Nikon NIFS Series Synthetic Silica Glass
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2 Nikon NIFS Series Synthetic Silica Glass NIFS Series DVNTGES Nikon s synthetic silica glass (SiO2) NIFS series is built around over 90 years experience in the field of optics. By combining our critical process controls and leading metrology capabilities, we offer materials which meet and exceed our customers standard requirements. With our proprietary synthesis and annealing processes, we can optimize our glass to meet our customers application requirements for homogeneity, birefringence and OH content. The NIFS series is the ideal choice for OEM, R&D and special project requirements for Semiconductor lithography, High power Nd:YG, stronomy, Medical and FPD applications. Optical grades Grade Internal transmittance [%] Sample thickness0 mm Laser durability Birefringence Striae Recommended wavelength NIFSV NIFS NIFSU NIFSS NIFSI 99.9at 93 nm 99.9at 93 nm 99.9at 248 nm 99.9at 365 nm B 0 nm/cm on request 3D Free 3D Free D Free 3D Free D Free 3D Free D Free rf excimer laser93 nm rf excimer laser93 nm excimer laser248 nm UV region, Visible region Values stated above are valid for material with a diameter of mm and a thickness of 5 00 mm. Material outside this range will be regarded as custom. Laser durability is classified into three groups,, B and, with NIFSV represents the highest grade of material available. Material available in Striae 3D Free (all directions) or in the required working direction (D Free). NIFS vailable range of homogeneity at 633 nm Homogeneity ppm NIFSV NIFS NIFSU NIFSS < 0.5 < <.5 < 2 < 3 < 4 < 5 < 0 < Not specified NIFS Transmittance range F 2 57 nm rf 93 nm 248 nm iline 365 nm gline 436 nm NIFSV NIFS NIFSU NIFSS Glass Business Unit
3 Transmittance data VUVVISIR region Internal transmittance% NIFSV NIFS, U, S Thickness:0 mm Wavelengthnm Internal transmittance% Guarantee area of NIFSV NIFS NIFSU NIFSS NIFSV NIFS Thickness:0 mm Wavelengthnm 2
4 Nikon NIFS Series Synthetic Silica Glass Properties of NIFSV (Nikon Synthetic Silica Glass) n d ν d n e ν e Optical Properties Wavelength[µm] t s r ' HeNe D d e F F' g h i rf onditions temperature22.5 humidity50 % atmospheric pressure03.25 hpa P P2 P3 P4 Q Q2 Q3 Q4 Refractive Indicies Dispersion oefficients * E E E E E E E E+0 F F' ' ΔP,t ΔP,s ΔP F,e ΔP g,f ΔP i,g P s,t P,s P d, P e,d P g,f P i,h P' s,t P' ',s P' d,' P' e,d P' g,f' P' i,h D0 D D2 ~ ~ ~ +80 Partial Dispersions bnormal Dispersions Relative Partial Dispersions onstants for bsolute n/t 8 2.2E E08.4E2 Effect of Temperature on Refractive Index bsolute Δn/ΔT [0 6 /] nm nm nm E0 E λ /µm E E0 2.35E Electrical Properties Dielectric onstant [2] Dielectric Loss ngle (2/MHz),[ ] tan δ(δ =90 φ) [2/MHz] Electrical Resistivity20 [Ωcm] Thermal Properties Expansion oefficient (+25 ~ +00) [0 6 /] (+25 ~ +200) [0 6 /] (+25 ~ +300) [0 6 /] (+25 ~ +600) [0 