RF/Microwave Discharge Plasma for Mercury-Free Lighting

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J-STAGE Advanced published date: September 19, 2014, Paper RF/Microwave Discharge Plasma for Mercury-Free Lighting Ahmad Nazri DAGANG*, **, Hideki MOTOMURA** and Masafumi JINNO** * ** ABSTRACT This research focused on the development of a mercury-free light source through the use of radio frequency (RF) and microwave discharges. RF at 13.56 MHz and microwave at 2.45 GHz were applied to generate the plasma. With the use of this kind of high frequency power generator, plasma can be ignited without using the electrodes inside the chamber or discharge tube, which could significantly increase the lamp lifetime. The potential for high luminance, excellent colour rendering and environmental-friendliness makes xenon the most promising candidate as the replacement for the mercury fluorescent lamp. In this research, RF energy at 13.56 MHz was induced to the cylindrical discharge tube in order to investigate the characteristics of the xenon RF-inductively coupled plasma discharge as a light source. The luminance, spectral distribution and colour rendering index were measured. The values of the luminance and colour rendering index were comparative to the values for a conventional discharge lamp. For microwave plasma, in order to develop a planar-type lamp, surface wave plasma was applied. A few types (transverse, inclined, longitudinal) of slot antennas were tested and the lamp brightness and discharge uniformity were evaluated. The chamber window (front or rear) was coated with a three-colour phosphor from the combination of red, green and blue phosphors and the excitation effect was investigated. From phosphor coating and slot structure optimisations, lamp luminance and discharge uniformity could be improved. KEYWORDS: inductively coupled plasma, surface wave plasma, mercury-free, electrode-less discharge, xenon 22

Figure 1 Connection diagram for luminance and spectrum measurements 23

Figure 2 Diagram of chamber used in the experiment Figure 4 Slot antenna structures Figure 3 Setup diagram for surface wave plasma discharge λ λ ν ω ν ω ν ω ν ω 24

π Table 1 Xenon pressures and calculated luminous flux Figure 6 Relation between CRI value and gas pressure, xenon ICP at 100 W Figure 7 Relation between CRI value and gas pressure, wavelength at 300 780 nm, xenon pressure at 0.2 Torr, input power at 100 W, R a 95 Figure 5 Relation between luminance and gas pressure at 50 W and 100 W Figure 8 Relation between CRI value and gas pressure, wavelength at 300 780 nm, xenon pressure at 1 Torr, input power at 100 W, R a 63 25

Figure 9 Discharge image and image processing for slot A Figure 11 Discharge image and image processing for slot C Figure 10 Discharge image and image processing for slot B Figure 12 Discharge image and image processing for slot D Table 2 Discharge brightness and uniformity (without phosphor) 26

Figure 13 Relation between luminance and input power at 0.3 Torr, with and without phosphor (phosphor coated on front window) Figure 14 Relation between luminance and gas pressure at 300 W, with and without phosphor (phosphor coated on front window) Figure 15 Discharge images for three conditions, (a) without coating 900 cd m 2, (b) front coating, 982 cd m 2, (c) rear coating 5248 cd m 2 at 0.5 Torr 27

νω σ ω σ ω v e v e 2 ev m 5 1 5.931 10 ms - 2eV m 6 1 1.489 10 ms - σ ν ω νm n σmve P P nkt, n, ( T 300 K) kt P ω σmve kt ωkt P, Te 1 ev σmve = 0.311 Torr ωkt P, Te 6.25 ev σmve 0.0045 Torr 28