Spectroscopic studies ofthe electrical structure oftransition metal and rare earth complex oxides

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Available online at www.sciencedirect.com Physica E 21 (24) 712 716 www.elsevier.com/locate/physe Spectroscopic studies ofthe electrical structure oftransition metal and rare earth complex oxides G. Lucovsky a;, Yu Zhang a, J.L. Whitten b, D.G. Schlom c, J.L. Freeouf d a Department of Physics, North Carolina State University, Raleigh, NC 27695, USA b Department of Chemistry, North Carolina State University, Raleigh, NC, USA c Department of Materials Science, Penn. State University, College Park, USA d Department of Electrical Engineering, Oregon Graduate Institute, Portland, OR, USA Abstract Spectroscopic studies oftransition metal (Tm) and rare earth (Re) oxides, combined with ab initio theory identify the band edge electronic structure ofhigh-k dielectrics. The lowest conduction band states are derived from anti-bonding Tm (Re) d -states. A novel method for obtaining independent control of band gap energies and dielectric constants in complex oxides, ReTmO 3, results from coupling of Tm and Re atom d-states bonded to the same oxygen atom.? 23 Published by Elsevier B.V. PACS: 71.15.Nc; 71.15.Qe; 78.2. e; 78.4. q; 78.7.Dm Keywords: High-K dielectrics; Transition metal oxides; Rare earth oxides; Complex oxides 1. Introduction The band edge electronic structure ofthe group IVB Tm oxides, TiO 2 ; ZrO 2, and HfO 2, has been studied by X-ray absorption spectroscopy (XAS) and vacuum ultra-violet spectroscopic ellipsometry (VUVSE). Combined with ab initio calculations, these studies provide the basis for a quantitative understanding of an empirically determined scaling ofband gap, and band oset energy with respect to Si as function of Tm or Re atomic d-state energies. Based on scaling, and conrmed by experiment, elemental oxides, and silicate and aluminate alloys containing Sc, Ti, Ta and Nb have band oset energies too small ( 1eV) Corresponding author. Tel.: +1-919-515-3468; fax: +1-919- 515-7331. E-mail address: gerry lucovsky@ncsu.edu (G. Lucovsky). for achieving the low levels of tunneling required for advanced devices in spite of5-fold increases in thickness relative to SiO 2. Spectroscopic studies ofgdsco 3 provide an additional dimension to scaling issues. It is shown that the coupling ofre and Tm d-states through bonding to a common C-atom increases minimum band gaps and conduction band oset energies with respect to Si, identifying a novel approach for atomic engineering ofadvanced gate dielectrics. 2. Spectroscopic studies of group IVB Tm oxides and GdScO 3 The lowest conduction band states ofzr(hf)o 2 as determined from XAS [1], and VUVSE measurements [2] are associated with Zr(Hf) 4(5)d -states and are 1386-9477/$ - see front matter? 23 Published by Elsevier B.V. doi:1.116/j.physe.23.11.111

G. Lucovsky et al. / Physica E 21 (24) 712 716 713 Table 1 Measured and calculated (italics) d d and d s splittings (±:2 ev) Oxide Zr M 2;3 HfN 2;3 d d (d s ) O K 1 Edge d d (d s) Band Edge d d (d s ) ZrO 2 2.5 (12) 1.9 (12.6) 1.5 (4.) 1.5 (3.5) 1:4 ( 2) 1.3 (1.3) HfO 2 2 (1) 1.3 (1.4) 1.5 (4.) 1.6 (3.) 1:4 ( 2) 1.3 (1.5) absorption (arb.units) (a) 1.4 1.3 1.2 1.1 1..9.8.7 398 4 42 44 46 48 41 absorption constant (cm -1 ) 1.E+7 1.E+6 1.E+5 1.E+4 1.E+3 1.E+2 1.E+1 4 5 6 7 8 9 (c) absorption (arb.units) (b) 2. 1.8 1.6 1.4 1.2 1..8.6.4.2 525 53 535 54 54 % transmission 7 6 5 4 3 2 1 3.5 4 4.5 5 (d) 5.5 Fig. 1. GdScO 3 spectra: (a) L 2;3 spectrum for Sc, (b) O K 1 edge spectrum, (c) absorption constant, and (d) intra 4flevel transitions. presented in Table 1. Fig. 1 displays the XAS, VUVSE and optical absorption measurements for crystalline GdScO 3 [3]. The features in the Sc L 2;3 spectrum in Fig. 1(a) are due to localized transitions between spin orbit split Sc 2p 1=2 and 2p 3=2 states, and symmetry split Sc 3d states. The features at 532:5 and 536 ev in the O K 1 edge in Fig. 1(b) are associated, respectively, with transitions to d - and s -states. Based on its width the lower energy feature is Sc 3d -like, but also includes Gd 5d. The splitting between these states of 3:5 ev is smaller than the splittings of 4: evin ZrO 2 (4d 5s ) and HfO 2 (5d 6s ). Fig. 1(c) displays the band edge optical absorption constant,, as a function of photon energy obtained from analysis ofvuvse data. The transmission spectrum in Fig. 1(d) establishes that features between about 4.8 and 5:8 ev are due to intra-4flevel transitions characteristic of the half-occupied 4f-shell of Gd [4]. The threshold for absorption at 5:7 ev in Fig. 1(c) marks the onset oftransitions to the lowest d -state, and the rapid rise ofabsorption at 6 ev, the onset oftransitions to s -states. 3. Ab initio calculations The spectra for the group IVB oxides have been interpreted through ab initio calculations [5]. The calculations are done initially via a self-consistent eld (SCF) Hartree Fock calculation with a single determinant wave function, not including electron correlation. Following this, there is a conguration

