Soft X - Ray Optics: Fundamentals and Applications University of California, Berkeley and Center for X-Ray Optics Lawrence Berkeley National Laboratory 1
The Short Wavelength Region of the Electromagnetic Spectrum (1.1) 2
Available Optical Techniques for Soft X-Rays and EUV 3
Scattering and Refractive Index 4
Glancing Incidence Optics 5
A High Quality Mo/Si Multilayer Mirror N = 40 d = 6.7 Courtesy of Sasa Bajt (LLNL) ˇ 6
Multilayer Mirrors Satisfy the Bragg Condition 7
High Reflectivity, Thermally and Environmentally Robust Multilayers Coatings for High Throughput EUV Lithography 8
Recent Progress in Multilayer Mirrors Peak reflectance (%) 80 70 60 50 40 30 20 10 Near-Normal Incidence Multilayer Mirrors Sc Ti V C H 2 O window Si Au 0 1 10 Wavelength (nm) 9
Extreme Ultraviolet Telescope 10
EUV Image of the Solar Corona Showing Loops Near the Solar Limb http://vestige.imsal.com/trace Courtesy of L. Golub, Harvard-Smithsonian and T. Barbee, LLNL. 11 λ = 17.3 nm (71.7 ev)
Fluorescent Microprobe Based on Crossed Cylinders 12
Diffractive Optics for Soft X-Rays and EUV Zone Plates Gratings Pinholes 13
A Fresnel Zone Plate Lens 14
A Fresnel Zone Plate Lens Used as a Diffractive Lens for Point to Point Imaging 15
Zone Plates for Soft X-Ray Image Formation 16
A Fresnel Zone Plate Lens Used for X-Ray Microscopy Courtesy of E. Anderson (LBNL) 17
Soft X-Ray Microscopy at the ALS E. Anderson, LBNL 18
High Resolution Zone-Plate Microscope XM-1 at the ALS Well engineered Sample indexing Tiling for larger field of view Pre-focused High sample throughput Illumination important Phase contrast 19
Applications of Soft X-Ray Microscopy Magnetic Recording Materials Cryo Microscopy for the Life Sciences Cell border 100 nm lines & spaces Nucleoli Cell border 1 µm Nucleus Fe L 3 @ 707.5 ev FeTbCo Multilayer with Al Capping Layer Cryo X-Ray Microscopy of 3T3 Fibroblast Cells Protein Labeled Microtubule Network Courtesy of P. Fischer (Max Planck) and G. Denbeaux (CXRO/LBNL) Courtesy of C. Larabell (UCSF) and W. Meyer-Ilse (CXRO/LBNL) 20
Magnetic Domains Imaged at Different Photons Energies 1 µm FeGd Multilayer Contrast reversal hω = 704 ev below Fe L-edges hω = 707.5 ev Fe L 3 -edge hω = 720.5 ev Fe L 2 -edge P. Fischer, T. Eimueller, M. Koehler (U. Wuerzberg) S. Tsunashima (U. Nagoya) and N. Tagaki (Sanyo) G. Denbeaux, L. Johnson, A. Pearson (CXRO-LBNL) 21
Bio-Nanotomography for 3D Imaging of Cells Nanotomography of Cryogenic Fixed Cells Soft X-Ray Nanotomography of a Yeast Cell QuickTime and a decompressor are needed to see this picture. Courtesy of G. Schneider (BESSY) Surf. Rev. Lett. 9, 177 (2002) 22 λ = 2.5 nm Courtesy of C. Larabell (UCSF & LBNL) and M. LeGros (LBNL)
Bio-Nanotomography for 3D Imaging of Cells Nanotomography of Cryogenic Fixed Cells Soft X-Ray Nanotomography of a Yeast Cell QuickTime and a decompressor are needed to see this picture. C. Larabell and M. LeGros, Molec. Bio. Cell 15, 957 (2004) λ = 2.5 nm 23
Extreme Ultraviolet (EUV) Lithography Based on Multilayer Coated Optics 24
The Engineering Test Stand (ETS): A Pre-Manufacturing EUV Stepper Mask stage Projection optics Wafer stage Collection optic EUV Plasma source Condenser optics 25
ETS Optics Meet Tight Specifications Condenser optic Projection optic Courtesy of D. Sweeney (LLNL) 26
A 0.30 NA Micro-Exposure Tool (MET) has been Fabricated by Zeiss and LLNL Mask Illumination MET NA = 0.30 13.4 nm 5X 200 X 600 µm field Fold Flat Secondary Button Bipod 35 nm Primary Wafer Bipods Courtesy of J. Taylor (LLNL) Courtesy of Patrick Naulleau (LBNL) 27
Intel EUV Intel MET Installation EUV MET Installation 16 crates 17+ tons 15 pumps All for.... Jeanette Roberts 28 SPIE March 1, 2005
International Technology Roadmap for Semiconductors* 29
Possible Compact Sources for Soft X-Ray Microscopy and EUV Metrologies Laser produced plasmas [Berglund et al., J.Microscopy 197, 268 (2000)] Electrical discharge plasmas (www.energetiq.com) EUV lasers [Vaschenko et al., Opt. Lett. 30, 2095 (2005)] EUV High Harmonic Generation [Kapteyn et al., Phys. Today 58 (March 2005)] 30
Lectures Available Over the Web Free UC Berkeley Webcast www.coe.berkeley.edu/ast/sxreuv AST 210 / EECS 213 (offered Fall 2005, starts Aug. 30, 2 pm PDT, live over internet plus archived) 31