian 2, R.-P. Brinkmann 2, M. Böke 1, J. Winter 1 1 Institute of Experimental
More informationLinear and Nonlinear Dust Acoustic Waves, Shocks and Stationary Structures in DC-Glow-Discharge Dusty Plasma Experiments.
53rd Annual Meeting of the APS Division of Plasma Physics BI2.00005 Monday November 14, 2011 Linear and Nonlinear Dust Acoustic Waves, Shocks and Stationary Structures in DC-Glow-Discharge Dusty Plasma
More informationCharacteristics and classification of plasmas
Characteristics and classification of plasmas PlasTEP trainings course and Summer school 2011 Warsaw/Szczecin Indrek Jõgi, University of Tartu Partfinanced by the European Union (European Regional Development
More informationFeature-level Compensation & Control
Feature-level Compensation & Control 2 Plasma Eray Aydil, UCSB, Mike Lieberman, UCB and David Graves UCB Workshop November 19, 2003 Berkeley, CA 3 Feature Profile Evolution Simulation Eray S. Aydil University
More informationNumerical Simulation: Effects of Gas Flow and Rf Current Direction on Plasma Uniformity in an ICP Dry Etcher
Appl. Sci. Converg. Technol. 26(6): 189-194 (2017) http://dx.doi.org/10.5757/asct.2017.26.6.189 Research Paper Numerical Simulation: Effects of Gas Flow and Rf Current Direction on Plasma Uniformity in
More informationHiden EQP Applications
Hiden EQP Applications Mass/Energy Analyser for Plasma Diagnostics and Characterisation EQP Overview The Hiden EQP System is an advanced plasma diagnostic tool with combined high transmission ion energy
More informationThe Effect of Discharge Characteristics on Dielectric Barrier Discharges According to the Relative Permittivity
, pp.21-27 http://dx.doi.org/10.14257/astl.2017.145.05 The Effect of Discharge Characteristics on Dielectric Barrier Discharges According to the Relative Permittivity Don-Kyu Lee Electrical Engineering,
More informationKINETIC DESCRIPTION OF MAGNETIZED TECHNOLOGICAL PLASMAS
KINETIC DESCRIPTION OF MAGNETIZED TECHNOLOGICAL PLASMAS Ralf Peter Brinkmann, Dennis Krüger Fakultät für Elektrotechnik und Informationstechnik Lehrstuhl für Theoretische Elektrotechnik Magnetized low
More informationCONTROL OF UNIFORMITY IN CAPACITIVELY COUPLED PLASMAS CONSIDERING EDGE EFFECTS*
CONTROL OF UNIFORMITY IN CAPACITIVELY COUPLED PLASMAS CONSIDERING EDGE EFFECTS* Junqing Lu and Mark J. Kushner Department of Electrical and Computer Engineering at Urbana-Champaign mjk@uiuc.edu, jqlu@uiuc.edu
More informationExtrel Application Note
Extrel Application Note Real-Time Plasma Monitoring and Detection of Trace H 2 O and HF Species in an Argon Based Plasma Jian Wei, 575 Epsilon Drive, Pittsburgh, PA 15238. (Presented at the 191st Electrochemical
More informationNONLINEAR ELECTROMAGNETICS MODEL OF AN ASYMMETRICALLY DRIVEN CAPACITIVE DISCHARGE
NONLINEAR ELECTROMAGNETICS MODEL OF AN ASYMMETRICALLY DRIVEN CAPACITIVE DISCHARGE M.A. Lieberman Department of Electrical Engineering and Computer Sciences University of California Berkeley, CA 94720 Collaborators:
More informationBreakdown behavior in radio-frequency argon discharges
PHYSICS OF PLASMAS VOLUME 10, NUMBER 3 MARCH 2003 H. B. Smith, C. Charles, and R. W. Boswell Plasma Research Laboratory, Research School of Physical Sciences and Engineering, Australian National University,
More informationExperimental Study on the Instability Arc of a Low - Current Vacuum Arc for Copper Based Cathode Material.
