High performance doubly clamped piezoresistive accelerometers by the outturn of electroplating

Similar documents
Analytical Design of Micro Electro Mechanical Systems (MEMS) based Piezoelectric Accelerometer for high g acceleration

Design and Simulation of Comb Drive Capacitive Accelerometer by Using MEMS Intellisuite Design Tool

EE C245 / ME C218 INTRODUCTION TO MEMS DESIGN FALL 2009 PROBLEM SET #7. Due (at 7 p.m.): Thursday, Dec. 10, 2009, in the EE C245 HW box in 240 Cory.

Design and Analysis of dual Axis MEMS Capacitive Accelerometer

EE C245 / ME C218 INTRODUCTION TO MEMS DESIGN FALL 2011 C. Nguyen PROBLEM SET #7. Table 1: Gyroscope Modeling Parameters

10 Measurement of Acceleration, Vibration and Shock Transducers

Kurukshetra University INDIA

Institute for Electron Microscopy and Nanoanalysis Graz Centre for Electron Microscopy

DESIGN AND FABRICATION OF THE MICRO- ACCELEROMETER USING PIEZOELECTRIC THIN FILMS

Simulation based Analysis of Capacitive Pressure Sensor with COMSOL Multiphysics

Finite Element Analysis of Piezoelectric Cantilever

Simulation of a Micro-Scale Out-of-plane Compliant Mechanism

MEMS INERTIAL POWER GENERATORS FOR BIOMEDICAL APPLICATIONS

DESIGN AND SIMULATION OF ACCELEROMETER SPRINGS

DESIGN AND SIMULATION OF UNDER WATER ACOUSTIC MEMS SENSOR

Variable Capacitance Accelerometers: Design and Applications

Outline. 4 Mechanical Sensors Introduction General Mechanical properties Piezoresistivity Piezoresistive Sensors Capacitive sensors Applications

Design and characterization of in-plane MEMS yaw rate sensor

Platform Isolation Using Out-of-plane Compliant Mechanism

MODELING OF T-SHAPED MICROCANTILEVER RESONATORS. Margarita Narducci, Eduard Figueras, Isabel Gràcia, Luis Fonseca, Joaquin Santander, Carles Cané

Design of a MEMS Capacitive Comb-drive Accelerometer

Modeling, Simulation and Optimization of the Mechanical Response of Micromechanical Silicon Cantilever: Application to Piezoresistive Force Sensor

Midterm 2 PROBLEM POINTS MAX

Modelling of Different MEMS Pressure Sensors using COMSOL Multiphysics

CHAPTER 4 DESIGN AND ANALYSIS OF CANTILEVER BEAM ELECTROSTATIC ACTUATORS

EE C247B / ME C218 INTRODUCTION TO MEMS DESIGN SPRING 2016 C. NGUYEN PROBLEM SET #4

SENSOR DEVICES MECHANICAL SENSORS

Piezoresistive Sensors

Optimal Design of Capacitive Micro Cantilever Beam Accelerometer

Fabrication and performance of d 33 -mode lead-zirconate-titanate (PZT) MEMS accelerometers

AC : MEMS FABRICATION AS A MULTIDISCIPLINARY LABORATORY

Thickness Optimization of a Piezoelectric Converter for Energy Harvesting

Experimental Approach to Determine the Stress at a Section of Semi Circular Curved Beam Subjected to Out-Of-Plane Load Using Strain Rosette

DESIGN AND OPTIMIZATION OF BULK MICROMACHINED ACCELEROMETER FOR SPACE APPLICATIONS

CHAPTER 5 FIXED GUIDED BEAM ANALYSIS

Published by: PIONEER RESEARCH & DEVELOPMENT GROUP(

Contactless Excitation of MEMS Resonant Sensors by Electromagnetic Driving

Tunable MEMS Capacitor for RF Applications

EECS C245 ME C218 Midterm Exam

Foundations of MEMS. Chang Liu. McCormick School of Engineering and Applied Science Northwestern University. International Edition Contributions by

Capacitive MEMS Accelerometer Based on Silicon-on-Insulator Technology: Design, Simulation and Radiation Affect

Modeling and Design of MEMS Accelerometer to detect vibrations on chest wall

EE C247B / ME C218 INTRODUCTION TO MEMS DESIGN SPRING 2014 PROBLEM SET #1

b. The displacement of the mass due to a constant acceleration a is x=

sensors Article Anh Vang Tran ID, Xianmin Zhang and Benliang Zhu *

1. Narrative Overview Questions

Overview. Sensors? Commonly Detectable Phenomenon Physical Principles How Sensors Work? Need for Sensors Choosing a Sensor Examples