714 G. Lucovsky et al. / Physica E 21 (24) 712 716 energy relative to valence band edge (ev) 1 ZrO2 TiO 2 5-5 -1 4d * σ 4d* π 4d π 4d σ 3d* σ 3d* π 3d π 3d σ Fig. 2. Calculated band edge electronic structure ofzro 2 and TiO 2. Energies are referenced to the top of the valence band. interaction (CI) renement ofthe bonding orbitals based on a multi-determinant expansion wave function, and including electron correlation. This method has been applied to small clusters that include bonding ofa Tm atom to O neighbors terminated by H. Calculations have been made for the ground state energy, and the Tm K 1, the Tm X 2;3 (X = L; M and N) the O K 1, and the AO 2 (A = Ti; Zr and Hf) band edge transitions. Comparisons between the ab initio calculations for d d and d s splittings ofthe lowest anti-bonding states and experimental data in Table 1 are in excellent agreement. The calculated band edge electronic structure for ZrO 2 and TiO 2 are included in Fig. 2 with the lowest band gap energies determined from experiment. Energies in Fig. 2 are referenced to the top of the valence band, which is comprised ofo 2p non-bonding states. In order ofincreasing binding energy the valence band states are non-bonding O 2p, and 3d Ti (4d Zr) and 3d Ti (4d Zr) states bonded with O 2p or orbitals. The overlap is larger for Ti 3d-O/2p -bonding than for Zr 4d/O 2p -bonding, hence the energy dierence of 2 ev. The separation ofconduction band d-states comes from the calculations, and the relative energy ofthe lowest conduction band states is from experiment. The energies of the lowest Tm conduction band states have a reversed = ordering, and their energies relative to the atomic Ti 3d and Zr 4d states are smaller. conduction band offset (ev) minimum band gap (ev) (a) (b) 6 5 4 3 2 1 2.5 2 1.5 1.5-14 -13-12 -11-1 -9-8 -7-6 atomic d-state energy (ev) -.5-12 -11-1 -9-8 -7-6 atomic d-state energy (ev) Fig. 3. (a) Empirical scaling ofband gaps versus atomic d-state energy (b) Empirical scaling ofconduction band oset energies with respect to Si versus atomic d-state energy. Solid line trend for transition metal oxides, dashed line predicted scaling for complex oxides with d-state coupling. The most important aspect offig. 2 is the energy dierence of 2 ev between the atomic d-states, 11:1 ev for the Ti 3d state and 8:13 for the Zr 4d state, and the respective, lowest anti-bonding states. This explains the approximately linear dependence of the elemental oxide band gaps with the energies ofthe respective atomic d-states (see Fig. 3) in the energy range between 11 and 8 ev. This range includes in order ofincreasing (more positive) d-state energy, Ti, Nb, Ta, Sc, Zr and Hf. The bending over at higher energies, e.g., for Y (or La), is a manifestation of

