New Fast Technology Co., Ltd. 半導體製程微污染前瞻即時監控系統
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1 New Fast Technology Co., Ltd. 半導體製程微污染前瞻即時監控系統
2 半導體產業製程微污染監控需求 高階製程技術演進 ( 資料來源 : 玉山投顧整理 ) Airborne Molecular Contaminant Sources of Contamination Volatile Organic Contaminants Chemical Contamination Real time Yield Improve!! Absorbed Molecules Metal Ion Non-volatile Residue Cations / Anions Particles Root cause control
3 NFA In-line Monitoring System Advantages NFA In-line Analyzer Off-line Lab Testing 廠置佈點規劃, 全自動化採樣 人員攜帶採樣裝置至現場採樣 全自動化 採樣管路 auto-prepurge 分析方法整合, 採樣後即刻分析 人工操作 人員需自行清洗採樣裝置人員操作分析機台 軟體自動數據計算與報告 人工處理數據與報告 auto-prepurge 人員攜帶採樣裝置至現場採樣 程控採樣後立即分析 人員需自行清洗採樣裝置 即時監測技術分析與自動報告輸出 無時效性 人員操作分析機台 ( 機台分析排程 ) 機台狀態與監控環境異常即時發報 人工處理數據與報告 數據準確性 & 穩定性 Auto-recalibration ISTD 即時修正 QC 機制確保數據正確性 人為污染 & 誤差導入 採樣 / 清洗汙染不同人分析操作可能導致之誤差人工檢核數據與報告
4 NFA In-line Monitor Equipment Total Solution VOCs NFA-121 NFA-1007 advanced NFA-ALIS Elements NFA-i108s IS-T10R NFA-C350 MA/MB NFA-i108P Nano-particle Automatic Stable Accurate Low DL Real time Simple
5 NFA Inline Equipment Configuration 廠置佈點 ( 採樣點 ) 自動化採樣 ( 濃縮 / 稀釋 ) 偵測器分析 ( 定性 / 定量 ) 結果資料庫 數據輸出與異常發報 OOC Alarm ug/m PFA Sampling tube
6 NFA-1007/Advanced NFA-ALIS 空氣中有機污染物分類 (WHO) 分類 MC Monitoring and Metrology (Volatile Organics Contaminant) 沸點溫度 極易揮發性有機物化合物 (VVOCs) 0~ 揮發性有機物化合物 (VOCs) ~ 半揮發性有機物化合物 (SVOCs) ~ 空氣中有機污染物採樣與分析 ( EPA TO-14; TO-15; TO-17 / NIEA A723.73B ; NIEA A715.15B ) TD GC MSD
7 pptv NFA-1007/Advanced In-line VOCs Monitoring - I Analysis Capability 50 MDL of NFA-1007/Advanced MDL = x S (2.998 confidence level for 8 repeat runs / S - RSD*CDL) Method: refer NIEA-PA107 ( 環境檢驗方法偵測極限測定指引 )
8 NFA-1007/Advanced In-line VOCs Monitoring - II Long Term Stability STD auto-calibration / QC and ISTD auto-recalibration (option) function
9 NFA-ALIS AMC Lab Intelligent System- I IPA Benzene Toluene 檢量線相關係數, R 值 Cal-1 Cal
10 Recovery rate NFA-ALIS AMC Lab Intelligent System- II Accuracy and Stability Verification 查核樣品 _10ppb 回收率 % 130% cycle-1 cycle-2 cycle-3 cycle-4 cycle-5 cycle-6 cycle-7 cycle-8 120% 110% 100% 90% 80% 70%
11 NFA-C350 MA & MB Monitoring and Metrology (Anion/Cation Contaminants) Typical MA & MB Anions: F - Cl - NO 2- Br- NO 3- PO 4 2- SO 4 2- Cations: NH 4+ Na + Mg 2+ Ca 2+ 空氣中陰陽離子採樣與分析 (NIEA A507.10B; NIEA A757.10B; NIEA W415.53B ) Ion Chromatography
12 ug/m3 NFA-C350 In-line MA/MB Monitoring - I Analysis Capability 1.0 MDL of MA/MB Fluoride Chloride Nitrite Bromide Nitrate Phosphate Sulfate Ammonia Sodium Magnesium Calcium * MDL calculation is based on impinger sampling parameters and DL of Ion chromatography
