ZEP520 ZEP520. Technical Report. ZEON CORPORATION Specialty Materials Division. High Resolution Positive Electron Beam Resist.
|
|
|
- Jesse Rice
- 6 years ago
- Views:
Transcription
1 Technical Report ZEP52 ZEP52 Ver.1.2 Mar.21 ZEONREX Electronic Chemicals High Resolution Positive Electron Beam Resist ZEP52 ZEON CORPORATION Specialty Materials Division Headquarters R&D Center Furukawa Sogo Bldg., Marunouchi, Yako, Kawakaki-ku Kawasaki-shi Chiyoda-ku, Tokyo , JAPAN Kanagawa-ken , JAPAN Phone : Phone : Fax : Fax :
2 CONTENTS 1. Characteristics 2. Properties 3. Thinner 4. Developer 5. Rinse 6. Remover 7. Spin Curve 8. Dependence on Pre-bake Temperature 9. Dependence on Development Temperature & Time 1. Application Examples 11. Dry Etching Resistance 12. Example of 13. Handling Precaution 14. Appendix Any process conditions and data are examples. Those will not guarantee the same data in customers process
3 1. Characteristics ZEP52 series are high performance positive EB resists which show high resolution, high sensitivity and high dry etch resistance. They are suitable for various EB processes. (1) Resolution Show high resolution and rectangle pattern profile (2) Resistance to dry etching Show high dry etch resistance and are almost equivalent to that of positive photoresists generally used (3) Sensitivity Show high sensitivity 2. Properties Item Mw Viscosity (mpa s) Solvent Form ZEP o-dichlorobenzene 1QT bottle ZEP52 57, 22 or ZEP52A-7 7 Anisole 1ml bottle ZEP52A Thinner Item Composition Remarks Form ZEP-S o-dichlorobenzene ZEP52-12 ZEP52 1QT bottle ZEP-A Anisole ZEP52A-7 ZEP52A 4. Developer Item Composition Remarks Form ZEP-RD Xylene (o-,m-,p- mixed) standard ZEP-N5 n-amyl acetate high resolution 1GL bottle ZED-WN o-xylene high resolution ZEP-SD 2-Butanone 4% Methyl isobutyl ketone 6% high sensitivity - 2 -
4 5. Rinse Item Composition Remarks Form ZMD-B Methyl isobutyl ketone 89% Isopropyl alcohol 11% 1GL bottle 6. Remover Item Composition Remarks Form ZDMAC Dimethylacetamide 1GL bottle 7. Spin Curve ZEP52 Spin Curve Thickness (Å) ZEP52 ZEP52/Dilution Rate=2.5 ZEP52-12 ZEP52-12/Dilution Rate=2. ZEP52-12/Dilution Rate=2.5 Substrate : 4 inch Si wafer Spin Time : 6sec. PB time : 2min. (Oven) Spin Speed (r.p.m.) ZEP52A Spin Curve Thickness (Å) ZEP52A ZEP52A-7 Substrate : 4 inch Si wafer Spin Time : 6sec. PB time : 2min. (Oven) Spin Speed (r.p.m.) - 3 -
5 8. Dependence on Pre-bake Temperature Dose to Clear (uc/cm 2 ) Prebake Temperature o C 1min. Dev. 3min. Dev. Substrate : Si wafer PB time : 3min. Exposure : ELS33, 2kV Developer : ZED-N5 Dev. temp. : 23 o C Dev. time : 1, 3min. Rinse : ZMD-B, 23 o C, 1sec. Normalyzed Residual Thickness (%) Prebake Temperature ( o C) 1min. Dev. 3min. Dev. Substrate : Si wafer PB time : 3min. Exposure : ELS33, 2kV Developer : ZED-N5 Dev. temp. : 23 o C Dev. time : 1, 3min. Rinse : ZMD-B, 23 o C, 1sec
6 9. Dependence on Development Temperature Dose to Clear (uc/cm 2 ) Development Temperature ( o C) ZEP-RD ZED-WN ZED-N5 ZEP-SD Substrate : Si wafer PB time : 3min. Exposure : ELS33, 2kV Dev. time : 1min. Rinse : ZMD-B, 23 o C, 1sec. Normalyzed Residual Thickness (%) Development Temperature ( o C) ZEP-RD ZED-WN ZED-N5 ZEP-SD Substrate : Si wafer PB time : 3min. Exposure : ELS33, 2kV Dev. time : 1min. Rinse : ZMD-B, 23 o C, 1sec
7 9. Dependence on Development Time Å Dose to Clear (uc/cm 2 ) ZEP- RD ZED- WN ZED- N5 ZEP- SD Development time (min.) Substrate : Si wafer PB time : 3min. Exposure : ELS33, 2kV Dev. temp. : 23 o C Rinse : ZMD-B, 23 o C, 1sec. Normalyzed residual thickness (%) ZEP- RD ZED- WN ZED- N5 ZEP- SD Development time (min.) Proce s s Conditions Subs trate : Si wafer Res is t : ZEP52 Film thicknes s : 5Å PB time : 3min. Expos ure : ELS33, 2k Dev. temp. : 23 o C Rins e : ZMD-B, 23 o C, 1-6 -
8 1. Application Examples.15µm Isolated Space PB time : 2min. Exposure : 3kV, A, 1 line exp µc/cm Dev. temp. : ZED-WN, 23 o C, 3sec. Rinse : IPA, 23 o C, 2sec..1µm Isolated Line PB time : 2min. Exposure area : 1µm (2 2dot) Exposure : 3kV, A, 1 line exp..7µsec./dot Dev. temp. : ZED-WN, 23 o C, 6sec. Rinse : IPA, 23 o C, 2sec..5µm Isolated Space Film thickness : 15Å Exposure : 75kV These data were presented by ELIONIX INC
