1 The plasma simulation system 2016 Brochure www.quantemol.com
2 What does Q-VT do? Quantemol-Virtual Tool is an expert software system for the simulation of industrial plasma processing tools. Q-VT builds upon the comprehensively validated Hybrid Plasma Equipment Model (HPEM) codes developed by the renowned plasma physicist Professor Mark Kushner for simulating non-equilibrium low pressure (up to 1 Torr) plasma processes. Q-VT includes an intuitive user interface, data visualisation and analysis capabilities, and convenient job/batch management Benefits of Q-VT What can Q-VT model: Plasma tool geometry alterations Advanced volume and surface chemistries Variation of key plasma state variables with process parameter changes Ion flux on wafer level: ion energy/angular distribution functions, and fluxes of all species along the wafer Non-Maxwellian electron dynamics Complex electromagnetic plasma interactions (current coils, permanent magnets, multi-frequency power supply, plasma circuit interactions) Pulsed plasma discharges (New) An experimentally validated simulation system focused on modelling plasma tools User-friendly tool-like interface Sets of validated plasma chemistries and cross-sections are provided with the licence Example libraries include numerous chambers Easy-to-use drawing tool for chamber design and modification: a tool simulation setup service can be provided The ability to model complex plasma phenomena with additional modules (dust/radiation transport, ion kinetics, external circuits, etc.) Multi-run management system for managing large numbers of simulations Fig. The simulation consists of a core simulation module, the HPEM, which can be extended with additional add-on modules to incorporate the physics of interest in a given plasma process Applications of Q-VT include: Advanced reactor scale visualisation of scalar and vector plasma properties Possibility to import experimental results Ability to easily distribute and manage jobs over a cluster Tool design and development Modelling of discharge and wafer level chemistry kinetics Modelling etch/deposition uniformity Examining tilting effects (when used with an additional scale profile model feature, specifically compatible with Synopsys TCAD software) Large wafer size simulation (12 inch and more)
3 In Quantemol-VT, tool settings can be easily modified through the intuitive design viewer. The simulation projects are organised and structured with a workbook management system. With the help of a graphical meshing tool your chamber design can be drawn with materials of your choice in 2D (planar) and 2.5D (axisymmetric cylindrical geometry). Results can be plotted and analysed within Q-VT or exported as data files Outputs from Q-VT include: 2D distributions of species densities, temperatures, fluxes, fields and power depositions, surface fluxes, time-resolved kinetics, spatially resolved EEDFs, and ion/neutral energy/angle distributions. Recent citations for the underlying simulation: 1. J. Shoeb, M. M. Wang and M. J. Kushner, "Damage by Radicals and Photons During Plasma Cleaning of Porous low-k SiOCH. I. Ar/O2 and He/H2 Plasmas", J. Vac. Sci. Technol. A 30, 041303 (2012). 2. S. Tinck, W. Boullart and A. Bogaerts, "Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching: effects of SiO2chamber wall coating", Plasma Sources Sci. Technol. 20, 045012 (2011) 3. Y. Yang, M. Strobel, S. Kirk and M. J. Kushner, "Fluorine Plasma Treatments of Polypropylene Films: II. Modeling Reaction Mechanisms and Scaling", Plasma Proc. Polymers 7, 123 (2010)
4 The core physics behind Q-VT is a comprehensive model (Hybrid Plasma Equipment Model) developed by Prof. Mark Kushner and others for modelling low pressure plasma processing reactors. The core simulation module includes: Simulation of gaseous phase chemistry and surface sticking reactions Fluid transport (up to 3 rd order moments) for species in the gaseous phase Heat transport due to reactions, conduction, diffusion and flow Electrostatic field solvers with the ability to apply DC and RF potentials to surfaces and coils Boltzmann and Monte-Carlo solutions of electron kinetics Extensive database of cross-section reactions developed by Prof. Mark Kushner and his group Additional add-on modules available 1 EMC Electron Monte Carlo 2 SKM Surface Kinetics Module 3 MAXWELL Maxwell Equation Solver 4 PCMC 5 MICROWAVE Plasma Chemistry Monte Carlo Simulation and Ion Monte Carlo Simulation Finite Difference Time Domain Microwave Module 6 CIRCUIT RF circuit module. 7 SPUTTER Sputtering 8 DTS Dust Transport Simulator 9 HV Photon beam injection 10 RADTRANS Radiation Transport Mod- Consultancy As well as providing advanced modelling software, Quantemol also provides a unique consultancy service. With our suite of software and highly skilled engineers we provide complete bespoke results analyses. Consultancy projects range from small quick calculations to comprehensive development. Typical types of consultancy work provided are: Calculations of specific electron-molecule and electron-atom cross sections Industrial plasma tool simulations Plasma process parameter optimisations Plasma chemistry designs Plasma etching and deposition calculations General multiphysics problems (CFD, etc..) We work on the basis of complete confidentiality and understand the importance of protecting intellectual property. Please contact us on +44 203 549 58 41 info@quantemol.com for more details
