Tunable Electrical Conductivity of Individual Graphene Oxide Sheets Reduced at Low Temperatures

Similar documents
Solvothermal Reduction of Chemically Exfoliated Graphene Sheets

Efficient Preparation of Large-Area Graphene Oxide Sheets for Transparent Conductive Films

Characterization of Thermally Reduced Graphene Oxide by Imaging Ellipsometry

Vertical Alignment of Reduced Graphene Oxide/Fe-oxide Hybrids Using the Magneto-Evaporation Method

Space charge limited conduction with exponential trap distribution in reduced graphene oxide sheets

Nano-Flower MnO 2 Coated Graphene Composite Electrodes for Energy Storage Devices

Edge chirality determination of graphene by Raman spectroscopy

Supplementary Figure S1. AFM images of GraNRs grown with standard growth process. Each of these pictures show GraNRs prepared independently,

Fast and facile preparation of graphene. oxide and reduced graphene oxide nanoplatelets

Figure 1: Graphene release, transfer and stacking processes. The graphene stacking began with CVD

Physics of Nanotubes, Graphite and Graphene Mildred Dresselhaus

Supplementary Information. Experimental Evidence of Exciton Capture by Mid-Gap Defects in CVD. Grown Monolayer MoSe2

A. Optimizing the growth conditions of large-scale graphene films

Synthesis and Characterization of Graphene by Raman Spectroscopy

AN IMPROVED METHOD FOR TRANSFERRING GRAPHENE GROWN BY CHEMICAL VAPOR DEPOSITION

Supplementary Information

Nitrogen-doped graphene and its electrochemical applications

Wafer Scale Homogeneous Bilayer Graphene Films by. Chemical Vapor Deposition

Evolution of graphene growth on Cu and Ni studied by carbon isotope

A new method of growing graphene on Cu by hydrogen etching

TRANSVERSE SPIN TRANSPORT IN GRAPHENE

Application Note. Graphene Characterization by Correlation of Scanning Electron, Atomic Force and Interference Contrast Microscopy

SUPPLEMENTARY INFORMATION

Supporting Information

Multicolor Graphene Nanoribbon/Semiconductor Nanowire. Heterojunction Light-Emitting Diodes

Supporting Information Available:

Doped Sites at Basal-Planes

Frictional characteristics of exfoliated and epitaxial graphene

Intrinsic Electronic Transport Properties of High. Information

Preparation of graphene relying on porphyrin exfoliation of graphite

Supporting Online Material for

Transparent Electrode Applications

SUPPLEMENTARY INFORMATION

Supplementary Figure 1: Micromechanical cleavage of graphene on oxygen plasma treated Si/SiO2. Supplementary Figure 2: Comparison of hbn yield.

Supporting Information

Radiation Induced Reduction: A Effect and Clean Route to

Raman spectroscopy at the edges of multilayer graphene

Hopping in CVD Grown Single-layer MoS 2

Supporting Information

Evolution of Graphene Growth on Ni and Cu by Carbon Isotope Labeling

Visibility study of graphene multilayer structures

Production of Graphite Chloride and Bromide Using Microwave Sparks

SUPPORTING INFORMATION: Titanium Contacts to Graphene: Process-Induced Variability in Electronic and Thermal Transport

Supplementary Figure 1 Detailed illustration on the fabrication process of templatestripped

Supplementary Information for. Origin of New Broad Raman D and G Peaks in Annealed Graphene

Graphene Segregated on Ni surfaces and Transferred to Insulators

DEPOSITION OF THIN TiO 2 FILMS BY DC MAGNETRON SPUTTERING METHOD

Resistance Thermometry based Picowatt-Resolution Heat-Flow Calorimeter

Restoring the electrical conductivity of graphene oxide films by UV light induced. oxygen desorption

Band-like transport in highly crystalline graphene films from

SUPPORTING INFORMATION

Ferroelectric Zinc Oxide Nanowire Embedded Flexible. Sensor for Motion and Temperature Sensing

