Electrical Discharges Characterization of Planar Sputtering System

Similar documents
Characterization of low pressure plasma-dc glow discharges (Ar, SF 6 and SF 6 /He) for Si etching

DEPOSITION OF THIN TiO 2 FILMS BY DC MAGNETRON SPUTTERING METHOD

Electrical characteristics and plasma diagnostics of (Ar/O 2 ) gas mixture glow Discharge

Effect of Pressure and Discharge Voltage on Plasma Parameters in Air seeded Arc-plasma

Sputter Ion Pump (Ion Pump) By Biswajit

Effect of He and Ar Addition on N 2 Glow Discharge Characteristics and Plasma Diagnostics

Electrical Breakdown in Low-Pressure Nitrogen in Parallel Electric and Magnetic Fields

Repetition: Practical Aspects

Study of DC Cylindrical Magnetron by Langmuir Probe

Influence of Axial Magnetic Field on the Electrical Breakdown and Secondary Electron Emission in Plane-Parallel Plasma Discharge

An Investigation of the Secondary Electron Emission Coefficient of Aluminum and Graphite Disc Electrodes

Introduction to Plasma

STRONG DOUBLE LAYER STRUCTURE IN THERMIONIC VACUUM ARC PLASMA *

SPECTRAL INVESTIGATION OF A COMPLEX SPACE CHARGE STRUCTURE IN PLASMA

Chapter 5: Nanoparticle Production from Cathode Sputtering. in High-Pressure Microhollow Cathode and Arc Discharges

Effect of negative ions on the characteristics of plasma in a cylindrical discharge

LECTURE 5 SUMMARY OF KEY IDEAS

CHARACTERIZATION OF A DC PLASMA WITH HOLLOW CATHODE EFFECT

Application of Plasma Phenomena Lecture /3/21

TMT4320 Nanomaterials November 10 th, Thin films by physical/chemical methods (From chapter 24 and 25)

FLASH CHAMBER OF A QUASI-CONTINUOUS VOLUME SOURCE OF NEGATIVE IONS

Influence of Amorphous Carbon Deposition on the Probability for Recombination of Neutral Oxygen Atoms on Aluminium Surfaces

Lecture 6: High Voltage Gas Switches

Nitrogen Glow Discharge by a DC Virtual Cathode

Breakdown behavior in radio-frequency argon discharges

1 AT/P5-05. Institute of Applied Physics, National Academy of Sciences of Ukraine, Sumy, Ukraine

PIC/MCC Simulation of Radio Frequency Hollow Cathode Discharge in Nitrogen

PRINCIPLES OF PLASMA DISCHARGES AND MATERIALS PROCESSING

The Computational Simulation of the Positive Ion Propagation to Uneven Substrates

The effect of self-absorption in hollow cathode lamp on its temperature

1. INTRODUCTION 2. EXPERIMENTAL SET-UP CHARACTERIZATION OF A TUBULAR PLASMA REACTOR WITH EXTERNAL ANNULAR ELECTRODES

THE INFLUENCE OF EXTERNAL MAGNETIC FIELD ON THE RADIATION EMITTED BY NEGATIVE GLOW OF A DC GLOW DISCHARGE

The Q Machine. 60 cm 198 cm Oven. Plasma. 6 cm 30 cm. 50 cm. Axial. Probe. PUMP End Plate Magnet Coil. Filament Cathode. Radial. Hot Plate.

Effect of Pressure and Hot Filament Cathode on Some Plasma Parameters of Hollow Anode Argon Glow Discharge Plasma

Ultra-High Vacuum Technology. Sputter Ion Pumps l/s

Miniature Vacuum Arc Thruster with Controlled Cathode Feeding

Arab Journal of Nuclear Sciences and Applications

Previous Lecture. Electron beam lithoghraphy e - Electrons are generated in vacuum. Electron beams propagate in vacuum

ION Pumps for UHV Systems, Synchrotrons & Particle Accelerators. Mauro Audi, Academic, Government & Research Marketing Manager

Vacuum Pumps. Two general classes exist: Gas transfer physical removal of matter. Mechanical, diffusion, turbomolecular

6.5 Optical-Coating-Deposition Technologies

Chaotic-to-ordered state transition of cathode-sheath instabilities in DC glow discharge plasmas

