Development of Cs 2 Te photocathode RF gun system for compact THz SASE-FEL
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1 Development of Cs 2 Te photocathode RF gun system for compact THz SASE-FEL R. Kuroda, H. Ogawa, N. Sei, H. Toyokawa, K. Yagi-Watanabe, M. Yasumoto, M. Koike, K. Yamada, T. Yanagida*, T. Nakajyo*, F. Sakai*
2 Outline Introduction (THz source, our present system) Development of compact multi-pulse laser Development of compact Cs 2 Te load-lock system Multi-bunch electron beam generation Surface observation of Cs 2 Te cathode with PhotoElectron Emission Microscopy (PEEM) Summary
3 Introduction Motivation THz imaging technique using the laser-driven THz source has been developed at many other laboratories for detection of the illegal medicine, dangerous chemicals and so on. However, in case of laser based THz source, the output power is very low. The imaging analysis of large illuminated area is not practical. High power THz source based on compact electron linac (within about 1 middle room size) is required and it can perform the total inspections of the sealed letters and the carry-along items.
4 Introduction Dr. Ogawa talked at Storage ring TERAS Accelerator Facility at AIST (located near KEK in Tsukuba, Japan) afternoon session on Monday Storage ring NIJI-IV FEL Positron Beam line Focus! Compact S-band linac Laser Compton X-ray source THz CSR experiment (preliminary experiment of THz SASE-FEL)
5 Introduction Our system have been developed by Sumitomo Heavy Industries Ltd (SHI) and AIST for FESTA project to develop the laser Compton scattering hard X-ray source. Total system is installed in 1 room which area is about 10m 10m including all components such as a Klystron, laser systems, a BNL-type S-band photocathode RF gun, two 1.5 m-long accelerator structures, achromatic arc section and beam dump. The LCS hard X-ray source is usually operated for biological observation. X-ray application station Ti:Sa Laser We are originally planning to modify our system to apply to THz SASE-FEL in future. it is designed Nd:YLF based Laser on the compact S-band linac. Laser Compton Scattering Hard X-ray X Source Achromatic arc RF gun S-band linac 8 m
6 Image of compact THz SASE FEL at AIST SASE-FEL Now under planning Undulator Acromatic arc seciton RF gun 40 MeV S-band linac 8m
7 Image of compact THz SASE FEL at AIST The FEL will be operated in the wavelength range of µm, which corresponds to 1-3 THz THz Parameters Wavelength µm output power 2 W Pulse width 5-10 ps (1σ) Spectrum width 2-3% Repetition rage 50Hz Output stability 2-3% System Parameters Electron charge 1nC 100bunches/macro pulse Electron energy 40MeV Number of period 20 Undulator period 100 mm
8 1nC UV laser : commercial single-pulse laser FEL Frontiers 07, Elba Island, Italy, September 8-14, 2007 Our requirement of electron beam 100 bunches / macro pulse Low emittance (already achieve < 5 mm single bunch) Improvement Photocathode: Cu, Mg Cs 2 Te Subject to achieve: 1 Development of compact multi-pulse UV laser 2 Development of compact load-lock system of Cs 2 Te photocathode. 3 Multi-bunch electron beam generation 4 Photocathode surface observation with PEEM original multi-pulse laser
9 YVO4 ps-osc FEL Frontiers 07, Elba Island, Italy, September 8-14, 2007 Development of Compact Multi-pulse UV laser OSC pulse picker 79.3 MHz CW mode-lock 0.7W FI 10Hz 100pulse 1/4 To modulator Pockels cell Pre Amp. & Pulse Modulator YAG Pre. Amp. AOM 1st order AM pulse dump To amp. 15mW RF amp. AWG 25MHz,250MS/s 14bit Amplifiers & frequency converter From YAG amp modulator X 2 stage Flat pulse SHG FHG Single pass G=10 150mW KTP BBO 8~10mW@10Hz UV