Electronic Supplementary Information

Selective Manipulation of Molecules by Electrostatic Force and Detection of Single Molecules in Aqueous Solution

Carbon Quantum Dots/NiFe Layered Double Hydroxide. Composite as High Efficient Electrocatalyst for Water

Accessible Graphene Aerogel for Efficient Harvesting. Solar Energy

Thermal Transport in Graphene and other Two-Dimensional Systems. Li Shi. Department of Mechanical Engineering & Texas Materials Institute

A Novel Approach to the Layer Number-Controlled and Grain Size- Controlled Growth of High Quality Graphene for Nanoelectronics

Large Scale Direct Synthesis of Graphene on Sapphire and Transfer-free Device Fabrication

Graphene photodetectors with ultra-broadband and high responsivity at room temperature

Raman spectroscopy of graphene on different substrates and influence of defects

Effect of Spiral Microwave Antenna Configuration on the Production of Nano-crystalline Film by Chemical Sputtering in ECR Plasma

For more information, please contact: or +1 (302)

Supplementary Information

Simultaneous Nitrogen Doping and Reduction of Graphene Oxide

Supplementary Figure 1 Dark-field optical images of as prepared PMMA-assisted transferred CVD graphene films on silicon substrates (a) and the one

performance electrocatalytic or electrochemical devices. Nanocrystals grown on graphene could have

Non-destructive and Rapid Evaluation of CVD Graphene

GRAPHENE ON THE Si-FACE OF SILICON CARBIDE USER MANUAL

Effect of Gold Substrates on the Raman Spectra of Graphene

SUPPLEMENTARY INFORMATION

Reduction of Fermi velocity in folded graphene observed by resonance Raman spectroscopy

Supplementary material for High responsivity mid-infrared graphene detectors with antenna-enhanced photo-carrier generation and collection

Electronic Supplementary Information. Experimental details graphene synthesis

Controlling Graphene Ultrafast Hot Carrier Response from Metal-like. to Semiconductor-like by Electrostatic Gating

Supporting Information. by Hexagonal Boron Nitride

Supplementary Information for

SUPPLEMENTARY INFORMATION

Supplementary Figure S1. AFM image and height profile of GO. (a) AFM image

Raman Imaging and Electronic Properties of Graphene

Supplementary Figure 1. Selected area electron diffraction (SAED) of bilayer graphene and tblg. (a) AB

Accepted Manuscript. Lateral Size Selection of Surfactant-Stabilised Graphene Flakes using Size Exclusion

Supplementary Information. High-Performance, Transparent and Stretchable Electrodes using. Graphene-Metal Nanowire Hybrid Structures

Synthesis of Nitrogen-Doped Graphene via Thermal Annealing Graphene with Urea

Supporting Information. Direct Growth of Graphene Films on 3D Grating. Structural Quartz Substrates for High-performance. Pressure-Sensitive Sensor

Graphene-Based Liquid Crystal Device

Journal Name. Supporting Information. Significant enhancement in blue emission and electrical conductivity of N-doped graphene. Dynamic Article Links

Synthesis of Isotopically-Labeled Graphite Films by Cold-Wall Chemical Vapor Deposition and Electronic Properties of Graphene Obtained from Such Films

Raman and optical characterization of multilayer turbostratic graphene grown via chemical vapor deposition

Instrumentation and Operation

Wafer-scale fabrication of graphene

RIPPLE FORMATION ON InP SURFACE IRRADIATED WITH FEMTOSECOND LASER

Graphene films on silicon carbide (SiC) wafers supplied by Nitride Crystals, Inc.

