NEXTorr HV 100 HIGHLIGHTS

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NEXTorr HV 100 HIGHLIGHTS General Features High pumping speed for all active gases Pumping speed for noble gases and methane High sorption capacity and increased lifetime Constant pumping speed in HV and UHV Minimal power requirement during operations Fast pumpdown after air venting and without baking Suitable for viton sealed systems Extremely compact and light pump Reduced magnetic interference Able to measure pressure lower than 10 9 mbar Applications Improvement of the ultimate vacuum in HV and UHV systems Reduction of the footprint and weight of vacuum systems Surface science analysis systems Particle accelerators, synchrotron radiation sources and related equipment Process pumps for vacuum devices and deposition chambers Thin films deposition systems Portable vacuum instrumentations Pumping, storing and releasing hydrogen isotopes The NEXTorr HV 100 is an extremely compact pump able to sorb gases very effectively and with large capacities at operative pressures typical of High Vacuum systems, starting from 10 7 Torr. The getter cartridge consists of porous sintered non evaporable getter (NEG) disks stacked in a highly efficient gas trapping structure on a CF35 flange. The disks are made of the new ZAO1 getter alloy. An integrated heater allows for the pump activation (500 C 1 h) and its operation in warm conditions ( 200 C). As a result, the NEXTorr HV 100 can deliver large pumping speed for H 2, active gases like CO, CO 2, O 2, N 2, H 2 O, air and hydrocarbon species in vacuum systems characterized by large gas loads with minimum power requirement (5.4 W at 200 C). The NEXTorr HV 100 can also be used in UHV regime by simply operating the NEG element at room temperature (no power required). On the other side of the same flange, a noble diode ion pump featuring 15 l/s for methane (CH 4 ) and 7 l/s for Argon (Ar) is connected. Gas flows from the vacuum system to the ion pump through an optimized conductance. The optimized conductance and the special internal design of the ion pump allow the maximum exploitation of the ion pump sorption performances. The configuration of the ion pump with respect of the getter cartridge provides additional pumping synergies. Gases released by the ion pump during the operation are intercepted and removed by the getter element, with a substantial reduction of backstreaming effects. For the same reasons, increased pumping efficiency for H 2 and CH 4 are obtained. Fine titanium particles which are known to be continuously emitted by ion pumps during operation are also effectively trapped by the getter element, reducing potential contamination of the vacuum system. 81 75 O35 78 Total pump weight (magnets included) Total pump volume 106,5 64,5 2.2 kg 171 0.5 litre Dimensions in mm Type of ion pump Operation Voltage Ion Element Noble Diode 5.0 kvdc making innovation happen, together

Pumping speed curves for various gases NEXTorr HV 100 NEXTorr HV 100 sorption test (according to ASTM F798-97) 100 H 2 CO 2 Pumping Speed [l/s] 10 N 2 Activation : 550 C x 60' Sorption pressure: 1e-6 torr Sorption temperature : 200 C 1 0,00001 0,0001 0,001 0,01 0,1 1 10 100 Sorbed Quantity [Torr l] Typical Pump Characteristics NEXTorr HV 100 Alloy Type ZAO1 Alloy Composition Zr V Ti Al Getter Mass (g) 45.5 Getter Surface (cm 2 ) 136 Pumping speed (l/s) @ 200 C Sorption capacity (Torr l) CH 4 Gas NEG activated NEG saturated H 2 80 5 O 2 55 3 CO 2 40 5 N 2 25 3 CH 4 15 8 Argon 1 7 (0.7) 7 (0.7) Gas Single run capacity Single run capacity Room temperature 2 200 C 3 H 4 2 910 N/A O 2 1.0 43 CO 2 0.25 10 N 2 0.08 43 CH 4 30 50000 hours at 10 6 Torr Number of runs (sorption cycles) 100 20 Note: 1 Measured at 3 10 6 Torr. Unsaturated pump (saturated pump) 2 Capacity value with the NEG element at room temperature, corresponding to a drop of the pumping speed to 10% of its initial value. A drop to 15% has been considered in the case of N 2. 3 The single run capacity at 200 C is intended as the recommended absorbed quantity per run allowing to perform at least 20 sorption cycles. Capacity values for the various gases are not additive (a getter fully reacted with one gas species will not sorb another gas). 