EE141- Spring 2003 Lecture 3. Last Lecture
|
|
- Bruno Hopkins
- 5 years ago
- Views:
Transcription
1 - Spring 003 Lecture 3 IC Manufacturing 1 Last Lecture Design Metrics (part 1) Today Design metrics (wrap-up) IC manufacturing 1
2 Administrivia Discussion sessions start this week. Only one this week (Dejan is still stuck) We -3pm in 03 McLaughlin Homework 1 due on Th» If you have problems running SPICE, check with Huifang Labs start next week!» Make sure to get your card key coded for 353 Cory» Temporary logins have been provided for the PCs in 353 Cory. Login: ee141-temp Passward: tempaccount 3 The Week at a Glance M Lab DISC* OH TA mtng (Dejan) (Huifang) (Huifang) BWRC 353 Cory TBD 89Cory Tu Lec (Jan) 03 McLaughlin OH(Jan) 511Cory W Lab (Huifang) 353 Cory DISC* (Dejan) 03 McLaughlin OH (Dejan) 89Cory Th Lec (Jan) 03 McLaughlin Lab (both) 353 Cory <- Problem Sets Due F * Discussion sections will cover identical material 4
3 Design Metrics (wrap-up) How to quantify the quality of a gate? So far : cost & reliability Today: speed & power 5 Delay Definitions V in 50% t V out t phl t plh 90% 50% 10% t t f t r 6 3
4 Ring Oscillator v 0 v 1 v v 3 v 4 v 5 v 0 v 1 v 5 T= t p N 7 AFirst-OrderRCNetwork R v out v in C t p =ln()τ =0.69RC Important model matches delay of inverter 8 4
5 Power Dissipation Instantaneous power: p(t) =v(t)i(t) =V supply i(t) Peak power: P peak = V supply i peak Average power: 1 P ave = T ) V t+ T supply t+ T p( t dt = t t T i supply () t dt 9 Energy and Energy-Delay Power-Delay Product (PDP) = E = Energy per operation = P av t p Energy-Delay Product (EDP) = quality metric of gate = E t p 10 5
6 AFirst-OrderRCNetwork R v out v in C L E 0 1 T T Vdd = Pt ()dt = V dd i supply ()dt t = V dd C L dv out = C L V dd T T Vdd 1 E cap = P cap ()dt t = V out i cap ()dt t = C L V out dv out = --C V L dd CMOS Manufacturing Process 1 6
7 CMOS Process 13 AModernCMOSProcess gate-oxide TiSi AlCu Tungsten SiO n+ p-well p-epi poly n-well p+ SiO p+ Dual-Well Trench-Isolated CMOS Process 14 7
8 Circuit Under Design V DD V DD M M4 V in V out V out M1 M3 This two-inverter circuit (of Figure 3.5 in the text) will be manufactured in a twin-well process. 15 Circuit Layout 16 8
9 The Manufacturing Process For a great tour through the process and its different steps, check For a complete walk-through of the process (64 steps), check the Book web-page 17 Photo-Lithographic Process oxidation optical mask photoresist removal (ashing) photoresist coating stepper exposure process step Typical operations in a single photolithographic cycle (from [Fullman]). photoresist development acid etch spin, rinse, dry 18 9
10 Patterning of SiO Si-substrate (a) Silicon base material Si-substrate (b) After oxidation and deposition of negative photoresist Si-substrate Photoresist SiO UV-light Patterned optical mask Exposed resist Si-substrate Si-substrate Si-substrate Chemical or plasma etch Hardened resist SiO (d) After development and etching of resist, chemical or plasma etch of SiO (e) After etching Hardened resist SiO SiO (c) Stepper exposure (f) Final result after removal of resist 19 CMOS Process at a Glance Define active areas Etch and fill trenches Implant well regions Deposit and pattern polysilicon layer Implant source and drain regions and substrate contacts Create contact and via windows Deposit and pattern metal layers 0 10
11 CMOS Process Walk-Through p-epi p+ (a) Base material: p+ substrate with p-epi layer p-epi p+ SiN 3 4 SiO (b) After deposition of gate-oxide and sacrificial nitride (acts as a buffer layer) p+ (c) After plasma etch of insulating trenches using the inverse of the active area mask 1 CMOS Process Walk-Through SiO (d) After trench filling, CMP planarization, and removal of sacrificial nitride n (e) After n-well and V Tp adjust implants p (f) After p-well and V Tn adjust implants 11
12 CMOS Process Walk-Through poly(silicon) (g) After polysilicon deposition and etch n+ p+ (h) After n+ source/drain and p+source/drain implants. These steps also dope the polysilicon. SiO (i) After deposition of SiO insulator and contact hole etch. 3 CMOS Process Walk-Through Al (j) After deposition and patterning of first Al layer. Al SiO (k) After deposition of SiO insulator, etching of via s, deposition and patterning of second layer of Al. 4 1