10 Status of multi-pulse UV laser All solid-state and compact 8µJ 100 pulse/ macro pulse Timing jitter is less than 1 ps Intensity stability is less than 3% (each pulse) Intensity flatness is less than 5% (macro pulse) 0.7m FEL Frontiers 07, Elba Island, Italy, September 8-14, 2007 PC Conversion Crystal AMP Oscillator Pre- AMP 1m AOM
11 FEL Frontiers 07, Elba Island, Italy, September 8-14, 2007 Development of Cs2Te compact load-lock system for multi-bunch electron beam generation (Collaborating with KEK, Waseda Univ.) Compact Cs2Te cathode load-lock system RF-gun 1m Delivering unit Evaporation Chamber at KEK Te 50nm Mo plug Cs2TeEvaporation Cs >10nm
12 Multi-bunch electron beam generation using Cs 2 Te photo-cathode Cs 2 Te First Multi-bunch electron beam (40MeV) (End of July, 2007) 1.5 nc 100 bunch@40mev Bunch spacing: 12.8 ns Cs-Te photo-cathode load-lock system Quantum efficiency is about 0.7% MAX)
13 Cs 2 Te operation status Cs 2 Te First Beam Oblique irradiate Perpendicular Evaporation (QE is unknown) Beam Operation (LCS experiment) Installation and RF aging Surface observation with PEEM Stabilization of Cs 2 Te with RF during 7 hour operation
14 Laser spot size dependence FEL Frontiers 07, Elba Island, Italy, September 8-14, 2007 Charge saturation appears due to space charge limitation 1.8mmφ(FWHM) 1mmφ(FWHM) Electron charge vs Laser energy by changing laser spot size
15 Compact load-lock PEEM for surface observation Sample Position Cs Ar + 2 Te cathode delivering unit CO O 2 Window for other analyzing light Xe lamp, Hg lamp, CCD FEL(NIJI-IV), Laser etc XY stage D 2 lamp Objective Condenser Anode Lens Lens Mid Lens Delay Lens Cs 2 Te with Mo plug Sample hν Aperture MCP Screen Window We improved photoelectron emission microscopy (PEEM) device to apply to the load-lock system for Cs 2 Te surface observation in vacuum (10-7 Pa).
16 First Cs 2 Te surface observation with PEEM UV filter(239nm, 300nm, 360nm) XY stage Xe Lamp Field of view: 200 µm Scanning by XY stage (manual) 50µm Cs 2 Te surface was observed with PEEM right after evaporation. Mo substrate has small roughness but its surface is practically flat and Cs 2 Te is uniformly evaporated.
17 First Cs 2 Te surface observation with PEEM(2) Some craters and projections can be observed on the surface. Crater 50µm Projection Even if Mo substrate is polished with diamond powder, it has some small craters and projections. So we can observe them with PEEM.
18 First Cs 2 Te surface observation with PEEM(3) Cs 2 Te 50µm 360nm(3.4eV), MCP 1.45 kv R. A. Powell et al., Phys. Rev.B.8 (1973) (5.2eV)nm, MCP 1.45kV Dependence of different UV filters In case of 360nm filter (3.4eV), we cannot observe PEEM image. 300nm(4.13eV), MCP 1.45 kv
19 First Cs 2 Te surface observation with PEEM(4) Some long scratch on Mo substrate is observed. 50µm σ=0.8µm Narrow scratch less than 1 µm(rms) can be observed with PEEM.
20 Multi-pulse UV laser is almost completed. FEL Frontiers 07, Elba Island, Italy, September 8-14, 2007 Summary Cs 2 Te cathode and load-lock system are already operated for LCS experiments and quantum efficiency is achieved about 0.7%(MAX), typically 0.3%. Multi-bunch electron beam generation is already started and achieved about 1.5 nc 100 bunches. Surface observation of flesh Cs 2 Te cathode is already started with PEEM. In near future Surface observation of Used Cs 2 Te cathode will be performed with PEEM High resolution observation of nm scale will be demonstrated by high magnified optics mode of PEEM. Modification of PEEM device to combine sample evaporation, substrate baking and element analysis. Acknowledgement Authors would like to thanks to KEK-ATF and Waseda Univ. members for their deep help on development of the compact Cs 2 Te load-lock system.
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