Study on Semiconductor Lasers of Circular Structures Fabricated by EB Lithography

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Study on Semiconductor Lasers of Circular Structures Fabricated by EB Lithography Ashim Kumar Saha (D3) Supervisor: Prof. Toshiaki Suhara Doctoral Thesis Defense Quantum Engineering Design Course Graduate School of Engineering, Osaka University

Semiconductor lasers of circular geometry have many potential advantages for applications including laser display, printers, optical interconnects, sensing and THz wave generation. gratings are stitched together with sectors [1] 2D array formation beam shaping function Circular-Grating-Coupled Surface Emitting Lasers [1] S. Kristjansson, M. Li, N. Eriksson, M. Hagberg, K.-J. Killius, and A. Larsson, IEEE Photon. Technol. Lett., vol. 9, p. 416, 1997.

Laser with MMI coupler [3] Ring laser with directional coupler [2] Monolithic dual-wavelength diode lasers [4] Application for THz wave generation [2] M. Osiński, H. Cao, C. Liu, and P. G. Eliseev, J. Cryst. Growth, vol. 288, no. 1, pp. 144 147, Feb. 2006. [3] S. Matsuo and T. Segawa, IEEE J. Sel. Top. Quantum Electron., vol. 15, no. 3, pp. 545 554, 2009. [4] M. Uemukai, H. Ishida, A. Ito, T. Suhara, H. Kitajima, A. Watanabe, and H. Kan, Jpn. J. Appl. Phys., 51, 020205 (2012).

Continuous circular scanning of e-beam y y x EB EB writing by Circular scanning field size 80µm 80µm field size 500µm 500µm Conventional EB writing of circular grating Circular gratings of fine groove (<100 nm) over large area (~500 µm) EB writing of circular grating by ELS3700S

My research subjects are the study of integrated semiconductor lasers having circular geometry, aiming to the application for beam shaping function and THz wave generation. CGCSEL with focusing function Single mode RFP Laser Two-wavelength RFP Laser In my thesis work, I demonstrate the design, fabrication and experimental results of those lasers.

InGaAs based CGCSEL which emits light at 980 nm wavelength was designed, fabricated and evaluated. I designed the DBR and GC by Coupled Mode Theory Beam shaping for particle trapping Focus Circular DBR Circular GC Multiple spot formation Active region InGaAs SQW

3 rd order coupling coefficient κ 3 was calculated by: = 2π n a k 0 κ 3 = k 0 2N eff Δε 3 g+d g E y x 2 dx E y x 2 dx Δε 3 = n g 2 n a 2 sin 3aπ 3π 3 is the amplitude of 3 rd order Fourier component. n k 0 Wave vector diagram of 3 rd order DBR

Applying phase matching condition, period Λ r of the 1 st order grating coupler with focusing function can be written as: N eff k 0 + n a k 0 sinθ r = (r) 2π N eff λ + 2π 2π sinθ r = λ Λ r Λ r = n a k 0 r λ r 2 +f 2 +N eff f Focus Radiation into air θ(r) = N eff k 0 Chirped GC θ r r ra n r Wave vector diagram of 1 st order grating coupler x r

Coupling coefficient 3 and total decay factor 1 + 2 [cm -1 ] Decay factors air and sub [cm -1 ] Power distribution ratio P air [%] based on the Coupled Mode Theory and Transfer Matrix Method P air = air /( air + sub + abs ) 300 200 Third-order DBR Duty ratio = 0.75 3 =159 cm -1 120 80 First-order GC Duty ratio = 0.5 P air =54% 60 40 air = 88 cm -1 100 1 + 2 = 0.02 cm -1 40 20 sub = 36 cm -1 0 0 0 0 50 100 150 200 0 50 100 150 200 Groove depth d [nm] Groove depth d [nm] Dependence of third-order coupling coefficient 3 and total radiation decay factor 1 + 2 on the DBR groove depth. Dependence of air, sub and P air on the GC groove depth calculated by assuming abs = 40 cm -1.

Formation of circular active region I have written a computer program to control the electron beam writing system with circular scanning mode.