13 Advanced Metalization 5 Advanced Metalization 6 13
14 Design Rules Jan M. Rabaey 7 3D Perspective Polysilicon Aluminum 8 14
15 Design Rules Interface between designer and process engineer Guidelines for constructing process masks Unit dimension: Minimum line width» scalable design rules: lambda parameter» absolute dimensions (micron rules) 9 CMOS Process Layers Layer Well (p,n) Active Area (n+,p+) Select (p+,n+) Polysilicon Metal1 Metal Contact To Poly Contact To Diffusion Via Color Yellow Green Green Red Blue Magenta Black Black Black Representation 30 15
16 Layers in 0.5 µmcmosprocess 31 Intra-Layer Design Rules Same Potential Different Potential Well Active Select or Contact or Via Hole Polysilicon Metal1 Metal
17 Transistor Layout Transistor Vias and Contacts 1 Via Metal to Active Contact 1 Metal to Poly Contact
18 Select Layer 3 Select Substrate Well 35 CMOS Inverter Layout GND In V DD A A Out (a) Layout A A n p-substrate Field n + p + Oxide (b) Cross-Section along A-A 36 18
19 Layout Editor 37 Design Rule Checker poly_not_fet to all_diff minimum spacing = 0.14 um
20 Sticks Diagram V DD 3 In 1 Out Dimensionless layout entities Only topology is important Final layout generated by compaction program GND Stick diagram of inverter 39 Next Lecture The inverter at a glance The MOS transistor 40 0
EE115C Winter 2017 Digital Electronic Circuits. Lecture 3: MOS RC Model, CMOS Manufacturing
EE115C Winter 2017 Digital Electronic Circuits Lecture 3: MOS RC Model, CMOS Manufacturing Agenda MOS Transistor: RC Model (pp. 104-113) S R on D CMOS Manufacturing Process (pp. 36-46) S S C GS G G C GD
More informationToday s lecture. EE141- Spring 2003 Lecture 4. Design Rules CMOS Inverter MOS Transistor Model
- Spring 003 Lecture 4 Design Rules CMOS Inverter MOS Transistor Model Today s lecture Design Rules The CMOS inverter at a glance An MOS transistor model for manual analysis Important! Labs start next
More informationEE 5211 Analog Integrated Circuit Design. Hua Tang Fall 2012
EE 5211 Analog Integrated Circuit Design Hua Tang Fall 2012 Today s topic: 1. Introduction to Analog IC 2. IC Manufacturing (Chapter 2) Introduction What is Integrated Circuit (IC) vs discrete circuits?
More informationDiscussions start next week Labs start in week 3 Homework #1 is due next Friday
EECS141 1 Discussions start next week Labs start in week 3 Homework #1 is due next Friday Everyone should have an EECS instructional account Use cory, quasar, pulsar EECS141 2 1 CMOS LEAKAGE CHARACTERIZATION
More informationMOSFET: Introduction
E&CE 437 Integrated VLSI Systems MOS Transistor 1 of 30 MOSFET: Introduction Metal oxide semiconductor field effect transistor (MOSFET) or MOS is widely used for implementing digital designs Its major
More informationEE 434 Lecture 7. Process Technology
EE 434 Lecture 7 Process Technology Quiz 4 How many wafers can be obtained from a 2m pull? Neglect the material wasted in the kerf used to separate the wafers. 2m And the number is. 1 8 3 5 6 4 9 7 2 1
More informationVLSI VLSI CIRCUIT DESIGN PROCESSES P.VIDYA SAGAR ( ASSOCIATE PROFESSOR) Department of Electronics and Communication Engineering, VBIT
VLSI VLSI CIRCUIT DESIGN PROCESSES P.VIDYA SAGAR ( ASSOCIATE PROFESSOR) SYLLABUS UNIT II VLSI CIRCUIT DESIGN PROCESSES: VLSI Design Flow, MOS Layers, Stick Diagrams, Design Rules and Layout, 2 m CMOS Design
More information4FNJDPOEVDUPS 'BCSJDBUJPO &UDI
2010.5.4 1 Major Fabrication Steps in CMOS Process Flow UV light oxygen Silicon dioxide Silicon substrate Oxidation (Field oxide) photoresist Photoresist Coating Mask exposed photoresist Mask-Wafer Exposed
More informationCMPEN 411 VLSI Digital Circuits. Lecture 04: CMOS Inverter (static view)
CMPEN 411 VLSI Digital Circuits Lecture 04: CMOS Inverter (static view) Kyusun Choi [Adapted from Rabaey s Digital Integrated Circuits, Second Edition, 2003 J. Rabaey, A. Chandrakasan, B. Nikolic] CMPEN
More informationIntegrated Circuits & Systems
Federal University of Santa Catarina Center for Technology Computer Science & Electronics Engineering Integrated Circuits & Systems INE 5442 Lecture 2 Quality Metrics of Digital Design guntzel@inf.ufsc.br
More informationECE520 VLSI Design. Lecture 8: Interconnect Manufacturing and Modeling. Payman Zarkesh-Ha
