NEW POWDER MATERIAL Nano-sized Zeolite SiC powder
Z161_3_E Nano-sized Zeolite Model No. Type (cation) Pore Diameter (Å) Average Particle Size (nm) Sample Amount (g) SiC powder Please let us know your requirements. 27-27, Tsuruta-cho, Nishi-ku, Sakai City, Osaka 593-8323 Phone: (+81)72-274-777 (reception) E-mail: zeolite-eigyo@nakamura-gp.co.jp
Company Outline Company Outline Main Office Address Establishment Representative Capital Number of employees Affiliated companies 27-27, Tsuruta-cho, Nishi-ku, Sakai City, Osaka 593-8323 December 21, 197 Makoto Inoue, President 2,,122,8 yen 257 (consolidated), 17 (non-consolidated) (as of December 31, 215) JQA-QM3339 JQA-EM1988 Securities Identification Nippon Nozzle Co., Ltd. (1% ownership of share capital) Code: 6166 Suminoe Nakacho Device Technology Corporation (49.9% ownership of share capital) Company History October 1954 December 197 July 1989 June 21 November 25 April 28 January 21 February 21 June 21 September 21 January 211 June 211 February 213 September 213 June 215 December 215 Established Nakamura Steel Works in Asahigaoka Kita-machi, Sakai-ku, Sakai City, Osaka for production and distribution of ultra-hard jigs and tools. Established Nakamura Choukou Co., Ltd.. Newly established Main Office Factory at, and moved the Main Office to Otori Minami-machi, Nishi-ku, Sakai City, Osaka. Newly established MAC Center at Tsuruta-cho, Nishi-ku, Sakai City, Osaka. (Currently, Main Office) Newly established MAC Center, South Building. Acquired all shares of Nippon Nozzle, Co., Ltd. and made it a wholly-owned subsidiary. (Currently, consolidated subsidiary) Newly established Izumi Factory 1, Building 1 at Ayumino, Izumi-City, Osaka. Started mass production of silicon wafers for solar cells. Closed Main Office Factory (Otori Minami-machi) and moved the Main Office to MAC Center (Tsuruta-cho, Nishi-ku, Sakai City). Newly established Izumi Factory 1, Building 2 at Ayumino, Izumi City, Osaka. Started distribution of diamond saw wires. Increase the capital to 1,31,875, yen. (Received 1,245,, yen of investment from Innovation Network Corporation of Japan, a public-private investment fund). Newly established Izumi Factory 1, Building 3 at Ayumino, Izumi City, Osaka. Established Shanghai Nakamura Choukou Trading Co., Ltd., a Chinese subsidiary, in Shanghai City, China. (Currently, consolidated subsidiary). Transferred the silicon wafer slicing business for solar cells to Suminoe Nakacho Device Technology Corporation, joint venture established by Suminoe Textile Company Ltd. and us (Currently, Equity method applicable affiliated company). Got the shares listed on the Tokyo Exchanges, Market of the High-Growth and Emerging Stocks (Mothers) (Securities Identification Code: 6166) Opened Izumi Factory 2 at Ayumino, Izumi City, Osaka. Kyoto Hyogo Osaka Nara Shiga Main Office (MAC Center) Special High-Precision Equipment Business New Business Development Office, Management Headquarters 27-27, Tsuruta-cho, Nishi-ku, Sakai City, Osaka 593-8323 Diamond nozzle Wakayama 72-274-777 Shanghai Nakamura Choukou Trading Co., Ltd. (Chinese subsidiary) Nippon Nozzle Co., Ltd. (Subsidiary) Chemical fiber spinning nozzle business 2-1-1, Murotani, Nishi-ku, Kobe City, Hyogo 651-2241 (Kobe High-Tech Park) Chemical fiber spinning nozzle Izumi Factory Electronics material slicing and periphery business 2-3-7, Ayumino, Izumi City, Osaka 594-1157 (Izumi Factory 1) (Izumi Factory 2) Diamond saw wire 19F, Room 6 E, 165, West Zhong Shang Road, Changning District, Shanghai 251
Nano-sized Zeolite Zeoal Nano-sized Zeolite For improvement of features of every thing Zeoal *Under application for trademark registration Nakamura Choukou Co., Ltd., in collaboration with Tokyo University, developed an innovative production process for zeolite nano-particles by utilizing the crushing and recrystallizing technology held by the University, and succeeded in production of low-cost nano-sized zeolite powder. While maintaining zeolite s inherent functions such as adsorption, this technology allows to minimize the particle size to 5-3 nm. By minimizing the particle size to an unnoticeable level by human five senses, this technology does not damage the basic properties and esthetics of the target objects to which the function is added. The technology opens the door to possibilities widely, for example, optical application which requires light transparency, and addition to tiny fibers. Catalyst property Nano-sizing Outer surface area Ion exchange property Dispersion in pores Adsorption property Realized practical-level production cost Crushing and Recrystallizing Process Ex. Conventional product method Silicon source Mineralizer (Bottom-up) Synthesis in diluted aluminosilicate solution Use of organic substances, such as structure directing agents Structure directing agent Aluminum source Water Hydrothermal synthesis method Heating/ Compression New Method (Top-down) Zeolite Crushing Recrystallizing Use of technological seeds of Tokyo University Under patent application Production method of fine zeolite (Toru Wakihara, Nakamura Choukou Co., Ltd.) Nano-sized zeolite
Particle size FE-SEM Ordinary zeolite 5-3 nm Zeoal 4A Type 5 nm-product Zeoal 4A Type 3 nm-product 1 μm 5 nm 5 nm number frequency / % 3 2 1 1 2 3 4 5 particle size / nm 4 4 ave. 1837 nm ave. 5 nm ave. 288 nm Vapor Adsorption/Desorption Isotherm number frequency / % 3 2 1 5 1 15 2 particle size / nm Fine and homogeneous nano-particles number frequency / % 3 2 1 2 4 6 8 particle size / nm *The average particle sizes are not guarantee values. 4 35 - Large pore adsorption amount Large outer surface area V a /cm 3 (STP)g -1 3 25 2 15 1 Adsorpion Desorpion Developed nano-sized zeolite Water adsorption amount Micro-sized zeolite (gh2o/gzeolite) Developed nano-sized zeolite (5 nm) (3 nm) RH (5).26.28.27 5 Micro-sized zeolite.2.4.6.8 1 p/p RH (9).27.35.31 *The water adsorption amounts are not guarantee values. Crystallinity XRD Pattern Developed nano-sized zeolite Peak area 115 A-Type Zeolite Phase Intensity (a.u.) Micro-sized zeolite Peak area 116 1 2 3 4 5 2θ (degree)
SiC Effective Use of Silicon Sludge (1) Silicon material (6) Solar cell panel Process of solar cell panel manufacturing (2) Single crystal silicon (5) Solar cell (3) Silicon ingot (4) Silicon wafers for solar cell Generation of a large amount of good-quality silicon sludge To slice the silicon ingot with diamond saw wire Chips are discharged. １μｍ Silicon ingot Silicon wafers Effective use of silicon sludge Appearance SEM Ordinary SiC/Crushing method Developed SiC/Bottom-up method １μｍ Green color unique to GC Crystalline Phase Sharp shape XRD Pattern *Submicron size Number Frequency (%) Intensity (a.u.) 2 3 4 5 2 θ (degree) 6 7 Rounded fine particles Particle Size Distribution 6 1 １μｍ β-sic monophase Rough crushing Fine crushing 4 3 2 1.1 8 (d5) 6.3 (d5).33 5.1 1 1 particle size (μm) 1 1 Development to diverse applications DPF Gears Please let us know your requirements.