N Channel MOSFET level 3
|
|
- Maude French
- 6 years ago
- Views:
Transcription
1 N Channel MOSFET level 3 mosn3 NSource NBulk NSource NBulk NSource NBulk NSource (a) (b) (c) (d) NBulk Figure 1: MOSFET Types Form: mosn3: instance name n 1 n n 3 n n 1 is the drain node, n is the gate node, n 3 is the source node, n is the bulk node. Parameters: parameter list Parameter Type Default value Required? gamma: Bulk threshold parameter (V 0.5 ) DOUBLE 0 no kp: Transconductance parameter (A/V ) DOUBLE no l: Device length (m) DOUBLE no w: Device width (m) DOUBLE no ld: Lateral diffusion length (m) DOUBLE 0 no wd: Lateral diffusion width (m) DOUBLE 0 no nsub:substrate doping (cm 3 ) DOUBLE 0 no phi: Surface inversion potential (V) DOUBLE 0.6 no tox: Oxide thickness (m) DOUBLE no u0: Surface mobility (cm /V-s) DOUBLE 600 no vt0: Zero bias threshold voltage (V) DOUBLE 0 no kappa: Saturation field factor (m) DOUBLE 0. no t: Device temperature (degrees) DOUBLE no tnom: Nominal temperature (degrees) DOUBLE no nfs: Fast surface state density (cm ) DOUBLE 0 no eta: Static feedback on threshold voltage DOUBLE 0 no theta: Mobility modulation (1/V) DOUBLE 0 no tpg: Gate material type DOUBLE 0 no nss: Surface state density (cm ) DOUBLE 0 no vmax: Maximum carrier drift velocity (m/sec) DOUBLE 0 no xj: Metallurgical junction depth DOUBLE 0 no delta: Width effect on threshold voltage DOUBLE 0 no Example: mosn3:m l=1.u w=0u Description: f REEDA TM has the NMOS level 3 model based on the MOS level 3 model in SPICE. It uses the charge conservative Yang-Chatterjee model for modeling charge and capacitance. 1
2 DC Calculations: Constants used are: All parameters used are indicated in this font. Effective channel length and width: q = (As) (1) k = (J/K) () ɛ 0 = (F/m) (3) ɛ s = 11.7 ɛ 0 () E g = T (V ) T (5) C ox = ɛ (F ) TOX (6) L eff = L LD (7) W eff = W WD (8) Depletion layer width coefficient Built in voltage: Square root of substrate voltage: ɛs X d = q NSUB 10 6 (9) V bi = VT0 GAMMA PHI (10) V BS 0 = SqV BS = PHI V BS PHI V BS > 0 = SqV BS = 1 + PHI 0.5 V BS(1 + PHI 0.75 V BS) Short-channel effect correction factor: In a short channel device, device threshold voltage tends to lower since part of the depletion charge in the bulk terminates the electric fields at the source and drain. The value of this correction factor is determined by the metallurgical depth XJ. (11) c 0 = (1) c 1 = (13) c = (1) T 1 = XJ (c 0 + c 1 X d SqV BS + c (X d SqV BS ) ) (15) F s = 1 LD + T 1 X d SqV BS 1 ( ) L eff XJ + X d SqV (16) BS Narrow channel effect correlation factor: The edge effects in a narrow channel cause the depletion charge to extend beyond the width of the channel. This has an effect of increasing the threshold voltage. F n = π ɛ s DELTA C ox W eff (17) Static feedback coefficient: The threshold voltage lowers because the charge under the gate terminal depleted by the drain junction field increases with V DS. This effect is Drain Induced Barrier Lowering (DIBL). σ = ETA L eff 3 C ox (18)
3 Threshold voltage: V th = V bi σ V DS + GAMMA SqV BS F s + F n SqV BS Subthreshold operation: This variable is invoked depending on the value of the parameter NFS and is used only during subthreshold mode. X n = 1 + q NFS 10 C ox + F n + GAMMA Modified threshold voltage: This variable defines the limit between weak and strong inversion. Subthreshold gate voltage: Surface mobility: (19) F s SqV BS (0) NFS > 0 = V on = V th + k T q X n (1) NFS 0 = V on = V th () µ s = V gsx = MAX(V GS, V on ) (3) U THETA (V gsx V th ) Saturation voltage: Calculation of this voltage requires many steps. The effective mobility is calculated as () µ eff = µ s F drain (5) where 1.0 F drain = 1 + µs V (6) DS VMAX L eff The Taylor expansion of coefficient of bulk charge is β = W eff L eff µ eff C ox (7) F B = GAMMA The standard value of saturation voltage is calculated as The final value of the saturation voltage depends on the parameter VMAX F s SqV BS + F n (8) V sat = V gsx V th 1 + F B (9) VMAX = 0 = V dsat = V sat (30) VMAX > 0 = V c = VMAX L eff µ s (31) V dsat = V sat + V c Vsat + Vc (3) Velocity saturation drain voltage: This ensures that the drain voltage does not exceed the saturation voltage. V dsx = MIN(V DS, V dsat ) (33) Drain Current: Linear Region: µ s I DS = β U0 10 F drain (V gsx V th 1 + F b V dsx ) V dsx (3) 3