DBR and grating coupler fabrication y Circular DBR and GC were fabricated by electron beam lithography employing the smooth circular scanning and two step RIE. x EB writing by Circular scanning Circular scanning 1 2 3 4 5 p-side and n-side electrode formation

Fabricated CGCSEL DBR and GC gratings of almost uniform duty ratios were fabricated. DBR Active region GC 100 µm Third-order DBR 457.8 nm 170 nm First-order GC Optical microscopic image of the fabricated CGCSEL. SEM images of the DBR and the chirped GC. Inset is the cross sectional view of the DBR.

Peak Power [ W] Intensity [arb.unit] Lasing Characteristic of the CGCSEL Single mode lasing was accomplished. 300 200 100 at 23 C 1.2 275 µw 978.3 nm 1.0 0.8 0.6 0.4 I th = 80 ma 0 0 50 100 150 Injection Current [ma] P-I characteristic of the CGCSEL 0.2 0.0 970 975 980 985 990 Wavelength [nm] lasing spectrum measured at 115mA

Lateral 0 Focusing Function Intensity variation comparable to a cos 2 dependence corresponding to lasing in TE 1 mode. 500 µm Image plane z= 0 mm z= 1.5 mm 250 200 150 100 65µm 50 vertical 0 50 100 150 200 250 z= 3.0 mm z= 4.5 mm Emission patterns at different distances z from the laser surface at an injection current of 140 ma 0 100 200 300 400 500 600 um 0 100 200 300 400 500 600 um 95µm

3. Theoretical Analysis and Design of Ring/Fabry- Perot Composite Cavity Lasers Simple fabrication because it does not require narrow gaps or deep etching Useful for of THz wave generation

Ring cavity: f Rm = c 2πRn Re m, Δf R = c 2πRn Reg FP cavity: f Fm = c 2Ln Fe m, Δf F = c 2Ln Feg n Re (n Reg ), n Fe (n Feg ): effective (effective group) refractive indices m, m : mode numbers for the ring and FP cavities

Composite cavity ring/fp laser with active ring and FP section Complex round trip gain =1 C ηe jβ2πr r A r B 1 Ce jβ2πr 2 e j2βl = 1 G R = gπr G L = gl β = β + j g : complex propagation constant 2 : intensity gain factor η = CC + SS r A r B C + ηg R e jβ2πr 1 CG R e jβ2πr 2 G L e jβ2l = 1 (1)

Assuming n Re = n Fe = n e and n Reg = n Feg = n eg Phase condition: 2 arg C + ηg R e jδβ2πr 1 CG R e jδβ2πr 2 β Rm + δβ L = 2Mπ 2 Amplitude condition: r A r B Δω R = Rneg ω Rm 1 ω Rm ω Rm+1 ω ω Putting β = n e = β c Rm + δβ = β Rm + n eg δω in (1) c M : is the composite mode number ηg R C 2 + 4C ηg R sin 2 (δβπr) 1 CG R 2 + 4CG R sin 2 (δβπr) G L = 1 (3) δω ω = ω Rm + δω

Case I: ω Fm 1 ω Fm ω Fm +1 FP modes ω ω Rm = ω Fm ω Rm 1 ω Rm ω Rm+1 Ring modes Phase condition is satisfied by ω = ω Rm = ω FPm. Hence the composite cavity mode is at this frequency. ω Amplitude Condition: r A r B ηe gπr C 1 Ce gπr 2 e gl = 1 Composite mode can lase only if G R C < 1 r A r B C 2 G L < 1 LHS of AC 1 r A r B 0 th G R = 1/C

Δω Case II: ω Rm ω Fm FP modes ω Fm 1 ω Fm ω Fm +1 ω Δω Δω R Δω F Phase condition: 2 arg C + ηg R e jδβ2πr 1 CG R e jδβ2πr 2 δβ Δβ L = 2 M m π For C < G R < 1 C, δβ2πr 1 and M = m, we have δβ = Ring modes Δβ G 1 + R SS 2πR (ηg R C )(1 CG R )L ω Rm 1 ω Rm ω Rm+1 ω = ω Rm + δω ω Since, 0 < δβ Δβ < 1 hence 0 < δω Δω < 1, the composite cavity mode frequency ω is between the FP mode and ring mode i.e., ω Rm < ω CCM < ω Fm or ω Fm < ω CCM < ω Rm.