6 /] Thermal onductivity (32)[W/mK] Specific Heat apacity [J/gK] Thermal Diffusivity [0 7 m 2 /sec] Mechanical Properties Young's Modulus Poisson's Ratio Knoop Hardness brasion Hardness Shear Modulus ompressive Strength Mohs Hardness Bending Strength 93 nm Specific Gravity 2.20 OH Li Na K Mg a < 00 ppm l Ti r Fe u [kgf/mm 2 ] [0 2 /Pa] [0 2 /Pa] εr φ E μ HK G β hemical Properties limatic Resistance R(S) [lass] 4 cid Resistance by Surface Method R(S) [lass] cid Resistance by Powder Method R(P) [lass] 5 Phosphate Resistance PR(S) [lass] 6 Impurities α λ c κ E4 >E Glass Business Unit
5 Properties of NIFS (Nikon Synthetic Silica Glass) n d ν d n e ν e Optical Properties Wavelength[µm] t s r ' HeNe D d e F F' g h i rf onditions temperature22.5 humidity50 % atmospheric pressure03.25 hpa P P2 P3 P4 Q Q2 Q3 Q4 Refractive Indicies Dispersion oefficients * E E E E E E E E+0 F F' ' ΔP,t ΔP,s ΔP F,e ΔP g,f ΔP i,g P s,t P,s P d, P e,d P g,f P i,h P' s,t P' ',s P' d,' P' e,d P' g,f' P' i,h D0 D D2 ~ ~ ~ +80 Partial Dispersions bnormal Dispersions Relative Partial Dispersions onstants for bsolute n/t 8 2.5E E E3 Effect of Temperature on Refractive Index bsolute Δn/ΔT [0 6 /] nm nm nm E0 E λ /µm E E0.84E Electrical Properties Dielectric onstant [2] Dielectric Loss ngle (2/MHz),[ ] tan δ(δ =90 φ) [2/MHz] Electrical Resistivity (20) [Ωcm] Thermal Properties Softening Point (logη = 7.6) nnealing Point (logη = 3.0) Strain Point (logη = 4.5) Expansion oefficient (+25 ~ +00) [0 6 /] (+25 ~ +200) [0 6 /] (+25 ~ +300) [0 6 /] (+25 ~ +600) [0 6 /] Thermal onductivity (32) [W/mK] Specific Heat apacity Thermal Diffusivity [J/gK] [0 7 m 2 /sec] Mechanical Properties Young's Modulus Poisson's Ratio Knoop Hardness brasion Hardness Shear Modulus ompressive Strength Mohs Hardness Bending Strength 93 nm hemical Properties Specific Gravity 2.20 OH Li Na K Mg a < 200 ppm l Ti r Fe u [kgf/mm 2 ] [0 2 /Pa] [0 2 /Pa] εr φ E μ HK G β limatic Resistance R(S) [lass] 4 cid Resistance by Surface Method R(S) [lass] cid Resistance by Powder Method R(P) [lass] 5 Phosphate Resistance PR(S) [lass] 6 Impurities [] [] [] E4 >E+6 α λ c κ
6 Nikon NIFS Series Synthetic Silica Glass Properties of NIFSU (Nikon Synthetic Silica Glass) n d ν d n e ν e Optical Properties Wavelength[µm] t s r ' HeNe D d e F F' g h i rf onditions temperature22.5 humidity50 % atmospheric pressure03.25 hpa P P2 P3 P4 Q Q2 Q3 Q4 Refractive Indicies Dispersion oefficients * E E E E E E E E+0 F F' ' ΔP,t ΔP,s ΔP F,e ΔP g,f ΔP i,g P s,t P,s P d, P e,d P g,f P i,h P' s,t P' ',s P' d,' P' e,d P' g,f' P' i,h D0 D D2 ~ ~ ~ +80 Partial Dispersions bnormal Dispersions Relative Partial Dispersions onstants for bsolute n/t 8 2.5E E E3 Effect of Temperature on Refractive Index bsolute Δn/ΔT [0 6 /] nm nm nm E0 E λ /µm E E0.84E Electrical Properties Dielectric onstant [2] Dielectric Loss ngle (2/MHz),[ ] tan δ(δ =90 φ) [2/MHz] Electrical