Experimental Study on the Instability Arc of a Low - Current Vacuum Arc for Copper Based Cathode Material. Narong Mungkung Department of Electrical Technology Education, Faculty of Industrial Education
More informationElectron cyclotron resonance plasma enhanced direct current sputtering discharge with magnetic-mirror plasma confinement
Electron cyclotron resonance plasma enhanced direct current sputtering discharge with magnetic-mirror plasma confinement M. Mišina, a) Y. Setsuhara, and S. Miyake Joining and Welding Research Institute,
More informationStructure of Velocity Distribution of Sheath-Accelerated Secondary Electrons in Asymmetric RF-DC Discharge
Structure of Velocity Distribution of Sheath-Accelerated Secondary Electrons in Asymmetric RF-DC Discharge Alexander V. Khrabrov 1, Igor D. Kaganovich 1, Peter L. G. Ventzek 2, Alok Ranjan 3, and Lee Chen
More informationIII. Electromagnetic uniformity: finite RF wavelength in large area, VHF reactors: standing waves, and telegraph effect
III. Electromagnetic uniformity: finite RF wavelength in large area, VHF reactors: standing waves, and telegraph effect IV. Uniformity in time: minimize transients, rapid equilibration to steady-state
More informationCesium Dynamics and H - Density in the Extended Boundary Layer of Negative Hydrogen Ion Sources for Fusion
Cesium Dynamics and H - Density in the Extended Boundary Layer of Negative Hydrogen Ion Sources for Fusion C. Wimmer a, U. Fantz a,b and the NNBI-Team a a Max-Planck-Institut für Plasmaphysik, EURATOM
More informationModeling Dust-Density Wave Fields as a System of Coupled van der Pol Oscillators
Kristoffer Menzel 13th WPDP 1 Modeling Dust-Density Wave Fields as a System of Coupled van der Pol Oscillators Kristoffer Ole Menzel, Tim Bockwoldt, Oliver Arp, Alexander Piel 13th WPDP, Waco May 21, 2012
More informationSimulation of a two-dimensional sheath over a flat insulator conductor interface on a radio-frequency biased electrode in a high-density plasma
JOURNAL OF APPLIED PHYSICS VOLUME 95, NUMBER 7 1 APRIL 2004 Simulation of a two-dimensional sheath over a flat insulator conductor interface on a radio-frequency biased electrode in a high-density plasma
More informationPlasma Processing of Large Curved Surfaces for SRF Cavity Modification
Plasma Processing of Large Curved Surfaces for SRF Cavity Modification J. Upadhyay, 1 Do Im, 1 S. Popović, 1 A.-M. Valente-Feliciano, 2 L. Phillips, 2 and L. Vušković 1 1 Department of Physics - Center
More informationPlasma diagnostics of pulsed sputtering discharge
Plasma diagnostics of pulsed sputtering discharge Vitezslav Stranak Zdenek Hubicka, Martin Cada and Rainer Hippler University of Greifswald, Institute of Physics, Felix-Hausdorff-Str. 6, 174 89 Greifswald,
More informationCombinatorial RF Magnetron Sputtering for Rapid Materials Discovery: Methodology and Applications
Combinatorial RF Magnetron Sputtering for Rapid Materials Discovery: Methodology and Applications Philip D. Rack,, Jason D. Fowlkes,, and Yuepeng Deng Department of Materials Science and Engineering University
More informationANGULAR DEPENDENCE OF ELECTRON VELOCITY DISTRIBUTIONS IN LOW-PRESSURE INDUCTIVELY COUPLED PLASMAS 1
