Searching for functional oxides using high-throughput ab initio screening

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11 th Korea-US Forum on Nanotechnology Searching for functional oxides using high-throughput ab initio screening Kanghoon Yim, Joohee Lee, Yong Youn, Kyu-hyun Lee, and Seungwu Han Materials Theory and Computation Group Department of Materials Science and Engineering Seoul National University

Introduction Battery (Ceder group) Catalyst (Norskov group)

Automatic computation of material properties Complexity level of modeling I II III IV Property Lattice parameter, band structure (energy gap, effective mass), elastic constant, phonon, dielectric constant, absorption coefficient,.. Point defect (formation energy, transition level, migration energy), surface (exposed to vacuum), Defect complex, doping, Interface (band alignment)

Automation package Automation script module (compatible with VASP) Program Input Output icsd.py ICSD# or elements (valid ICSD account) POSCARs param.py Crystal structure E cut or PREC, k-point set for convergence of total energy, stress, force relax.py band.py epsilon.py Crystal structure Parameter set Crystal structure Parameter set Crystal structure Parameter set (Fully) relaxed structure -Band structure (plotting) -Band gap (line or full 3-d search, one-point hybrid) Optical and/or static dielectric tensor to be open at http://mtcg.snu.ac.kr

High-throughput ab initio screening I: high-k dielectrics HfO 2 and ZrO 2 are already being used as high-k dielectrics in transistors and capacitors of recent CPUs and DRAMs

Ideal gate dielectrics Cooler Ideal condition for gate dielectrics Faster If we search over a larger material database, possibly all oxides, is there any material that possess both large band gap and high K? Only dozens of oxides are experimentally known for both band gap and K values. Modern ab initio codes and computing environment may enable collection of a much larger database.

ICSD (Inorganic Crystal Structure Database) Abundant inorganic crystal structure data (161,000 structures) are easily accessible. (as of 2013) - 1,716 crystal structures of the elements - 30,968 records for binary compounds - 60,640 records for ternary compounds - 56,730 records for quarternary and quintenary compounds Number of oxides - binary oxides: 2,830 records - ternary oxides: 16,270 records Due to the large number of candidate structures, we need to automatize the computational procedure.

Computational strategy (ev) a Select elements O Inorganic Crystal Structure Database Al Hf } Pre-screening of structures Ab initio calculations { Band gap Conduction Valence Ionic relaxation Equilibrium structures Static dielectric constant Property database b 11 10 9 8 7 Flash VASP was used for the ab initio calculations. Ba 3 (PO 4 ) 2 CaB 4 O 7 AlO(OH) YBO 3 AlLiO 2 AlO(OH) Sr 3 (PO 4 ) 2 CPU c-beo

Computational cost Calculated data from more than 1,500 structures are collected over effectively 1 year or so. (~500 structures are metallic within GGA) Computational resources - Quadcore Intel Xeon 2.50 GHz (E5420) - 8 nodes (64 cores) Average computational costs ~ 130 CPU hours per structure or ~ 8 structures per day Time cost Structure relaxation Band gap (GGA) Band gap (HSE) Dielectric constant % 6 21 43 30

Energy gap (ev) Results b 11 10 9 8 7 6 5 4 3 2 1 0 Ba 3 (PO 4 ) 2 CaB 4 O 7 YBO 3 AlLiO 2 Property database ~1,500 oxides Flash Sr 3 (PO 4 ) 2 AlO(OH) Na 2 SO 4 AlO(OH) t-hfo 2 NaIO 3 CPU K 2 W 2 O 7 10 100 1000 Dielectric constant DRAM c-beo NbOCl 3 NbOCl 3 [DRAM] - f FOM > 210 - E g > 3 ev and κ > 30 [CPU] - f FOM > 210 - E g > 4 ev - E vac > 5.6 ev [Flash] - f FOM > 80 - E g > 6 ev Figure of merit: 10 80 210 1000 (>1000) FOM = (band gap)x(dielectric constant)

c-beo [Binary oxide] c-beo (rocksalt) w-beo Phase transition at P > 137 GPa 2 Be-O bond length is 0.16A longer than w-beo ΔE/atom = 480 mev at 0K ε 0 : 276 E g : 10.0 ev ε 0 : 6.9 E g : 9.3 ev Phonon dispersion curve f = 9.96 THz f = 3.48 THz 2 Y. Mori et al, Phys. Stat. Sol. (b), 241, 14 (2004)