SUPPLEMENTARY INFORMATION

Supporting Information

Supporting information

Supporting Information. Fast Synthesis of High-Performance Graphene by Rapid Thermal Chemical Vapor Deposition

Determining Carbon Nanotube Properties from Raman. Scattering Measurements

Direct Observation of Inner and Outer G Band Double-resonance Raman Scattering in Free Standing Graphene

Supplementary Information

Transcription:

Supporting Information to Accompany: Tunable Electrical Conductivity of Individual Graphene Oxide Sheets Reduced at Low Temperatures Inhwa Jung, Dmitriy A. Dikin,*, Richard Piner, and Rodney S. Ruoff*, Department of Mechanical Engineering, University of Texas at Austin Department of Mechanical Engineering, Northwestern University SI-1. Description of the devices fabrication The devices were fabricated as follows. First, the SiO 2 thin film was grown on a silicon wafer (p-type, (100), resistivity: 0.001 0.005 Ω-cm) by thermal oxidation at 1100 C. The SiO 2 thickness was measured with a spectroscopic ellipsometer (MV-2000; J. A. Woollam, Inc.) at 4 different locations of the wafer and was found to be 305.5 ± 4.7 nm. Alignment marks were then photolithographically (MA6 Mask Aligner from SUSS MicroTec) patterned and deposited (1- nm-thick Ti followed by a 2-nm-thick Au film) on these substrates. Prior to deposition of graphene oxide sheets, the substrate was cleaned by acetone and isopropanol, and then treated in a plasma cleaner (Plasma Preen II-862, Plasmatic Systems, Inc.) with oxygen plasma for 3 min. at 1.2 Torr and approximately 350 Watts. A droplet of a water dispersion of graphene oxide (0.01mg/mL) was placed onto the substrate, and after about one minute the substrate was gently blown with nitrogen gas. This time interval and the graphene oxide concentration in water led to a sparse dispersion of the sheets on the substrate. A confocal microscope (Leica HC) was used to locate the individual graphene oxide sheets on the silica surface. Optimized imaging conditions (543 nm wavelength of laser light; other details are described in Ref. 1 ) allowed for easier detection of single layer sheets based on the enhanced image contrast, as was also discovered and discussed for a visibility of pristine graphene 2-6. Some of the (nominally, individual) sheets were scanned by AFM (Park Scientific AutoProbe CP/MT scanning probe microscope). The minimum measured thickness of the graphene oxide sheets was slightly less than 1 nm. Ambient imaging conditions in combination with the very hydrophilic nature of graphene oxide suggest the possibility of adsorbed water molecules. Based on the acquired optical images, a set of metal electrodes contacting an individual graphene oxide sheet was photolithographically patterned and deposited (5-nm-thick Ti layer 1

followed by 50-nm-thick Au). Thermal reduction of the wired up graphene oxide sheets and their simultaneous electrical measurements were performed inside the vacuum chamber of a scanning electron microscope (Nova NanoSEM600, FEI Co.) at a vacuum of approximately 10-5 Torr. For this purpose, a vacuum-compatible device holder with an integrated heater (UHV heater, model 101124, Heatwave Labs) and thermometer (10 kω thermistor 103JG1F, NTC) was custom-built. The thermometer was calibrated against a thermocouple glued to a similar silicon substrate and placed at the device location (top of the hot plate) in the vacuum chamber. The device was mechanically clamped onto the hot plate by a ceramic screw and washer. A thermally conductive but electrically insulating epoxy bond (Duralco 128 Epoxy resin) was applied between the top of the heating plate and device to secure electrical isolation. Measurements were made by a 4-probe configuration using a current source (model 6221, output resistance >10 14 Ω, Keithley) and two electrometers (model 6514, input resistance >2x10 14 Ω Keithley 6514 electrometer). Using two electrometers and isolated probes eliminated the common-mode leakage current and made the high impedance measurements possible. The backgate potential was supplied by a DC power supply (Agilent 6544A or Agilent E3612A). SI-2. Description of devices and analysis of their conductivity The characteristics for ten devices are summarized in Table S-1. More than 10 devices were tested, and as shown in Table S, three different configurations of electrodes were used. Eight more devices are not shown in this table, from which two had two electrodes, five devices had 4 electrodes, and one device had 6 electrodes. Some of these devices were used for preliminary tests in ambient conditions, and some did not withstand the full set of tests performed, for various reasons. The conductivity of device 7, which was reduced by gas phase hydrazine followed by thermal annealing, was the highest among all measured devices. This result suggests additional studies, which will be published elsewhere. Thin metal electrodes (5-nm-Ti followed by 50-nm-Au) were deposited on naturally (irregularly) shaped sheets of graphene oxide. We have used all possible combinations of current and voltage probes for electrical measurement with the goal of taking into account the shape of the graphene oxide sheets and the electrode positions with respect to the sheet edges in order to get the best estimate the device conductivity. This imperfect van der Pauw configuration 7 did not allow the use of a simple analytical calculation, instead we have applied a 2