ECE520 VLSI Design Lecture 8: Interconnect Manufacturing and Modeling Payman Zarkesh-Ha Office: ECE Bldg. 230B Office hours: Wednesday 2:00-3:00PM or by appointment E-mail: pzarkesh@unm.edu Slide: 1 Review
More informationLecture 0: Introduction
Lecture 0: Introduction Introduction q Integrated circuits: many transistors on one chip q Very Large Scale Integration (VLSI): bucketloads! q Complementary Metal Oxide Semiconductor Fast, cheap, low power
More informationELEN0037 Microelectronic IC Design. Prof. Dr. Michael Kraft
ELEN0037 Microelectronic IC Design Prof. Dr. Michael Kraft Lecture 2: Technological Aspects Technology Passive components Active components CMOS Process Basic Layout Scaling CMOS Technology Integrated
More informationChapter 2. Design and Fabrication of VLSI Devices
Chapter 2 Design and Fabrication of VLSI Devices Jason Cong 1 Design and Fabrication of VLSI Devices Objectives: To study the materials used in fabrication of VLSI devices. To study the structure of devices
More informationEEC 116 Lecture #5: CMOS Logic. Rajeevan Amirtharajah Bevan Baas University of California, Davis Jeff Parkhurst Intel Corporation
EEC 116 Lecture #5: CMOS Logic Rajeevan mirtharajah Bevan Baas University of California, Davis Jeff Parkhurst Intel Corporation nnouncements Quiz 1 today! Lab 2 reports due this week Lab 3 this week HW
More informationCMOS Inverter (static view)
Review: Design Abstraction Levels SYSTEM CMOS Inverter (static view) + MODULE GATE [Adapted from Chapter 5. 5.3 CIRCUIT of G DEVICE Rabaey s Digital Integrated Circuits,, J. Rabaey et al.] S D Review:
More informationESE 570: Digital Integrated Circuits and VLSI Fundamentals
ESE 570: Digital Integrated Circuits and VLSI Fundamentals Lec 2: January 17, 2017 MOS Fabrication pt. 1: Physics and Methodology Lecture Outline! Digital CMOS Basics! VLSI Fundamentals! Fabrication Process
More informationUniversity of Pennsylvania Department of Electrical Engineering. ESE 570 Midterm Exam March 14, 2013 FORMULAS AND DATA
University of Pennsylvania Department of Electrical Engineering ESE 570 Midterm Exam March 4, 03 FORMULAS AND DATA. PHYSICAL CONSTANTS: n i = intrinsic concentration undoped) silicon =.45 x 0 0 cm -3 @
More informationESE 570: Digital Integrated Circuits and VLSI Fundamentals
ESE 570: Digital Integrated Circuits and VLSI Fundamentals Lec 2: January 19, 2016 MOS Fabrication pt. 1: Physics and Methodology Lecture Outline! Digital CMOS Basics! VLSI Fundamentals! Fabrication Process
More informationnmos IC Design Report Module: EEE 112
nmos IC Design Report Author: 1302509 Zhao Ruimin Module: EEE 112 Lecturer: Date: Dr.Zhao Ce Zhou June/5/2015 Abstract This lab intended to train the experimental skills of the layout designing of the
More informationP. R. Nelson 1 ECE418 - VLSI. Midterm Exam. Solutions
P. R. Nelson 1 ECE418 - VLSI Midterm Exam Solutions 1. (8 points) Draw the cross-section view for A-A. The cross-section view is as shown below.. ( points) Can you tell which of the metal1 regions is the
More informationAdministrative Stuff
EE141- Spring 2004 Digital Integrated Circuits Lecture 30 PERSPECTIVES 1 Administrative Stuff Homework 10 posted just for practice. No need to turn in (hw 9 due today). Normal office hours next week. HKN
More informationENEE 359a Digital VLSI Design
SLIDE 1 ENEE 359a Digital VLSI Design Prof. blj@eng.umd.edu Credit where credit is due: Slides contain original artwork ( Jacob 2004) as well as material taken liberally from Irwin & Vijay s CSE477 slides
More informationChapter 3 Basics Semiconductor Devices and Processing
Chapter 3 Basics Semiconductor Devices and Processing Hong Xiao, Ph. D. www2.austin.cc.tx.us/hongxiao/book.htm Hong Xiao, Ph. D. www2.austin.cc.tx.us/hongxiao/book.htm 1 Objectives Identify at least two
More informationCMOS INVERTER. Last Lecture. Metrics for qualifying digital circuits. »Cost» Reliability» Speed (delay)»performance
CMOS INVERTER Last Lecture Metrics for qualifying digital circuits»cost» Reliability» Speed (delay)»performance 1 Today s lecture The CMOS inverter at a glance An MOS transistor model for manual analysis
More informationLecture 150 Basic IC Processes (10/10/01) Page ECE Analog Integrated Circuits and Systems P.E. Allen
