Gamma Vacuum Gamma Vacuum designs, manufactures, and services ion pumps, titanium sublimation pumps, and their controls. We have grown to be an industry leading ion pump supplier through superior quality, delivery, service and innovation. The employees of Gamma Vacuum have experience in real world vacuum applications ranging from systems manufacturing and optics assembly to TIG welding for vacuum environments. Our staff and facility are dedicated to one thing; creating the purest vacuum environments on earth. Ion Pump Features Ion pumps are used in a wide variety of high and ultra-high vacuum (UHV) environments. They are used for their capability to reach the lowest possible pressure for an economical cost. In addition, ion pumps have some technical advantages over other technologies: Vibration free operation Low maintenance Permanent gas capture Low operational cost Pressure indicator Radiation tolerance Bakeable Non-contaminating technology Long operating lifetime Customization Gamma Vacuum has a wide range of standard products on the shelf or built to order. Dedicated research and engineering staff are available for producing custom ion pumps for any application. SEM ion pumps (patent pending) Unique port configurations Custom dimensions High pressure applications Extreme high vacuum (HV) applications Legacy feedthrough adaptions INDUSTRY Industrial and Medical Processes Semiconductor Instrumentation High Energy Physics 2007 Image - Courtesy of Diamond Light Source, UK TECHNOLOGY Radar Traveling Wave Tubes (TWT) Klystrons -Ray Tube Evacuation -Ray Sources Treatment & Diagnostics Critical Dimension SEM (CD SEM) Lithography Electron Microscopes (SEM/TEM) Focused Ion Beam (FIB) Scanning Probe Microscope (SPM) Surface Analysis (AES, PS, SIMS, ED) Mass Spectrometry (MS) Molecular Beam Epitaxy (MBE) Accelerators Boosters Storage Rings Front Ends Beam Lines End Stations Free Electron Lasers (FEL) Laser Interferometers.2 3 Ion Pump Applications ION PUMP SIZE (I/S) 3 20 20 75 75 800+ Gamma Vacuum is ISO 9001:2000 registered
Ion Pump Operation TiTan Ion Pump Characteristics TiTan Pumping Elements Step 1: Create a high magnetic field Permanent magnets located outside the vacuum are used to generate a 1200 gauss magnetic field. This field is used to contain and guide electrons within circular anode rings. Step 2: Generate a cloud of electrons (plasma) High voltage is applied to the element assembly after rough pumping. Electrons are pulled into the anode tube assembly and generate a cloud of spinning electrons, commonly referred to as a plasma, and are trapped by the high magnetic field. Step 3: Ionize gas molecules Ion pumps are electro-physical vacuum pumps and remove gases from their environment by turning them into solid materials. As gases move into the anode assembly, they are struck by electrons. Electrons are removed from the gas molecules valence shell in the collision and the gas molecule now has a positive charge. This is called a positive ion. The positive ion is forced by the high voltage field at high velocity out of the anode tube towards the cathode plate. Step 4: Capture gas ions When the positive ion reaches the cathode plate, its velocity creates a physical impact called sputtering. Cathode materials are ejected towards the anode tube and the ion behaves in one of two ways: Chemical Reaction reactive gas ions react with cathode materials and form new solid compounds. For example, an ionized oxygen molecule will take an electron from and readily react with a titanium cathode atom creating a solid titanium oxide. Ion implanted within cathode plate Ion reflected as a high-energy neutral Physical Reaction heavier gas ions, like argon, impact the cathode, acquire an electron, and bounce back (reflect) towards the anode assembly. These reflected ions are called high energy neutrals because they still have enough energy to implant themselves physically in pump surfaces and stop contributing to the vacuum environment pressure. TiTan ion pump elements are tuned for specific pumping applications. Surfaces are chemically processed to remove potential surface contaminants and provide maximum adhesion for extended lifetime. Ceramics are optimally shielded to reduce exposure to sputtered material. TiTan CV (Conventional) two titanium cathodes for high pumping speed of reactive gases TiTan DI (Differential) a