GaN for use in harsh radiation environments

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4 th RD50 - Workshop on radiation hard semiconductor devices for very high luminosity colliders GaN for use in harsh radiation environments a (W Cunningham a, J Grant a, M Rahman a, E Gaubas b, J Vaitkus b, V Cindro c, M Moll d, M Glaser d ) a University of Glasgow, b Vilnius University, c Jozef Stefan Institute, d CERN

Outline Properties of GaN Material Characterisation CCE Experimental Setup Irradiation X-Rays Neutrons Protons Comparisons to Existing Data Conclusions & Future Work

Properties of GaN GaN (Gallium Nitride) Compound Semiconductor (n-type) Direct Wide Bandgap (~3.4eV) High Density (6.15gcm -3 ) High Threshold Voltage => Ideal material for ionising radiation detector Also applications in blue and UV wavelengths such as lasers and high-brightness LEDs.

Material Properties Material used was Semi-Insulating (SI) GaN Grown by MOCVD on Sapphire (Al 2 O 3 ) substrate Increased resistivity caused by altering TMG flow rates and growth temperature for growth capping layer 100nm Au shottky contacts 2-2.5micron capping layer 2micron n* buffer layer Sapphire (0001) plane

Photoluminesence Excitation by cw HeCd laser, 20mW @ 325nm PL signal dispersed by double monochromator Signal detected using UV enhanced photomultiplier The observed spectra consist of 3 bands. 10-1 (UVB) band 3.42eV=> Band-to-band recombination Blue (BB) band 2.85eV=> The 60 -type basal plane dislocations Yellow (YB) band 2.19eV=> Point Defects e.g. complexes of Ga vacancy I PL (a.u.) 10 1 10 0 YB epi GaN P ex = 0.12 mw 1047 4 GTM 1030 2 GTM BB UVB 2,0 2,5 3,0 3,5 Photon energy (ev) PL Intensity α Defect Concentration => Concentration of point (Y PL) and structural (B PL) dislocations increases with TMG flow rate

Technique To test material s performance in harsh radiation environments Perform material characterisation (I-V, CCE) Irradiate diodes to a range of known fluencies Repeat I-V, CCE measurements

I-V characteristics

α setup for CCE measurements 5.48 MeV α particles from Am 241 source Energy Deposited in 2µm of GaN ~ 553keV Detector and Source housed in vacuum chamber (P ~20 mbar) Measurement setup consisted of Charge sensitive pre-amplifier Shaper amplifier with a shaping time of 1µs, Connected to a pulse height analyser Energy deposition vs. Penetration depth (Bragg curve) of 5.48 MeV α, particles in GaN calculated, calculated using the SRIM code Energy calibration of the detection system was carried out using Si surface barrier diode assumed to have 100% CCE Correcting for difference between electron-hole pair creation energy in Si (3.62eV) and GaN (8.9eV) => Assign energies to the peaks of the observed spectra. => Calculate the c.c.e. of the detector

CCE for Unirradiated GaN Range of Voltage 0-28V CCE = 95%

X-rays Material irradiated at Imperial College London Irradiated to a fluence of 600MRad 10keV x-rays

I-V, CCE for x-rays

CCE for x-rays Range of Voltage 0-28V CCE ~ 100%

n irradiation Material irradiated at Ljubljana Neutron Irradiation Facility Samples irradiated to fluences of 10 14 n/cm 2 10 15 n/cm 2 10 16 n/cm 2 Fluences quoted are 1MeV neutron NIEL equivalent

I-V for n irrad

CCE for n irrad 10 14 n 10 15 n 10 14 n/cm 2, CCE ~ 77% 10 15 n/cm 2, CCE ~ 10% 10 16 n/cm 2, CCE ~ 5%

p irradiation Material irradiated at CERN Samples irradiated to fluence of 10 16 p/cm 2 24GeV/c proton beam

I-V for p irrad.

Comparisons Material Unirradiated CCE Irradiated CCE GaAs 100 % (MIPS) [2] 50 % (2x 10 14 24GeV protons/ cm 2 ) [2] SiC (100 µm bulk V doped) ** 60 % (5.486 Am 241 alpha) [3] 50 % (10 13 300 MeV/c pions/cm 2 ) [3] SiC (epi layer 30 µm) 90 % (5.486 Am 241 alpha) [4] 60 %(10 14 24 GeV/c protons/cm 2 ) [5] Diamond 24 % (Mips) [6] 18 % (10 15 300 MeV/c pions/cm 2 ) [6] GaN 95 % (5.486 Am 241 alpha) 77 % (10 14 1 MeV neutrons/cm 2) 10% (10 15 1MeV neutrons/cm 2 ) 5% (10 16 1MeV neutrons/cm 2 ) Si assumed to have 100 % CCE for all radiation types before irradiation ** 10 18 cm -3 Vanadium (V) doped SiC maximum CCE 60 % [7] [2] U. Biggeri et al, Noise behaviour of semi-insulating GaAs particle detectors before and after proton irradiation, Nucl. Phys. B (Proc. Suppl.) 78 (1999), 527-532 [3] W. Cunningham et al, Performance of irradiated bulk SiC detectors, Nucl.Instr.and Meth. A 509 (2003), 127-131 [4] G. Verzellezi et al, Investigation on the charge collection properties of a 4H-SiC Schottky diode detector, Nucl.Instr.and Meth. A 476 (2002), 717-721 [5] F. Nava et al, Radiation tolerance of epitaxial silicon carbide detectors for electrons,protons and gamma-rays, Nucl.Instr.and Meth. A 505 (2003), 645-655 [6] W. Adam et al, Radiation tolerance of CVD diamond detectors for pions and protons, Nucl.Instr.and Meth. A 476 (2002), 686-693 [7] Simulations caried out by T. Quinn et al to be presented

Results Evidence of increased TMG flow rate proportional to defect density Increase in leakage currents is non linear for increased irradiation levels CCE measurements Unirradiated, CCE ~ 95% 600Mrad X-ray, CCE ~ 100% 10 14 n/cm 2, CCE ~ 77% 10 15 n/cm 2, CCE ~ 10% 10 16 n/cm 2, CCE ~ 5%

Conclusions and Future Work Demonstrated the potential of SI GaN for room temperature ionising radiation detectors Require further tests beyond preliminary results shown until now Full range of n/p irradiations between 10 14-10 16 Perform CCE measurements at varying temperatures Further improvement possible as the growth technology of GaN develops. Begin testing on fabricated diodes on Bulk GaN Use different material (CST, compensated) Detailed investigation of defects post irradiation DLTS MWA / PC TSC