Simulation of Gas Discharge in Tube and Paschen s Law

ION BOMBARDMENT CHARACTERISTICS DURING THE GROWTH OF OPTICAL FILMS USING A COLD CATHODE ION SOURCE

CHAPTER 6: Etching. Chapter 6 1

INFLUENCE OF MAGNETIC FIELD ON MONOCHROME VISIBLE LIGHT IN ELECTROPOSITIVE ELECTRONEGATIVE GAS MIXTURES DISCHARGES PLASMA

PASCHEN CURVES AND SPATIAL DISTRIBUTION OF EMITTED LIGHT OF GLOW DISCHARGE IN THE AIR

Lecture 6 Plasmas. Chapters 10 &16 Wolf and Tauber. ECE611 / CHE611 Electronic Materials Processing Fall John Labram 1/68

Table of Content. Mechanical Removing Techniques. Ultrasonic Machining (USM) Sputtering and Focused Ion Beam Milling (FIB)

PHYSICAL VAPOR DEPOSITION OF THIN FILMS

Dust collected in MAST and in Tore Supra. Nanoparticle growth in laboratory plasmas

acta physica slovaca vol. 54 No. 2, April 2004 SIMPLE EXPERIMENTAL METHODS TO CONTROL CHAOS IN A DOUBLE PLASMA MACHINE 1

Design and construction of a very small repetitive plasma focus device

Extrel Application Note

Low-pressure gas breakdown in uniform dc electric field

Department of Aerospace Engineering and Engineering Mechanics, The University of Texas at Austin, Austin, Texas 78712, USA

Plasma Chamber. Fortgeschrittenes Praktikum I. Supervisors: Baran Eren, Dr. Marco Wisse, Dr. Laurent Marot. Abstract

Effect of Spiral Microwave Antenna Configuration on the Production of Nano-crystalline Film by Chemical Sputtering in ECR Plasma

Radio-Frequency Spectrometry

Chapter 7 Plasma Basic

Plasma Modeling with COMSOL Multiphysics

Electron cyclotron resonance plasma enhanced direct current sputtering discharge with magnetic-mirror plasma confinement

Two-dimensional Fluid Simulation of an RF Capacitively Coupled Ar/H 2 Discharge

Volume Production of D - Negative Ions in Low-Pressure D 2 Plasmas - Negative Ion Densities versus Plasma Parameters -

ARGON EXCIMER LAMP. A. Sobottka, L. Prager, L. Drößler, M. Lenk. Leibniz Institute of Surface Modification

Recombination and Decay of Plasma Produced by Washer Stacked Plasma Gun inside a Curved Vacuum Chamber

Chapter 7. Plasma Basics

Adjustment of electron temperature in ECR microwave plasma

Effect of nitrogen gas pressure and hollow cathode geometry on the luminous intensity emitted from glow discharge plasma

Earlier Lecture. In the earlier lecture, we have seen non metallic sensors like Silicon diode, Cernox and Ruthenium Oxide.

A novel sputtering technique: Inductively Coupled Impulse Sputtering (ICIS)

Nanosecond-scale Processes in a Plasma Pilot for Ignition and Flame Control

Technology for Micro- and Nanostructures Micro- and Nanotechnology

Keywords. 1=magnetron sputtering, 2= rotatable cathodes, 3=substrate temperature, 4=anode. Abstract

VARIATION OF ION ENERGY FLUX WITH INCREASING WORKING GAS PRESSURES USING FARADAY CUP IN PLASMA FOCUS DEVICE

Contents: 1) IEC and Helicon 2) What is HIIPER? 3) Analysis of Helicon 4) Coupling of the Helicon and the IEC 5) Conclusions 6) Acknowledgments

Lecture 10. Vacuum Technology and Plasmas Reading: Chapter 10. ECE Dr. Alan Doolittle

Regenerative Soot-II: Emission o f carbon clusters from sooting plasma

Energy fluxes in plasmas for fabrication of nanostructured materials

Application of Rarefied Flow & Plasma Simulation Software

Chemistry Instrumental Analysis Lecture 34. Chem 4631

Electric Rocket Engine System R&D

ESTIMATION OF ELECTRON TEMPERATURE IN ATMOSPHERIC PRESSURE DIELECTRIC BARRIER DISCHARGE USING LINE INTENSITY RATIO METHOD

