Supporting Information. Decoupling of CVD Graphene by controlled Oxidation of Recrystallized Cu. Taiwan.

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1 Supporting Information Decoupling of CVD Graphene by controlled Oxidation of Recrystallized Cu Ang-Yu Lu,, Sung-Yen Wei, Chih-Yu Wu, Yenny Hernandez, Tzu-Yin Chen, Te-Huan Liu, Chun- Wei Pao, Fu-Rong Chen, Lain-Jong Li * and Zhen-Yu Juang, * Research Center for Applied Sciences, Academia Sinica, Taipei 11529, Taiwan. Department of Engineering and System Science, National Tsing Hua University, Hsinchu 30013, Taiwan. Max Planck Institute for Polymer Research, Ackermannweg 10, 55128 Mainz, Germany. * To whom correspondence should be addressed, (Z. Y. Juang) juang@ess.nthu.edu.tw and (L. J. Li) lanceli@gate.sinica.edu.tw

2 S1: Molecular Dynamics Simulations MD simulations were carried out using the Lammps MD package. 1 The C-C interaction, C-Cu interaction, and Cu-Cu interactions were described by AIREBO, 2 Lennard-Jones, 3 and EAM 4 potentials, respectively. The system was monolayered graphene on thick (or bulk) Cu(111) or Cu(001). The work of adhesion was computed through the formula Γ = E graphene + E Cu - E graphene+cu, where E graphene+cu, E graphene and E Cu are the potential energies of Cu surface covered with graphene, stand-alone graphene and stand-alone Cu surface, respectively. Figure S1 Figure S1a and S1b display the top view of the monolayer graphene on bulk Cu(111) and Cu(001) from molecular dynamics (MD) simulations. The work of adhesion Γ of each interface from MD simulations is shown at the bottom of each figure. We conclude that graphene on Cu(111) is thermodynamically more stable due to a larger Γ compared with the graphene on Cu(001). Thus, Cu(111) is a preferred orientation in slow cooling process, as discussed in text. The observation of Cu(001) indicates that the Cu(001) resulted from fast cooling process is kinetically determined. We suspect that the presence of graphene may provide easy heterogeneous nucleation sites for Cu(001).

3 S2: Cu coating on inner surface of quartz tube Figure S2 At process temperatures of CVD ~ 1000 C, the inner surface of quartz tube near low-temperature zone of the furnace is coated by a thin Cu film after processing. This phenomenon corroborates that Cu is vaporized at this temperature, and implies that graphene growth occurs at a semi-molten state of the Cu substrate. S3: EBSD result of CVD-grown graphene/cu sample with slow-cooling process using highpurity Cu foil as substrate Figure S3 As discussed in the main text, high purity Cu has a higher melting point that Cu foils which suggest that process temperatures ~1000 C its crystal structure remains unchanged therefore recrystallization does not occur under cooling.

4 S4: EBSD/Raman mapping of slow-cooled sample Figure S4

5 S5: Reported Raman data for identifying decoupled, on SiO 2 and suspended SLG. Table S1. A review of Raman features of micromechanically exfoliated SLG Exfoliation SLG Laser energy Substrate for Raman FWHM of 2D (cm - I (ev) measurement 2D /I G ) Ref. 2.33 ev Suspended 6.21 24.8 30.5 SiO 2 2.16 27.7 37.1 5 1.96 ev SiO 2 2 4.62 22.4 28.9 6 2.41 ev Suspended 4 32 7 2.41 ev SiO 2 2 2.75 28 8 2.41 ev SiO 2 na 28 9 2.33 ev SiO 2 3.4 4.5 30 10 2.41 ev SiO 2 2.9 3.1 27 29 11 Table S2. A review of Raman features of CVD-grown SLG CVD-grown SLG Laser energy Substrate for Raman FWHM of 2D (cm - I (ev) measurement 2D /I G ) Ref. 1.96 ev SiO 2 2.92 32.2 6 2.33 ev Suspended 3.52 35 12 2.33 ev SiO 2 2 33 13 2.33 ev SiO 2 3.77 3.8 32 14 2.41 ev SiO 2 2 37 38 15 2.41 ev SiO 2 4 30 16 1.96 ev SiO 2 2.6 35 17 2.33 ev Suspended 2.8 4.2 25 35 18 2.33 ev Ni 0.5 1 30 40 SiO 2 5.6 35 19 2.33 ev SiO 2 2 5 35 20 na na 2.9 44 21 Based on the results in Table S1 and Table S2, we can set a convenient criterion for identification of SLG, that is, I 2D /I G 2 and FWHM of 2D = 25 35 cm -1. In the case of I 2D /I G < 2 and FWHM of 2D > 35 cm -1 in ref. 15 and ref. 17, most probably the number n of graphene layers is 2. Another possibility is that external factors influence the Raman features of SLG making it look like n 2 with FWHM of 2D > 35 cm -1, for example, in the case of strong interacting CVD graphene on metal substrates. In the case of CVD-grown graphene, regardless the surface precipitation (on Ni) or growth mechanism (on Cu), one has no reason to believe that the interaction between metal substrates and asgrown graphene could be neglected. Thus another criterion for identification of as-grown SLG on metal

6 surface is needed. From the Raman spectra of as-grown graphene in Figure 3, a suggested criterion for coupled SLG on Cu could be that FWHM of 2D = 40-50 cm -1 and I 2D /I G = 1 2. Since the lattice orientation of Cu could be probed locally by EBSD in our study, the criterion for as-grown SLG on different Cu lattices such Cu(111) and Cu(100) could be realized in detail as shown in Table 1. Note that the band-shifts of G and 2D are not shown in Table 1 as the position of these features does not influence the identification of SLG. S6: Raman results from Cu/SiO 2 substrate and cold-walled CVD system Figure S5 We also use the Cu thin film (300 nm) coated SiO 2 /Si substrate and another cold-walled CVD system (Black Magic II, AIXTRON) to reconfirm the decoupling effect. The results are similar to that reported by Ismach, et al. 14 We took Raman spectra of 9 different positions (A1-3, B1-3 and C1-3) from 3 asgrown graphene samples (sample A, B and C). After 7 days exposure in air with controlled moisture for oxidation, another 9 Raman spectra were taken at the same positions as shown as spectra in Figure S5 with *. The result clearly reveals the decoupling effect is universal, and has nothing to do with types of Cu (thin film or foil) and CVD (cold-walled or hot-walled).

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