Lecture 8. Equations of State, Equilibrium and Einstein Relationships and Generation/Recombination

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Lecture 8 Equations of State, Equilibrium and Einstein Relationships and Generation/Recombination Reading: (Cont d) Notes and Anderson 2 sections 3.4-3.11

Energy Equilibrium Concept Consider a non-uniformly doped semiconductor. E c -E f varies with position Since the electrons (or holes) are free to move anywhere in the material, the average energy of the electrons can not change. x If the average energy did change from one position Fewer electrons, but higher energy to another, there would E c More electrons, but lower energy be a net motion of electrons from high E i energy toward low E f energy. Ln(N D ) E v x E f must be constant when no current flows!

Equilibrium Concept Remember: No net current can flow otherwise we have a perpetual motion machine. But dec/dx is nonzero so we have a drift current component. The drift current component MUST be balanced by a diffusion current component! E J n Diffusion E c J n Drift Ln(N D ) x E i E v E f x

Equilibrium Concept Additionally, since electrons and holes operate independently of each other, J n Diffusion + J n Drift =0 and J p Diffusion + J p Drift =0 Thus, for non-uniform doping in equilibrium, we have: E f is constant No net current Carrier Concentration gradients that result in a diffusion current component. A Built in electric field that result in a drift current component. BOTH electron and hole components must sum to zero. I.E. J n =J p =0

Equilibrium Concept Consider the case for electrons: J but Thus, taking dn n de i = e dx kt dx q = ne kt Thus (*) becomes, µ ( qne) ( qne) D n or, D µ n Drift n n = + E kt q J = n Diffusion 1 q de dx i the = qµ ne + qd and derivative ( Ef Ei) ( Ef Ei) / kt f i i ( Ef Ei) n q kt Likewise n = n of n de dx 0 = e n, for holes, i n = dn dx dn dx = / kt n = kt D µ 0 p p = e kt q ( ) and de dx / kt f = de dx i 0 Einstein Relationship

Equilibrium Concept Other need to knows kt = Energy (thermal energy) = (8.617x10-5 ev/k) (T in K) [ev] = (8.617x10-5 ev/k) (1.6x10-19 J/eV)(T in K) [J] kt/q = Voltage (thermal voltage) = J/coulomb =J/(J/V)=volts D n = Diffusion coefficient [cm 2 /second] Example: For Si, µ n ~1358 @ 27 C ====> D n = (0.0259 V) (1358 cm 2 /V-second) = 35.2 cm 2 /Second

Real Energy band Diagrams: Direct verses Indirect Bandgaps The energy required to liberate an electron from the atom (the energy bandgap) is the same in all escape directions (directions that an electron can leave the atom). Example: Electrons directed toward a neighboring atom would have a high escape energy, while electrons directed toward a channel in the crystal (a hole through the crystal) would have a lower escape energy. Thus, the energy band diagram is actually a function of momentum. Additionally, both energy and momentum (directed mass motion) must be conserved during any transition.

Real Energy band Diagrams: Direct verses Indirect Bandgaps Probability of a direct transition from valence band to conduction band is high! Direct Bandgap Indirect Bandgap Probability of a direct transition from valence band to conduction band is low but if the valence electron is on an atom vibrating in a direction (I.e. has momentum) that lowers the energy required, the probability increases!

Real Energy band Diagrams: Direct verses Indirect Bandgap variations in Light Absorption Polar materials like GaAs, InP, GaN etc tend to be better at absorbing light. No lattice vibration is needed to absorb the light=direct gap. Electric field resonates (fields are additive) with the atomic dipole and thus is absorbed strongly! + + + + + - - - - - Magnitude of Electric Field of a Photon of light

Real Energy band Diagrams: Direct verses Indirect Bandgap variations in Light Absorption Covalent materials like Si, Ge etc tend to be poor light absorbers. A lattice vibration is needed to induce a dipole in the crystal before the light can be absorbed=indirect gap. After the atoms move apart from their equilibrium positions, the core is displaced from the electron cloud. The photon s electric field then resonates (fields are additive) with the atom core - electron cloud dipole and thus is absorbed. + 0 0 0 0 0 0 0 0 + Magnitude of Electric Field of a Photon of light - Electron cloud

3 Recombination and 3 Generation Mechanisms

Recombination and Generation Mechanisms Deep State Impurities

Recombination Mechanisms Band to Band or direct (directly across the band) recombination Does not have to be a direct bandgap material, but is typically very slow in indirect bandgap materials. Basis for light emission devices such as semiconductor LASERs, LEDs, etc Photon (single particle of light) or multiple phonons (single quantum of lattice vibration - equivalent to saying thermal energy)

Recombination Mechanisms Recombination-Generation (R-G) Center recombination. Also known as Shockley-Read-Hall (SRH) recombination. Energy loss can result in a Photon (single particle of light) but is more often multiple phonons (single quantum of lattice vibration - equivalent to saying thermal energy) Two steps: 1.) 1 st carrier is trapped (localized) at an unintentional (or intentional) defect/impurity. 2.) 2 nd carrier (opposite type) is attracted to the R-G center and annihilates the 1 st carrier. Useful for creating fast switching devices by quickly killing off ehp s.

Recombination Mechanisms 1 2 Auger pronounced O-jay recombination. Requires 3 particles. Two steps: 1.) 1 st carrier and 2 nd carrier of same type collide instantly annihilating the electron hole pair (1 st and 3 rd carrier). The energy lost in the annihilation process is given to the 2 nd carrier. 2.) 2 nd carrier gives off a series of phonons until it s energy returns to equilibrium energy (E~=E c ) This process is known as thermalization. 3

Generation Mechanisms Band to Band or direct (directly across the band) generation Does not have to be a direct bandgap material. Mechanism that results in n i Basis for light absorption devices such as semiconductor photodetectors, solar cells, etc

Generation Mechanisms Recombination-Generation (R-G) Center generation. Two steps: 1.) A bonding electron is trapped (localized) at an unintentional defect/impurity generating a hole in the valence band. 2.) This trapped electron is then promoted to the conduction band resulting in a new ehp. Almost always detrimental to electronic devices. AVOID IF POSSIBLE!

Generation Mechanisms Impact Ionization generation. Requires 3 particles and, typically, high electric fields (steeply bent bands). 1 st carrier is accelerated by high electric fields (or may very rarely gain enough kinetic energy on it s own) and collides with a lattice atom, knocking out a bonding electron creating an ehp. If the origin is a high electric field, this process can lead to rapid carrier multiplication known as avalanching. Can be very useful for very sensitive (but noisy) photodiodes. Sets an upper limit on practical electric fields that can be tolerated in many transistors.