titanium and tantalum cathode for maintained pumping speeds of reactive gases and long term stability of noble gases TiTan 30 tantalum embedded sputter zones for stability insurance against air leaks TiTan TR classic triode element for higher pressure operation Vacuum Processing Ion pumps are shipped under vacuum at pressures less than 1x10-10 mbar. Certificates of conformance are provided and record all leak check points and pump characteristic values. RGA scans can be provided upon request. Heaters Integrated Heaters can be added to ion pumps for economical and efficient baking. Port Configurations Each ion pump can be configured with a variety of pumping port options. Additional ports are available in most designs on the top, bottom, or side and can accommodate TSP or non-evaporable getter (NEG) modules. Feedthroughs Gamma Vacuum has standardized on the 10kV SHV feedthrough since 1996. Mechanical and corrosive failures do not exist with the 10kV SHV feedthrough. For legacy purposes, alternate feedthroughs are available. Cables In addition to incorporating the SAFECONN interlock system, high voltage cables are made of flexible silicone materials that are heat resistant and have high radiation tolerance. 1.952.445.4841 info@gammavacuum.com
TiTan Ion Pumps Small Ion Pumps (mini 75S) Small ion pumps come in a wide variety of sizes and configurations. Gamma Vacuum maintains stock of the most common configurations for same day delivery. Achieving speeds up to 75 l/s, these pumps have the added advantage that they can be mounted in any orientation without additional support. SMALL ION PUMPS Mini 3S 10S 25S 45S Speed (l/s).2 2 3 8 10 15 20 DN 16 (1.33 ) DN 16 (1.33 ) SPECIFICATIONS 1.5 x 1.5 x 2.0 (38 x 38 x 51) 1.8 x 1.8 x 4.3 (45 x 45 x 108) 4.2 x 4.4 x 7.5 (107 x 113 x 190) 8.0 x 4.9 x 5.1 (202 x 125 x 130) 0.35 (0.8) 0.35 (0.8) 6 (13) 9 (20) COMPATABILITY Inlet Flange(s) Dimensions, in (mm) (h x l x w, max) Weight, kg (lbs) SPC LPCe MPCe TSP 75S 30 40 DN 63 (4.5 ) 8.2 x 9.9 x 5.1 (209 x 251 x 130) 16 (34) 40 75 DN 63 (4.5 ) DN 100 (6 ) 10.9 x 9.5 x 5.1 (277 x 242 x 130) 19 (42) Low Profile Ion Pumps (100L 800L) Low Profile ion pumps are under 12" (300 mm) in height for standard configurations. Custom built to each order, the closed magnetic loop of these pumps reduce stray magnetic field created by the pump making these pumps ideal for any type of charged particle application. LOW PROFILE ION PUMPS 100L 200L 300L 400L 400L 600L 80 100 160 200 240 300 320 400 320 400 DN 100 (6 ) 13 x 13 x 5 (325 x 325 x 128) 13 x 16 x 9 (325 x 413 x 233) 13 x 16 x 13 (325 x 413 x 337) 13 x 16 x 16 (325 x 413 x 413) 20 x 16 x 9 (508 x 413 x 233) 29 (62) 49 (108) 66 (145) 72 (159) 115 (253) 480 600 13 x 20 x 20 (325 x 513 x 513) 103 (226) Tall Profile Ion Pumps (150TV 600TV) 600L 800L 480 600 20 x 16 x 13 (508 x 413 x 336) 115 (253) Tall Profile ion pumps designed for mounting in narrow locations. These pumps are also built to order and are designed to fit into locations where a Low Profile Ion Pump may not fit. They also match competitive dimensions. TALL PROFILE 150TV 300TV 600TV 640 800 120 150 240 300 DN 150 ( 8 ) DN 100 (6 ) 20 x 16 x 16 (508 x 413 x 413) 14 x 10 x 9 (338 x 247 x 231) 14 x 18 x 9 (345 x 450 x 231) 124 (273) 32 (70) 65 (143) Lifetime All Gamma Vacuum ion pumps are designed to operate for 45,000 50,000 hours at 1x10-6 mbar. Lifetime increases linearly with decreased pressure. Ultimate Pressure Ion Pumps are capable of reaching pressures below 1x10-10 mbar. Ultimate pressure of an ion pump is dictated by overall system conditions and materials. All ion pumps are shipped at less than 1x10-10 mbar. 480 600 21 x 18 x 12 (525 x 450 x 305) 109 (243) 1.952.445.4841 info@gammavacuum.com