13 % Recovery Rate NFA-C350 In-line MA/MB Monitoring - II Sampling Efficiency and Accuracy Sampling Efficiency (%) 查核樣品 50 ppb Recovery Rate 140% 130% cycle-1 cycle-2 cycle-3 cycle-4 cycle-5 cycle-6 cycle-7 cycle-8 cycle-9 cycle % 120% 100% 110% 80% 100% 90% 60% 80% 40% 70% 20% 60% 50% 0% Fluoride Acetate Formate Chloride Nitrite Bromide Nitrate Sulfate 40% Fluoride Acetate Formate Chloride Nitrite Bromide Nitrate Phosphate Sulfate Method: refer Comparison of Cleanroom Samplers for Inorganic Airborne Molecular Contaminants
14 NFA-i108s IS-T10R Ultra Trace element Monitoring and Metrology Multi-elements: Li ; Be ; Na ; Mg ; Al ; K ; Ca ; Sc ; Ti ; V ; Cr ; Mn ; Fe ; Co ; Ni ; Cu ; Zn ; Ge ; Ga As ; Se ; Rb ; Sr ; Y ; Zr ; Nb ; Mo ; Ru ; Rh ; Pd ; Ag ; Cd ; In ; Sn ; Sb ; Te ; Cs ; Ba La ; Ce ; Pr ; Nd ; Sm ; Eu ; Gd ; Tb ; Dy ; Ho ; Er ; Tm ; Yb ; Lu ; Hf ; Ta ; W ; Pt Au ; Hg ; Tl ; Pb ; Bi ; Th ; U ; B ; P ; Si 化學試劑中超微量元素分析 (SEMI C ; SEMI C ; NIEA M105.01B) ICP-MS
15 ppt NFA-i108s In-line Trace Element Monitoring - I Analysis Capability 10 MDL of Chemicals UPW NH4OH 29% H2O2 31% HNO3 70% HF 49% H2SO4 9.8% OK-73 NBAC 0 Na Mg Al K Ca Cr Fe Ni Co Cu Zn Ag Pb Li Be Ti V Ga Ge As Sr IPA 99% MDL = x S (2.998 confidence level for 8 repeat runs / S - RSD*CDL) Method: refer EN
16 Recovery Rate NFA-i108s In-line Trace Element Monitoring - II Accuracy and Stability Verification 查核樣品 5ppt in HF 回收率 % 160% Cycle-1 Cycle-2 Cycle-3 Cycle-4 Cycle-5 Cycle-6 Cycle-7 Cycle-8 Cycle-9 Cycle % 120% 100% 80% 60% 40% Li Be B Na Mg Al K Ca Ti V Cr Mn Fe Ni Co Cu Zn Ga Ge As Sr Zr Nb Mo Ag Cd In Sn Sb Ba Ta Pt Au Tl Pb Bi
17 NFA-i108s In-line Trace Element Monitoring - III In-line dilution system: ACC Module for Accurate Dynamic Dilution Target: Dilute 10x (w/w%) Check method: Assay ; H2SO4 product conc. : %
18 Nano-particle Monitoring NFA-i108P and Metrology Typical nano-particle species Mg, Al, Fe, Ti,,Si, Ag, Au 化學試劑中奈米顆粒分析 (NIEA M105.01B ; NIST-SP ; SEMI C ) ICP-MS
19 Single Nano-particle Analysis with ICP-MS Nature NanoTechnology, 2015, 10, (one ion cloud per particle) American Chemical Society, 2014, 86,
20 Dissolved metal vs. Nano-particle Analysis Environ. Toxicol. Chem. 2012, 31,
21 Microsecond Scanning with no Settling Time TRA data
22 Additional assumptions for Analysis Spherical particle shape. The particle is solid, not hollow. The total elemental composition is known or can be determined. The elemental components are uniformly distributed throughout the particle. (i.e., the particle is not constructed in layers.) The elemental determination is free from interferences The particle is completely and consistently atomized and ionized in the plasma, free from matrix effects (the ionization efficiency matches that of the ionic calibration standard solution and reference material) The nebulization efficiency can be accurately determined and remains constant between reference materials and samples