Case II: ω Rm ω Fm, Δω Δω R Δω F Amplitude condition: r A r B ηe gπr C 2 + 4C ηe gπr sin 2 (δβπr) 1 Ce gπr 2 + 4Ce gπr sin 2 (δβπr) egl = 1 1 LHS of AC δβπr = 0 Increasing δβπr r A r B Ring mode lasing 0 th G R = 1/C

For the case of 2R<L<πR, f F > f R and common electrode for current injection Δf F f f Fm f Fm +1 f Fm +2 f Fm 1 Fm +3 f Fm +4 FP modes f Δf R f Rm 1 Ring modes f Rm f Rm+1 f Rm+2 f Rm+3 f Rm+4 f Rm+5 f Rm+6 f Δf CC Δf FΔf R Δf F Δf R

With separate electrodes for current injection

With separate electrodes for current injection If the injection current to the ring section is increased

With separate electrodes for current injection If the injection current to the ring section is increased more

GaAs 0.86 P 0.14 tensile strained singlequantum-well (SQW) in a separate confinement heterostructure (SCH) with Ga 0.51 In 0.49 P guiding layers. Using by effective index method, ridge width and height were determined. b vs R was calculated by the beam propagation method (BPM). ridge structure R=400 µm was determined, and L=950 µm was selected as to satisfy 2R<L<πR.

4. Single-Mode RFP Composite Cavity Lasers Novel device structure Simple fabrication process Stable single mode operation

The designed RFP laser was fabricated by using a GaAsP SQW epitaxial structure. 1.45µm Ridge formation by electron beam (EB) lithography and reactive ion etching (RIE). GaAs substrate p-side and n-side electrode formation. Planarization of entire sample by BCB layer.

Fabricated Single mode RFP Laser Fabricated waveguide has smooth and almost vertical side wall. 3µm 800 µm 20µm 950 µm Optical microscopic image SEM images

Output Power P [mw] Intensity [arb.unit] Relative Intensity [db] FP laser SMSR > 25 db RFP laser Lasing Characteristic 12 10 8 6 4 2 8 4 0 8 4 0 8 4 0 8 4 0 0.10 0.05 I=300 ma I=250 ma I=200 ma I=180 ma I=150 ma 0.00 798 800 802 804 Wavelength [nm] 0 0 50 100 150 200 250 Injection Current I [ma] 20 C Threshold current I th = 140mA P-I characteristic of the RFP laser P max -40 798 800 802 804 lasing spectra of FP and RFP lasers Single mode operation of the RFP laser was achieved with a side mode suppression ratio (SMSR) greater than 25 db. 0-10 -20-30 @I=2I th Wavelength [nm]

Relative Intensity [db] Lasing Peak Wavelength [nm] Temperature Dependence Lasing spectra showed the shift of the peak towards longer wavelength region similar to the gain peak shift. 0 I= 300 ma 22 C 24 C 18 C 19 C 20 C 21 C 23 C 25 C 810 808 Peak Wavelength Linear Fit d dt=0.23 nm/ C -10 806-20 804-30 803 804 805 806 Wavelength [nm] lasing spectra of the RFP laser 802 800 18 20 22 24 26 Temperature [ C] temperature dependence of lasing wavelength

5. Two-Wavelength RFP Composite Cavity Lasers Simple fabrication process Useful for THz wave generation Wavelength tunable lasing

RFP Laser with Separate Electrodes (a) (c) 2R=790 µm L=1090 µm 3.0 µm Ridge height 1.55 µm (b) Optical microscopic and SEM images

P [mw] P [mw] Lasing Characteristic I R P I F 12 8 I R =0 ma I R =25 ma I R =50 ma I R =75 ma I R =100 ma 20 C CW operation 4 3 I F =0 ma I F =25 ma I F =50 ma I F =75 ma 20 C CW operation 2 4 1 0 0 50 100 150 200 I F [ma] 0 0 50 100 150 200 250 300 I R [ma] P-I characteristic of the RFP laser