4 Saturation region: Cutoff Region: I DS = β (V GS V th 1 + F b V dsat ) V dsat (35) I DS = 0 (36) Channel length modulation: As V DS increases beyond V dsat, the point where the carrier velocity begins to saturate moves towards the source. This is modeled by the term l. Xd l = X E p d + KAPPA (V DS V dsat ) E p Xd (37) where E p is the lateral field at pinch-off and is given by E p = VMAX µ s (1 F drain ) (38) The drain current is multiplied by a correction factor l fact. This factor prevents the denominator L eff l from going to zero. The corrected value of drain-source current is l 0.5 L eff = l fact = L eff L eff l (39) l > 0.5 L eff = l fact = l L eff (0) I DSnew = I DS l fact (1) Subthreshold operation: For subthreshold operation, if the fast surface density parameter NFS is specified and V GS V on, then the final value of drain-source current is given by I DSfinal = I DSnew e kt q V GS Von Xn () Yang-Chatterjee charge model This model ensures continuity of the charges and capacitances throughout different regions of operation. The intermediate quantities are: and V F B = V to GAMMA PHI PHI (3) C o = C ox W eff L eff () Accumulation region V GS V F B + V BS Cut-off region V F B + V BS < V GS V th Q d = 0 (5) Q s = 0 (6) Q b = C o (V GS V F B V BS ) (7) Q d = 0 (8) Q s = 0 (9) GAMMA Q b = C o { (V GS V F B V BS ) GAMMA } (50)
5 Saturation region V th < V GS V DS + V th Linear region V GS > V DS + V th Q d = 0 (51) Q s = 3 C o (V GS V th ) (5) Q b = C o (V F B PHI V th ) (53) V DS Q d = C o [ 8 (V GS V th V DS ) + V GS V th 3 V DS] (5) V DS Q s = C o [ (V GS V th V DS ) + V GS V th + 1 V DS] (55) Q b = C o (V F B PHI V th ) (56) The final currents at the transistor nodes are given by I d = I DSfinal + dq d dt I g = dq g dt I s = I DSfinal + dq s dt (57) (58) (59) 5
6 DC Characteristics Transient analysis Output Vds (V) Vd (V) e-09 e-09 3e-09 e-09 5e-09 6e-09 7e-09 8e-09 9e-09 1e-08 (a) Ids (A) Time (s) (b) Figure : Analysis results. Notes: This is the M element in the SPICE compatible netlist. Version: Credits: Name Affiliation Date Links Nikhil Kriplani NC State University August 00 nmkripla@unity.ncsu.edu 6
ESE 570: Digital Integrated Circuits and VLSI Fundamentals
ESE 570: Digital Integrated Circuits and VLSI Fundamentals Lec 6: January 30, 2018 MOS Operating Regions, pt. 2 Lecture Outline! Operating Regions (review) " Subthreshold " Resistive " Saturation! Intro.
More informationThe Devices. Devices
The The MOS Transistor Gate Oxyde Gate Source n+ Polysilicon Drain n+ Field-Oxyde (SiO 2 ) p-substrate p+ stopper Bulk Contact CROSS-SECTION of NMOS Transistor Cross-Section of CMOS Technology MOS transistors
More informationEE 560 MOS TRANSISTOR THEORY PART 2. Kenneth R. Laker, University of Pennsylvania
1 EE 560 MOS TRANSISTOR THEORY PART nmos TRANSISTOR IN LINEAR REGION V S = 0 V G > V T0 channel SiO V D = small 4 C GC C BC substrate depletion region or bulk B p nmos TRANSISTOR AT EDGE OF SATURATION
More informationMOS Transistor I-V Characteristics and Parasitics
ECEN454 Digital Integrated Circuit Design MOS Transistor I-V Characteristics and Parasitics ECEN 454 Facts about Transistors So far, we have treated transistors as ideal switches An ON transistor passes
More informationCMPEN 411 VLSI Digital Circuits. Lecture 03: MOS Transistor
CMPEN 411 VLSI Digital Circuits Lecture 03: MOS Transistor Kyusun Choi [Adapted from Rabaey s Digital Integrated Circuits, Second Edition, 2003 J. Rabaey, A. Chandrakasan, B. Nikolic] CMPEN 411 L03 S.1
More informationDigital Integrated Circuits A Design Perspective. Jan M. Rabaey Anantha Chandrakasan Borivoje Nikolic. The Devices. July 30, Devices.