MODERN PHYSICS OF PLASMAS (19 lectures)

Repetition: Physical Deposition Processes

A simple electric thruster based on ion charge exchange

1 Hall-Current Ion Sources

High Beta Discharges with Hydrogen Storage Electrode Biasing in the Tohoku University Heliac

Gas Electronegativity Influence on Electrical Breakdown Mechanisms

A Multi-beamlet Injector for Heavy Ion Fusion: Experiments and Modeling

D- Charge Exchange Ionizer for the JINR Polarized Ion Source POLARIS

Surface corona discharge along an insulating flat plate in air applied to electrohydrodynamically airflow control : electrical properties

Plasma Processing of Large Curved Surfaces for SRF Cavity Modification

Surface hardening by means of plasma immersion ion implantation and nitriding in glow discharge with electrostatic confinement of electrons

PHYSICAL AND CHEMICAL PROPERTIES OF ATMOSPHERIC PRESSURE PLASMA POLYMER FILMS

Jacob s Ladder Controlling Lightning

Experimental Study of Plasma Under-liquid Electrolysis in Hydrogen Generation

Modern Methods in Heterogeneous Catalysis Research: Preparation of Model Systems by Physical Methods

vacuum analysis plasma diagnostics surface science gas analysis

Mass Spectrometry in MCAL

Transcription:

International Journal of Recent Research and Review, Vol. V, March 213 ISSN 2277 8322 Electrical Discharges Characterization of Planar Sputtering System Bahaa T. Chaid 1, Nathera Abass Ali Al-Tememee 2, Mohammed K. Khalaf 3, Fwad T. Ibrahim 4 1 Department of physics, College of Science, Baghdad University, Iraq 1 dr.bahaa211@yahoo.com 2 Department of physics, College of Science, Baghdad University, Iraq 2 nathera_27@yahoo.com 3 Ministry of Science and Technology, Baghdad, Iraq 3 mohammedkhkh@yahoo.com 4 Department of physics, College of Science, Baghdad University, Iraq 4 Fuadtariq22@yahoo.com Abstract- A home-made dc sputtering is characterized by cathode potential of 25-25 V and sputtering gas pressures of (3.5 1-2 1.5) mbar. This paper studies in experiment the breakdown of argon, nitrogen, and oxygen in a uniform dc electric field at different discharge gaps and cathode potentials. Paschen curves for Argon, Nitrogen, and oxygen are obtained by measuring the breakdown voltage of gas within a stainless steel vacuum chamber with two planar, stainless steel electrodes. The Paschen curves in Ar, N 2, and O 2 gases show that the breakdown voltage between two electrodes is a function of pd (The product of the pressure inside the chamber and distance between the electrodes). Current-voltage characteristics visualization of the discharge indicate that the discharge is operating in the abnormal glow region. Keywords: gas discharge, glow discharge, plasma, dcsputtering. I. INTRODUCTION Dc glow discharges are widely applied for depositing thin films, etching, plasma polymerization, oxidation, and pumping gas discharge lasers, etc. Therefore the research into the conditions of the dc glow discharge is of considerable interest [1]-[6]. Plasmas are ionized gases; hence, they consist of positive (and negative) ions and electrons, as well as neutral species. Therefore, the ignition of the dc glow discharge is one of the oldest problems in the study of low-pressure gas discharges. The mechanism of the gas discharge can be explained as follows: When a sufficiently high potential difference is applied between two electrodes placed in a gas, the latter will break down into positive ions and electrons, giving rise to a gas discharge [7-9]. The field of gas discharge plasma applications has rapidly expanded in recent years. This is due to the large chemical freedom offered by the non-equilibrium aspects of the plasma [1-11]. This wide variety of chemical non-equilibrium conditions is possible, since (external control) parameters can easily be modified, such as: the chemical input (working gas; this defines the different species in the plasma: electrons, atoms, molecules, ions, radicals, clusters); the pressure (ranging from about.1 Pa to atmospheric pressure; as mentioned higher pressure typically reduces the collision mean free path, enhances the confinement and pushes the plasma toward equilibrium); the electromagnetic field structure (typically externally imposed, but it can also be modified by the plasma species; these electric and/or magnetic fields are used to accelerate, heat, guide and compress the particles); the discharge configuration (e.g. with or without electrodes; 17

