Astronomical Observing Techniques 2017 Lecture 9: Silicon Eyes 1

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Transcription:

Astronomical Observing Techniques 2017 Lecture 9: Silicon Eyes 1 Christoph U. Keller keller@strw.leidenuniv.nl

Content 1. Detector Types 2. Crystal La>ces 3. Electronic Bands 4. Fermi Energy and Fermi FuncFon 5. Intrinsic Photoconductors 6. Extrinsic Photoconductors 7. Readout & OperaFons 8. Detector Noise 2

Modern Detectors Photon detectors Responds to individual photons, releases electrons, X-rays to IR Examples: photoconductors, photodiodes, photoemissive detectors Thermal detectors Absorbs photons, changes temperatures, changes resistance, IR and sub-mm detectors Examples: bolometers Coherent receivers Responds directly to electrical field and preserve phase, mainly used in the sub-mm and radio regime Examples: heterodyne receivers 3

4

Crystal LaEce crystals: periodic arrangement of atoms, ions or molecules smallest group of atoms that repeats is unit cell unit cells repeat at la>ce points crystal structure and symmetry determine many physical properfes keller@strw.leidenuniv.nl purple:na+, green: Cl- Astronomical Observing Techniques 2017, Lecture 9: Detectors 1 5

Diamond Unit Cell 6

Covalent Bond Elements with 4 e in valence shell form crystals with diamond la>ce structure (each atom bonds to four neighbors). Double-bonds between neighbours due to shared electrons 7

Diamond LaEce with 2 Elements Diamond la>ce not only formed by group IV elements (C, Si, Ge) but also by III-V semiconductors (InSb, GaAs, AlP) 8

Electronic States and Bands Single (Hydrogen) Atom Atoms in crystal WavefuncFons Ψ overlap à Energy levels of individual atoms split due to Pauli principle (avoiding the same quantum states) à MulFple spli>ng è bands keller@strw.leidenuniv.nl 9

Electron Energy Levels in Carbon en.wikipedia.org/wiki/electronic_band_structure possible energy levels of electrons in diamond la>ce Pauli exclusion principle leads to spli>ng of energy states electrons in conducfon band can move freely 10

Fermi Energy Pauli exclusion principle 2 fermions cannot occupy same quantum state; fill up unoccupied quantum states Fermi energy E F is energy of highest occupied quantum state in a system of fermions at T = 0K Fermi funcfon f(e) is probability that state of energy E is occupied at temperature T; f(e F ) = 0.5 f ( E) = 1 ( )/kt 1+ e E E F 11

Electric ConducJvity ConducFvity requires charge carriers in the conducfon band E g Metal: Fermi energy in the middle of conducfon band -> free electrons at all temperatures Insulator: large band gap and Fermi energy between bands Semiconductor: narrow band gap and Fermi energy between bands 12

Overcoming Bandgap E g Overcome bandgap E g to lik e into conducfon band: 1. external excitafon, e.g. via a photon ßphoton detector 2. thermal excitafon 3. impurifes 13

Electrons in ConducJon Band Number of occupied states in conducfon band is given by product of number possible states N c in conducfon band Fmes the probability f(e c ) that they are occupied For silicon, temperature increase of 8K doubles number of electrons in conducfon band n 0 = N c f ( E c ) N c = 2 2 m kt eff h 2 f ( E c ) = 1 1+ e E c E F 3/2 ( )/kt E c E F >>kt e ( E c E F )/kt 14

Intrinisic Photo-Conductors: Basic Principle - semi-conductor: few charge carriers à high resistance - charge carriers = electron-hole pairs - photon liks e - into conducfon band - applied electric field drives charges to electrodes 15

Photo-Current ConducFvity: j=σe Current: I=jwd V=RI, E=V/l σ=j/e=jl/v=jl/(ri) =jl/(rjwd) =1/R l/wd 1 l σ = = qn0µ n R wd d where: R d = resistance w,d,l = geometric dimensions 16

Photo-Current 1 l σ = = qn0µ n R wd d where: R d = resistance w,d,l = geo. dimensions q = elementary charge n 0 = number density of charge carriers φ = photon flux η = quantum efficiency τ = mean lifefme before recombinafon n 0 = ϕητ wdl μ n = electron mobility; drik velocity v=μ n E, current density j=n 0 qv, σ=j/e=n 0 qμ n E/E=qn 0 μ n 17

Important QuanJJes and DefiniJons # absorbed photons Quantum efficiency η = # incoming photons electrical output signal Responsivity S = input photon power Wavelength cutoff: λ = c hc E g 1.24µ m = E g [ ev ] Photo-current: I ph = qϕηg Photoconductive gain G: G = I ph τ = = qϕη τ t carrier lifetime transit time The product ηg describes the probability that an incoming photon will produce an electric charge that will reach an electrode 18

