Halar ECTFE chemical resistance chart

Transcription

1 Technical Information Halar ECTFE chemical resistance chart Introduction Halar ECTFE is one of the most chemically resistant polymers available today. This chemical resistance is due to the chemically resistant monomers used, the highly ordered 1:1 structure, and the high crystallinity of the resulting product. In the chemical processing industry Halar ECTFE coatings have been successfully used for universal corrosion protection for more than 30 years. Halar ECTFE is extensively used in chemical and pharmaceutical processes, semiconductor fabs, refineries, power plants as well as for many other different applications in contact with highly corrosive or ultra-pure chemicals, like strong inorganic bases and strong mineral and oxidizing acids. Furthermore, Halar ECTFE exhibits outstanding permeation resistance. As a mater of fact, for coating applications the chemical resistance of the polymer is not per se a sufficient condition to assure the corrosion protection needed in the application. In fact, even when the coating material is not affected by the contact with the chemical substance, permeation of the chemical through the coating can after some time in service lead to metal substrate corrosion, with subsequent service failure. Metal corrosion can occur underneath the coating and is typically caused by the combined presence of water and oxygen, that permeate through the coating and reach the metal substrate (low permeation of H 2 O and O 2 through the coating => better corrosion resistance). The permeation data reported in this document will show that Halar ECTFE is a fluoropolymer with very low permeation coefficients in comparison with other fluoropolymers such as ETFE. In addition to its high degree of chemical and permeation resistance, Halar ECTFE possesses the following factors that make it suitable for demanding applications: Mechanically tough with excellent cut through and abrasion resistance Low cold flow High tensiles and elongation Outstanding impact at room temperature and down into the cryogenic Dimensionally stable Excellent release properties Resistant tobalt-60 radiation High purity: it does not contaminate high purity fluids Easily fabricated into complex shapes by normal melt processable techniques Extremely smooth surface

2 Description The aim of this document is to report some of the available results of actual chemical and permeation resistance tests, performed in laboratories. In going through these data, it should be carefully taken into consideration what follows: chemical attack and chemical resistance are very complex phenomena and it s known that there are many factors affecting the chemical suitability of Halar ECTFE or any other plastic, such as for instance: Specific chemical or mixture concentration Temperature and temperature variation Composition of the chemical in contact which may be a complex completely different than the individual components Exotherm or heat of reaction or mixing Pressure, due primarily to the effect of pressure on concentration of a reactive gas Time of exposure Stress levels Velocity Suspended solids Thickness The results of the chemical resistance tests reported below have been generated in laboratories according to USA ASTM D543 specification after 30 days of continuous exposure. These results indicate if there have been effects on the Halar ECTFE material in terms of weight gain (swelling) and change in mechanical properties after 30 days of continuous immersion in the chemical substance. The results of the permeation tests reported below have been generated in laboratories according to USA ASTM D1434 specification and following the indications of USA ASTM E96 specification. Furthermore, it should be noted that these chemical and permeation resistance tests have been performed at lab-scale at atmospheric pressure, on compression moulded specimens. Therefore, the exposed results do not take into account the combined effects of pressure, residual internal stresses and presence of welds.

3 Chemical resistance data Acetic Acid 20 I I Acetic Acid 50 I I Acetic Acid 100 I I Acetone 20 I I Acetone 50 I I Acetone Cyanohydrin 50 I I Acetonitrile 50 I I Acetophenone 50 I I Acrylic Acid 100 I I Aluminum Chloride I I Ammonium Hydroxide I I Amyl Acetate, 99 * 50 I I Aniline 50 I I Aniline 100 I I Benzaldehyde 20 I I Benzaldehyde 50 I I Benzyl Chloride, 97 * 50 I I 2.3 1

4 Benzyl Alcohol 121 I I n-butanol 121 I I Butylaldehyde * 50 I I Butyl Lactate * 50 I I Butyl Phthalate 100 I I Calcium Hydroxide, I I Cellosolve Acetate 20 I I Cellosolve Acetate 100 I I Chlorine Water, sat. 121 I I Chloroacetic Acid, I I Chlorobenzene 20 I I Chlorobenzene 50 I I Chlorosulfonic acid 50 I I a-chlorotoluene 20 I I a-chlorotoluene 50 I I Chromic Acid, I I Cyclohexylamine * 50 I I o-cresol 50 I I 0.3 1

5 o-cresol 100 I I Cyclohexanone 20 I I Cyclohexanone 50 I I Diacetone Alcohol 50 I I Dibutyl Sebacate 100 I I Dibutyl Phthalate * 50 I I Diethyl Phthalate * 50 I I o-dichlorobenzene 20 I I o-dichlorobenzene 50 I I Dichloroethane 20 I I ,2-Dichloroethylene 20 I I Dichloropropane 20 I I Dichloropropane 50 I I a,a-dichlorotoluene 20 I I N,N-Diethylethanolamine * 50 I I Diethylhydroxyamine, I I Diethylene glycol butyl ether acetate * Diethyleneglycolmonobutyl ether* 50 I I I I 0.2 1