Digital Integrated Circuits A Design Perspective Jan M. Rabaey Anantha Chandrakasan Borivoje Nikolic The July 30, 2002 1 Goal of this chapter Present intuitive understanding of device operation Introduction
More informationThe Devices. Digital Integrated Circuits A Design Perspective. Jan M. Rabaey Anantha Chandrakasan Borivoje Nikolic. July 30, 2002
Digital Integrated Circuits A Design Perspective Jan M. Rabaey Anantha Chandrakasan Borivoje Nikolic The Devices July 30, 2002 Goal of this chapter Present intuitive understanding of device operation Introduction
More informationII III IV V VI B C N. Al Si P S. Zn Ga Ge As Se Cd In Sn Sb Te. Silicon (Si) the dominating material in IC manufacturing
II III IV V VI B N Al Si P S Zn Ga Ge As Se d In Sn Sb Te Silicon (Si) the dominating material in I manufacturing ompound semiconductors III - V group: GaAs GaN GaSb GaP InAs InP InSb... The Energy Band
More information! MOS Capacitances. " Extrinsic. " Intrinsic. ! Lumped Capacitance Model. ! First Order Capacitor Summary. ! Capacitance Implications
ESE 570: Digital Integrated Circuits and VLSI Fundamentals Lec 7: February, 07 MOS SPICE Models, MOS Parasitic Details Lecture Outline! MOS Capacitances " Extrinsic " Intrinsic! Lumped Capacitance Model!
More informationEE 560 MOS TRANSISTOR THEORY
1 EE 560 MOS TRANSISTOR THEORY PART 1 TWO TERMINAL MOS STRUCTURE V G (GATE VOLTAGE) 2 GATE OXIDE SiO 2 SUBSTRATE p-type doped Si (N A = 10 15 to 10 16 cm -3 ) t ox V B (SUBSTRATE VOLTAGE) EQUILIBRIUM:
More informationPractice 3: Semiconductors
Practice 3: Semiconductors Digital Electronic Circuits Semester A 2012 VLSI Fabrication Process VLSI Very Large Scale Integration The ability to fabricate many devices on a single substrate within a given
More informationLECTURE 3 MOSFETS II. MOS SCALING What is Scaling?
LECTURE 3 MOSFETS II Lecture 3 Goals* * Understand constant field and constant voltage scaling and their effects. Understand small geometry effects for MOS transistors and their implications modeling and
More informationOperation and Modeling of. The MOS Transistor. Second Edition. Yannis Tsividis Columbia University. New York Oxford OXFORD UNIVERSITY PRESS
Operation and Modeling of The MOS Transistor Second Edition Yannis Tsividis Columbia University New York Oxford OXFORD UNIVERSITY PRESS CONTENTS Chapter 1 l.l 1.2 1.3 1.4 1.5 1.6 1.7 Chapter 2 2.1 2.2
More informationMOSFET: Introduction
E&CE 437 Integrated VLSI Systems MOS Transistor 1 of 30 MOSFET: Introduction Metal oxide semiconductor field effect transistor (MOSFET) or MOS is widely used for implementing digital designs Its major
More informationECE315 / ECE515 Lecture-2 Date:
Lecture-2 Date: 04.08.2016 NMOS I/V Characteristics Discussion on I/V Characteristics MOSFET Second Order Effect NMOS I-V Characteristics ECE315 / ECE515 Gradual Channel Approximation: Cut-off Linear/Triode
More informationMOSFET. Id-Vd curve. I DS Transfer curve V G. Lec. 8. Vd=1V. Saturation region. V Th
MOSFET Id-Vd curve Saturation region I DS Transfer curve Vd=1V V Th V G 1 0 < V GS < V T V GS > V T V Gs >V T & Small V D > 0 I DS WQ inv WC v WC i V V VDS V V G i T G n T L n I D g V D (g conductance
More informationMOS Transistor Theory
CHAPTER 3 MOS Transistor Theory Outline 2 1. Introduction 2. Ideal I-V Characteristics 3. Nonideal I-V Effects 4. C-V Characteristics 5. DC Transfer Characteristics 6. Switch-level RC Delay Models MOS
More informationEE105 Fall 2014 Microelectronic Devices and Circuits. NMOS Transistor Capacitances: Saturation Region
EE105 Fall 014 Microelectronic Devices and Circuits Prof. Ming C. Wu wu@eecs.berkeley.edu 511 Sutardja Dai Hall (SDH) 1 NMOS Transistor Capacitances: Saturation Region Drain no longer connected to channel
More informationESE 570: Digital Integrated Circuits and VLSI Fundamentals
ESE 570: Digital Integrated Circuits and VLSI Fundamentals Lec 7: February 4, 2016 MOS SPICE Models, MOS Parasitic Details Lecture Outline! MOS Capacitances " Extrinsic " Intrinsic! Lumped Capacitance
More informationThe Devices: MOS Transistors
The Devices: MOS Transistors References: Semiconductor Device Fundamentals, R. F. Pierret, Addison-Wesley Digital Integrated Circuits: A Design Perspective, J. Rabaey et.al. Prentice Hall NMOS Transistor
More informationMOSFET Physics: The Long Channel Approximation
MOSFET Physics: The ong Channel Approximation A basic n-channel MOSFET (Figure 1) consists of two heavily-doped n-type regions, the Source and Drain, that comprise the main terminals of the device. The