numerical method of finite elements (FEM) based on multi-physics modeling software (COMSOL), which we have already used for our high resistance polymer composite samples 8, 9. We have used a two-dimensional model. The conductivity of the electrodes was defined as the conductivity of Au, and the material conductivity was set as an arbitrary (isotropic) value. Insulating boundary conditions were applied to the perimeter of the graphene oxide sheet. The boundary conditions at the electrode cross-section were chosen as either ground, constant, or zero current flow depending on the experimental conditions. The current flow across the boundaries between metal electrodes and graphene oxide was assumed to be normal. Examples of the calculated distribution of electric potential are shown in Figure Sb1 and Sb2. The material sheet resistance was determined by dividing the potential difference between the two electrodes ( V=V1-V2) by the total current flow. The device resistivity was calculated based on an assumed graphene oxide thickness of 1 nm. The procedure for determining device resistivity is shown in the Figure S1c. Based on an assumed value of resistivity for a particular combination of electrodes, the device resistance was calculated and compared with the measured value. The material resistivity (conductivity) is defined to be correct when the error between measured and calculated values converges to within one percent. The measurements and the calculations were repeated for different combinations of current and voltage probes. For example, resistance for device S9 was determined in 12 directions. The combination of the current probes I 5,2 and the voltage probes V 8,11 as shown in Figure S1-(b-1), defines the resistance along the red arrow and the direction a in Figures S1-(b- 1) and S1-(d). The direction b is determined based on the combination of I 6,3 and V 9,12 electrodes, and so on. As one can see in Figure S1-(d), both measured and calculated resistances did not exactly matched along all directions, but they follow each other qualitatively. In the next to last column of the table S1, the ratios between the maximum resistance and the minimum resistance are shown. Although the measured and calculated ratio did not exactly matched, the direction of maximum ratio is aligned for all 4-electrodes devices and deviated only 30 for 12- electrodes device (S9). On the basis of the entire set of data, we have concluded that the apparent anisotropy is a result of the geometry of the sheet and electrodes and other artifacts rather than an intrinsic material property. The values of conductivity for each device reported in Table S1 were obtained as an average value for all calculated directions. 3

