Determination of challenging elements in ultrapure semiconductor grade sulfuric acid by Triple Quadrupole ICP-MS

Similar documents
Determination of trace elements in ultrapure semiconductor grade sulfuric acid using the Agilent 8900 ICP-QQQ in MS/MS mode

Ultra trace measurement of potassium and other elements in ultrapure water using the Agilent 8800 ICP-QQQ in cool plasma reaction cell mode

Analysis of Trace Metal Impurities in High Purity Hydrochloric Acid Using ICP-QQQ

Application note. Trace level analysis of sulfur, phosphorus, silicon and chlorine in NMP using the Agilent 8800 Triple Quadrupole ICP-MS

Direct Measurement of Metallic Impurities in 20% Ammonium Hydroxide by 7700s/7900 ICP-MS

Lead isotope analysis: Removal of 204 Hg isobaric interference from 204 Pb using ICP-QQQ in MS/MS mode

Direct Analysis of Trace Metal Impurities in High Purity Nitric Acid Using ICP-QQQ

Agilent s New 8800 ICP-QQQ. Transforming ICP-MS Technology

Trace elemental analysis of distilled alcoholic beverages using the Agilent 7700x ICP-MS with octopole collision/ reaction cell

Multi-Element Analysis of Petroleum Crude Oils using an Agilent 7900 ICP-MS

Enhancing the productivity of food sample analysis with the Agilent 7700x ICP-MS

Comparing Collision/Reaction Cell Modes for the Measurement of Interfered Analytes in Complex Matrices using the Agilent 7700 Series ICP-MS

Rapid Analysis of High-Matrix Environmental Samples Using the Agilent 7500cx ICP-MS. Application. Author. Abstract. Introduction.

Accurate analysis of neptunium 237 in a uranium matrix, using ICP-QQQ with MS/MS

Determination of Impurities in Silica Wafers with the NexION 300S/350S ICP-MS

The ultratrace determination of iodine 129 in aqueous samples using the 7700x ICP-MS with oxygen reaction mode

Application. Determination of Trace Metal Impurities in Semiconductor-Grade Hydrofluoric Acid. Authors. Introduction. Abstract.

Applications of ICP-MS for Trace Elemental Analysis in the Hydrocarbon Processing Industry

Determination of ultratrace elements in photoresist solvents using the Thermo Scientific icap TQs ICP-MS

Simple, reliable analysis of high matrix samples according to US EPA Method 6020A using the Agilent 7700x/7800 ICP-MS

Thermo Scientific icap TQ ICP-MS: Typical limits of detection

Thermo Scientific icap RQ ICP-MS: Typical limits of detection

Accurate Analysis of Trace Mercury in Cosmetics using the Agilent 8900 ICP-QQQ

Determination of Chromium in Gelatin Capsules using an Agilent 7700x ICP-MS

Application note. Accurate determination of sulfur in biodiesel using Isotope Dilution-Triple Quadrupole ICP-MS (ID-ICP-QQQ) Petrochemical

Semiquantitative Screening of Pharmaceutical Antiviral Drugs using the Agilent 7500ce ICP-MS in Helium Collision Mode

The Agilent 7700x ICP-MS Advantage for Drinking Water Analysis

Accurate measurement of elemental impurities in metals and metal alloys using the Thermo Scientific icap TQ ICP-MS

Analysis of Arsenic, Selenium and Antimony in Seawater by Continuous-Flow Hydride ICP-MS with ISIS

Multi-Element Analysis of Cannabis using the Agilent 7800 ICP-MS

Agilent 8900 Triple Quadrupole ICP-MS

Trace Analyses in Metal Matrices Using the ELAN DRC II

High-Speed Environmental Analysis Using the Agilent 7500cx with Integrated Sample Introduction System Discrete Sampling (ISIS DS)

Implementing EPA Method 6020 with the Agilent ICP-MS Portfolio

Techniques for the Analysis of Organic Chemicals by Inductively Coupled Plasma Mass Spectrometry (ICP-MS)

High Throughput Water Analysis using Agilent 7900 ICP-MS coupled with ESI prepfast

Determination of Phosphorus and Sulfur with Dynamic Reaction Cell ICP-MS

Direct Analysis of Photoresist Using Inductively Coupled Plasma Mass Spectrometry (ICP-MS) Application

Quantitative analysis of high purity metals using laser ablation coupled to an Agilent 7900 ICP-MS

Agilent s Solutions for Nanoparticles Analysis ICP-MS, ICP-MS/MS, software. Alain Desprez Agilent Technologies