Lecture 150 Basic IC Processes (10/10/01) Page 1501 LECTURE 150 BASIC IC PROCESSES (READING: TextSec. 2.2) INTRODUCTION Objective The objective of this presentation is: 1.) Introduce the fabrication of
More informationLecture 4: CMOS Transistor Theory
Introduction to CMOS VLSI Design Lecture 4: CMOS Transistor Theory David Harris, Harvey Mudd College Kartik Mohanram and Steven Levitan University of Pittsburgh Outline q Introduction q MOS Capacitor q
More informationCS 152 Computer Architecture and Engineering
CS 152 Computer Architecture and Engineering Lecture 12 VLSI II 2005-2-24 John Lazzaro (www.cs.berkeley.edu/~lazzaro) TAs: Ted Hong and David Marquardt www-inst.eecs.berkeley.edu/~cs152/ Last Time: Device
More informationSelf-study problems and questions Processing and Device Technology, FFF110/FYSD13
Self-study problems and questions Processing and Device Technology, FFF110/FYSD13 Version 2016_01 In addition to the problems discussed at the seminars and at the lectures, you can use this set of problems
More informationEEC 118 Lecture #6: CMOS Logic. Rajeevan Amirtharajah University of California, Davis Jeff Parkhurst Intel Corporation
EEC 118 Lecture #6: CMOS Logic Rajeevan mirtharajah University of California, Davis Jeff Parkhurst Intel Corporation nnouncements Quiz 1 today! Lab 2 reports due this week Lab 3 this week HW 3 due this
More informationENGR890 Digital VLSI Design Fall Lecture 4: CMOS Inverter (static view)
ENGR89 Digital VLSI Design Fall 5 Lecture 4: CMOS Inverter (static view) [Adapted from Chapter 5 of Digital Integrated Circuits, 3, J. Rabaey et al.] [Also borrowed from Vijay Narayanan and Mary Jane Irwin]
More informationThe Devices. Digital Integrated Circuits A Design Perspective. Jan M. Rabaey Anantha Chandrakasan Borivoje Nikolic. July 30, 2002
Digital Integrated Circuits A Design Perspective Jan M. Rabaey Anantha Chandrakasan Borivoje Nikolic The Devices July 30, 2002 Goal of this chapter Present intuitive understanding of device operation Introduction
More informationEE143 LAB. Professor N Cheung, U.C. Berkeley
EE143 LAB 1 1 EE143 Equipment in Cory 218 2 Guidelines for Process Integration * A sequence of Additive and Subtractive steps with lateral patterning Processing Steps Si wafer Watch out for materials compatibility
More informationIC Fabrication Technology
IC Fabrication Technology * History: 1958-59: J. Kilby, Texas Instruments and R. Noyce, Fairchild * Key Idea: batch fabrication of electronic circuits n entire circuit, say 10 7 transistors and 5 levels
More informationEE115C Digital Electronic Circuits Homework #6
Problem 1 Sizing of adder blocks Electrical Engineering Department Spring 2010 EE115C Digital Electronic Circuits Homework #6 Solution Figure 1: Mirror adder. Study the mirror adder cell (textbook, pages
More informationDigital Integrated Circuits A Design Perspective
Semiconductor Memories Adapted from Chapter 12 of Digital Integrated Circuits A Design Perspective Jan M. Rabaey et al. Copyright 2003 Prentice Hall/Pearson Outline Memory Classification Memory Architectures
More informationTHE INVERTER. Inverter
THE INVERTER DIGITAL GATES Fundamental Parameters Functionality Reliability, Robustness Area Performance» Speed (delay)» Power Consumption» Energy Noise in Digital Integrated Circuits v(t) V DD i(t) (a)
More informationDigital Integrated Circuits (83-313) Lecture 5: Interconnect. Semester B, Lecturer: Adam Teman TAs: Itamar Levi, Robert Giterman 1
Digital Integrated Circuits (83-313) Lecture 5: Interconnect Semester B, 2015-16 Lecturer: Adam Teman TAs: Itamar Levi, Robert Giterman 1 What will we learn today? 1 A First Glance at Interconnect 2 3
More informationCMPEN 411 VLSI Digital Circuits. Lecture 03: MOS Transistor
CMPEN 411 VLSI Digital Circuits Lecture 03: MOS Transistor Kyusun Choi [Adapted from Rabaey s Digital Integrated Circuits, Second Edition, 2003 J. Rabaey, A. Chandrakasan, B. Nikolic] CMPEN 411 L03 S.1
More informationThe Physical Structure (NMOS)
The Physical Structure (NMOS) Al SiO2 Field Oxide Gate oxide S n+ Polysilicon Gate Al SiO2 SiO2 D n+ L channel P Substrate Field Oxide contact Metal (S) n+ (G) L W n+ (D) Poly 1 Transistor Resistance Two
More informationDevice Models (PN Diode, MOSFET )