23 Nano-particle Analysis Easy Work Flow Blank Analysis Run one ion standard ---for diameter calculation ---with the element targeted Run one Reference Material ---for Nebulization Efficiency calculation --- with Au NIST RM, target element independent Sample Analysis
24 response (cps) frequency TRA data convert ICP-MS TRA data convert Response vs frequency Input Analyte response factor Mass of analyte in particle Nebulization efficiency (calculated from reference material) Analyte density Analyte mass fraction in sample particle time (sec) response (cps) Size distribution Calculate
25 Method Verification
26 Nano-particle RM Verification - I Mixed Nano-particle in UPW NIST RM 8012 / 8013 : 30nm / 60nm Au 20nm Fe 2 O3 RM 50nm SiO 2 RM
27 Particle number Particle number particles/ml particles/ml Nano-particle RM Verification - II Linear of Fe Nano-particle RM in Chemicals 4.0E nm Fe RM in H2O2 5.E nm Fe RM in NH4OH 3.0E+05 4.E E+05 y = 35718x R² = E+05 2.E+05 y = 39333x R² = E+05 1.E E RM Conc. (ppt) 0.E RM Conc. (ppt) nm Fe RM in IPA y = x R² = Acquisition Time (sec) nm Fe RM in NBAC y = x R² = Acquisition Time (sec)
28 Particle number Particle number Particles/mL particles/ml Nano-particle RM Verification - III Linear of Si Nano-particle RM in Chemicals 6.E nm Si RM in H2SO4 7.E+05 50nm Si RM in NH4OH 5.E+05 4.E+05 3.E+05 2.E+05 y = x R² = E+05 5.E+05 4.E+05 3.E+05 2.E+05 y = 15588x R² = E+05 1.E+05 0.E RM Conc. (ppt) 0.E RM Conc. (ppt) nm Si RM in IPA nm Si RM in NBAC y = x R² = y = x R² = Acquisition Time (sec) Acquisition Time (sec)
29 Conclusions of Nano-particle Analysis with ICP-MS The property of ICP-MS : high sensitivity and low background can get the low BED measurement ability. Provides Complete information including element-species particle size distribution particle amounts (particles/l) sample concentration. The analysis method were verified with nano-particle RM, precision accuracy and stability are all reliable.
30 nm NFA-i108P In-line Nano-particle Monitoring - I Nano-Particle Analysis Capability BED of Chemicals Fe Ag Au Si Fe Al Si Ti Fe Al Si Fe Al Si Ti Fe Al Si Ti Fe Al Si Ti Fe Al Si Ti Fe Al Si Zn UPW H2O2 31% H2SO4 98% TMAH OK-73 NH4OH 29% IPA NBAC * Note: Particle size detection ability would influence by the chemical purity level of target element Method:G
