A3D Hybrid Model of ahelicon Source +

Size: px
Start display at page:

Download "A3D Hybrid Model of ahelicon Source +"

Transcription

1 A3D Hybrid Model of ahelicon Source + Eric R. Keiter* and Mark J. Kushner** Department of Electrical and Computer Engineering 146 W. Green St., Urbana, IL 6181 USA 1st Gaseous Electronics Conference October Work supported by Semiconductor Research Corp. and AFOSR/DARPA. * mjk@uiuc.edu ** Present Address: Sandia National Labs, Albuquerque, NM, USA

2 Agenda!!!!! Abstract ModelDescription -waveequation -tensorconductivity Results,NagoyaTypeIIIcoil Results,M=Coil Conclusions Gec98_Helicon1

3 Abstract As the semiconductor industry moves to larger wafer sizes ($>$3mm) effecient new plasma sources which are capable of maintaining process uniformity at large scale will be needed. Helicon sources have been proposedasapossiblealternativetoinductivelycoupledplasmasources, duetohighefficiency,andthepowerdepositionnotbeinglimitedtoaskin depth. Additionally, helicon plasmas operate at very low pressure, so particulate contamination is minimal. In this paper, we present results fromanumericalstudyofaheliconsource. Thethreedimensionalhybrid plasmaequipmentmodel(hpem3d)hasbeenextendedtoincludeacold plasmatensorconductivityintheelectromagnetics(em)module. Astatic magneticfield isgenerated byasolenoid whichsurrounds thecylindrical reactor geometry and is simulated by solving for the vector potential. Transport of charged and neutral species is handled with a fluid simulation. By varying parameters such as the static magnetic field magnitude,reactorgeometry,andcoilconfiguration,weareabletomodify thepowerdepositionprofile. Thisinturndeterminesthedownstreamion and neutral flux uniformity. We find that for larger magnetic fields, the powerdepositionpenetratesmoredeeplyintothebulkplasma. Gec98_Helicon2

4 Scehmatic of 3D Hybrid Plasma Equipment Model (HPEM-3D)! HPEM-3D combines modules which address different physics or different timescales. E(r,z, θ) Magneto- Statics Module Circuit Module I,V Electromagnetics Module σ(r,z, θ ) E(r,z, θ) B(r,z, θ) Electron Energy Equation/ Boltzmann Module N(r,z, θ) P(r,z, θ) Φ(r,z, θ ) T(r,z, e θ) S(r,z, θ) µ (r,z, θ ) Electron Transport (Continuity) Ion Transport (Continuity, Momentum) Surface Kinetics Ambipolar Transport/ Sheath Poisson Solution Gec98_Helicon3

5 Electric Field Module: Wave Equation! The electric field module of the HPEM-3D is responsible for solving the 3D frequency domain wave equation: 2 E = µ ε ω E iµ ωj iωµ σe ant a f 2! The left hand side is replaced by: E = E E where the first term is neglected.! The conductivity, σ,is the cold plasma tensor conductivity (see next slide)! The finite difference form of the wave equation results in alarge matrix equation, whichis solved using ageneralized minimum residual method.!!! The Helicon wavelength can be estimated by If λ is small compared to reactor size, the numerical solution of the wave equation is difficult, as the problem is less well conditioned. The matrix problem is solved using the generalized minimum residual method. λ = 1. x1 2 B ωrn Gec98_Helicon4

6 Conductivity Tensor! The plasma current in the wave equation is handled by acold plasma tensor conductivity: σ = σ mv qa α 1 + B m 2 2 c h F G H 2 2 α + B αb + B B αb + B B r z r θ θ r z 2 2 αb + B B α + B αb + B B z r θ θ r θ z 2 2 θ r z r θ z z αb + B B αb + B B α + B I J K α = a iω q + v / m m f σ 2 = q m mv m! The addition of the static magnetic field results in alarger,less well conditioned matrix problem.! If the static magnetic field is predominantly in the z-direction, the (3,3) term of the tensor dominates Gec98_Helicon

7 Antenna Configuration! Two different antenna configurations were used: Nagoya Type III Double Ring (m=) J J! The Nagoya Type III is commonly used in laboratory Helicon plasmas, where it has been shown to produce an m=1 mode under the right conditions.! The Double Ring configuration was tested here to see if using it would resultin am=heliconmode. Gec98_Helicon6

8 Reactor Geometry 3 3 Side (r,z) view Showerhead Solenoid Top (r, θ)view, m= coil 2 1 Antenna Coil Dielectric Reactor wall Solenoid Top (r, θ)view, Nagoya Type III coil Coil Wafer! Antenna coil can either be the m= or Nagoya Type III configuration Gec98_Helicon Solenoid Coil

9 Plasma Parameters! M=cases: Pressure:.mTorr TotalPowerDeposition: 12Watts StaticMagneticField:,6,9Gauss Gas:Argon ReactorHeight:3cm ReactorRadius:1cm! NagoyaTypeIIIcases: Pressure:.mTorr TotalPowerDeposition: 6Watts StaticMagneticField:,3,6Gauss Gas:Argon ReactorHeight:3cm ReactorRadius:1cm Gec98_Helicon8

10 No Static Magnetic Field (B=), Nagoya Type III Coil AR 3.8E E E E E E E E E E E E E E E E+7.113E E E+7 1E+7 E-MAG Argon Ion Density (cm-3) Electric Field Total Magnitude With no magnetostatic field, the plasma is in purely inductive mode. The power deposition is confined near the coil. Gec98_Helicon1

11 No Static Magnetic Field (B=), Nagoya Type III Coil E E E E E E E E E E E E E E E Argon Ion Density (cm -3 ) Electric Field Total Magnitude Total Power Deposition (Log Watt/cm -3 ) Top view: With no magnetostatic field, the plasma is in purely inductive mode. Gec98_Helicon11

12 No Static Magnetic Field (B=), Nagoya Type III Coil Argon Ion Density (cm -3 ) Electric Field Total Magnitude Total Power Deposition (Log Watt/cm -3 ) Top view: With no magnetostatic field, the plasma is in purely inductive mode. Gec98_Helicon12

13 Static Magnetic Field (B=3 G), Nagoya Type III Coil AR 1.2E E E E E E E E E E E E E E E E E E E+7 1E+7 E-MAG Argon Ion Density (cm-3) Electric Field Total Magnitude With the addition of a magnetostatic field, power deposition extends downstream away from the coils. Gec98_Helicon13

14 Static Magnetic Field (B=3 G), Nagoya Type III Coil E E E E E E E E E E E+1.447E E E E E-.4132E E E E E E E-6 1E Argon Ion Density (cm -3 ) Electric Field Total Magnitude Total Power Deposition (Log Watt/cm -3 ) Top view: With the addition of a magnetostatic field, power deposition extends downstream from the coils. Power deposition near the theta component of the coils is reduced. Gec98_Helicon14