Proceedings MEMS Inertial Switch for Military Applications

Biosensors and Instrumentation: Tutorial 2

Simple piezoresistive accelerometer

Optimizing the Performance of MEMS Electrostatic Comb Drive Actuator with Different Flexure Springs

EE C247B / ME C218 INTRODUCTION TO MEMS DESIGN SPRING 2014 C. Nguyen PROBLEM SET #4

Design And Analysis of Microcantilevers With Various Shapes Using COMSOL Multiphysics Software

International Journal of Modern Trends in Engineering and Research e-issn No.: , Date: 2-4 July, 2015

Contactless Excitation of MEMS Resonant Sensors by Electromagnetic Driving

9-11 April 2008 Measurement of Large Forces and Deflections in Microstructures

DESIGN OPTIMIZATION OF NANO CAVITY BASED PHOTONIC ACCELEROMETER SENSOR FOR VEHICLE SYSTEM

Evaluation of a surface acoustic wave motor with a multi-contact-point slider

Cantilever Beam Crack Detection using FEA and FFT Analyser

Four Degrees-of-Freedom Micromachined Gyroscope

Design of Electrostatic Actuators for MOEMS Applications

SENSORS and TRANSDUCERS

MEMS Mechanical Fundamentals

Introduction to Microeletromechanical Systems (MEMS) Lecture 9 Topics. MEMS Overview

Design and Analysis of Various Microcantilever Shapes for MEMS Based Sensing

Thermal Sensors and Actuators

Proceedings Design, Fabrication and Testing of the First 3D-Printed and Wet Metallized z-axis Accelerometer

Silicon Capacitive Accelerometers. Ulf Meriheinä M.Sc. (Eng.) Business Development Manager VTI TECHNOLOGIES

ELECTROMECHANICAL RELIABILITY TESTING OF THREE-AXIAL SILICON FORCE SENSORS

Design and Simulation of Micro-cantilever

Dept. of Electrical & Computer Engineering, Dept. of Mechanical Engineering University of Bridgeport, Bridgeport, CT /08/2015

SIMULATION AND OPTIMIZATION OF MEMS PIEZOELECTRIC ENERGY HARVESTER WITH A NON-TRADITIONAL GEOMETRY

micromachines ISSN X

Single- and dual-axis lateral capacitive accelerometers based on CMOS-MEMS technology

MEMS Tuning-Fork Gyroscope Mid-Term Report Amanda Bristow Travis Barton Stephen Nary

Design and Simulation of A MEMS Based Horseshoe Shaped Low Current Lorentz Deformable Mirror (LCL-DM).

Design of Piezoresistive MEMS Accelerometer with Optimized Device Dimension

Design and Optimization of Piezoelectric Dual-Mode Micro-Mirror

DESIGN AND ANALYSIS OF ROTATION RATE SENSOR. Modeling of vibratory MEMs Gyroscope

sensors ISSN

Simulation and Optimization of an In-plane Thermal Conductivity Measurement Structure for Silicon Nanostructures

Fabrication and Characterization of High Performance Micro Impedance Inclinometer

Analysis of Stress Distribution in Piezoelectric. MEMS Energy Harvester Using Shaped Cantilever Structure

Revealing bending and force in a soft body through a plant root inspired. approach. Lucia Beccai 1* Piaggio 34, Pontedera (Italy)

Microsensors. G.K. Ananthasuresh Professor, Mechanical Engineering Indian Institute of Science Bangalore, , India

FEM-SIMULATIONS OF VIBRATIONS AND RESONANCES OF STIFF AFM CANTILEVERS

Lecture 20. Measuring Pressure and Temperature (Chapter 9) Measuring Pressure Measuring Temperature MECH 373. Instrumentation and Measurements

19. Capacitive Accelerometers : A Case Study. 19. Capacitive Accelerometers : A Case Study. Introduction. Introduction (ctnd.)