Device Models (PN Diode, MOSFET ) Instructor: Steven P. Levitan steve@ece.pitt.edu TA: Gayatri Mehta, José Martínez Book: Digital Integrated Circuits: A Design Perspective; Jan Rabaey Lab Notes: Handed
More informationAE74 VLSI DESIGN JUN 2015
Q.2 a. Write down the different levels of integration of IC industry. (4) b. With neat sketch explain briefly PMOS & NMOS enhancement mode transistor. N-MOS enhancement mode transistor:- This transistor
More informationLecture 7 Circuit Delay, Area and Power
Lecture 7 Circuit Delay, Area and Power lecture notes from S. Mitra Intro VLSI System course (EE271) Introduction to VLSI Systems 1 Circuits and Delay Introduction to VLSI Systems 2 Power, Delay and Area:
More informationECE321 Electronics I
ECE31 Electronics Lecture 1: CMOS nverter: Noise Margin & Delay Model Payman Zarkesh-Ha Office: ECE Bldg. 30B Office hours: Tuesday :00-3:00PM or by appointment E-mail: payman@ece.unm.edu Slide: 1 CMOS
More informationDevice Models (PN Diode, MOSFET )
Device Models (PN Diode, MOSFET ) Instructor: Steven P. Levitan steve@ece.pitt.edu TA: Gayatri Mehta, José Martínez Book: Digital Integrated Circuits: A Design Perspective; Jan Rabaey Lab Notes: Handed
More informationEE C247B / ME C218 INTRODUCTION TO MEMS DESIGN SPRING 2016 C. NGUYEN PROBLEM SET #4
Issued: Wednesday, March 4, 2016 PROBLEM SET #4 Due: Monday, March 14, 2016, 8:00 a.m. in the EE C247B homework box near 125 Cory. 1. This problem considers bending of a simple cantilever and several methods
More informationEE241 - Spring 2000 Advanced Digital Integrated Circuits. References
EE241 - Spring 2000 Advanced Digital Integrated Circuits Lecture 26 Memory References Rabaey, Digital Integrated Circuits Memory Design and Evolution, VLSI Circuits Short Course, 1998.» Gillingham, Evolution
More informationESE 570: Digital Integrated Circuits and VLSI Fundamentals
ESE 570: Digital Integrated Circuits and VLSI Fundamentals Lec 15: March 3, 2016 Combination Logic: Ratioed & Pass Logic, and Performance Lecture Outline! CMOS NOR2 Worst Case Analysis! Pass Transistor
More informationMOS Transistor Properties Review
MOS Transistor Properties Review 1 VLSI Chip Manufacturing Process Photolithography: transfer of mask patterns to the chip Diffusion or ion implantation: selective doping of Si substrate Oxidation: SiO
More informationSemiconductor Memories
Semiconductor References: Adapted from: Digital Integrated Circuits: A Design Perspective, J. Rabaey UCB Principles of CMOS VLSI Design: A Systems Perspective, 2nd Ed., N. H. E. Weste and K. Eshraghian
More informationThe Inverter. Digital Integrated Circuits A Design Perspective. Jan M. Rabaey Anantha Chandrakasan Borivoje Nikolic
Digital Integrated Circuits A Design Perspective Jan M. Rabaey Anantha Chandrakasan Borivoje Nikolic The Inverter Revised from Digital Integrated Circuits, Jan M. Rabaey el, 2003 Propagation Delay CMOS
More informationENEE 359a Digital VLSI Design
SLIDE 1 ENEE 359a Digital VLSI Design & Logical Effort Prof. blj@ece.umd.edu Credit where credit is due: Slides contain original artwork ( Jacob 2004) as well as material taken liberally from Irwin & Vijay
More informationUNIVERSITY OF CALIFORNIA College of Engineering Department of Electrical Engineering and Computer Sciences. Fall Exam 1
UNIVERSITY OF CALIFORNIA College of Engineering Department of Electrical Engineering and Computer Sciences EECS 143 Fall 2008 Exam 1 Professor Ali Javey Answer Key Name: SID: 1337 Closed book. One sheet
More informationEE 330 Lecture 16. MOS Device Modeling p-channel n-channel comparisons Model consistency and relationships CMOS Process Flow
EE 330 Lecture 16 MOS Device Modeling p-channel n-channel comparisons Model consistency and relationships CMOS Process Flow Review from Last Time Operation Regions by Applications Id I D 300 250 200 150
More informationEE 330 Lecture 18. Small-signal Model (very preliminary) Bulk CMOS Process Flow
EE 330 Lecture 18 Small-signal Model (very preliminary) Bulk CMOS Process Flow Review from Last Lecture How many models of the MOSFET do we have? Switch-level model (2) Square-law model Square-law model
More informationMake sure the exam paper has 9 pages (including cover page) + 3 pages of data for reference
UNIVERSITY OF CALIFORNIA College of Engineering Department of Electrical Engineering and Computer Sciences Spring 2006 EE143 Midterm Exam #1 Family Name First name SID Signature Make sure the exam paper