More informationMOS Transistors. Prof. Krishna Saraswat. Department of Electrical Engineering Stanford University Stanford, CA
MOS Transistors Prof. Krishna Saraswat Department of Electrical Engineering S Stanford, CA 94305 saraswat@stanford.edu 1 1930: Patent on the Field-Effect Transistor! Julius Lilienfeld filed a patent describing
More informationLecture 3: CMOS Transistor Theory
Lecture 3: CMOS Transistor Theory Outline Introduction MOS Capacitor nmos I-V Characteristics pmos I-V Characteristics Gate and Diffusion Capacitance 2 Introduction So far, we have treated transistors
More informationECEN474/704: (Analog) VLSI Circuit Design Spring 2018
ECEN474/704: (Analog) SI Circuit Design Spring 2018 ecture 2: MOS ransistor Modeling Sam Palermo Analog & Mixed-Signal Center exas A&M University Announcements If you haven t already, turn in your 0.18um
More informationESE 570 MOS TRANSISTOR THEORY Part 2
ESE 570 MOS TRANSISTOR THEORY Part 2 GCA (gradual channel approximation) MOS Transistor Model Strong Inversion Operation CMOS = NMOS + PMOS 2 TwoTerminal MOS Capacitor > nmos Transistor VGS
More informationLecture 12: MOSFET Devices
Lecture 12: MOSFET Devices Gu-Yeon Wei Division of Engineering and Applied Sciences Harvard University guyeon@eecs.harvard.edu Wei 1 Overview Reading S&S: Chapter 5.1~5.4 Supplemental Reading Background
More informationChapter 4 Field-Effect Transistors
Chapter 4 Field-Effect Transistors Microelectronic Circuit Design Richard C. Jaeger Travis N. Blalock 5/5/11 Chap 4-1 Chapter Goals Describe operation of MOSFETs. Define FET characteristics in operation
More informationLecture 15: MOS Transistor models: Body effects, SPICE models. Context. In the last lecture, we discussed the modes of operation of a MOS FET:
Lecture 15: MOS Transistor models: Body effects, SPICE models Context In the last lecture, we discussed the modes of operation of a MOS FET: oltage controlled resistor model I- curve (Square-Law Model)
More informationFundamentals of the Metal Oxide Semiconductor Field-Effect Transistor
Triode Working FET Fundamentals of the Metal Oxide Semiconductor Field-Effect Transistor The characteristics of energy bands as a function of applied voltage. Surface inversion. The expression for the
More informationMOSFET Capacitance Model
MOSFET Capacitance Model So far we discussed the MOSFET DC models. In real circuit operation, the device operates under time varying terminal voltages and the device operation can be described by: 1 small
More informationMOS Transistor Theory MOSFET Symbols Current Characteristics of MOSFET. MOS Symbols and Characteristics. nmos Enhancement Transistor
MOS Transistor Theory MOSFET Symbols Current Characteristics of MOSFET Calculation of t and Important 2 nd Order Effects SmallSignal Signal MOSFET Model Summary Material from: CMOS LSI Design By Weste
More informationIntegrated Circuits & Systems
Federal University of Santa Catarina Center for Technology Computer Science & Electronics Engineering Integrated Circuits & Systems INE 5442 Lecture 10 MOSFET part 1 guntzel@inf.ufsc.br ual-well Trench-Isolated
More informationLecture 29 - The Long Metal-Oxide-Semiconductor Field-Effect Transistor (cont.) April 20, 2007
6.720J/3.43J - Integrated Microelectronic Devices - Spring 2007 Lecture 29-1 Lecture 29 - The Long Metal-Oxide-Semiconductor Field-Effect Transistor (cont.) April 20, 2007 Contents: 1. Non-ideal and second-order
More informationELEC 3908, Physical Electronics, Lecture 23. The MOSFET Square Law Model
ELEC 3908, Physical Electronics, Lecture 23 The MOSFET Square Law Model Lecture Outline As with the diode and bipolar, have looked at basic structure of the MOSFET and now turn to derivation of a current
More informationUniversity of Pennsylvania Department of Electrical Engineering. ESE 570 Midterm Exam March 14, 2013 FORMULAS AND DATA
University of Pennsylvania Department of Electrical Engineering ESE 570 Midterm Exam March 4, 03 FORMULAS AND DATA. PHYSICAL CONSTANTS: n i = intrinsic concentration undoped) silicon =.45 x 0 0 cm -3 @
More informationToday s lecture. EE141- Spring 2003 Lecture 4. Design Rules CMOS Inverter MOS Transistor Model
- Spring 003 Lecture 4 Design Rules CMOS Inverter MOS Transistor Model Today s lecture Design Rules The CMOS inverter at a glance An MOS transistor model for manual analysis Important! Labs start next
More informationVLSI Design The MOS Transistor
VLSI Design The MOS Transistor Frank Sill Torres Universidade Federal de Minas Gerais (UFMG), Brazil VLSI Design: CMOS Technology 1 Outline Introduction MOS Capacitor nmos I-V Characteristics pmos I-V