15 Static Magnetic Field (B=3 G), Nagoya Type III Coil E E E E E E E E E E E E E E E Argon Ion Density (cm -3 ) Electric Field Total Magnitude Total Power Deposition (Log Watt/cm -3 ) Top view: With the addition of a magnetostatic field, power deposition extends downstream from the coils. The addition of a Bz magnetic field results in the power deposition mostly being near the z component of the coil. Gec98_Helicon

16 Static Magnetic Field (B=6 G), Nagoya Type III Coil AR E E E E E E E E E E E E E E E E E E E+7 1E+7 E-MAG Argon Ion Density (cm -3 ) Electric Field Total Magnitude With the addition of a magnetostatic field, power deposition extends downstream away from the coils. Gec98_Helicon16

17 Static Magnetic Field (B=6 G), Nagoya Type III Coil E E E E E E E E E E E+1.447E E E E E E E E E E E E E E-7 1E Argon Ion Density (cm -3 ) Electric Field Total Magnitude Total Power Deposition (Log Watt/cm -3 ) Top view: With the addition of a magnetostatic field, power deposition extends downstream away from the coils. Enhanced power deposition near z- component of the coils. Gec98_Helicon17

18 Static Magnetic Field (B=6 G), Nagoya Type III Coil E E E E E E E E E E E E E E E Argon Ion Density (cm -3 ) Top view: Electric Field Total Magnitude Total Power Deposition (Log Watt/cm -3 ) With the addition of a magnetostatic field, power deposition extends downstream from the coils. The addition of a Bz magnetic field results in the power deposition mostly being near the z component of the coil. Gec98_Helicon18

19 No Static Magnetic Field (B=), M= Coil.84667E E E E E E E E+1.716E E E E E E E E+8.689E E E+7 1E Argon Ion Density (cm-3) Electric Field Total Magnitude (Log V/cm) With no magnetostatic field, the plasma is in purely inductive mode. Gec98_Helicon19

20 No Static Magnetic Field (B=), M= Coil E E E E E E E E E E E E E E E Argon Ion Density (cm -3 ) Electric Field Total Magnitude Total Power Deposition (Log Watt/cm -3 ) Top view: With no magnetostatic field, the plasma is in purely inductive mode. Gec98_Helicon2

21 Static Magnetic Field: B=6 G, M= Coil.3348E E E E+1.398E+1 3.4E E E E E E E E E E E E E E+7 1E Argon Ion Density (cm -3 ) Electric Field Total Magnitude The addition of the magnetic field (B z =6G), the electrons tend to follow the magnetic field lines, and the heating region becomes elongated down the z-axis. Gec98_Helicon21

22 Static Magnetic Field: B=6 G, M= Coil E E E E E E E E E E E E E E E Argon Ion Density (cm -3 ) Electric Field Total Magnitude Total Power Deposition (Log Watt/cm -3 ) Top view: The addition of the magnetic field (B z =6G), the electrons tend to follow the magnetic field lines, and the heating region becomes elongated down the z-axis. Gec98_Helicon22

23 Static Magnetic Field: B=9 G, M= Coil.33429E E E E E E E E E E E E+8.11E E E E E E E+7 1E Argon Ion Density (cm -3 ) Electric Field Total Magnitude As the magnetic field increases from 6 Gauss to 9 Gauss, the electric field penetration increases. Gec98_Helicon23

24 Static Magnetic Field: B=9 G, M= Coil E E E E E E E E E E E E E E E Argon Ion Density (cm -3 ) Electric Field Total Magnitude Total Power Deposition (Log Watt/cm -3 ) Top view: As the magnetic field increases from 6 Gauss to 9 Gauss, the electric field penetration increases. Gec98_Helicon2

MODELING OF AN ECR SOURCE FOR MATERIALS PROCESSING USING A TWO DIMENSIONAL HYBRID PLASMA EQUIPMENT MODEL. Ron L. Kinder and Mark J.

MODELING OF AN ECR SOURCE FOR MATERIALS PROCESSING USING A TWO DIMENSIONAL HYBRID PLASMA EQUIPMENT MODEL. Ron L. Kinder and Mark J. TECHCON 98 Las Vegas, Nevada September 9-11, 1998 MODELING OF AN ECR SOURCE FOR MATERIALS PROCESSING USING A TWO DIMENSIONAL HYBRID PLASMA EQUIPMENT MODEL Ron L. Kinder and Mark J. Kushner Department of

More information

SIMULATIONS OF ECR PROCESSING SYSTEMS SUSTAINED BY AZIMUTHAL MICROWAVE TE(0,n) MODES*

SIMULATIONS OF ECR PROCESSING SYSTEMS SUSTAINED BY AZIMUTHAL MICROWAVE TE(0,n) MODES* 25th IEEE International Conference on Plasma Science Raleigh, North Carolina June 1-4, 1998 SIMULATIONS OF ECR PROCESSING SYSTEMS SUSTAINED BY AZIMUTHAL MICROWAVE TE(,n) MODES* Ron L. Kinder and Mark J.

More information

OPTIMIZATION OF PLASMA UNIFORMITY USING HOLLOW-CATHODE STRUCTURE IN RF DISCHARGES*

OPTIMIZATION OF PLASMA UNIFORMITY USING HOLLOW-CATHODE STRUCTURE IN RF DISCHARGES* 51th Gaseous Electronics Conference & 4th International Conference on Reactive Plasmas Maui, Hawai i 19-23 October 1998 OPTIMIZATION OF PLASMA UNIFORMITY USING HOLLOW-CATHODE STRUCTURE IN RF DISCHARGES*

More information

SPUTTER-WIND HEATING IN IONIZED METAL PVD+

SPUTTER-WIND HEATING IN IONIZED METAL PVD+ SPUTTER-WIND HEATING IN IONIZED METAL PVD+ Junqing Lu* and Mark Kushner** *Department of Mechanical and Industrial Engineering **Department of Electrical and Computer Engineering University of Illinois

More information

INVESTIGATION of Si and SiO 2 ETCH MECHANISMS USING an INTEGRATED SURFACE KINETICS MODEL

INVESTIGATION of Si and SiO 2 ETCH MECHANISMS USING an INTEGRATED SURFACE KINETICS MODEL 46 th AVS International Symposium Oct. 25-29, 1999 Seattle, WA INVESTIGATION of Si and SiO 2 ETCH MECHANISMS USING an INTEGRATED SURFACE KINETICS MODEL Da Zhang* and Mark J. Kushner** *Department of Materials