More informationCMOS Transistors, Gates, and Wires
CMOS Transistors, Gates, and Wires Should the hardware abstraction layers make today s lecture irrelevant? pplication R P C W / R W C W / 6.375 Complex Digital Systems Christopher atten February 5, 006
More informationSemiconductor memories
Semiconductor memories Semiconductor Memories Data in Write Memory cell Read Data out Some design issues : How many cells? Function? Power consuption? Access type? How fast are read/write operations? Semiconductor
More informationMOSFET and CMOS Gate. Copy Right by Wentai Liu
MOSFET and CMOS Gate CMOS Inverter DC Analysis - Voltage Transfer Curve (VTC) Find (1) (2) (3) (4) (5) (6) V OH min, V V OL min, V V IH min, V V IL min, V OHmax OLmax IHmax ILmax NM L = V ILmax V OL max
More informationImportant! EE141- Fall 2002 Lecture 5. CMOS Inverter MOS Transistor Model
- Fall 00 Lecture 5 CMO Inverter MO Transistor Model Important! Lab 3 this week You must show up in one of the lab sessions this week If you don t show up you will be dropped from the class» Unless you
More informationESE370: Circuit-Level Modeling, Design, and Optimization for Digital Systems
ESE370: Circuit-Level Modeling, Design, and Optimization for Digital Systems Lec 6: September 18, 2017 MOS Model You are Here: Transistor Edition! Previously: simple models (0 and 1 st order) " Comfortable
More informationStep 1. Finding V M. Goal: Þnd V M = input voltage for the output = V M both transistors are saturated at V IN = V M since
Step 1. Finding V M Goal: Þnd V M = input voltage for the output = V M both transistors are saturated at V IN = V M since V DSn = V M - 0 > V M - V Tn V SDp = V DD - V M = (V DD - V M ) V Tp Equate drain
More informationEE141- Fall 2002 Lecture 27. Memory EE141. Announcements. We finished all the labs No homework this week Projects are due next Tuesday 9am EE141
- Fall 2002 Lecture 27 Memory Announcements We finished all the labs No homework this week Projects are due next Tuesday 9am 1 Today s Lecture Memory:» SRAM» DRAM» Flash Memory 2 Floating-gate transistor
More informationCS 152 Computer Architecture and Engineering. Lecture 11 VLSI
CS 152 Computer Architecture and Engineering Lecture 11 VLSI 2005-10-6 John Lazzaro (www.cs.berkeley.edu/~lazzaro) TAs: David Marquardt and Udam Saini www-inst.eecs.berkeley.edu/~cs152/ Today: State Storage
More informationLecture 25. Semiconductor Memories. Issues in Memory
Lecture 25 Semiconductor Memories Issues in Memory Memory Classification Memory Architectures TheMemoryCore Periphery 1 Semiconductor Memory Classification RWM NVRWM ROM Random Access Non-Random Access
More informationEE-612: Lecture 22: CMOS Process Steps
EE-612: Lecture 22: CMOS Process Steps Mark Lundstrom Electrical and Computer Engineering Purdue University West Lafayette, IN USA Fall 2006 NCN www.nanohub.org Lundstrom EE-612 F06 1 outline 1) Unit Process
More informationChapter 5. The Inverter. V1. April 10, 03 V1.1 April 25, 03 V2.1 Nov Inverter
Chapter 5 The Inverter V1. April 10, 03 V1.1 April 25, 03 V2.1 Nov.12 03 Objective of This Chapter Use Inverter to know basic CMOS Circuits Operations Watch for performance Index such as Speed (Delay calculation)
More informationMOS Transistor Theory
MOS Transistor Theory So far, we have viewed a MOS transistor as an ideal switch (digital operation) Reality: less than ideal EE 261 Krish Chakrabarty 1 Introduction So far, we have treated transistors
More informationLecture 11 VTCs and Delay. No lab today, Mon., Tues. Labs restart next week. Midterm #1 Tues. Oct. 7 th, 6:30-8:00pm in 105 Northgate
EE4-Fall 2008 Digital Integrated Circuits Lecture VTCs and Delay Lecture # Announcements No lab today, Mon., Tues. Labs restart next week Midterm # Tues. Oct. 7 th, 6:30-8:00pm in 05 Northgate Exam is
More informationEEC 116 Lecture #3: CMOS Inverters MOS Scaling. Rajeevan Amirtharajah University of California, Davis Jeff Parkhurst Intel Corporation
EEC 116 Lecture #3: CMOS Inverters MOS Scaling Rajeevan Amirtharajah University of California, Davis Jeff Parhurst Intel Corporation Outline Review: Inverter Transfer Characteristics Lecture 3: Noise Margins,
More informationAnnouncements. EE141- Spring 2003 Lecture 8. Power Inverter Chain
