Comprehensive Integrated Simulation and Optimization of LPP for EUV Lithography Devices

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Comprehense Inegraed Smulaon and Opmaon of LPP for EUV Lhograph Deces A. Hassanen V. Su V. Moroo T. Su B. Rce (Inel) Fourh Inernaonal EUVL Smposum San Dego CA Noember 7-9 2005 Argonne Naonal Laboraor Offce of Scence A Offce of Scence Laboraor Operaed b The Uners of Chcago

Oulne HEIGHTS-EUV Modelng Capables Laser Produced Plasma Smulaon Phscal and Numercal Model Laser Absorpon Targe Geomer Sngle Laser Smulaon Resuls Mul-Laser Confguraons Conclusons Poneerng Scence and 2 Offce of Scence

Varous HEIGHTS Research Areas Poneerng Scence and Offce of Scence

Inegraed EUV Modelng HEIGHTS-EUV: EUV: Comprehense Smulaon Proec Poneerng Scence and Offce of Scence

3-D D HEIGHTS-LPP Capables 3D TVD Mehod and Formulaons for MHD 3D Implc Scheme of sparse mar for Hea Conducon Smulaon 3D Mone Carlo Mehod for Radaon Transpor Modelng (wegh facors) for Connuum & Lnes 3D Mone Carlo Model for Laser Absorpon n Plasma Smulaon MPI Implemenaon for Mul-Processor Machnes Poneerng Scence and 5 Offce of Scence

3-D D Laser-Targe Ineracon Unlmed Full 3-D Geomer of Targe/Dece Mulple Laser Beam Ssems Each Has Own Parameers: - Sar me emporal power dsrbuon - Sar pon n space spaal power dsrbuon - Focus pon of laser beam - Drecon of laser beam s unlmed Dealed Treamen of Laser Reflecon/Absorpon processes Parallel Implemenaon of Varous Modules of HEIGHTS-LPP Poneerng Scence and 6 Offce of Scence

Poneerng Scence and Offce of Scence 7 Hdrodnamc (2 Hdrodnamc (2-T Approach) T Approach) ( ) ( ) ( ) [ ] ( ) [ ] ( ) [ ] ( ) [ ] ( ) [ ] ( ) [ ] ( ) e h rad las h e h Q Q p e p e p e e Q Q Q Q p e p e p e e p p p 2 2 2 0 0 0 0

Poneerng Scence and Offce of Scence 8 Plasma Hea Conducon Plasma Hea Conducon n n n n n n n D T A T A T A T A T A T A T A ( ) K A 2 ( ) K A 2 ( ) K A 2 ( ) K A 2 ( ) K A 2 ( ) K A 2 ( ) ( ) ( ) ( ) ( ) ( ) n n n K K K K K K c A 2 2 2 2 2 2 2 n n n n T c D 2 K hermal conduc coeffcen c specfc hea dens D T A 0 T K e

HEIGHTS Aomc Phscs Models Poneerng Scence and Offce of Scence

Dscree Ordnae Radaon Transpor 3D Radaon Transpor Coupled o MHD Mar Clndrcal Geomer Specfed Drecons Spannng Toal Sold Angle Hgh-Order Gaussan Inegraon (up o 96 96 angles) d I d E κ em B E κ abs I E S rad 2π π d I E ϕ 0 0 ( θ ϕ ) cosθ snθ dθ de I B κ E E em radae nens ϕ θ drece angles 3 2hE Planc funcon 2 E T c e κ emsson and absorpon coeffcens abs c speed of lgh h Planc consan Bolman consan. Poneerng Scence and 0 Offce of Scence

Mone Carlo Radaon Transpor N em 3D Radaon Transpor n Clndrcal Geomer Opmed Wegh Facors Drec Smulaon of Emsson Transpor and Absorpon of Phoons n he Doman Up o 000000 Emed Phoons from Each Cell κ number of emed phoons; [ E E ] E phoon energ; T emperaure and dens of κ em em abs E E ( E ) h π c 2 em N 3 2 2 E T e E de ma 0 N mn mn ( E L) N ( E) ma emsson and absorpon coeffcens; energ range; ( E l ) he plasma; h Plan consan c speed of lgh L phoon absorpon lengh. em e L abs dl Poneerng Scence and Offce of Scence

Mone Carlo Radaon Transpor Poneerng Scence and 2 Offce of Scence

Laser-Drople Targe Ineracon Varous se dameer of drople arge Pre-pulse for arge preheang Varous laser wae lengh Dfferen pulse duraons Dfferen npu energes Square or Gaussan laser beam power dsrbuon n me and space Poneerng Scence and 3 Offce of Scence

Laser Pulses Conrol n Tme Poneerng Scence and 4 Offce of Scence

Laser-Drople Ineracon Poneerng Scence and 5 Offce of Scence

EUV Emsson Zone (Sn Drople) Poneerng Scence and 6 Offce of Scence

CE Dependence on Laser Waelengh Poneerng Scence and 7 Offce of Scence

Mul-Laser Confguraons Targe: Sn drople 00 µm 3 Lasers wh drecon angles: Θ -aal angle ϕ angle beween lasers (20 ) Laser parameers: spo on arge 00 µm pulse duraon 0 ns square n me Gaussan n space Poneerng Scence and 8 Offce of Scence

Temperaure and Radaon Flues Poneerng Scence and 9 Offce of Scence

CE of -Laser Vs. 3-Laser 3 Deces Poneerng Scence and 20 Offce of Scence

Temperaure (sde ew) Poneerng Scence and 2 Offce of Scence

Temperaure (op ew) Poneerng Scence and 22 Offce of Scence

Pea Temperaure (ev) Poneerng Scence and 23 Offce of Scence

Dens (sde ew) Poneerng Scence and 24 Offce of Scence

Dens (op ew) Poneerng Scence and 25 Offce of Scence

EUV Source Area (sde ew) Poneerng Scence and 26 Offce of Scence

EUV Source Area (op ew) Poneerng Scence and 27 Offce of Scence

Dependence of CE on Angle θ Poneerng Scence and 28 Offce of Scence

Conclusons HEIGHTS-LPP Pacage s epanded o full 3-D modelng of Laser produced plasma deces Parallel MPI erson of HEIGHTS s deeloped and esed Imporance of 3D effecs n he EUV emsson was shown Increasng of CE can be obaned b usng mul- laser confguraons Furher opmaon sudes are needed for source parameers debrs mgaon and collecor ssems lfeme Poneerng Scence and 29 Offce of Scence