More information

PARTICLE CONTROL AT 100 nm NODE STATUS WORKSHOP: PARTICLES IN PLASMAS

PARTICLE CONTROL AT 100 nm NODE STATUS WORKSHOP: PARTICLES IN PLASMAS PARTICLE CONTROL AT 100 nm NODE STATUS WORKSHOP: PARTICLES IN PLASMAS Mark J. Kushner University of Illinois Department of Electrical and Computer Engineering Urbana, IL 61801 mjk@uiuc.edu December 1998

More information

INTRODUCTION TO THE HYBRID PLASMA EQUIPMENT MODEL

INTRODUCTION TO THE HYBRID PLASMA EQUIPMENT MODEL INTRODUCTION TO THE HYBRID PLASMA EQUIPMENT MODEL Prof. Mark J. Kushner Department of Electrical and Computer Engineering 1406 W. Green St. Urbana, IL 61801 217-144-5137 mjk@uiuc.edu http://uigelz.ece.uiuc.edu

More information

A MONTE CARLO SIMULATION OF RADIATION TRAPPING IN ELECTRODELESS GAS DISCHARGES HAVING COMPLEX GEOMETRIES*

A MONTE CARLO SIMULATION OF RADIATION TRAPPING IN ELECTRODELESS GAS DISCHARGES HAVING COMPLEX GEOMETRIES* A MONTE CARLO SIMULATION OF RADIATION TRAPPING IN ELECTRODELESS GAS DISCHARGES HAVING COMPLEX GEOMETRIES* Kapil Rajaraman** and Mark J. Kushner*** **Department of Physics ***Department of Electrical and

More information

MODELING OF SEASONING OF REACTORS: EFFECTS OF ION ENERGY DISTRIBUTIONS TO CHAMBER WALLS*

MODELING OF SEASONING OF REACTORS: EFFECTS OF ION ENERGY DISTRIBUTIONS TO CHAMBER WALLS* MODELING OF SEASONING OF REACTORS: EFFECTS OF ION ENERGY DISTRIBUTIONS TO CHAMBER WALLS* Ankur Agarwal a) and Mark J. Kushner b) a) Department of Chemical and Biomolecular Engineering University of Illinois,

More information

I. INTRODUCTION J. Vac. Sci. Technol. A 16 4, Jul/Aug /98/16 4 /2454/9/$ American Vacuum Society 2454

I. INTRODUCTION J. Vac. Sci. Technol. A 16 4, Jul/Aug /98/16 4 /2454/9/$ American Vacuum Society 2454 Consequences of three-dimensional physical and electromagnetic structures on dust particle trapping in high plasma density material processing discharges Helen H. Hwang, a) Eric R. Keiter, b) and Mark

More information

MONTE CARLO SIMULATION OF RADIATION TRAPPING IN ELECTRODELESS LAMPS: A STUDY OF COLLISIONAL BROADENERS*

MONTE CARLO SIMULATION OF RADIATION TRAPPING IN ELECTRODELESS LAMPS: A STUDY OF COLLISIONAL BROADENERS* MONTE CARLO SIMULATION OF RADIATION TRAPPING IN ELECTRODELESS LAMPS: A STUDY OF COLLISIONAL BROADENERS* Kapil Rajaraman** and Mark J. Kushner*** **Department of Physics ***Department of Electrical and

More information

Wave propagation and power deposition in magnetically enhanced inductively coupled and helicon plasma sources

Wave propagation and power deposition in magnetically enhanced inductively coupled and helicon plasma sources Wave propagation and power deposition in magnetically enhanced inductively coupled and helicon plasma sources Ronald L. Kinder a) and Mark J. Kushner b) Department of Electrical and Computer Engineering,

More information

SCALING OF HOLLOW CATHODE MAGNETRONS FOR METAL DEPOSITION a)

SCALING OF HOLLOW CATHODE MAGNETRONS FOR METAL DEPOSITION a) SCALING OF HOLLOW CATHODE MAGNETRONS FOR METAL DEPOSITION a) Gabriel Font b) Novellus Systems, Inc. San Jose, CA, 95134 USA and Mark J. Kushner Dept. of Electrical and Computer Engineering Urbana, IL,

More information

ANGULAR DEPENDENCE OF ELECTRON VELOCITY DISTRIBUTIONS IN LOW-PRESSURE INDUCTIVELY COUPLED PLASMAS 1

ANGULAR DEPENDENCE OF ELECTRON VELOCITY DISTRIBUTIONS IN LOW-PRESSURE INDUCTIVELY COUPLED PLASMAS 1 ANGULAR DEPENDENCE OF ELECTRON VELOCITY DISTRIBUTIONS IN LOW-PRESSURE INDUCTIVELY COUPLED PLASMAS 1 Alex V. Vasenkov 2, and Mark J. Kushner Department of Electrical and Computer Engineering Urbana, IL

More information

Physique des plasmas radiofréquence Pascal Chabert

Physique des plasmas radiofréquence Pascal Chabert Physique des plasmas radiofréquence Pascal Chabert LPP, Ecole Polytechnique pascal.chabert@lpp.polytechnique.fr Planning trois cours : Lundi 30 Janvier: Rappels de physique des plasmas froids Lundi 6 Février:

More information

EFFECT OF REACTOR GEOMETRY ON ION ENERGY DISTRIBUTIONS FOR PULSED PLASMA DOPING (P 2 LAD)*

EFFECT OF REACTOR GEOMETRY ON ION ENERGY DISTRIBUTIONS FOR PULSED PLASMA DOPING (P 2 LAD)* EFFECT OF REACTOR GEOMETRY ON ION ENERGY DISTRIBUTIONS FOR PULSED PLASMA DOPING (P 2 LAD)* Ankur Agarwal a) and Mark J. Kushner b) a) Department of Chemical and Biomolecular Engineering University of Illinois

More information

EFFECT OF PRESSURE AND ELECTRODE SEPARATION ON PLASMA UNIFORMITY IN DUAL FREQUENCY CAPACITIVELY COUPLED PLASMA TOOLS *

EFFECT OF PRESSURE AND ELECTRODE SEPARATION ON PLASMA UNIFORMITY IN DUAL FREQUENCY CAPACITIVELY COUPLED PLASMA TOOLS * EFFECT OF PRESSURE AND ELECTRODE SEPARATION ON PLASMA UNIFORMITY IN DUAL FREQUENCY CAPACITIVELY COUPLED PLASMA TOOLS * Yang Yang a) and Mark J. Kushner b) a) Department of Electrical and Computer Engineering

More information

CONSEQUENCES OF RADIATION TRAPPING ON ELECTRON ENERGY DISTRIBUTIONS IN LOW PRESSURE INDUCTIVELY COUPLED Hg/Ar DISCHARGES*