9 11. Dry Etching Resistance (1) CF 4 Dry Etching Rate CF 4 Dry Etching Conditions.15torr, 7sqcm, 2W 35 3 Etching Rate (Å/min.) ZEP series Competitor E Novolak Resist O (2) Cl 2 +O 2 Dry Etching Rate Cl 2 +O 2 Dry Etching Conditions Cl 2 /O 2 =4/1, 5min. Etching Rate (Å/min.) ZEP52 Novolak Resist - 8 -
10 12. Example of (1) Coating (2) Pre-bake (3) Exposure (4) Development (5) Rinse (6) Post bake (7) De-scum (8) Etching ZEP52/52A 2rpm 6sec 5Å ZEP52-12/52A-7 2rpm 6sec 3Å 17-2 o C 2-3min. (Oven) 17-2 o C 2-5min. (Hot Plate) 2-5µC/ 2 cm at 2kV 2-25 o C 6-36sec. (Dipping) ZEP-RD, ZED-N5, ZED-WN 2-25 o C 1-6sec. (Dipping) ZMD-B In case of wet etching 1-14 o C 2-3min. (Oven) min. (Hot Plate) O 2 -plasma Dry process and wet process can be used. Wet Etching solution for Cr Ammonium cerium (IV) nitrate (NH 4 ) 2 Ce(NO 3 ) 6 Perchloric acid HClO 4 3-8wt% Pure water H 2 O 77-84wt% 13-18wt% (9) Resist Removing < deep-uv + organic solvent > 1 st step: 185nm+254nm,1mW/cm 2,3min.-irradiation 2 nd step: Dimethylacetamide (DMAC) or 1-Methyl-2-pyrrolidinone (NMP), 23 o C 1min. *As the polymer of ZEP52 is decomposed by deep-uv irradiation, it can be easily removed. <organic solvent > N-methyl-2-pyroridone (3-35 o C) <hot H 2 SO 4 -H 2 O 2 > hot H 2 SO 4 -H 2 O 2 (9-1 o C) - 9 -
11 13. Handling Precautions (1) Flammable Liquid (2) Harmful by inhalation (3) Avoid contact with skin and eyes CAUTION: Open carefully. Use in well ventilated area. In case of contact with skin and eyes, rinse immediately with plenty of water for 15 minutes and get medical attention. In case of fire use Alcohol form CO 2 or dry chemical, never use water. STORAGE: Keep capped and away from oxidants, sparks and open flame. Store at cool [32 o F ( o C) - 77 o F (25 o C)], dark place. Use in clean room
12 14. Appendix (1) Refractive Index of ZEP52 Film Cauchy Coefficient n = n + n 1 /λ 2 + n 2 /λ 4 n = n 1 = n 2 = Absorption coefficient = Unit of λ : Å Measured by UV-125/SE (KLA Tencor) (2) Glass Transition Temperature of ZEP52 Polymer Tg : 15 o C Measured by DSC < U.S.A > Zeon Chemicals L.P. (ZCLP) 4111 Bells Lane, Louisville, Kentucky 4211 (TEL) (FAX) < Europe > Zeon Europe GmbH Am Seestern Dusseldorf Germany (TEL ) (FAX)
Supplementary Figure 1 Detailed illustration on the fabrication process of templatestripped
Supplementary Figure 1 Detailed illustration on the fabrication process of templatestripped gold substrate. (a) Spin coating of hydrogen silsesquioxane (HSQ) resist onto the silicon substrate with a thickness
Photolithography 光刻 Part II: Photoresists
微纳光电子材料与器件工艺原理 Photolithography 光刻 Part II: Photoresists Xing Sheng 盛兴 Department of Electronic Engineering Tsinghua University xingsheng@tsinghua.edu.cn 1 Photolithography 光刻胶 负胶 正胶 4 Photolithography
Dry Etching Zheng Yang ERF 3017, MW 5:15-6:00 pm
Dry Etching Zheng Yang ERF 3017, email: yangzhen@uic.edu, MW 5:15-6:00 pm Page 1 Page 2 Dry Etching Why dry etching? - WE is limited to pattern sizes above 3mm - WE is isotropic causing underetching -
Pattern Transfer- photolithography
Pattern Transfer- photolithography DUV : EUV : 13 nm 248 (KrF), 193 (ArF), 157 (F 2 )nm H line: 400 nm I line: 365 nm G line: 436 nm Wavelength (nm) High pressure Hg arc lamp emission Ref: Campbell: 7
520/ Photolithography (II) Andreas G. Andreou
520/580.495 Photolithography (II) Andreas G. Andreou Lecture notes from Positive Photoresists and Photolithography by R. Darling http://www.engr.washington.edu/~cam/processes A.G. Andreou 2000 1 Lecture
Development of Lift-off Photoresists with Unique Bottom Profile
Transactions of The Japan Institute of Electronics Packaging Vol. 8, No. 1, 2015 [Technical Paper] Development of Lift-off Photoresists with Unique Bottom Profile Hirokazu Ito, Kouichi Hasegawa, Tomohiro
Environment Department CoSHH Assessment Form