SI-3. Raman spectroscopy A scanning confocal Raman microscope (WITec, Ulm, Germany) was used to image a few individual graphene sheets before and after vacuum thermal treatment situated on SiO 2 (Figure S2) and on Si 3 N 4 substrates. Spectra were acquired in ambient conditions using a laser excitation of 532 nm delivered through a single-mode optical fiber. A very low incident power minimizes any heating effect. Under identical experimental conditions Raman spectra were also taken from graphene sheets prepared by the "scotch-tape" technique (Figure S2). In the Raman spectrum of graphene oxide sheets, there are two prominent peaks at 1350 and 1600 cm -1 corresponding to the D and G bands, respectively. Furthermore, one can see the absence of a well-defined 2D peak that is well-known for both graphene and graphite and referred to as the G' peak in other papers (e.g. Ref. 10 ); but there are two small and wide bumps between ~2500 and ~3100 cm -1. It is known 11 that the D-band, a breathing mode of A 1g symmetry, becomes Raman-active in graphite with finite-sized crystallites and is forbidden in perfect graphite, while the G-band peak corresponds to the Raman-allowed E 2g mode, in-plane bond-stretching motion of pairs of sp 2 -bonded carbon atoms 12. According to a modified model 13 of Ref. 11, the in-plane nanocrystalline size, L a, can be estimated by an empirical relation L a [nm] = (2.4x10-10 ) λ 4 (I G /I D ), where I G and I D is the intensity of the G- and D-band peaks respectively, and λ is a wave length of an irradiation in nm units. The graphitic domain size is thus found to be about 3-4 nm in our graphene oxide sheets. The fact is that G and D peaks of varying intensity, position and width are also present in the Raman spectra of disordered, amorphous, and diamond-like carbon (Ref. 14, and references therein). As a consequence of thermal treatment of our graphene oxide sheets, (Fig. 1d) the ratio I G /I D decreased. This might be interpreted as a decrease of the mean size of nanocrystals, L a, although the electrical conductivity increased at the same time by more than 4 orders of magnitude. Similar behavior was seen earlier, on thin films of graphene oxide 15 and reported by others 16, 17. Using XPS analysis, Becerril et al 18 also concluded that a relatively modest increase in the content of non-oxygenated carbon, causes a significant boost in electrical conductivity. Based on the study of various forms of carbon reviewed in Ref. 14 and the modeling discussed therein, one can conclude that: (i) the L a equation is not applicable for the early stages of structural transformation of graphene oxide, and (ii) the nanocrystalline graphite-like state of graphene oxide is created from the amorphous state of 4

initially very disordered graphene oxide (see the phase diagram in Fig.1 and detailed discussion in Ref. 14 ). Table S1. Summary of the measured graphene oxide devices which survived all tests. No Confocal image Distance between I probes (µm) Steps of reduction, Max temperature, Duration (Step - 0 C - min) Final measured resistance (MΩ) Calculated conductivity (S/m) Measured R max/r min Calculated R max/r min Resistance saturation S1 33 (1) - 200-40 (2) - 200-50 (3) - 225-120 (4) - 250-60 2.96 69 1.06 1.26 step 1 S2 15 (1) - 195-40 3.97 48 2.78 1.67 step 1 S3 21 (1) - 192-40 (2) - 225-60 1.94 85 1.93 1.67 step 2 S4 15 (1) - 180-100 (2) - 175-150 311.5 0.52 2.38 1.46 not reached S5 39 (1) - 186-150 204.0 0.9 1.23 1.33 not reached S6 27 (1) - 195-100 (2) - 200-500 28.5 7 1.48 2.00 not reached S7* 33 (1) Hydrazine (2) - 215-100 0.685 275 3.28 1.69 step 2 S8 27 (1) - 209-60 132 1.6 not reached S9 33 (1) - 205-60 (2) 205-100 5.23 33 2.06 1.17 step 2 S12 37 (1) - 172-170 (2) - 138-70 (3) - 152-110 (4) - 165-120 4.43 45 2.28 1.69 step 4 * This graphene oxide sheet was treated first by hydrazine vapor and then thermally heated. The distance between the current, I, probes is determined as an edge-to-edge distance between: two neighboring metal lines for devices S1-S8; two lines, as shown in Fig.S1-b1, for device 9; and two wide metal lines for device 12. Time of temperature increase to its maximum value. Device cooling was based on turning off the heater. 5

(a) (b-1) 7 8 9 (b-2) 6 5 4 g h i j f e k l d c a b 10 11 12 10µm 3 2 1 V2 V1 V2 V1 (c) Measure resistance (R M ) Define resistivity in FEM, calculate resistance (R C ) (d) g 1.0 h 0.5 i - Measured - Calculated j R M R - R M C < 0.01 Obtain resistivity 1.0 f e d k l 1.0 Change direction c b a Average for all directions 1.0 Figure S1. The method for determining device resistivity. (a) Confocal microscope image (at 543 nm wavelength) of S12 device. (b) Examples of the calculated distribution of electric potential for the indicated combination of current and voltage probes for device S12 (b-1) and for device S9 (b-2). (c) Procedure for determining device resistivity (conductivity) based on measured values and FEM fitting. (d) Normalized relative resistance for S12 device in 12 directions as indicated in the panel (b-1): experiment ( - red), calculation ( - blue). 6