ANGULAR DEPENDENCE OF ELECTRON VELOCITY DISTRIBUTIONS IN LOW-PRESSURE INDUCTIVELY COUPLED PLASMAS 1 Alex V. Vasenkov 2, and Mark J. Kushner Department of Electrical and Computer Engineering Urbana, IL
More informationDriving frequency effects on the mode transition in capacitively coupled argon discharges
Driving frequency effects on the mode transition in capacitively coupled argon discharges Liu Xiang-Mei( ), Song Yuan-Hong( ), and Wang You-Nian( ) School of Physics and Optoelectronic Technology, Dalian
More informationApplication of Rarefied Flow & Plasma Simulation Software
2016/5/18 Application of Rarefied Flow & Plasma Simulation Software Yokohama City in Japan Profile of Wave Front Co., Ltd. Name : Wave Front Co., Ltd. Incorporation : March 1990 Head Office : Yokohama
More informationETCHING Chapter 10. Mask. Photoresist
ETCHING Chapter 10 Mask Light Deposited Substrate Photoresist Etch mask deposition Photoresist application Exposure Development Etching Resist removal Etching of thin films and sometimes the silicon substrate
More informationPlasma parameter evolution in a periodically pulsed ICP
Plasma parameter evolution in a periodically pulsed ICP V. Godyak and B. Alexandrovich OSRAM SYLVANIA, 71 Cherry Hill Drive, Beverly, MA 01915, USA The electron energy probability function (EEPF) has been
More informationMAPPING OF ATOMIC NITROGEN IN SINGLE FILAMENTS OF A BARRIER DISCHARGE MEASURED BY TWO PHOTON FLUORESCENCE SPECTROSCOPY (TALIF)
MAPPING OF ATOMIC NITROGEN IN SINGLE FILAMENTS OF A BARRIER DISCHARGE MEASURED BY TWO PHOTON FLUORESCENCE SPECTROSCOPY (TALIF) C. LUKAS, M. SPAAN, V. SCHULZ VON DER GATHEN, H. F. DÖBELE Institut für Laser
More informationNARROW GAP ELECTRONEGATIVE CAPACITIVE DISCHARGES AND STOCHASTIC HEATING
NARRW GAP ELECTRNEGATIVE CAPACITIVE DISCHARGES AND STCHASTIC HEATING M.A. Lieberman, E. Kawamura, and A.J. Lichtenberg Department of Electrical Engineering and Computer Sciences University of California
More informationPlasma Modeling with COMSOL Multiphysics
Plasma Modeling with COMSOL Multiphysics Copyright 2014 COMSOL. Any of the images, text, and equations here may be copied and modified for your own internal use. All trademarks are the property of their
More informationA novel sputtering technique: Inductively Coupled Impulse Sputtering (ICIS)
IOP Conference Series: Materials Science and Engineering A novel sputtering technique: Inductively Coupled Impulse Sputtering (ICIS) To cite this article: D A L Loch and A P Ehiasarian 2012 IOP Conf. Ser.:
More informationCHARACTERIZATION OF A DC PLASMA WITH HOLLOW CATHODE EFFECT
Romanian Reports in Phisics, Vol. 56, No., P. 71-76, 004 CHARACTERIZATION OF A DC PLASMA WITH HOLLOW CATHODE EFFECT A. R. PETRE 1, M. BÃZÃVAN 1, V. COVLEA 1, V.V. COVLEA 1, ISABELLA IOANA OPREA, H. ANDREI
More informationElectron Current Extraction and Interaction of RF mdbd Arrays
Electron Current Extraction and Interaction of RF mdbd Arrays Jun-Chieh Wang a), Napoleon Leoni b), Henryk Birecki b), Omer Gila b), and Mark J. Kushner a) a), Ann Arbor, MI 48109 USA mkush@umich.edu,
More informationEffect of Gas Flow Rate and Gas Composition in Ar/CH 4 Inductively Coupled Plasmas
COMSOL CONFERENCE BOSTON 2011 Effect of Gas Flow Rate and Gas Composition in Ar/CH 4 Inductively Coupled Plasmas Keisoku Engineering System Co., Ltd., JAPAN Dr. Lizhu Tong October 14, 2011 1 Contents 1.