Environment Department CoSHH Assessment Form This document should be completed electronically or in handwritten block capitals and by consulting current Safety Data Sheets (SDS). Completed forms should
EXPERIMENT 6 Empirical Formula of a Compound
EXPERIMENT 6 Empirical Formula of a Compound INTRODUCTION Chemical formulas indicate the composition of compounds. A formula that gives only the simplest ratio of the relative number of atoms in a compound
Methyl isobutyl ketone
Kumho Asiana Building 14Fl, #57, Shinmunro 1-Ga Jongro-Gu, Seoul, 110-061, Korea 82-2-6303-3480~2 Phone 82-2-6303-3492 Facsimile www.kpb.co.kr Methyl isobutyl ketone M I B K Description Methyl isobutyl
High-Performance Semiconducting Polythiophenes for Organic Thin Film. Transistors by Beng S. Ong,* Yiliang Wu, Ping Liu and Sandra Gardner
Supplementary Materials for: High-Performance Semiconducting Polythiophenes for Organic Thin Film Transistors by Beng S. Ong,* Yiliang Wu, Ping Liu and Sandra Gardner 1. Materials and Instruments. All
Supplementary Information Effects of asymmetric nanostructures on the extinction. difference properties of actin biomolecules and filaments
Supplementary Information Effects of asymmetric nanostructures on the extinction difference properties of actin biomolecules and filaments 1 E. H. Khoo, 2 Eunice S. P. Leong, 1 W. K. Phua, 2 S. J. Wu,
Introduction. Sample kit content
Introduction Polymer blend sample preparation TN01062 Preparation of polymer samples available from the Lateral force, Phase imaging, and Force modulation mode kits The SBS-PMMA, SBS-PS, and SBR-PMMA samples
Australian Journal of Basic and Applied Sciences. Characteristic of Photocurable Organic/Inorganic Hybrids Utilizing Acid Proliferation Reactions
AENSI Journals Australian Journal of asic and Applied Sciences ISSN:1991-8178 Journal home page: www.ajbasweb.com Characteristic of Photocurable Organic/Inorganic Hybrids Utilizing Acid Proliferation Reactions
METHYLISOBUTYLKETONE (4-methyl-2 pentanone) IN URINE BY GC/MS Headspace Code GC10510
METHYLISOBUTYLKETONE (4-methyl-2 pentanone) IN URINE BY GC/MS Headspace Code GC10510 BIOCHEMISTRY The methyl isobutyl ketone is a colorless and flammable liquid that is used as organic solvent in the laboratory
TECHNICAL INFORMATION 1,2-Indanedione Catalog Nos. LV508, LV5081
SIRCHIE Products Vehicles Training Copyright 2014 by SIRCHIE All Rights Reserved. TECHNICAL INFORMATION 1,2-Indanedione Catalog Nos. LV508, LV5081 Application Hazards/Safety Info Detection of latent fingerprints
MSDS. ( Material Safety Data Sheet ) High Density Polyethylene (LUTENE-H ME9180)
MSDS LG Chemical Limited LG Twin Tower/ East Wing, 20, Yoido-dong, Youngdungpo-gu Seoul, 150-721 Korea Tel : 822-3773-3060 Fax : 822-784-9731 ( Material Safety Sheet ) (LUTENE-H ME9180) Issue Item Page
Total Carboxylic Acid Group Content Applicable Products: Carbopol * Polymers and Pemulen * Polymeric Emulsifiers
LUBRIZOL TEST PROCEDURE TP-1318-A Edition: August, 2010 Total Carboxylic Acid Group Content Applicable Products: Carbopol * Polymers and Pemulen * Polymeric Emulsifiers Scope: This procedure is used for
E-TIN 34 PRE-DIP A Solderable Immersion Tin
E-TIN 34 PRE-DIP A Solderable Immersion Tin Product Description E-TIN 34 is a simple to operate, ready to use, stable, replenishable, electroless/immersion tin-plating solution designed for use as an alternative
Dynasylan SIVO 110. Description. Product Information. SIVO SOL Technology for coating systems
Dynasylan SIVO 110 +49-69-218-5656 SIVO SOL Technology for coating systems Description Dynasylan SIVO 110 resembles a multifunctional, basically VOC-free, water-borne sol-gel system. It is composed of
Supplementary Information Our InGaN/GaN multiple quantum wells (MQWs) based one-dimensional (1D) grating structures
Polarized white light from hybrid organic/iii-nitrides grating structures M. Athanasiou, R. M. Smith, S. Ghataora and T. Wang* Department of Electronic and Electrical Engineering, University of Sheffield,