More informationDevice Models (PN Diode, MOSFET )
Device Models (PN Diode, MOSFET ) Instructor: Steven P. Levitan steve@ece.pitt.edu TA: Gayatri Mehta, José Martínez Book: Digital Integrated Circuits: A Design Perspective; Jan Rabaey Lab Notes: Handed
More informationFIELD-EFFECT TRANSISTORS
FIEL-EFFECT TRANSISTORS 1 Semiconductor review 2 The MOS capacitor 2 The enhancement-type N-MOS transistor 3 I-V characteristics of enhancement MOSFETS 4 The output characteristic of the MOSFET in saturation
More informationECE 342 Electronic Circuits. 3. MOS Transistors
ECE 342 Electronic Circuits 3. MOS Transistors Jose E. Schutt-Aine Electrical & Computer Engineering University of Illinois jschutt@emlab.uiuc.edu 1 NMOS Transistor Typically L = 0.1 to 3 m, W = 0.2 to
More informationECE-305: Fall 2017 MOS Capacitors and Transistors
ECE-305: Fall 2017 MOS Capacitors and Transistors Pierret, Semiconductor Device Fundamentals (SDF) Chapters 15+16 (pp. 525-530, 563-599) Professor Peter Bermel Electrical and Computer Engineering Purdue
More informationLecture 5: CMOS Transistor Theory
Lecture 5: CMOS Transistor Theory Slides courtesy of Deming Chen Slides based on the initial set from David Harris CMOS VLSI Design Outline q q q q q q q Introduction MOS Capacitor nmos I-V Characteristics
More informationCMOS INVERTER. Last Lecture. Metrics for qualifying digital circuits. »Cost» Reliability» Speed (delay)»performance
CMOS INVERTER Last Lecture Metrics for qualifying digital circuits»cost» Reliability» Speed (delay)»performance 1 Today s lecture The CMOS inverter at a glance An MOS transistor model for manual analysis
More informationEE5311- Digital IC Design
EE5311- Digital IC Design Module 1 - The Transistor Janakiraman V Assistant Professor Department of Electrical Engineering Indian Institute of Technology Madras Chennai October 28, 2017 Janakiraman, IITM
More informationNanoscale CMOS Design Issues
Nanoscale CMOS Design Issues Jaydeep P. Kulkarni Assistant Professor, ECE Department The University of Texas at Austin jaydeep@austin.utexas.edu Fall, 2017, VLSI-1 Class Transistor I-V Review Agenda Non-ideal
More informationECE 342 Electronic Circuits. Lecture 6 MOS Transistors
ECE 342 Electronic Circuits Lecture 6 MOS Transistors Jose E. Schutt-Aine Electrical & Computer Engineering University of Illinois jesa@illinois.edu 1 NMOS Transistor Typically L = 0.1 to 3 m, W = 0.2
More informationDevice Models (PN Diode, MOSFET )
Device Models (PN Diode, MOSFET ) Instructor: Steven P. Levitan steve@ece.pitt.edu TA: Gayatri Mehta, José Martínez Book: Digital Integrated Circuits: A Design Perspective; Jan Rabaey Lab Notes: Handed
More informationLecture 04 Review of MOSFET
ECE 541/ME 541 Microelectronic Fabrication Techniques Lecture 04 Review of MOSFET Zheng Yang (ERF 3017, email: yangzhen@uic.edu) What is a Transistor? A Switch! An MOS Transistor V GS V T V GS S Ron D
More informationMOS Transistor Properties Review
MOS Transistor Properties Review 1 VLSI Chip Manufacturing Process Photolithography: transfer of mask patterns to the chip Diffusion or ion implantation: selective doping of Si substrate Oxidation: SiO
More informationMOS Transistor Theory
MOS Transistor Theory So far, we have viewed a MOS transistor as an ideal switch (digital operation) Reality: less than ideal EE 261 Krish Chakrabarty 1 Introduction So far, we have treated transistors
More informationEE105 - Fall 2006 Microelectronic Devices and Circuits
EE105 - Fall 2006 Microelectronic Devices and Circuits Prof. Jan M. Rabaey (jan@eecs) Lecture 7: MOS Transistor Some Administrative Issues Lab 2 this week Hw 2 due on We Hw 3 will be posted same day MIDTERM
More informationLecture #27. The Short Channel Effect (SCE)
Lecture #27 ANNOUNCEMENTS Design Project: Your BJT design should meet the performance specifications to within 10% at both 300K and 360K. ( β dc > 45, f T > 18 GHz, V A > 9 V and V punchthrough > 9 V )
More informationFinal Examination EE 130 December 16, 1997 Time allotted: 180 minutes
Final Examination EE 130 December 16, 1997 Time allotted: 180 minutes Problem 1: Semiconductor Fundamentals [30 points] A uniformly doped silicon sample of length 100µm and cross-sectional area 100µm 2
More informationESE 570: Digital Integrated Circuits and VLSI Fundamentals
ESE 570: Digital Integrated Circuits and VLSI Fundamentals Lec 5: January 25, 2018 MOS Operating Regions, pt. 1 Lecture Outline! 3 Regions of operation for MOSFET " Subthreshold " Linear " Saturation!