31 RPD (%) RPD (%) NFA-i108P In-line Nano-particle Monitoring - II Precision Verification 30 Precision of Fe Nano-particle in H2SO Day 1 Day 2 Day 3 Day 4 Day 5 Day 6 Day 7 Day 8 Day 9 Day 10 Day 11 Day 12 Day 13 Day 14 Day Precision of Fe Nano-particle in NH4OH Day 1 Day 2 Day 3 Day 4 Day 5 Day 6 Day 7 Day 8 Day 9 Day 10 Day 11 Day 12 Day 13 Day 14 Day 15
32 Recovery Rate Recovery Rate NFA-i108P In-line Nano-particle Monitoring - III Accuracy Verification 140% 查核樣品 _20nm Fe RM 回收率 % 140% 查核樣品 _50nm Si RM 回收率 % 130% 130% 120% 120% 110% 110% 100% 100% 90% 90% 80% 80% 70% 70% 60% UPW H2O2 H2SO4 TMAH OK-73 NH4OH 60% UPW H2O2 H2SO4 TMAH OK-73 98% 98%
33 Recovery Rate Recovery Rate NFA-i108P In-line Nano-particle Monitoring - IV Accuracy and Stability Verification 140% 130% 120% 110% 100% 90% 80% 70% 60% 50% 查核樣品 20nm Fe RM Recovery Rate in H2SO4 Day 1 Day 2 Day 3 Day 4 Day 5 Day 6 Day 7 Day 8 Day 9 Day 10 Day 11 Day 12 Day 13 Day 14 Day % 120% 110% 100% 90% 80% 70% 60% 50% 40% 查核樣品 20nm Fe RM Recovery Rate in NH4OH Day 1 Day 2 Day 3 Day 4 Day 5 Day 6 Day 7 Day 8 Day 9 Day 10 Day 11 Day 12 Day 13 Day 14 Day 15
34 NFA-HMI Database System Full integration/database System Auto production trend-chart and file auto- upload (ex. Excel, CSV, Htm etc.) Easy search history data (weekly, monthly and annually) Multi-function trend-chart and data process system (single compound grouping sampling port.) Sampling Port Trend Chart Data Output & Display
35 Conclusions NFA In-line Monitoring System Features Items 廠置佈點規劃 整合式去活化採樣閥組 / 管路設計 數據即時性 Description Multi-port monitoring, area: m 2 (100 m) ~ m 2 (150 m) 截彎取直減少 dead volume 並使用去活化 /wellconditioned 管路, 以獲得最佳化樣品進樣效率與避免交叉污染 即刻採樣分析, 即時反應現場 / 原料品質狀況 數據準確性與穩定性自動異常發報 & 鎖點功能低偵測極限系統自動化與操作介面人性化 SEMI S2 認證機台 客製化標準品與內標準品, 確保樣品分析的可靠性與穩定性 Auto-recalibration & QC 機制導入, 確保數據正確性可設定各監控點上下限值 & 異常發報並對於異常點位自動執行鎖點與復歸 方法最佳化以達高階製程需求最低偵測能力 全自動化採樣分析, 軟體自動數據計算與報告輸出 符合半導體產業等級安規需求
36 Total Solution Provider
37 NF Lab. Service Application Target Sampling method Instrements Type MDL 零件 / 產品表面汙染檢測 環境 / 無塵室 / 製程氣體空降分子檢測煙道廢氣排放檢測 VOCs Outgassing TD-GC-MS Organic 0.01 ng/cm 2 (12'') Metal Surface-extraction (NF method) ICP-MS Inorganic 10^-3 ng/cm 2 (12'') F - /Cl - /NO 2 - /Br - /NO 3 - /PO 4 3- /SO 4 2- /NH 4 + Surface-extraction (NF method) IC Inorganic 0.3 ng/cm 2 (12'') TD-GC-MS VOCs Tube/Canister/Bag/On-line Organic TD-GC-TOF F - /Cl - /NO 2 - /Br - /NO 3 - /PO 4 3- /SO 4 2- single ppb sub ppb CHOO - /CH3COO/Li + /NH + 4 /Na + /Mg 2+ Impinger (NF method) IC Inorganic 1 µg/m 3 K + /Ca 2+ /Mn 2+ /Sr 2+ /Ba 2+ 特定氣體殘留不純物分析 CO/CO 2 /N 2 /Ar/H 2 /He/O 2 /CH 4 GC-TCD ppm Inorganic/Orgnaic 氣體純度檢測 C 2 H 6 /C 3 H 8 GC-PDHID 0.1ppm Canister 總碳氫化合物 (THC) 檢測 THC/CH 4 /NMHC GC-FID Organic 1ppm (Methane) 硫 / 磷化合物檢測 P/S compounds GC-FPD Inorganic/Orgnaic ppm 零件 / 產品表面汙染物檢測濾網 零部件 建材等 高分子添加物解析高分子材料單體解析 VOCs TD-GC-MS Organic ppb Headspace P/S compounds TD-GC-FPD Inorganic/Orgnaic ppm Involatile organic compounds -- Py-GC-MS Organic -- 有機溶劑雜質分析 VOCs Direct/ Dilution GC-MS Organic ppb 差異性分析 VOCs Direct/ Dilution GC-TOF Organic sub ppb 混酸成分分析 超純水品質檢測製程化學品 ( 酸 鹼 有機溶劑 ) 檢測 F - /Cl - /NO 2 - /Br - /NO 3 - /PO 4 3- /SO 4 2- /COOH - /CH 3 COO - Direct/ Dilution IC Inorganic 2ppb Metal Direct/ Dilution ICP-MS Inorganic ppq 酸濃度分析 Acid / Base -- Auto-titrator Inorganic % 奈米粒子粒徑 濃度分析 Single nanoparticle Direct/ Dilution SNP-ICP-MS Inorganic 10nm (BED)
38 NF Lab. Service Application Target Sampling method Instrements Type MDL VOCs Outgassing TD-GC-MS Organic 0.01 ng/cm 2 (12'') Metal Surface-extraction (NF method) ICP-MS Inorganic 10^-3 ng/cm 2 (12'') F - /Cl - /NO 2 - /Br - /NO 3 - /PO 4 3- /SO 4 2- /NH 4 + Surface-extraction (NF method) IC Inorganic 0.3 ng/cm 2 (12'') TD-GC-MS VOCs Tube/Canister/Bag/On-line Organic TD-GC-TOF F - /Cl - /NO 2 - /Br - /NO 3 - /PO 4 3- /SO 4 2- single ppb sub ppb CHOO - /CH3COO/Li + /NH + 4 /Na + /Mg 2+ Impinger (NF method) IC Inorganic 1 µg/m 3 K + /Ca 2+ /Mn 2+ /Sr 2+ /Ba 2+ 特定氣體殘留不純物分析 CO/CO 2 /N 2 /Ar/H 2 /He/O 2 /CH 4 GC-TCD ppm Inorganic/Orgnaic 氣體純度檢測高純度氣體分析 C 2 H 6 /C 3 H 8 (Bulk gas/special GC-PDHID 0.1ppm Canister gas Analysis) 總碳氫化合物 (THC) 檢測 THC/CH 4 /NMHC GC-FID Organic 1ppm (Methane) 硫 / 磷化合物檢測 P/S compounds GC-FPD Inorganic/Orgnaic ppm 零件 / 產品表面汙染物檢測濾網 零部件 建材等 高分子添加物解析高分子材料單體解析 VOCs TD-GC-MS Organic ppb Headspace P/S compounds TD-GC-FPD Inorganic/Orgnaic ppm Involatile organic compounds -- Py-GC-MS Organic -- 有機溶劑雜質分析 VOCs Direct/ Dilution GC-MS Organic ppb 差異性分析 VOCs Direct/ Dilution GC-TOF Organic sub ppb 混酸成分分析 空氣 / 煙道揮發性有機污染物分析 (VOCs Analysis) 零件 / 產品表面汙染檢測 環境 / 無塵室 / 製程氣體空降分子檢測煙道廢氣排放檢測 超純水品質檢測製程化學品 ( 酸 鹼 有機溶劑 ) 檢測 材料有機物逸散頂空分析 (Head Space Analysis) 熱裂解分析 & 高分子材料鑑定 (Pyrolysis Analysis) Wafer 表面污染物分析 (Wafer Surface Analysis) F - /Cl - /NO 2 - /Br - /NO 3 - /PO 4 3- /SO 4 2- 陰陽離子分析 (Anions/Cations Analysis) 化學試劑超微量元素分析 (Ultra Trace Metal Analysis) /COOH - /CH 3 COO - Direct/ Dilution IC Inorganic 2ppb Metal Direct/ Dilution ICP-MS Inorganic ppq 化學試劑奈米粒子分析 (Nano-particle Analysis) 酸濃度分析 Acid / Base -- Auto-titrator Inorganic % 奈米粒子粒徑 濃度分析 Single nanoparticle Direct/ Dilution SNP-ICP-MS Inorganic 10nm 酸鹼濃度分析 (Assay Analysis)
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