J. Photopolym. Sci. Technol., Vol. 22, No. 5, Fig. 1. Orthogonal solvents to conventional process media.
originates from the limited number of options regarding orthogonal solvents, i.e. solvents that do not dissolve or adversely damage a pre-deposited organic materials layer. The simplest strategy to achieve
Lab- Properties of Acids and Bases. Name. PSI Chemistry
Lab- Properties of Acids and Bases PSI Chemistry Name Introduction Acids and bases are useful reagents in the chemistry laboratory and play an important role in biology and nature. What are acids and bases?
Figure 1: Graphene release, transfer and stacking processes. The graphene stacking began with CVD
Supplementary figure 1 Graphene Growth and Transfer Graphene PMMA FeCl 3 DI water Copper foil CVD growth Back side etch PMMA coating Copper etch in 0.25M FeCl 3 DI water rinse 1 st transfer DI water 1:10
GRIGNARD REACTION Synthesis of Benzoic Acid
1 GRIGNARD REACTION Synthesis of Benzoic Acid In the 1920 s, the first survey of the acceleration of chemical transformations by ultrasound was published. Since then, many more applications of ultrasound
Supplementary Figures
Supplementary Figures I n t e g r a l 2. 0 1 3 9 2. 0 4 1 5 0. 0 4 4 2 1. 0 0 0 0 1. 0 0 3 2 4. 1 0 0 6 2. 9 8 6 5 1 0. 1 9 4 8. 5 8. 0 7. 5 7. 0 6. 5 6. 0 5. 5 5. 0 4. 5 4. 0 ( p p m ) 3. 5 3. 0 2. 5
DRAIN TRACING DYE RED E123
DRAIN TRACING DYE RED E123 1.1 Product Identifier Product Name CAS No. EC No. DRAIN TRACING DYE RED E123 915-67-3 213-022-2 1.2. Relevant identified uses of the substance or mixture and uses advised against
HYSICAL AND CHEMICAL PROPERTIES AND PHYSIC AND CHEMICAL CHANGES
Experiment 4 Name: 15 P HYSICAL AND CHEMICAL PROPERTIES AND PHYSIC AND CHEMICAL CHANGES 13 Al e In this experiment, you will also observe physical and chemical properties and physical and chemical changes.
4FNJDPOEVDUPS 'BCSJDBUJPO &UDI
2010.5.4 1 Major Fabrication Steps in CMOS Process Flow UV light oxygen Silicon dioxide Silicon substrate Oxidation (Field oxide) photoresist Photoresist Coating Mask exposed photoresist Mask-Wafer Exposed
Multilayer Ceramic Chip Capacitors
HIGH VOLTAGE SERIES JARO high voltage series Multilayer Ceramic Capacitors are constructed by depositing alternative layers of ceramic dielectric materials and internal metallic electrodes, by using advanced
Material Safety Data Sheet acc. to ISO/DIS 11014
Page 1/5 1 Identification of substance: Catalog number: 21175 Manufacturer/Supplier: BD Diagnostic Systems 7 Loveton Circle Sparks, MD 21152 Telephone: (41) 771-1 or (8) 638-8663 Information department:
EXPERIMENT 7 Reaction Stoichiometry and Percent Yield
EXPERIMENT 7 Reaction Stoichiometry and Percent Yield INTRODUCTION Stoichiometry calculations are about calculating the amounts of substances that react and form in a chemical reaction. The word stoichiometry
Material Safety Data Sheet acc. to ISO/DIS 11014
Page 1/5 1 Identification of substance: Catalog number: 248810 Manufacturer/Supplier: BD Diagnostic Systems 7 Loveton Circle Sparks, MD 21152 Tel: (410) 771-0100 or (800) 638-8663 Information department:
Lithography and Etching
Lithography and Etching Victor Ovchinnikov Chapters 8.1, 8.4, 9, 11 Previous lecture Microdevices Main processes: Thin film deposition Patterning (lithography) Doping Materials: Single crystal (monocrystal)
Photosensitive Polyimide for Packaging Applications
Journal of Photopolymer Science and Technology Volume 28, Number 1 (2015) 73 77 2015SPST Photosensitive Polyimide for Packaging Applications Masao Tomikawa, Ryoji kuda, and Hiroyuki hnishi Electronic &
Section 3: Etching. Jaeger Chapter 2 Reader
Section 3: Etching Jaeger Chapter 2 Reader Etch rate Etch Process - Figures of Merit Etch rate uniformity Selectivity Anisotropy d m Bias and anisotropy etching mask h f substrate d f d m substrate d f
GL Chromatodisc. Usage Type Description. GL Chromatodisc Type A GL Chromatodisc Type P GL Chromatodisc Type N 13AI
syringe filters promises reproducible results from the filtration of organic and aqueous solutions in HPLC. Trace amount of samples containing impurities or contaminants can be easily removed, resulting