More informationModelling of low-temperature plasmas: kinetic and transport mechanisms. L.L. Alves
Modelling of low-temperature plasmas: kinetic and transport mechanisms L.L. Alves llalves@tecnico.ulisboa.pt Instituto de Plasmas e Fusão Nuclear Instituto Superior Técnico, Universidade de Lisboa Lisboa,
More informationElectron Transport Behavior in a Mirror Magnetic Field and a Non-uniform Electric Field
Commun. Theor. Phys. (Beijing, China) 35 (2001) pp. 207 212 c International Academic Publishers Vol. 35, No. 2, February 15, 2001 Electron Transport Behavior in a Mirror Magnetic Field and a Non-uniform
More informationPlasma Diagnosis for Microwave ECR Plasma Enhanced Sputtering Deposition of DLC Films
Plasma Science and Technology, Vol.14, No.2, Feb. 2012 Plasma Diagnosis for Microwave ECR Plasma Enhanced Sputtering Deposition of DLC Films PANG Jianhua ( ) 1, LU Wenqi ( ) 1, XIN Yu ( ) 2, WANG Hanghang
More informationMODELING OF AN ECR SOURCE FOR MATERIALS PROCESSING USING A TWO DIMENSIONAL HYBRID PLASMA EQUIPMENT MODEL. Ron L. Kinder and Mark J.
TECHCON 98 Las Vegas, Nevada September 9-11, 1998 MODELING OF AN ECR SOURCE FOR MATERIALS PROCESSING USING A TWO DIMENSIONAL HYBRID PLASMA EQUIPMENT MODEL Ron L. Kinder and Mark J. Kushner Department of
More informationThe Gaseous Electronic Conference GEC reference cell as a benchmark for understanding microelectronics processing plasmas*
PHYSICS OF PLASMAS VOLUME 6, NUMBER 5 MAY 1999 The Gaseous Electronic Conference GEC reference cell as a benchmark for understanding microelectronics processing plasmas* M. L. Brake, J. Pender, a) and
More informationModelling of plasma tank and related langmuir probe calibration MATEO-VELEZ J.-C, ROUSSEL J.-F., SARRAIL D, BOULAY F., INGUIMBERT V.
Modelling of plasma tank and related langmuir probe calibration MATEO-VELEZ J.-C, OUSSEL J.-F., SAAIL D, BOULAY F., INGUIMBET V. PAYAN D. ONEA CNES Objectives Initial: Validation of SPIS modelling (LEO
More informationPhysics (
Question 2.12: A charge of 8 mc is located at the origin. Calculate the work done in taking a small charge of 2 10 9 C from a point P (0, 0, 3 cm) to a point Q (0, 4 cm, 0), via a point R (0, 6 cm, 9 cm).
More informationAs we discussed in class, here are the key properties of the topographical map:
Ch21P Page 1 1P22/1P92 Problems (2011) Chapter 21 Electric Potential Friday, January 14, 2011 10:03 AM In the previous chapter we learned about the use of the electric field concept to describe electric
More informationBeams and magnetized plasmas
Beams and magnetized plasmas 1 Jean-Pierre BOEUF LAboratoire PLAsma et Conversion d Energie LAPLACE/ CNRS, Université Paul SABATIER, TOULOUSE Beams and magnetized plasmas 2 Outline Ion acceleration and
More informationA Kinetic Theory of Planar Plasma Sheaths Surrounding Electron Emitting Surfaces
A Kinetic Theory of Planar Plasma Sheaths Surrounding Electron Emitting Surfaces J. P. Sheehan1, I. Kaganovich2, E. Barnat3, B. Weatherford3, H. Wang2, 4 1 2 D. Sydorenko, N. Hershkowitz, and Y. Raitses
More informationAnisotropic spin splitting in InGaAs wire structures
Available online at www.sciencedirect.com Physics Physics Procedia Procedia 3 (010) 00 (009) 155 159 000 000 14 th International Conference on Narrow Gap Semiconductors and Systems Anisotropic spin splitting
More informationRECENT PROGRESS ON THE PHYSICS
RECENT PROGRESS ON THE PHYSICS OF CAPACITIVE DISCHARGES M.A. Lieberman Department of Electrical Engineering and Computer Sciences University of California Berkeley, CA 94720 Download this talk: http://www.eecs.berkeley.edu/
More informationElectron spins in nonmagnetic semiconductors
Electron spins in nonmagnetic semiconductors Yuichiro K. Kato Institute of Engineering Innovation, The University of Tokyo Physics of non-interacting spins Optical spin injection and detection Spin manipulation
More information