LimitaJons of Intrinsic Semiconductors long-wavelength cutoffs λ c = hc E g Germanium: 1.85μm Silicon: 1.12μm GaAs: 0.87μm difficult to create completely pure material problems to make good electrical contacts to pure Si difficult to avoid impurifes and minimize thermal noise 19

Extrinsic Semiconductors extrinsic semiconductors: charge carriers = electrons (n-type) or holes (p-type) addifon of impurifes at low concentrafon to provide excess electrons or holes much reduced bandgap -> longer wavelength cutoff Example: addilon of boron to silicon in the ralo 1:100,000 increases its conduclvity by a factor of 1000! 20

Extrinsic Semiconductor Band Gaps Ge Si Problem: absorpfon coefficients much less than for intrinsic photoconductors à low quantum efficiency à acfve volumes of pixels must be large 21

DepleJon Zone / PN JuncJon en.wikipedia.org/wiki/depletion_region juncfon between p- and n-doped Si (both are electrically neutral) e - migrate to P-side, holes migrate to N-side e - can only flow over large distances in n-type material, holes can only flow in p-type material 22

DepleJon Zone / PN JuncJon migrafng e - from N-side to P-side produces posifve donor ion on N-side; migrafng hole produces negafve acceptor ion on P- side migrafng e - recombine with holes on P-side; migrafng holes recombine with e - on N-side migrafng e - and holes, mobile charge carriers are depleted charged ions remain adjacent to interface en.wikipedia.org/wiki/depletion_region 23

Photodiodes juncfon between two oppositely doped zones 2 adjacent zones create a deplefon region 1. Photon gets absorbed e.g. in the p-type part 2. AbsorpFon creates an e -hole pair 3. The e diffuses through the material 4. Voltage drives the e across the deplefon region à photo-current 24

Charge Coupled Devices (CCDs) CCDs = array of integrafng capacitors. Pixel structure: metal gate evaporated onto SiO 2 (isolator) on silicon = MOS bias voltage V g 1. photons create free e - in the photoconductor 2. e drik toward the electrode but cannot penetrate the SiO 2 layer 3. e accumulate at the Si SiO 2 interface 4. total charge collected at interface measures number of photons during the exposure 5. à read out the number of e 25

Charge Coupled Readouts Charges are moved along columns to the edge of the array to the output amplifier here: 3 sets of electrodes à 3- phase CCD Time sequence Charge transfer (in-)efficiencies (CTEs) due to electrostafc repulsion, thermal diffusion and fringing fields 26

http://solar.physics.montana.edu/nuggets/2000/001201/ccd.png 27

Charge Transfer Efficiency (CTE) Time-dependent mechanisms that influence the CTE: 1. ElectrostaFc repulsion causes electrons to drik to the neighbouring electrode with Fme constant for charge transfer τ SI. 2. Thermal diffusion drives electrons across the storage well at τ th. 3. Fringing fields due to dependency of the well on the voltages of neighbouring electrodes (τ ff ). ApproximaFon for the CTE of a CCD with m phases: CTE = ( t /τ 1 e ) m Noise from charge transfer inefficiency: ε = (1-CTE) 28

CCD Color Sensors 1. Three exposures through 3 filters only works for fixed targets 2. Split input into 3 channels with separate filter and CCD 3. Bayer mask over CCD each subset of 4 pixels has one filtered red, one blue, and two green 29

Main Detector Noise Components G-R noise Fundamental stafsfcal noise due to the Poisson stafsfcs of the photon arrival à transferred into the stafsfcs of the generated and recombined holes and electrons Johnson or ktc noise Fundamental thermodynamic noise due to thermal mofon of charge carriers. Photo-conductor is an RC circuit where <Q 2 > = ktc 1/f noise I 2 I1/ f 2 G R I f 2 = 4q ϕηg 2 Δf 2 I J 2 Δf kt = 4 R increased noise at low frequencies, due to bad electrical contacts, temperature fluctuafons, surface effects (damage), crystal defects, and JFETs, Δf Total noise: I + I + 2 N 2 = IG R 2 J I 2 1/ f 30

BLIP and NEP OperaFonally, background-limited performance (BLIP) is always preferred: I >> I + 2 G R 2 J I 2 1/ f The noise equivalent power (NEP) is the signal power that yields an RMS S/N of unity in a system of Δf = 1 Hz: NEP G R = 2hc λ ϕ η 1/ 2 In BLIP the NEP can only be improved by increasing the quantum efficiency η as background photon noise dominates 31