CONSEQUENCES OF RADIATION TRAPPING ON ELECTRON ENERGY DISTRIBUTIONS IN LOW PRESSURE INDUCTIVELY COUPLED Hg/Ar DISCHARGES* CONSEQUENCES OF RADIATION TRAPPING ON ELECTRON ENERGY DISTRIBUTIONS IN LOW PRESSURE INDUCTIVELY COUPLED Hg/Ar DISCHARGES* Kapil Rajaraman**, Alex Vasenkov*** and Mark J. Kushner*** **Department of Physics

More information

ELECTRON ENERGY DISTRIBUTIONS AND NON-COLLISIONAL HEATING IN MAGNETICALLY ENHANCED INDUCTIVELY COUPLED PLASMAS*

ELECTRON ENERGY DISTRIBUTIONS AND NON-COLLISIONAL HEATING IN MAGNETICALLY ENHANCED INDUCTIVELY COUPLED PLASMAS* ELECTRON ENERGY DISTRIUTIONS AND NON-COLLISIONAL HEATING IN MAGNETICALLY ENHANCED INDUCTIVELY COUPLED PLASMAS* Ronald L. Kinde and Mak J. Kushne Depatment of Electical and Compute Engineeing Ubana, IL

More information

Plasma Modeling with COMSOL Multiphysics

Plasma Modeling with COMSOL Multiphysics Plasma Modeling with COMSOL Multiphysics Copyright 2014 COMSOL. Any of the images, text, and equations here may be copied and modified for your own internal use. All trademarks are the property of their

More information

Effect of Gas Flow Rate and Gas Composition in Ar/CH 4 Inductively Coupled Plasmas

Effect of Gas Flow Rate and Gas Composition in Ar/CH 4 Inductively Coupled Plasmas COMSOL CONFERENCE BOSTON 2011 Effect of Gas Flow Rate and Gas Composition in Ar/CH 4 Inductively Coupled Plasmas Keisoku Engineering System Co., Ltd., JAPAN Dr. Lizhu Tong October 14, 2011 1 Contents 1.

More information

CONTROL OF UNIFORMITY IN CAPACITIVELY COUPLED PLASMAS CONSIDERING EDGE EFFECTS*

CONTROL OF UNIFORMITY IN CAPACITIVELY COUPLED PLASMAS CONSIDERING EDGE EFFECTS* CONTROL OF UNIFORMITY IN CAPACITIVELY COUPLED PLASMAS CONSIDERING EDGE EFFECTS* Junqing Lu and Mark J. Kushner Department of Electrical and Computer Engineering at Urbana-Champaign mjk@uiuc.edu, jqlu@uiuc.edu

More information

The low-field density peak in helicon discharges

The low-field density peak in helicon discharges PHYSICS OF PLASMAS VOLUME 10, NUMBER 6 JUNE 2003 Francis F. Chen a) Electrical Engineering Department, University of California, Los Angeles, Los Angeles, California 90095-1597 Received 10 December 2002;

More information

Consequences of asymmetric pumping in low pressure plasma processing reactors: A three-dimensional modeling study

Consequences of asymmetric pumping in low pressure plasma processing reactors: A three-dimensional modeling study Consequences of asymmetric pumping in low pressure plasma processing reactors: A three-dimensional modeling study Mark J. Kushner a) University of Illinois, Department of Electrical and Computer Engineering,

More information

SIMULATION OF POROUS LOW-k DIELECTRIC SEALING BY COMBINED He AND NH 3 PLASMA TREATMENT *

SIMULATION OF POROUS LOW-k DIELECTRIC SEALING BY COMBINED He AND NH 3 PLASMA TREATMENT * SIMULATION OF POROUS LOW-k DIELECTRIC SEALING BY COMBINED He AND NH 3 PLASMA TREATMENT * JULINE_ICOPS09_01 Juline Shoeb a) and Mark J. Kushner b) a) Department of Electrical and Computer Engineering Iowa

More information

Low-field helicon discharges

Low-field helicon discharges Plasma Phys. Control. Fusion 39 (1997) A411 A420. Printed in the UK PII: S0741-3335(97)80958-X Low-field helicon discharges F F Chen, X Jiang, J D Evans, G Tynan and D Arnush University of California,

More information

Low Temperature Plasma Technology Laboratory

Low Temperature Plasma Technology Laboratory Low Temperature Plasma Technology Laboratory PLASMA INJECTION WITH HELICON SOURCES Francis F. Chen, Xicheng Jiang, and John D. Evans Electrical Engineering Department, UCLA LTP-97 July, 1999 Electrical

More information

Investigation of the DSMC Approach for Ion/neutral Species in Modeling Low Pressure Plasma Reactor

Investigation of the DSMC Approach for Ion/neutral Species in Modeling Low Pressure Plasma Reactor Investigation of the DSMC Approach for Ion/neutral Species in Modeling Low Pressure Plasma Reactor Hao Deng, Z. Li, D. Levin, and L. Gochberg Department of Aerospace Engineering The Pennsylvania State

More information

Low Temperature Plasma Technology Laboratory

Low Temperature Plasma Technology Laboratory Low Temperature Plasma Technology Laboratory CHARACTERIZATION AND MODELING OF THE MØRI SOURCE Francis F. Chen and Donald Arnush FINAL REPORT, UC MICRO PROJECT 98-2 JOINTLY FUNDED BY APPLIED MATERIALS LTP-2

More information

Angular anisotropy of electron energy distributions in inductively coupled plasmas

Angular anisotropy of electron energy distributions in inductively coupled plasmas JOURNAL OF APPLIED PHYSICS VOLUME 94, NUMBER 9 1 NOVEMBER 2003 Angular anisotropy of electron energy distributions in inductively coupled plasmas Alex V. Vasenkov a) and Mark J. Kushner b) Department of

More information

Diffusion during Plasma Formation

Diffusion during Plasma Formation Chapter 6 Diffusion during Plasma Formation Interesting processes occur in the plasma formation stage of the Basil discharge. This early stage has particular interest because the highest plasma densities

More information

Hong Young Chang Department of Physics, Korea Advanced Institute of Science and Technology (KAIST), Republic of Korea

Hong Young Chang Department of Physics, Korea Advanced Institute of Science and Technology (KAIST), Republic of Korea Hong Young Chang Department of Physics, Korea Advanced Institute of Science and Technology (KAIST), Republic of Korea Index 1. Introduction 2. Some plasma sources 3. Related issues 4. Summary -2 Why is

More information

DEPOSITION AND COMPOSITION OF POLYMER FILMS IN FLUOROCARBON PLASMAS*

DEPOSITION AND COMPOSITION OF POLYMER FILMS IN FLUOROCARBON PLASMAS* DEPOSITION AND COMPOSITION OF POLYMER FILMS IN FLUOROCARBON PLASMAS* Kapil Rajaraman and Mark J. Kushner 1406 W. Green St. Urbana, IL 61801 rajaramn@uiuc.edu mjk@uiuc.edu http://uigelz.ece.uiuc.edu November

More information

Model for noncollisional heating in inductively coupled plasma processing sources

Model for noncollisional heating in inductively coupled plasma processing sources Model for noncollisional heating in inductively coupled plasma processing sources Shahid Rauf a) and Mark J. Kushner b) Department of Electrical and Computer Engineering, University of Illinois, 1406 West

More information

Influences on ionization fraction in an inductively coupled ionized physical vapor deposition device plasma

Influences on ionization fraction in an inductively coupled ionized physical vapor deposition device plasma JOURNAL OF APPLIED PHYSICS VOLUME 91, NUMBER 2 15 JANUARY 2002 Influences on ionization fraction in an inductively coupled ionized physical vapor deposition device plasma Daniel R. Juliano, a) David N.