Computation Models for Studying the Dynamic Behaviour of MEMS Structures. Determination of Silicon Dynamic Young s Modulus (E dynamic )

DEVELOPMENT OF A NOVEL ACTIVE ISOLATION CONCEPT 1

Performance Evaluation of MEMS Based Capacitive Pressure Sensor for Hearing Aid Application

Design and Analysis of Silicon Resonant Accelerometer

COMSOL Simulation of a Dualaxis MEMS Accelerometer with T-shape Beams

Y. C. Lee. Micro-Scale Engineering I Microelectromechanical Systems (MEMS)

Microstructure cantilever beam for current measurement

Study of Semi-Circular Beam Used in C-Arm Based Mobile X-Ray Units in Medical Healthcare Sector

HEALTH MONITORING OF PLATE STRUCTURE USING PIEZO ELECTRIC PATCHES AND CURVATURE MODE SHAPE

Piezoresistive pressure sensors. Electronics and Cybernetics 1

Structural Synthesis and Configuration Analysis of Broken Strands Repair Operation Metamorphic Mechanism

Surface Acoustic Wave Linear Motor

Transcription:

International Research Journal of Engineering and Technology (IRJET e-issn: 395-0056 Volume: 0 Issue: 08 Nov-015 www.irjet.net p-issn: 395-007 High performance doubly clamped piezoresistive accelerometers by the outturn of electroplating B. Anupama 1 1 Assistant Professor, Department of Electronics & Communication Engineering, MES College of Engineering, Kerala, India ---------------------------------------------------------------------***--------------------------------------------------------------------- Abstract - MEMS accelerometers find application in various fields such as vibration monitoring, inertial 1. INTRODUCTION guidance, seismology, micro-gravity measurement, etc. and demand for high performance accelerometer for various applications is increasing. Although several conversion mechanisms and physical processes are found useful for acceleration sensing, piezoresistive accelerometers are cost effective as compared to other sensing mechanisms. Performance improvement of quad beam accelerometer in terms of displacement sensitivity and rotational cross axis sensitivity are presented in this paper. The improvement is achieved by incorporating a thick layer of gold on top of the proof mass of the accelerometer structure. To reduce cross axis sensitivity, center of mass has to be closer to the plane of beams. This can be accomplished by depositing gold on top of proof mass. Addition of gold on top of proof mass allows use of reduced silicon proof mass thickness and improves real estate consumption due to sloping side wall. Here we use gold as the deposited layer on the proof mass.this is because the the density of bulk gold(19.3 grams/cm 3 is nearly eight times more than that of crystal silicon(.33 g/cm 3. Also it is chemically inert to most of the chemicals used in micromachining process. In the present work, three different accelerometer structures are considered for performance evaluation in terms of sensitivity, cross axis sensitivity, linearity and silicon real estate consumption. Parametric analysis is performed by using simple analytical models by varying geometrical dimensions of the various parts of accelerometer structures. Effect of electroplated gold layer on the performance characteristics of each structure is studied. Key Words: Sensitivity, cross axis sensitivity, piezoresistive effect MEMS accelerometers find application in various fields such as vibration monitoring, inertial guidance, microgravity measurement, etc. Demand for high performance accelerometer for various applications is still increasing and it is essential to realize these sensors in a cost effective way. Research has been carried out to deploy accelerometers in new applications such as automobile pollution control systems [1,]. Although several conversion mechanisms and physical processes are found useful for acceleration sensing, piezoresistive accelerometers are cost effective as compared to other sensing mechanisms [3-7]. The main advantage of piezoresistive accelerometers is the simplicity of their structure and fabrication process. Also they are less susceptible to parasitic capacitance and electromagnetic interference. It is challenging to achieve simultaneously high sensitivity and low cross axis sensitivity in designing micro accelerometers. Moreover these devices show a high range of cross axis sensitivity which is a major issue principally for high performance applications. To overcome this drawback, a MEMS piezoresistive single axis accelerometers with electroplated gold layer atop proof mass to enhance the performance of the sensor has been developed[13]. However, only quad beam accelerometer structures with their beams oriented in single direction with fixed dimension was considered.. DEVICE DETAILS Three different accelerometer structures are considered in the present study as shown in Fig-1. They consist of a thick proof mass supported by four thin flexures that are fixed to an outer supporting frame. The two opposite edges of the flexures are clamped by the frame and proof mass..1 Structural configuration In the structure shown in Fig-1 (a, all the four flexures are oriented along X direction which is parallel to wafer 015, IRJET ISO 9001:008 Certified Journal Page 51

