For the following statements, mark ( ) for true statement and (X) for wrong statement and correct it.

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Benha University Faculty of Engineering Shoubra Electrical Engineering Department First Year communications. Answer all the following questions Illustrate your answers with sketches when necessary. The exam consists of two pages. 1 st semester Exam Date: 9 1 014 ECE111: Electronic Engineering fundamentals Duration : 3 hours No. of questions: 5 Total Marks: 90 Marks Examiners: Dr. Ehsan Abaas Dr. Abdallah Hammad K=1.38 3 J/K h=6.64 34 J.s q=1.6 19 C m o =9.1 31 Kg ε o =8.85x 14 F/cm [Si] n i =1.5x cm 3 [Si] ε rs = 11.7 [Si] E g =1.1 ev [Ge] n i =x 1 cm 3 Question 1 (18 marks) For the following statements, mark ( ) for true statement and (X) for wrong statement and correct it. 1 Fermi level is located above the intrinsic level in n type Si and below it in p type Si. ( ) In n type Si, as doping concentration increases, Fermi level moves toward the conduction band edge. ( ) 3 For a reverse biased pn junction, as the reverse bias voltage increases the depletion capacitance increases ( X ) 4 For the same doping level, the conductivity of the p type Si is higher than that of n type Si. ( X ) 5 Holes move in the opposite direction of the applied electric field. ( X ) 6 In a pn junction, depletion region extends more in lightly doped side than in heavily doped side. ( ) 7 Forward biased pn junction can be used as a variable capacitor (varactor). ( X ) 8 Drift current arises when there is a change in carrier concentration. ( X ) 9 The intrinsic carrier concentration of a semiconductor decreases as its energy gap increases. ( ) The mass action law is valid at thermal equilibrium in intrinsic semiconductors only ( X ) 11 When an intrinsic semiconductor is doped with N D donors, the new electron concentration is: n = ( X ) n i + N D 1 At very high temperatures, doped semiconductors tend to be intrinsic ( ) 13 With the rise in temp around 300 k the conductivity of an intrinsic semiconductor decrease ( X ) 14 The Hall effects occur only in (metals, intrinsic, and extrinsic) ( ) 15 The depletion region in the pn junction is depleted of immobile charge ( X ) 16 The depletion region in the pn junction is reduced when the junction is forward bias ( ) 17 When the diode is reveres bias it is equivalent to off switch ( ) 18 As the time between collisions increases, the mobility decreases ( X ) Correction: 3 Decreases All kinds of Semiconductor 4 Lower 11 n=n D +p 5 Same 13 Increase 7 Reverse 15 Mobile charge 8 Diffusion 18 Increase Page 1 of 7

Question (18 marks) a (9 marks) Silicon semiconductor at T = 300 K is doped with donors atoms of N D = 3 x cm 3.Assume ni = 1.5 x cm 3. Calculate: i The thermal equilibrium electron and hole concentrations in the sample. ii The Fermi energy level with respect to the intrinsic Fermi level at T = 300 k. (i) N D N D n n i 3 3 n 1.5 3.6 n i 1.5 3 cm 9 3 p 6.1 cm n 3.6 (ii) KT n 3.6 E F Ei ln 0.06ln 0.09eV 3meV q ni 1.5 b (9 marks) The electron concentration in Silicon at T = 300 K is given by: nx exp Cm Where x is measured in µm and is limited to 0 x 5 µm. The electron diffusion coefficient is D n =5 cm /s. The electron current density through the semiconductor is constant and equal to J n = 40 A/cm. The electron current has both diffusion and drift current components. Determine the electric field as a function of x which must exist in the semiconductor. Page of 7

Question 3 (18 marks) a (9 marks) Germanium is doped with 5 x 17 donor atoms per cm 3 at T = 300 K. The dimensions of the Hall device shown in Figure. 1 are t = 5x 3 cm, d = x cm. and W= 0.1 cm. The current is I x = 50 µa. The applied voltage is V x = 0 mv. The magnetic flux density is B z = 5 x tesla (Wb/m ). Calculate: i The Hall voltage. ii The Hall Electric field. iii The carrier mobility. Figure 1 b (9 marks) Silicon P + n junction has N A = 18 cm 3 and N D = 5 x 15 cm 3.The cross sectional area of the junction is A = 5 x 5 cm. Calculate i The junction capacitance for V R = 3V ii Show that the curve ([1/C] versus V R ) can be used to find N D and V o. Page 3 of 7

Question 4 (18 marks) a (9 marks) The charge distribution of an abrupt pn junction is shown in Figure. i Derive an expressions for the electric field in the region x p <x < x n. ii By using Poisson s Equation find the expressions for the potential distribution in the region x p <x < x n () () ρ () s x dx dx ε d ψ x de x x x 0 p de() x qna dx qna E() x xe 1 qna E 1 xp qna E () x xx p 0 x xn de() x qnd dx qnd E() x xe qnd E xn qnd E () x xx n qn qn E E x A D max (0) p x n (b) Page 4 of 7

a (9 marks) A silicon pn junction diode is doped such that E F = E V + 5KT on the p side and E F = E C 4KT on the n side. i Draw an equilibrium energy band diagram of this junction. ii Calculate the built in voltage at 300K. Given that Eg = 1.1 ev iii If the donor concentration N D = 6.x 17 cm 3, Calculate N A i ii 1.1 5 4 1.1 90.059 0.8869 iii 1.5 6... 1.8 ln 0.8869 Page 5 of 7

Question 5 (18 marks) a (6 marks) Define: barrier potential, Static forward resistance, PIV, Reverse Stauration current. a barrier potential: when the n type material put in contact with the p type material, free electrons from n type diffuse and cross the junction and combine with holes in the p type material leaving behind (+ve ions) in the surface of the n type. While ( ve ions) on the p type reign. These positive and negative ions create an electric field which in turn produces an electric potential (barrier potential) that prevent more electrons from crossing the junction. Static forward resistance: it is the ratio dc voltage across the diode and the current passes through it. PIV: it equals the peak value of the input voltage and the diode must be capable of withstanding the amount of repeatative reverse voltage Reverse Stauration current: is the current in a semiconductor diode caused by drift of minority carriers from the neutral regions to the depletion region. This current is almost independent of the reverse voltage. b (6 marks) Assuming an ideal diode, the dc output across the resistor V dc = V. i Sketch (V i, V D, I D ) for the half wave rectifier of Figure. 3. The input is a sinusoidal waveform with a frequency of 50 Hz. ii Determine the PIV of the diode. Figure 3 PIV=V i (p)=6.8v Page 6 of 7

a (6 marks) Consider a silicon pn junction with the following parameters. N D = 16 cm 3 N A = 5x 16 cm 3, n i = 1.5x cm 3 τ n = τ p =5x 7 S, D p = cm /S, D n = 5 cm /S, ε rs = 11.7, and the cross sectional area is 3 cm Calculate the reverse saturation current I o... I.1 14 Good Luck Dr. Abdallah Hammad Page 7 of 7