G. Lucovsky et al. / Physica E 21 (24) 712 716 715 Tm (or Re)-d Tm-d O 2p π nb O 2p π nb Tm-d* πb σb Tm (or Re)-d Tm-d bonding coupled Tm&Re-d* Re-d πb coupled Tm&Re-d b bonding σ Fig. 4. Schematic representation ofmolecular orbitals for band edge electronic structure for elemental transition metal and rare earth oxides, and for complex oxides with d-state coupling through O atoms. increased overlap between higher lying (n + 1) s -states, and the n d- band. The attening out at lower energy occurs for oxides that are not high-k candidates. Based on the results presented in Ref. [7], the minimum band gap in GdScO 3 is associated with transitions to Sc 3d -anti-bonding states and is 4:3 ± :1 ev[6]. Scaling arguments suggest the lowest band gap in GdScO 3 should be at approximately the same energy, 4:5 ev, rather than at the measured value of 5:7 ev. 4. Interpretation of the spectra for GdScO 3 The lowest band gap in GdScO 3 is at 5:7 ev and this represents a marked departure from the empirical scaling discussed above. The local bonding in GdScO 3 includes arrangements in which Gd and Sc atoms are bonded to the same O atom. This promotes a mixing of Sc 3d-states and Gd 5d-states, which changes the band edge electronic structure as shown schematically in Fig. 4. The upper part ofthe gure illustrates bonding in elemental Tm (Re) oxides such as Sc 2 O 3 (Gd 2 O 3 ) in which Tm or Re atoms are bonded to a common O atom. The lower portion illustrates bonding in complex oxides in which Tm and Re atoms are bonded to the same O atom. For GdScO 3, the overlap between Sc 3d states and O 2p states is greater than for Gd 5d states. These overlaps shift the valence band, and anti-bonding states from their values in the respective end member oxides. Based on these overlaps, the valence band -states are at intermediate energies with respect to the corresponding elemental oxide states, increasing the energy ofthe lowest conduction band states with respect to Sc 2 O 3. The basis for the scaling of Re/Tm complex oxide band gaps and band osets with d-states energies is developed from comparisons between GdScO 3 and ZrO 2, where the onset ofstrong absorption occur at 5:7 ev, suggesting that GdScO 3 has a band gap characteristic ofa 4d Tm oxide. In this context the average atomic d-state energy ofsc and Gd is 8: ev, approximately equal to the d-state energy ofzr, 8:13 ev. Additionally, the band gaps of ScO 3, 4:3 ev, and Gd 2 O 3 ; 6:3 ev, average to 5:3 ev. This suggests a virtual crystal model for complex Tm/Re oxides in which d-states ofthe constituent atoms are coupled through bonding to the same O atoms. Bonding in Tm/Re silicates and aluminates is qualitatively dierent, and this has been addressed in Ref. [1]. The energies ofzr and Si core states track across Zr silicate alloys with a constant separation [7]. This is equivalent to the dierence between the band edge transitions between O 2p non-bonding states and Zr 4d and Si 3s states maintaining a constant energy. Tm/Re silicate and aluminate alloys are then 2-band systems, where conduction band energies are maintained at relative end-member oxide levels, but absorption strengths scale with relative concentration. The complex ReTmO 3 display a qualitatively dierent 1-band behavior. However, oxides ofgd 2 O 3 and Sc 2 O 3, with other than a 1:1 ratio are expected to display spectra characteristic ofmore than one d-state bonding group; Sc 2 O 3 -rich alloys should display multiple d -state features characteristic ofsc O Sc, and Sc O Gd bonding. 5. Discussion Fig. 4 includes the application ofthe virtual crystal model to complex oxides. The square point is the experimental value for GdScO 3 and is plotted at the Sc atomic d-state energy of 9:35 ev. The

716 G. Lucovsky et al. / Physica E 21 (24) 712 716 diamond shape point is calculated for a HfO 2 (5d) TiO 2 (3d), 1:1 alloy, TiHfO 4, where the predicted band gap is 4:45 ev, the average ofhfo 2 (5:8 ev) and TiO 2 (3:1 ev). Conduction band oset energies are estimated on the basis ofthe same model. GdScO 3 is equivalent to ZrO 2 with an oset of 1:5 ev, and Hf(Zr)TiO 4 is expected to have an oset energy of approximately 1 ev, whilst a Ta 2 O 5 2HfO 2 alloy may have an oset as high as 1:4 ev. References [1] G. Lucovsky, et al., J. Vac. Soc. Technol. B 2 (22) 1739. [2] S-.G. Lim, et al., Appl. Phys. 91 (22) 45. [3] J.H. Haeni et al., unpublished. [4] D.S. McClure, Electronic Spectra ofmolecules and Ions in Crystals, Academic Press, New York, 1959. [5] Y. Zhang, G. Lucovsky and J.L Whitten, unpublished. [6] H.H. Tippins, J. Phys. Chem. Solids 27 (1966) 169. [7] G.B. Rayner Jr., et al., J. Vac. Sci. Technol. B 2 (22) 1748.