- Spring 2003 Lecture 8 Power Inverter Chain Announcements Homework 3 due today. Homework 4 will be posted later today. Special office hours from :30-3pm at BWRC (in lieu of Tuesday) Today s lecture Power
More informationDynamic operation 20
Dynamic operation 20 A simple model for the propagation delay Symmetric inverter (rise and fall delays are identical) otal capacitance is linear t p Minimum length devices R W C L t = 0.69R C = p W L 0.69
More informationHw 6 and 7 Graded and available Project Phase 2 Graded Project Phase 3 Launch Today
EECS141 1 Hw 8 Posted Last one to be graded Due Friday April 30 Hw 6 and 7 Graded and available Project Phase 2 Graded Project Phase 3 Launch Today EECS141 2 1 6 5 4 3 2 1 0 1.5 2 2.5 3 3.5 4 Frequency
More informationLecture Outline. ESE 570: Digital Integrated Circuits and VLSI Fundamentals. Review: 1st Order RC Delay Models. Review: Two-Input NOR Gate (NOR2)
ESE 570: Digital Integrated Circuits and VLSI Fundamentals Lec 14: March 1, 2016 Combination Logic: Ratioed and Pass Logic Lecture Outline! CMOS Gates Review " CMOS Worst Case Analysis! Ratioed Logic Gates!
More informationLecture 9: Interconnect
Digital Integrated Circuits (83-313) Lecture 9: Interconnect Semester B, 2016-17 Lecturer: Dr. Adam Teman TAs: Itamar Levi, Robert Giterman 23 May 2017 Disclaimer: This course was prepared, in its entirety,
More informationLecture 4: DC & Transient Response
Introduction to CMOS VLSI Design Lecture 4: DC & Transient Response David Harris Harvey Mudd College Spring 004 Outline DC Response Logic Levels and Noise Margins Transient Response Delay Estimation Slide
More informationLecture 15 OUTLINE. MOSFET structure & operation (qualitative) Review of electrostatics The (N)MOS capacitor
Lecture 15 OUTLINE MOSFET structure & operation (qualitative) Review of electrostatics The (N)MOS capacitor Electrostatics t ti Charge vs. voltage characteristic Reading: Chapter 6.1 6.2.1 EE105 Fall 2007
More informationLecture 12 CMOS Delay & Transient Response
EE 471: Transport Phenomena in Solid State Devices Spring 2018 Lecture 12 CMOS Delay & Transient Response Bryan Ackland Department of Electrical and Computer Engineering Stevens Institute of Technology
More informationESE 570: Digital Integrated Circuits and VLSI Fundamentals
ESE 570: Digital Integrated Circuits and VLSI Fundamentals Lec 15: March 15, 2018 Euler Paths, Energy Basics and Optimization Midterm! Midterm " Mean: 89.7 " Standard Dev: 8.12 2 Lecture Outline! Euler
More informationIntroduction to CMOS VLSI Design Lecture 1: Introduction
Introduction to CMOS VLSI Design Lecture 1: Introduction David Harris, Harvey Mudd College Kartik Mohanram and Steven Levitan University of Pittsburgh Introduction Integrated circuits: many transistors
More informationEEC 118 Lecture #2: MOSFET Structure and Basic Operation. Rajeevan Amirtharajah University of California, Davis Jeff Parkhurst Intel Corporation
EEC 118 Lecture #2: MOSFET Structure and Basic Operation Rajeevan Amirtharajah University of California, Davis Jeff Parkhurst Intel Corporation Announcements Lab 1 this week, report due next week Bring
More informationESE 570: Digital Integrated Circuits and VLSI Fundamentals
ESE 570: Digital Integrated Circuits and VLSI Fundamentals Lec 4: January 23, 2018 MOS Transistor Theory, MOS Model Penn ESE 570 Spring 2018 Khanna Lecture Outline! CMOS Process Enhancements! Semiconductor
More informationVLSI GATE LEVEL DESIGN UNIT - III P.VIDYA SAGAR ( ASSOCIATE PROFESSOR) Department of Electronics and Communication Engineering, VBIT
VLSI UNIT - III GATE LEVEL DESIGN P.VIDYA SAGAR ( ASSOCIATE PROFESSOR) contents GATE LEVEL DESIGN : Logic Gates and Other complex gates, Switch logic, Alternate gate circuits, Time Delays, Driving large
More informationTopics to be Covered. capacitance inductance transmission lines
Topics to be Covered Circuit Elements Switching Characteristics Power Dissipation Conductor Sizes Charge Sharing Design Margins Yield resistance capacitance inductance transmission lines Resistance of
More informationCarrier Transport by Diffusion
Carrier Transport by Diffusion Holes diffuse ÒdownÓ the concentration gradient and carry a positive charge --> hole diffusion current has the opposite sign to the gradient in hole concentration dp/dx p(x)
