Lecture 5-8 Instrumentation

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Transcription:

Lecture 5-8 Instrumentation

Requirements 1. Vacuum Mean Free Path Contamination Sticking probability UHV Materials Strength Stability Permeation Design considerations Pumping speed Virtual leaks Leaking de-greasing

Vacuum pumps Diffusion Ion pumps Turbo molecular pumps Sublimation pumps Cryo pumps Sample handling Preparation Treatment in vacuum Manipulation

Instrument : Light source, analyser, detector Resolution, Sensitivity Width of radiation Width of the level Analyser resolution Analysers FW HM Dispersive Retarding potential I (Photoelectrons, I nr, A S, Analyser solid angle at detector) Photon Intensity Cross section Area of the slit

Transmission Fraction of electrons reaching the detector from an isotropic point source = Useful instrument solid angle. Transmission factor Integral of point source transmission over slit area luminosity Integral of solid angle over slit area étendue Line width of radiation pressure broadening (Stark, van der Waals, resonance) Doppler broadening Recoil of atoms Life time

I( ) = 1 + /2 [3/2 (sin 2 ) 1] for unpolarised photons -asymmetry parameter Angle e - Surface Sensitivity h Bulk e - Adsorbate

Other techniques Photo detachment EXAFS, SEXAPS, synchrotron radiation EPMA or Electron probe x-ray micro analysis Ion beam techniques SIMS ISS RBS FABMS dynamic static INS (ion neutralization spectroscopy) SNMS (sputtered neutral mass spectrometry) PIXE (particle induced x-ray emission

History Photoelectric effect 1887 Hertz Rutherford ray spectroscopy Before WWI Basic XPS equation, E K = h -E B Originally stated by Rutherford 1914 Moseley Rawlinson Robinson After WWI ray spectrum of elements Anomalous lines corresponding to electron ejection due to fluorescence excitation. Anger spectroscopy 1925

Steinhardt 1951 An x-ray photoelectron spectrometer for chemical analysis Kai Seigbahn Uppsala 1940 s 1967 ESCA: Atomic, Molecular and solid state structure studied by means of Electron spectroscopy Acronym ESCA is due to Seigbahn

Early Hertz Experiment

U vs. for a number of metals

Simple UPS

Heart of the instrument

What is inside

X-Ray Source

X-Ray emission spectrum

Detail of the spectrum

Water Inlet Tube Focusing Shields Filament 1 Filament 2 Anode Face 1 Anode Face 2 X-rays Window X-ray source with dual filament and anode faces

UV Source

Synchrotron

Resolution Absolute resolution, FWHM Base width E B = 2 E E Relative resolution R = E/E 0 Represented normally, in percentage, E/E 0 x 100 Resolving power = 1/R = E 0 / E XPS line widths 0.7eV Mg K,0.85 eval K, For an absolute resolution of 0.2 ev, the relative resolution is 10-4 or a resolving power of 10,000. To keep the analyser size to an optimum value, the KEs have to be retarded - pass energy.

For an absolute resolution of 0.2 ev, the relative resolution is only 10-3. High absolute resolution can be achieved by retardation. Not always advantageous. Requirement in UPS

EDC around E F in an UPS spectrum of Ag. Solid line is the Fermi function at RT

Electronic structure of solids p Half full p band Band gap s s band Full

Zero Unoccupied Fermi level Occupied Energy

In a piece of metal, there are 10 23 electrons. We have high quantum states for most electrons. Probability that a given quantum state is occupied is given by the Fermi factor, f(e) = 1/[e (E- )/kt + 1] Plot of this is given here which gives a definition of Femi level.

is chemical potential, is the energy of the level for which f(e) = ½ E F

How the given energy states are occupied at a given temperature is given by Fermi-Dirac distribution. N(E)dE = f(e)s(e)de = S(E)dE/[e (E- )/kt + 1] N(E) = number of electrons per unit volume, having energy between E and E + de S(E) = number of available quantum states in this energy range. This distribution obeys Pauli exclusion principle. Number of electrons N(E) can never be larger than the number of available states S(E) as the denominator is always greater than one. For states with energies well above, 1 in the denominator can be neglected. N(E)dE e -(E- )/kt This resembles Bolzmann distribution

UPS EDC at E F of Ag (15 K). Resolution, E is obtained by convoluting a Fermi function with a Gaussian function

Analysers

Retarding Field Analyser Amplifier Electron beam Sample Detector Scan

Intensity Retarding Voltage

E o /ev = k/ln(r 2 /r 1 ) mv 2 /r = ev

Inner and Outer Magnetic Shields Outer Cylinder Inner Cylinder Rotary Motion X-Ray Source Sample Electron Gun Electron Multiplier First Stage Second State

e V = E(R 2 /R 1 R 1 /R 2 )

1. Single-Channel Detector Channel electron multiplier:a continuous dynode surface. High count rate of 10 6 counts per second. 2. Multi-Channel Detector A set of parallel detector chains or position sensitive detectors kept at the analyser exit slit plain.

Channel electron multiplier Semi Conducting Surface Lead doped glass e - glass HV 10 6 electron film

Hemispherical sector electron energy analyser and control electronics.

Spectrometer with X-ray monocromatisation

Modern instrument for UPS, XPS, AES and EELS

An electron gun for beams up to 10 ke V

Ion gun using a Penning discharge.

A liquid-metal field emission ion source

A simple method of XPS imaging using a conventional HAS instrument

Data analysis