4 After the getter element has reached its H 2 capacity, it can be regenerated. Through the regeneration process it is possible to extract the hydrogen stored in the getter. After a full regeneration process, the pump can start pumping hydrogen again. O 2 The SAES Group manufacturing companies are ISO9001 certified and the Italian companies are also ISO14001 certified. Full information about our certifications for each company of the Group are available on our website at: D.VS.170.0.18 Ordering Information Product Product description Code NEXTorr PUMP NEXTorr HV 100 5H0209 NEG element power supply* NEG POWER LP C1** 3B0521 ION element power supply SIP POWER 3B0506 Output cable NEG element NEG POWER NEXTORR D100/D200 OUTPUT CABLE 3 MT*** 3B0495 Output cable ION element NIOPS 03 OUTPUT CABLE ION 3 MT*** 3B0410 *The power supply includes the input cable **Other models, able to simultaneously drive up to four pumps, are available ***Longer output cables are available on requests The NEXTorr product line incorporates and exploits the patented concept of a combined pumping system comprising a getter pump and an ion pump, and have global Intellectual Property Rights coverage with patents already granted in the US (8,287,247), Europe (2,409,034), Japan (5,372,239), China (102356236). SAES Group. Printed in Italy. All rights reserved. SAES and NEXTorr are registered trademarks of SAES Group. SAES Group reserves the right to change or modify product specifications at any timewithout notice. SAES Group neg_technology@saes.com

NEXTorr HV 200 HIGHLIGHTS General Features High pumping speed for all active gases Pumping speed for noble gases and methane High sorption capacity and increased lifetime Constant pumping speed in HV and UHV Minimal power requirement during operations Fast pumpdown after air venting and without baking Suitable for viton sealed systems Extremely compact and light pump Reduced magnetic interference Able to measure pressure lower than 10 9 mbar Applications The NEXTorr HV 200 is an extremely compact pump able to sorb gases very effectively and with large capacities at operative pressures typical of High Vacuum systems, starting from 10 7 Torr. The getter cartridge consists of porous sintered non evaporable getter (NEG) disks stacked in a highly efficient gas trapping structure on a CF35 flange. The disks are made of the new ZAO1 getter alloy. An integrated heater allows for the pump activation (500 C 1 h) and its operation in warm conditions ( 200 C). As a result, the NEXTorr HV 200 can deliver large pumping speed for H 2, active gases like CO, CO 2, O 2, N 2, H 2 O, air and hydrocarbon species in vacuum systems characterized by large gas loads with minimum power requirement (6.5 W at 200 C). The NEXTorr HV 200 can also be used in UHV regime by simply operating the NEG element at room temperature (no power required). On the other side of the same flange, a noble diode ion pump featuring 15 l/s for methane (CH 4 ) and 7 l/s for Argon (Ar) is connected. Gas flows from the vacuum system to the ion pump through an optimized conductance. The optimized conductance and the special internal design of the ion pump allow the maximum exploitation of the ion pump sorption performances. The configuration of the ion pump with respect of the getter cartridge provides additional pumping synergies. Gases released by the ion pump during the operation are intercepted and removed by the getter element, with a substantial reduction of backstreaming effects. For the same reasons, increased pumping efficiency for H 2 and CH 4 are obtained. Fine titanium particles which are known to be continuously emitted by ion pumps during operation are also effectively trapped by the getter element, reducing potential contamination of the vacuum system. Improvement of the ultimate vacuum in HV and UHV systems Reduction of the footprint and weight of vacuum systems Surface science analysis systems Particle accelerators, synchrotron radiation sources and related equipment Process pumps for vacuum devices and deposition chambers Thin films deposition systems Portable vacuum instrumentations Pumping, storing and releasing hydrogen isotopes 81 75 O35 Total pump weight (magnets included) Total pump volume Type of ion pump Operation Voltage Ion Element 106,5 91 78 197,5 Dimensions in mm 2.2 kg 0.5 litre Noble Diode 5.0 kvdc making innovation happen, together

