V.Storizhko Institute of Applied Physics, National Academy of Sciences of Ukraine

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1 IAP accelerator based facility for simulation and studies of radiation induced defects in materials V.Storizhko Institute of Applied Physics, National Academy of Sciences of Ukraine IAEA Technical Meeting Accelerator Simulation and Theoretical Modelling of Radiation Effects Kharkov, 9-13 June 2008

2 Radiation damage is inherently multiscale with interacting phenomena ranging from ps to decades and nm to m B.D.Wirth, UC-Brkeley

3 2 MeV scanning ion microprobe

4 2 MV electrostatic accelerator

5 Element Hydrogen Lithium Boron Carbon Тable 1 Detection limits and lateral resolution some resonant nuclear reactions Nuclear reaction 1 H( 15 N,αγ) 15 C 1 H( 19 F,αγ) 16 O 7 Li(p,γ) 8 Be 10 B(α.p) 13 C 11 B(p,γ) 12 C 11 B(p,α) 8 Be 12 C(p,γ) 13 N 13 C(p,γ) 14 N Resonance energy (kev) Resonance width (ev) Resolution (nm) Detection limits (1:10 6 ) , Nitrogen 14 N(α,γ) 18 F Oxygen 18 O(p,γ) 15 N Fluorine 19 F(p,γ) 16 O ,1 Natrium 23 Na(p,γ) 20 Ne ,5 Magnesium 24 Mg(p,γ) 25 Al 223 <32 0,6 Aluminium 27 Al(p,γ) 28 Si , Phosphorus 31 P(p,γ) 28 Si 31 P(p,γ) 32 S <300 < Аrgon 40 Ar(p,γ) 41 K Тitanium 48 Ti(p,γ) 49 V Chrome 52 Cr(p,γ) 53 Mn

6 First tests of the scanning nuclear microprobe with a gauging grid electron microscopy data nuclear microprobe data

7 High-sensitivity HVEE isotope mass-spectrometer to be shipped to Ukraine in Commissioning is scheduled for 2008

8

9 Pelletron-6 accelerator-based system by NEC, USA Methods Type Ions Application Sensitivity Resolution RBS Standard 1-2 Mev He med., heavy 10 atppm 10nm Special med., heavy 0.1 atppm 50nm Special med., heavy 1000 atppm 0.1nm ERDA Standard 3 Mev He H 10 atppm 100nm Special 4.5 Mev Ne H 1000 atppm 0.5nm Special 1.5 Mev Ar Light atoms 1000 atppm 0.2nm NRA Standard p, d, 3He Light atoms atppm 100nm PIXE Standard 3MeV p, He No light atoms 1-10 atppm none

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11 5 MeV ion/positron accelerator-based analytical facility of NEC manufacture, USA, transferred to IAP NASU from Max-Planck Institute (Stuttgart, Germany). Construction of the laboratory building and facility commissioning trials are scheduled for

12 Laser isotope mass-spectrometer with coordinate-sensitive detector Інтенсивність Интенсивность Intensity Образец Sample Зразок M М161,часть M spectrum частина спектра of спектру Sn+ олова and Sn и Sb+ сурьмы + та isotopes Sb + ізотопів 120Sn Sn Sn+ 121Sb+ 123Sb+ 124Sn С(Sn)=0,08%, C(Sb)=0,0024%, С(121Sb)=0,0014% канал channel

13 High-dose ion implanter Ion implanter of standard design is a DC accelerator with stepwise adjustment of the ion energy from 10 tо 170 кеv. Implanter performance data Ion beam energy кеv Ion beam formation voltage кv Accelerating voltage range кv Beam current in the acceptance chamber < 4 ма Accelerated ion masses а.о.м. Removable ion sources - (gas source, metal-vapour source) Vacuum in acceptance chamber ~ 10-4 Pа Ion source life ~ 50 hours Power consumption ~ 20 кwt. Table 2. Ion current in acceptance chamber Ions H + He + N + N 2 + O + O 2 + Ar + 11 B + F + Ion current 1mA 0.5 ma 0.5 ma 0.5 ma 0.5 ma 0.5 ma 0.6 ma 200 mka 50 mka

14 High-intensity ion source testing equipment Performance data - ion energy - 60 kev - ion current ma - vacuum in the chamber Pa - evacuation rate 1000 l/s The testing equipment is provided with multiwatt power supplies of the ion source, high-voltage terminal water-cooling system, diagnostics facilities.

15 High-frequency magnetron sputtering facility Experiments Experiments are performed on a synthesis of metal, oxide and nitride coatings used as targets for incident ion beams and in ion-implantation doping. A technology has been developed and used for the preparation of ZnO 0,2 0,6 µm thick films on sapphire substrates by high-frequency reactive sputtering of a Zn target. The film exhibit one peak (002) in XRD spectra and 85 % transparency in the 0,2 0,6 µm spectrum range. The films have the grain size of ~60 nm and surface roughness 5 nm.

16 EL-60 based facility for electron beam deposition Performance data - electron energy - 60 kev - electron current ma - vacuum in the chamber Pa - evacuation rate 2500 l/s

17 Physical characteristics of some existing pulsed H-injectors and H-sources Martin Stockli / The Development of High-Current and High Duty-Factor H-Injectors // Presented LINAC-06, Knoxville, TN, August Facility Source type Current (ma) Pulse length (ms) Rep Rate (Hz) Extraction Aperture Ø (mm) Normalized Emittance (rms) Cs Energy (kev) DESY RF Multicusp ext. RF (90%) 0.43 (90%) No 38 Fermi magnetron ~ x / 0.3 Yes ~ 20 BNL magnetron ~ ~ 0.4 Yes 35 ISIS Penning ~ 60 ~ x 10 ~ 1 ~ 0.15 / 0.29 Yes 35 LANSCE Surface converter ~ 18 {40} {8} ~ 0.14 (98%) { ~0.3 (98%)} Yes 80 SNS Multicusp Int. RF / 0.26(100%) 0.25/0.31(100%) Yes 65 JEARI Multicusp ~ 0.21 (100%) Yes 70 SUMY Inverse magnetron ~ No ~ 60

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