More information

Modélisation de sources plasma froid magnétisé

Modélisation de sources plasma froid magnétisé Modélisation de sources plasma froid magnétisé Gerjan Hagelaar Groupe de Recherche Energétique, Plasma & Hors Equilibre (GREPHE) Laboratoire Plasma et Conversion d Énergie (LAPLACE) Université Paul Sabatier,

More information

65 th GEC, October 22-26, 2012

65 th GEC, October 22-26, 2012 65 th GEC, October 22-26, 2012 2D Fluid/Analytical Simulation of Multi-Frequency Capacitively-Coupled Plasma Reactors (CCPs) E. Kawamura, M.A. Lieberman, D.B. Graves and A.J. Lichtenberg A fast 2D hybrid

More information

Spatial distributions of power and ion densities in RF excited remote plasma reactors

Spatial distributions of power and ion densities in RF excited remote plasma reactors Plasma Sources Sci. Technol. 5 (1996) 499 509. Printed in the UK Spatial distributions of power and ion densities in RF excited remote plasma reactors Irène Pérès and Mark J Kushner University of Illinois,

More information

Helicon Plasma Thruster Experiment Controlling Cross-Field Diffusion within a Magnetic Nozzle

Helicon Plasma Thruster Experiment Controlling Cross-Field Diffusion within a Magnetic Nozzle Helicon Plasma Thruster Experiment Controlling Cross-Field Diffusion within a Magnetic Nozzle IEPC-2013-163 Presented at the 33rd International Electric Propulsion Conference, The George Washington University

More information

Jackson 6.4 Homework Problem Solution Dr. Christopher S. Baird University of Massachusetts Lowell

Jackson 6.4 Homework Problem Solution Dr. Christopher S. Baird University of Massachusetts Lowell Jackson 6.4 Homework Problem Solution Dr. Christopher S. Baird University of Massachusetts Lowell PROBLEM: A uniformly magnetized and conducting sphere of radius R and total magnetic moment m = 4πMR 3

More information

Low Temperature Plasma Technology Laboratory

Low Temperature Plasma Technology Laboratory Low Temperature Plasma Technology Laboratory CENTRAL PEAKING OF MAGNETIZED GAS DISCHARGES Francis F. Chen and Davide Curreli LTP-1210 Oct. 2012 Electrical Engineering Department Los Angeles, California

More information

A time dependent propagator method for long mean free path transport of neutral particles in plasma processing reactors

A time dependent propagator method for long mean free path transport of neutral particles in plasma processing reactors A time dependent propagator method for long mean free path transport of neutral particles in plasma processing reactors Wen-yi Tan, Robert J. Hoekstra, and Mark J. Kushner a) Department of Electrical and

More information

fiziks Institute for NET/JRF, GATE, IIT-JAM, JEST, TIFR and GRE in PHYSICAL SCIENCES

fiziks Institute for NET/JRF, GATE, IIT-JAM, JEST, TIFR and GRE in PHYSICAL SCIENCES Content-ELECTRICITY AND MAGNETISM 1. Electrostatics (1-58) 1.1 Coulomb s Law and Superposition Principle 1.1.1 Electric field 1.2 Gauss s law 1.2.1 Field lines and Electric flux 1.2.2 Applications 1.3

More information

LOW-PRESSURE radio-frequency (RF) inductive-coupled

LOW-PRESSURE radio-frequency (RF) inductive-coupled IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 34, NO. 3, JUNE 2006 767 Self-Consistent Modeling of Nonlocal Inductively Coupled Plasmas Oleg V. Polomarov, Constantine E. Theodosiou, Igor D. Kaganovich, Demetre

More information

Multi-fluid Simulation Models for Inductively Coupled Plasma Sources

Multi-fluid Simulation Models for Inductively Coupled Plasma Sources Multi-fluid Simulation Models for Inductively Coupled Plasma Sources Madhusudhan Kundrapu, Seth A. Veitzer, Peter H. Stoltz, Kristian R.C. Beckwith Tech-X Corporation, Boulder, CO, USA and Jonathan Smith

More information

Introduction to Plasma Physics

Introduction to Plasma Physics Introduction to Plasma Physics Hartmut Zohm Max-Planck-Institut für Plasmaphysik 85748 Garching DPG Advanced Physics School The Physics of ITER Bad Honnef, 22.09.2014 A simplistic view on a Fusion Power

More information

UNIT-I INTRODUCTION TO COORDINATE SYSTEMS AND VECTOR ALGEBRA

UNIT-I INTRODUCTION TO COORDINATE SYSTEMS AND VECTOR ALGEBRA SIDDHARTH GROUP OF INSTITUTIONS :: PUTTUR Siddharth Nagar, Narayanavanam Road 517583 QUESTION BANK (DESCRIPTIVE) Subject with Code : EMF(16EE214) Sem: II-B.Tech & II-Sem Course & Branch: B.Tech - EEE Year

More information

Contents: 1) IEC and Helicon 2) What is HIIPER? 3) Analysis of Helicon 4) Coupling of the Helicon and the IEC 5) Conclusions 6) Acknowledgments

Contents: 1) IEC and Helicon 2) What is HIIPER? 3) Analysis of Helicon 4) Coupling of the Helicon and the IEC 5) Conclusions 6) Acknowledgments Contents: 1) IEC and Helicon 2) What is HIIPER? 3) Analysis of Helicon 4) Coupling of the Helicon and the IEC 5) Conclusions 6) Acknowledgments IEC:! IEC at UIUC modified into a space thruster.! IEC has

More information

A Working Electron Impact Cross Section Set for CHF 3. Mark J. Kushner a) and Da Zhang b) University of Illinois 1406 W. Green St Urbana, IL 61801

A Working Electron Impact Cross Section Set for CHF 3. Mark J. Kushner a) and Da Zhang b) University of Illinois 1406 W. Green St Urbana, IL 61801 A Working Electron Impact Cross Section Set for CHF 3 Mark J. Kushner a) and Da Zhang b) University of Illinois 1406 W. Green St Urbana, IL 61801 Abstract Trifluoromethane, CHF 3, is used for plasma etching

More information

Faraday s Law. Underpinning of Much Technology

Faraday s Law. Underpinning of Much Technology Module 21: Faraday s Law 1 Faraday s Law Fourth (Final) Maxwell s Equation Underpinning of Much Technology 2 Demonstration: Falling Magnet 3 Magnet Falling Through a Ring Link to movie Falling magnet slows

More information

The plasma simulation system Brochure.