Performance of the Agilent 7900 ICP-MS with UHMI for high salt matrix analysis

IMPROVING DATA QUALITY WITH ADVANCED INSTRUMENTATION UTILIZING MULTIPLE INTERFERENCE REDUCTION TECHNOLOGIES

Direct Measurement of Trace Metals in Edible Oils by 7500cx ICP-MS with Octopole Reaction System

Unmatched Removal of Spectral Interferences in ICP-MS Using the Agilent Octopole Reaction System with Helium Collision Mode Application

Rapid Screening and Confirmation of Melamine Residues in Milk and Its Products by Liquid Chromatography Tandem Mass Spectrometry

Agilent 8800 Triple Quadrupole ICP-MS: Understanding oxygen reaction mode in ICP-MS/MS

Simplified workflows for the Thermo Scientific icap TQ ICP-MS

Samples compliant with the WATER

Elemental analysis of river sediment using the Agilent 4200 MP-AES

Basic and Application Inductively coupled plasma mass spectrometry (ICPMS)

Ultra-fast determination of base metals in geochemical samples using the 5100 SVDV ICP-OES

Fundamentals of the ICP-MS Technique and How to Resolve Issues for Pharmaceutical Materials (In 20 Minutes) Tim Shelbourn, Eli Lilly and Company

Handling Interferences in the Modern Laboratory with Advanced Triple Quadrupole ICP-MS Technology

Accurate Determination of TiO 2 Nanoparticles in Complex Matrices using the Agilent 8900 ICP-QQQ

Determination of major, minor and trace elements in rice fl our using the 4200 Microwave Plasma- Atomic Emission Spectrometer (MP-AES) Authors

Simple and Reliable Soil Analysis using the Agilent 7800 ICP-MS with ISIS 3

Florida State University Libraries

High-Throughput Semiquantitative Screening of Ambient Air Samples by ORS-ICP-MS and Integrated Sample Introduction System (ISIS) Application

Hands on mass spectrometry: ICP-MS analysis of enriched 82 Se samples for the LUCIFER experiment

Agilent ICP-MS. Fundamentals of ICP-MS Analysis and Its Applications for Low Level Elemental Determination in Cannabis

Agilent Technologies at TIAFT 2013

Rapid, simple, interference-free analysis of environmental samples using the XSERIES 2 ICP-MS with 3 rd generation CCT ED

Fergus Keenan Shona McSheehy Julian Wills

Analysis of noble metals at low levels in geological reference materials and ores

Inductively Coupled Plasma Mass Spectrometry (ICP-MS) Debjani Banerjee Department of Chemical Engineering IIT Kanpur

Agilent ICP-MS Journal December 2016 Issue 67

Sample Analysis Design PART III

Partial Energy Level Diagrams

The 30-Minute Guide to ICP-MS

Analysis of Biomarkers in Crude Oil Using the Agilent 7200 GC/Q-TOF

Key Analytical Issues: Sample Preparation, Interferences and Variability. Tim Shelbourn, Eli Lilly and Company

Real World Analysis of Trace Metals in Drinking Water Using the Agilent 7500ce ICP-MS with Enhanced ORS Technology. Application. Authors.

Determination of Trace Metals in Human Urine Using the NexION 300 ICP-MS

Analysis of high matrix samples using argon gas dilution with the Thermo Scientific icap RQ ICP-MS

Introducing the Agilent 7000A QQQ-MS for GC Sunil Kulkarni Product Specialist Agilent Technologies

High Sensitivity HPLC Analysis of Perchlorate in Tap Water Using an Agilent 6460 Triple Quadrupole LC/MS System

Outsmart Interferences with Triple Quadrupole ICP-MS. The world leader in serving science

Extrel Application Note

Simultaneous quantification of peptides and phosphopeptides by caplc-icp- MS using the Agilent 8800/8900 Triple Quadrupole ICP-MS

Application of the Agilent 7900 ICP-MS with Method Automation function for the routine determination of trace metallic components in food CRMs

Rapid determination of five arsenic species in polished rice using HPLC-ICP-MS

Total Elemental Analysis of Food Samples for Routine and Research Laboratories, using the Thermo Scientific icap RQ ICP-MS

Total elemental analysis of food samples for routine and research laboratories using the Thermo Scientific icap RQ ICP-MS

Sample Analysis Design PART II

Macrolides in Honey Using Agilent Bond Elut Plexa SPE, Poroshell 120, and LC/MS/MS