Pumping speed curves for various gases NEXTorr HV 200 NEXTorr HV 200 sorption test (according to ASTM F798-97) 1000 Pumping Speed [l/s] 100 10 CO 2 H 2 N 2 Activation : 550 C x 60' Sorption pressure: 1e-6 torr Sorption temperature : 200 C 1 0,00001 0,0001 0,001 0,01 0,1 1 10 100 Sorbed Quantity [Torr l] Typical Pump Characteristics NEXTorr HV 200 Alloy Type ZAO1 Alloy Composition Zr V Ti Al Getter Mass (g) 84 Getter Surface (cm 2 ) 252 Pumping speed (l/s) @ 200 C Sorption capacity (Torr l) CH 4 Gas NEG activated NEG saturated H 2 155 5 O 2 110 3 CO 2 90 5 N 2 50 3 CH 4 15 8 Argon 1 7 (0.7) 7 (0.7) Gas Single run capacity Single run capacity Room temperature 2 200 C 3 H 4 2 1680 N/A O 2 1.8 75 CO 2 0.45 18 N 2 0.15 75 CH 4 30 50000 hours at 10 6 Torr Number of runs (sorption cycles) 100 20 Note: 1 Measured at 3 10 6 Torr. Unsaturated pump (saturated pump) 2 Capacity value with the NEG element at room temperature, corresponding to a drop of the pumping speed to 10% of its initial value. A drop to 15% has been considered in the case of N 2. 3 The single run capacity at 200 C is intended as the recommended absorbed quantity per run allowing to perform at least 20 sorption cycles. Capacity values for the various gases are not additive (a getter fully reacted with one gas species will not sorb another gas). 4 After the getter element has reached its H 2 capacity, it can be regenerated. Through the regeneration process it is possible to extract the hydrogen stored in the getter. After a full regeneration process, the pump can start pumping hydrogen again. O 2 The SAES Group manufacturing companies are ISO9001 certified and the Italian companies are also ISO14001 certified. Full information about our certifications for each company of the Group are available on our website at: D.VS.168.0.18 Ordering Information Product Product description Code NEXTorr PUMP NEXTorr HV 200 5H0197 NEG element power supply* NEG POWER LP C1** 3B0521 ION element power supply SIP POWER 3B0506 Output cable NEG element NEG POWER NEXTORR D100/D200 OUTPUT CABLE 3 MT*** 3B0495 Output cable ION element NIOPS 03 OUTPUT CABLE ION 3 MT*** 3B0410 *The power supply includes the input cable **Other models, able to simultaneously drive up to four pumps, are available ***Longer output cables are available on requests The NEXTorr product line incorporates and exploits the patented concept of a combined pumping system comprising a getter pump and an ion pump, and have global Intellectual Property Rights coverage with patents already granted in the US (8,287,247), Europe (2,409,034), Japan (5,372,239), China (102356236). SAES Group. Printed in Italy. All rights reserved. SAES and NEXTorr are registered trademarks of SAES Group. SAES Group reserves the right to change or modify product specifications at any timewithout notice. SAES Group neg_technology@saes.com

NEXTorr HV 300 HIGHLIGHTS General Features High pumping speed for all active gases Pumping speed for noble gases and methane High sorption capacity and increased lifetime Constant pumping speed in HV and UHV Minimal power requirement during operations Fast pumpdown after air venting and without baking Suitable for viton sealed systems Extremely compact and light pump Reduced magnetic interference Able to measure pressures lower than 10 9 mbar Applications Improvement of the ultimate vacuum in HV and UHV systems Reduction of the footprint and weight of vacuum systems Surface science analysis systems Particle accelerators, synchrotron radiation sources and related equipment Process pumps for vacuum devices and deposition chambers Thin films deposition systems Portable vacuum instrumentations Pumping, storing and releasing hydrogen isotopes The NEXTorr HV 300 is an extremely compact pump able to sorb gases very effectively and with large capacities at operative pressures typical of High Vacuum systems, starting from 10 7 Torr. The getter cartridge consists of porous sintered non evaporable getter (NEG) disks stacked in a highly efficient gas