5 Price list Use Case Type of Licence Version Non-commercial research Commercial research Licence term 1 year 3 years Perpetual Annual Support Single Workstation SE 6,000 12,000 20,000 3,000 NE 8,000 15,000 25,000 3,700 Research group SE 10,000 20,000 32,000 4,800 NE 13,000 25,000 35,000 5,200 Institution SE 16,000 31,000 39,000 5,800 NE 20,000 34,000 41,000 6,100 Single Workstation SE 18,000 n/a 35,000 5,200 NE 24,000 n/a 38,000 5,700 Site NE 30,000 n/a 45,000 6,700 General terms Commercial research - research by commercial organisations or for commercial organisations with results not disclosed to public access Non-commercial research - research by not-forprofit organisations producing publishable results All licences are floating type licences and can be moved from one PC to another. SE - Standard Edition NE - Network Edition, Single workstation licence - to be used on a single workstation with a possibility to be used by multiple users Research group licence - includes up to 5 workstations used by researchers in one group, can be installed on the cluster but the number of users should be limited to 5 within one group only Institution licence - covers an unlimited number of users across different groups within an institution Site licence - covers an unlimited number of users within a company HPEM database - an extensive electron impact cross-sections database is included. Min spec: Quantemol-VT software Linux x86, 64 bit operating system, 4 GB RAM (large calculations will require more RAM), 10 GB free disk space ** - perpetual licences for academic institutions include only 5 years of HPEM licence. If intending to continue using the software academic institutions are required to purchase a support for the 6th year of licence in order to get HPEM licence extension Use Case 1 year 3 years Perpet- Noncommercial research Commercial research Type of Licence FAQ Standard Edition on single workstation can use any number of cores to be run Network Edition of single workstation licence allows you to submit jobs across the network, but user will still have to share the work space Annual support includes initial training, e-mail and telephone support, bug fixes throughout the year. Add on modules should to be purchased separately and we can advise which ones you might need Additional plasma chemistries supplied with HPEM free of charge: Ar, O 2, NF 2, Cl 2, N 2, Ar/Al, Ar/Cu, Ar/Hg, Ar/C 4 F 8 /O 2 /CO, He/N 2, C 2 F 6 Add-on module prices Licence term Single 200 400 600 Workstation Research 250 500 750 Institution 300 600 900 Single 1,500 n/a 4,000 Workstation Site 3,000 n/a 5,000 Other chemistries can be designed and provided upon request.
6 Example 1 Argon ICP. Pressure: 10 mt; applied frequency 6.78 MHz; coil antenna. Left: electron density and temperature distributions at 100 W. Right: electron energy distribution functions at 50 W (top) and 200 W (bottom) Published: A. V. Vasenkov and M. J. Kushner, Electron energy distributions and anomalous skin depth effects in high-plasmadensity inductively coupled discharges, Phys. Rev. E 66, 066411 (2002) Validation Example 2 Argon in a dc biased boundary electrode (BE) - ICP chamber (8.5 cm x 28 cm). Left: Ar + ion density at pressures: 7 mt, 14 mt, 28 mt, and 50 mt. Right: Plasma potential on axis at a fixed location in the chamber. Published: M. D. Logue, H Shin, W Zhu, L Xu, V M Donnelly, D J Economou, M J Kushner, Ion energy distributions in inductively coupled plasmas having a biased boundary electrode, Plas. Sourc. Sci. Tech., 21 (2012) 065009
7 Example 3 Etching of amorphous carbon (a-c) by PECVD with an N2/H2 gas mixture in a CCP tool (LAM 2300 Exelan Flex). Left: etch rate as a function of power (250 W to 1000W. Right: Published: K Van Laer, S Tinck, V Samara, J F de Marneffe, A Bogaerts, Etching of low-k materials for microelectronics applications by means of N2/H2 plasma: modelling and experimental investigation, Plas. Source. Sci. Tech. 22 (2013) 025011 Example 4 Synchronous pulsed plasma ICP (2 solenoid RF coils) powered at 13.56 MHz (silicon Etch Advant- Edge G5 reactor from Applied Materials, Inc.) Top: Ar, 20mT Source Pulsing 5 khz (50% & 70% duty cycles), Bottom: Ar, 5mT, Sync pulsing 50% dc Published: S. Banna et. al, Inductively Coupled Pulsed Plasmas in the Presence of Synchronous Pulsed Substrate Bias for Robust, Reliable, and Fine Conductor Etchying, IEEE Trans Plas. Sci 37 (2009) 9
8 Example 5 Silicon Etch via Cl2/O2/Ar in a TCP reactor (LAM Research 2300 Versys Kiyo) In this study: pressure 20-80 mtorr; ICP power 500-1200W @13.56 MHz; dc bias -100 to -500 V. S. Tinck, W Boullart and A Bogaerts, Investigation of etching and deposition processes of Cl2/O2/Ar inductively coupled plasmas on silicon by mesn of plasma-surface simulations and experiments, J. Phys. D: Appl. Phys. 42 (2009) 095204 Please contact us: Phone: +44 203 549 58 41 Email info@quantemol.com Address: Quantemol Ltd 8A Lancaster Drive, London, NW3 4HA