The New Agilent 7700 Series ICP-MS

LC/MS/MS qua ntitation of β-estradiol 17-acetate using an Agilent 6460 Triple Quadrupole LC/MS working in ESI negative ion mode

Agilent 7500a Inductively Coupled Plasma Mass Spectrometer (ICP-MS)

Identification and Quantitation of PCB Aroclor Mixtures in a Single Run Using the Agilent 7000B Triple Quadrupole GC/MS

Agilent 8900 Triple Quadrupole ICP-MS LEAVE INTERFERENCES BEHIND WITH MS/MS

Interference-free determination of ultra-trace levels of Arsenic and Selenium using methyl fluoride as reaction gas in ICP-MS/MS

Analysis of domestic sludge using the Agilent 4200 MP-AES

The Characterization of Nanoparticle Element Oxide Slurries Used in Chemical-Mechanical Planarization by Single Particle ICP-MS

China Soil Pollution Survey: Elemental Analysis of Soil and Sediment Digests by ICP-MS

Advanced ICP-MS techniques for overcoming interferences in LA-ICP-MS bioimaging

Single Nanoparticle Analysis of Asphaltene Solutions using ICP-QQQ

Agilent 8800 ICP-QQQ

icap TQ ICP-MS Applications Compendium

Application Note. Gas Chromatography/Mass Spectrometry/Food Safety. Abstract. Authors

The Investigation of Fertilizer Analyses Using Microwave Digestion and the Agilent 720-ES

Transcription:

Determination of challenging elements in ultrapure semiconductor grade sulfuric acid by Triple Quadrupole ICP-MS Application note Semiconductor Authors Junichi Takahashi Agilent Technologies, Japan Introduction The relatively recent technology of collision/reaction cell (CRC) has become widely used with quadrupole ICP-MS (ICP-QMS) to remove polyatomic ions, which can cause problematic spectral interferences on analytes in complex matrices. By utilizing CRC, background equivalent concentrations (BECs) can be reduced to the ppt or sub-ppt level for almost all elements in semiconductor grade chemicals. In certain sample matrices, however, some polyatomic species which are either very stable, or were originally present at high levels, may not be completely removed by the cell and can therefore still cause residual spectral interferences. For example, a sulfur matrix gives rise to SO and SN ions in the ICP, both of which can interfere with the determination of titanium. The first ionization potentials (IP) of the polyatomic species SO and SN are 10.2 ev and 8.9 ev respectively and so both are more readily ionized in the ICP than S (IP 10.36 ev). In addition, SO has a dissociation energy of 5.44 ev, so it is not easily dissociated