(a) (c) D-band 2D-band G-band (b) Figure S2: Raman imaging. (a) Optical microscope image of the portion of the graphene oxide sheet with two metal leads. (b) Scanning confocal Raman image of the corner area of the sheet shown in panel (a) collected in the integrated range 1294-1685 cm -1. (c) Raman spectra collected from: single sheet of graphene oxide deposited from water solution (NR-SGO), thermally reduced single sheet of graphene oxide (tr-sgo), and single sheet of pristine graphene. 7

References 1. Jung, I.; Pelton, M.; Piner, R.; Dikin, D. A.; Stankovich, S.; Watcharotone, S.; Hausner, M.; Ruoff, R. S. Nano Lett. 2007, 7, 3569. 2. Ni, Z. H.; Wang, H. M.; Kasim, J.; Fan, H. M.; Yu, T.; Wu, Y. H.; Feng, Y. P.; Shen, Z. X. Nano Letters 2007, 7, 2758. 3. Blake, P.; Hill, E. W.; Neto, A. H. C.; Novoselov, K. S.; Jiang, D.; Yang, R.; Booth, T. J.; Geim, A. K. Appl. Phys. Lett. 2007, 91, 063124. 4. Roddaro, S.; Pingue, P.; Piazza, V.; Pellegrini, V.; Beltram, F. Nano Letters 2007, 7, 2707. 5. Casiraghi, C.; Hartschuh, A.; Lidorikis, E.; Qian, H.; Harutyunyan, H.; Gokus, T.; Novoselov, K. S.; Ferrari, A. C. Nano Lett. 2007, 7, 2711. 6. Abergel, D. S. L.; Russell, A.; Fal'ko, V. I. Appl. Phys. Lett. 2007, 91, 063125. 7. van der Pauw, L. J. Philips Res. Rep. 1958, 13, 1. 8. Stankovich, S.; Dikin, D. A.; Dommett, G. H. B.; Kohlhaas, K. M.; Zimney, E. J.; Stach, E. A.; Piner, R. D.; Nguyen, S. T.; Ruoff, R. S. Nature 2006, 442, 282. 9. Zimney, E. J.; Dommett, G. H. B.; Ruoff, R. S.; Dikin, D. A. Meas. Sci. Technol. 2007, 18, 2067. 10. Cancado, L. G.; Reina, A.; Kong, J.; Dresselhaus, M. S. Physical Review B 2008, 77. 11. Tuinstra, F.; Koenig, J. L. J Chem. Phys. 1970, 53, 1126. 12. Nemanich, R. J.; Solin, S. A.; Gúerard, D. Phys. Rev. B 1977, 16, 2665. 13. Pimenta, M. A.; Dresselhaus, G.; Dresselhaus, M. S.; Cancado, L. G.; Jorio, A.; Saito, R. Phys. Chem. Chem. Phys. 2007, 9, 1276. 14. Ferrari, A. C.; Robertson, J. Philos. Trans. R. Soc. Lond. Ser. A-Math. Phys. Eng. Sci. 2004, 362, 2477. 15. Stankovich, S.; Dikin, D. A.; Piner, R. D.; Kohlhaas, K. A.; Kleinhammes, A.; Jia, Y.; Wu, Y.; Nguyen, S. T.; Ruoff, R. S. Carbon 2007, 45, 1558. 16. Gomez-Navarro, C.; Weitz, R. T.; Bittner, A. M.; Scolari, M.; Mews, A.; Burghard, M.; Kern, K. Nano Lett. 2007, 7, 3499. 17. Gilje, S.; Han, S.; Wang, M.; Wang, K. L.; Kaner, R. B. Nano Lett. 2007, 7, 3394. 18. Becerril, H. A.; Mao, J.; Liu, Z.; Stoltenberg, R. M.; Bao, Z.; Chen, Y. ACS Nano 2008, 2, 463. 8