trapping structure on a CF63 flange. The disks are made of the new ZAO1 getter alloy. An integrated heater allows for the pump activation (500 C x 1 h) and its operation in warm conditions ( 200 C). Thanks to the flexibility of the ZAO1 technology, the benefits of NEG pumping can be extended to the high vacuum regime (1 10 9 Torr to 1 10 7 Torr). Operating the NEXTorr HV 300 at approximately 200 C, active gas as well as hydrocarbon species can be dissociated onto the surface of the ZAO1 disks and partially diffused into the bulk. As a result, the NEXTorr HV 300 can deliver large pumping speeds for H 2, active gases, like CO, CO 2, O 2, N 2, H 2 O, air and hydrocarbon species in vacuum systems characterized by large gas loads with minimum power requirement (12 W at 200 C). The NEXTorr HV 300 can also be used in UHV regime by simply operating the NEG element at room temperature (no power required). The pump integrates a thermocouple to measure the temperature during the activation and the operation at 200 C. On the other side of the same flange, a noble diode ion pump featuring 14 l/s for methane (CH 4 ) and 6 l/s for Argon (Ar) is connected. Gas flows from the vacuum system to the ion pump through an optimized conductance. The optimized conductance and the special internal design of the ion pump allow the maximum exploitation of the ion pump sorption performances. The configuration of the ion pump with respect of the getter cartridge provides additional pumping synergies. Gases released by the ion pump during the operation are intercepted and removed by the getter element, with a substantial reduction of backstreaming effects. For the same reasons, increased pumping efficiency for H 2 and CH 4 are obtained. Fine titanium particles which are known to be continuously emitted by ion pumps during operation are also effectively trapped by the getter element, reducing potential contamination of the vacuum system. Dimensions in mm making innovation happen, together

Pumping speed curves for various gases NEXTorr HV 300 NEXTorr HV 300 sorption test (according to ASTM FT98-97) 1000 H 2 Pumping Speed [l/s] 100 10 Activation: 550 C x 60' Sorption temperature: 200 C Sorption pressure: 1e-6Torr 1 0,0001 0,001 0,01 0,1 1 10 100 1000 Sorbed Quantity [Torr l] CO 2 Typical Pump Characteristics NEXTorr HV 300 Alloy Type ZAO Alloy Composition Zr V Ti Al Getter Mass (g) 200 Getter Surface (cm 2 ) 600 H 2 300 Pumping Speed (l/s)@200 C O 2 260 CO 2 190 N 2 130 H 2 4000 Sorption Capacity O 2 Single run at 200 C 190 (Torr ll) CO 2 Single run at 200 C 45 N 2 Single run at 200 C 190 Number of runs (sorption cycles) >20 O 2 N 2 The SAES Group manufacturing companies are ISO9001 certified and the Italian companies are also ISO14001 certified. Full information about our certifications for each company of the Group are available on our website at: D.VS.152.1.17 Note: Pumping speed data refer to the initial values. The Single run capacity is intended as the recommended absorbed quantity per run allowing to perform more than 20 sorption cycles at 1e 6 Torr. In case of operation under much lower gas loads or at RT, the pump can be reactivated 100 times or more. Ordering Information Product Product description Code NEXTorr PUMP NEXTorr HV 300 5H0231 NEG element power supply* NEG POWER LP C1** 3B0521 ION element power supply* SIP POWER 3B0506 NEG element Output cable Cable supply output with KTC/3MT V1.1HT*** 3B0420 ION element Output cable NIOPS04 06 OUTPUT CABLE ION 3 MT*** 3B0418 * The power supply includes the input cable ** Other models, able to simultaneously drive up to four pumps, are available *** Longer output cables are available on request The NEXTorr product line incorporates and exploits the patented concept of a combined pumping system comprising a getter pump and an ion pump, and have global Intellectual Property Rights coverage with patents already granted in the US (8,287,247), Europe (2,409,034), Japan (5,372,239), China (102356236). SAES Group. Printed in Italy. All rights reserved. SAES and NEXTorr are registered trademarks of SAES Group. SAES Group reserves the right to change or modify product specifications at any timewithout notice. SAES Group neg_technology@saes.com