International Research Journal of Engineering and Technology (IRJET e-issn: 395-0056 Volume: 0 Issue: 08 Nov-015 www.irjet.net p-issn: 395-007 primary flat. In the structure shown in Fig-1 (b, (here after structure, the four flexures are located at the centre of the proof mass edges whereas the accelerometer structure shown in Fig-1 (c, (here after structure 3, the four flexures are shifted to the corners of the edges and oriented along both X and Y directions. Piezoresistors may be implanted on the maximum stress region at the fixedends of flexures to form Wheatstone bridge for signal pickup. 4Ew 3 bh Kz b (1 l 3 b ( l 3a l 3a b 1 b 1 K x K z ( 3 K y a K (3 z where E is the Young s Modulus,w b is the width of the beam,l b is the length of the beam, h b is the thickness of the beam, a 1 is the distance between the centre of proof mass and the proof mass edge along Y direction and a is the distance between the centre of flexure and proof mass along X direction as shown in Fig-1. K x, K y and K z represents the spring constant along X, Y and Z axes, respectively. Similar expressions are found for other multiple suspended beam configuration as in (1. The spring constant along Z axis for the other two configurations are the same. However, the spring constant along X and Y axes for these structures differ. In the case of structure shown in Fig-1(b the equation for the spring constant along X and Y axes are same and can be written from [5], as Fig-1:Four beam structures with beams located a at the edges oriented to X axis (b at the centre of the proof mass on all the edges (c at the corners of the proof mass oriented to X and Y axes (d Cross sectional view of the structure across AA Cantilever structures with single beam is not considered in the present study, because it is more sensitive to crossaxis accelerations along X and Y directions. Even though, cross axis response can be reduced by using two beam cantilever structure, only half-active Wheatstone bridge can be formed by using this structure.. Parametric equations In an accelerometer structure, spring constant along a particular direction depends on the following parameters; (a number of flexures (b geometrical dimension of the flexures (c position of the flexures. To achieve low cross axis sensitivity along a particular direction, spring constant should be high along that direction. In the present study, for the fixed-fixed quad beam structure where all flexures are placed parallel to X-axis as shown in Fig-1 (a, equation of the spring constant along Z, X and Y axes can be written from [5], as ( l 3a l 3a b 1 b 1 Kx K y Kz (4 6 For the structure with beams shifted away from the proof mass centre and aligned with the proof mass edges shown in Fig-1(c, the equation for the spring constants are given from [5], as ( l 3a l 3a 3a b 1 b 1 K x K y K z (5 6 The equation for rotation of proof mass around the X-axis (θ X for Y-axis acceleration for all the three structures can be written from [5], as MayZc x ( 6 K y where a y is the acceleration along the Y axis, Zc is distance between the center of mass (cg of the proof mass and plane of the flexures and M is the mass of the proof mass. Similarly, the equation for rotation of proof mass around the Y-axis (θ Y for X-axis acceleration in general can be written from [5], as 015, IRJET ISO 9001:008 Certified Journal Page 5

International Research Journal of Engineering and Technology (IRJET e-issn: 395-0056 Volume: 0 Issue: 08 Nov-015 www.irjet.net p-issn: 395-007 MaxZc y (7 Kx where a x is the acceleration along the X-axis. The displacement of mass, z, due to applied acceleration along z direction for all the three structures is given from [5], by Maz z (8 Kz where M is the mass of proof mass,a z is the acceleration applied along z direction and K z is the spring constant along z direction.it is clear from the (8 that the sensitivity is directly proportional to the mass of the proof mass.so as the mass of proof mass is increased by electroplating gold on top of it,the displacement increases and hence the sensitivity. 3. METHODOLOGY The different parameters used for the parametric sensitivity analysis are the length of the beam, thickness of the beam and width of the beam for acceleration up to +1 g and for fixed proof mass dimensions. The analysis is done by varying one of the parameter and by fixing the other two parameters. Initially, the length of beam is varied from 400μm to 000μm with width of the beam and thickness of the beam fixed to 50μm and 30μm, respectively. Subsequently, the width of the beam is varied from 50μm to 500μm in steps of 50μm, with the thickness of beam and length of the beam fixed to 30μm and 100μm, respectively. By fixing the length of the beam to 100μm and width of the beam to 50μm and by varying the thickness of the beam from 0μm to 60μm, the performance parameters in terms of prime axis displacement sensitivity and cross axis response are analyzed. Fig - : Variation of displacement of proof mass and spring constant along Z axis with length of the beam Fig -3: Variation of displacement of proof mass and spring constant along Z axis with width of the beam 4. RESULTS AND DISCUSSION To demonstrate the performance enhancement of an accelerometer, the material parameters are selected as E=1.69GPa and density of gold as 19.8kg/m 3. As geometrical parameters, width of the beam and thickness of the beam are fixed to 50 μm and 30 μm respectively, and the length of the beam is varied there is an increase in displacement as shown in Fig-. This increase in displacement is higher for the structure with electroplated gold. Fig -4 : Variation of displacement of proof mass and spring constant along Z axis with thickness of the beam As the width of the beam is varied from 50μm to 500μm, it can be seen from the Fig-3 that there is a decrease in sensitivity and an increase in spring constant. But from the simulation it can be deduced that structure with electroplated gold has more sensitivity than the structure without electroplated gold. There is a constant percentage increase of around 3.9% in sensitivity for the structure with gold as the width of the beam is varied. 015, IRJET ISO 9001:008 Certified Journal Page 53