discharge volume: a small volume typically means large gradients and thus departure from equilibrium). The temporal behavior (e.g. pulsing the plasma). Because of this multi-dimensional parameter space of the plasma conditions, there exists a large variety of gas discharge plasmas, employed in a large range of applications. This paper reports the results of homemade lowpressure plasma system where it can be used to enhance repeatability of the sputtering process. Experimental study of breaking down of argon, nitrogen and oxygen in the dc electric field in cylindrical discharge vessels with various inter-electrode gaps d and gas pressure supply were tested. Mechanisms and characteristics of plasma source are analysis as paschen characteristics curve, pressure-discharge current curves and discharge current-applied voltage. II. EXPERIMENTAL WORK The plasma system is made of a stainless steel cylinder (inner diameter 3 m, height 34 m), closed by stainless steel plates and sealed by o-rings. The electrodes and the metallic rods are encapsulated in Teflon shell so that only the electrode surfaces are in contact with the gas and edge effects are avoided. The shells used to cover the electrodes have a circular open area of 78.5 cm 2, which is the effective surface area of the electrode in contact with the gas. The electrodes are made of stainless steel of 15 mm in thickness and1 mm in diameter. Before each experiment the electrodes are mechanically polished and chemically cleaned in dichloromethane. The pressure is controlled by a manual throttle valve mounted between the reactor and the pumping unit. The pumping system is composed of a rotary vane pump and a diffusion pump. The gas through put is set at 15 cm 3 /s by a gas flow-controller. Different gases used for the experiment with purity of 99.99 %. Before each measurement the reactor is brought to a base 5 pressure of about 3 1 mbar. A high voltage dcpower supply is used for delivering 3KV between two electrodes (see figure 1). III. RESULT AND DISCUSSION Planar parallel electrodes used to measure Paschen curves for different inter-electrodes spacing. We measured the breakdown curves of the glow discharge in argon, nitrogen and oxygen within the range of dc voltage V dc ( 25 25V ) and pressure of 8 1 3 1.5mbar.Electrodes were employed and before taking measurements the cathode surface was purified by igniting the dc glow discharge in argon at a 3 pressure of 8 1 mbar and a discharge current 5 8 ma for 1 min. Under these conditions the I dc ion flux on the cathode is sufficiently large enough to remove the monolayer of gases remaining on the cathode surface after mechanical machining and polishing, but the discharge current value is not yet sufficient to produce the cathode spots that erode the cathode surface. Fig.2 and Fig.3 shows the paschen curves for argon, oxygen and nitrogen, which are obtained discharge tubes of fixed radius R and different inter electrode gaps d. It follows from these figures that on increasing the gap d the curves are shifted not only to the region of higher breakdown voltages U dc, but simultaneously to higher pd values. However one can see from the results in Fig.3 that on increasing d the breakdown curves are also shifted to higher pd values.consequently, the deviation from Paschen s law that we have observed is supported by the measured data of other authors [5,11]. In all probability, this shift of the breakdown curves to higher U dc and pd values with the increase of the inter electrode gap d is associated with the growth of the losses of charged particles on the lateral walls of the discharge chamber due to the diffusion across the electric field. 18

H. V. power supply A Gas inlet and flow controller V Plasma chamber Vacuum system Fig. 1: Schematic diagram of the Low pressure plasma system. Breakdown voltage(v) 22 215 21 25 2 195 19 185 18 175 17 d=3 cm d=4 cm d=5 cm d=6 cm 2 Pd (mbar. cm) 4 Breakdown voltage (v) 1 9 8 7 6 5 4 3 2 1 Ar N2 O2 2 4 6 8 1 Pd(mbar.cm) Fig.2: A plot of breakdown voltage of Ar as a function of pd with different inter-electrode spacing Fig.3: A plot of breakdown voltage as a function of pd with different gases for inter electrode spacing d=5cm. 19