[Ternary oxides] AlO(OH) Na 2 SO 4 ε : 4.7 ε 0 : 18.4 E g : 5.7 ev ε : 2.3 ε 0 : 20.7 E g : 6.9 ev Two common features for ternary higher-k candidates 1 2 Cations in edge-shared octahedra cage Edge-shared anion octahedra form loose cages. Cations in the cages vibrate with soft phonon frequency. Channeled structure by strong covalent oxide unit Strong covalent oxide unit + loosely bound cation Channeled structure : ions easily vibrate along the channel that is not blocked by other ions.

Support vector regression Support vector regression on 152 binary oxides over a wide range of band gap. Four properties (Z, NN distance, effective CN, Bader charge) are selected for the Gaussian-type regression model. N é E g ({X}) = åa i expê- 1 2s X - X 2 i i=1 ë 2 ù ú û 4/5 used in training In collaboration with Samsung Advanced Institute of Technology

Photoabsorber for solar cell name E g (ev) name E g (ev) Sr 3 GeO 0.82 Cd 3 TeO 6 1.99 Sr 3 SiO 0.86 K 4 OBr 2 2.05 WOCl 3 0.98 Cd 2 Sb 2 O7 2.09 Ag 2 BiO 3 1.13 MoO 3 2.17 Tl 2 O 1.16 K 3 OCl 2.19 Hg 3 O 2 Cl 2 1.23 MoO 3 2.20 Ag 2 HgO 2 1.31 Hg 4 O 2 (NO 3 ) 2 2.26 Rb 4 Br 2 O 1.56 CdGeO 3 2.27 Rb 2 Sn 2 O 3 1.74 SnO 2 2.29 direct band gap, 0.8 ev < E g < 2.4 ev LiAg 3 O 2 1.84 WO 3 2.31 Sb 2 OS 2 1.94 LiNbO 2 2.37

High-throughput ab initio screening II: dopants in ZnO Carrier concentration control for electrode applications <Transparent conductor> Conventional dopant: Al, Ga, In, Mn, Co, B, rare earth A. Zakutayev et al., Appl. Phys. Lett. 103, 232106 (2013) : Heavily doped-zno has High conductivity (ρ ~ 10-4 Ωcm) comparable to ITO (0.72 10-4 Ωcm)

Dopant in ZnO Band gap engineering and facilitate absorption of visible light Reliable and reproducible p-type doping Diluted magnetic semiconductor of transitionmetal doped ZnO Conventional dopant : N, C, F, transition metal Conventional dopant : N, P, Mg, Cd, transition metal M. Opel et al., Phys. Status Solidi B 251 (2014) Conventional dopant : transition metal, Li S. Rehman et al., J. Hazard. Mater. 170 (2009) D.C. Look et al., Semicond. Sci. Technol. 20 (2005) P. Sharma et al., Nat. Mater. 2 (2003)

Dopants in ZnO We wish to calculate: Stable dopant site Solubility limit Band gap and carrier density

Possible doping sites Interstitial sites Substitutional sites - Octahedral site (AB ) - Tetrahedral site (AB ) Split-interstitial - Cation site - Anion site

Work flow to find stable doping sites

Preliminary results on Li dopant Formation energy (ev) Formation energy (ev) Fermi level (ev) Fermi level (ev)

High-throughput ab initio screening III: band alignment of oxides Formation energy (ev) H(+/ ) level Formation Energy of MgO:H (GGA) H- H0 H+ H(+/ ) level VBM E F (ev) CBM C. G. Van de Walle et al, Nature 423, 626 (2003) H + stable configuration H - stable configuration - H(+/-) level as the charge neutrality level (CNL) can be a reference level to align relative band positions of solids.

Summary We are developing programs for automatic high-throughput ab initio computations With decent computational resources, it is possible to compute a certain bulk property with the speed of ~500 structures per month. We built a materials map related to band gap and dielectric constants and found several candidate high-k dielectrics that worth experimental investigation. We are expanding the automated ab initio screening to find suitable dopants in ZnO and band alignment of various oxides.