The plasma simulation system Brochure. 1 The plasma simulation system 2016 Brochure www.quantemol.com 2 What does Q-VT do? Quantemol-Virtual Tool is an expert software system for the simulation of industrial plasma processing tools. Q-VT builds

More information

2D Hybrid Fluid-Analytical Model of Inductive/Capacitive Plasma Discharges

2D Hybrid Fluid-Analytical Model of Inductive/Capacitive Plasma Discharges 63 rd GEC & 7 th ICRP, 2010 2D Hybrid Fluid-Analytical Model of Inductive/Capacitive Plasma Discharges E. Kawamura, M.A. Lieberman, and D.B. Graves University of California, Berkeley, CA 94720 This work

More information

Electromagnetic Fields. Lecture 2. Fundamental Laws

Electromagnetic Fields. Lecture 2. Fundamental Laws Electromagnetic Fields Lecture 2 Fundamental Laws Laws of what? Electric field... is a phenomena that surrounds electrically charged objects or that which is in the presence of a time-varying magnetic

More information

Plasma waves in the fluid picture I

Plasma waves in the fluid picture I Plasma waves in the fluid picture I Langmuir oscillations and waves Ion-acoustic waves Debye length Ordinary electromagnetic waves General wave equation General dispersion equation Dielectric response

More information

Characteristics and classification of plasmas

Characteristics and classification of plasmas Characteristics and classification of plasmas PlasTEP trainings course and Summer school 2011 Warsaw/Szczecin Indrek Jõgi, University of Tartu Partfinanced by the European Union (European Regional Development

More information

Cluster fusion in a high magnetic field

Cluster fusion in a high magnetic field Santa Fe July 28, 2009 Cluster fusion in a high magnetic field Roger Bengtson, Boris Breizman Institute for Fusion Studies, Fusion Research Center The University of Texas at Austin In collaboration with:

More information

EP2Plus: a hybrid plasma. plume/spacecraft. interaction code. F. Cichocki, M. Merino, E. Ahedo

EP2Plus: a hybrid plasma. plume/spacecraft. interaction code. F. Cichocki, M. Merino, E. Ahedo EP2Plus: a hybrid plasma plume/spacecraft interaction code F. Cichocki, M. Merino, E. Ahedo 24 th SPINE meeting ESTEC, Noordwijk, October 23 rd, 2017 Contents Introduction to EP2PLUS Overall structure

More information

Numerical simulation of Vibrationally Active Ar-H2 Microwave Plasma

Numerical simulation of Vibrationally Active Ar-H2 Microwave Plasma Numerical simulation of Vibrationally Active Ar-H2 Microwave Plasma F. Bosi 1, M. Magarotto 2, P. de Carlo 2, M. Manente 2, F. Trezzolani 2, D. Pavarin 2, D. Melazzi 2, P. Alotto 1, R. Bertani 1 1 Department

More information

1. A moving kaon decays into two pions, one of which is left at rest. (m K

1. A moving kaon decays into two pions, one of which is left at rest. (m K Physics Qualifying Examination Part I September 12, 2015 7-Minute Questions 1. A moving kaon decays into two pions, one of which is left at rest. (m K 500 MeV, m π = 140 MeV). a. What is the total energy

More information

Shapes of agglomerates in plasma etching reactors

Shapes of agglomerates in plasma etching reactors Shapes of agglomerates in plasma etching reactors Fred Y. Huang a) and Mark J. Kushner b) University of Illinois, Department of Electrical and Computer Engineering, 1406 West Green Street, Urbana, Illinois

More information

Electromagnetics in COMSOL Multiphysics is extended by add-on Modules

Electromagnetics in COMSOL Multiphysics is extended by add-on Modules AC/DC Module Electromagnetics in COMSOL Multiphysics is extended by add-on Modules 1) Start Here 2) Add Modules based upon your needs 3) Additional Modules extend the physics you can address 4) Interface

More information

Plasma abatement of perfluorocompounds in inductively coupled plasma reactors

Plasma abatement of perfluorocompounds in inductively coupled plasma reactors Plasma abatement of perfluorocompounds in inductively coupled plasma reactors Xudong Peter Xu, a) Shahid Rauf, b) and Mark J. Kushner c) University of Illinois, Department of Electrical and Computer Engineering,

More information

PRINCIPLES OF PLASMA DISCHARGES AND MATERIALS PROCESSING

PRINCIPLES OF PLASMA DISCHARGES AND MATERIALS PROCESSING PRINCIPLES OF PLASMA DISCHARGES AND MATERIALS PROCESSING Second Edition MICHAEL A. LIEBERMAN ALLAN J, LICHTENBERG WILEY- INTERSCIENCE A JOHN WILEY & SONS, INC PUBLICATION CONTENTS PREFACE xrrii PREFACE

More information

General Physics II. Electromagnetic Induction and Electromagnetic Waves

General Physics II. Electromagnetic Induction and Electromagnetic Waves General Physics II Electromagnetic Induction and Electromagnetic Waves 1 Induced emf We have seen that an electric current produces a magnetic field. Michael Faraday demonstrated that a magnetic field

More information

MICRODISCHARGES AS SOURCES OF PHOTONS, RADICALS AND THRUST*

MICRODISCHARGES AS SOURCES OF PHOTONS, RADICALS AND THRUST* MICRODISCHARGES AS SOURCES OF PHOTONS, RADICALS AND THRUST* Ramesh Arakoni a) and Mark J. Kushner b) a) Dept. Aerospace Engineering b) Dept. Electrical and Computer Engineering Urbana, IL 61801 USA mjk@uiuc.edu

More information

Effect of sputter heating in ionized metal physical vapor deposition reactors

Effect of sputter heating in ionized metal physical vapor deposition reactors JOURNAL OF APPLIED PHYSICS VOLUME 87, NUMBER 10 15 MAY 2000 Effect of sputter heating in ionized metal physical vapor deposition reactors Junqing Lu a) Department of Mechanical and Industrial Engineering,

More information

Introduction to Electric Circuit Analysis

Introduction to Electric Circuit Analysis EE110300 Practice of Electrical and Computer Engineering Lecture 2 and Lecture 4.1 Introduction to Electric Circuit Analysis Prof. Klaus Yung-Jane Hsu 2003/2/20 What Is An Electric Circuit? Electrical