Normalized Intensity [arb.unit] Obtained Two-wavelength Lasing Spectra Currents were injected to both of the ring and straight waveguides. I R was increased slowly and carefully observing the lasing spectrum. Accomplished two-wavelength lasing with discrete sets of separations. I R I F P 1.0 I F =150 ma I R =84 ma 3.7 nm 0.5 (d) 0.0 1.0 1.0 nm I F =120 ma I R =100 ma 0.5 (c) 0.0 1.0 I F =110 ma I R =163 ma 1.8 nm 0.5 (b) 0.0 1.0 I F =100 ma I R =163 ma 4.3 nm 0.5 (a) 0.0 796 798 800 802 804 806 808 Wavelength [nm] Two-wavelength lasing spectra

Lasing performances Table I: Summary of driving conditions and obtained twowavelength lasing performances. Injection currents I F, I R [ma] Obtained twowavelength lasing 1, 2 [nm] Wavelength separation 2-1 [nm] Total output power [mw] Power difference [mw] Beat frequency f 1 -f 2 [THz] 100, 163 801.7, 806.0 4.3( 7 CC ) 3.34 0.11 2.00 110, 163 803.3, 805.1 1.8( 3 CC ) 4.39 0.0 0.83 120, 100 798.7, 799.7 1.0( 2 CC ) 4.46 0.0 0.47 150, 84 801.7, 805.4 3.7( 6 CC ) 7.50 0.16 1.72 For this Laser, CC = ( 2 /c) f CC 0.59 nm calculated by using n Reg = n Feg = 3.624 for the effective group refractive indices.

6. Conclusions Stitching error free CGCSEL was fabricated by EB lithography employing smooth circular scanning. Single-mode-like lasing was accomplished and the focusing function was confirmed. Idea of a novel all-active circular ring / FP composite cavity semiconductor laser was presented. Analysis of lasing threshold and selection of lasing modes were also presented. An RFP laser with common p-electrode was fabricated. Stable single longitudinal mode operation was accomplished. RFP laser with separate p-electrodes was also fabricated. Twowavelength lasing with discrete sets of separations were accomplished. For the first time, I was able to fabricate the stitching error free circular gratings for such a large size device. This unique fabrication technique would further accelerate the research on this type of lasers. I also accomplished the two-wavelength lasing with almost equal powers from a single RFP laser for the first time. This device could be a promising candidate for the source of THz wave generation by photomixing process.

List of publications Journal Papers [1] A. K. Saha, M. Uemukai and T. Suhara, InGaAs circular-grating-coupled surface emitting laser with focusing function fabricated by electron-beam writing with circular scanning, Optical Review, vol. 21, no. 3, pp.206-209, June 2014. [2] A. K. Saha, M. Uemukai and T. Suhara, Single-mode operation of GaAsP ring / Fabry-Perot composite cavity semiconductor lasers, Jpn. J. Appl. Phys., vol. 54, no. 6, 060302, 2015. [3] A. K. Saha and T. Suhara, Two-wavelength lasing of ring / Fabry-Perot composite cavity semiconductor laser with two separate electrodes, Jpn. J. Appl. Phys., vol. 54, no. 7, 070307, 2015. Conference Presentations [1] A. K. Saha, T. Sumitani, M. Uemukai and T. Suhara, Design and Fabrication of InGaAs Quantum Well Circular-Grating-Coupled Surface Emitting Laser, The 60 th Japan Society of Applied Physics (JSAP) Spring Meeting, 29a-B4-9 (2013-03). [2] A. K. Saha, T. Sumitani, M. Uemukai and T. Suhara, Lasing Characteristic of InGaAs Circular- Grating-Coupled Surface Emitting Laser with Focusing Function, The 61 th Japan Society of Applied Physics (JSAP) Spring Meeting, 18p-F9-13 (2014-03). [3] A. K. Saha, M. Uemukai and T. Suhara, Single-Mode Operation of GaAsP Ring/Fabry-Perot Composite Cavity Semiconductor Lasers, Institute of Electronics, Information and Communication Engineers (IEICE) Technical Report, vol. 114, no. 432, LQE2014-176, pp. 237-240, (2015-01). [4] A. K. Saha and T. Suhara, Demonstration of Two-Wavelength Lasing in a GaAsP Ring/Fabry-Perot Composite Cavity Semiconductor Laser, submitted for presentation in 2015 International Conference on Solid State Devices and Materials (SSDM 2015), (Sapporo, Hokkaido, Japan).

Thank you very much for your kind attention.