More informationESE370: Circuit-Level Modeling, Design, and Optimization for Digital Systems. Today. Refinement. Last Time. No Field. Body Contact
ESE370: Circuit-Level Modeling, Design, and Optimization for Digital Systems Day 10: September 6, 01 MOS Transistor Basics Today MOS Transistor Topology Threshold Operating Regions Resistive Saturation
More informationEE105 - Fall 2005 Microelectronic Devices and Circuits
EE105 - Fall 005 Microelectronic Devices and Circuits ecture 7 MOS Transistor Announcements Homework 3, due today Homework 4 due next week ab this week Reading: Chapter 4 1 ecture Material ast lecture
More informationMicroelectronics Part 1: Main CMOS circuits design rules
GBM8320 Dispositifs Médicaux telligents Microelectronics Part 1: Main CMOS circuits design rules Mohamad Sawan et al. Laboratoire de neurotechnologies Polystim! http://www.cours.polymtl.ca/gbm8320/! med-amine.miled@polymtl.ca!
More informationECE 546 Lecture 10 MOS Transistors
ECE 546 Lecture 10 MOS Transistors Spring 2018 Jose E. Schutt-Aine Electrical & Computer Engineering University of Illinois jesa@illinois.edu NMOS Transistor NMOS Transistor N-Channel MOSFET Built on p-type
More informationChapter 5 MOSFET Theory for Submicron Technology
Chapter 5 MOSFET Theory for Submicron Technology Short channel effects Other small geometry effects Parasitic components Velocity saturation/overshoot Hot carrier effects ** Majority of these notes are
More informationP. R. Nelson 1 ECE418 - VLSI. Midterm Exam. Solutions
P. R. Nelson 1 ECE418 - VLSI Midterm Exam Solutions 1. (8 points) Draw the cross-section view for A-A. The cross-section view is as shown below.. ( points) Can you tell which of the metal1 regions is the
More informationSECTION: Circle one: Alam Lundstrom. ECE 305 Exam 5 SOLUTIONS: Spring 2016 April 18, 2016 M. A. Alam and M.S. Lundstrom Purdue University
NAME: PUID: SECTION: Circle one: Alam Lundstrom ECE 305 Exam 5 SOLUTIONS: April 18, 2016 M A Alam and MS Lundstrom Purdue University This is a closed book exam You may use a calculator and the formula
More informationHW 5 posted due in two weeks Lab this week Midterm graded Project to be launched in week 7
HW 5 posted due in two weeks Lab this week Midterm graded Project to be launched in week 7 2 What do digital IC designers need to know? 5 EE4 EECS4 6 3 0< V GS - V T < V DS Pinch-off 7 For (V GS V T )
More informationLecture 30 The Short Metal Oxide Semiconductor Field Effect Transistor. November 15, 2002
6.720J/3.43J Integrated Microelectronic Devices Fall 2002 Lecture 30 1 Lecture 30 The Short Metal Oxide Semiconductor Field Effect Transistor November 15, 2002 Contents: 1. Short channel effects Reading
More informationLecture 10 MOSFET (III) MOSFET Equivalent Circuit Models
Lecture 1 MOSFET (III) MOSFET Equivalent Circuit Models Outline Lowfrequency smallsignal equivalent circuit model Highfrequency smallsignal equivalent circuit model Reading Assignment: Howe and Sodini;
More informationLEVEL 61 RPI a-si TFT Model
LEVEL 61 RPI a-si TFT Model Star-Hspice LEVEL 61 is an AIM-SPICE MOS15 amorphous silicon (a-si) thin-film transistor (TFT) model. Model Features AIM-SPICE MOS15 a-si TFT model features include: Modified
More informationGaN based transistors
GaN based transistors S FP FP dielectric G SiO 2 Al x Ga 1-x N barrier i-gan Buffer i-sic D Transistors "The Transistor was probably the most important invention of the 20th Century The American Institute
More information! PN Junction. ! MOS Transistor Topology. ! Threshold. ! Operating Regions. " Resistive. " Saturation. " Subthreshold (next class)
ESE370: ircuitlevel Modeling, Design, and Optimization for Digital Systems Lec 7: September 20, 2017 MOS Transistor Operating Regions Part 1 Today! PN Junction! MOS Transistor Topology! Threshold! Operating
More informationVirtual Device Simulation. Virtual Process Integration
: CMOS Process and Device Simulation Virtual Device Simulation Virtual Process Integration Dr Zhou Xing Office: S1-B1c-95 Phone: 6790-4532 Email: exzhou@ntu.edu.sg Web: http://www.ntu.edu.sg/home/exzhou/teaching//
More informationEE115C Winter 2017 Digital Electronic Circuits. Lecture 2: MOS Transistor: IV Model
EE115C Winter 2017 Digital Electronic Circuits Lecture 2: MOS Transistor: IV Model Levels of Modeling Analytical CAD analytical Switch-level sim Transistor-level sim complexity Different complexity, accuracy,
More informationChapter 2 CMOS Transistor Theory. Jin-Fu Li Department of Electrical Engineering National Central University Jungli, Taiwan
Chapter 2 CMOS Transistor Theory Jin-Fu Li Department of Electrical Engineering National Central University Jungli, Taiwan Outline Introduction MOS Device Design Equation Pass Transistor Jin-Fu Li, EE,
More informationEEC 118 Lecture #2: MOSFET Structure and Basic Operation. Rajeevan Amirtharajah University of California, Davis Jeff Parkhurst Intel Corporation
EEC 118 Lecture #2: MOSFET Structure and Basic Operation Rajeevan Amirtharajah University of California, Davis Jeff Parkhurst Intel Corporation Announcements Lab 1 this week, report due next week Bring
More informationQuantitative MOSFET. Step 1. Connect the MOS capacitor results for the electron charge in the inversion layer Q N to the drain current.