Digitel Ion Pump Controllers Digitel SPC Small Pump Controller Digitel Flexibility The DIGITEL line is flexible enough to control a wide variety of ion pump and TSP configurations. The LPCe and MPCe can operate up to 4 ion pumps simultaneously or independent operation of one or two ion pumps respectively. The MPCe is capable of controlling one or two TSP cartridges independently. The SPC is a versatile way to fully operate ion pumps 0.2 75 l/s. A pressure/current/voltage display along with standard serial communications makes the SPC able to accommodate the needs of basic and advanced users. Nano amp resolution provides gauging capabilities using the appropriate ion pump set-up. Digitel LPCe Large Pump Controller Ion pumps 100 l/s and over require higher currents for starting and higher pressure operation. The LPCe supplies higher currents to a dedicated single ion pump (or up to four ion pumps in parallel) and has an easy to read touchscreen LCD display that simultaneously displays pressure, current, and voltage. Standard serial communications and 8 set points allow for easy system integration. And the LPCe fits into any rack at just 3U high and 1 2 rack wide. Digitel MPCe Multiple Pump Controller Incorporating the same features as the LPC, the MPCe allows for high current control of two ion pumps independently or up to four in parallel. At 3U high and a full rack in width, the MPCe is ideally featured to operate a wide variety of ion pump configurations on any system. With remote TSP control capability, there is no need to have more than one controller for all of the UHV pumps on a system. TSP/DTSP Remote TSP Controller The remote TSP (titanium sublimation pump) controller is fully operated from the touchscreen LCD of the MPCe. A TSP filament can be fired manually or based on pressure of either ion pump the MPCe is monitoring. Timed modes also let the user have full control over the exact parameters under which a filament can be fired. A single remote TSP controller can operate up to 8 filaments in various TSP configurations. Ease of Use Each DIGITEL has a highly visible display. The SPC has an easy to ready LED that displays pressure, current or voltage. The LPCe and MPCe are each fully controlled with an intuitive touch panel LCD. Digital resolution down to 1nA is possible dependent upon pump size and current requirements. Operator Safety The integrated SAFECONN high voltage interlock system eliminates electrical shocks and false positive pressure readings. The controller automatically shuts off high voltage when the cable is disconnected from the ion pump or controller end. The system is isolated and guarantees ground, high voltage, and then safety connectivity that prevents accidental arcing. Communications Serial communications (RS232, RS422 and RS485) are standard on all DIGITEL products. MPCe and LPCe configurations also allow for optional Ethernet protocol for advanced facility and instrumentation communications. Economical Each DIGITEL has programmable analog and interlock capabilities. This allows for optimal flexibility when integrating with standard and/or legacy set-point and analog monitoring systems. 1.952.445.4841 info@gammavacuum.com
TiTan Sublimation Pumping Titanium Sublimation Pumps (TSPs) are often used in combination with ion pumps or independently to remove reactive gases from the vacuum environment. Combined with an ion pump, the TSP allows for low ultimate pressures in a shorter amount of time. All TSP components are bakeable to 400 C. TSP Filament Cartridge The filament cartridge is mounted on a 2 3/4" CFF (NW 35). The feedthrough supports three titanium-molybdenum filaments and a return path for ground isolation. Each filament contains 1.5 grams of usable titanium and averages 20 hours of operation. Liquid Cryoshroud The liquid cryoshroud consists of a double walled, type 304L stainless steel cylinder with two liquid nitrogen feedthroughs (.375" diameter) with flare type fittings. It provides 1578 cm 2 (245 in 2 ) of liquid nitrogen cooled surface area that provides pumping speeds up to 12,000 L/s for hydrogen (see table). The shroud is mounted on an 8" CFF (NW 150). Ambient Sputter Shield The ambient sputter shield economically maximizes surface area when cooling is not practical or possible. It provides 827cm 2 (128 in 2 ) of ambient temperature surface area that provides pumping speeds up to 2200 L/s for hydrogen (see table). The shield is mounted on an 8" CFF (NW 150). Typical TSP Pumping Speeds Liquid Cryoshroud Ambient Sputter Shield H 2 CO H 2 O Area (cm 2 /in 2 ) Temperature ( C) Rate (L/s/cm 2 ) Speed (L/S) Rate (L/s/cm 2 ) Speed (L/S) Rate (L/s/cm 2 ) Speed (L/S) 709/110 20 C 2.6 1,843 8.2 5,814 7.3 5,176 1578/245* -195 C 17 12,053 11 7799 14.6 23,039 827/128 20 C 2.6 2,150 8.2 6,780 7.3 6,037 * Applies to H 2 O speed only
2915 133rd Street West Shakopee, MN 55379 Phone: 952.445.4841 Toll Free: 800.237.3603 Fax: 952.445.7615 info@gammavacuum.com Creating the purest vacuum environments on Earth