when the CRC is used in collision mode with an inert cell gas. Titanium has 5 isotopes: 46 Ti (8%), 47 Ti (7.3%), Ti (73.8%), 49 Ti (5.5%) and 50 Ti (5.4%). The two most abundant isotopes of Ti ( Ti and 46 Ti) are also the ones that suffer the most intense interferences, from 32 S 14 N at m/z 46 and 32 S 16 O at m/z, so the minor isotope 47 Ti is usually chosen for the analysis of Ti in high purity H 2. The BEC of Ti in 10x diluted H 2 measured with ICP-QMS in CRC mode is approximately 50 ppt [1]. Semiconductor process chemical manufacturers need a lower BEC in order to be able to determine metal contaminants at the required levels in the 10x dilute acid. A similar issue occurs with phosphoric acid analysis. In this case, in order to avoid spectral interferences from 31 P 16 O and 31 P 16 OH, a different minor titanium isotope, 46 Ti, is used. In the worst case, a mixed chemical containing both sulfuric and phosphoric acids would leave no Ti isotope available free from polyatomic interferences. The newly developed technology of triple quadrupole ICP-MS (ICP-QQQ) offers a better solution for this issue. In this application note, ICP-QQQ was used for the successful analysis of Ti and other elements which have historically been very difficult to determine at trace levels in sulfuric acid. Experimental The Agilent 8800 Triple Quadrupole ICP-MS differs from conventional ICP-QMS, in that it features an additional quadrupole mass filter (Q1) positioned in front of the Octopole Reaction System (ORS 3 ) cell and the analyzer quadrupole mass filter (now called Q2). This enables the 8800 ICP-QQQ to be operated in MS/MS mode, which is unique to tandem mass spectrometer configurations such as the ICP-QQQ. Q1 operates as a mass filter, selecting the ions that enter the cell, and therefore controlling the ions that can take part in reactions in the cell. Because plasma ions are eliminated from the cell by Q1, ion transmission through the cell is greatly increased [2]. When using reaction gas methods, reaction efficiency is also greatly enhanced, enabling the use of lower reaction gas flow rates which also increases ion transmission and therefore sensitivity. Furthermore, the 8800 ICP-QQQ s four stage vacuum system results in a higher final vacuum than the three stage systems used in ICP-QMS, which also gives the 8800 ICP-QQQ increased sensitivity compared to ICP-QMS. However, the greatest benefit of MS/MS mode is that it allows the full potential of reaction cell mode to be exploited. MS/MS mode can be used with either onmass or mass-shift measurements. In MS/MS on-mass mode (used when the analyte ion is less reactive than the interfering ions), Q1 and Q2 are both set to the mass of the analyte ion. The reaction gas reacts with the interference, neutralizing it or combining with it to form a new product ion at a different mass, thereby allowing measurement of the analyte at its original mass. Alternatively, in MS/MS mass-shift mode (used when the analyte is more reactive than the interfering ions), the analyte is reacted with an appropriate reaction gas, and measured as a new product ion at a new mass away from the interference. In both cases, the key role of Q1 is to allow only ions at the mass of the analyte precursor ion to enter the cell, excluding all potential interfering ions that would also react with the reaction gas. This application uses a combination of both onmass mode and mass-shift mode, depending on the analyte being measured. Prior to the actual multi-element analysis, reaction product ions were investigated. The 8800 ICP-QQQ supports several unique MS/MS acquisition modes including product ion scan, which is a very useful approach to method development for reaction gas methods. In a product ion scan, Q1 is fixed at the analyte (precursor) ion mass, and Q2 is scanned across a selected mass range, giving a spectrum showing all potential product ions that can be formed from reactions between the precursor ions and the cell gas. This can be used to confirm expected reaction pathways and identify useful analyte product ions, but it also gives an indication of potential unwanted product ions that may affect the measurement of other analytes in ICP-QMS or 2

in ICP-QQQ when operated in Single Quad mode. In this case, the product ion scan was performed for a matrix of 10x diluted high purity H 2 (98% sulfuric acid, Tama Chemicals, Japan), and NH 3 reaction gas was used in the cell. Q1 was set at the mass of the precursor ion of interest (m/z for Ti ) and Q2 was scanned between m/z 45 and 130. The same product ion scan was then performed for a second aliquot of H 2 spiked with 100 ppt of Ti. Figure 1 shows the product ion scan spectra obtained for the two samples with Q1 set to m/z (major isotope of Ti). The upper spectrum is the blank H 2 while the lower spectrum shows the new product ion peaks observed from the 100 ppt Ti spike solution. Since Q1 was fixed at m/z, the resulting peaks are all species formed due to the reaction of Ti with NH 3. Thus we can select a suitable product ion peak to use as a surrogate for Ti measurement. The following useful analytical species were identified in the spiked spectrum: TiNH (m/z 63), TiNH 2 (m/z 64), Ti(NH)(NH 3 ) or Ti(NH 2 (m/z 80), NH (m/z 97), NH (m/z 114), NH 2 (m/z 115) and ) 4 (m/z 116). It is worthwhile to note that most of these product ions can give unreliable data when NH 3 cell gas is used for Ti analysis on quadrupole ICP-MS. This is because there may be native ions, such as 63 Cu, 64 Zn, 114 Cd and 115 In, present at the same mass as the Ti product ions. With ICP-QMS, these co-existing ions cannot be excluded from the cell and so remain as overlaps on the Ti product ions used for quantification. The performance obtained using the product ions at m/z 64, m/z 114 and m/z 115 was similar, but the BEC at m/z 114 (product ion NH ) was slightly better, so this ion was chosen for the measurement of Ti. Unidentified peaks were also found in the blank spectrum. Those were assumed to be 32 S 16 ON x H y, formed from the other ions such as 32 S 16 O that would enter the cell when Q1 is set to m/z. Tune step 1 : 12B23NH3_TiH2SO4 blk spectra 49-127_Data.D x10 2 4 CPS 2 0 40 50 60 70 80 90 100 110 120 130 Mass Tune step 1 : 12B23NH3_TiH2SO4 100ppt spectra 49-127_Data.D x10 2 4 TiNH TiNH 2 Ti(NH)(NH 3 ) or Ti(NH 2 NH NH NH 2 CPS 2 ) 4 0 40 50 60 70 80 90 100 110 120 130 Mass Figure 1. Product ion spectra of Ti in 9.8% H 2 (NH 3 cell gas, Q1, Q2 45-130). Upper spectrum blank H 2, lower spectrum with 100 ppt Ti spike added. 3