6 Diethylene Triamine 50 I I Diisobutyl Ketone * 50 I I Diisopropyl Ketone 20 I I Diisopropyl Ketone 100 I I N,N-Dimethyl Acetamide 20 I I N,N-Dimethyl Acetamide 50 I I N,N-Dimethyldodecylamine 75 I I N,N-Dimethyl Formamide 20 I I N,N-Dimethyl Formamide 50 I I Dimethyl Phthalate 100 I I Dimethyl Sulfoxide 100 I I Dimethylamine 20 I I Dimethylamine, I I Dioctyl Phthalate 50 I I ,4-Dioxane 50 I I Dipropylene glycol methyl ether * 50 I I Ethanol 100 I I 0.8 1

7 Ethyl Acetate 50 I I Ethyl Formate 20 I I Ethylene Glycol 100 I I Ethylenediamine 20 I I Ferric Chloride, I I Ethoxyethanol, 99 * 50 I I Fluoroboric Acid, I I Formaldehyde, I I Formic Acid, I I Furfural 50 I I n-hexane ** 30 I I Hydrochloric acid, I I Hydrofluoric acid, I I Hydrogen Peroxide, I I Hydroxybenzene sulfonic acid * 70 I I Isophorone * 50 I I Isopropyl Alcohol ** 80 I I Lithium Hydroxide, I I 0.0 1

8 Methane Sulfuric Acid, I I Methanol 50 I I Methyl Cellosolve 100 I I Methyl Ethyl Ketone 20 I I Methyl Formate 20 I I Methyl Isobutyl Ketone 20 I I Methyl Isobutyl Ketone 50 I I Methyl Methacrylate 20 I I Methyl-2-Pyrrolidinone 20 I I N-Methylpyrrolidinone 20 I I Methylene Chloride 20 I I Nitric Acid, I I Nitric Acid, I I Nitric Acid, I I Nonyl Phenol * 50 I I Octanol 50 I I Pentyl Acetate 20 I I Pentyl Acetate 50 I I Phenol 50 I I 0.1 1

9 Phosphoric Acid, I I Phosphorous Oxychloride 20 I I Potassium Carbonate, I I Potassium Hydroxide, I I Propanol * 50 I I Propyl Acetate 20 I I Propyl Acetate 50 I I Sodium Carbonate, I I Sodium Chlorite, I I Sodium Hydrosulfide, I I Sodium Hydroxide, I I Sodium Hypochlorite, I I Sodium Hypochlorite, I I Sulfuric Acid, I I Tetrachloroethylene 20 I I Tetramethyl Ammonium Hydroxide p-toluenesulfonic Acid (sol. sat.) * 100 I I I I 0.0 1

10 Toluene 20 I I Tributyl Phosphate * 50 I I Trichlorobenzene 50 I I ,1,1-Trichloroethylene 20 I I Triethylamine * 50 I I Tricresyl Phosphate 100 I I Triethyl Phosphate 50 I I Triethylene Tetramine 50 I I Vinyl Acetate 50 I I Xylene 20 I I Xylene 50 I I 3.4 1

11 Halar ECTFE permeability data according to ASTM D1434 and following the indications of ASTM E96 Permeability data Chemical Permeation Coefficients ECTFE ETFE unit 25 C 25 C 50 C O (0.6 a ) N (0.2 a ) H 2 O (gas) 7.5 (98 b ) HCl from a 37 solution in water HNO 3 from a 65 solution in water H 2 SO 4 from 96 solution in water < < HCl Methanol H 2 O (liq) [cm 3 (STP) mm/m 2 atm 24h] 10 2 [g mm/m 2 24h] a - published literature data from ETFE supplier A according to ASTM D1434 b - published literature data from ETFE supplier B according to ASTM D1434 Additional Information All statements, data and information given herein are believed to be accurate and reliable, but are presented without guarantee, warranty or responsibility of any kind. For additional technical information consult your sales representative or the website: Whilst every care has been taken by S.p.A. in the preparation of this document, no warranty is given to its accuracy and completeness, nor as to compliance with laws so far as they may affect the content of this document. Local laws and regulations (i.e. on consumer s protection, safety, health and environment) are applicable. The users shall be solely responsible. Furthermore, freedom of use under patent or other similar rights should not be assumed. World Headquarters: SOLVAY SOLEXIS S.p.A. Viale Lombardia, Bollate (MI), Italy Tel: Fax: United States Headquarters: SOLVAY SOLEXIS Inc. 10 Leonard Lane Thorofare, NJ USA Tel: Fax: a Passion for Progress