Quantitative MOSFET Step 1. Connect the MOS capacitor results for the electron charge in the inversion layer Q N to the drain current. V DS _ n source polysilicon gate y = y * 0 x metal interconnect to
More informationMetal-oxide-semiconductor field effect transistors (2 lectures)
Metal-ide-semiconductor field effect transistors ( lectures) MOS physics (brief in book) Current-voltage characteristics - pinch-off / channel length modulation - weak inversion - velocity saturation -
More informationLecture 10 MOSFET (III) MOSFET Equivalent Circuit Models
Lecture 10 MOSFET (III) MOSFET Equivalent Circuit Models Outline Lowfrequency smallsignal equivalent circuit model Highfrequency smallsignal equivalent circuit model Reading Assignment: Howe and Sodini;
More informationScaling Issues in Planar FET: Dual Gate FET and FinFETs
Scaling Issues in Planar FET: Dual Gate FET and FinFETs Lecture 12 Dr. Amr Bayoumi Fall 2014 Advanced Devices (EC760) Arab Academy for Science and Technology - Cairo 1 Outline Scaling Issues for Planar
More informationLecture 12: MOS Capacitors, transistors. Context
Lecture 12: MOS Capacitors, transistors Context In the last lecture, we discussed PN diodes, and the depletion layer into semiconductor surfaces. Small signal models In this lecture, we will apply those
More informationLong Channel MOS Transistors
Long Channel MOS Transistors The theory developed for MOS capacitor (HO #2) can be directly extended to Metal-Oxide-Semiconductor Field-Effect transistors (MOSFET) by considering the following structure:
More informationThe Intrinsic Silicon
The Intrinsic ilicon Thermally generated electrons and holes Carrier concentration p i =n i ni=1.45x10 10 cm-3 @ room temp Generally: n i = 3.1X10 16 T 3/2 e -1.21/2KT cm -3 T= temperature in K o (egrees
More informationELEC 3908, Physical Electronics, Lecture 26. MOSFET Small Signal Modelling
ELEC 3908, Physical Electronics, Lecture 26 MOSFET Small Signal Modelling Lecture Outline MOSFET small signal behavior will be considered in the same way as for the diode and BJT Capacitances will be considered
More informationThe Devices. Digital Integrated Circuits A Design Perspective. Jan M. Rabaey Anantha Chandrakasan Borivoje Nikolic. July 30, 2002
igital Integrated Circuits A esign Perspective Jan M. Rabaey Anantha Chandrakasan Borivoje Nikolic The evices July 30, 2002 Goal of this chapter Present intuitive understanding of device operation Introduction
More informationLecture 11: MOSFET Modeling
Digital Integrated Circuits (83-313) Lecture 11: MOSFET ing Semester B, 2016-17 Lecturer: Dr. Adam Teman TAs: Itamar Levi, Robert Giterman 18 June 2017 Disclaimer: This course was prepared, in its entirety,
More informationNon Ideal Transistor Behavior
Non Ideal Transistor Behavior Slides adapted from: N. Weste, D. Harris, CMOS VLSI Design, Addison- Wesley, 3/e, 2004 1 Non-ideal Transistor I-V effects Non ideal transistor Behavior Channel Length ModulaJon
More informationCircuits. L2: MOS Models-2 (1 st Aug. 2013) B. Mazhari Dept. of EE, IIT Kanpur. B. Mazhari, IITK. G-Number
EE610: CMOS Analog Circuits L: MOS Models- (1 st Aug. 013) B. Mazhari Dept. of EE, IIT Kanpur 3 NMOS Models MOS MODEL Above Threshold Subthreshold ( GS > TN ) ( GS < TN ) Saturation ti Ti Triode ( DS >
More informationEE 330 Lecture 16. MOS Device Modeling p-channel n-channel comparisons Model consistency and relationships CMOS Process Flow
EE 330 Lecture 16 MOS Device Modeling p-channel n-channel comparisons Model consistency and relationships CMOS Process Flow Review from Last Time Operation Regions by Applications Id I D 300 250 200 150
More informationTechnische Universität Graz. Institute of Solid State Physics. 11. MOSFETs
Technische Universität Graz Institute of Solid State Physics 11. MOSFETs Dec. 12, 2018 Gradual channel approximation accumulation depletion inversion http://lampx.tugraz.at/~hadley/psd/l10/gradualchannelapprox.php
More informationLecture 4: CMOS Transistor Theory