Operating parameters Operating parameters used for the analysis are shown in Table 1. Sample solution was introduced by free aspiration using a C-Flow PFA micro-concentric nebulizer (Agilent part # G3285-80000) with an uptake rate of 200 µl/ min, together with the 8800 ICP-QQQ s standard quartz torch and quartz spray chamber. A Pt sampling cone (Agilent part # G3280-67036 or 67056) and Pt skimmer cone (Agilent part # G3280-67064 or 67065) are also necessary for H 2 analysis. Calibration Calibration standards were prepared by spiking mixed standard solutions into the 10x diluted high purity H 2. The calibration plots for Ti and Cr are shown in Figures 2 and 3. Good linearity down to 10 ppt for both elements was observed, with sub-ppt detection limits. With conventional ICP-QMS with CRC, both these elements are heavily interfered by sulfur-based polyatomic ions, and cannot be determined at low ppt level in this matrix. Table 1. Operating parameters O 2 MS/MS NH 3 MS/MS RF power, W 1600 Sampling depth, mm 8 Carrier gas, L/min 0.8 Makeup gas, L/min 0.41 Extract 1, V 6.6 5.7 Extract 2, V -50-160 Octopole bias V -20 Q2 bias V -40 He ml/min 3 1 O 2 ml/min 1) 0.4 N/A NH 3 ml/min 2) N/A 3 1) 100% O 2 2) 10% NH 3 balanced with 90% He Figure 2. Calibration curve of Ti using MS/MS mass-shift mode with NH 3 cell gas Figure 3. Calibration curve of Cr using MS/MS mass-shift mode with O 2 cell gas 4

Results and discussion The analytical data for a number of difficult elements in high purity H 2 is shown in Table 2. Q1 and Q2 settings and reaction gas used are shown for each element. Mass-shift mode was used for all elements except V. All analytes measured using O 2 cell gas were measured as their MO product ions, so Q2 was set 16 amu higher than Q1. Ti was measured as NH at m/z 114, as discussed earlier, while V, which is unreactive with both O 2 and NH 3, was measured at its original mass 51 using NH 3 cell gas. NH 3 reaction mode was used because the overlap on 51 V from 34 S 16 OH cannot be completely removed using helium collision mode. The BEC of V obtained using NH 3 is two orders of magnitude better than the BEC obtained using He. The concentrations of all the analytes measured in a 10x diluted H 2 sample were calculated by MSA (method of standard addition) and converted to concentration values in the original (undiluted) sulfuric acid. Results are shown in Table 2; except for Si and P, the sulfuric acid can be certified as 10 ppt impurity level grade. Table 2. Results of impurity analysis of a commercial 98% high purity sulfuric acid Q1 m/z Q2 m/z Cell gas Conc. (ng/kg) Si 28 44 O 2 6800 P 31 47 O 2 800 Ti 114 NH 3 7.2 V 51 51 NH 3 1.6 Cr 52 68 O 2 37 Ge 74 90 O 2 4.5 As 75 91 O 2 2.7 Se 78 94 O 2 2.0 Conclusions The Agilent 8800 Triple Quadrupole ICP-MS, operated in MS/MS mode, eliminates problematic spectral interferences that cannot be removed with CRC-ICP-QMS. The great benefit of MS/MS mode is that the mass selection performed by the first quadrupole (Q1), positioned in front of the cell, allows the cell to operate much more efficiently and selectively, opening up the true potential of reaction cell chemistry in a way not possible with conventional ICP-QMS. The 8800 ICP-QQQ now enables the routine analysis and certification of some key analytes in high purity process chemicals such as sulfuric acid. References 1. Junichi Takahashi, Kouichi Youno, Analysis of Impurities in Semiconductor Grade Sulfuric Acid using the Agilent 7500cs ICP-MS, Agilent ICP-MS application note, publication number 5988-9190EN, 2003. 2. Agilent ICP-MS Journal Issue 49, publication number 5990-9942EN, 2012. 5

www.agilent.com Agilent shall not be liable for errors contained herein or for incidental or consequential damages in connection with the furnishing, performance or use of this material. Information, descriptions, and specifications in this publication are subject to change without notice. Agilent Technologies, Inc. 2013 Published January 19, 2015 Publication number: 5991-2819EN