More information

Last time. Gauss' Law: Examples (Ampere's Law)

Last time. Gauss' Law: Examples (Ampere's Law) Last time Gauss' Law: Examples (Ampere's Law) 1 Ampere s Law in Magnetostatics iot-savart s Law can be used to derive another relation: Ampere s Law The path integral of the dot product of magnetic field

More information

A KINETIC MODEL FOR EXCIMER UV AND VUV RADIATION IN DIELECTRIC BARRIER DISCHARGES*

A KINETIC MODEL FOR EXCIMER UV AND VUV RADIATION IN DIELECTRIC BARRIER DISCHARGES* A KINETIC MODEL FOR EXCIMER UV AND VUV RADIATION IN DIELECTRIC BARRIER DISCHARGES* Xudong Peter Xu and Mark J. Kushner University of Illinois Department of Electrical and Computer Engineering Urbana, IL

More information

SCALING OF PLASMA SOURCES FOR O 2 ( 1 ) GENERATION FOR CHEMICAL OXYGEN-IODINE LASERS

SCALING OF PLASMA SOURCES FOR O 2 ( 1 ) GENERATION FOR CHEMICAL OXYGEN-IODINE LASERS SCALING OF PLASMA SOURCES FOR O 2 ( 1 ) GENERATION FOR CHEMICAL OXYGEN-IODINE LASERS D. Shane Stafford and Mark J. Kushner Department of Electrical and Computer Engineering Urbana, IL 61801 http://uigelz.ece.uiuc.edu

More information

Numerical Study of Power Deposition, Transport and Acceleration Phenomena in Helicon Plasma Thrusters

Numerical Study of Power Deposition, Transport and Acceleration Phenomena in Helicon Plasma Thrusters Numerical Study of Power Deposition, Transport and Acceleration Phenomena in Helicon Plasma Thrusters M. Magarotto, M. Manente, P. de Calro, F. Trezzolani, D. Pavarin, and D. Melazzi CISAS, Padova, Italy

More information

Overview of FRC-related modeling (July 2014-present)

Overview of FRC-related modeling (July 2014-present) Overview of FRC-related modeling (July 2014-present) Artan Qerushi AFRL-UCLA Basic Research Collaboration Workshop January 20th, 2015 AFTC PA Release# 15009, 16 Jan 2015 Artan Qerushi (AFRL) FRC modeling

More information

Review of Electrodynamics

Review of Electrodynamics Review of Electrodynamics VBS/MRC Review of Electrodynamics 0 First, the Questions What is light? How does a butterfly get its colours? How do we see them? VBS/MRC Review of Electrodynamics 1 Plan of Review

More information

FARADAY S AND LENZ LAW B O O K P G

FARADAY S AND LENZ LAW B O O K P G FARADAY S AND LENZ LAW B O O K P G. 4 3 6-438 MOTIONAL EMF AND MAGNETIC FLUX (DERIVIATION) Motional emf = vbl Let a conducting rod being moved through a magnetic field B During time t 0 the rod has been

More information

Two-dimensional Fluid Simulation of an RF Capacitively Coupled Ar/H 2 Discharge

Two-dimensional Fluid Simulation of an RF Capacitively Coupled Ar/H 2 Discharge Two-dimensional Fluid Simulation of an RF Capacitively Coupled Ar/H 2 Discharge Lizhu Tong Keisoku Engineering System Co., Ltd., Japan September 18, 2014 Keisoku Engineering System Co., Ltd., 1-9-5 Uchikanda,

More information

Electron Density and Ion Flux in Diffusion Chamber of Low Pressure RF Helicon Reactor

Electron Density and Ion Flux in Diffusion Chamber of Low Pressure RF Helicon Reactor WDS'06 Proceedings of Contributed Papers, Part II, 150 155, 2006. ISBN 80-86732-85-1 MATFYZPRESS Electron Density and Ion Flux in Diffusion Chamber of Low Pressure RF Helicon Reactor R. Šmíd Masaryk University,

More information

Faraday's Law ds B B G G ΦB B ds Φ ε = d B dt

Faraday's Law ds B B G G ΦB B ds Φ ε = d B dt Faraday's Law ds ds ε= d Φ dt Φ Global Review Electrostatics» motion of q in external E-field» E-field generated by Σq i Magnetostatics» motion of q and i in external -field» -field generated by I Electrodynamics»

More information

Jacob s Ladder Controlling Lightning

Jacob s Ladder Controlling Lightning Host: Fusion specialist: Jacob s Ladder Controlling Lightning PART 1 Jacob s ladder demonstration Video Teacher resources Phil Dooley European Fusion Development Agreement Peter de Vries European Fusion

More information

Plasma transport around dust agglomerates having complex shapes

Plasma transport around dust agglomerates having complex shapes JOURNAL OF APPLIED PHYSICS VOLUME 83, NUMBER 11 1 JUNE 1998 Plasma transport around dust agglomerates having complex shapes Eric R. Keiter a) and Mark J. Kushner b) Department of Electrical and Computer

More information

2. Q. 1 to 5 are Very short Answer type questions (1 Mark each. ) 3. Q. 6 to 12 are short Answer type questions. (2 Marks each. )

2. Q. 1 to 5 are Very short Answer type questions (1 Mark each. ) 3. Q. 6 to 12 are short Answer type questions. (2 Marks each. ) 1. All questions are compulsory. 2. Q. 1 to 5 are Very short Answer type questions (1 Mark each. ) 3. Q. 6 to 12 are short Answer type questions. (2 Marks each. ) 4. Q. 13 to 24 are short answer questions

More information

Electromagnetic Induction

Electromagnetic Induction Electromagnetic Induction Name Section Theory Electromagnetic induction employs the concept magnetic flux. Consider a conducting loop of area A in a magnetic field with magnitude B. The flux Φ is proportional

More information

DHANALAKSHMI SRINIVASAN INSTITUTE OF RESEARCH AND TECHNOLOGY

DHANALAKSHMI SRINIVASAN INSTITUTE OF RESEARCH AND TECHNOLOGY DHANALAKSHMI SRINIVASAN INSTITUTE OF RESEARCH AND TECHNOLOGY SIRUVACHUR-621113 ELECTRICAL AND ELECTRONICS DEPARTMENT 2 MARK QUESTIONS AND ANSWERS SUBJECT CODE: EE 6302 SUBJECT NAME: ELECTROMAGNETIC THEORY

More information

TENTATIVE CONTENTS OF THE COURSE # EE-271 ENGINEERING ELECTROMAGNETICS, FS-2012 (as of 09/13/12) Dr. Marina Y. Koledintseva

TENTATIVE CONTENTS OF THE COURSE # EE-271 ENGINEERING ELECTROMAGNETICS, FS-2012 (as of 09/13/12) Dr. Marina Y. Koledintseva TENTATIVE CONTENTS OF THE COURSE # EE-271 ENGINEERING ELECTROMAGNETICS, FS-2012 (as of 09/13/12) Dr. Marina Y. Koledintseva Part 1. Introduction Basic Physics and Mathematics for Electromagnetics. Lecture

More information

The Plasma Simulation System Brochure.