Introduction to CMOS VLSI Design Lecture 4: CMOS Transistor Theory David Harris, Harvey Mudd College Kartik Mohanram and Steven Levitan University of Pittsburgh Outline q Introduction q MOS Capacitor q
More information6.012 MICROELECTRONIC DEVICES AND CIRCUITS
MASSACHUSETTS INSTITUTE OF TECHNOLOGY Department of Electrical Engineering and Computer Science 6.012 MICROELECTRONIC DEVICES AND CIRCUITS Answers to Exam 2 Spring 2008 Problem 1: Graded by Prof. Fonstad
More informationECE 305: Fall MOSFET Energy Bands
ECE 305: Fall 2016 MOSFET Energy Bands Professor Peter Bermel Electrical and Computer Engineering Purdue University, West Lafayette, IN USA pbermel@purdue.edu Pierret, Semiconductor Device Fundamentals
More informationChapter 2 MOS Transistor theory
Chapter MOS Transistor theory.1 Introduction An MOS transistor is a majority-carrier device, which the current a conductg channel between the source and the dra is modulated by a voltage applied to the
More informationThe Devices. Jan M. Rabaey
The Devices Jan M. Rabaey Goal of this chapter Present intuitive understanding of device operation Introduction of basic device equations Introduction of models for manual analysis Introduction of models
More informationInvestigation of the Thermal Noise of MOS Transistors under Analog and RF Operating Conditions
Investigation of the Thermal Noise of MOS Transistors under Analog and RF Operating Conditions Ralf Brederlow 1, Georg Wenig 2, and Roland Thewes 1 1 Infineon Technologies, Corporate Research, 2 Technical
More informationMOS CAPACITOR AND MOSFET
EE336 Semiconductor Devices 1 MOS CAPACITOR AND MOSFET Dr. Mohammed M. Farag Ideal MOS Capacitor Semiconductor Devices Physics and Technology Chapter 5 EE336 Semiconductor Devices 2 MOS Capacitor Structure
More informationLecture 28 - The Long Metal-Oxide-Semiconductor Field-Effect Transistor (cont.) April 18, 2007
6.720J/3.43J - Integrated Microelectronic Devices - Spring 2007 Lecture 28-1 Lecture 28 - The Long Metal-Oxide-Semiconductor Field-Effect Transistor (cont.) April 18, 2007 Contents: 1. Second-order and
More informationCMOS Digital Integrated Circuits Analysis and Design
MOS igital ntegrated ircuits Analysis and esign hapter 4 Modeling of MOS ransistors Using SPE 1 ntroduction he SPE software that was distributed by U Berkeley beginning in the late 1970s had three built-in
More informationEE 330 Lecture 16. Devices in Semiconductor Processes. MOS Transistors
EE 330 Lecture 16 Devices in Semiconductor Processes MOS Transistors Review from Last Time Model Summary I D I V DS V S I B V BS = 0 0 VS VT W VDS ID = μcox VS VT VDS VS V VDS VS VT L T < W μc ( V V )
More informationIntroduction to CMOS VLSI. Chapter 2: CMOS Transistor Theory. Harris, 2004 Updated by Li Chen, Outline
Introduction to MOS VLSI Design hapter : MOS Transistor Theory copyright@david Harris, 004 Updated by Li hen, 010 Outline Introduction MOS apacitor nmos IV haracteristics pmos IV haracteristics Gate and
More informationLecture Outline. ESE 570: Digital Integrated Circuits and VLSI Fundamentals. Review: MOS Capacitor with External Bias
ESE 57: Digital Integrated Circuits and VLSI Fundamentals Lec 5: Januar 6, 17 MOS Operating Regions, pt. 1 Lecture Outline! 3 Regions of operation for MOSFET " Subthreshold " Linear " Saturation! Level
More informationECE 305 Exam 5 SOLUTIONS: Spring 2015 April 17, 2015 Mark Lundstrom Purdue University
NAME: PUID: : ECE 305 Exam 5 SOLUTIONS: April 17, 2015 Mark Lundstrom Purdue University This is a closed book exam. You may use a calculator and the formula sheet at the end of this exam. Following the
More informationClass 05: Device Physics II
Topics: 1. Introduction 2. NFET Model and Cross Section with Parasitics 3. NFET as a Capacitor 4. Capacitance vs. Voltage Curves 5. NFET as a Capacitor - Band Diagrams at V=0 6. NFET as a Capacitor - Accumulation
More informationESE 570: Digital Integrated Circuits and VLSI Fundamentals
ESE 570: Digital Integrated Circuits and VLSI Fundamentals Lec 4: January 23, 2018 MOS Transistor Theory, MOS Model Penn ESE 570 Spring 2018 Khanna Lecture Outline! CMOS Process Enhancements! Semiconductor
More information