GUIDELINES FOR THE SAFE USE OF PYROPHORIC LIQUID REAGENTS
Page 1 of 5 GUIDELINES FOR THE SAFE USE OF Pyrophoric liquid reagents are substances that spontaneously ignite when exposed to air and/or moisture. These reagents are commonly utilized in chemical synthesis
Safety in the Chemistry Laboratory
Safety in the Chemistry Laboratory CHAPTER1 Safety must be everyone s primary concern in the chemistry lab. Understanding and following all safety rules in the organic chemistry lab is critical to your
SUPPORTING INFORMATION
SUPPORTING INFORMATION Liquid Beam Desorption Mass Spectrometry for the Investigation of Continuous Flow Reactions in Microfluidic Chips Sandra Schulze, Maik Pahl, Ferdinand Stolz, ǂ, Johannes Appun, ȹ
Bindzil for hard surface cleaners. Colloidal silica dispersions uses and benefits
Bindzil for hard surface cleaners Colloidal silica dispersions uses and benefits Product overview Bindzil colloidal silica dispersions Add value to your cleaners Bindzil water-based colloidal silica dispersions
Material Safety Data Sheet
1. Identification of the Substance/Preparation and the Company/Undertaking Substance or preparation trade name: Unique reference numbers(s): Company/undertaking name & address: PZT INOSTEK Solution Sol-Gel
Thin Wafer Handling Challenges and Emerging Solutions
1 Thin Wafer Handling Challenges and Emerging Solutions Dr. Shari Farrens, Mr. Pete Bisson, Mr. Sumant Sood and Mr. James Hermanowski SUSS MicroTec, 228 Suss Drive, Waterbury Center, VT 05655, USA 2 Thin
applied as UV protective films
Nanocomposite gels via in-situ photoinitiation and disassembly of TiO 2 -Clay composites with polymers applied as UV protective films Chuanan Liao, Qing Wu, Teng Su, Da Zhang, Qingsheng Wu and Qigang Wang*
Material Safety Data Sheet acc. to ISO/DIS 11014
Page 1/5 1 Identification of substance: Catalog number: 212185 Manufacturer/Supplier: BD Diagnostic Systems 7 Loveton Circle Sparks, MD 21152 Tel: (410) 771-0100 or (800) 638-8663 Information department:
TETRACHLOROETHYLENE IN URINE BY GC/MS Headspace Code GC15010
TETRACHLOROETHYLENE IN URINE BY GC/MS Headspace Code GC15010 BIOCHEMISTRY The Tetrachlorethylene or perchlorethylene, is an organic halide. Its structure is similar to that of a molecule of ethene which
Surface Mount UV LED. NUVA33 Series PART NUMBERING SYSTEM. WAVELENGTH CODES Code Nominal Wavelength
FEATURES SURFACE MOUNT 3.4mm x 3.4mm x 2.37mm WAVELENGTH 365 ~ 45nm FOR UV CURING, PHOTO CATALYST & SENSOR LIGHTING RoHS COMPLIANT COMPATIBLE WITH REFLOW SOLDERING TAPE AND REEL PACKAGING SPECIFICATIONS
Material Safety Data Sheet acc. to ISO/DIS 11014
Page 1/5 1 Identification of the substance/mixture and of the company/undertaking Product Identifier Catalog Number: 23874 Details of the supplier of the safety data sheet Manufacturer/Supplier: BD Diagnostic
2.8-1 SCIENCE EXPERIMENTS ON FILE Revised Edition. Dew Formation
2.8-1 SCIENCE EXPERIMENTS ON FILE Revised Edition Dew Formation Topic Dew Time 30 minutes! Safety Please click on the safety icon to view safety precautions. Be careful using the thermometer. Be careful
Classifying Chemical Reactions: Lab Directions
Classifying Chemical Reactions: Lab Directions Please Return Background: The power of chemical reactions to transform our lives is visible all around us in our homes, in our cars, even in our bodies. Chemists
Expt 10: Friedel-Crafts Alkylation of p-xylene
Expt 10: Friedel-Crafts Alkylation of p-xylene INTRODUCTION The Friedel-Crafts alkylation reaction is one of the most useful methods for adding alkyl substituents to an aromatic ring. Mechanistically,
Classification of Mystery Substances
Classification of Mystery Substances This document supports the safety activity Mystery Substance Identification: The Identification of Unlabeled Chemicals Found on School Premises from Flinn Scientific.
TRICHLOROETHYLENE IN URINE BY GC/MS Headspace Code GC16110
TRICHLOROETHYLENE IN URINE BY GC/MS Headspace Code GC16110 BIOCHEMISTRY Trichlorethylene, marketed under the name of thinner, is used as a degreaser of metals, preparation of paints and cleaning of fabrics.