The Plasma Simulation System Brochure. The Plasma Simulation System 2018 Brochure www.quantemol.com Benefits of Q-VT An experimentally validated simulation system focused on modelling plasma tools User-friendly interface Sets of validated cross-sections

More information

PHYSICS - GIANCOLI CALC 4E CH 29: ELECTROMAGNETIC INDUCTION.

PHYSICS - GIANCOLI CALC 4E CH 29: ELECTROMAGNETIC INDUCTION. !! www.clutchprep.com CONCEPT: ELECTROMAGNETIC INDUCTION A coil of wire with a VOLTAGE across each end will have a current in it - Wire doesn t HAVE to have voltage source, voltage can be INDUCED i V Common

More information

Waves in plasmas. S.M.Lea

Waves in plasmas. S.M.Lea Waves in plasmas S.M.Lea 17 1 Plasma as an example of a dispersive medium We shall now discuss the propagation of electromagnetic waves through a hydrogen plasm an electrically neutral fluid of protons

More information

Chapter 22. Induction

Chapter 22. Induction Chapter 22 Induction Induced emf A current can be produced by a changing magnetic field First shown in an experiment by Michael Faraday A primary coil is connected to a battery A secondary coil is connected

More information

Plasmas rf haute densité Pascal Chabert LPTP, Ecole Polytechnique

Plasmas rf haute densité Pascal Chabert LPTP, Ecole Polytechnique Plasmas rf haute densité Pascal Chabert LPTP, Ecole Polytechnique chabert@lptp.polytechnique.fr Pascal Chabert, 2006, All rights reserved Programme Introduction Généralité sur les plasmas Plasmas Capacitifs

More information

Simulation of Low Pressure Plasma Processing Reactors: Kinetics of Electrons and Neutrals

Simulation of Low Pressure Plasma Processing Reactors: Kinetics of Electrons and Neutrals Simulation of Low Pressure Plasma Processing Reactors: Kinetics of Electrons and Neutrals R. R. Arslanbekov and V. I. Kolobov CFD Research Corporation, Huntsville, AL, USA Abstract. In this paper, we illustrate

More information

Part 4: Electromagnetism. 4.1: Induction. A. Faraday's Law. The magnetic flux through a loop of wire is

Part 4: Electromagnetism. 4.1: Induction. A. Faraday's Law. The magnetic flux through a loop of wire is 1 Part 4: Electromagnetism 4.1: Induction A. Faraday's Law The magnetic flux through a loop of wire is Φ = BA cos θ B A B = magnetic field penetrating loop [T] A = area of loop [m 2 ] = angle between field

More information

PLASMA processing (etching, deposition, cleaning) is one

PLASMA processing (etching, deposition, cleaning) is one 486 IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, VOL. 11, NO. 3, AUGUST 1998 Virtual Plasma Equipment Model: A Tool for Investigating Feedback Control in Plasma Processing Equipment Shahid Rauf, Member,

More information

Dispersive Media, Lecture 7 - Thomas Johnson 1. Waves in plasmas. T. Johnson

Dispersive Media, Lecture 7 - Thomas Johnson 1. Waves in plasmas. T. Johnson 2017-02-14 Dispersive Media, Lecture 7 - Thomas Johnson 1 Waves in plasmas T. Johnson Introduction to plasmas as a coupled system Magneto-Hydro Dynamics, MHD Plasmas without magnetic fields Cold plasmas

More information

EE 3324 Electromagnetics Laboratory

EE 3324 Electromagnetics Laboratory EE 3324 Electromagnetics Laboratory Experiment #3 Inductors and Inductance 1. Objective The objective of Experiment #3 is to investigate the concepts of inductors and inductance. Several inductor geometries

More information

Modeling and Simulation of Plasma Based Applications in the Microwave and RF Frequency Range

Modeling and Simulation of Plasma Based Applications in the Microwave and RF Frequency Range Modeling and Simulation of Plasma Based Applications in the Microwave and RF Frequency Range Dr.-Ing. Frank H. Scharf CST of America What is a plasma? What is a plasma? Often referred to as The fourth

More information

Fast particle production in laser-irradiated targets

Fast particle production in laser-irradiated targets 2010 IHEDS Workshop Fast particle production in laser-irradiated targets presented by Alex Arefiev in collaboration with Boris Breizman, Vladimir Khudik Institute for Fusion Studies, The University of

More information

Using a Microwave Interferometer to Measure Plasma Density Mentor: Prof. W. Gekelman. P. Pribyl (UCLA)

Using a Microwave Interferometer to Measure Plasma Density Mentor: Prof. W. Gekelman. P. Pribyl (UCLA) Using a Microwave Interferometer to Measure Plasma Density Avital Levi Mentor: Prof. W. Gekelman. P. Pribyl (UCLA) Introduction: Plasma is the fourth state of matter. It is composed of fully or partially

More information

4 Modeling of a capacitive RF discharge

4 Modeling of a capacitive RF discharge 4 Modeling of a capacitive discharge 4.1 PIC MCC model for capacitive discharge Capacitive radio frequency () discharges are very popular, both in laboratory research for the production of low-temperature

More information

EFFECTS OF PROPENE ON THE REMEDIATION OF NOx FROM DIESEL EXHAUSTS*

EFFECTS OF PROPENE ON THE REMEDIATION OF NOx FROM DIESEL EXHAUSTS* EFFECTS OF PROPENE ON THE REMEDIATION OF NOx FROM DIESEL EXHAUSTS* Rajesh Dorai and Mark J. Kushner University of Illinois Department of Electrical and Computer Engineering Urbana, IL 6181 Email : Mark

More information

Tokamak Divertor System Concept and the Design for ITER. Chris Stoafer April 14, 2011

Tokamak Divertor System Concept and the Design for ITER. Chris Stoafer April 14, 2011 Tokamak Divertor System Concept and the Design for ITER Chris Stoafer April 14, 2011 Presentation Overview Divertor concept and purpose Divertor physics General design considerations Overview of ITER divertor

More information

Electromagnetism Answers to Problem Set 9 Spring 2006

Electromagnetism Answers to Problem Set 9 Spring 2006 Electromagnetism 70006 Answers to Problem et 9 pring 006. Jackson Prob. 5.: Reformulate the Biot-avart law in terms of the solid angle subtended at the point of observation by the current-carrying circuit.

More information