More informationCMOS Digital Integrated Circuits Lec 13 Semiconductor Memories
Lec 13 Semiconductor Memories 1 Semiconductor Memory Types Semiconductor Memories Read/Write (R/W) Memory or Random Access Memory (RAM) Read-Only Memory (ROM) Dynamic RAM (DRAM) Static RAM (SRAM) 1. Mask
More informationEE382M-14 CMOS Analog Integrated Circuit Design
EE382M-14 CMOS Analog Integrated Circuit Design Lecture 3, MOS Capacitances, Passive Components, and Layout of Analog Integrated Circuits MOS Capacitances Type of MOS transistor capacitors Depletion capacitance
More informationInterconnect (2) Buffering Techniques. Logical Effort
Interconnect (2) Buffering Techniques. Logical Effort Lecture 14 18-322 Fall 2002 Textbook: [Sections 4.2.1, 8.2.3] A few announcements! M1 is almost over: The check-off is due today (by 9:30PM) Students
More informationLecture 12: MOS Capacitors, transistors. Context
Lecture 12: MOS Capacitors, transistors Context In the last lecture, we discussed PN diodes, and the depletion layer into semiconductor surfaces. Small signal models In this lecture, we will apply those
More information! Previously: simple models (0 and 1 st order) " Comfortable with basic functions and circuits. ! This week and next (4 lectures)
ESE370: CircuitLevel Modeling, Design, and Optimization for Digital Systems Lec 6: September 18, 2017 MOS Model You are Here: Transistor Edition! Previously: simple models (0 and 1 st order) " Comfortable
More informationan introduction to Semiconductor Devices
an introduction to Semiconductor Devices Donald A. Neamen Chapter 6 Fundamentals of the Metal-Oxide-Semiconductor Field-Effect Transistor Introduction: Chapter 6 1. MOSFET Structure 2. MOS Capacitor -
More informationESE 570: Digital Integrated Circuits and VLSI Fundamentals
ESE 570: Digital Integrated Circuits and VLSI Fundamentals Lec 4: January 29, 2019 MOS Transistor Theory, MOS Model Penn ESE 570 Spring 2019 Khanna Lecture Outline! CMOS Process Enhancements! Semiconductor
More informationLecture 11: MOS Transistor
Lecture 11: MOS Transistor Prof. Niknejad Lecture Outline Review: MOS Capacitors Regions MOS Capacitors (3.8 3.9) CV Curve Threshold Voltage MOS Transistors (4.1 4.3): Overview Cross-section and layout
More informationThe CMOS Inverter: A First Glance
The CMOS Inverter: A First Glance V DD S D V in V out C L D S CMOS Inverter N Well V DD V DD PMOS 2λ PMOS Contacts In Out In Out Metal 1 NMOS Polysilicon NMOS GND CMOS Inverter: Steady State Response V
More information12. Memories / Bipolar transistors
Technische Universität Graz Institute of Solid State Physics 12. Memories / Bipolar transistors Jan. 9, 2019 Technische Universität Graz Institute of Solid State Physics Exams January 31 March 8 May 17
More informationLecture 15 OUTLINE. MOSFET structure & operation (qualitative) Review of electrostatics The (N)MOS capacitor
Lecture 15 OUTLINE MOSFET structure & operation (qualitative) Review of electrostatics The (N)MOS capacitor Electrostatics Charge vs. voltage characteristic Reading: Chapter 6.1 6.2.1 EE15 Spring 28 Lecture
More informationThe Devices. Jan M. Rabaey
The Devices Jan M. Rabaey Goal of this chapter Present intuitive understanding of device operation Introduction of basic device equations Introduction of models for manual analysis Introduction of models
More informationMidterm. ESE 570: Digital Integrated Circuits and VLSI Fundamentals. Lecture Outline. Pass Transistor Logic. Restore Output.
ESE 570: Digital Integrated Circuits and VLSI Fundamentals Lec 16: March 21, 2017 Transmission Gates, Euler Paths, Energy Basics Review Midterm! Midterm " Mean: 79.5 " Standard Dev: 14.5 2 Lecture Outline!
More informationIntegrated Circuits & Systems
Federal University of Santa Catarina Center for Technology Computer Science & Electronics Engineering Integrated Circuits & Systems INE 5442 Lecture 7 Interconnections 1: wire resistance, capacitance,
More informationDigital Integrated Circuits A Design Perspective. Semiconductor. Memories. Memories
Digital Integrated Circuits A Design Perspective Semiconductor Chapter Overview Memory Classification Memory Architectures The Memory Core Periphery Reliability Case Studies Semiconductor Memory Classification
More information