International Research Journal of Engineering and Technology (IRJET e-issn: 395-0056 Volume: 0 Issue: 08 Nov-015 www.irjet.net p-issn: 395-007 As the thickness of the beam is varied from 10μm to 60μm it can be seen from the Fig-4 that there is a decrease in sensitivity and an increase in spring constant. But from the simulation it can be deduced that structure with electroplated gold has more sensitivity than the structure without electroplated gold. There is a percentage increase from 3.46% to 3.68% in sensitivity for the structure with gold as the thickness of the beam is varied. Fig -5: Variation of rotational cross axis sensitivity of proof mass and spring constant for Y axis acceleration with length of the beam increased there is a decrease in spring constant from 86.07% to 1.94% for the structure with gold. Also it can be deduced that the increase in rotation is lesser for structure with electroplated gold and a percentage decrease in rotation from 3.49% to 3.54% is observed. As the thickness of the beam is varied from 10μm to 60μm it can be seen from the Fig-6 that there is a decrease in rotational cross axis sensitivity and an increase in spring constant. But from the simulation it can be deduced that structure with electroplated gold has less cross axis sensitivity than the structure without electroplated gold. For quad beam configuration 1, there is a percentage decrement in cross axis sensitivity from 1.39% to 31.% for the structure with electroplated gold as the thickness is increased. In the case of configuration, the percentage decrease in cross axis sensitivity for the structure with electroplated gold is observed to be a constant value of 3.63%. For configuration 3, there is a decrease in cross axis sensitivity which is lesser for structure with electroplated gold. The percentage reduction was observed to be varying from 3.49% to 31.6% for the structure with electroplated gold. Fig -6 :Variation of rotational cross axis sensitivity of proof mass and spring constant for Y axis acceleration with thickness of the beam Fig- 5 shows the plot between rotation of proof mass around X axis and Spring Constant along Y axis for a variation in beam length. It can be seen that as the length of the beam is varied from 00μm to 000μm it can be seen that there is a decrease in spring constant and an increase in rotational cross axis sensitivity. For the quad beam configuration 1 there is a percentage decrease in cross axis sensitivity from 3.65% to 3.71% for the structure with gold as the length of the beam is varied. For configuration the simulation results shows that structure with electroplated gold has less cross axis sensitivity than the structure without gold. It is observed that there is a constant decrement in cross axis sensitivity around 3.58%. For quad beam configuration 3, as the length is Fig -7: Variation of rotational cross axis sensitivity of proof and spring constant for Y axis acceleration with width of the beam For quad beam configuration 1, when the width of the beam is increased from 50μm to 500μm, there is a decrease in rotation of proof mass around X axis as shown in Fig-7. It can be observed from the simulation results that the rotation is lesser for structure with electroplated gold. The percentage decrease observed is found to be varying from 3.7% to 3.56%. In the case of quad beam configuration where the beams are positioned at the centre on all edges of the proof mass, there is a constant percentage decrease of around 3.64% in cross axis sensitivity for the structure with gold as the width of the beam is varied. For the quad beam configuration 3, as the width of the beam is increased there is an increase in spring constant while a decrease in cross axis sensitivity is observed. 015, IRJET ISO 9001:008 Certified Journal Page 54