--> Buy True-PDF --> Auto-delivered in 0~10 minutes. GB Translated English of Chinese Standard: GB5009.
Translated English of Chinese Standard: GB5009.17-2014 www.chinesestandard.net Sales@ChineseStandard.net NATIONAL STANDARD OF GB THE PEOPLE S REPUBLIC OF CHINA National Food Safety Standard-Determination
Ali Hayek, a Yongan Xu, b Takashi Okada, a Stephen Barlow, a Xuelian Zhu, b Jun Hyuk Moon, b Seth R. Marder, * a and Shu Yang* b
Supporting Information for: Poly(glycidyl methacrylate)s with controlled molecular weights as lowshrinkage resins for 3D multibeam interference lithography Ali Hayek, a Yongan Xu, b Takashi Okada, a Stephen
Development of Photosensitive Polyimides for LCD with High Aperture Ratio. May 24, 2004
Development of Photosensitive Polyimides for LCD with High Aperture Ratio May 24, 2004 utline Why is polymer dielectric required for TFT LCD? Requirements of the polymer dielectrics What is polyimide?
Supplementary materials for: Large scale arrays of single layer graphene resonators
Supplementary materials for: Large scale arrays of single layer graphene resonators Arend M. van der Zande* 1, Robert A. Barton 2, Jonathan S. Alden 2, Carlos S. Ruiz-Vargas 2, William S. Whitney 1, Phi
NWLSS TM Nitric Oxide (Nitrate/Nitrite) Non-Enzymatic Assay
Premier Products for Superior Life Science Research NWLSS TM Nitric Oxide (Nitrate/Nitrite) Non-Enzymatic Assay Product NWK-NNO01 For Research Use Only Non-enzymatic assay system for measurement of nitric
Supporting Information
Supporting Information Enhanced Thermal Stability in Perovskite Solar Cells by Assembling 2D/3D Stacking Structures Yun Lin 1, Yang Bai 1, Yanjun Fang 1, Zhaolai Chen 1, Shuang Yang 1, Xiaopeng Zheng 1,
Specification HW321A. Drawn Approval Approval. Rev November 서식번호 : SSC-QP (Rev.00)
Specification HW321A SSC Customer Drawn Approval Approval [ Contents ] 1.Full code of HIGH FLUX LED series 2.Feature & Application 3. Absolute Maximum Ratings 4.Electro Characteristics 5.Outline Dimension
Test Report For: FunderMax GmbH. MAX Resistance 2. SEFA , 2.1 Chemical/Stain Resistances
4700 Broadmoor SE, Suite 200 Kentwood, MI 49512 Telephone: 616-656-7401 Facsimile: 616-656-2022 www.intertek-etlsemko.com P.O. No.: MP Page 1 of 9 Test Report For: FunderMax GmbH MAX Resistance 2 SEFA
Specification LY521. <080924> Rev. 0.3 Document No. : SSC-QP (Rev.00) Drawn Approval Approval. Rev. 00 December
Specification LY521 SSC Customer Drawn Approval Approval 1. Features Contents 2. Absolute Maximum Ratings 3. Electric-Optical Characteristics 4. Reliability Tests 5. Characteristic Diagrams 6. Color &
Supplementary Information. High-Performance, Transparent and Stretchable Electrodes using. Graphene-Metal Nanowire Hybrid Structures
Supplementary Information High-Performance, Transparent and Stretchable Electrodes using Graphene-Metal Nanowire Hybrid Structures Mi-Sun Lee, Kyongsoo Lee, So-Yun Kim, Heejoo Lee, Jihun Park, Kwang-Hyuk
Nano fabrication by e-beam lithographie
Introduction to nanooptics, Summer Term 2012, Abbe School of Photonics, FSU Jena, Prof. Thomas Pertsch Nano fabrication by e-beam lithographie Lecture 14 1 Electron Beam Lithography - EBL Introduction
Fabrication-II. Electron Beam Lithography Pattern Design Thin Film Deposition
Fabrication-II Electron Beam Lithography Pattern Design Thin Film Deposition By Charulata Barge, Graduate student, Prof. Zumbühl Group, Department of Physics, Universtity of Basel. Date:- 20th Oct. 2006
Toxicology Extraction Procedure for Base Drugs Using United Chemical Technologies Clean Screen Extraction Columns
Name of Procedure: Toxicology Extraction Procedure for Base Drugs Using United Chemical Technologies Clean Screen Extraction Columns Suggested Uses: This is an extraction procedure for base drugs. The
Stretchable Graphene Transistors with Printed Dielectrics and Gate Electrodes
Stretchable Graphene Transistors with Printed Dielectrics and Gate Electrodes Seoung-Ki Lee, Beom Joon Kim, Houk Jang, Sung Cheol Yoon, Changjin Lee, Byung Hee Hong, John A. Rogers, Jeong Ho Cho, Jong-Hyun
Objective: Science Classroom Laboratory Safety
Science Classroom Laboratory Safety Objective: Learn safety rules for working with chemicals and participating in a safe manner when carrying out lab procedures. Complete the safety and equipment assignment
UNIT 3. By: Ajay Kumar Gautam Asst. Prof. Dev Bhoomi Institute of Technology & Engineering, Dehradun
UNIT 3 By: Ajay Kumar Gautam Asst. Prof. Dev Bhoomi Institute of Technology & Engineering, Dehradun 1 Syllabus Lithography: photolithography and pattern transfer, Optical and non optical lithography, electron,
Supporting Information. Effects of Environmental Water Absorption by. Film Transistor Performance and Mobility
Supporting Information Effects of Environmental Water Absorption by Solution-Deposited Al 2 O 3 Gate Dielectrics on Thin Film Transistor Performance and Mobility Trey B. Daunis, James M. H. Tran, and Julia
Supporting Information
Supporting Information A Generic Method for Rational Scalable Synthesis of Monodisperse Metal Sulfide Nanocrystals Haitao Zhang, Byung-Ryool Hyun, Frank W. Wise, Richard D. Robinson * Department of Materials
BGA REBALLING INSTRUCTIONS WINSLOW AUTOMATION, INC.