Resistivity (20) [Ωcm] Thermal Properties Softening Point (logη = 7.6) [] nnealing Point (logη = 3.0) [] Strain Point (logη = 4.5) [] Expansion oefficient (+25 ~ +00) [0 6 /] (+25 ~ +200) [0 6 /] (+25 ~ +300) [0 6 /] (+25 ~ +600) [0 6 /] Thermal onductivity (32) [W/mK] Specific Heat apacity [J/gK] Thermal Diffusivity [0 7 m 2 /sec] Mechanical Properties Young's Modulus Poisson's Ratio Knoop Hardness [kgf/mm 2 ]2 brasion Hardness 3 Shear Modulus ompressive Strength Mohs Hardness Bending Strength 9 [0 2 /Pa] 93 nm [0 2 /Pa] hemical Properties limatic Resistance R(S) [lass] 4 cid Resistance by Surface Method + R(S) [lass] cid Resistance by Powder Method R(P) [lass] 5 Phosphate Resistance PR(S) [lass] 6 Specific Gravity 2.20 Impurities OH Li Na K Mg a < 200 ppm l Ti r Fe u εr φ E μ HK G β E4 >E+6 α λ c κ Glass Business Unit
7 Properties of NIFSS (Nikon Synthetic Silica Glass) n d ν d n e ν e Optical Properties Wavelength[µm] t s r ' HeNe D d e F F' g h i rf onditions temperature22.5 humidity50 % atmospheric pressure03.25 hpa P P2 P3 P4 Q Q2 Q3 Q4 Refractive Indicies Dispersion oefficients * E E E E E E E E+0 F F' ' ΔP,t ΔP,s ΔP F,e ΔP g,f ΔP i,g P s,t P,s P d, P e,d P g,f P i,h P' s,t P' ',s P' d,' P' e,d P' g,f' P' i,h D0 D D2 ~ ~ ~ +80 Partial Dispersions bnormal Dispersions Relative Partial Dispersions onstants for bsolute n/t 8 2.5E E E3 Effect of Temperature on Refractive Index bsolute Δn/ΔT [0 6 /] nm nm nm E0 E λ /µm E E0.84E Electrical Properties Dielectric onstant [2] Dielectric Loss ngle (2/MHz),[ ] tan δ(δ =90 φ) [2/MHz] Electrical Resistivity (20) [Ωcm] Thermal Properties Softening Point (logη = 7.6) nnealing Point (logη = 3.0) Strain Point (logη = 4.5) Expansion oefficient (+25 ~ +00) [0 6 /] (+25 ~ +200) [0 6 /] (+25 ~ +300) [0 6 /] (+25 ~ +600) [0 6 /] Thermal onductivity (32) [W/mK] Specific Heat apacity Thermal Diffusivity [J/gK] [0 7 m 2 /sec] Mechanical Properties Young's Modulus Poisson's Ratio Knoop Hardness [kgf/mm 2 ]2 brasion Hardness 3 Shear Modulus ompressive Strength Mohs Hardness Bending Strength 9 [0 2 /Pa] 93 nm [0 2 /Pa] Specific Gravity 2.20 OH Li Na K Mg a < 200 ppm < 00 ppb < 00 ppb < 00 ppb < 00 ppb < 00 ppb [] [] [] l Ti r Fe u εr φ E μ HK G β hemical Properties limatic Resistance R(S) [lass] 4 cid Resistance by Surface Method R(S) [lass] cid Resistance by Powder Method R(P) [lass] 5 Phosphate Resistance PR(S) [lass] 6 Impurities E4 >E+6 < 00 ppb < 00 ppb < 00 ppb < 00 ppb < 00 ppb α λ c κ
8 N.B. Export of the products* in this catalog is controlled under the Japanese Foreign Exchange and Foreign Trade Law. ppropriate export procedure shall be required in case of export from Japan. *Products: Hardware and its technical information (including software) Glass Business Unit Shinagawa Intercity Tower, 253, Konan, Minatoku, Tokyo , Japan Tel FX
Nikon Synthetic Silica Glass Si02
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