1 8 6 4 2 (a) Ar (d=3 cm) p=.35 mbar p=.75 mbar p=.3 mbar p=.8 mbar 1 8 6 4 2 (b) Ar (d=4 cm) p=.35 mbar p=.75 mbar p=.3 mbar p=.8 mbar 1 2 3 1 2 3 1 8 6 4 2 (c) Ar (d=5 cm) p=.35 mbar p=.75 mbar p=.3 mbar p=.8 mbar 1 8 6 4 2 (d) Ar (d=6 cm) p=.35 mbar p=.75 mbar p=.3 mbar p=.8 mbar 1 2 3 1 2 3 Fig.4: I-V characteristics of Ar discharge plasma at different value of gas pressure and inter-electrode spacing The characteristics of glow discharge cathode current as a function of applied voltage for different argon gas pressure with different inter-electrode spacing have been established with the scheme shown in fig.4(d=3,4,5,and6 cm).the current in the external circuit can be measured as a function of voltage drop between the anode and the cathode. A further decrease in the external current limiting resistance brings the voltage /discharge current characteristic in to abnormal glow discharge region. This agrees with the data of [6] and also follows from the results of previous works [5]. Since the visible glow already covers the entire work surface, an increase in current density will now be accompanied by an increase in the voltage drop through the resistance of the glow discharge. These positive 2

characteristics and behavior attributed to the mobility limited version of the child-langmuir equation, where the current density is proportional to V 2 and interelectrode spacing (d) [7]. Fig. 5 shows the dependence of cathode currents to the variation of working pressure using different type of gases with (d=5cm) and a constant applied voltage (7V). The cathode current increased gradually with increasing pressure of Ar,N 2, and O 2 to maximum value of cathode current at pressure equal 1.5, 1,and.8 mbar respectively. The decreasing of discharge current with high value of working pressure attributed to reduce the mean-free path of gas discharge electrons resulted to the increasing of electron-neutral collisions. It is also clear from the previous obtained figures that the maximum discharge current was obtained at an optimum inter-electrode spacing and pressure are equal to 5 cm and.8 mbar where the expected sputtering yield is maximum due to the increase of the output charge particles of glow discharge plasma. 6 4 2 d=5 cm V=7volt O2 Ar Pressure 2 (mbar) 4 6 Fig.5: I-P characteristics for different gases plasma with biasing voltage (7volt) IV. CONCLUSIONS This home-built dc- sputtering system has long stable operation using nitrogen, argon, and oxygen gases. The present investigations show that an increase of the discharge voltage was accompanied by an increase of the discharge current, where the characteristics of such discharge is characterized by abnormal glow discharge. This dc-glow discharge system can be used for sputtering application. V. REFERENCE [1] Ed. Marcus, R. K. Pleunm, Glow Discharge Spectroscopes, Press, New York, 1993. [2] Bogaerts, A., et al, Glow discharge modeling: from basic understanding towards applications, Surf. Interface Anal. 35, 593 63(23). [3] Speranza, A., et al, Glow discharge in low pressure plasma PVD: Mathematical model and numerical simulations Meccanica. 46, 681 697(211). [4] F.F. Chen, Plasma physics and controlled fusion, 1, Plenumm press, (New York), 1985. [5] B. T. Chiad, T. L. Al-Zubaydi, M. K. Khalaf, A. I. Khudiar, Journal of Optoelectronics and Biomedical Materials,1(3),255-262(29). [6] B. T. Chiad, T. L. Al-Zubaydi, M. K. Khalaf, A. I. Khudiar,Indian J pure & Appl phys, 48,723-73, (21). [7] A.Von Lnger, Ionized gases, (Uarenaon, Oxford), 1965. [8] Meek J. M. and Craggs J. D. 1953 Electrical Breakdown of Gases (Oxford: Clarendon) [9] Brown S. C. 1959 Basic Data of Plasma Physics (New York: Wiley) [1] V. A.Lisovskiy, S D Yakovin and V D Yegorenkov, Low-pressure gas breakdown in uniform dc electric field,j. Phys. D: Appl. Phys.33, 2722 273 (2). [11] Annemie Bogaert, Erik Neyt, Renaat Gijbel, Joost van der Mullen, Spectrochimica Acta Part B 57, 69 658 (22). 21