BGA REBALLING INSTRUCTIONS WINSLOW AUTOMATION, INC. Acknowledgments S o l d e r Q u i k i s a t r a d e m a r k o f W i n s l o w A u t o m a t i o n, I n c. R a y c h e m C o r p o r a t i o n p a t e
Wet Chemical Processing with Megasonics Assist for the Removal of Bumping Process Photomasks
Wet Chemical Processing with Megasonics Assist for the Removal of Bumping Process Photomasks Hongseong Sohn and John Tracy Akrion Systems 6330 Hedgewood Drive, Suite 150 Allentown, PA 18106, USA Abstract
25. Qualitative Analysis 2
25. Qualitative Analysis 2 This experiment uses a series of wet chemistry analytical tests to determine the functional group present in a series of known and an unknown compound. Each student receives
Specification LR521. Drawn Approval Approval. Rev. 05 December 서식번호 : SSC-QP (Rev.00)
Specification LR521 SSC Customer Drawn Approval Approval 1. Features Contents 2. Absolute Maximum Ratings 3. Electric-Optical Characteristics 4. Reliability Tests 5. Characteristic Diagrams 6. Color &
Nanoimprint Lithography
Nanoimprint Lithography Wei Wu Quantum Science Research Advanced Studies HP Labs, Hewlett-Packard Email: wei.wu@hp.com Outline Background Nanoimprint lithography Thermal based UV-based Applications based
Unit 1: Safety in the Laboratory
Chemistry 11 Unit 1: Safety in the Laboratory 1. Safety Equipment & Common Lab Rules 2. The Five Chemical Hazards 3. Hazard & WHMIS symbols 4. Accidents & Accident Prevention 1 Safety in the Chemistry
Preparation of an Ester Acetylsalicylic Acid (Aspirin)
Preparation of an Ester Acetylsalicylic Acid (Aspirin) BJECTIVE: To become familiar with the techniques and principle of esterification. DISCUSSIN: Aspirin is a drug widely used as an antipyretic agent
Ion Selective Electrode Probe
Rev. 1 Ion Selective Electrode Probe KDS-1064 Calcium KDS-1065 Ammonium KDS-1066 Nitrate KDS-1067 Chloride Type : Ion selective electrode Range : 1 M to 5x10-7 M(40,000 ~ 0.01 ppm) Sensor description The
SUBJECT: Precipitation Method to Remove Unincorporated Dye Terminators from ABI PRISM BigDye Terminator v3.0 Cycle Sequencing Reactions
User Bulletin ABI PRISM 3700 DNA Analyzer, ABI PRISM 3100 Genetic Analyzer, ABI PRISM 310 Genetic Analyzer, and ABI PRISM 377 DNA Sequencer April 11, 2002 SUBJECT: Precipitation Method to Remove Unincorporated
High Purity Chromasolv Solvents
Research Chemicals High Purity Chromasolv Solvents Part of Honeywell Research Chemical s Exclusive Riedel-de Haën Brand Portfolio The Chromasolv family of solvents are used in a variety of analytical applications
Safety Data Sheet. 1. Identification of the Substance/Mixture and the Supplier. 2. Hazards Identification
Safety Data Sheet 1. Identification of the Substance/Mixture and the Supplier Supplier : National Institute of Advanced Industrial Science and Technology (AIST) Address : 1-3-1 Kasumigaseki, Chiyoda, Tokyo,
--> Buy True-PDF --> Auto-delivered in 0~10 minutes. GB Translated English of Chinese Standard: GB5009.