International Research Journal of Engineering and Technology (IRJET e-issn: 395-0056 Volume: 0 Issue: 08 Nov-015 www.irjet.net p-issn: 395-007 From all the previous simulation results it is clear that configuration 1 with beams positioned at the edges of the proof mass has got least cross axis sensitivity. So this structure is best in terms of rotational cross axis sensitivity around X axis. It is clear from Fig-8 that as the length of beam is increased from 00μm to 000μm there is a decrease in cross axis sensitivity which is lesser for structure with electroplated gold. For multiple suspension beam configuration 1 there is a percentage decrease in cross axis sensitivity from 3.7% to 3.5% for the structure without gold. The simulation results shows that structure with electroplated gold has less cross axis sensitivity than the structure without gold for configuration. It is observed that there is a constant decrement in cross axis sensitivity around 3.58%. For quad beam configuration 3, as the length is increased there is a decrease in spring constant from 86.07% to 1.94% for the structure with gold. Also it can be deduced that the increase in rotation is lesser for structure with electroplated gold and a percentage decrease in rotation from 3.49% to 3.54% is observed. Fig -8: Variation of rotational cross axis sensitivity of proof mass and spring constant for X axis acceleration with length of the beam Fig -10 : Variation of rotational cross axis sensitivity of proof mass and spring constant for X axis acceleration with width of the beam In the case of multiple suspended beam configurations where the beams are positioned at the edges of the proof mass, when thickness of the beam is varied from 10μm to 60μm, there is percentage reduction in cross axis sensitivity from 3.4% to 3.65% for the structure with gold as shown in Fig-9. For configuration, the percentage decrease in cross axis sensitivity for the structure with electroplated gold is observed is of a constant value of around 3.63%. The percentage reduction in cross axis sensitivity for the structure with electroplated gold was observed to be varying from 3.49% to 31.6% in the case of configuration 3. As the width of the beam is increased from 50μm to 500μm, in configuration, there is a percentage reduction in cross axis sensitivity for the structure with gold. The percentage decrease observed is found to be varying from 3.7% to 3.56% as shown in Fig-10. In the case of quad beam configuration where the beams are positioned at the centre on all edges of the proof mass, there is a constant percentage decrease of around 3.64 % in cross axis sensitivity for the structure with gold as the width of the beam is varied. For the quad beam configuration 3 as the width of the beam is increased there is an increase in spring constant while a decrease in cross axis sensitivity is observed. From the graph, we can deduce that there is a percentage decrease in cross axis sensitivity for the structure with electroplated gold which is found to be 3.63%. 3. CONCLUSIONS Fig -9 : Variation of rotational cross axis sensitivity of proof mass and spring constant for X axis acceleration with thickness of the beam A comparative study of sensitivity analysis of 3 different accelerometer structures is discussed in this paper. Effect of electroplated gold on these structures has been studied. It can be clearly deduced from the simulation results that configuration 3 where the beams are placed at the corners 015, IRJET ISO 9001:008 Certified Journal Page 55

International Research Journal of Engineering and Technology (IRJET e-issn: 395-0056 Volume: 0 Issue: 08 Nov-015 www.irjet.net p-issn: 395-007 of the proof mass has the least cross axis sensitivity around Y axis. REFERENCES [1] Kal S, Ganguly A and Boni A, An embedded system for pollution control in automobiles by using a MEMS acceleration signal, Proc. 10th IEEE Int. Conf. on Emerging Technologies and Factory Automation, ETFA (Catania, Italy, 005. [] Roushan R T, Saha G, Boni A and Kal, FPGA implementation of automobile pollution control system using a MEMS accelerometer, IEEE Int. Conf. Industrial Technology (Mumbai, India, 006. [3] Roylance L M and Angell J B, A batch fabricated silicon accelerometer, IEEE Trans. Electron Devices 6 1911 7, 1979. [5] Pak J J, Kabir A E, Neudeck G W and Logsdon J H, A bridge-type piezoresistive accelerometer using merged epitaxial lateral overgrowth for thin silicon beam formation, Sensors Actuators A 56 67 71,1996. [6] Chen H, Bao M, Zhu H and Shen S, A piezoresistive accelerometer with a novel vertical beam structure Sensors Actuators A 63 19 5, 1997. [7]Sim J-H, Cho C-S, Kim J-S, Lee J-H and Lee J-H, Eightbeam piezoresistive accelerometer fabricated by using a selective porous-silicon etching method, Sensors Actuators A 66 73 8, 1998. 015, IRJET ISO 9001:008 Certified Journal Page 56