Translated English of Chinese Standard: www.chinesestandard.net Sales@ChineseStandard.net NATIONAL STANDARD OF THE GB PEOPLE S REPUBLIC OF CHINA GB 5009.15-2014 National Food Safety Standard Determination
DEPOSITION OF THIN TiO 2 FILMS BY DC MAGNETRON SPUTTERING METHOD
Chapter 4 DEPOSITION OF THIN TiO 2 FILMS BY DC MAGNETRON SPUTTERING METHOD 4.1 INTRODUCTION Sputter deposition process is another old technique being used in modern semiconductor industries. Sputtering
Photolithography II ( Part 1 )
1 Photolithography II ( Part 1 ) Chapter 14 : Semiconductor Manufacturing Technology by M. Quirk & J. Serda Bjørn-Ove Fimland, Department of Electronics and Telecommunication, Norwegian University of Science
Recent progress in nanoparticle photoresist development for EUV lithography
Recent progress in nanoparticle photoresist development for EUV lithography Kazuki Kasahara ab, Vasiliki Kosma b, Jeremy Odent b, Hong Xu b, Mufei Yu b, Emmanuel P. Giannelis b, Christopher K. Ober b a
SOP Title: Preparation of FFPE sections prior to processing to nucleic acid
SOP Title: Preparation of FFPE sections prior to processing to nucleic acid The STORE processing methods were shown to be fit-for purpose for DNA, RNA and protein extraction from FFPE material. The STORE
Supporting Information
Supporting Information Self-cleaning membranes from comb-shaped copolymers with photoresponsive side groups Papatya Kaner 1, Xiaoran Hu 2, Samuel W. Thomas III 2, Ayse Asatekin 1,* 1 Department of Chemical
Full-color Subwavelength Printing with Gapplasmonic
Supporting information for Full-color Subwavelength Printing with Gapplasmonic Optical Antennas Masashi Miyata, Hideaki Hatada, and Junichi Takahara *,, Graduate School of Engineering, Osaka University,
Detection limit: grain, feed 500 ppb; milk 50 ppb; cream, cheese 5 ppb
Product information Background Deoxynivalenol (DON) Deoxynivalenol, called vomitoxin, is a toxic metabolite mainly produced by Fusarium graminearum. It is mainly found in wheat, barley, corn and feed.
Formation and Surface Modification of Nanopatterned Thiol-ene Substrates using
Supporting Information Formation and Surface Modification of Nanopatterned Thiol-ene Substrates using Step and Flash Imprint Lithography Vaibhav S. Khire, 1 Youngwoo Yi, 2 Noel A. Clark, 2 and Christopher
SAFETY DATA SHEET (SDS) LOX-8 PASTE. 1. Identification of the substance/mixture and of the company/undertaking
SAFETY DATA SHEET (SDS) LOX-8 PASTE 1. Identification of the substance/mixture and of the company/undertaking 1.1 Product identifiers: Product name Lox-8 Paste 1.2 Relevant identified uses of the substance
Material Safety Data Sheet acc. to ISO/DIS 11014
Page 1/6 1 Identification of the substance/mixture and of the company/undertaking Product Identifier Catalog Number: 220971 Details of the supplier of the safety data sheet Manufacturer/Supplier: BD Diagnostic
Electronic Supplementary Information (ESI)
Electronic Supplementary Material (ESI) for Journal of Materials Chemistry A. This journal is The Royal Society of Chemistry 2018 Electronic Supplementary Information (ESI) Sifting α,ω-di(thiophen-2-yl)alkanes
Supporting Information. Metallic Adhesion Layer Induced Plasmon Damping and Molecular Linker as a Non-Damping Alternative
Supporting Information Metallic Adhesion Layer Induced Plasmon Damping and Molecular Linker as a Non-Damping Alternative Terefe G. Habteyes, Scott Dhuey, Erin Wood, Daniel Gargas, Stefano Cabrini, P. James
METHYLETHYLKETONE (M.E.K.) IN URINE BY GC/MS in head space Code GC10010
METHYLETHYLKETONE (M.E.K.) IN URINE BY GC/MS in head space Code GC10010 BIOCHEMISTRY The MEK is presented as a colorless liquid odor similar to that of acetone, is volatile and potentially explosive. The
Chemical Bonds. MATERIALS 24-well microplate calcium chloride candle citric acid conductivity tester ethanol gloves iron ring lab apron
Microscale Chemical Bonds Chemical compounds are combinations of atoms held together by chemical bonds. These chemical bonds are of two basic types ionic and covalent. Ionic bonds result when one or more
Safety Data Sheet. Identification of the substance/mixture, intended use and of the company/undertaking
http://www.clickchemistrytools.com E: inquiries@clickchemistrytools.com T: 480 584 3340 F: 866 717 2037 Safety Data Sheet Section 1: Identification of the substance/mixture, intended use and of the company/undertaking
SU photoresist and SU-8 Developer (1-methoxy-2-propanol acetate) were
Supplementary Information 1. Materials: SU-8 2010 photoresist and SU-8 Developer (1-methoxy-2-propanol acetate) were obtained from M/s MicroChem, MA, USA. Whatman no. 1 chromatography paper circles of
ELOTANT Milcoside301V2
ELOTANT Milcoside301V2 1. Chemical Product and Company Identification a. Product name ELOTANT Milcoside 301V2 b. Product use Wetting agent; Plasticizer; Release agent; Foaming Agent, Dish Wash; Hair Care;